KR20050104759A - Vibrating diffractive optical modulator - Google Patents

Abstract

The present invention relates to a vibration diffractive light modulator for each modulation unit. More specifically, the present invention relates to an improved vibrating diffractive light modulator that can reduce the number of pixel units needed by vibrating the micromirror pixel units constituting one unit of diffraction at a predetermined frequency.

Vibration-type optical modulator for each pixel unit of the present invention, a plurality of micromirror pixel unit for diffracting the incident light in accordance with the voltage applied to the subject; A sub substrate supporting the plurality of micromirror pixel units; A plurality of vibration units for vibrating the micromirror pixel unit at a predetermined frequency according to a voltage applied to the sub-substrate; And a substrate supporting the plurality of vibration units.

Description

Vibrating diffractive optical modulator

The present invention relates to a vibrating diffractive light modulator. More specifically, the present invention relates to an improved vibrating diffractive light modulator that can reduce the number of pixel units needed by vibrating the micromirror pixel units constituting one unit of diffraction at a predetermined frequency.

In general, optical signal processing has advantages of high speed, parallel processing capability, and large-capacity information processing, unlike conventional digital information processing, which cannot process a large amount of data and real-time processing, and design a binary phase filter using spatial light modulation theory. Research on fabrication, optical logic gates, optical amplifiers, image processing techniques, optical devices, optical modulators, etc. The dual spatial optical modulator is used in the fields of optical memory, optical display, printer, optical interconnection, hologram, and the like, and research on the development of a display device using the same is underway.

Such a spatial light modulator is, for example, a reflective deformable grating light modulator 10 as shown in FIG. 1. Such a modulator 10 is disclosed in US Pat. No. 5,311,360 to Bloom et al. The modulator 10 includes a plurality of regularly spaced deformable reflective ribbons 18 having reflective surface portions and suspended above the substrate 16. An insulating layer 11 is deposited on the silicon substrate 16. Next, deposition of the sacrificial silicon dioxide film 12 and the low stress silicon nitride film 14 is followed. The nitride film 14 is patterned from the ribbon 18 and a portion of the silicon dioxide layer 12 is etched so that the ribbon 18 is retained on the oxide spacer layer 12 by the nitride frame 20. In order to modulate light with a single wavelength [lambda] 0, the modulator is designed such that the thickness of the ribbon 18 and the thickness of the oxide spacers 12 are [lambda] 0/4.

The lattice amplitude of this modulator 10, defined by the vertical distance d between the reflective surface 22 on the ribbon 18 and the reflective surface of the substrate 16, is the ribbon 18 (the ribbon 16 serving as the first electrode). Is controlled by applying a voltage between the reflective surface 22 of the substrate 16 and the substrate 16 (the conductive film 24 under the substrate 16 serving as the second electrode). In the undeformed state, i.e., without any voltage applied, the grating amplitude is equal to [lambda] 0/2, and the total path difference between the ribbon and the light reflected from the substrate is equal to [lambda] 0, thus reinforcing the phase to this reflected light. Thus, in the undeformed state, the modulator 10 reflects light as a planar mirror. The undeformed state is indicated as 20 in FIG. 2 showing incident light and reflected light.

When a proper voltage is applied between the ribbon 18 and the substrate 16, electrostatic forces deform the ribbon 18 in the down position toward the surface of the substrate 16. In the down position, the grating amplitude changes to equal λ 0/4. The total path difference is half of the wavelength, and the light reflected from the modified ribbon 18 and the light reflected from the substrate 16 have a destructive interference. As a result of this interference, the modulator diffracts incident light 26. The modified state is represented by 28 and 30 in FIG. 3, showing light diffracted in the +/- diffraction modes (D + 1, D-1).

The adhesion between the ribbon 18 and the substrate 16 during the wet process used to form the space under the ribbon 18 and during the operation of the modulator 10 proved to be a major problem in this device.

An improved prior art for solving this problem is "Method and Apparatus for Modulating an Incident Light Beam to Form a Two-Dimensional Image" of Silicon Light Machines, National Application No. 10-2000-7014798.

In the disclosed "method and apparatus for modulating an incident light beam to form a two-dimensional image", the diffraction grating light valve comprises a plurality of elongated elements each having a reflective surface. The elongated elements are parallel to each other on top of the substrate, with supported ends and aligned to form a row of adjacent reflective surfaces (GLV array). The elongated elements form a group according to the display elements. Each group is alternating by alternately applying a voltage to the substrate. The nearly planar center of each deformed elongated element is substantially parallel at a predetermined distance from the center of each undeformed element. The preset distance is chosen to be 1/3 to 1/4 of the distance between the undeformed reflective surface and the substrate so that the deformed elongated element does not contact the surface of the substrate. By preventing contact with the substrate, elongated elements are prevented from adhering to the substrate. In addition, by limiting the preset distance, hysteresis to deform the elongated element is prevented.

 4 shows a side cross-sectional view of the elongate element 100 of the GLV in the undeformed state according to the improved prior art. In FIG. 4, the elongate element 100 is suspended on the substrate (including the constituent layer) surface by its end. In FIG. 4, reference numeral 102 denotes an air space.

5 shows a plan view of a portion of a GLV that includes six elongated elements 100. The elongated elements 100 have the same width and are arranged parallel to each other. The elongated elements 100 are separated from one another in a small space, thereby allowing each elongated element 100 to be selectively deformed with respect to other elements.

6 shows a front view of the display element 100 with the elongated element 100 unmodified. 6 is a view taken along the line A-A 'shown in FIG. The undeformed state is selected by equalizing the bias on each elongated element 100 relative to the conductor layer 106. Since the reflective surface of the elongate element 100 is substantially co-planar, light incident on the elongate element 100 is reflected.

FIG. 7 shows a front view of the display element 200 with alternating elongated elements 100 alternately arranged. The figure shown in FIG. 7 is cut along the line A-A 'shown in FIG. The elongated ribbon 100, which has not been substantially removed, is held in the desired position by the applied bias voltage. The strained state in the moving elongated ribbon 100 is achieved by alternately applying a drive voltage to the elongated element 100 relative to the conductor layer 106. The vertical distance d1 is approximately planar with respect to the central portion 102, thus defining the grating amplitude of the GLV. The grating amplitude d1 can be adjusted by adjusting the drive voltage on the driven elongated element 100. This allows precise tuning of the GLV at the optimum contrast ratio.

However, Silicon Light Machines' optical modulator uses an electrostatic method to control the position of the micromirror, in which case the operating voltage is relatively high (usually around 30V) and the relationship between the applied voltage and the displacement is not linear. As a result, there is a disadvantage that the reliability is not high in controlling the light.

In order to solve this problem, Korean Patent Application No. P2003-077389 discloses a thin film piezoelectric optical modulator and a method of manufacturing the same.

8A through 8C are cutaway views of a recessed thin film piezoelectric optical modulator according to an improved technique.

Referring to FIG. 8A, a recessed thin film piezoelectric optical modulator according to an embodiment of the improved technology has a micromirror layer 1015a for reflecting and diffracting incident light and floating on a recessed portion of the silicon substrate 1001a. An element 1010a.

The element 1010a has a constant width as shown in FIG. 10A and a plurality of elements are uniformly arranged to form a recessed thin film piezoelectric optical modulator. In addition, the elements 1010a have different widths and alternately arranged as shown in FIG. 10B to form a recessed thin film piezoelectric optical modulator. In addition, the elements 1010a may be spaced apart from each other at a predetermined distance (almost the same distance as the width of the elements 1010a) as shown in FIG. 10C, and in this case, all of the upper surfaces of the silicon substrate 1001a. The micromirror layer 1020 is stacked to reflect and diffract the incident light.

The silicon substrate 1001a has a depression to provide air space to the element 1010a, an insulating layer 1002a is deposited on the upper surface, and ends of the element 1010a are attached to both sides of the depression. .

The elements 1010a have a rod shape, and the bottom surfaces of both ends are attached to both side regions outside the depressions of the silicon substrate 1001a so that the center portion is spaced apart from the depressions of the silicon substrate 1001a. The layer 1015a is stacked on top, and the portion located in the depression of the silicon substrate 1001a includes a lower support 1011a that is movable up and down.

In addition, the element 1010a is stacked on the lower support 1011a, and is stacked on the lower electrode layer 1012a and the lower electrode layer 1012a for providing a piezoelectric voltage, and contracts and expands when voltage is applied to both sides. It is laminated on the piezoelectric material layer 1013a for generating the driving force, the piezoelectric material layer 1013a, and on the upper electrode layer 1014a for providing a piezoelectric voltage to the piezoelectric material layer 1013a, and on the upper electrode layer 1014a. And a micromirror layer 1015a for reflecting and diffracting the incident beam.

When the voltage is applied to the upper electrode layer 1013a and the lower electrode layer 1012a, the element 1010a can be diffracted by reflecting down the incident light as shown in FIG. 9A.

8B and 9B, it can be seen that the piezoelectric material layers 1013b and 1013b 'are positioned on both sides to generate vertical driving force. Referring to FIGS. 8C and 9C, the piezoelectric material layer 1013c is centered. It can be seen that the position is generated in the vertical driving force.

11A-11C are cross-sectional views of a lead-out thin film piezoelectric optical modulator according to an improved technique.

Referring to FIG. 11A, unlike the recessed thin film piezoelectric optical modulator, the lead-type thin film piezoelectric optical modulator according to an embodiment of the improved technology has the lower support 2011a of the element 2010a drawn from the silicon substrate 2001a to provide air. Provide space, and as a result the element 2010a is movable up and down.

That is, the element 2010a has a micromirror layer 2015a for reflecting and diffracting incident light, and the element 2010a floats in the lead portion of the silicon substrate 2001a and is movable up and down.

The element 2010a has a constant width as shown in FIG. 13A and a plurality of elements are uniformly arranged to form a recessed thin film piezoelectric optical modulator. In addition, the elements 2010a have different widths and alternately arranged as shown in FIG. 13B to form a recessed thin film piezoelectric optical modulator. In addition, the elements 2010a may be spaced apart from each other at a predetermined interval (a distance substantially equal to the width of the elements 2010a), as shown in FIG. 13C, and in this case, all the upper surfaces of the silicon substrate 2001a may be disposed. The micromirror layer 2020 is stacked to reflect and diffract incident light.

The lower support 2011a of the element 2010a is derived to provide an air space to the element 2010a, and both ends thereof are attached to the silicon substrate 2001a.

The element 2010a has a rod shape, the center part is separated from the silicon substrate 2001a, and the bottom surface of each end is attached to the silicon substrate 2001a, and the micro mirror layer 2015a is laminated on the top. The portion located in the depression of the silicon substrate 2001a includes a lower support 2011a that is movable up and down.

In addition, the element 2010a is stacked on the lower support 2011a, and is stacked on the lower electrode layer 2012a and the lower electrode layer 2012a for providing a piezoelectric voltage, and contracts and expands when voltage is applied to both surfaces. It is laminated on the piezoelectric material layer 2013a for generating the driving force, the piezoelectric material layer 2013a, and the upper electrode layer 2014a for providing the piezoelectric voltage to the piezoelectric material layer 2013a, and the upper electrode layer 2014a. A micro mirror layer 2015a for reflecting and diffracting the incident beam is included.

When the voltage is applied to the upper electrode layer 2013a and the lower electrode layer 2012a, the element 2010a can be diffracted by reflecting down incident light as shown in FIG. 12A.

11B and 12B, it can be seen that the piezoelectric material layers 2013b and 2013b ′ are positioned at both sides to generate vertical driving force. Referring to FIGS. 11C and 12C, the piezoelectric material layers 2013c are centered. It can be seen that the position is generated in the vertical driving force.

Meanwhile, optical modulators of the type described in the patents of BLUM, Samsung Electro-Mechanics, etc. may be used to form a structure for displaying an image. In this case, at least two adjacent elements may form one pixel. Of course, three may be one pixel, four may be one pixel, or six may be one pixel. If the display has an optical system that detects only diffracted light, when no voltage is applied to an element such as a ribbon and the ribbon lamp is kept in the upper position, the pixels are dark, that is, the voltage is applied to the ribbon lamp so that the ribbon lamp is applied to the substrate. When pulled downward, the pixel is in a bright state, ie on. The most important problem in designing a display system is the contrast ratio between dark and bright pixels. In addition, the most important problem in designing a display system is to achieve miniaturization and high integration in view of the recent trend of miniaturization and high integration of electronic products.

However, optical modulators of the type described in the patents of BLUM, Samsung Electro-Mechanics, etc. have certain limitations in achieving miniaturization. That is, no matter how small the width of the element of the optical modulator can be less than 3um, there is a limit that the distance between the element and the element can not be smaller than 0.5um.

Scanning multiple arrays of pixels requires an optical modulator with the same number of pixel units. However, this approach is inefficient because it requires many expensive pixel units.

Therefore, in order to solve the above problem, a highly efficient optical modulator capable of scanning a plurality of pixels even with a small number of pixel units is required.

It is an object of the present invention to provide a diffractive light modulator that can dramatically reduce the number of pixel units required for scanning.

Vibration-type optical modulator for each pixel unit according to the present invention comprises a plurality of micromirror pixel units for diffracting the incident light in accordance with the applied voltage; A plurality of vibration units for vibrating the micromirror pixel unit at a predetermined frequency according to an applied voltage; And a substrate supporting the sub substrates.

Hereinafter, the present invention will be described in more detail with reference to the drawings.

14A shows a cross section of a thin film type vibration diffraction light modulator array 1400 according to the present invention, and FIG. 14B shows an operation of a thin film type vibration diffraction light modulator array 1400 according to the present invention.

14A and 14B show the pixel unit 1405 by piezoelectric / electric distortion driving as an embodiment of the present invention. The pixel unit 1405 is composed of a plurality of actuating cells 1404, which shows an example composed of four actuating cells 1404.

The optical modulator pixel unit 1405 diffracts the linear light in the form of the incident single beam 1415 and scans it into a subject formed with a diffraction beam having a predetermined diffraction coefficient. The diffracted light is a zero-order diffraction beam 1411. ) And ± first order diffraction beams 1412,1413.

In the vibration diffraction type optical modulator 1400 according to the present invention, as illustrated in FIG. 14A, a plurality of micromirror pixel units 1405 diffracting incident light according to an applied voltage and transferring the light to a subject are applied to the subject. And a plurality of vibration units 1409 for vibrating the micromirror pixel unit at a predetermined frequency, and a substrate 1410 for supporting the plurality of vibration units.

Each pixel unit 1405 is composed of a plurality of actuating cells 1404, and the actuating cells 1404 are each of an upper electrode layer 1401, a lower electrode layer 1402, and an applied voltage for applying a voltage. It is composed of a piezoelectric material layer 1402 that contracts or expands in accordance with, and is driven up and down by a driving power source applied from the outside. The upper electrode layer 1401 also serves as a micromirror that reflects light while applying a voltage.

The vibration unit 1409 includes a predetermined sub substrate 1414 having a recess for providing an air space in a central portion thereof, an insulating layer 1408 and an invariant element 1406 and a piezoelectric element formed on the sub substrate. And a piezoelectric vibrator composed of 1407.

Each pixel unit 1405 is fixed to the substrate 1408 by the piezoelectric vibrator. When a predetermined voltage is applied to the piezoelectric element 1407 through an electrode (not shown), the length of the piezoelectric element 1407 is increased or decreased depending on the applied voltage, but the invariant element 1406 does not change the length of the piezoelectric element. The vibrator vibrates from side to side. This vibration causes the pixel unit 1405 to vibrate in the direction of the arrow in Fig. 14B.

The light 1411, 1412, 1413 diffracted by this vibration alternately scans the light shown by the solid line and the light shown by the dotted line.

15A and 15B show a scanning operation by the oscillating diffractive light modulator of the present invention.

As shown in Fig. 15A, for example, when scanning a horizontally arranged 720 pixel array 1415, each pixel unit of the optical modulator is oscillated up and down to scan two pixels of a subject, which is half of the number of conventionally required pixels. An optical modulator with 360 pixel units 1405 can also scan a 720 pixel array.

In other words, scanning alternately the hatched pixels of FIG. 15A and the non-hatched rectangles at high speed produces the same effect as scanning each pixel unit. In addition, by vibrating one pixel unit to scan three or more pixels, the pixel array can be scanned with fewer pixel units.

As such, one pixel unit may replace two or more pixel units 1405 by virtue of the pixel unit 1405 rapidly switching between one or more pixel scanning positions by a predetermined frequency.

Further, as shown in Fig. 15B, each pixel unit is oscillated from side to side to scan two or more pixels 1416, for example, scanning an array of 1280 pixels with an optical modulator having half or less pixel units. can do.

In one embodiment of the present invention, the actuating cell 1404 may have a structure in close contact with the sub-substrate 1414 or the insulating layer 1408 of the vibration unit 1409, that is, a thick film structure. In the case where the actuating cell 1404 has a thick film structure, it is not necessary to form a depression on the sub substrate 1414 unlike the case of the thin film structure.

In this case, the lower electrode 1403 is formed on a predetermined sub substrate 1414 constituting the actuating cell 1404 having a thin film structure to provide the piezoelectric / electric strain layer 1402 with a driving voltage applied from the outside. It is formed on the sub-substrate 1414 by sputtering or vapor deposition of electrode materials such as Pt, Ta / Pt, Ni, Au, Al, RuO2, and the like.

In this case, it is deposited on the sub-substrate 1407 to support the piezoelectric / distortion layer 322 of the actuating cell 1405 having a thin film structure, materials such as SiO2, Si3N4, Si, ZrO2, Al2O3, etc. It may further comprise a lower support consisting of.

The piezoelectric material layer 1402 is a predetermined piezoelectric / electric distortion material whose length is changed in an up-down direction or a left-right direction by a piezoelectric phenomenon generated in conjunction with a driving power source applied from the outside, more specifically, PzT, PNN-PT, ZnO. Piezoelectric / electrical distortion materials such as Pb, Zr or titanium are wetted (screen printing, Sol-Gel coting, etc.) and dry methods (sputtering, evaporation, vapor deposition, etc.) on the lower electrode 1403 on the lower electrode 1403. Is formed.

The upper electrode 1401 is formed on the piezoelectric / distortion layer 1402 to perform reflection and diffraction on incident light, more specifically, Pt, Ta / Pt, Ni, Au, Al, RuO2, or the like. The electrode material of is formed in the range of 0.01 ~ 3㎛ through sputtering or deposition method.

In this case, the upper electrode 1401 may operate as a micromirror that performs reflection and diffraction on an optical signal input from the outside, or Al, which is a predetermined light reflection material, to further enhance reflection and diffraction on the optical signal. It may be configured to further include a micro mirror composed of Au, Ag, Pt, Au / Cr.

Here, the piezoelectric / electric distortion diffraction type optical modulator 1400 is driven in units of pixels 1405 in which the actuating cells 1405 are grouped in a predetermined number.

In the embodiment of the present invention, instead of the pixel unit 1405 composed of the above-described piezoelectric / electric distortion diffractive optical modulator, the electrostatically driven optical modulator in which the actuating cell is driven by the constant power according to the applied voltage or the applied voltage is applied. A magnetically driven optical modulator may be used in which the actuating cell is driven by the magnetic force.

Fig. 16A shows a cross-sectional view of a vibrating diffraction light modulator array 1600 for each pixel unit vibrating by electrostatic driving as another embodiment according to the present invention, and Fig. 16B shows a side cross-sectional view of Fig. 16A.

The vibration diffraction type optical modulator according to the present embodiment includes a plurality of pixel units 1600 formed on the substrate 1608, as shown in FIG. 16A.

As illustrated in FIG. 16A, the vibration diffraction type optical modulator according to the present invention includes a plurality of micromirror pixel units 1605 which diffracts incident light according to an applied voltage and transmits the light to a subject, and according to an applied voltage. And a plurality of vibration units 1609 for vibrating the micromirror pixel unit at a frequency, and a substrate 1612 for supporting the plurality of vibration units.

Each pixel unit 1605 is composed of a plurality of actuating cells 1604, and the actuating cells 1604 each have an upper electrode layer 1601, a lower electrode layer 1602, and an applied voltage for applying a voltage. And a piezoelectric material layer 1602 that contracts or expands in accordance with the above, and is driven up and down by a driving power source applied from the outside. The upper electrode layer 1601 also serves as a micromirror that reflects light while applying a voltage.

The vibration unit 1609 includes a predetermined sub-substrate 1607 in which a depression for providing an air space is formed in the center portion, upper electrodes 1610 and 1610 and lower electrodes 1611 and 1611 for applying a vibration voltage. It is composed. The upper electrodes 1614 and 1614 and the lower electrodes 1615 and 1615 are spaced apart from each other by a predetermined interval.

As shown in FIGS. 16A and 16B, when a positive voltage is applied to the upper electrodes 1610 and 1610, and a negative voltage is applied to the lower electrodes 1611 and 1611, attraction between the upper electrode and the lower electrode is applied. When the same polarity is applied between the upper electrodes 1610 and 1610 and the lower electrodes 1611 and 1611, the repulsive force acts on each other. However, since the sub-substrate 1607 and the substrate 1612 will remain intact even when a voltage is applied, the vibration unit 1609 is bent. In this way, if the arrangement of voltage polarities applied between the upper electrodes 1610 and 1610 and the lower electrodes 1611 and 1611 is changed to a predetermined frequency, the vibration unit 1609 vibrates and consequently the pixel unit fixed thereto. 1605 also vibrates.

Similar to the vibration by the vibrator shown in Figs. 14A and 14B, one pixel unit can perform scanning of two or more pixels by vibration of the pixel unit.

In the embodiment of the present invention, instead of the pixel unit 1605 composed of the above-described piezoelectric / electric distortion diffractive optical modulator, the electrostatically driven optical modulator in which the actuating cell is driven by the constant power according to the applied voltage or the applied voltage is applied. A magnetically driven optical modulator may be used in which the actuating cell is driven by the magnetic force.

FIG. 17A shows a cross-sectional view of a vibrating diffraction light modulator array 1600 for each pixel unit vibrating by electrostatic driving as another embodiment according to the present invention, and FIG. 17B shows a cross-sectional side view of FIG. 17A.

The vibration diffraction type optical modulator according to the present embodiment includes a plurality of pixel units 1705 formed on the substrate 1712, as shown in FIG. 17A.

Each pixel unit 1705 is composed of a plurality of actuating cells 1704, and the actuating cells 1704 each include an upper electrode layer 1701, a lower electrode layer 1702, and an applied voltage for applying a voltage. It consists of a piezoelectric material layer 1702 that contracts or expands in accordance with, and is driven up and down by a driving power source applied from the outside. The upper electrode layer 1701 also serves as a micromirror that reflects light while applying a voltage.

A piezoelectric / electric distortion element 1707 is disposed in the vibration unit 1709, and an electrode 1706 for applying a voltage is zigzag in the piezoelectric / electric distortion element 1707. When a voltage is applied to the electrode 1706, the piezoelectric / electric warp element 1707 increases or decreases according to the applied voltage. However, since the degree of contraction or expansion is different between the place where a strong voltage is applied and the place where a strong voltage is not applied, the sub-substrate 1708. Bends up and down. In this way, when the voltage is applied to the electrode 1714 at a predetermined frequency and then the cycle is repeated, the vibration unit 1709 vibrates at a predetermined frequency, and the pixel unit 1705 fixed thereto also vibrates together.

According to the vibration type diffraction optical modulator for each pixel unit of the present invention, the number of pixel units required for scanning can be significantly reduced.

1 illustrates a prior art electrostatic grating light modulator.

2 is a diagram illustrating reflecting incident light in a state where the electrostatic grating light modulator of the prior art is not deformed.

3 shows a diffraction of incident light in a state in which a prior art grating light modulator is deformed by electrostatic force.

4 is a side view of a column-type electrostatic diffraction grating light valve according to a conventionally improved technique.

5 is a plan view of a portion of a Grating Light Velve (GLV) comprising six elongated elements corresponding to a single display element in accordance with the prior art.

FIG. 6 is a front view of a display element of a GLV including six elongated elements that reflect incident light in an undeformed state according to the prior art.

FIG. 7 is a front view of a display element of a GLV having six elongated elements that diffract incident light in a state deformed by an electrostatic force according to a conventionally improved technique.

8A-8C are side views of diffractive thin film piezoelectric micromirrors with various types of depressions with undeformed piezoelectric materials in accordance with one embodiment of the prior art.

9A-9C are side views of a diffractive thin film piezoelectric micromirror with various types of depressions having a piezoelectric material after deformation according to one embodiment of the prior art.

10A and 10B are front views of a display element in which diffractive thin film piezoelectric micromirrors having depressions are alternately arranged in the same or different dimensions, and FIG. 10C shows a diffractive thin film piezoelectric micromirror having depressions having a predetermined width. Front view of the placed display element.

11A-11C are side views of diffractive thin film piezoelectric micromirrors with various types of leads having unmodified piezoelectric materials.

12A-12C are side views of a diffractive thin film piezoelectric micromirror with various types of leads having a piezoelectric material after being deformed.

13A and 13B are front views of a display element in which diffractive thin film piezoelectric micromirrors having a leading portion are alternately arranged with the same or different widths, and FIG. 13C shows a diffractive thin film piezoelectric micromirror having leading portions having a predetermined width. View of an isolated display element.

Fig. 14A shows a cross section of a thin film type vibration diffraction light modulator array according to the present invention, and Fig. 14B shows an operation of a thin film type vibration diffraction light modulator array according to the present invention.

15A and 15B show a scanning operation by the oscillating diffractive light modulator of the present invention.

Fig. 16A shows a cross-sectional view of a vibrating diffraction light modulator array 1600 for each pixel unit vibrating by electrostatic driving as another embodiment according to the present invention, and Fig. 16B shows a side cross-sectional view of Fig. 16A.

FIG. 17A shows a cross-sectional view of a vibrating diffraction light modulator array 1600 for each pixel unit vibrating by electrostatic driving as another embodiment according to the present invention, and FIG. 17B shows a cross-sectional side view of FIG. 17A.

Description of the main parts of the drawing

1400, 1600, 1700: Optical modulator 1401, 1601, 1701: Upper electrode

1402,1602,1702: Piezoelectric material layer 1403,1603,1703: Lower electrode

1404: Actuating Cell 1405: Micromirror Pixel Unit

1406: piezoelectric element 1407: invariant element

1408: insulating layer 1409: vibration unit

1410: substrate 1411: + first order diffracted light

1412: 0th order diffraction and 1413: -1st order diffracted light

1414: Sub-substrate 1415,1416: Pixel

Claims (5)

A plurality of micromirror pixel units diffracting the incident light according to the applied voltage and transferring the incident light to a subject; A sub substrate supporting the plurality of micromirror pixel units; A plurality of vibration units for vibrating the micromirror pixel unit at a predetermined frequency according to a voltage applied to the sub-substrate; And And a substrate for supporting the plurality of vibration units. The method of claim 1, Each of the plurality of vibration units, And a piezoelectric vibrator, one end of which is fixed to the micro pixel unit and the other end of which is fixed to the substrate, and which is vibrated at a predetermined frequency when a voltage is applied thereto. The method of claim 2, The piezoelectric vibrator includes an invariant element and a piezoelectric element, and the voltage is applied to the piezoelectric element at a predetermined cycle and is characterized in that the vibration-controlled optical modulator. The method of claim 1, Each of the plurality of vibration units, support fixture; And Further comprising a plurality of upper electrode and lower electrode pairs attached to the side of the support and spaced by a predetermined interval, And a polarity of a voltage applied at a predetermined frequency to the upper electrode and the lower electrode pairs. The method of claim 1, Each of the plurality of vibration units, Piezoelectric / electric distortion layer; And And a plurality of electrodes for applying a voltage to the piezoelectric / electric distortion layer.