KR20030024156A - 급격한 금속-절연체 상전이를 이용한 전계 효과 트랜지스터 - Google Patents
급격한 금속-절연체 상전이를 이용한 전계 효과 트랜지스터 Download PDFInfo
- Publication number
- KR20030024156A KR20030024156A KR1020010057176A KR20010057176A KR20030024156A KR 20030024156 A KR20030024156 A KR 20030024156A KR 1020010057176 A KR1020010057176 A KR 1020010057176A KR 20010057176 A KR20010057176 A KR 20010057176A KR 20030024156 A KR20030024156 A KR 20030024156A
- Authority
- KR
- South Korea
- Prior art keywords
- insulator
- mort
- field effect
- effect transistor
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N99/00—Subject matter not provided for in other groups of this subclass
- H10N99/03—Devices using Mott metal-insulator transition, e.g. field-effect transistor-like devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
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- Thin Film Transistor (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
Claims (5)
- 기판;상기 기판 상에 배치되어 충전 홀이 유입시 급격한 금속-절연체 상전이를 발생시키는 모트 절연체;상기 모트 절연체 위에 배치되어 일정 전압 인가시 상기 충전 홀을 상기 모트 절연체에 유입시키는 강유전체막;상기 강유전체막 위에 배치되어 상기 강유전체막에 일정 전압을 인가하기 위한 게이트 전극;상기 모트 절연체의 제1 표면과 전기적으로 연결되도록 형성된 소스 전극; 및상기 모트 절연체의 제2 표면과 전기적으로 연결되도록 형성된 드레인 전극을 구비하는 것을 특징으로 하는 전계 효과 트랜지스터.
- 제1항에 있어서,상기 기판은 SrTiO3기판인 것을 특징으로 하는 전계 효과 트랜지스터.
- 제1항에 있어서,상기 모트 절연체는, LaTiO3, YTiO3또는 h-BaTiO3물질로 이루어진 것을 특징으로 하는 전계 효과 트랜지스터.
- 제1항에 있어서,상기 강유전체막은 Ba1-xSrxTiO3물질로 이루어진 것을 특징으로 하는 전계 효과 트랜지스터.
- 제1항에 있어서,상기 소스 전극과 상기 드레인 전극은 상기 강유전체막에 의해 상호 분리되는 것을 특징으로 하는 전계 효과 트랜지스터.
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2001-0057176A KR100433623B1 (ko) | 2001-09-17 | 2001-09-17 | 급격한 금속-절연체 상전이를 이용한 전계 효과 트랜지스터 |
| US10/188,522 US6624463B2 (en) | 2001-09-17 | 2002-07-02 | Switching field effect transistor using abrupt metal-insulator transition |
| JP2002197871A JP3917025B2 (ja) | 2001-09-17 | 2002-07-05 | モット−ブリンクマン−ライス−キム(mbrk)電界効果トランジスタ |
| TW091115081A TW565934B (en) | 2001-09-17 | 2002-07-08 | Switching field effect transistor using abrupt metal-insulator transition |
| US11/234,816 USRE42530E1 (en) | 2001-09-17 | 2005-09-23 | Device using a metal-insulator transition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2001-0057176A KR100433623B1 (ko) | 2001-09-17 | 2001-09-17 | 급격한 금속-절연체 상전이를 이용한 전계 효과 트랜지스터 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20030024156A true KR20030024156A (ko) | 2003-03-26 |
| KR100433623B1 KR100433623B1 (ko) | 2004-05-31 |
Family
ID=19714341
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR10-2001-0057176A Expired - Fee Related KR100433623B1 (ko) | 2001-09-17 | 2001-09-17 | 급격한 금속-절연체 상전이를 이용한 전계 효과 트랜지스터 |
Country Status (4)
| Country | Link |
|---|---|
| US (2) | US6624463B2 (ko) |
| JP (1) | JP3917025B2 (ko) |
| KR (1) | KR100433623B1 (ko) |
| TW (1) | TW565934B (ko) |
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005041308A1 (en) * | 2003-10-23 | 2005-05-06 | Electronics And Telecommunications Research Institute | Metal-insulator transition switching transistor and method for manufacturing the same |
| WO2006062317A1 (en) * | 2004-12-08 | 2006-06-15 | Electronics And Telecommunications Research Institute | Device using abrupt metal-insulator transition layer and method of fabricating the device |
| KR100609699B1 (ko) * | 2004-07-15 | 2006-08-08 | 한국전자통신연구원 | 급격한 금속-절연체 전이 반도체 물질을 이용한 2단자반도체 소자 및 그 제조 방법 |
| KR100682926B1 (ko) * | 2005-01-31 | 2007-02-15 | 삼성전자주식회사 | 저항체를 이용한 비휘발성 메모리 소자 및 그 제조방법 |
| KR100702033B1 (ko) * | 2006-04-25 | 2007-03-30 | 삼성전자주식회사 | 모트 패턴을 갖는 모스 전계효과 트랜지스터 |
| KR100714115B1 (ko) * | 2005-07-29 | 2007-05-02 | 한국전자통신연구원 | 급격한 mit 소자, 그 소자를 이용한 고전압 잡음제거회로 및 그 제거회로를 포함한 전기전자시스템 |
| KR100734882B1 (ko) * | 2005-07-28 | 2007-07-03 | 한국전자통신연구원 | 급격한 금속-절연체 전이를 하는 웨이퍼, 그 열처리 장치및 이를 이용한 열처리 방법 |
| KR100745354B1 (ko) * | 2004-08-24 | 2007-08-02 | 주식회사 엘지화학 | 이차전지의 과충전 방지를 위한 안전 소자 및 그 안전소자가 결합된 이차전지 |
| KR100959982B1 (ko) * | 2004-05-19 | 2010-05-27 | 주식회사 엘지화학 | 전지용 안전 소자 및 이를 구비한 전지 |
| US7791376B2 (en) | 2006-11-02 | 2010-09-07 | Electronics And Telecommunications Research Institute | Logic circuit using metal-insulator transition (MIT) device |
| WO2013066006A1 (ko) * | 2011-10-31 | 2013-05-10 | 한국전자통신연구원 | 금속-절연체 전이 3 단자 소자와 그를 구비한 전기 전자 시스템 및 그에 따른 정전기 잡음 신호 제거 방법 |
| US9595673B2 (en) | 2011-10-31 | 2017-03-14 | Electronics And Telecommunications Research Institute | Method for removing electro-static discharge (EDS) noise signal in electronic system including the metal-insulator transition (MIT) 3-terminal device |
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| KR100513719B1 (ko) | 2002-08-12 | 2005-09-07 | 삼성전자주식회사 | 하프늄 산화막 형성용 전구체 및 상기 전구체를 이용한하프늄 산화막의 형성방법 |
| KR100503421B1 (ko) * | 2003-05-20 | 2005-07-22 | 한국전자통신연구원 | 채널 재료로서 절연체-반도체 상전이 물질막을 이용한전계 효과 트랜지스터 및 그 제조 방법 |
| KR100467330B1 (ko) * | 2003-06-03 | 2005-01-24 | 한국전자통신연구원 | 절연체 바나듐 산화막을 채널 영역으로 이용한 전계 효과트랜지스터 및 그 제조 방법 |
| KR100576704B1 (ko) * | 2003-11-06 | 2006-05-03 | 한국전자통신연구원 | 급격한 금속-절연체 상전이형 소자를 포함하는 전류제어회로 |
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| KR100714125B1 (ko) * | 2005-03-18 | 2007-05-02 | 한국전자통신연구원 | 급격한 mit 소자를 이용한 저전압 잡음 방지회로 및 그회로를 포함한 전기전자시스템 |
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| EP1911137A4 (en) * | 2005-07-29 | 2011-02-02 | Korea Electronics Telecomm | DEVICE WITH ABRUPTED METAL-ISOLATOR TRANSFER, CIRCUIT FOR REMOVING HIGH VOLTAGE NOISE WITH UNIT WITH METAL-ISOLATOR TRANSFER AND ELECTRICAL AND / OR ELECTRONIC SYSTEM WITH SWITCHING |
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- 2001-09-17 KR KR10-2001-0057176A patent/KR100433623B1/ko not_active Expired - Fee Related
-
2002
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- 2002-07-05 JP JP2002197871A patent/JP3917025B2/ja not_active Expired - Fee Related
- 2002-07-08 TW TW091115081A patent/TW565934B/zh not_active IP Right Cessation
-
2005
- 2005-09-23 US US11/234,816 patent/USRE42530E1/en not_active Expired - Fee Related
Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7408217B2 (en) | 2003-10-23 | 2008-08-05 | Electronics And Telecommunications Research Institute | Metal-insulator transition switching transistor and method for manufacturing the same |
| WO2005041308A1 (en) * | 2003-10-23 | 2005-05-06 | Electronics And Telecommunications Research Institute | Metal-insulator transition switching transistor and method for manufacturing the same |
| KR101121282B1 (ko) * | 2004-05-19 | 2012-03-23 | 주식회사 엘지화학 | 전지용 안전 소자 및 이를 구비한 전지 |
| KR100959982B1 (ko) * | 2004-05-19 | 2010-05-27 | 주식회사 엘지화학 | 전지용 안전 소자 및 이를 구비한 전지 |
| KR100609699B1 (ko) * | 2004-07-15 | 2006-08-08 | 한국전자통신연구원 | 급격한 금속-절연체 전이 반도체 물질을 이용한 2단자반도체 소자 및 그 제조 방법 |
| KR100745354B1 (ko) * | 2004-08-24 | 2007-08-02 | 주식회사 엘지화학 | 이차전지의 과충전 방지를 위한 안전 소자 및 그 안전소자가 결합된 이차전지 |
| WO2006062317A1 (en) * | 2004-12-08 | 2006-06-15 | Electronics And Telecommunications Research Institute | Device using abrupt metal-insulator transition layer and method of fabricating the device |
| US7767501B2 (en) | 2004-12-08 | 2010-08-03 | Electronics And Telecommunications Research Institute | Devices using abrupt metal-insulator transition layer and method of fabricating the device |
| KR100682926B1 (ko) * | 2005-01-31 | 2007-02-15 | 삼성전자주식회사 | 저항체를 이용한 비휘발성 메모리 소자 및 그 제조방법 |
| KR100734882B1 (ko) * | 2005-07-28 | 2007-07-03 | 한국전자통신연구원 | 급격한 금속-절연체 전이를 하는 웨이퍼, 그 열처리 장치및 이를 이용한 열처리 방법 |
| KR100714115B1 (ko) * | 2005-07-29 | 2007-05-02 | 한국전자통신연구원 | 급격한 mit 소자, 그 소자를 이용한 고전압 잡음제거회로 및 그 제거회로를 포함한 전기전자시스템 |
| KR100702033B1 (ko) * | 2006-04-25 | 2007-03-30 | 삼성전자주식회사 | 모트 패턴을 갖는 모스 전계효과 트랜지스터 |
| US7791376B2 (en) | 2006-11-02 | 2010-09-07 | Electronics And Telecommunications Research Institute | Logic circuit using metal-insulator transition (MIT) device |
| WO2013066006A1 (ko) * | 2011-10-31 | 2013-05-10 | 한국전자통신연구원 | 금속-절연체 전이 3 단자 소자와 그를 구비한 전기 전자 시스템 및 그에 따른 정전기 잡음 신호 제거 방법 |
| US9595673B2 (en) | 2011-10-31 | 2017-03-14 | Electronics And Telecommunications Research Institute | Method for removing electro-static discharge (EDS) noise signal in electronic system including the metal-insulator transition (MIT) 3-terminal device |
Also Published As
| Publication number | Publication date |
|---|---|
| KR100433623B1 (ko) | 2004-05-31 |
| JP3917025B2 (ja) | 2007-05-23 |
| TW565934B (en) | 2003-12-11 |
| US20030054615A1 (en) | 2003-03-20 |
| JP2003101018A (ja) | 2003-04-04 |
| USRE42530E1 (en) | 2011-07-12 |
| US6624463B2 (en) | 2003-09-23 |
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