KR102819507B1 - Measuring device for monitoring gaseous material using selective operation of multiple valves - Google Patents

Abstract

A measuring system capable of measuring components of a gas mixture including a gaseous substance includes a sampling unit selectively connected to a pipe through which the gas mixture passes and samples the gas mixture from the pipe, a detection unit which separates and detects gaseous substances included in the gas mixture sampled by the sampling unit by component, and a valve assembly having a plurality of valves which selectively connect the sampling unit to the pipe or the detection unit. The plurality of valves cooperate to selectively perform a sampling connection operation for connecting the pipe and the sampling unit, a sampling blocking operation for blocking the communication between the pipe and the sampling unit, and a gas delivery operation for forming a flow path so that a carrier gas flows together with the gas mixture.

Description

{Measuring device for monitoring gaseous material using selective operation of multiple valves}

The present invention relates to a measuring system, and more particularly, to a measuring system capable of measuring the components of a gas mixture including a gaseous substance flowing through a pipe.

In the semiconductor manufacturing process, cleaning and etching processes that treat the surface of semiconductor components such as wafers are very important in securing product yield and precision. Generally, plasma, UV, and ozone are used to perform cleaning and etching processes for semiconductor components.

In order to check the condition of the wafer to see if this process has been completed properly, there are cases where the surface components are analyzed using expensive (hundreds of millions to tens of millions) ToF (Time of Flight)-SIMS (Secondary Ion Mass Spectroscopy), which is a wafer surface component analysis equipment, after the process is completed.

TOF-SIMS is a method that obtains chemical components and surface structures by analyzing positive or negative ions released when striking a surface with primary ions, and has a wide detection range and excellent precision, but the price of the device for utilizing this method is expensive and it is not miniaturized, so there are limits to detection in the field. In addition, in order to utilize TOF-SIMS, inspection must be performed on semiconductor components after the semiconductor component process is completed, so real-time monitoring is not possible.

Therefore, it is impossible to monitor the progress of the actual process in real time and perform customized optimal process control.

As a device for monitoring the process status in real time during the semiconductor process, an RGA (Residual Gas Analyzer) is sometimes used. However, RGA is also very expensive, cannot analyze gas mixtures, and has the disadvantage of being limited to high-vacuum chambers. RGA is only partially utilized in the deposition process.

Thus, in the past, during the main process of the semiconductor processing process, such as the etching or cleaning process, there was no device that could measure in real time (in-situ) whether there was residual material on the surface of the semiconductor component, the control status of the gaseous substance used in the process, and whether there was a leak, due to technical and price issues.

In a series of processes such as semiconductor processes that require real-time analysis of gaseous substances, the development of a measurement system that can easily and appropriately measure the components of the gas mixture generated as a result of the process is required.

Patent registration No. 10-0187612

The purpose of this specification is to provide a measuring system capable of measuring components by directly sampling a gas mixture containing gaseous substances generated through a series of processes from a pipe.

In order to achieve the above object, according to one aspect of the present invention, there is provided a measuring system capable of measuring a component of a gas mixture including a gaseous substance, the measuring system comprising: a sampling unit selectively connected to a pipe through which the gas mixture passes to sample the gas mixture from the pipe; a detection unit separating and detecting, by component, a gaseous substance included in the gas mixture sampled by the sampling unit; and a valve assembly having a plurality of valves for selectively connecting the sampling unit to the pipe or the detection unit, wherein the plurality of valves cooperate to selectively perform a sampling connection operation for connecting the pipe and the sampling unit, a sampling blocking operation for blocking the communication between the pipe and the sampling unit, and a gas delivery operation for forming a flow path so that a carrier gas flows together with the gas mixture.

In one embodiment, the sampling connection operation, the sampling blocking operation and the gas delivery operation are performed sequentially.

According to one embodiment, a measuring system characterized in that a flow path is formed through which a carrier gas flows through the sampling unit to the detection unit by the gas transfer operation.

According to one embodiment, when the sampling connection is operated, a fluid flow path is formed that leads directly from the carrier gas tank to the detection unit, and a fluid flow path is formed that leads from the pipe through the sampling unit and back to the pipe, and when the gas delivery operation is operated, a fluid flow path is formed that leads from the carrier gas tank through the sampling unit and back to the detection unit.

According to one embodiment, the sampling blocking operation includes a sampling route sealing operation for confining and trapping the gas mixture in the sampling section, and a pressure reducing operation for reducing the pressure of the gas mixture trapped in the sampling section.

According to one embodiment, the detection unit includes a pressure reducing chamber for reducing the pressure of the gas mixture, and the gas mixture is introduced into the pressure reducing chamber through the pressure reducing operation to reduce the pressure, and the gas delivery operation is performed after reducing the pressure of the gas mixture.

In one embodiment, the plurality of valves include a plurality of multi-port valves each having a plurality of ports, and the plurality of multi-port valves are selectively operated so that the sampling connection operation, the sampling cut-off operation and the gas delivery operation are selectively performed.

According to one embodiment, the plurality of multi-port valves include first to third three-way valves each having three ports, wherein a first port of the first three-way valve is connected to the pipe, a second port is connected to one end of the first connecting pipe, and a third port is connected to the pipe, a first port of the second three-way valve is connected to an inlet of the sampling section, a second port is connected to the other end of the first connecting pipe, and a third port is connected to one end of the second connecting pipe, a first port of the third three-way valve is connected to an outlet of the sampling section, a second port is connected to the pipe, and a third port is connected to one end of the third connecting pipe, and by operation of the first three-way valve, the sampling section and the pipe are connected or blocked.

According to one embodiment, the plurality of multi-port valves include fourth and fifth three-way valves each having three ports, a first port of the fourth three-way valve is connected to a carrier gas inlet pipe communicating with a carrier gas tank, a second port is connected to the other end of the second connecting pipe, a third port is connected to one end of the fourth connecting pipe, a first port of the fifth three-way valve is connected to a detection unit inlet pipe communicating with the detection unit, a second port is connected to the other end of the fourth connecting pipe, and a third port is connected to the other end of the third connecting pipe, and the first to fifth three-way valves are selectively operated to switch the path of the fluid, whereby the sampling connection operation, the sampling cutoff operation, and the gas delivery operation are selectively performed.

According to one embodiment, the sampling blocking operation includes a sampling route sealing operation for confining and trapping the gas mixture in the sampling section, and a pressure reducing operation for causing the gas mixture trapped in the sampling section to flow into the pressure reducing chamber to reduce the pressure, wherein during the sampling route sealing operation, the first three-way valve and the third three-way valve operate simultaneously to switch the path of the fluid, and during the pressure reducing operation, the fifth three-way valve operates to switch the path of the fluid.

In one embodiment, during the gas transfer operation, the second three-way valve and the fourth three-way valve operate simultaneously to change the path of the fluid.

Figure 1 is a schematic system diagram of a measurement system according to one embodiment.
Figure 2 is a schematic diagram of a valve assembly according to Example 1.
Figure 3 is a schematic diagram illustrating the arrangement of each valve of the valve assembly of Figure 2 in three dimensions.
Figures 4 and 5 illustrate the state of the valve assembly of Figures 2 and 3 during sampling connection operation.
Figures 6 and 7 illustrate the state of the valve assembly of Figures 2 and 3 during the sampling route sealing operation in the sampling blocking operation.
Figures 8 and 9 illustrate the state of the valve assembly of Figures 2 and 3 during pressure relief operation in the sampling blocking operation.
Figures 10 and 11 illustrate the state of the valve assembly of Figures 2 and 3 during gas delivery operation.
Figure 12 is a schematic system diagram of a measurement system according to a modified example of Example 1.
Figure 13 is a schematic diagram of a valve assembly according to a modified example of Example 1.
FIG. 14 and FIG. 15 are schematic diagrams of a valve assembly according to Example 2, FIG. 14 showing a state during sampling connection operation, and FIG. 15 showing a state during sampling connection operation.
Figure 16 is a schematic conceptual diagram of a detection device according to one embodiment of the present invention.
Figure 17 is an enlarged view of the concentration module formed in the detection device of Figure 16.
Fig. 18 is a back view of the substrate coupled to the detection device of Fig. 16.
Figure 19 schematically illustrates the interior of a separation module formed in the detection device of Figure 16.
Figure 20 is a simplified diagram illustrating a process of separating and detecting a gaseous substance using the detection device of Figure 16.
Fig. 21 is a graph showing the detection results detected through a measuring system according to an embodiment.

Hereinafter, preferred embodiments of the present invention will be described with reference to the attached drawings. Although the present invention has been described with reference to the embodiments shown in the drawings, this is described as one embodiment, and the technical idea of the present invention and its core configuration and operation are not limited thereby.

As used herein, “upstream” means the side from which fluid flows in a path, and “downstream” means the side opposite to upstream.

Figure 1 is a schematic system diagram of a measurement system (10) according to one embodiment of the present invention.

The measuring system (10) according to the present embodiment is a measuring system capable of detecting a process state for a part in a processing device that processes a part in a chamber to generate a gas mixture (6) containing a gaseous substance (60).

<Processing device (1)>

The processing device (1) according to the present embodiment is a semiconductor processing device that performs a plasma cleaning treatment process for cleaning a wafer (3), which is a semiconductor component, through a plasma generator (electrode) (2) in a vacuum chamber (9).

When the plasma cleaning treatment process starts, cleaning gas (8) (e.g., O ₂ ) is introduced into the vacuum chamber (9) from an external cleaning gas tank (5).

The cleaning gas (8) ionized by the plasma generated by the plasma generator (2) reacts with compounds on the surface of the wafer (3), generating a gaseous substance (60) that is an organic compound of various components.

A gas mixture (6) containing a gaseous substance (60) is discharged to the outside through a pipe (20) connected to the chamber (9). A pump (4) is connected on the downstream side of the pipe (20) to form a vacuum within the chamber (9) and provide pressure for discharging the gas mixture (6).

The configuration of a semiconductor processing device for performing a plasma cleaning treatment process is known, and a more detailed description thereof is omitted here.

<Measurement System (10)>

The measuring system (10) according to the present embodiment is configured to analyze a gas mixture (6) discharged from a processing device (1) and detect a gaseous substance (60) included in the gas mixture (6) in substantially real time.

Referring to FIG. 1, the measuring system (10) includes a sampling unit (11) that is selectively connected to a pipe (20) of a processing device (1) and samples a gas mixture (6) from the pipe (20) for a predetermined time or volume, and a detection unit (12) that separates and detects a gaseous substance (60) included in the gas mixture (6) sampled by the sampling unit (11). In addition, the measuring system (10) includes a valve assembly (500) that selectively connects the sampling unit (11) to the pipe (20) or the detection unit (12).

The sampling unit (11) according to the present embodiment includes an inlet (101) through which a gas mixture (6) flows in, an outlet (102) through which the gas mixture (6) flows out, and a sampler module (103) arranged between the inlet (101) and the outlet (102).

The inlet (101) and outlet (102) have a long pipe shape, and the sampler module (103) has a shape formed by twisting the pipe shape into a spiral shape.

Here, the sampler module (103) can be replaced with another form, so it is described separately from the inlet (101) and the outlet (102) for convenience, but the sampling section (11) according to this embodiment is formed by twisting the middle section of a single pipe in a spiral shape.

By forming the sampler module (103) in a spiral shape, the volume of the gas mixture (6) sampled in the sampling section (11) can be increased.

The sampling section (11) according to this embodiment is in the form of a conduit with both ends open, and while the sampling section (11) is connected to the pipe (20), the gas mixture (6) continues to flow inside the conduit. That is, the inside of the sampling section (11) is always filled with the same volume of gas mixture (6).

Therefore, when the communication between the sampling section (11) and the pipe (20) is blocked, the same volume of gas mixture (6) is always sampled inside the sampling section (11) regardless of the time.

As shown in Fig. 1, the pipe (20) is formed with an upstream connecting pipe (31) and a downstream connecting pipe (32) branching from the pipe (20). According to the present embodiment, the diameters of the upstream connecting pipe (31) and the downstream connecting pipe (32) are substantially the same as the diameter of the sampling section (11).

The sampling section (11) is selectively connected to the upstream connection pipe (31) and the downstream connection pipe (32) by the valve assembly (500) and is selectively connected to the pipe (20).

According to the present embodiment, the upstream connection pipe (31) and the downstream connection pipe (32) are connected to the pipe (20) between the chamber (9) and the pump (4). That is, the sampling section (11) is connected to the pipe (20) on the upstream side of the pump (4).

Accordingly, it is possible to prevent the gas mixture (6) being sampled from being contaminated by oil components discharged from the pump (4). In addition, by exchanging the pipe (20) between the chamber (9) and the pump (4), which is relatively easy to change in structure, into a form in which the upstream connection pipe (31) and the downstream connection pipe (32) are connected, the measuring system (10) can be easily applied to the existing processing device (1).

The valve assembly (500) according to the present embodiment comprises a plurality of valves and a connecting pipe connecting them. In Fig. 1, the valve assembly (500) is simply illustrated in the shape of a square block for convenience of illustration, and the specific configuration of the assembly is described in detail later.

According to the present embodiment, a plurality of valves of the valve assembly (500) cooperate to selectively perform a sampling connection operation that connects the pipe (20) and the sampling section (11), and a sampling blocking operation that blocks the communication between the pipe (20) and the sampling section (11).

The valve assembly (500) is connected to the upstream connection pipe (31) and the downstream connection pipe (32), and, as necessary, forms a flow path in which the gas mixture (6) flowing through the pipe (20) passes through the valve assembly (500) and returns to the pipe (20).

Additionally, the valve assembly (500) is connected to the inlet (101) of the sampling unit (11) and to the outlet (102) of the sampling unit (11).

In addition, the valve assembly (500) is connected to a carrier gas inlet pipe (51) connected to a carrier gas tank (70) and to a detection unit inlet pipe (52) leading to a detection unit (12).

The detection unit (12) according to the present embodiment includes a decompression chamber (600) that stores a gas mixture (6) sampled in a sampling unit (11) and reduces the pressure of the gas mixture (6), a concentration module (200) that filters and concentrates a gaseous substance (60) included in the gas mixture (6) reduced in the decompression chamber (600), a separation module (300) that separates the gaseous substance (60) concentrated in the concentration module (20) by component, and a sensor module (400) that detects a gaseous substance (60) flowing out from the separation module (300). The decompression chamber (600), the concentration module (200), the separation module (300), and the sensor module (400) are connected to each other by conduits (52, 53, 54). Each module of the detection unit (12) will be described in more detail later.

<Operation of the measurement system (10)>

First, referring to Fig. 1, the operation of the measuring system (10) for measuring a gaseous substance (60) will be described.

As illustrated in Fig. 1, when the plasma cleaning treatment process is started by the treatment device (1), the valve assembly (500) performs a sampling connection operation to sample the gas mixture (6) by the sampling unit (11).

More specifically, when the sampling connection is in operation, the valve assembly (50) operates to form a fluid flow path that leads directly from the carrier gas tank (70) to the detection unit (12), and a fluid flow path that goes from the pipe (20) through the sampling unit (11) and back to the pipe (20).

According to the present embodiment, during the sampling connection operation (other than during the gas transfer operation described later), a fluid flow path is formed directly from the carrier gas tank (70) to the detection unit (12) (i.e., the carrier gas tank (70) and the detection unit (12) are connected), so that the carrier gas (e.g., N ₂ or H ₂ ) (7) flows from the carrier gas tank (70) toward the detection unit (12). Accordingly, the detection unit (12) is maintained in a clean atmosphere that is not contaminated by the outside air by the carrier gas (7). Carrier gases such as helium have very low reactivity with porous polymers or organic compounds described later.

After a predetermined period of time, the valve assembly (500) performs a sampling blocking operation to block further sampling.

When the sampling blocking operation is performed, the valve assembly (500) blocks the communication between the sampling section (11) and the pipe (20), so that a gas mixture (6) of the volume determined by the sampling section (11) is trapped inside the sampling section (11). In this embodiment, when the sampling connection operation is performed, a fluid flow path directly from the carrier gas tank to the detection section and a fluid flow path from the pipe through the sampling section and back to the pipe are formed.

Additionally, the valve assembly (500) performs a gas delivery operation after the sampling blocking operation or simultaneously with the sampling blocking operation.

The gas transfer operation forms a flow path that allows the carrier gas to flow together with the gas mixture (6) at least in the analysis unit (12). In this embodiment, during the gas transfer operation, a flow path of fluid is formed from the carrier gas tank (70) through the sampling unit (11) to the detection unit (12).

Meanwhile, during the sampling blocking operation, the valve assembly (500) forms a fluid flow path that allows a portion of the gas mixture (6) flowing through the pipe (20) to flow back into the pipe (20) through the upstream connection pipe (31), the valve assembly (500), and the downstream connection pipe (32).

According to the present embodiment, since the diameters of the bypass pipe (31) and the sampling section (11) are substantially the same, even if the sampling connection operation state is instantaneously switched to the sampling blocking operation state, the amount of gas mixture (6) that escapes from the pipe (20) to the upstream connection pipe (31) remains almost unchanged.

If the bypass path is suddenly blocked while a certain amount of gas mixture (6) is being bypassed and discharged from the pipe (20), a pressure shock may occur inside the pipe (20). This pressure shock may have adverse effects on the pump (4) or the treatment device (1), etc.

According to the present embodiment, even if the sampling connection operation state is instantaneously switched to the sampling blocking operation state, the gas mixture (6) is still maintained in a state of bypassing a certain amount from the pipe (20) through the flow path through the upstream connection pipe (31), the valve assembly (500), and the downstream connection pipe (32), so that sudden pressure fluctuations can be suppressed.

In addition, since the operation of the processing device (1) does not have to be stopped during the entire process of sampling the gas mixture (6), the yield of semiconductor components can be increased.

During gas transfer operation, the gas mixture (6) sampled in the sampling section (11) may be flowed to the detection section (12) by a separate pump (not shown) installed downstream of the detection section (12). However, according to the present embodiment, during gas transfer operation, the inlet section (101) of the sampling section (11) is connected to the carrier gas tank (70) by the valve assembly (500). The sampled gas mixture (6) flows to the detection section (12) together with the carrier gas (7) discharged from the carrier gas tank (70).

The gas mixture (6) flows into the concentration module (200), and the gaseous substance (60) contained in the gas mixture (6) is caught by the concentration module (200) and concentrated and stored in the concentration module (200).

Thereafter, when energy such as heat is applied to the concentration module (200), the gaseous substance (60) is discharged from the concentration module (200), and the gaseous substance (60) is carried by the carrier gas (7) and flows to the separation module (300). The separation module (300) separates the gaseous substance (60) into its components and discharges them.

After that, the gaseous substance (60) discharged from the separation module (300) flows to the sensor module (400) while being carried by a carrier gas (7) at a constant speed. The sensor module (400) detects the gaseous substance (60) that has reached it.

<Valve assembly (500, 500')>

Hereinafter, with reference to FIGS. 2 to 15, an embodiment of a valve assembly (500, 500') will be described in detail.

(Example 1)

FIG. 2 is a schematic diagram of a valve assembly (500) according to one embodiment, and FIG. 3 is a schematic diagram illustrating the arrangement of each valve of the valve assembly (500) of FIG. 2 in three dimensions.

As illustrated in FIGS. 2 and 3, the valve assembly (500) according to the present embodiment includes five three-way valves, each having three ports.

The first port (531) of the first three-way valve (530) is connected to the upstream connection pipe (31) and is connected to the pipe (20), the second port (532) is connected to one end of the first connection pipe (35), and the third port (533) is connected to the downstream connection pipe (32) and is connected to the pipe (20).

The first port (521) of the second three-way valve (520) is connected to the inlet (101) of the sampling section (11), the second port (522) is connected to the other end of the first connecting pipe (35) and is connected to the first three-way valve (530), and the third port (523) is connected to one end of the second connecting pipe (38).

The first port (541) of the third three-way valve (540) is connected to the outlet (102) of the sampling section (11), the second port (542) is connected to the downstream connecting pipe (32) and is connected to the pipe (20), and the third port (543) is connected to one end of the third connecting pipe (36).

The first port (511) of the fourth three-way valve (510) is connected to a carrier gas inlet pipe (51) communicating with a carrier gas tank (70), the second port (512) is connected to one end of the fourth connecting pipe (37), and the third port (513) is connected to the other end of the second connecting pipe (38) and is connected to the second three-way valve (520).

The first port (551) of the fifth three-way valve (550) is connected to the detection unit inlet pipe (52) communicating with the detection unit (12), the second port (552) is connected to the other end of the fourth connection pipe (37) and connected to the fourth three-way valve (510), and the third port (553) is connected to the other end of the third connection pipe (36) and connected to the third three-way valve (540).

As illustrated in FIG. 3, in the present embodiment, the fourth three-way valve (510) and the second three-way valve (520) are arranged in the horizontal direction (y direction), and the second three-way valve (520), the first three-way valve (530), the third three-way valve (530), and the fifth three-way valve (550) are arranged in the vertical direction (z direction) in sequence and side by side. However, the arrangement of these valves is not limited to the present embodiment. Since the valve assembly (500) according to the present embodiment is composed of a plurality of valves, the arrangement of each valve can be freely changed. Accordingly, even when the measuring system (10) is installed in the pipe (20) of the existing processing device (1), the valve assembly (500) can be effectively configured appropriately while avoiding various pipes or facilities around the existing processing device (1).

In addition, although the directions of the first to third ports of each three-way valve are depicted as being the same in FIG. 3, the orientation of the three-way valves can be freely determined depending on the installation space situation.

According to the present embodiment, each three-way valve of the valve assembly (500) is a manual valve that is manually operated by a lever to change the path of the fluid within the valve.

A "manual valve" is a manually operated device that changes the flow path of a fluid only when an external force is applied to the lever and the lever is operated. It is distinguished from an "automatic valve" in which an actuator inside the valve is operated by an electric signal to automatically change the flow path of the fluid.

The first three-way valve (530) has a handle-shaped lever (534) in the middle of the T-shaped body. Depending on the rotation direction of the lever (534), two flow paths are selectively formed: a flow path from the first port (531) to the second port (532) and a flow path from the first port (531) to the third port (533).

The second three-way valve (520) has a handle-shaped lever (524) in the middle of the T-shaped body. Depending on the rotation direction of the lever (524), two flow paths are selectively formed: a flow path from the first port (521) to the second port (522) and a flow path from the first port (521) to the third port (523).

The third three-way valve (540) has a handle-shaped lever (544) in the middle of the T-shaped body. Depending on the rotation direction of the lever (544), two flow paths are selectively formed: a flow path from the first port (541) to the second port (542) and a flow path from the first port (541) to the third port (543).

The fourth three-way valve (510) has a handle-shaped lever (514) in the middle of the T-shaped body. Depending on the rotation direction of the lever (514), two flow paths are selectively formed: a flow path from the first port (511) to the second port (512) and a flow path from the first port (511) to the third port (513).

The fifth three-way valve (550) has a handle-shaped lever (554) in the middle of the T-shaped body. Depending on the rotation direction of the lever (554), two flow paths are selectively formed: a flow path from the first port (551) to the second port (552) and a flow path from the first port (551) to the third port (553).

Hereinafter, the operation of the valve assembly (500) will be specifically described with reference to FIGS. 4 to 11.

Figures 4 and 5 illustrate the valve assembly (500) when the sampling connection is in operation. Figure 4 is a schematic diagram of the valve assembly (500), and Figure 5 is a schematic diagram illustrating the arrangement of each valve of the valve assembly (500) in three dimensions.

When the sampling connection is in operation, the first three-way valve (530) connects the first port (531) and the second port (532) to form a flow path from the first port (531) to the second port (532). At this time, the flow path to the third port (533) is blocked.

The second three-way valve (520) is connected to the first port (521) and the second port (522), thereby forming a flow path from the first port (521) to the second port (522). At this time, the flow path to the third port (523) is blocked.

The third three-way valve (540) is connected to the first port (541) and the second port (542), thereby forming a flow path from the first port (541) to the second port (542). At this time, the flow path to the third port (543) is blocked.

Accordingly, a portion of the gas mixture (6) flowing through the pipe (20) is introduced into the first port (531) of the first three-way valve (530) through the upstream connection pipe (31), and into the sampling unit (11) through the second three-way valve (520). The gas mixture (6) exits the sampling unit (11), flows into the third three-way valve (540), and returns to the pipe (20) through the downstream connection pipe (32).

During the sampling connection operation, the gas mixture (6) continues to flow inside the sampling section (11), so the inside of the sampling section (11) is always filled with the same volume of gas mixture (6).

Meanwhile, when the sampling connection is in operation, the fourth three-way valve (510) connects the first port (511) and the second port (512) to form a flow path from the first port (511) to the second port (512). At this time, the flow path to the third port (513) is blocked.

The fifth three-way valve (550) is connected between the first port (551) and the second port (552), thereby forming a flow path from the first port (551) to the second port (552). At this time, the flow path to the third port (553) is blocked.

Accordingly, a fluid flow path is formed leading to the carrier gas inlet pipe (51), the fourth three-way valve (510), the fifth three-way valve (550), and the detection unit inlet pipe (52), thereby forming a fluid flow path leading directly from the carrier gas tank (70) to the detection unit (12).

As described above, through the flow path of the fluid, the carrier gas (7) continues to flow from the carrier gas tank (70) toward the detection unit (12), so that the detection unit (12) is maintained in a clean atmosphere that is not contaminated by the outside air by the carrier gas (7).

In the sampling connection operation state, the levers of the first to fifth three-way valves are selectively turned by the link structure (600) so that each three-way valve operates and the path of the fluid is switched, thereby switching to the sampling blocking operation state.

According to the present embodiment, in the sampling blocking operation step, two operations of sampling route sealing operation and pressure relief operation are performed sequentially.

Figures 6 and 7 illustrate the valve assembly (500) during the sampling route sealing operation. Figure 6 is a schematic diagram of the valve assembly (500), and Figure 7 is a schematic diagram illustrating the arrangement of each valve of the valve assembly (500) in three dimensions.

According to the present embodiment, when switching to the sampling blocking operation, the sampling route sealing operation is first performed. The sampling route sealing operation is an operation to confine and trap the gas mixture (6) in the sampling section.

When the sampling route sealing is in operation, the first three-way valve (530) operates to block the second port (532) and allow the first port (531) and the third port (533) to communicate, thereby forming a flow path from the first port (531) to the third port (533).

In addition, simultaneously with the operation of the first three-way valve (530), the third three-way valve (540) is operated, thereby blocking the second port (542) and allowing the first port (541) and the third port (543) to communicate, thereby forming a flow path from the first port (541) to the third port (543).

Accordingly, the sampling section (11) and the pipe (20) are blocked from communicating with each other, and the gas mixture (6) is trapped in the sampling section (11). Specifically, the gas mixture (6) is trapped between the first three-way valve (530) and the second three-way valve (520) (the first connecting pipe (35)), between the second three-way valve (520) and the third three-way valve (540) (the sampler module (103)), and between the third three-way valve (540) and the fifth three-way valve (550) (the third connecting pipe (36)). In FIGS. 6 and 7, a portion that is trapped and has no fluid flow is indicated by a dashed line.

Meanwhile, the gas mixture (6) flowing into the upstream connecting pipe (31) returns to the pipe (20) as is through the third port (533) of the first three-way valve (530).

In addition, the flow path of the carrier gas leading to the carrier gas inlet pipe (51), the fourth three-way valve (510), the fifth three-way valve (550), and the detection unit inlet pipe (52) is maintained as is. Since the carrier gas (7) continues to flow from the carrier gas tank (70) toward the detection unit (12), the detection unit (12) is maintained in a clean atmosphere that is not contaminated by the outside air by the carrier gas (7).

After the sampling route sealing operation is performed, a pressure reducing operation is performed. The pressure reducing operation is to reduce the pressure of the gas mixture (6) trapped in the sampling section (11).

Figures 8 and 9 illustrate the valve assembly (500) during pressure relief operation. Figure 8 is a schematic diagram of the valve assembly (500), and Figure 9 is a schematic diagram illustrating the arrangement of each valve of the valve assembly (500) in three dimensions.

During pressure relief operation, the fifth three-way valve (550) operates to block the second port (552) and allow the first port (551) and the third port (553) to communicate, thereby forming a flow path from the first port (551) to the third port (553).

Accordingly, the carrier gas flow path leading to the sampling section (11) is blocked, so that the carrier gas (7) does not flow into the sampling section (11). However, the carrier gas (7) remains trapped in the fourth connecting pipe (37) inside the sampling section (11). Accordingly, when the gas transfer operation described later is switched, the flow of the carrier gas (7) can occur immediately. In FIGS. 8 and 9, a portion where the fluid is trapped and does not flow is depicted by a dashed line.

On the other hand, the gas mixture (6) trapped in the sampling section (11) flows into the detection section inlet pipe (52) due to the pressure difference and flows into the decompression chamber (600).

The decompression chamber (600) is a chamber having a larger diameter than the detection unit inlet pipe (52). As the volume of the space increases, the pressure of the gas mixture (6) is reduced within the decompression chamber (600). For example, a gas mixture (6) having a pressure of 5 bar is reduced to 2 bar in the decompression chamber (600).

According to the present embodiment, as illustrated in FIG. 1, in order to prevent the gas mixture (6) from condensing within the decompression chamber (600) due to the pressure reduction, a heater (601) capable of heating the decompression chamber (600) to a predetermined temperature is provided. The heater (601) maintains the decompression chamber (600) at a predetermined temperature (e.g., a target temperature of 100° C. or higher) or higher, thereby preventing the gas mixture (6) from being adsorbed within the chamber. The decompression chamber (600) may be made of, for example, stainless steel.

In an environment where the flowing gas mixture (6) is under high pressure (for example, 5 bar or more), if the gas mixture (6) trapped in the sampling section (11) is directly flowed into the detection section (12), the internal structure of the detection section (12) may be damaged by the pressure.

Through a pressure reducing operation that reduces the pressure of the gas mixture (6), the pressure of the gas mixture (6) can be reduced to a level that can be measured by the internal components of the detection unit (12).

After the sampling blocking operation is performed, the valve assembly (500) operates to perform a gas transfer operation to form a fluid flow path from the carrier gas tank (70) through the sampling section (11) to the detection section.

Figures 10 and 11 illustrate the valve assembly (500) during gas delivery operation. Figure 10 is a schematic diagram of the valve assembly (500), and Figure 11 is a schematic diagram illustrating the arrangement of each valve of the valve assembly (500) in three dimensions.

When the gas transfer is in operation, the second three-way valve (520) is operated to block the second port (522) and allow the first port (521) and the third port (523) to communicate, thereby forming a flow path from the first port (521) to the third port (523).

In addition, simultaneously with the operation of the second three-way valve (520), the fourth three-way valve (510) is operated, thereby blocking the second port (512) and allowing the first port (511) and the third port (513) to communicate, thereby forming a flow path from the first port (511) to the third port (513).

During gas transfer operation, since the second three-way valve (520) and the fourth three-way valve (510) are connected, a fluid flow path is formed from the carrier gas tank (70) through the sampling unit (11) to the detection unit (12). That is, according to the present embodiment, a gas transfer operation is performed so that a fluid flow path is formed from the carrier gas tank (70) through the sampling unit (11) to the detection unit (12). The gas mixture (6) flowing into the upstream connecting pipe (31) returns to the pipe (20) as is through the third port (533) of the first three-way valve (530).

The carrier gas (7) pushes out the gas mixture (6) remaining inside the sampling section (11) and at the same time provides power for the gas mixture (6) to flow inside the detection section (12).

In this embodiment, the operation of the valve assembly (500) is sequentially performed in four stages: a sampling connection operation, a sampling route sealing operation, a sampling blocking operation in which a pressure reducing operation is performed, and a gas delivery operation. However, the time for each operation to be performed is very short, so that it may be performed with almost no time difference. In addition, the operation of the next stage may be switched before the desired operation in each operation stage is completely performed. For example, even if the gas mixture (6) has not completely exited the sampling section (11) through the pressure reducing operation in which pressure reducing is performed, if the gas mixture (6) is decompressed to the desired pressure by the decompression chamber (600), the operation may be switched to the gas delivery operation immediately.

According to this embodiment, since the valve assembly (500) is composed of a plurality of valves, free arrangement of the plurality of valves is possible, so that it can be easily installed in an existing processing device (1). In addition, since it is easy to replace a valve that has failed, maintenance efforts and costs can be reduced.

On the other hand, according to the present embodiment, since a multi-port valve is applied as a plurality of valves, the use of unnecessary valves can be suppressed as much as possible.

Furthermore, according to the present embodiment, a manual three-way valve operated by a lever is applied as the valve. In general, a manual three-way valve has a higher threshold for the pressure it can handle than an automatic six-way valve. Therefore, the measuring system (10) according to the present embodiment has superior pressure resistance compared to a measuring system using one automatic six-way valve, so that it can be applied even when the pressure applied to the pipe (20) is very high.

Additionally, since the sampling route is sealed and depressurized before gas is delivered to perform analysis, the measuring system can operate effectively even in high-pressure environments.

(variant example)

In Example 1, the levers of the first to fifth three-way valves are selectively operated (operated) to reduce the pressure of the gas mixture (6), and a four-stage operation is performed. However, in an environment where it is not necessary to necessarily reduce the pressure of the gas mixture (6), this does not have to be limited.

In an environment where depressurization of the gas mixture (6) is not required, the valve operation in the valve assembly (500) illustrated in FIG. 3 may be performed differently from that in Example 1, thereby simplifying the operation steps. In addition, as illustrated in FIG. 12, in an environment where depressurization of the gas mixture (6) is not required, the depressurization chamber (600) and the heater (601) may also be omitted. In FIG. 12, except that the depressurization chamber (600) and the heater (601) are omitted, the other configurations are the same as in FIG. 1, and therefore, a duplicate description will be omitted.

Hereinafter, with reference to FIGS. 4, 5, 10, and 11, the operation of a valve assembly (500) according to a modified example in which the operation steps are simplified will be described. In other words, in this modified example, two operations, the operation of FIG. 4 (FIG. 5) and the operation of FIG. 10 (FIG. 11), are performed, and the operations corresponding to FIGS. 6 to 9 are omitted.

According to a modified example, when the valve assembly (500) switches from the sampling connection operation to the sampling blocking operation, it switches to the gas delivery operation so that a flow path of fluid is formed from the carrier gas tank (70) through the sampling section (11) to the detection section at the same time as the sampling blocking operation.

Duplicate description of the sampling connection operation described in FIGS. 4 and 5 is omitted.

According to a modified example, in the sampling connection operation state, the levers of the first to fifth three-way valves are turned simultaneously so that each three-way valve operates simultaneously and the path of the fluid is switched simultaneously, thereby switching to the sampling blocking operation state and simultaneously to the gas delivery operation state.

Referring to FIGS. 10 and 11, during the sampling blocking operation (gas delivery operation), the first three-way valve (530) operates to block the second port (532) and allow the first port (531) and the third port (533) to communicate, thereby forming a flow path from the first port (531) to the third port (533).

In addition, simultaneously with the operation of the first three-way valve (530), the second three-way valve (520) is operated, thereby blocking the second port (522) and allowing the first port (521) and the third port (523) to communicate, thereby forming a flow path from the first port (521) to the third port (523).

In addition, simultaneously with the operation of the first three-way valve (530), the third three-way valve (540) is operated, thereby blocking the second port (542) and allowing the first port (541) and the third port (543) to communicate, thereby forming a flow path from the first port (541) to the third port (543).

In addition, simultaneously with the operation of the first three-way valve (530), the fourth three-way valve (510) is operated, thereby blocking the second port (512) and allowing the first port (511) and the third port (513) to communicate, thereby forming a flow path from the first port (511) to the third port (513).

In addition, simultaneously with the operation of the first three-way valve (530), the fifth three-way valve (550) is operated, thereby blocking the second port (552) and allowing the first port (551) and the third port (553) to communicate, thereby forming a flow path from the first port (551) to the third port (553).

Accordingly, the communication between the sampling section (11) and the pipe (20) is blocked, and the gas mixture (6) is trapped in the sampling section (11).

At this time, according to the present embodiment, when the sampling blocking operation is performed, the second three-way valve (520) and the fourth three-way valve (510) are connected, and the third three-way valve (540) and the fifth three-way valve (550) are connected, so that a fluid flow path from the carrier gas tank (70) through the sampling unit (11) to the detection unit (12) is formed simultaneously with the sampling blocking operation. That is, according to the present embodiment, a gas transfer operation that forms a fluid flow path from the carrier gas tank (70) through the sampling unit (11) to the detection unit (12) is performed simultaneously with the sampling blocking operation.

The gas mixture (6) trapped inside the sampling section (11) is pushed by the carrier gas (7) discharged from the carrier gas tank (70) and flows to the detection section (12).

Meanwhile, the gas mixture (6) flowing into the upstream connecting pipe (31) returns to the pipe (20) as is through the third port (533) of the first three-way valve (530).

According to a modified example, in the sampling connection operation state, the levers of the first to fifth three-way valves are turned simultaneously so that each three-way valve operates simultaneously and the path of the fluid is switched simultaneously, thereby switching to the sampling blocking operation state.

Although means for electrical control for simultaneous operation of multiple three-way valves may be considered, according to this modified example, each of the three-way valves is operated simultaneously by the operation of the mechanical link structure (700).

Figure 13 is a schematic diagram of a valve assembly (500) according to a modified example.

As illustrated in FIG. 13, according to the present embodiment, the levers of each three-way valve are connected together to a single link structure (700). The link structure (700) has a link arm (702, 703) that rotates around a motor (701), and the link arms (702, 703) are rotatably connected to the levers of each three-way valve. According to the present embodiment, when the motor (701) rotates and the link arms (702, 703) rotate, the levers of each three-way valve connected to the link arms rotate simultaneously, thereby simultaneously switching the flow path of the fluid within each valve.

In order to explain the concept of the link structure (700), it should be understood that only a schematic structure of the link structure (700) is illustrated in FIG. 3. The configuration of the link structure (700) is not particularly limited as long as it is a form in which the levers of each three-way valve can be rotated simultaneously by a single driving means (such as a motor). In addition, the link structure (700) is not limited to a link arm structure that is rotatably connected, and may be configured using a combination of known operating means such as a rack and pinion.

According to a modified example, since each of the three-way valves is operated simultaneously by the operation of the link structure (700), the timing of operation of each valve can be uniformly matched without a complex and sophisticated control algorithm or control means. Accordingly, the ease of control of the entire system can be secured and the cost can be reduced.

However, as in Example 1, since a manual three-way valve operated by a lever is applied as the valve, the threshold value of the pressure to be handled is large. Therefore, the measuring system in this modified example can also be applied even when the pressure applied to the pipe (20) is relatively high.

(Example 2)

Figures 14 and 15 are schematic diagrams of a valve assembly (500') according to another embodiment.

As illustrated in FIGS. 14 and 15, the valve assembly (500') according to the present embodiment includes two 4-way valves (560, 570) each having four ports as multi-port valves. According to the present embodiment, the two 4-way valves (560, 570) are "automatic valves" that operate automatically under the control of a controller (not shown).

The first port (561) of the first four-way valve (560) is connected to a carrier gas inlet pipe (51) communicating with a carrier gas tank (70), the second port (562) is connected to the inlet (101) of the sampling section (11), the third port (563) is connected to an upstream connecting pipe (31) and is connected to a pipe (20), and the fourth port (564) is connected to one end of a fifth connecting pipe (39).

The first port (571) of the second four-way valve (570) is connected to the detection unit inlet pipe (52) communicating with the detection unit (12), the second port (572) is connected to the outlet (102) of the sampling unit (11), the third port (573) is connected to the downstream connection pipe (32) and is connected to the pipe (20), and the fourth port (574) is connected to the other end of the fifth connection pipe (39).

As shown in Fig. 14, when the sampling connection is in operation, the first four-way valve (560) has the second port (562) and the third port (563) connected, and the first port (561) and the fourth port (564) connected. Similarly, the second four-way valve (570) has the second port (572) and the third port (573) connected, and the first port (571) and the fourth port (574) connected.

Accordingly, a portion of the gas mixture (6) flowing through the pipe (20) is introduced into the third port (563) of the first four-way valve (560) through the upstream connection pipe (31) and into the sampling section (11) through the second port (562). The gas mixture (6) exits the sampling section (11), is introduced into the second port (572) of the second four-way valve (570), and returns to the pipe (20) through the downstream connection pipe (32) through the third port (573).

During the sampling connection operation, the gas mixture (6) continues to flow inside the sampling section (11), so the inside of the sampling section (11) is always filled with the same volume of gas mixture (6).

Meanwhile, when the sampling connection is in operation, a fluid flow path is formed leading to the carrier gas inlet pipe (51), the fourth three-way valve (510), the fifth three-way valve (550), and the detection unit inlet pipe (52), thereby forming a fluid flow path leading directly from the carrier gas tank (70) to the detection unit (12).

As described above, through the flow path of the fluid, the carrier gas (7) continues to flow from the carrier gas tank (70) toward the detection unit (12), so that the detection unit (12) is maintained in a clean atmosphere that is not contaminated by the outside air by the carrier gas (7).

In the sampling connection operating state, the first four-way valve (560) and the second four-way valve (570) are simultaneously operated by a controller (not shown) to switch the path of the fluid, thereby switching to the sampling blocking operating state.

As illustrated in FIG. 15, during the sampling blocking operation, the first four-way valve (560) operates so that the third port (563) and the fourth port (564) are connected and the communication between the second port (562) and the third port (563) is blocked, and at the same time, the second four-way valve (570) operates so that the third port (573) and the fourth port (574) are connected and the communication between the second port (562) and the third port (563) is blocked. Accordingly, the communication between the sampling section (11) and the pipe (20) is blocked, and the gas mixture (6) is trapped in the sampling section (11).

Additionally, the controller of the valve assembly (500') causes the first port (661) and the second port (562) of the first four-way valve (560) to be connected to each other after or simultaneously with the sampling blocking operation, and causes the first port (671) and the second port (572) to be connected to each other.

Accordingly, a fluid flow path is formed from the carrier gas tank (70) through the sampling unit (11) to the detection unit (12), and gas transfer operation is performed. The gas mixture (6) trapped inside the sampling unit (11) is pushed by the carrier gas (7) discharged from the carrier gas tank (70) and flows to the detection unit (12).

Meanwhile, the gas mixture (6) flowing into the upstream connecting pipe (31) returns to the pipe (20) through the third port (563), the fourth port (564) of the first four-way valve (560), the fourth port (574) of the second four-way valve (570), and the third port (573).

Although in this embodiment 2, as in the modified example of embodiment 1, the valve assembly (500') is described as having the operation stages of a sampling connection operation and a sampling blocking operation (and a gas delivery operation), it will be appreciated that the valve assembly (500') may also be made to operate in the stages of a sampling connection operation, a sampling route sealing operation, a pressure relief operation, and a gas delivery operation.

According to the present embodiment, since the valve assembly (500') is composed of a plurality of valves, relatively free arrangement of the plurality of valves is possible, so that it can be easily installed in an existing processing device (1). In addition, since replacement of a valve in which a malfunction has occurred is easy, maintenance efforts and costs can be reduced. On the other hand, according to the present embodiment, since a multi-port valve is applied as the plurality of valves, the use of unnecessary valves can be suppressed as much as possible. Here, a three-way valve or a four-way valve is described as the multi-port valve in the embodiment form, but it will be understood that a so-called "multi-port valve" having a plurality of ports and switching the flow of fluid can produce a similar effect by combination thereof.

Furthermore, according to the present embodiment, a four-way valve operated by a lever is applied as the valve. In general, a four-way valve has a higher threshold for the pressure it can handle than a six-way valve. Therefore, the measuring system (10) according to the present embodiment has superior pressure resistance compared to a measuring system using one six-way valve, so that it can be applied even when the pressure applied to the pipe (20) is very high.

<Detection unit (12)>

Hereinafter, with reference to FIGS. 16 to 21, the configuration of the detection unit (12) and the principle of separating and detecting a gaseous substance (60) included in a gas mixture (6) by the detection unit (12) will be described.

According to the present embodiment, the concentration module (200), the separation module (300), and the sensor module (400) constituting the detection unit (12) are configured as a single detection device (120) that is miniaturized and integrated into a portable form. As described above, the decompression chamber (600) and the heater (601) may be omitted depending on the pressure environment, and therefore, the decompression chamber (600) and the heater (601) will not be described in more detail in the description of the detection unit (12) described below.

Figure 16 is a schematic conceptual diagram of a detection device (120).

As illustrated in FIG. 16, the detection device (120) has a structure in which a substrate (122) on which a concentration module (200) and a separation module (300) are integrated, and a sensor module (400) are installed in a single body (121). Inside the body (121), a power source (not illustrated) for the heating wire and the sensor module (400) and a communication device (not illustrated) for transmitting a signal of the sensor module (400) are embedded. In addition, inside the body (121), a memory for storing information such as a library for the time at which each gaseous substance (60) described below escapes through the separation path (310) and a processor for comparing information detected by the sensor module with the library to derive a result may be provided. In addition, the body (121) may be provided with a speaker or a liquid crystal screen for notifying an operator of the derived result. However, functions such as the above memory, processor, etc. may be performed by a separate computer, and the detection device (120) may communicate with a separate computer to send the detection results by the sensor module to the computer for processing.

The substrate (122) is formed by bonding a silicon material plate (first substrate) and a glass material plate (second substrate).

According to the present embodiment, the concentration module (200), the separation module (300), and the plurality of conduits (52, 53) connecting them are all deeply etched and formed on one side of the first substrate using a deep reactive-ion etching (DRIE) process. Accordingly, a nano-sized structure can be precisely formed on the substrate (122), so that the overall size of the detection device (120) can be miniaturized. The concentration module (200), the separation module (300), and the plurality of conduits (52, 53) connecting them are simultaneously etched and formed in a concave groove shape on the first substrate, and the second substrate is placed and bonded to block the concave groove, thereby completing a structure with a closed upper portion.

According to the present embodiment, the first substrate and the second substrate can be strongly bonded to each other by anodic bonding, which is a voltage-based bonding method under atmospheric pressure conditions.

Figure 17 is an enlarged view of a concentration module (200) according to the present embodiment.

The concentration module (200) includes a concentration chamber (210) formed as a space with a large volume compared to the conduit connected thereto.

The concentration chamber (210) has an approximately elongated polygonal shape, including two opposing unidirectional sides extending in the short direction of the concentration chamber (210) and two opposing longitudinal sides extending in the long direction of the concentration chamber (210).

The unidirectional side is formed by bending roughly in a “v” shape so that the center is away from the longitudinal side, thereby allowing the flow of fluid within the concentration chamber (210) to spread evenly.

An inlet conduit (52) is formed in the center of one unidirectional side of the enrichment chamber (210) to communicate with the enrichment chamber (210) and to introduce a gas mixture (6). An outlet conduit (53) is formed in the center of the other unidirectional side of the enrichment chamber (210) to allow gas to escape from the enrichment chamber (210).

In this specification, the terms "inlet" and "outlet" are intended to mean different openings through which fluid can flow into and out of the corresponding conduit, and are not necessarily limited to fluid flowing into the inlet and flowing out of the outlet in the corresponding conduit. That is, in some cases, fluid may flow into the outlet and flow out of the inlet in the corresponding conduit.

A plurality of columns (211) are arranged at regular intervals inside the concentration chamber (210). By using a depth reactive ion etching process, a plurality of columns (211) can be formed inside the concentration chamber (210) by preventing some of the columns from being etched when forming the concentration chamber (210).

The concentration chamber (210) filters and concentrates and stores gaseous substances (60) in the gas mixture (6). To this end, the interior of the concentration chamber (210) is filled with an adsorbent (212) capable of capturing gaseous substances (60). As the adsorbent (212), a material such as a carbon compound to which gaseous substances (60), which are organic compounds, can be attached and captured by van der Waals forces, for example, can be used.

The adsorbent (212) may be filled in the chamber (110) in advance before bonding the first substrate and the second substrate, or may be filled in the concentration chamber (210) by a gas transfer method. In the case of a gas transfer method, a separate introduction pipe (not shown) may be formed to communicate with the concentration chamber (210).

The gaseous substance (60) introduced into the concentration chamber (210) is captured by the adsorbent (212) and concentrated and stored inside the concentration chamber (210).

In order to discharge the gaseous substance (60) stored in the concentration chamber (210) back out of the concentration chamber (210), the bond between the adsorbent (212) and the gaseous substance (60) must be broken, and for this, the detection device (120) according to the present embodiment is equipped with a heating device that applies heat to the concentration chamber (210).

Figure 18 illustrates the back surface of the first substrate.

On the back surface of the first substrate, a heating wire (901) is attached as a chamber heating device that generates heat when power is applied. The heating wire (901) is formed on the first substrate corresponding to a position where the concentration chamber (210) is formed. The heating wire (901) has a terminal (903) to which power can be connected. A temperature sensor (902) that can measure the temperature rising by the heating wire (901) can be provided at the center of the heating wire (901).

By applying power to the heating wire (901) to generate heat, heat energy capable of dissociating the adsorbent (212) and the gaseous substance (60) can be selectively applied to the concentration chamber (210).

Meanwhile, as illustrated in FIG. 18, according to the present embodiment, in order to improve the reactivity within the separation path (310) described later, a heating wire (800) that selectively applies heat to the separation path (310) may be formed on the back surface of the first substrate corresponding to the position of the separation path (310). Terminals (801) to which power can be applied are formed at both ends of the heating wire (800).

At this time, the heat applied by the heating wire (901) may be conducted by the first silicon substrate and unexpectedly apply heat to adjacent components such as the separation path (310).

To prevent such heat conduction as much as possible, according to the present embodiment, a plurality of slits (311, 312, 313) are formed along the periphery of the heating wire (901) and completely penetrate the first substrate.

The conduit (53) connected to the concentration module (200) is connected to the separation module (300).

The separation module (300) includes a long separation path (310). The separation path (310) forms a single fluid flow path, and gaseous substances (60) introduced into the separation path (310) are separated into components while moving along the separation path (310) which has a very long path, and are discharged from the separation path (310) with a time difference.

According to the present embodiment, in order to ensure that the separation path (310) has a sufficiently long path to separate hazardous substances, the separation path (310) is arranged to form a single-layer column that is arranged in a maze shape within a defined square space.

As illustrated in FIG. 16, from the entrance of the separation path (310) in fluid communication with the conduit (53), the separation path (310) is extended in a coil shape while bending toward the center of a square space, and then extends again from the center in a coil shape to the exit of the separation path (310). That is, the path extending in a columnar shape toward the center and the path extending away from the center intersect each other adjacent to each other, so that the path length of the separation path (310) can be maximized in a small space.

In Fig. 16, for the convenience of the city, adjacent paths are sufficiently spaced apart, but the spacing between adjacent paths is formed very densely.

By forming the path spacing very densely, for example, a separation path (310) having a cross-sectional area of several nanometers can be extended for about 3 m.

FIG. 19 schematically illustrates the interior of a separation path (310) according to one embodiment of the present invention.

As illustrated in Fig. 19, the inner surface of the separation path (310) is coated with a porous material (311) to which a gaseous substance (60) can be attached. For example, the porous material (311) may be a porous polymer such as PDMS.

The harmful substance (M), which is an organic compound, is attached to the porous polymer by the van der Waals force. At this time, when the carrier gas (7) flows inside the separation path (310), the gaseous substance (60) that was attached to the porous material (311) by the force of the carrier gas (7) is separated from the porous material (311), flows for a certain distance, loses mobility, and is attached to the porous material (311) again, and this process is repeated.

Since the gaseous substance (60) has different masses and van der Waals forces acting on the porous substance (311) depending on its composition, as shown in Fig. 19, the gaseous substances (60) of different compositions are attached to the porous substance (311) and then separated and flow at different frequencies and distances. That is, the gaseous substances (60) move at different movement speeds within the separation path (310) depending on their compositions. For example, among the first substance (61) indicated by a triangle and the second substance (62) indicated by a circle, the movement speed of the second substance (62) is faster.

According to the present embodiment, since the separation path (310) has a long path of about 3 m, the gaseous substance (60) injected into the inlet of the separation path (310) is equalized in moving distance by component while moving along the long path, and is discharged through the outlet of the separation path (310) in a lump by component. Since the gaseous substance (60) has different moving speeds depending on the component, the gaseous substance (60) is separated by component and discharged through the outlet of the separation path (310) with a time difference. That is, without any work such as applying electricity, the gaseous substance (60) is separated by component and discharged with a time difference simply by causing the hazardous substance to travel through the separation path (310).

The porous material (311) may be coated on the separation path (310) before the first substrate and the second substrate are bonded, or may be coated in a gas flow manner through a separate introduction tube (not shown).

The gaseous substance (60) that sequentially exits the exit of the separation path (310) is detected by the sensor module (400).

The sensor module (400) according to the present embodiment is a photoionization type (PID) sensor that measures voltage changes due to electrons dissociating from a gaseous substance (60) flowing out from a separation path (310) of a separation module (300) by applying ultraviolet (UV) light to the gaseous substance (60). Specifically, when UV light is irradiated on a substance such as an organic compound, electrons escape, generating a potential.

The higher the concentration of the substance, the higher the detected potential value, which can be used to calculate the concentration of the substance.

The gas mixture (6) sampled by the carrier gas (7) flows into the concentration chamber (210) through the detection unit inlet pipe (52). The gas flowing into the concentration chamber (210) moves in the longitudinal direction of the concentration chamber (210). In this process, the gaseous substance (60) included in the gas mixture (6) is adsorbed to the adsorbent (212) filled inside the concentration chamber (210).

After concentrating the gaseous substance (60) in the concentration chamber (210) for a predetermined period of time, power is applied to the heating wire (901) to heat the concentration chamber (210). The gaseous substance (60) that has been concentrated and stored inside the concentration chamber (210) is separated from the adsorbent (212) by the applied heat energy, and is carried by the carrier gas (7) flowing through the inside of the concentration chamber (210) and escapes from the concentration chamber (210). The carrier gas (7) carrying the gaseous substance (60) flows to the separation path (310).

The high concentration gaseous substance (60) that escapes from the concentration chamber (210) is instantly introduced into the separation path (310).

That is, the concentration chamber (210) according to the present embodiment not only functions as a reservoir for storing concentrated hazardous substances, but also as an injector capable of injecting highly concentrated hazardous substances into a separation path (310).

Figure 20 is a simplified diagram illustrating a process of separating and detecting a gaseous substance (60) using a detection device (120) according to the present embodiment.

As described above, within the separation path (310), the gaseous substance (60) has different movement speeds depending on its component.

Through experiments, the time to exit the separation path (310) can be obtained in advance depending on the composition of the gaseous substance (60).

For example, a gas containing only isopropyl antipyrine (IPA) could detect the substance in the sensor module (400) after about 20 seconds. In this manner, experiments can be conducted for each expected gaseous substance (60), and a library can be created for the time at which each gaseous substance (60) escapes through the separation path (310).

Since gaseous substances (61, 62, 63, 64) of different components are sequentially discharged through the separation path (310), the components of the gaseous substances can be identified by checking the time at which the potential value significantly increases through the sensor module (20), and the concentration of the gaseous substances can also be obtained through the potential value.

Figure 21 is a graph showing the detection results detected through the measuring system (10) when plasma cleaning treatment was performed.

As shown in Figure 21, it can be confirmed that a sharp peak occurs in which the potential value increases rapidly at a given time.

The components of the gaseous substances detected at that time have already been specified, for example, the substance of peak a is pyridine, the substance of peak b is butanediol, etc.

In addition, it is possible to analyze how much of a gaseous substance (60) of a certain component is included in the gas mixture (6) discharged from the treatment device (1) through the potential value by the component of the gaseous substance.

The operator or the control unit of the system can continuously check whether there is residue on the cleaned wafer (3) by checking the composition and concentration of the detected gaseous substance (60). If the concentration of a specific substance is close to 0 or falls below a predetermined standard, it can be determined that there is no residue on the cleaned wafer (3) and the cleaning process can be terminated.

According to this configuration, even in a state where the plasma cleaning process is continuously performed (in-situ), the presence and concentration of the gaseous substance (60) included in the gas mixture (6) discharged from the processing device (1) can be checked to determine whether there is residue. Accordingly, the process of terminating the process, inspecting the wafer with a separate device, and then performing the cleaning process again if it does not meet the standard can be omitted, so that the yield of semiconductor components can be greatly improved.

In addition, the sampling time, the desorption time in the concentration module of the gaseous substance (60), and the separation time are extremely short compared to the time required to stop the processing device (1), move the wafer for inspection, and then process it again, so that the processing status of the wafer can be inspected in practically "real time."

<Other examples>

In the above-described embodiment, the processing device (1) is described as a plasma cleaning processing device for a wafer, but it is not limited thereto. The processing device (1) may be a UV ozone-based cleaning device. In addition, the processing device (1) may be a plasma, UV ozone-based etching processing device for a wafer. The etching method may be dry or wet. In addition, the part to be processed may be a semiconductor part other than a wafer, and may not be a semi-conductor part. The measuring system (10) according to the present embodiment can be applied to any process as long as it is a process in which a gas mixture is generated by a reaction between a reactive gas and a part in a chamber.

Furthermore, the processing device (1) is not limited to a device that performs a specific "process". For example, the measuring system (10) may be installed in a chimney through which factory exhaust smoke is discharged as a "pipe (20)" and may be used to measure the components of factory exhaust smoke. In addition, the processing device (1) may be referred to as other devices that discharge a gas mixture, such as a vehicle.

According to the above embodiment, the detection unit (12) is configured as a single portable detection device (120), but is not limited thereto. The concentration module (200), separation module (300), and sensor module (400) of the detection unit (12) may be configured as separate devices, and each device does not necessarily have to be miniaturized to be portable.

In addition, according to the above embodiment, a PID type sensor is used in the sensor module (400), but a sensor using a hydrogen ionization detector (FID) technique may be used.

In addition, in the above embodiment, a sampler (103) using a spiral conduit is used, but it is not limited to this. If it is possible to temporarily store a gas mixture (6) of a predetermined volume, for example, a simple straight conduit shape or a sample bag can also be used as a sampler.

In addition, according to the above embodiment, the sampling unit (11) and the detection unit (12) are in fluid communication, but this is not limited to this. After sampling is performed by the sampling unit (11), the sampling unit (11) may be separated and moved, and connected to a detection unit (12) in another location.

According to the above embodiment, the valve assembly (500, 500') is connected to the pipe (20) in a kind of bypass form through an upstream connection pipe (31) and a downstream connection pipe (32) branching from the pipe (20), but is not limited thereto. In Fig. 1, the conduit between the upstream connection pipe (31) and the downstream connection pipe (32) may be deleted so that the gas mixture (6) passing through the pipe (20) necessarily flows through the valve assembly (500, 500').

Claims (11)

A measuring system capable of measuring the components of a gas mixture containing a gaseous substance,
A sampling unit that is selectively connected to a pipe through which the gas mixture passes and samples the gas mixture from the pipe;
A detection unit that separates and detects gaseous substances contained in a gas mixture sampled by the above sampling unit by component;
A valve assembly comprising a plurality of valves for selectively connecting the sampling section to the pipe or the detection section,
The above plurality of valves cooperate to selectively perform a sampling connection operation for connecting the pipe and the sampling section, a sampling blocking operation for blocking the communication between the pipe and the sampling section, and a gas delivery operation for forming a flow path so that the carrier gas flows together with the gas mixture.
The above sampling blocking operation is:
A sampling route sealing operation for trapping and confining the gas mixture in the sampling section,
A measuring system characterized by including a pressure reducing operation for reducing the pressure of the gas mixture trapped in the sampling section. In the first paragraph,
A measuring system characterized in that the sampling connection operation, the sampling blocking operation, and the gas delivery operation are performed sequentially. In the first paragraph,
A measuring system characterized in that a flow path is formed through which the carrier gas flows through the sampling unit to the detection unit by the gas transfer operation. In the third paragraph,
When the above sampling connection is in operation, a flow path of fluid directly from the carrier gas tank to the detection unit and a flow path of fluid returning from the pipe through the sampling unit to the pipe are formed.
A measuring system characterized in that, during the above gas delivery operation, a fluid flow path is formed from the carrier gas tank through the sampling unit to the detection unit. delete In the first paragraph,
The above detection unit includes a pressure reducing chamber for reducing the pressure of the gas mixture,
By the above pressure reducing operation, the gas mixture is introduced into the pressure reducing chamber to reduce the pressure,
A measuring system characterized in that the gas delivery operation is performed after depressurizing the gas mixture. A measuring system capable of measuring the components of a gas mixture containing a gaseous substance,
A sampling unit that is selectively connected to a pipe through which the gas mixture passes and samples the gas mixture from the pipe;
A detection unit that separates and detects gaseous substances contained in a gas mixture sampled by the above sampling unit by component;
A valve assembly comprising a plurality of valves for selectively connecting the sampling section to the pipe or the detection section,
The above plurality of valves cooperate to selectively perform a sampling connection operation for connecting the pipe and the sampling section, a sampling blocking operation for blocking the communication between the pipe and the sampling section, and a gas delivery operation for forming a flow path so that the carrier gas flows together with the gas mixture.
The above plurality of valves each include a plurality of multi-port valves having a plurality of ports,
A measuring system characterized in that the plurality of multi-port valves are selectively operated so that the sampling connection operation, the sampling cut-off operation and the gas delivery operation are selectively performed. In Article 7,
The above multiple multi-port valves include first to third three-way valves each having three ports,
The first port of the first three-way valve is connected to the pipe, the second port is connected to one end of the first connecting pipe, and the third port is connected to the pipe.
The first port of the second three-way valve is connected to the inlet of the sampling section, the second port is connected to the other end of the first connecting pipe, and the third port is connected to one end of the second connecting pipe.
The first port of the third three-way valve is connected to the outlet of the sampling section, the second port is connected to the pipe, and the third port is connected to one end of the third connecting pipe.
A measuring system characterized in that the sampling section and the pipe are connected or blocked by the operation of the first three-way valve. In Article 8,
The above multiple multi-port valves include fourth and fifth three-way valves each having three ports,
The first port of the fourth three-way valve is connected to a carrier gas inlet pipe communicating with the carrier gas tank, the second port is connected to the other end of the second connecting pipe, and the third port is connected to one end of the fourth connecting pipe.
The first port of the fifth three-way valve is connected to the inlet pipe of the detection unit communicating with the detection unit, the second port is connected to the other end of the fourth connecting pipe, and the third port is connected to the other end of the third connecting pipe.
A measuring system characterized in that the sampling connection operation, the sampling cut-off operation and the gas delivery operation are selectively performed by selectively operating the first to fifth three-way valves to switch the path of the fluid. In Article 9,
The above detection unit includes a pressure reducing chamber for reducing the pressure of the gas mixture,
The above sampling blocking operation is:
It includes a sampling route sealing operation for trapping and confining the gas mixture in the sampling section, and a pressure reducing operation for flowing the gas mixture trapped in the sampling section into the pressure reducing chamber to reduce the pressure.
When the above sampling route sealing is in operation, the first three-way valve and the third three-way valve operate simultaneously to change the path of the fluid,
A measuring system characterized in that, when the above pressure reducing operation is performed, the fifth three-way valve operates to change the path of the fluid. In Article 10,
A measuring system characterized in that, during the above gas transmission operation, the second three-way valve and the fourth three-way valve operate simultaneously to switch the path of the fluid.

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