KR102004805B1 - 코일 전자 부품 - Google Patents
코일 전자 부품 Download PDFInfo
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- KR102004805B1 KR102004805B1 KR1020170135379A KR20170135379A KR102004805B1 KR 102004805 B1 KR102004805 B1 KR 102004805B1 KR 1020170135379 A KR1020170135379 A KR 1020170135379A KR 20170135379 A KR20170135379 A KR 20170135379A KR 102004805 B1 KR102004805 B1 KR 102004805B1
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- H01F27/00—Details of transformers or inductances, in general
- H01F27/28—Coils; Windings; Conductive connections
- H01F27/32—Insulating of coils, windings, or parts thereof
- H01F27/324—Insulation between coil and core, between different winding sections, around the coil; Other insulation structures
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/403—Oxides of aluminium, magnesium or beryllium
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45555—Atomic layer deposition [ALD] applied in non-semiconductor technology
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- H01F1/03—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity
- H01F1/12—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials
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- H01F1/01—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
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- H01F1/14—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials metals or alloys
- H01F1/20—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials metals or alloys in the form of particles, e.g. powder
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- H01F1/24—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials metals or alloys in the form of particles, e.g. powder pressed, sintered, or bound together the particles being insulated
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- H01F27/29—Terminals; Tapping arrangements for signal inductances
- H01F27/292—Surface mounted devices
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- H01L27/28—
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
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- H01F41/0206—Manufacturing of magnetic cores by mechanical means
- H01F41/0246—Manufacturing of magnetic circuits by moulding or by pressing powder
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Abstract
Description
도 2는 본 발명의 일 실시형태의 코일 전자 부품을 개략적으로 나타낸 단면도이다.
도 3은 도 2의 A 영역을 확대하여 나타낸 것이다.
도 4는 원자층 증착에 의하여 박막이 형성되는 원리를 나타내는 모식도이다.
도 5는 변형 예에 따른 코일 전자 부품에서 바디의 영역을 개략적으로 나타낸 단면도이다.
2: 고주파 인덕터
3: 통상의 비드
4: 고주파용 비드
5: 공통 모드 필터
100: 코일 전자 부품
101: 바디
102: 지지부재
103: 코일부
104: 절연층
105, 106: 외부전극
111: 절연체
112: 자성 입자
113, 113`: 코팅층
S: 응집체
P: 대상 물체
A1, A2: 원자층
Claims (12)
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 코일부가 내설되며 절연체 및 상기 절연체에 응집체의 형태로 분산된 복수의 자성 입자를 갖는 바디;
상기 응집체의 표면을 따라 절연 물질로 형성된 코팅층; 및
상기 코일부와 접속된 외부 전극;을 포함하며,
상기 절연체와 상기 코팅층은 서로 다른 세라믹 물질로 이루어진 코일 전자 부품.
- 코일부가 내설되며 절연체 및 상기 절연체에 응집체의 형태로 분산된 복수의 자성 입자를 갖는 바디;
상기 응집체의 표면을 따라 절연 물질로 형성된 코팅층; 및
상기 코일부와 접속된 외부 전극;을 포함하며,
상기 절연체와 상기 코팅층은 서로 동일한 물질로서 일체 구조로 형성된 코일 전자 부품.
- 제9항에 있어서,
상기 절연체와 상기 코팅층은 알루미나로 이루어진 코일 전자 부품.
- 삭제
- 삭제
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020170135379A KR102004805B1 (ko) | 2017-10-18 | 2017-10-18 | 코일 전자 부품 |
| US16/003,901 US11495398B2 (en) | 2017-10-18 | 2018-06-08 | Coil electronic component |
| CN201811112983.2A CN109686550B (zh) | 2017-10-18 | 2018-09-25 | 线圈电子组件 |
| US17/948,656 US12014866B2 (en) | 2017-10-18 | 2022-09-20 | Coil electronic component |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020170135379A KR102004805B1 (ko) | 2017-10-18 | 2017-10-18 | 코일 전자 부품 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020190059441A Division KR102064117B1 (ko) | 2019-05-21 | 2019-05-21 | 코일 전자 부품 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20190043382A KR20190043382A (ko) | 2019-04-26 |
| KR102004805B1 true KR102004805B1 (ko) | 2019-07-29 |
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ID=66096609
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020170135379A Active KR102004805B1 (ko) | 2017-10-18 | 2017-10-18 | 코일 전자 부품 |
Country Status (3)
| Country | Link |
|---|---|
| US (2) | US11495398B2 (ko) |
| KR (1) | KR102004805B1 (ko) |
| CN (1) | CN109686550B (ko) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102021202630A1 (de) * | 2021-03-18 | 2022-09-22 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein | Vorrichtung mit einem porösen Körper zum Aufnehmen einer Wärmemenge und Verfahren zum Bereitstellen einer Vorrichtung |
Citations (1)
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| CN109686550B (zh) | 2023-04-18 |
| KR20190043382A (ko) | 2019-04-26 |
| US12014866B2 (en) | 2024-06-18 |
| US20230015432A1 (en) | 2023-01-19 |
| US11495398B2 (en) | 2022-11-08 |
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| CN109686550A (zh) | 2019-04-26 |
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