KR101103264B1 - Method of manufacturing functional surface - Google Patents

Abstract

The present invention relates to a method for producing a functional surface having a self-purifying ability by photolysis and having a super-hydrophilic antireflection ability. Specifically, the method for producing a functional surface according to the present invention includes a) spherical shape on one surface of a transparent substrate. Arranging a plurality of beads having a single layer; b) etching the plurality of beads to form a constant separation distance between the beads; c) etching the substrate with an etching mask on the plurality of beads having the predetermined distance to form surface irregularities on one surface of the substrate; d) removing the plurality of beads from one surface of the substrate; And e) forming a photocatalyst layer on one surface of the substrate on which the surface irregularities are formed.

Anti-reflective, Surface irregularities, Colloidal lithography, Photocatalyst, Glass

Description

Fabrication Method for Functional Surface

The present invention relates to a method for producing a functional surface having a self-purifying ability by photolysis and having a super-hydrophilic antireflection property, and in detail, has an antireflection property of not more than 5% of the reflectivity of the transparent substrate, The present invention relates to a method for producing a functional surface that decomposes itself and has superhydrophilic properties.

Recently, research is being actively conducted to use engineering inspired by natural nanostructures. Representative examples are lotus leaf showing super water repellency and moth eyes showing antireflection.

In general, anti-reflection is an anti-reflection concept. The anti-reflection surface technology refers to a technique of increasing the amount of light transmitted by reducing the reflection of light generated by a sudden change in refractive index on the surface of an optical device.

Moth's eye is a representative model of anti-reflection. Moth's eye is composed of well-ordered nanostructures, so the reflection of light is very small, so you can protect yourself from predators like birds. It is easy to secure activities.

The anti-reflective surface using this nanostructure, that is, the anti-reflective surface, is applied to the optical lens such as a monitor including OLED / LCD, lighting including LED, advertisement, solar cell, industrial appliance glass including automobile instrument panel, camera, etc. It can reduce the glare of light reflections and reduce the amount of light coming from inside, providing clear and bright picture quality.

In general, the antireflective surface is coated with a thin film of a chemical material having an index of refraction between air and a substrate using an electron beam deposition or an ion assisted deposition method. In addition, if you want to prevent reflection at different wavelengths, you need to deposit different layers of different materials with different refractive indices.

However, the anti-reflective surface using nanostructures has the advantage of showing the effect of anti-reflection in a wide incidence angle and wavelength range compared to the conventional technology using a coating thin film.

Antireflective surfaces using nanostructures have been approached by various nanoprocessing methods. Recently, nanostructures were fabricated on the silicon surface by nanosphere lithography and dry etching using SF ₄ plasma to report the antireflection effect (Peng Jiang et al. APL, vol. 92, 061112, 2008). However, the above research results have a problem in that the uneven structure is formed on the silicon surface by using a plasma after the silica nanospheres are arranged in a single layer on silicon, which is not transparent.

In addition, in the same research group, a mold using silica nanoparticles was made and then replicated with PDMS (polydimethylsiloxane) to synthesize a structure of PETPTA (polyethoxylated trimethylolpropane triacrylate) on glass by UV polymerization. (Peng Jiang et al. APL, vol. 91, 101108, 2007). However, this is difficult to adjust the shape of the structure and there is a problem that the durability is weak.

Generally, the surface of automobile glass or building window glass has a low contact angle of 20 to 40 ㅀ. Therefore, in rainy weather, water adheres to water droplets, grows, and flows down into a heterogeneous water film. This heterogeneous water film causes light scattering in the case of automobile glass, thereby obstructing the driver's view, especially in rainy weather or at night driving, and easily contaminates the surface with dust, yellow sand, etc. in the case of building glass windows. In addition, in the case of high-rise and large-area buildings that are difficult to clean, glass having a self-cleaning function in which organic / inorganic foreign substances are removed by itself has a significant advantage in terms of building maintenance.

Accordingly, the present invention is a method for producing a functional surface that can be processed in a large area, can be easily produced in a short time, has a homogeneous and anti-deterioration antireflection property, self-removing organic and inorganic contaminants, and superhydrophilicity To provide.

An object of the present invention for solving the above problems is to treat a transparent substrate as its object, and has a anti-reflective property of less than 5% of the reflectance, organic contaminants on the surface of the substrate is self-decomposed, and a functional surface having super hydrophilic properties It is to provide a manufacturing method that can be easily produced.

The present invention provides a method for producing a functional surface having a self-purifying ability by photolysis and having a superhydrophilic antireflection ability, comprising the steps of: a) arranging a plurality of beads having a spherical shape on one surface of a transparent substrate in a single layer; b) etching the plurality of beads to form a constant separation distance between the beads; c) etching the substrate with an etching mask on the plurality of beads having the predetermined distance to form surface irregularities on one surface of the substrate; d) removing the plurality of beads from one surface of the substrate; And e) forming a photocatalyst layer on one surface of the substrate on which the surface irregularities are formed.

Preferably, the method for producing a functional surface according to the present invention comprises the steps of f) arranging a plurality of beads having a spherical shape in a single layer on an opposite surface that is a surface facing the one surface of the substrate having the surface irregularities; g) etching the plurality of beads arranged on the opposite surface to form a constant separation distance between the beads; h) etching the substrate with an etching mask on the plurality of beads having a predetermined distance to form surface irregularities on the opposite surface; And i) removing the plurality of beads from the opposing face.

Characteristically, the transparent substrate is glass and the beads are plastic.

The bead arranged on one surface of the substrate satisfies the following relation 1, and the separation distance between the etched beads satisfy the following relation 2.

(Relationship 1)

50 nm ≤ R _mean ≤ 200 nm

(The above R _mean is the average diameter of the beads.)

(Relationship 2)

5 nm ≤ R ≤ 100 nm

(R is the separation distance between beads.)

The surface irregularities formed by the etching of the substrate have a feature that satisfies the following relational formula (3).

(Relationship 3)

50 nm ≤ D ≤ 1500 nm

(D is a step of surface irregularities.)

The bead etching and the substrate etching are directional dry etching using an etching gas, respectively, and the beads are etched by an etching gas containing O ₂ , CF ₄ , Ar, or a mixed gas thereof. The substrate is characterized by being etched by an etching gas containing CF ₄ , SF ₆ , HF or a mixture thereof.

In terms of selective etching of the material, the etching gas of the substrate preferably further contains H ₂ .

The beads are spin-coating, dip-coating, lifting up, electrophoretic deposition, chemical or electrochemical deposition and electrospray. ) Is preferably arranged on the surface of the substrate.

The photocatalyst layer is characterized in that the TiO ₂ , ZnO, WO ₃ , SnO ₂ , Bi ₂ O ₃ , or a mixture thereof, the photocatalyst layer is organometallic chemical vapor deposition (MOCDV), plasma organometallic chemical vapor deposition (PE-MOCVD) ), Atomic layer deposition (ALD), magnetron sputtering, and electrospray.

Functional glass produced by the manufacturing method according to the present invention based on the glass has a characteristic of having a reflectance of 5% or less due to surface irregularities, and a superhydrophilic glass having self-purifying ability by photolysis of the photocatalyst layer.

Functional surface manufacturing method according to the present invention is characterized by having anti-reflective properties by the fine irregularities formed on the surface of the transparent substrate, even in a large area of the substrate can form fine irregularities uniformly within a short time, the adhesion of other heterogeneous materials In addition, the substrate surface itself has an antireflection property, thereby preventing deterioration of the antireflection property over time and having excellent physical stability. In addition, the method for producing a functional surface according to the present invention has an advantage of controlling the reflectance within 5% to 1% by controlling the number of surfaces on which fine irregularities are formed.

In addition, the method for producing a functional surface according to the present invention forms a photocatalyst layer on the top surface of the surface irregularities to give anti-reflective properties, thereby providing super hydrophilic performance and simultaneously removing organic contaminants attached to the substrate by photocatalyst by photolysis. It has the strength of self-cleaning ability to maintain clean surface state. In addition, the inorganic contaminants are easily removed by the superhydrophilic performance, and there is an advantage of ensuring visibility by preventing distortion or diffuse reflection of light due to the attachment, aggregation and growth of water droplets.

Hereinafter, a method for manufacturing a functional surface of the present invention will be described in detail with reference to the accompanying drawings. The drawings introduced below are provided by way of example so that the spirit of the invention to those skilled in the art can fully convey. Accordingly, the present invention is not limited to the drawings presented below and may be embodied in other forms. Also, throughout the specification, like reference numerals designate like elements.

Hereinafter, the technical and scientific terms used herein will be understood by those skilled in the art without departing from the scope of the present invention. Descriptions of known functions and configurations that may be unnecessarily blurred are omitted.

1 is an example showing a process diagram of a functional surface manufacturing method according to the present invention, the step of the dotted line of Figure 1 is an embodiment of the preferred embodiment, it means that the step is optionally further performed.

As illustrated in FIG. 1, the method for manufacturing a functional surface according to the present invention includes arranging beads on a transparent substrate surface (S10), etching the beads to form a separation distance between the beads (S20), and etching the etched beads. Etching the substrate with a mask (s30), removing the beads from the substrate surface (s40), and forming a photocatalyst layer on the surface of the substrate having the surface irregularities (s40).

At this time, the transparent substrate is characterized by being glass. When the transparent substrate is glass, the beads are characterized in that they are plastic beads in terms of ease of bead etching and ease of selective etching of the substrate and the beads, and are preferably polystyrene beads. In addition, the beads preferably have a spherical shape in terms of uniform and regular bead arrangement according to the position.

2 is a perspective view illustrating a step S10 of arranging beads on the transparent substrate surface. As shown in FIG. 2, a plurality of beads 200 having a spherical shape are arranged in a single layer on one surface of the substrate 100 by step s10. In this case, the bead is preferably an array having six nearest neighbor beads of each bead, and each closest bead is preferably in contact with each other. The arrangement of these beads can be controlled by the bead content of the bead dispersion, which is applied or dispersed on the substrate surface, or the application or dispersion conditions.

As described above, in the step (s10) of arranging a plurality of beads having a spherical shape on one surface of the transparent substrate as a single layer, after applying or coating a bead dispersion in which the beads are dispersed to one surface of the transparent substrate, It is carried out by removing the liquid phase of the dispersion, the application or coating of the dispersion is spin-coating, dip-coating, lifting up, electrophoretic deposition, chemical or It is carried out by any one or more methods selected from chemical or electrochemical deposition and electrospray.

At this time, in order to arrange the beads to have a regular arrangement in a single layer on the transparent substrate surface, the step (s10) is preferably carried out by spin coating. For example, the bead arrangement step (s10) is diluted using methanol containing 0.25% of a surfactant in a solution in which the beads are dispersed at a concentration of 2.5%, and spin coating for 1 minute at a rotation speed of 3000 rpm. Can be performed.

Before the step (s10) is performed, it is preferable that the step of cleaning the substrate 100 is further performed, and the cleaning is preferably performed using a piranha sulfate-containing solution or an organic solvent and physical vibration.

For example, after dipping the substrate 100 in a solution prepared by heating the solution containing the solution of pyrana sulfate to 60 ° C and sonicating or stirring for 10 minutes, it is washed five times with distilled water. In addition, the cleaned substrate 100 specimen is dried and treated in a UVO cleaner for about 3 minutes.

3 (a) is a perspective view illustrating a step (S20) of etching the plurality of beads 200 arranged in a single layer on the substrate surface 100 to form a constant separation distance R between the beads. (b) shows an enlarged view of region 'A' in FIG. Here, in FIG. 3 (b), the circular dotted line indicates the diameter of the beads arranged on the substrate surface before the bead etching, and the solid line located inside the dotted line indicates the diameter of the bead 200 reduced in size by etching in step S20. Indicates.

As shown in FIG. 3, the step S20 may include etching the plurality of beads 200 arranged on the surface of the substrate to form an etching mask in which each bead is spaced apart from each other at a predetermined interval R. FIG. to be.

At this time, the separation distance (R) is arranged adjacent to the reference bead (S) and the reference bead (S) when the bead arbitrarily selected one of the plurality of beads 200 as the reference bead (S) Spaced distance from adjacent beads.

In the step (s20), the substrate 100 is not etched, and selective etching is preferably performed to selectively etch the beads 200, and physical stability of the bead arrangement, uniform and controlled separation distance and selective etching ( In terms of etching selectivity, dry etching including plasma etching and ion milling etching may be performed.

Characteristically, the beads are made of plastics, and the etching of the beads is performed by directional dry etching using an etching gas containing O ₂ , CF ₄ , Ar or a mixture thereof.

The etching mask manufactured by etching the beads is determined by the surface density of the beads (number of particles / substrate surface area of the beads), the average particle size of the beads before etching, and the separation distance R between the beads, and etching of the beads. Subsequently, in the etching step (s30) of the substrate to be performed, the surface of the substrate having no surface is etched by the etched beads, thereby forming a nano pillar structure having a shape similar to that of a pattern of beads etched on the substrate surface. Nanopillar shape by empty space) is formed.

Therefore, the surface irregularities of the nano-pillar structure are formed by the surface density of the beads, the average particle size of the beads before etching and the separation distance between the beads.

In order to ensure that the transparent substrate does not degrade the transparency and has antireflection properties of less than 5% reflectance due to the surface irregularities, the surface density of the beads, the average particle size of the beads before etching, the separation distance between the beads, and the etching depth of the substrate are controlled. In particular, the average particle size of the beads before the etching, the separation distance between the beads and the etching depth of the substrate should be controlled from the standpoint of anti-reflective characteristics and preventing transparency decrease.

In the manufacturing method according to the present invention, the average particle size (R _mean ) and the distance between beads (R) of the beads before etching are the basic dimensions of the region of the substrate which is not etched and the region of the substrate which is etched adjacent thereto. Therefore, in order to have antireflection characteristics in which the wavelength of the visible region is reflected within 5%, the average particle size (R _mean ) of the beads before etching is characterized by satisfying the following Equation 1, and the etching of the beads The separation distance (R) adjusted by the has a characteristic that satisfies the following relation (2). Furthermore, the separation distance R may allow easy and homogeneous etching to be performed during the etching step of the substrate to be described later as well as the antireflection property.

(Relationship 1)

50 nm ≤ R _mean ≤ 200 nm

(Relationship 2)

5 nm ≤ R ≤ 100 nm

After forming the etching mask (s20) by etching the beads, the etching step (s30) of the substrate for forming the surface irregularities is performed. The step (D) of the surface irregularities, which is the etching depth of the substrate, is a factor that affects the antireflection characteristics and the transparency of the substrate, and in order to have the antireflection characteristic of which the transparency of the substrate is 95% or more and reflected within 5%, There is a characteristic that satisfies relation 3.

(Relationship 3)

50 nm ≤ D ≤ 1500 nm

4 is a perspective view showing a substrate etching step (S30). Referring to FIG. 4, in the substrate etching step S30, one surface of the substrate 100 is etched using the plurality of etched beads 200 as an etching mask.

Specifically, the step (s30) is a step of etching the substrate with an etching mask (etching mask) a plurality of beads having a predetermined distance to form a surface irregularities on one surface of the substrate, to the etched beads As a result, the surface of the substrate on which the surface is not screened is etched so that the arrangement of the etched beads 200 is transferred.

In the step (s30), the bead 100 is not etched, it is preferable that the selective etching is performed to selectively etch the substrate 200, the selective etching (etching selectivity), the direction of etching and uniform and precise control In terms of the etching depth, it is preferable that dry etching including plasma etching and ion milling etching is performed.

Characteristically, the substrate is a glass material, and the etching of the substrate is performed by directional dry etching using an etching gas containing CF ₄ , SF ₆ , HF or a mixture thereof, and etching the substrate. In order to more effectively perform the selective viewing time, the etching gas preferably further contains H ₂ .

By the etching of the substrate (S30) of the above-described substrate is formed on the surface of the substrate 100 nano-shaped fine rough concave (110). As such, it is possible to easily form the fine concave-convex structure on the surface of the substrate 100 by etching using a dry etching process.

After etching of the substrate (S30) is performed, the beads are removed (S40), Figure 5 is a perspective view showing a bead removal step. Referring to FIG. 5, only the fine irregularities 110 remain on the surface of the substrate 100 from which the beads 200 are removed.

As a method of removing the beads 200, it is preferable to apply an ashing process widely used in a semiconductor process.

More specifically, an O ₂ plasma ashing process may be applied, and methods such as a Piranha solution, an organic solvent, a dilute HF solution and steam, and ultrasonic cleaning may be used.

FIG. 13 is a scanning electron micrograph of surface irregularities formed through steps S10 to S40 based on plate glass, and FIG. 14 is a view illustrating measurement of reflectance before and after surface irregularities of plate glass.

Therefore, as described above, the fine roughness 110 is formed on one surface of the substrate 100 through the bead array S10, the bead etching S20, the substrate etching S30, and the bead removal S40. By doing so, it is possible to manufacture the transparent substrate 100 having the antireflection property of which the transparency is not lowered and the reflectance is 5% or less.

6 is a perspective view illustrating a step (S50) of forming the photocatalyst layer 300 on one surface of the substrate 100 on which the surface irregularities are formed.

When the base material 100 is a glass material (A), even though the fine concave-convex 110 is formed on the surface due to the inherent property of the glass material, the hydrophilic property easily bonds with water molecules, but the photocatalytic layer 300 is formed. By the S50, the transparent substrate has superhydrophilicity with a contact angle of 10 ° or less, and maintains visibility of the transparent substrate as adhesion of droplets and growth of droplets are suppressed.

The surface of the substrate having super hydrophilicity by the formation of the photocatalytic layer 300 is easily water-induced to remove inorganic impurities attached to the transparent substrate surface such as dust, and organic contaminants adhered to the substrate surface. It is removed through photolysis. The photocatalytic layer 300 has a self-purifying ability to remove the organic / inorganic contaminants on the surface of the substrate itself.

The photocatalyst layer 300 is preferably a semiconductor photocatalyst, more preferably TiO ₂ , ZnO, WO ₃ , SnO ₂ , Bi ₂ O ₃ , or a mixture thereof.

The photocatalyst layer 300 may be formed using spray pyrolysis deposition (SPD) or physical / chemical vapor deposition, and the surface of the substrate 100 on which the fine surface irregularities 110 are formed. In order to form a photocatalytic layer 300 having a high bonding strength with a homogeneous thickness, the photocatalytic layer 300 may be formed by organometallic chemical vapor deposition (MOCDV), plasma organometallic chemical vapor deposition (PE-MOCVD), or atomic layer deposition (ALD). ), The magnetron sputtering method, and electrospry, and the method of depositing at least one selected from, and the thickness of the photocatalyst layer 300 is preferably 5nm to 15nm.

Therefore, as described above, the fine roughness 110 is formed on one surface of the substrate 100 through the bead array S10, the bead etching S20, the substrate etching S30, and the bead removal S40. By forming the photocatalyst layer (S50), the superhydrophilic transparent base material 100 having a self-purifying ability without anti-transparency can be produced.

As described above, although the object of the present invention can be achieved by forming the fine surface irregularities 110 on one surface of the substrate 100, the fine surface irregularities 110 may also be formed on the surface opposite to the surface on which the fine surface irregularities 110 are formed. It is desirable to form surface irregularities to maximize transmittance. In detail, by forming the fine surface irregularities on both of the opposing surfaces, it is possible to prevent the light in the air from entering the substrate and then rereflecting without passing through the substrate.

At this time, after forming the fine surface irregularities on the surface (opposite surface) facing the surface on which the fine surface irregularities 110 are formed, similar photocatalyst layer 300 is formed, so that the two opposite surfaces have anti-reflective properties and are self-purified. It is further desirable to produce a capable superhydrophilic transparent substrate 100.

14 to 16 is a case where a single surface is treated according to the present invention using a glass plate as a transparent substrate, the average diameter (R _mean ) of the beads before etching is 80nm, the distance between beads (R) is 20nm, the surface and step (D) of the irregularities is 600nm, the specimens were the photocatalytic material is TiO ₂ deposited 10nm.

FIG. 14 is an optical picture of the functional glass manufactured by the above-described manufacturing method of the present invention based on a glass plate, and FIG. 15 is a contact drop with a water drop before and after formation of the photocatalyst layer 300. It is measured.

As can be seen in Figure 15, when the photocatalyst layer (TiO ₂ ) is formed on the glass plate without the surface fine irregularities, the contact angle of 45 degrees due to the characteristics of the hydrophilic photocatalyst material itself, but the surface fine irregularities are formed according to the present invention After the formation of the same photocatalyst layer TiO ₂ , it can be seen that a superhydrophilic surface having a contact angle of 4 degrees is produced.

'Bare-glass' of FIG. 16 is a transmittance of the glass plate itself, and'nano-glass' is a case where only fine surface irregularities are formed by the above-described steps (S10 to S50) on one surface of the glass plate, and 'TiO ₂ nano- glass' is a case where fine surface irregularities and a photocatalyst layer (TiO ₂ ) are formed. As can be seen in Figure 16, it can be seen that the transmittance is significantly increased by the photocatalyst layer formed on the fine surface irregularities according to the present invention, it can be seen that the transmittance is 95% or more in the visible light region of 500nm or more.

Hereinafter, a method of forming the opposing surface unevenness 110 ′ in which the unevenness 110 of the substrate 100 is not formed, and forming the photocatalyst layer 300 ′ will be described in detail.

7 is a perspective view showing the substrate surface conversion step (S60). Referring to FIG. 7, the substrate surface converting step S60 may include unevenness through the bead arranging step S10 to bead removing step S40 or the bead arranging step S10 to photocatalytic layer forming step S50. In order to form the same concave-convex 100 'as the concave-convex 100 on the opposite side of the surface of the substrate 100 on which the 110 is formed, it means a preparation step of inverting the substrate 100 to 180 °.

FIG. 8 illustrates a secondary bead arranging step S70, and a plurality of beads 200 having a spherical shape on an unprocessed opposing surface of the substrate 100 through a method similar to the bead arranging step S10. ') Is arranged in a single layer.

Here, it is preferable to clean the substrate 100 prior to arranging the beads 200 ', and when cleaning the substrate 100 before arranging the beads 200 in the bead arranging step S10. , The other side of the substrate 100 is also preferably washed together.

In addition, the specific method of arranging the beads 200 ′ in the secondary bead arranging step S70 and the characteristics of the beads are similar to those of the bead arranging step S10, and thus detailed description thereof will be omitted.

Next, Figure 9 is a perspective view showing a secondary bead etching step (S80). Referring to FIG. 9, in the secondary bead etching step S80, the etching of the plurality of beads 200 ′ may be performed to form an etching mask having a predetermined interval R spaced between the beads 200 ′. Since specific implementation methods and conditions are similar to the bead etching step (S20), a detailed description thereof will be omitted.

10 is a perspective view illustrating a secondary substrate etching step S90. Referring to FIG. 10, in the secondary substrate etching step S90, the surface of the substrate 100 is etched by etching the opposite surface of the substrate 100 using the plurality of beads 200 ′ as an etching mask. Step, the specific implementation method is similar to the substrate etching step (S30), so a detailed description thereof will be omitted.

11 is a perspective view showing the secondary bead removal step (S100). Referring to FIG. 11, the second bead removing step (S100) is a step of removing the plurality of beads 200 ′ from the opposite surface of the etched substrate 100. The specific method of removing the beads 200 ′ is similar to that of the bead removing step S4, and thus a detailed description thereof will be omitted.

Next, FIG. 12 is a perspective view illustrating a second photocatalyst layer forming step S110. Referring to FIG. 12, the second photocatalyst layer forming step (S110) is a step of forming a photocatalyst layer on an opposite surface on which the surface irregularities 110 ′ are formed, and the photocatalytic layer 300 ′ is formed on the substrate 100. Since the coating method is similar to that in the photocatalytic layer forming step S50, a detailed description thereof will be omitted.

Based on the glass, through the manufacturing method of the functional surface according to the present invention described above, the functional glass can be produced, characterized in that the functional glass has a reflectance of 5% or less by the surface irregularities, photolysis of the photocatalyst layer It is characterized in that it is a superhydrophilic glass having a self-purifying ability, and in detail, it is characterized by being a superhydrophilic glass having a contact angle within 10 kV by the surface irregularities and photocatalyst layer.

More specifically, the glass is characterized in that the surface irregularities according to the present invention on the two opposing surfaces having a reflectivity of 1% or less, superhydrophilic glass having a self-purifying ability by photolysis of the photocatalyst layer.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed embodiments, but, on the contrary, Those skilled in the art will recognize that many modifications and variations are possible in light of the above teachings.

Therefore, the spirit of the present invention should not be limited to the described embodiments, and all of the equivalents or equivalents of the claims as well as the claims to be described later will belong to the scope of the present invention. .

1 is an example showing a process diagram of a functional surface manufacturing method according to the present invention,

2 is a perspective view showing a state where the beads are arranged on one surface of the substrate,

FIG. 3 (a) is a perspective view illustrating a state in which the beads of FIG. 2 are etched, and FIG. 3 (b) is an enlarged view showing an enlarged area 'A' of FIG. 3 (a).

4 is a perspective view showing a state in which the substrate of Figure 3 (a) is etched,

5 is a perspective view illustrating a state in which beads are removed from one surface of the substrate of FIG. 4;

FIG. 6 is a perspective view illustrating a photocatalyst layer formed on one surface of the substrate of FIG. 5;

FIG. 7 is a perspective view illustrating a state in which the substrate of FIG. 6 is turned over;

FIG. 8 is a perspective view illustrating a state in which beads are arranged on opposite surfaces of the substrate of FIG. 7;

FIG. 9 is a perspective view illustrating a state in which the bead of FIG. 8 is etched.

FIG. 10 is a perspective view illustrating a state in which the substrate of FIG. 9 is etched.

FIG. 11 is a perspective view illustrating a state in which beads are removed from opposite surfaces of the substrate of FIG. 10.

12 is a perspective view illustrating a state in which a photocatalyst layer is formed on an opposite surface of the substrate of FIG. 11;

13 is a scanning electron micrograph of the surface of the substrate on which fine irregularities are formed by the functional surface manufacturing method of the present invention.

14 is an optical photograph of a functional glass having a functional surface according to the present invention formed on a single surface using a glass plate as a transparent substrate,

15 is a measure of the contact drop (sessile drop method) with the water droplets before and after the formation of the photocatalyst layer 300 according to the present invention,

Figure 16 measures the transmittance of the functional glass according to the present invention.

DESCRIPTION OF THE REFERENCE SYMBOLS

100: description 110, 110 ': fine iron

200, 200 ': Bead 300, 300': Photocatalyst layer

Claims (11)

In the manufacturing method of the functional surface having a purification ability by photolysis and having a super hydrophilic antireflection ability, a) arranging a plurality of beads having a spherical shape on one surface of the transparent substrate in a single layer; b) etching the plurality of beads to form a constant separation distance between the beads; c) etching the substrate with an etching mask on the plurality of beads having the predetermined distance to form surface irregularities on one surface of the substrate; d) removing the plurality of beads from one surface of the substrate; e) forming a photocatalyst layer on one surface of the substrate on which the surface irregularities are formed; f) arranging a plurality of beads having a spherical shape in a single layer on an opposite surface that is a surface facing one surface of the substrate on which the surface irregularities are formed; g) etching the plurality of beads arranged on the opposite surface to form a constant separation distance between the beads; h) etching the substrate with an etching mask on the plurality of beads having a predetermined distance to form surface irregularities on the opposite surface; And i) removing the plurality of beads from the opposite surface; Method for producing a functional surface to be carried out including. delete The method of claim 1, The transparent substrate is glass, and the bead is a method for producing a functional surface, characterized in that the plastic. The method according to claim 1 or 3, The arranged bead satisfies relation 1 below, and the distance between the etched beads satisfies relation 2 below. (Relationship 1) 50 nm ≤ R _mean ≤ 200 nm (The above R _mean is the average diameter of the beads.) (Relationship 2) 5 nm ≤ R ≤ 100 nm (R is the separation distance between beads.) The method of claim 4, wherein The surface irregularities formed by the etching of the base material satisfy the following relational formula (3). (Relationship 3) 50 nm ≤ D ≤ 1500 nm (D is a step of surface irregularities.) The method of claim 3, The etching of the beads and the etching of the substrate are directional dry etching using etching gas, respectively, and the beads are etched by etching gas containing O ₂ , CF ₄ , Ar, or a mixed gas thereof. The substrate is etched by etching gas containing CF ₄ , SF ₆ , HF or a mixture of these. The method of claim 6, The method of the functional surface, characterized in that the etching gas for the substrate contains a H ₂ more. The method of claim 1, The beads are spin-coating, dip-coating, lifting up, electrophoretic deposition, chemical or electrochemical deposition and electrospray. A method for producing a functional surface, characterized in that arranged on the surface of the substrate by any one or more methods selected. The method of claim 3, And the photocatalyst layer is TiO ₂ , ZnO, WO ₃ , SnO ₂ , Bi ₂ O ₃ , or a mixture thereof. The method of claim 9, The photocatalyst layer is deposited by at least one method selected from organometallic chemical vapor deposition (MOCDV), plasma organometallic chemical vapor deposition (PE-MOCVD), atomic layer deposition (ALD), magnetron sputtering, and electrospry. Method for producing a functional surface. delete

Images