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KR100855174B1 - 기판 돔을 포함하는 진공 장치, 그 조립 및 분해 방법, 및 기판 돔을 포함하는 진공장치에서의 성막 방법 - Google Patents

기판 돔을 포함하는 진공 장치, 그 조립 및 분해 방법, 및 기판 돔을 포함하는 진공장치에서의 성막 방법 Download PDF

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Publication number
KR100855174B1
KR100855174B1 KR1020067022026A KR20067022026A KR100855174B1 KR 100855174 B1 KR100855174 B1 KR 100855174B1 KR 1020067022026 A KR1020067022026 A KR 1020067022026A KR 20067022026 A KR20067022026 A KR 20067022026A KR 100855174 B1 KR100855174 B1 KR 100855174B1
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KR
South Korea
Prior art keywords
dome
substrate
base
rotating mechanism
side gear
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020067022026A
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English (en)
Korean (ko)
Other versions
KR20070024518A (ko
Inventor
유타카 후세
타츠미 아베
마사유키 타키모토
히로유키 코무로
카즈히토 아오나하타
Original Assignee
가부시키가이샤 쇼와 신쿠
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 쇼와 신쿠 filed Critical 가부시키가이샤 쇼와 신쿠
Publication of KR20070024518A publication Critical patent/KR20070024518A/ko
Application granted granted Critical
Publication of KR100855174B1 publication Critical patent/KR100855174B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/548—Controlling the composition

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
KR1020067022026A 2004-06-25 2005-01-24 기판 돔을 포함하는 진공 장치, 그 조립 및 분해 방법, 및 기판 돔을 포함하는 진공장치에서의 성막 방법 Expired - Fee Related KR100855174B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004187285A JP4002959B2 (ja) 2004-06-25 2004-06-25 基板ドーム回転機構
JPJP-P-2004-00187285 2004-06-25

Publications (2)

Publication Number Publication Date
KR20070024518A KR20070024518A (ko) 2007-03-02
KR100855174B1 true KR100855174B1 (ko) 2008-08-29

Family

ID=35776645

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020067022026A Expired - Fee Related KR100855174B1 (ko) 2004-06-25 2005-01-24 기판 돔을 포함하는 진공 장치, 그 조립 및 분해 방법, 및 기판 돔을 포함하는 진공장치에서의 성막 방법

Country Status (4)

Country Link
JP (1) JP4002959B2 (ja)
KR (1) KR100855174B1 (ja)
CN (1) CN1946873B (ja)
WO (1) WO2006001095A1 (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008138276A (ja) * 2006-12-05 2008-06-19 Tsukishima Kikai Co Ltd 真空成膜装置
CN104651795B (zh) * 2015-03-10 2017-01-11 丹阳市鼎新机械设备有限公司 一种镜片真空镀膜机用旋转台
JP6019310B1 (ja) * 2015-04-16 2016-11-02 ナルックス株式会社 蒸着装置及び蒸着装置による成膜工程を含む製造方法
EP3840012A1 (en) * 2019-12-20 2021-06-23 Essilor International Optimized crucible assembly and method for physical vapor deposition

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0429654A (ja) * 1990-05-25 1992-01-31 Honda Motor Co Ltd ３組の遊星歯車列を用いた一体遊星歯車変速機
JPH0835065A (ja) * 1994-07-22 1996-02-06 Murata Mfg Co Ltd 真空成膜装置
KR960013625B1 (ko) * 1992-12-22 1996-10-10 재단법인 한국전자통신연구소 진공 열증착장치
JP2001073136A (ja) * 1999-09-08 2001-03-21 Showa Shinku:Kk 光学薄膜製造装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0754286Y2 (ja) * 1990-06-27 1995-12-18 関西日本電気株式会社 蒸着用プラネタ
DE19680845C1 (de) * 1996-11-01 2002-06-06 Theva Duennschichttechnik Gmbh Vorrichtung zur Herstellung oxidischer Dünnschichten

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0429654A (ja) * 1990-05-25 1992-01-31 Honda Motor Co Ltd ３組の遊星歯車列を用いた一体遊星歯車変速機
KR960013625B1 (ko) * 1992-12-22 1996-10-10 재단법인 한국전자통신연구소 진공 열증착장치
JPH0835065A (ja) * 1994-07-22 1996-02-06 Murata Mfg Co Ltd 真空成膜装置
JP2001073136A (ja) * 1999-09-08 2001-03-21 Showa Shinku:Kk 光学薄膜製造装置

Also Published As

Publication number Publication date
WO2006001095A1 (ja) 2006-01-05
KR20070024518A (ko) 2007-03-02
JP2006009082A (ja) 2006-01-12
JP4002959B2 (ja) 2007-11-07
CN1946873B (zh) 2010-09-29
CN1946873A (zh) 2007-04-11

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