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KR100803834B1 - Chuck of Photoresist Rotary Applicator - Google Patents

Chuck of Photoresist Rotary Applicator Download PDF

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Publication number
KR100803834B1
KR100803834B1 KR1020060079065A KR20060079065A KR100803834B1 KR 100803834 B1 KR100803834 B1 KR 100803834B1 KR 1020060079065 A KR1020060079065 A KR 1020060079065A KR 20060079065 A KR20060079065 A KR 20060079065A KR 100803834 B1 KR100803834 B1 KR 100803834B1
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South Korea
Prior art keywords
chuck
bracket
disc
glass substrate
photoresist
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Korean (ko)
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주이청 쳉
시안 쉔 창
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프라임 뷰 인터내셔널 코오포레이션 리미티드
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G03F7/70708—Chucks, e.g. chucking or un-chucking operations or structural details being electrostatic; Electrostatically deformable vacuum chucks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
    • H10P72/72—

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

포토레지스트 회전 도포기의 척은 브래킷과 원판을 가진다. 브래킷은The chuck of the photoresist rotary applicator has a bracket and a disc. Bracket

전도성이 있다. 원판은 베이스에 장착되고, 유리기판을 유지하며 도전성이 있다.It is conductive. The disc is mounted on the base, holds the glass substrate and is conductive.

그러므로, 유리기판이 척으로부터 제거될 때 정전기에 의해 유리기판이 손상되는 것을 방지하기 위하여 원판은 원판 위의 정전기를 방전할 수 있게 한다.Therefore, in order to prevent the glass substrate from being damaged by static electricity when the glass substrate is removed from the chuck, the original plate can discharge the static electricity on the original plate.

Description

포토레지스트 회전 도포기의 척{CHUCK FOR A PHOTORESIST SPIN COATER}CHUCK FOR A PHOTORESIST SPIN COATER}

도 1은 베이스 상에 본 발명에 따른 포토레지스트 회전 도포기의 척에 대한 사시도,1 is a perspective view of a chuck of a photoresist rotary applicator according to the invention on a base,

도 2는 도 1에 도시된 척을 가진 포토레지스트 회전 도포기의 확대 사시도,FIG. 2 is an enlarged perspective view of a photoresist rotary applicator with the chuck shown in FIG. 1;

도 3은 베이스 위의 도 2에 도시된 척을 가진 포토레지스트 회전 도포기 부분 단면에 대한 측면도,3 is a side view of a photoresist rotary applicator partial cross section with the chuck shown in FIG. 2 above a base;

도 4는 베이스 위의 도 2에 도시된 척을 가진 포토레지스트 회전 도포기 부분 단면과 전도 경로를 화살표로 나타내는 측면도, FIG. 4 is a side view of the photoresist rotary applicator partial cross-section with the chuck shown in FIG. 2 above the base and the conduction path as arrows;

도 5는 종래 기술에 따른 종래의 포토레지스트 회전 도포기의 사시도.5 is a perspective view of a conventional photoresist rotary applicator according to the prior art.

본 발명은 척에 관한 것으로, 특히 유리기판을 척으로부터 분리시 정전기에 의해 유리기판이 손상되는 것을 방지하기 위한 포토레지스트 회전 도포기의 척에 관한 것이다.The present invention relates to a chuck, and more particularly, to a chuck of a photoresist rotary applicator for preventing the glass substrate from being damaged by static electricity when the glass substrate is separated from the chuck.

LCD(액정 표시장치)는 얇고 가벼우며 유리기판을 갖고 있기 때문에 점차 LCD가 표시장치 시장을 지배해 나가고 있다. LCD를 생산하는 과정은 포토리도그래피처 리를 이용하여 유리 기판에 박막 트랜지스터와 회로를 형성하는 것을 포함한다. As LCDs (liquid crystal displays) are thin, light, and have glass substrates, LCDs dominate the display market. The process of producing an LCD includes forming a thin film transistor and a circuit on a glass substrate using photolithography.

이 포토리도그래피처리는 유리기판에 균일하게 포토레지스트 층을 도포한 다음에 현상처리를 행하기 전에 마스크로부터 포토레지스트 층으로 패턴을 전사시킨다.This photolithographic process applies a photoresist layer uniformly to the glass substrate and then transfers the pattern from the mask to the photoresist layer before developing.

도 5에 도시되는 바와 같이, 유리기판 위에 포토레지스트를 도포하는 종래의 방법은 포토레지스트 회전 도포기에 의한 것이다. 포토레지스트 회전 도포기는 모터, 진공 펌프, 축(90)과 척(91)을 포함한다. 축(91)은 회전가능하게 모터에 연결되고 모터에 의해 구동된다. 절연 재료로 만들어지고 흡입원판인 축(91)은 위에 장착되며 관으로 진공펌프에 연결되어 서로 통하게 된다. 진공 펌프가 척(91)에 흡입 효과를 제공할 수도 있다.As shown in Fig. 5, the conventional method of applying photoresist on a glass substrate is by a photoresist rotary applicator. The photoresist rotary applicator includes a motor, a vacuum pump, a shaft 90 and a chuck 91. The shaft 91 is rotatably connected to the motor and driven by the motor. Shafts 91, which are made of an insulating material and which are suction discs, are mounted on and connected to a vacuum pump by a tube and communicate with each other. A vacuum pump may provide a suction effect to the chuck 91.

포토레지스트가 도포될 때, 유리기판(92)이 척(91) 위에 놓여지고 포토레지스트가 유리기판(92)의 중앙으로 공급된다. 다음에, 진공펌프가 흡입하기 위해 작동되고 그 자리에서 유리기판(92)을 유지하며, 모터가 유리기판(92)을 함께 회전시키기 위해 척(91)을 가진 축(90)을 회전시키도록 동작한다. 그러므로, 포토레지스트는 원심력에 의해 중심부로부터 유리기판(92)의 전체 표면으로 방사상으로 분사된다.When the photoresist is applied, the glass substrate 92 is placed on the chuck 91 and the photoresist is supplied to the center of the glass substrate 92. Next, the vacuum pump is operated for suction and holds the glass substrate 92 in place, and the motor is operated to rotate the shaft 90 with the chuck 91 to rotate the glass substrate 92 together. do. Therefore, the photoresist is ejected radially from the center portion to the entire surface of the glass substrate 92 by centrifugal force.

유리기판(92) 위에 포토레지스트 액이 도포된 후, 유리기판(92)은 척(91)으로부터 제거한다. 그러나, 척(91)을 제거한 유리기판(92)에는 척(91)의 상부에 약 15-16 KV의 정전기를 갖게 된다. 고전압의 정전기는 유리기판(92)의 회로에 손상을 주어 유리기판(92)의 생산율이 감소한다.After the photoresist liquid is applied onto the glass substrate 92, the glass substrate 92 is removed from the chuck 91. However, the glass substrate 92 from which the chuck 91 is removed will have static electricity of about 15-16 KV on top of the chuck 91. The high voltage static electricity damages the circuit of the glass substrate 92 and reduces the production rate of the glass substrate 92.

본 발명의 목적은 유리기판이 척으로부터 제거될 때 정전기에 의해 유리기판이 손상되는 것을 방지하기 위한 포토레지스트 회전 도포기의 척을 제공하는 것이다.It is an object of the present invention to provide a chuck of a photoresist rotary applicator for preventing the glass substrate from being damaged by static electricity when the glass substrate is removed from the chuck.

상술한 목적을 달성하기 위해, 본 발명에 따른 포토레지스트 회전 도포기의 척은 브래킷과 원판을 포함한다. 브래킷은 정전기적으로 전도성이 있다. 원판은 베이스 위에 장착되고, 유리기판을 유지하고 정전기적으로 전도성이 있다. 그러므로, 원판은 유리기판이 척으로부터 제거될 때 정전기에 의해 유리기판이 손상되는 것을 방지하기 위해 정전기를 방전하도록 한다.In order to achieve the above object, the chuck of the photoresist rotary applicator according to the present invention comprises a bracket and a disc. The bracket is electrostatically conductive. The disc is mounted on the base, holds the glass substrate and is electrostatically conductive. Therefore, the disc allows discharge of static electricity to prevent the glass substrate from being damaged by static electricity when the glass substrate is removed from the chuck.

본 발명의 그 밖의 목적,이점과 새로운 특징은 본 명세서의 기술 및 첨부도면에 의해 더욱 명확하게 될 것이다.Other objects, advantages and novel features of the invention will become apparent from the description and the accompanying drawings.

도 1-3에서 제시하는 바와 같이, 본 발명에 따른 척은 포토레지스트 회전 도포기에 장착된다. 포토레지스트 회전 도포기는 접지되어 있는 베이스(80) 위에 장착되고, 모터, 축(10) 과 펌프를 가지고 있다. 모터와 진공펌프는 베이스(80) 위에 고정된다. 축(10)은 정전기적으로 전도성이 있고, 베이스(80)위에 장착되며, 모터에 회전하게 연결되어 구동되고, 상부단면 및 상부단면에 근접하여 축(10) 안에 가로로 된 장착 스롯(11)을 가지고 있다.As shown in Figures 1-3, the chuck according to the present invention is mounted to a photoresist rotary applicator. The photoresist rotary applicator is mounted on a grounded base 80 and has a motor, a shaft 10 and a pump. The motor and the vacuum pump are fixed on the base 80. The shaft 10 is electrostatically conductive, mounted on the base 80, driven in rotation to a motor and mounted horizontally in the shaft 10 in close proximity to the upper and upper sections 11. Have

도2 와 도3에서, 척은 축(10)의 상단에 장착되고 브래킷(20)과 원판(30)을 포함한다.2 and 3, the chuck is mounted on top of the shaft 10 and includes a bracket 20 and a disc 30.

브래킷(20)은 전도성이 있는 금속과 같은 정전기적으로 전도성을 지닌 물질로 이루어진다. 브래킷(20)은 분리할 수 있게 축(10)의 상단에 장착되고 중앙부, 바닥부, 중앙구멍(21)과 슬리브(22)를 가지고 있다. 중앙구멍(21)은 브래킷(20)의 중앙을 통하도록 되어 있고 관을 통해 진공펌프와 연결되어 진공펌프가 중앙구멍(21) 안에 흡착효과를 제공할 수도 있다. 슬리브(22)는 브래킷(20)의 바닥으로부터 아래로 돌출되어있고, 축(10)의 상단을 둘러싸서 장착되며 공동(221), 위치결정구멍(223)과 볼트(225)를 포함한다. 공동(221)은 슬리브에서 축방향으로 있고, 축(10)의 상단을 수용한다. 위치결정구멍(223)은 슬리브에서 방사 방향으로 되어 있고, 공동(221)과 통하며 나삿니로 되어 있다. 볼트(225)는 분리가능하게 위치결정구멍(223)에 장착되고 축(10) 안에 장착스롯(11)으로 연장되어 축(10)과 베이스(80)를 함께 조인다.The bracket 20 is made of an electrostatically conductive material, such as a conductive metal. The bracket 20 is detachably mounted on the top of the shaft 10 and has a center portion, a bottom portion, a center hole 21 and a sleeve 22. The central hole 21 is configured to pass through the center of the bracket 20 and may be connected to the vacuum pump through a pipe to provide a suction effect in the central hole 21. The sleeve 22 protrudes downward from the bottom of the bracket 20 and is mounted surrounding the top of the shaft 10 and includes a cavity 221, a positioning hole 223 and a bolt 225. The cavity 221 is axially in the sleeve and receives the top of the shaft 10. The positioning hole 223 is radial in the sleeve and is threaded through the cavity 221. The bolt 225 is detachably mounted to the positioning hole 223 and extends into the mounting slot 11 in the shaft 10 to tighten the shaft 10 and the base 80 together.

원판(30)은 베이스(80) 위에 장착되고, 유리기판을 접촉하여 유지하며, 탄소, 흑연, 금속과 같이 정전기적으로 전도성이 있는 물질과 전기를 통하는 물질로 이루어진다. 원판의 저항율은 103-105 Ω/sq이 바람직하다. 원판(30)은 중앙부, 상부, 관통구멍(31), 다수의 방사상의 틈(32)과 다수의 환상의 틈(33)을 포함한다. 관통구멍(31)은 원판(30)의 중앙을 관통하고 브래킷(20) 안의 중앙구멍(21)과 연결된다. 방사상의 틈(32)은 원판(30)의 상부에 있고 관통구멍(31)과 연통된다. 환상의 틈(33)은 원판(30)의 상부에 있고 방사상의 틈(32)과 연통되고 동심원으로 배열된다. 진공펌프가 작동될 때, 진공펌프에 의해 마련된 흡입력이 방사상과 환상의 틈(31, 32)에 도달해서 척 위에 유리기판을 안전하게 유지하도록 한다.The disc 30 is mounted on the base 80, and keeps the glass substrate in contact with each other, and is made of an electrically conductive material such as carbon, graphite, and metal and an electrically conductive material. The resistivity of the master is preferably 10 3 -10 5 Ω / sq. The disc 30 includes a central portion, an upper portion, a through hole 31, a plurality of radial gaps 32 and a plurality of annular gaps 33. The through hole 31 passes through the center of the disc 30 and is connected to the central hole 21 in the bracket 20. The radial gap 32 is at the top of the disc 30 and communicates with the through hole 31. The annular gap 33 is on top of the disc 30 and is in communication with the radial gap 32 and arranged concentrically. When the vacuum pump is operated, the suction force provided by the vacuum pump reaches radial and annular gaps 31 and 32 to securely hold the glass substrate on the chuck.

도2 와 도3에서, 원판(30), 브래킷(20), 축(10), 모터와 베이스(80)는 정전기 방전경로로 형성된다. 유리기판이 포토레지스트로 도포된 후에, 유리기판이 척으로부터 제거될 때 원판(30) 위 정전기는 정전기 방전경로를 통해 접지로 빠져나가 유리기판이 정전기에 의해 손상되는 것을 방지한다.2 and 3, the disc 30, the bracket 20, the shaft 10, the motor and the base 80 are formed by an electrostatic discharge path. After the glass substrate is applied with the photoresist, the static electricity on the disc 30 escapes to ground through the electrostatic discharge path when the glass substrate is removed from the chuck to prevent the glass substrate from being damaged by the static electricity.

그러므로, 베이스(80), 척과 원판(30)은 정전기를 정전기 방전경로를 통해 방전하도록 해서 원판 위의 유리기판이 정전기에 의해 손상되지 않도록 한다. 그 결과, 유리기판의 생산율은 증가한다.Therefore, the base 80, the chuck and the disk 30 discharge the static electricity through the electrostatic discharge path so that the glass substrate on the disk is not damaged by the static electricity. As a result, the production rate of glass substrates increases.

Claims (8)

삭제delete 정전기 전도 물질로 이루어진 브래킷과 Brackets made of electrostatic conductive material 상기 브래킷 상에 장착되며 탄소인 정전기 전도 물질로 만들어진 원판을 포함하는 것을 특징으로 하는 포토레지스트 회전 도포기의 척.A chuck of a photoresist rotary applicator, characterized in that it comprises a disc mounted on said bracket and made of an electrostatic conductive material which is carbon. 정전기 전도 물질로 이루어진 브래킷과 Brackets made of electrostatic conductive material 상기 브래킷 상에 장착되며 흑연인 정전기 전도 물질로 만들어진 원판을 포함하는 것을 특징으로 하는 포토레지스트 회전 도포기의 척.A chuck of a photoresist rotary applicator characterized in that it comprises a disc mounted on said bracket and made of an electrostatic conductive material which is graphite. 삭제delete 제 2항 또는 제3항에 있어서,The method according to claim 2 or 3, 상기 원판의 저항율이 103-105 Ω/sq인 것을 특징으로 하는 포토레지스트 회전 도포기의 척.The resist of the original plate is 10 3 -10 5 Ω / sq. 제 5항에 있어서,The method of claim 5, 상기 브래킷은 바닥부와 회전축 둘레에 장착되고 상기 브래킷의 바닥으로부터 아래로 돌출된 슬리브를 갖고, The bracket has a sleeve mounted about a bottom portion and a rotation axis and protruding downward from the bottom of the bracket, 상기 슬리브는 슬리브 안에서 축방향으로 있는 공동, 상기 슬리브에서 방사 방향으로 되어 있고 상기 공동과 통하는 위치결정 구멍과 상기 위치결정 구멍을 통해 분리가능하게 장착된 볼트를 가진 것을 특징으로 하는 포토레지스트 회전 도포기의 척.The sleeve having a cavity axially within the sleeve, a positioning hole radially in the sleeve and communicating with the cavity and a bolt detachably mounted through the positioning hole Pretend. 제 6항에 있어서,The method of claim 6, 상기 브래킷은 중심부와 상기 브래킷의 중심을 통하며 관을 통해 진공펌프와 연통하는 중앙구멍을 더 포함하고, The bracket further includes a central hole through the center and the center of the bracket and in communication with the vacuum pump through the tube, 상기 원판은 중앙부와 상기 원판의 중앙을 관통하며 상기 브래킷의 상기 중앙구멍과 연결되는 관통구멍을 더 포함하는 것을 특징으로 하는 포토레지스트 회전 도포기의 척.And the disc further comprises a through hole penetrating the central portion and the center of the disc and connected to the central hole of the bracket. 제 7항에 있어서,The method of claim 7, wherein 상기 원판은 상부, 상기 원판의 상부에 있고 상기관통구멍과 연통되는 다수의 방사상 틈 및 상기원판의 상부에 있고 상기 방사상 틈과 연결되는 다수의 환상 틈을 더 포함하는 것을 특징으로 하는 포토레지스트 회전 도포기의 척.The disc further comprises a top, a plurality of radial gaps on top of the disc and in communication with the through hole and a plurality of annular gaps on top of the disc and connected to the radial gaps. Chuck of the flag.
KR1020060079065A 2006-08-21 2006-08-21 Chuck of Photoresist Rotary Applicator Expired - Fee Related KR100803834B1 (en)

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JPH1110053A (en) * 1997-06-18 1999-01-19 Dainippon Screen Mfg Co Ltd Substrate processing equipment
JP2002273312A (en) * 2001-03-05 2002-09-24 Tokyo Electron Ltd Liquid supply device
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