KR0150291B1 - Drying of resist film and device thereof - Google Patents

Abstract

It is to provide a method and apparatus for drying a resist film, which can easily find a dry position without being influenced by the film thickness of the resist film and in which the resist film can be brought to a predetermined dry state at a desired position in the drying furnace.

In the drying apparatus of the resist film which passes through the inside of the drying furnace 1 and conveys the strip | belt-shaped material 7 to which the resist film was apply | coated in the longitudinal direction, about the conveyance direction of the raw material 7 in the furnace 1 A material temperature measuring means 3 for measuring the temperature of the material at a plurality of different positions, an atmosphere temperature measuring means 4 for measuring the ambient temperature in the drying furnace at each position where the temperature of the material is measured, and each of And a drying condition adjusting means (2) for adjusting the drying conditions in the drying furnace such that the resist film is in a dry state at a desired position in the drying furnace at a position where the temperature of the material and the ambient temperature are the same at each other.

Description

Method and apparatus for drying resist film.

1 is a schematic diagram showing main parts of an apparatus of one embodiment of the present invention.

2 is a floor diagram showing control of the embodiment of the present invention.

3 is a schematic diagram showing main parts of a device of another embodiment of the present invention.

4 is a graph showing an example of absorbance in each chamber of the prior art.

* Explanation of symbols for main parts of the drawings

1: drying furnace 2: drying condition adjusting means

3: material temperature measuring means 4: atmosphere temperature measuring means

5: drying position detecting means 6: staggered amount detecting means

7 material 8: display means

9: drying conditions setting means

The present invention relates to a method and apparatus for drying a resist film coated on a strip-shaped material, and more particularly, to a resist film coated on a strip-shaped material in a manufacturing process such as a shadow mask used for a color CRT or a lead frame used for a semiconductor device. It relates to a drying method and apparatus for drying.

Generally, the shadow mask used for a color CRT and the lead frame used for a semiconductor element are manufactured by the photoetching method. This method includes a coating step of applying a resist film to a strip-shaped material, an exposure step of printing a predetermined pattern on the applied resist film, a developing step of dissolving and removing an unexposed resist film in a exposure step with a developer, and a developing step The remaining resist film is then subjected to a high temperature treatment to dry and strengthen the resist film, and an etching process for etching strip material using the remaining resist film as a mask pattern. In the above-mentioned burning process. Proper drying of the resist film is important for etching the strip-shaped material in a desired pattern in the subsequent etching step, and greatly affects the quality of the final product.

As disclosed in Japanese Patent Laid-Open Publication No. 91-256049, a strip-shaped material coated with a resist film is passed through a drying furnace while being conveyed in its longitudinal direction to a resist film at a plurality of positions different from each other in the conveying direction of the material. BACKGROUND ART A method and apparatus for drying a resist film are known which measure the amount of moisture contained and set the drying conditions in the drying furnace so that the resist film is in a predetermined drying state at a desired position in the drying furnace based on the amount of moisture measured at each position.

The drying furnace disclosed by the said publication is comprised by enumerating seven chambers which can set the ambient temperature in a drying furnace to a predetermined value in the conveyance direction of a raw material. Each chamber is called the 1st-7th chamber in the upstream of a conveyance direction. In addition, the amount of moisture contained in the resist film is measured at nine measurement positions, respectively, at the inlet of the chamber and the drying furnace and at the outlet of the drying furnace. As an example of a moisture meter used to measure the amount of water, a water meter is disclosed in which light of absorption wavelength of water and light of non-absorption wavelength of water are simultaneously brought into contact with a resist film and the absorbance which is the intensity ratio of these lights reflected through the film is obtained. have.

Moreover, the above-mentioned publication discloses a method as described below as a method for obtaining a dry position which is a position in a drying furnace in which a resist film is in a predetermined dry state.

A graph showing the absorbance at each measurement position is obtained, with the abscissa being the measurement position where the absorbance is measured and the absorptivity being the ordinate. 4 is an example of the graph, in which the dry position is found at the intersection of the curves extending from each of the fourth to sixth chambers and the curves extending from the exit of the seventh chamber.

However, according to the method of obtaining the above-mentioned dry position, the problem as described below arises.

The amount of water contained in the applied resist film depends on the film thickness of the resist film, and when the film thickness is thick, the moisture content is large, and on the contrary, when the film thickness is small, when the film thickness is changed, the graph shown in FIG. You must ask every time. Therefore, it is very troublesome to find a dry position.

In view of the foregoing, it is an object of the present invention to dry a resist film that can easily find a dry position without being affected by the film thickness of the resist film, and that the resist film can be made in a predetermined dry state at a desired position in the drying furnace. A method and apparatus are provided.

Further, another object of the present invention is to provide a resist film drying apparatus capable of easily finding a position without being affected by the film thickness of the resist film.

The method for drying a resist film according to claim 1 is a method of drying a resist film in which a strip-shaped material coated with a resist film is passed through a drying furnace while being transported in the longitudinal direction thereof, with respect to the conveying direction of the material in the drying furnace. Measuring the temperature of the material at a plurality of different locations, and measuring the ambient temperature in the drying furnace at each location where the temperature of the material is measured, and wherein the temperature of the material and the temperature of the atmosphere are the same at each of the locations. And a step of setting the drying conditions in the drying furnace such that the resist film is in a predetermined drying state at a desired position in the drying furnace at the position.

The apparatus for drying a resist film of claim 2 is a drying apparatus for a resist film in which a strip-shaped material coated with a resist film is passed through a drying furnace while being transported in the longitudinal direction thereof, wherein the resist film is dried in a drying furnace with respect to a material conveying direction. Material temperature measuring means for measuring the temperature of the material at a plurality of locations respectively, Atmosphere temperature measuring means for measuring the ambient temperature in the drying furnace at each location where the temperature of the material is measured, and the temperature and atmosphere of the material at each of the locations And drying conditions setting means for setting the drying conditions in the drying furnace such that the resist film is in a predetermined drying state at a desired position in the drying furnace at a position where the temperatures are equal to each other.

3. The apparatus for drying a resist film according to claim 3, wherein the drying condition setting means includes drying position detecting means for obtaining a drying position at which the resist film is in a drying state at which the resist film is in a predetermined drying state at the temperature of the material at the respective positions and the ambient temperature; And a staggered amount detecting means for obtaining staggered amounts between a desired position and a dry position, and a dry condition adjusting means for adjusting the dry conditions in the drying furnace such that the dry position is located at a desired position in response to the staggered amount.

The resist film drying apparatus according to claim 4 is characterized in that a radiation thermometer is used as a material temperature measuring means in the resist film drying apparatus according to claim 2 or 3.

The apparatus for drying a resist film according to claim 5 is a resist apparatus for drying a resist film in which a strip-shaped material coated with a resist is passed in the longitudinal direction thereof and then dried in a drying furnace, wherein the resist film is dried with respect to the conveying direction of the material in the drying furnace. Material temperature measuring means for measuring the temperature of the material at a plurality of different positions respectively, Atmosphere temperature measuring means for measuring the ambient temperature in the drying furnace at each position where the temperature of the material is measured, and Temperature and atmosphere of the material at each of the positions And display means for displaying the dry state of the resist film at each position with temperature.

The drying apparatus of the resist film of Claim 6 is characterized in that the display means displays the temperature of the raw material and the ambient temperature at each of the above positions.

The drying apparatus of the resist film of Claim 7 is characterized in that the display means displays the temperature difference between the temperature of the raw material and the ambient temperature at each of the above positions.

The drying apparatus of the resist film of Claim 8 is characterized in that the display means displays the presence or absence of the temperature difference between the temperature of the raw material and the ambient temperature at the respective positions.

The function of the drying method of the resist film of Claim 1 is demonstrated below.

The strip-shaped material coated with the resist film passes through the drying furnace while being conveyed in the longitudinal direction. The temperature of the raw material is measured at a plurality of positions different from each other in the conveying direction of the raw material in the drying furnace. The ambient temperature in the drying furnace is measured at each of the above positions where the temperature of the material is measured. The drying conditions in the drying furnace are set so that the resist film becomes a predetermined drying state at a desired position in the drying furnace at a position where the temperature of the material and the ambient temperature are the same at each of the above positions.

The function of the drying method of the resist film of Claim 2 is demonstrated below.

The strip-shaped material coated with the resist film passes through the drying furnace while being conveyed in its longitudinal direction. The temperature of the raw material is measured by the raw material temperature measuring means at a plurality of positions which are different in the conveying direction of the raw material in the drying furnace. The ambient temperature in the drying furnace is measured by the ambient temperature measuring means at each of the positions where the temperature of the material is measured. The drying conditions in the drying furnace are automatically set by the drying condition setting means such that the resist film is in a predetermined drying state at a desired position in the drying furnace at a position where the material temperature and the ambient temperature are the same at each of the above positions.

The function of the drying apparatus of the resist film of Claim 3 is demonstrated below.

The drying apparatus having a position in the drying furnace in which the resist film is in a predetermined drying state is detected by the drying position detecting means at a position where the material temperature and the ambient temperature at the respective positions are the same. The staggered amount between the desired position and the dry position is detected by the staggered amount detecting means. The drying conditions in the drying furnace are controlled by the drying condition adjusting means in response to the staggered amount.

According to the drying apparatus of the resist film of Claim 4, the temperature of a raw material is measured by a radiation thermometer without contacting a raw material.

In the drying apparatus of the resist film of Claim 5, the strip | belt-shaped material to which the resist film was apply | coated is passed in the longitudinal direction, and passes through a drying furnace. The temperature of the raw material is respectively measured by the atmospheric temperature measuring means at a plurality of measured respective positions which are different with respect to the conveying direction of the raw material in the drying furnace. The dry state of the resist film at each position is indicated by the display means.

According to the drying apparatus of the resist film of claim 6, the temperature of the raw material and the ambient temperature are displayed by the display means at the respective positions in the drying furnace as the dry state of the resist film.

According to the drying apparatus of the resist film of claim 7, the temperature difference between the temperature of the raw material and the ambient temperature at each of the positions in the drying furnace as the dry state of the resist film is displayed by the display means.

According to the drying apparatus of the resist film of claim 8, the presence or absence of the temperature of the raw material and the ambient temperature is displayed by the display means at the respective positions in the drying furnace as the dry state of the resist film.

Hereinafter, an embodiment of the present invention will be described. 1 is a schematic diagram showing main parts of an apparatus of one embodiment of the present invention.

In FIG. 1, the raw material 7 is a shadow mask material of 0.05-0.3 mm in the form of long bands, such as an Invar-type alloy containing 36% nickel, a low carbon aluminized steel, and the like. The drying furnace 1 is composed of 100 chambers of the tenth chamber 30 in the first chamber 21 enumerated in the conveying direction of the raw material 7. The conveying rollers 12a and 12b introduce the raw material 7 into the resist bath 10, pick up the raw material 7 soaked with the resist 11 stored in the resist bath 10, and pass through the drying furnace 1. Let's do it. In order to prevent meandering of the raw material 7, the end-fitting roller 13 is designed with a step corresponding to the width of the raw material 7, and accurately introduces the raw material 7 into the resist bath 10. . The resist bath 10 stores the water-soluble resist 11 which consists of casein and dichromate. The radiation thermometers 3a to 3j constitute the material temperature measuring means 3 for measuring the temperature of the resist film (not shown) applied to the material 7 in the chambers 21 to 30, respectively. The thermocouples 4a to 4j respectively constitute atmospheric temperature measuring means 4 for measuring the ambient temperature in the drying furnace 1 in the chambers 21 to 30.

As the material temperature measuring means 3, thermometers using thermocouples, thermistors, etc. in addition to the radiation thermometers 3a to 3j have been studied, but a radiation thermometer capable of measuring the temperature of the material without contacting the material is preferable. In addition, as shown in FIG. 1, without installing the radiation thermometers 3a to 3j inside the drying furnace 1, a window is provided in the drying furnace 1, and the temperature of the material is measured through the window. The radiation thermometers 3a to 3j may be disposed outside the drying furnace 1 so as to be effective.

The drying condition setting means 9 is a drying condition in the drying furnace such that the resist film is in a predetermined dry state at a desired position in the drying furnace 1 at a position where the temperature of the material and the ambient temperature are the same in each chamber 21-30. To set it. The drying condition setting means 9 is constituted by the drying position detecting means 5, the staggered amount detecting means 6, and the drying condition adjusting means 2.

The drying position detecting means 5 detects a position in the drying furnace 1 in the drying furnace 1 where the atmosphere temperature and the temperature of the material are the same, that is, a position where the resist film becomes a predetermined dry state. . In addition, the dry position detecting means 5 is composed of an A / D converter 52 and a CPU 53. The A / D converters 52a to 52j convert analog analog signals output from the radiation thermometers 3a to 3j into digital electrical signals, respectively. The A / D converters 52a to 52j convert analog analog signals output from the thermocouples 4a to 4j into digital electrical signals, respectively. The CPU 53 calculates the temperature difference between the temperature of the raw material and the ambient temperature in each of the chambers 21 to 30 converted into digital electric signals. In addition, the CPU 53 detects the dry position from the temperature difference.

The staggered amount detecting means 6 stores a set drying position which is a desired drying position, and detects a staggered amount between the set dry seed position and the dry position. The staggered amount detecting means 6 is composed of a memory 54 and a comparator 55. The memory 54 stores the setting dry position. The comparator 55 calculates the staggered amount between the set drying position and the drying position.

The drying condition adjusting means 2 adjusts the drying conditions in the drying furnace so that the drying position is located at a desired position in response to the staggered amount. The drying condition adjusting means 2 is composed of fans 50a to 50j and control units 51a to 51j. The fans 50a to 50j send hot air to the respective chambers 21 to 30. The control units 51a to 51j adjust the atmosphere temperatures in the chambers 21 to 30 by controlling the fans 50a to 50j in response to the dry state of the resist film.

Rather, an infrared lamp (not shown) may be provided in each of the chambers 21 to 30 in place of the fans 50a to 50j in FIG. 1, and the output of the infrared lamp may be adjusted depending on the dry state of the resist film.

Further, the dry position detecting means 5 transmits the dry position at the most upstream side in the detected dry position to the staggered amount detecting means. The staggered amount detecting means 6 compares the staggered amount between the set dry position stored in the memory 54 therein and the most upstream dry position transmitted from the dry position detecting means 5 by the comparator 55. Calculate The calculation result is transmitted to the control units 51a to 51j of the drying condition adjusting means 2. The control units 51a to 51j control the rotation speed of the fans 50a to 50j so that the set drying position becomes the drying position, and adjusts the amount of hot air sent to the chambers 21 to 30.

Next, the operation of the above-described embodiment will be described below.

The radiation thermometers 3a to 3j and the thermocouples 4a to 4j respectively output the measurement values of the temperature of the material and the ambient temperature to the drying position detecting means 5 as analog electric signals.

The A / D converter 52 of the dry position detecting means 5 receives analog electric signals output from the radiation thermometers 3a to 3j and the thermocouples 4a to 4j and converts the digital electric signals.

The CPU 53 of the drying position detecting means 5 calculates the temperature difference between the material temperature and the ambient temperature in each of the chambers 21 to 30 converted into digital electric signals. Instead of calculating the temperature difference, the temperature ratio between the temperature of the material and the ambient temperature may be calculated. Table 1 shows an example of the temperature difference between the temperature and the ambient temperature and the calculated temperature of the material measured in this embodiment. However, the temperature of the material shown in Table 1 is the value obtained by multiplying the emissivity of the resist film by the temperature measuring instrument (display value) of the resist film measured by the radiation thermometer.

Further, the CPU 53 of the dry position detecting means 5 detects a dry position which is a position where the resist film is in a predetermined dry state. In the case of Table 1, when there is no temperature difference between the temperature of the raw material and the ambient temperature, the position where the temperature of the raw material and the ambient temperature are the same is the ninth and tenth chambers 29 and 30, and the transfer chambers 29 and 30. The resist film is in a predetermined dry state. In the eighth chamber 28, there is a temperature difference between the temperature of the material and the ambient temperature, so that the resist film is not in a predetermined dry state. Accordingly, it can be found that the dry position is in the ninth chamber 29, which is the chamber on the most upstream side where the resist film is in a predetermined dry state.

Next, the operation of the dry position detecting means 5 and the staggered amount detecting means 6 will be described based on the flow chart of FIG. In this floor chart, "n" represents the number of each chamber, and "X" represents the number of the chamber in a setting drying position. In addition, the operation shown in FIG. 2 is always performed during operation of the apparatus.

In step S1 of FIG. 2, the drying position detection means 5 initially sets n to "1" which is the most upstream chamber number.

In step S2, the CPU 53 of the drying position detecting means 5 calculates the temperature difference dn obtained by subtracting the temperature Rn of the material from the nth chamber from the ambient temperature Tn in the nth chamber. .

Next, in step S3, the CPU 53 determines whether or not the obtained temperature difference dn is positive. If the temperature difference dn is positive, the CPU 53 determines that the resist is not a predetermined dry state in the nth chamber. In this case, the flow advances to step S7.

In step S7, the CPU 53 adds "1" to n. In other words, the chamber number is advanced one downstream.

In step S8, the CPU 53 determines whether n is smaller than " 11 ". If n is smaller than "11", the flow returns to step S2.

In step S3 mentioned above, when the temperature difference dn is positive in the nth chamber, the above step is repeated. In step S8, however, when n is " 11 ", the CPU 53 determines that the dry position does not exist between the first chamber 21 and the tenth chamber 30. In this case, a problem arises in the apparatus, such as the setting of the atmospheric temperature in each chamber 21-30 being largely wrong. At this time, the CPU 53 generates an "error" in order to notify the abnormality of the apparatus.

In step S3, when the temperature difference dn of the nth chamber is not positive, the resist film is in a predetermined dry state in the nth chamber. Therefore, the CPU 53 determines that the most upstream drying position at which the resist film is in the predetermined dry state is in the nth chamber. Then, the CPU 53 is transmitted to the comparator 55 having the staggered amount detecting means 6 with the number " n " of the chamber having the most upstream drying position.

Next, in step S4, the comparator 55 determines the number of the chambers with the drying positions obtained by the CPU 53 from the number "X" of the chambers with the setting drying positions stored in the memory 54. Subtract amount "D" is calculated by subtracting n ".

Next, in step S5, the comparator 55 determines whether the staggered amount "D" is 0 or not. When the staggered amount "D" is 0, the comparator 55 determines that the drying position is located at the set drying position. In this case, the process returns to step S1 and the above steps are repeated.

In addition, when it is not staggered amount "D", the comparator 55 judges that the dry position "n" is staggered by the staggered amount "D" in the set dry position "X". Then, the comparator 55 transmits the staggered amount "D" to the control units 51a to 51j which the drying condition adjusting means 2 has.

Next, in step S6, the control units 51a to 51j control the rotation speeds of the fans 50a to 50j in response to the staggered amount "D" transmitted from the comparator 55, so that the respective chambers 21 The air volume of the hot air sent to ˜30) is automatically adjusted.

Then, the process returns to step S1 and the above steps are repeated.

According to the conventional drying method and window of the resist film in which the graph shown in FIG. 4 is made from the measured values of the moisture content contained in the resist, and the dry position is obtained using the graph, the moisture content must be measured at many positions. The two positions at which the moisture content does not change must be measured so that the moisture content of the seventh chamber and the water content at the outlet shown in FIG. 4 are the same. For this reason, when the drying positions are staggered after the seventh chamber shown in FIG. 4, in other words, when the drying positions are staggered after the measuring position on the upstream side of the final measuring position, the drying position cannot be obtained. there was.

According to the present embodiment, however, in each of the chambers 21 to 30 described above, the temperature difference between the temperature of the material and the ambient temperature is obtained, and the chamber where the temperature of the material and the ambient temperature are the same as each other is used as the dry position. If there is a drying position between the chamber 21 and the tenth chamber 30, the drying position can be obtained. Therefore, in the case where the drying positions are staggered to the measuring position on the upstream side of the final measuring position, the drying in the ninth and tenth chambers 29 and 30 is made even when the drying positions are staggered after the ninth chamber 29 of the present embodiment. You can find the location.

Next, another Example of this invention is described.

3 is a schematic diagram showing main parts of a device of another embodiment of the present invention. In FIG. 3, the same reference numerals as those shown in FIG. 1 have the same functions as those described in the above-described embodiment, and explanations are omitted here.

In FIG. 3, 60 is a dry state evaluation apparatus which evaluates the dry state of the resist film apply | coated to the raw material 7. As shown in FIG. The dry state evaluating apparatus 60 is composed of a material temperature measuring means 3, an atmosphere temperature measuring means 4, and a display means 8. The display means 78 shows the dry state of the resist film in each of the chambers 21 to 30 at the temperature of the material and the ambient temperature in each of the chambers 21 to 30. In addition, the display means 8 is comprised by the calculating means 15 and the CRT 14. The calculating means 15 calculates the temperature difference between the temperature of the raw material and the ambient temperature in each of the chambers 21 to 30, respectively. The CRT 14 displays the dry state of the resist film in each chamber. The setting means 16 adjusts the rotation speed of the fans 50a to 50j by operating the volumes 62a to 62j to set the amount of hot air blown into the drying furnace 1.

Next, the operation of the above embodiment will be described.

The material temperature measuring means 3 measures the temperature of the material in each of the chambers 21 to 30 and transmits the measured temperature of the material to the calculating means 15. The atmospheric temperature measuring means 4 measures the atmospheric temperature in each chamber, respectively, and transmits the measured atmospheric temperature to the calculating means 15. The calculation means 15 calculates the temperature difference between the temperature of the material and the ambient temperature in each of the chambers 21 to 30, and transmits the temperature and the ambient temperature of the material and these temperature differences to the CRT 14 in each chamber, respectively. The CRT 14 displays the temperature of the raw material, the ambient temperature, and the temperature difference between them for each temporary chamber 21-30. In addition, the CRT 14 may display only the temperature of the raw material and the ambient temperature for each of the chambers 21 to 30, respectively. In addition, the CRT 14 may display only the temperature difference between the temperature of the raw material and the ambient temperature for each of the chambers 21 to 30, respectively. In addition, the CRT 14 may display only the temperature of the raw material, the ambient temperature, and the presence or absence of the temperature difference for each of the chambers 21 to 30, respectively. Next, the operator who sets the drying conditions in the drying furnace 1 confirms the chamber number on the most upstream side where there is no temperature difference between the temperature of the raw material and the ambient temperature in the dry state of the resist film indicated on the CRT 14. And the operator judges whether the number of the said chamber is a desired number, or not. If the number of the chamber is not the desired number, the operator rotates the fans 50a to 50j by operating the volumes 62a to 62j of the setting means 16 so that the number of the chamber is the desired number. The number of water is adjusted to set the amount of airflow of hot air to be stuck in the drying furnace 1.

According to the method for drying a resist film according to claim 1, a strip-shaped material coated with a resist film is passed through a drying furnace while conveying in a longitudinal direction thereof, and the material is removed at a plurality of positions different from each other in the conveying direction of the material in the drying furnace. The temperature is measured respectively, and the ambient temperature in the drying furnace is measured at each position where the temperature of the material is measured, and the predetermined temperature of the resist film is at a desired position in the drying furnace at a position where the temperature of the material and the ambient temperature are the same at each of the above positions. It is possible to set the drying conditions in the drying furnace so as to be in this dry state.

According to the apparatus for drying a resist film according to claim 2, the temperature of the material at a plurality of positions different from each other with respect to the conveying direction of the material in the drying furnace is passed through the drying furnace while conveying the strip-shaped material coated with the resist film in the longitudinal direction thereof. Are measured by the material temperature measuring means, and the ambient temperature in the drying furnace is measured by the ambient temperature measuring means at each position where the temperature of the material is measured, so that the temperature of the material and the ambient temperature are the same at each of the positions. It is possible to set the drying conditions in the drying furnace by the drying condition setting means so that the predetermined position of the resist film becomes a dry state at the desired position in the drying furnace at the position.

According to the drying apparatus of the resist film of Claim 3, the drying position which is a position in the drying furnace where a resist film becomes a predetermined dry state at the material temperature and the ambient temperature of each said position is calculated | required by dry position detection means, and a resist film is made into predetermined | prescribed drying. It is possible to obtain the staggered amount between the desired position in the drying furnace and the dry position to be in a state by means of the staggered amount detecting means, and to control the drying conditions in the drying furnace by the drying condition adjusting means.

According to the drying apparatus of the resist film according to claim 4, since the radiation thermometer is used as the material temperature measuring means, it is possible to measure the temperature of the material without contacting the material, so that the oscillation is caused by the contact between the material and the material temperature measuring means. And there is no occurrence of damage to the resist film.

According to the drying apparatus of the resist film according to claim 5, the temperature of the material is changed at a plurality of positions different from each other with respect to the conveying direction of the material in the drying furnace by passing the strip-shaped material coated with the resist film in the longitudinal direction thereof. The temperature measured by the material temperature measuring means is respectively measured, and the ambient temperature in the drying furnace is measured by the ambient temperature measuring means at each position where the temperature of the material is measured, and the display means displays the dry state of the resist film at each position. It becomes possible.

According to the drying apparatus of the resist film of Claim 6, it becomes possible to display the temperature of the raw material and the atmospheric temperature by the display means in each position in a drying furnace as a dry state.

According to the drying apparatus of the resist film of Claim 7, it becomes possible to display by the display means the temperature difference between the temperature of a raw material and the atmospheric temperature in each position in a drying furnace as a dry state.

According to the drying apparatus of the resist film of Claim 8, it becomes possible to display by the display means the presence or absence of the temperature difference between the temperature of a raw material and the ambient temperature in each position in a drying furnace as a dry state.

Therefore, according to the method and apparatus for drying the resist film of the present invention, it is possible to easily find the dry position without being affected by the film thickness of the resist film. Further, it is possible to bring the resist film into a predetermined dry state at the desired position in the drying furnace to the found dry position.

Claims (8)

A method of drying a resist film in which a strip-shaped material coated with a resist film is passed through a drying furnace while being conveyed in the longitudinal direction thereof, wherein the temperature of the material is measured at a plurality of positions different from each other in the conveying direction of the material in the drying furnace. And a step of measuring the ambient temperature in the drying furnace in the drying furnace at each position where the temperature of the material is measured, and a resist at a desired position in the drying furnace at a position where the temperature of the material and the ambient temperature are the same at each of the above positions. And a step of setting the drying conditions in the drying furnace so that the film becomes a predetermined dry state. In the drying apparatus of a resist film which carries out the strip | belt-shaped material to which the resist film was apply | coated in the longitudinal direction, and passes through a drying furnace, the temperature of a raw material is measured in several different positions with respect to the conveyance direction of a material in a drying furnace, respectively. Material temperature measuring means for measuring the temperature of the material, and ambient temperature measuring means for measuring the ambient temperature in the drying furnace in the drying furnace at each position where the temperature of the material is measured, And drying condition setting means for setting the drying conditions in the drying furnace such that the resist film is in a dry state at a desired position in the apparatus. 3. The drying condition setting means according to claim 2, wherein the drying condition setting means comprises: drying position detecting means for finding a drying position at which the resist film is in a predetermined drying state at the material temperature and the ambient temperature of each position, and a desired position and a staggered amount in the drying furnace; And a staggered amount detecting means for obtaining a step, and a dry condition adjusting means for adjusting the dry conditions in the drying furnace such that the dry position is located at a desired position in response to the staggered amount. A drying apparatus for a resist film according to claim 2 or 3, wherein a radiation thermometer is used as said material temperature measuring means. In the drying apparatus of a resist film which carries out the strip | belt-shaped material to which the resist film was apply | coated in the longitudinal direction, and passes through a drying furnace, the temperature of a raw material is measured in several different positions with respect to the conveyance direction of a material in a drying furnace, respectively. Means for measuring the temperature of the material, atmosphere temperature measuring means for measuring the ambient temperature in the drying furnace at each position where the temperature of the material is measured, and displaying the dry state of the resist film at each position at the material temperature and the ambient temperature at each position. An apparatus for drying a resist film, comprising display means. The drying apparatus of a resist film according to claim 5, wherein said display means displays the temperature of the material and the ambient temperature at each position, respectively. The drying apparatus of a resist film according to claim 5, wherein said display means displays the temperature difference between the temperature of the raw material and the ambient temperature at each position, respectively. The drying apparatus of a resist film according to claim 5, wherein said display means displays the presence or absence of the temperature of the material and the ambient temperature at each position, respectively.