JPS6238229A - Gas mixing apparatus - Google Patents
Gas mixing apparatusInfo
- Publication number
- JPS6238229A JPS6238229A JP60176434A JP17643485A JPS6238229A JP S6238229 A JPS6238229 A JP S6238229A JP 60176434 A JP60176434 A JP 60176434A JP 17643485 A JP17643485 A JP 17643485A JP S6238229 A JPS6238229 A JP S6238229A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- series
- gas mixing
- mixing
- mixed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/40—Static mixers
- B01F25/42—Static mixers in which the mixing is affected by moving the components jointly in changing directions, e.g. in tubes provided with baffles or obstructions
Landscapes
- Chemical & Material Sciences (AREA)
- Dispersion Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔概要〕
半導体の気相成長用に使用される原料ガスを混合する装
置である。[Detailed Description of the Invention] [Summary] This is an apparatus for mixing source gases used for vapor phase growth of semiconductors.
複数のガス混合室が流路開閉器を介して直列に接続され
この流路開閉器がガス流の方向にそって順次開閉される
ようにされたガス流路を複数系列並列に接続し、この複
数系列の流路開閉器の開閉動作も各系列毎に交互になす
こととし、各ガス混合室内においてガスを拡散混合させ
た後、各系列毎に交番的に流出させることとしたもので
ある。A plurality of gas flow channels are connected in parallel in a plurality of series, in which a plurality of gas mixing chambers are connected in series through a flow channel switch, and the flow channel switches are sequentially opened and closed along the direction of the gas flow. The opening and closing operations of the plurality of series of flow path switches are also performed alternately for each series, and after the gas is diffused and mixed in each gas mixing chamber, it is alternately made to flow out for each series.
本発明は、半導体の気相成長法等に使用される原料ガス
の混合装置に関する。特に、複数種のガスが完全に混合
され、しかも、ガス圧送用エネルギーが減少するように
する改良に関する。TECHNICAL FIELD The present invention relates to a source gas mixing device used in semiconductor vapor phase growth methods and the like. In particular, the present invention relates to an improvement in which multiple types of gases are completely mixed and the energy required for pumping the gas is reduced.
従来技術に係る半導体の気相成長法等に使用される原料
ガスの混合装とは、その１例を第２図に示すように、ガ
ス流路５中にバッフル６等の気流障害物を設けて乱流を
発生させてなしていた。As shown in FIG. 2, an example of a mixing device for raw material gas used in a conventional semiconductor vapor phase growth method, etc. is one in which an airflow obstruction such as a baffle 6 is provided in a gas flow path 5. This caused turbulence.
この乱流を発生させてなすガス混合法は混合効率が悪く
、シかも、多段のバッフルを必要とするため、流路抵抗
が無視し難く、ガスの圧送に大きなエネルギーを必要と
する欠点があった。Gas mixing methods that generate this turbulent flow have poor mixing efficiency and require multiple stages of baffles, so flow path resistance is difficult to ignore and the disadvantage is that it requires a large amount of energy to pump the gas. Ta.
本発明はこの欠点を解消し、複数種のガスの混合効率が
すぐれており、しかも、波路抵抗が小さくガス圧送用エ
ネルギーの少ないガス混合装置を提供することにある。The object of the present invention is to eliminate this drawback and provide a gas mixing device that has excellent mixing efficiency for a plurality of gases, has small wave path resistance, and requires less energy for gas pumping.
」二足の目的を達成するため本発明が採った手段は、第
１図に示すように、複数のガス混合室 Ｉｌｌ、 １
１２、・・・Ｉｌｎ、 ２１１． ２１２、・・・２１
ｎをシャッタ等の波路開閉器 １２１、１２２．・・・
１２ｎ、２２１、２２２、・・・２２ｎを介して直列
に接続し、この波路開閉器 １２１． １２２、−・１
２ｎ、２２１．２２２、・・・２２ｎは、ガス流の方向
にそって １２１． １２２、・・・１２ｎ、 ２２１
． ２２２、−２２ｎの順に開閉されるようにされたガ
ス流路１．２、・・・を複数系列並列に接続し、各系列
の流出口（最終段の流路開閉器）は各系列毎に順次開閉
されるようにしたちのである。The means taken by the present invention to achieve the two objectives is to provide a plurality of gas mixing chambers as shown in FIG.
12,...Iln, 211. 212,...21
n as a wave path switch such as a shutter 121, 122. ...
12n, 221, 222, . 122, -・1
2n, 221.222,...22n are 121. along the direction of gas flow. 122,...12n, 221
．． A plurality of series of gas channels 1.2, . They are designed to open and close in sequence.
半導体の気相成長等に使用されるガスの種類、圧力条件
、流量条件等においては、乱流等を利用する攪拌混合方
式よりガスを静置して混合させる拡散混合方式の方がよ
りすぐれている。Regarding the type of gas, pressure conditions, flow rate conditions, etc. used for semiconductor vapor phase growth, etc., the diffusion mixing method, in which the gases are mixed while standing still, is superior to the stirring mixing method, which uses turbulence, etc. There is.
そこで、本発明にあっては、（イ）この拡散混合方式を
採ることとし、（ロ）混合効率を向−トするために複数
個のガス混合室が直列に接続された多段式の系列とし、
（ハ）拡散方式の欠点である非連続性を解消するため、
複数系列を並列接続して各系列が逐次ガスを放出するよ
うにしたものである。Therefore, in the present invention, (a) this diffusion mixing method is adopted, and (b) a multi-stage series in which a plurality of gas mixing chambers are connected in series is used to improve the mixing efficiency. ,
(c) In order to eliminate discontinuity, which is a drawback of the diffusion method,
Multiple series are connected in parallel so that each series releases gas sequentially.
以下、図面を参照しつ一１本発明の一実施例に係るガス
混合装置についてさらに説明する。Hereinafter, a gas mixing device according to an embodiment of the present invention will be further described with reference to the drawings.
第１図参照
１１１、 １１２、・・・１１ｎは、第１のガス流路系
列１を構成するガス混合室であり、 １２１、１２２、
・・・１２＋は、第１のガス流路系列１を構成するシャ
ッタ（流路開閉器）である、シャッタ １２１． １２
２、・・・１２ｎは、ガス混合室１１１． １１２、・
・・１Ｉｎの大きさ、ガスの種類、ガス圧等によって決
定される時間毎に逐次開閉する。換言すれば、シャッタ
１２１が閉じてガス混合室１１１に複数の被混合ガス
が流入してその内圧がガス圧送圧力まで上昇した後。Referring to FIG. 1, 111, 112, . . . 11n are gas mixing chambers constituting the first gas flow path series 1;
. . . 12+ is a shutter (flow path switch) constituting the first gas flow path series 1; a shutter 121. 12
2, . . . 12n are gas mixing chambers 111. 112,・
...Sequentially opens and closes at intervals determined by the size of 1In, type of gas, gas pressure, etc. In other words, after the shutter 121 is closed, a plurality of gases to be mixed flow into the gas mixing chamber 111, and the internal pressure thereof rises to the gas pumping pressure.
暫くの間静ｔされて、複数の被混合ガスは拡散混合され
る。この拡散混合が完了した後、シャッタ１２２が閉じ
てシャッタ １２１が開く、このとき、ガス混合室 １
１２の内圧はこのガス混合装置の流出口３の圧力と一致
しているから、ガス混合室 １１１内のガスはガス混合
室１１２に進む、そして、ここで、再び静置されて拡散
混合される。このようにして、被混合ガスは複数段の拡
散混合がされて、この系の流出口 １２ｎに向って進行
する。The mixture is kept still for a while, and the plurality of gases to be mixed are diffused and mixed. After this diffusion mixing is completed, the shutter 122 is closed and the shutter 121 is opened. At this time, the gas mixing chamber 1
Since the internal pressure of 12 matches the pressure of the outlet 3 of this gas mixing device, the gas in the gas mixing chamber 111 advances to the gas mixing chamber 112, where it is left still and diffused and mixed again. . In this way, the gases to be mixed are diffused and mixed in multiple stages and proceed toward the outlet 12n of this system.
このような系が、被混合ガスの種類に応じてｍ系列用意
される。m series of such systems are prepared depending on the type of gas to be mixed.
久ス１ ９ −ｒｎ）−も イひ川を児に１．かがち同
様の複数拡散混合過程を経てそれぞれの系の流出口 １
２ｎ、 ２２ｎ、・・・ｍ２ｎに向って進行する。Kusu 1 9 -rn) - also 1 with Ihikawa as a child. The outlet of each system passes through the same multiple diffusion and mixing process as Kagachi.
2n, 22n, . . . proceed toward m2n.
ここで、１．２、・・・ｍの流出口 １２ｎ、 ２２ｎ
、・・・ｍ２ｎは互いに非同期的に、要すれば、各系列
毎に順次開閉されることとされており、そのため、この
ガス混合装置全体の流出口３には、完全に混合されたガ
スが、各県ｌ、２、・・・ｍから順次給送されるので、
時間当りお−むね一定の流量が供給されることとなり、
このガス混合装置の流出口におけるガス流速はお−むね
一定となり、完全に混合したガスをお−むね安定した流
速をもって連続供給することができる。Here, the outlet ports of 1.2,...m 12n, 22n
,... m2n are to be opened and closed asynchronously with each other, if necessary, sequentially for each series, so that completely mixed gas is supplied to the outlet 3 of the entire gas mixing device. , each prefecture is sequentially fed from l, 2,...m, so
A roughly constant flow rate will be supplied per hour,
The gas flow rate at the outlet of this gas mixing device is generally constant, and completely mixed gas can be continuously supplied at a generally stable flow rate.
〔発明の効果〕
以上説明せるとおり、本発明に係るガス混合装置は、複
数段のガス混合室が直列に接続され、それらの間と流出
口にはシャッタ等の波路開閉器が設けられている拡散混
合方式のガス混合系が複数系並列に接続されており各系
列内においてはシャッタ等の流路開閉器が逐次開閉して
、被混合ガスを拡散混合しながら、逐次流出口に送るよ
うにされており、この各系列の流出口は各系列毎にハ「
１次開閉してこのガス混合装置の流出［１に完全に混合
されたカスを順次給送することとされているので、複数
種類の被程合カスを拡散混合方式をもって完全に混合し
た後、この完全に混合されたカスをお−むね一定の流速
をもって送出することができる。[Effects of the Invention] As explained above, in the gas mixing device according to the present invention, multiple stages of gas mixing chambers are connected in series, and a wave path switch such as a shutter is provided between them and at the outlet. Multiple gas mixing systems using the diffusion mixing method are connected in parallel, and within each system, flow path switches such as shutters are opened and closed sequentially to diffuse and mix the gas to be mixed and send it sequentially to the outlet. The outlet of each series is
The gas mixing device is first opened and closed to sequentially feed the completely mixed waste into the outflow [1], so after thoroughly mixing multiple types of processed waste using the diffusion mixing method, This thoroughly mixed waste can be delivered at a generally constant flow rate.
第１図は、本発明の一実施例に係るガス混合装置の構成
図である。
第２図は、従来技術に係るガス混合装置の構成図である
。
１．２、・・・ｍ日・木発１］の一実施例に係るカス混
合装置を構成する各系列、 ３拳 ・ Φ本発明の一
実施例に係るガス混合装置の流出口。
Ｉｌｌ、 １１２．・・・ｌｌｎ・φ１１第１系列を構
成するガス混合室、 １２＋、 １２２．・・・１２
ｎ拳・・第１系列の流路開閉器（シャッタ）、 ２１
１、２１２．・・・２１ｎ・・・第２系列を構成するガ
ス混合室、２２＋、 ２２２、・・・２２ｎ−φ・第
２系列の流路開閉器（シャッタ）、 ５・・・従来技術
のカス流路、 ６争・φへ、フル。FIG. 1 is a configuration diagram of a gas mixing device according to an embodiment of the present invention. FIG. 2 is a configuration diagram of a gas mixing device according to the prior art. 1.2,...m days/Thursday 1] Each series constituting the waste mixing device according to an embodiment of 3 fists Φ Outlet of the gas mixing device according to an embodiment of the present invention. Ill, 112. ...lln・φ11 gas mixing chamber constituting the first series, 12+, 122. ...12
n fist: 1st series flow path switch (shutter), 21
1, 212. ...21n...Gas mixing chamber constituting the second series, 22+, 222,...22n-φ・Flow path switch (shutter) of the second series, 5...Dus flow path of conventional technology , To 6th race/φ, full.
Claims (1)
１ｎ、２１１、２１２、・・・２１ｎが直列に接続され
各室相互間及び流出口に流路開閉器１２１、１２２、・
・・１２ｎ、２２１、２２２、・・・２２ｎが設けられ
、該流路開閉器１２１、１２２、・・・１２ｎ、２２１
、２２２、・・・２２ｎはガス流の方向にそって逐次開
閉されるガス流路１、２、・・・が少なくとも２系列並
列に接続されてなり、各系列の流出口の開閉は各系列毎
に順次なされることを特徴とするガス混合装置。At least two gas mixing chambers 111, 112,...1
1n, 211, 212, . . . 21n are connected in series, and flow path switches 121, 122, .
. . 12n, 221, 222, . . . 22n are provided, and the flow path switches 121, 122, . . . 12n, 221
, 222, . . . , 22n are formed by connecting at least two series of gas passages 1, 2, . A gas mixing device characterized in that the mixing is performed sequentially.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60176434A JPS6238229A (en) | 1985-08-10 | 1985-08-10 | Gas mixing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60176434A JPS6238229A (en) | 1985-08-10 | 1985-08-10 | Gas mixing apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6238229A true JPS6238229A (en) | 1987-02-19 |
Family
ID=16013634
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60176434A Pending JPS6238229A (en) | 1985-08-10 | 1985-08-10 | Gas mixing apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6238229A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8668377B2 (en) * | 2005-07-26 | 2014-03-11 | Toyota Jidosha Kabushiki Kaisha | Gas diluter |
-
1985
- 1985-08-10 JP JP60176434A patent/JPS6238229A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8668377B2 (en) * | 2005-07-26 | 2014-03-11 | Toyota Jidosha Kabushiki Kaisha | Gas diluter |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| NO177874C (en) | Device for mixing the components in a fluid flow, and using the device in a mass flow meter | |
| ATE173181T1 (en) | CHEMICAL MIXING AND REACTING APPARATUS | |
| GB883989A (en) | A method and a device for mixing flowing fluids employing stationary guiding means | |
| GB1284667A (en) | Method and apparatus for two phase heat exchange fluid distribution in plate type heat exchangers | |
| GB770688A (en) | Blending plastics and fluids | |
| TW336333B (en) | A substrate processing apparatus | |
| JPS6238229A (en) | Gas mixing apparatus | |
| ES2093646T3 (en) | METHOD AND APPARATUS OF FUMIGATION WITH PHOSPHINE. | |
| SE9500830D0 (en) | Apparatus for mixing a first fluid into a second fluid | |
| KR910014143A (en) | Gas separator | |
| CN120072611A (en) | Gas supply device and manufacturing method thereof | |
| GB1386932A (en) | Gas separating apparatus | |
| GB1318585A (en) | Mixing apparatus | |
| ES428165A1 (en) | Terminal air outlet device | |
| SE8404591D0 (en) | VACUUM SYSTEM ROTATION PROCESSOR | |
| WO2023119240A8 (en) | Respiratory support system | |
| GB1021288A (en) | Improvements relating to fluid operated shift registers | |
| JPS5372774A (en) | Gas treating apparatus | |
| GB1526087A (en) | Blending device | |
| JPS54139127A (en) | Flow rate adjusting damper device | |
| JPS52133434A (en) | Engine muffler | |
| JPS55109499A (en) | Fermentation treating method of wastes | |
| EP1545755A2 (en) | Production of variable concentration fluid mixtures | |
| JPS6337073Y2 (en) | ||
| GB959721A (en) | Improvements in or relating to pressure exchangers |