JPS607791A - Semiconductor laser element - Google Patents
Semiconductor laser elementInfo
- Publication number
- JPS607791A JPS607791A JP11750183A JP11750183A JPS607791A JP S607791 A JPS607791 A JP S607791A JP 11750183 A JP11750183 A JP 11750183A JP 11750183 A JP11750183 A JP 11750183A JP S607791 A JPS607791 A JP S607791A
- Authority
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- Japan
- Prior art keywords
- waveguide
- main
- conductivity type
- face
- type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/06209—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in single-section lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/4025—Array arrangements, e.g. constituted by discrete laser diodes or laser bar
- H01S5/4031—Edge-emitting structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/06233—Controlling other output parameters than intensity or frequency
- H01S5/0624—Controlling other output parameters than intensity or frequency controlling the near- or far field
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/06233—Controlling other output parameters than intensity or frequency
- H01S5/06243—Controlling other output parameters than intensity or frequency controlling the position or direction of the emitted beam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/4025—Array arrangements, e.g. constituted by discrete laser diodes or laser bar
- H01S5/4031—Edge-emitting structures
- H01S5/4068—Edge-emitting structures with lateral coupling by axially offset or by merging waveguides, e.g. Y-couplers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/4025—Array arrangements, e.g. constituted by discrete laser diodes or laser bar
- H01S5/4075—Beam steering
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明の技術分野〕
この発明は光通信、光情報処理などの光源に用いられる
半導体レーザ素子に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a semiconductor laser element used as a light source for optical communication, optical information processing, etc.
第1図(A)は従来の半導体レーザ素子の一例を示す平
面図、第1図(B)は第1図(A)のより −より線で
の断面図である。FIG. 1(A) is a plan view showing an example of a conventional semiconductor laser device, and FIG. 1(B) is a sectional view taken along a stranded line in FIG. 1(A).
図において、(1)はn形結晶基板、(2) 、 (3
)および(4)はそれぞれn形結晶基板(1)の主面上
に順次形成されたn形りラッド層、p形活性層およびp
形りラッド層、(5)はp形りラッド層(4)の主面上
に形成された絶縁膜、(6)は絶縁膜(5)の一部分に
p形りラッド層(4)の第1図(A)に図示する端面F
1からこの端面F1に背向する端面F2にわたって名ド
ライブ状に形成された主幹開口部、(7)は絶縁膜(5
)の主幹開口部(6)の形成部分以外の部分に主幹開口
部(6)の長手方向の一部から分岐され端面F1に達す
るように形成された分岐開口部、(8)は絶縁膜(5)
の表面の主幹開口部(6)に関して分岐開口部(7)側
とは反対側の部分上からp形りラッド層(4)の主幹開
口部(6)に面する部分上を通って絶縁膜(5)の表面
の主幹開口部(6)に関して分岐開口部(7)側の一部
上に達するように形成された主幹陽極、(9)は絶縁膜
(5)の表面の主幹開口部(6)に関して分岐開口部(
7)側の部分上とp形りラッド層(4)の分岐開口部(
6)に面する部分上とにわたって主幹陽極(8)と接触
しないように形成された分岐陽極、00はn形結晶基板
(1)の主面上に形成された共通陰極である。(I)は
主幹陽極(8)と共通陰極αOとの間に順方向電圧を印
加すると、順方向電流がp形活性層(3)の主幹開口部
(6)に対応する部分に集中して流れてレーザ発振する
主幹素子部、(IT)は分岐陽極(9)と共通陰極顛と
の間に順方向電圧を印加すると、順方向電流がp形活性
層(3)の分岐開口部(7)に対応する部分に集中して
流れてレーザ発振する分岐素子部である。In the figure, (1) is an n-type crystal substrate, (2), (3
) and (4) are an n-type rad layer, a p-type active layer, and a p-type active layer formed sequentially on the main surface of the n-type crystal substrate (1), respectively.
shaped rad layer, (5) is an insulating film formed on the main surface of p-shaped rad layer (4), (6) is a part of insulating film (5) formed with the p-shaped rad layer (4). End face F shown in Figure 1 (A)
1 to the end face F2 facing back to the end face F1, and (7) is the main opening formed in the shape of a drive, and (7) is the insulating film (5
) is a branch opening formed in a part other than the forming part of the main opening (6) from a part of the main opening (6) in the longitudinal direction and reaching the end surface F1, (8) is an insulating film ( 5)
The insulating film is passed over the part of the p-shaped rad layer (4) facing the main opening (6) from above the part of the surface of the main opening (6) opposite to the branch opening (7) side. The main anode (9) is formed so as to reach a part of the branch opening (7) side with respect to the main opening (6) on the surface of the insulating film (5). 6) Regarding the branch opening (
7) on the side part and the branch opening of the p-shaped rad layer (4) (
A branch anode is formed over the portion facing 6) so as not to contact the main anode (8), and 00 is a common cathode formed on the main surface of the n-type crystal substrate (1). (I) When a forward voltage is applied between the main anode (8) and the common cathode αO, the forward current is concentrated in the part of the p-type active layer (3) corresponding to the main opening (6). When a forward voltage is applied between the branch anode (9) and the common cathode section, the main element part (IT) that generates laser oscillation generates a forward current that flows through the branch opening (7) of the p-type active layer (3). ) is a branching element portion where the flow is concentrated in the portion corresponding to the laser beam and oscillates as a laser beam.
このように構成された従来例では、主幹開口部(6)の
分岐開口部(7)が分岐する部分と端面F2との間の部
分に対応するp形活性層(3)の部分が主幹素子部(1
)と分岐素子部(II)との共通の利得媒質となるので
、これらの素子部(I) 、 (If)が発振するレー
ザ光は、上記共通の利得媒質中を通ることから、光学的
な結合が行なわれ、これらの素子部(I) 、 (II
)の端面F1から放射されるレーザ光は、所定の位相関
係を持っており、それらの干渉によって所要の放射パタ
ーンが得られる。In the conventional example configured in this way, the portion of the p-type active layer (3) corresponding to the portion between the end surface F2 and the portion where the branch opening (7) of the main opening (6) branches is the main element. Part (1
) and the branching element section (II), the laser beams oscillated by these element sections (I) and (If) pass through the common gain medium, so that the optical The coupling is performed, and these element parts (I) and (II
The laser beams emitted from the end face F1 of ) have a predetermined phase relationship, and a desired radiation pattern is obtained by their interference.
ところが、画素子部(1)、(H)のうちの例えば分岐
素子部(n)の順方向電流を変化させて分岐素子部(I
I)の放射出力を変化させようとする場合には、この分
岐素子部(II)の順方向電流の変化によって分岐素子
部(II)の利得媒質のキ゛ヤリア濃度が変化して屈折
率の変化が生じ、この屈折率の変化が分岐素子部(II
)が発振するレーザ光の波長を変化させるので、画素子
部(1) 、 (n)の外部への放射レーザ光の位相関
係が変化して放射パターンが変化する。また、主幹素子
部(1)の順方向電流を変化させて主幹素子部(1)の
放射出力を変化させようとする場合でも、分岐素子部(
II)の場合と同様に放射パターンが変化する。また、
上述の場合とは逆に、放射パターンを変化させようとす
る場合には、画素子部(1) 、 (II)の外部への
放射レーザ光の位相関係を変化させる必要があるので、
主幹素子部(1)または分岐素子部(II)の順方向電
流を変化させねばならず、この順方向′電流の変化によ
って、主幹素子部(1)または分岐素子部(It)の放
射出力が変化する。However, by changing the forward current of the branch element part (n) of the pixel element parts (1) and (H), for example, the branch element part (I
When trying to change the radiation output of the branching element (II), the carrier concentration of the gain medium of the branching element (II) changes due to a change in the forward current of the branching element (II), causing a change in the refractive index. This change in refractive index occurs in the branching element part (II
) changes the wavelength of the oscillated laser light, the phase relationship of the laser light emitted to the outside of the pixel elements (1) and (n) changes, and the radiation pattern changes. Moreover, even when trying to change the radiation output of the main element part (1) by changing the forward current of the main element part (1), the branch element part (
The radiation pattern changes as in case II). Also,
Contrary to the above case, when trying to change the radiation pattern, it is necessary to change the phase relationship of the laser beams emitted to the outside of the pixel elements (1) and (II).
The forward current of the main element part (1) or the branch element part (II) must be changed, and the radiation output of the main element part (1) or the branch element part (It) is changed by changing the forward current. Change.
要するに、この従来例では、放射パターンの変化を放射
出力の変化とは独立に行うことは容易ではないという欠
点があった。In short, this conventional example has the drawback that it is not easy to change the radiation pattern independently of the change in radiation output.
この発明は、かかる欠点を解消する目的でなされたもの
で、活性層が発振するレーザ光が4波され外部へ放射さ
れる主幹導波路とその一部分に光学的に結合されこの主
幹導波路を導波するレーザ光の一部を分岐して外部へ放
射する分岐導波路とを有し、この分岐導波路の一部にこ
の分岐導波路によって導波されて外部へ放射されるレー
ザ光の位相を変化させ得る受動光位相変調部を設けるこ
とによって、放射パターンの変化を放射出力の変化とは
独立に行い得るようにした半導体レーザ素子を提供する
ものである。This invention was made with the aim of eliminating such drawbacks, and the laser light oscillated by the active layer is optically coupled to the main waveguide and a part thereof to be radiated into four waves to the outside, thereby guiding the main waveguide. It has a branching waveguide that branches a part of the waving laser light and radiates it to the outside. The present invention provides a semiconductor laser device in which the radiation pattern can be changed independently of the radiation output by providing a variable passive optical phase modulation section.
第2図(A)はこの発明の第1の実施例の半導体レーザ
素子を示す平面図、瀉2図(B)は第2図(A)の■B
−■B線での断面図である。FIG. 2(A) is a plan view showing a semiconductor laser device according to the first embodiment of the present invention, and FIG. 2(B) is a
-■ It is a cross-sectional view along the B line.
図において、第1図に示した従来例の符号と同一符号は
同等部分を示す。αυはn形結晶層からなりn形りラッ
ド層(2)の主面上の一部分にn形りラッド層(2)の
第2図(A)に図示する端面F、からこの端面F1に背
向する端面F2にわたってストライブ状に形成されレー
ザ光が導波されるn形主幹導波路、(3a)はp形結晶
層からなりn形主幹導波路αηの主面上に重なり合うよ
うに形成されレーザ光を発振するp形活性層、(12a
)および(12b)はn形結晶層からなりn形りラッド
層(2)の主面のn形主幹導波路αυの両外側の部分上
にそれぞれ一方の端部側の側面がn形主幹導波路αDの
端面F2側の端部の側面に光学的に結合され他方の端部
側の端面がn形りラッド層(2)の端面F1と同一平面
になるように形成されn形主幹導波路αυを導波するレ
ーザ光の一部を分岐して端面F1側の端面から外部へ放
射する第1および第2のn形分岐導波路、 (13a)
および(rsb)はp形結晶層からなりそれぞれ第1の
n形分岐導波路(12a)および第2のn形分岐導波路
(12b)の主面の端面F、側の端部上に第1のn形分
岐尋波路(12a)および第2のn形分岐導波路(x2
b)との間にpn接合を形成するように設けられ第1の
n形分岐導波[12a)および第2のn形分岐導波路(
x2b)によって導波されて外部へ放射されるレーザ光
の位相を変化させる第1および第2の受動光位相変調部
、(4a)はp形結晶層からなりn形りラッド層(2)
の主面上にn形主幹導波路αD、n形分岐導波路(12
a) 、 (12b )および受動光位相変調部(13
a)、(13b)を覆うように形成されたp形りラッド
層、(5a)はp形りラッド層(4a)の主面上に形成
された絶縁膜、(8a )は絶縁膜(5a)のp形活性
層(3a)に対応する部分を貫通しp形りラッドIti
i(4a)K接続されるように形成された主幹陽極、(
14a)および(14bltiそれぞれ絶縁膜(5a)
の第1の受動光位相変調部(13a )および第2の受
動光位相変調部(11)に対応する部分を貫通しp形り
ラッド層(4a)に接続されるように形成され第1の受
動光位相変調部(13a)および第2の受動光位相変調
部(13b)を駆動する駆動電極である。(夏)は主幹
陽極(8a)と共通陰極αOとの間に順方向電圧を印加
すると、順方向電流がp形活性層(3a)に集中して流
れてレーザ発振する主幹素子部である。In the figure, the same reference numerals as those in the conventional example shown in FIG. 1 indicate equivalent parts. αυ is made of an n-type crystal layer, and is located on a part of the main surface of the n-type rad layer (2) from the end face F shown in FIG. The n-type main waveguide (3a) is formed in a stripe shape across the facing end face F2 and guides the laser light, and the n-type main waveguide (3a) is made of a p-type crystal layer and is formed so as to overlap the main surface of the n-type main waveguide αη. A p-type active layer that oscillates laser light (12a
) and (12b) are n-type crystal layers, and each side surface on one end side is an n-type main waveguide on both outer parts of the n-type main waveguide αυ on the main surface of the n-type rad layer (2). The n-type main waveguide is optically coupled to the side surface of the end on the end face F2 side of the waveguide αD and is formed so that the end face on the other end side is flush with the end face F1 of the n-shaped rad layer (2). (13a) first and second n-type branch waveguides that branch a part of the laser light guiding αυ and radiate it to the outside from the end face on the end face F1 side;
and (rsb) are p-type crystal layers, and a first an n-type branch waveguide (12a) and a second n-type branch waveguide (x2
b) are provided to form a pn junction between the first n-type branch waveguide [12a) and the second n-type branch waveguide (
(4a) is a p-type crystal layer and an n-shaped rad layer (2);
An n-type main waveguide αD and an n-type branch waveguide (12
a), (12b) and passive optical phase modulation section (13
a), (13b) is a p-type rad layer formed to cover the p-type rad layer (5a) is an insulating film formed on the main surface of the p-type rad layer (4a), (8a) is an insulating film (5a) ) through the part corresponding to the p-type active layer (3a)
i(4a)K main anode formed to be connected, (
14a) and (14blti) respectively insulating film (5a)
The first passive optical phase modulation section (13a) and the second passive optical phase modulation section (11) are formed so as to penetrate through the parts corresponding to the first passive optical phase modulation section (13a) and the second passive optical phase modulation section (11) and to be connected to the p-shaped rad layer (4a). This is a drive electrode that drives the passive optical phase modulation section (13a) and the second passive optical phase modulation section (13b). (Summer) is the main element part where when a forward voltage is applied between the main anode (8a) and the common cathode αO, a forward current flows concentratedly in the p-type active layer (3a) and oscillates as a laser.
次に、この実施例の作用について説明する。Next, the operation of this embodiment will be explained.
ここで、受動光位相変調部(13a ) 、 (13b
)の機能について述べる。Here, passive optical phase modulation sections (13a), (13b
) functions.
駆動電極(14a)、(14b)と共通電極00との間
に逆方向バイアス電圧を印加すると、n形分岐導波路(
12a ) + (12b )と受動光位相変調部(1
3a)、(13b)との間に形成されるpn接合によっ
てn形分岐導波路(12a)、(12b)の受動光位相
変調部(xsa) 、 (1sb)と接する部分に空乏
層ができる。この空乏層によってn形分岐導波路(xz
a)、(xzb)の空乏層形成部分の屈折率が変化する
。この屈折率の変化量を△nとし、n形分岐導波路(1
2a) 、 (12b)が導波するレーザ光の波長をλ
とし、受動光位相変調部(13a) 、(13b)のn
形分岐導波路(12a)、(1zb)に沿う方向の長さ
をLとすれば、屈折率の変化量△nによってレーザ光の
位相の変化量φは次式で与えられる。When a reverse bias voltage is applied between the drive electrodes (14a), (14b) and the common electrode 00, the n-type branch waveguide (
12a) + (12b) and passive optical phase modulation section (1
3a) and (13b), a depletion layer is formed in the portions of the n-type branch waveguides (12a) and (12b) that are in contact with the passive optical phase modulation sections (xsa) and (1sb). This depletion layer creates an n-type branch waveguide (xz
The refractive index of the depletion layer forming portion of a) and (xzb) changes. Let the amount of change in this refractive index be △n, and the n-type branch waveguide (1
The wavelength of the laser light guided by 2a) and (12b) is λ
and n of the passive optical phase modulators (13a) and (13b)
If the length in the direction along the branched waveguides (12a) and (1zb) is L, then the amount of change φ in the phase of the laser beam is given by the amount of change Δn in the refractive index as shown below.
φ=2π・L△n/λ
例えば、Δn = 0.0035とし、λ=Q、13μ
mとし、L=23oμmとすれば、φ=2πとなる。φ=2π・L△n/λ For example, Δn = 0.0035, λ=Q, 13μ
m and L=23oμm, then φ=2π.
さて、駆動電極(14a) 、 (14b)と共通電極
Qf)との間に所要の逆方向バイアス電圧を印加した状
態において、主幹素子部(1)に順方向電流を流してp
形活性層(3a)にレーザ光を発振させると、p形活性
層に発振したレーザ光がn形主幹導波路αυによって導
波され、このレーザ光の一部分がn形分岐導波路(12
a)、(12b)に分岐され、受動光位相変調部(13
a)。Now, with a required reverse bias voltage applied between the drive electrodes (14a), (14b) and the common electrode Qf, a forward current is caused to flow through the main element section (1).
When the laser beam is oscillated in the p-type active layer (3a), the laser beam oscillated in the p-type active layer is guided by the n-type main waveguide αυ, and a part of this laser beam is transmitted to the n-type branch waveguide (12
a) and (12b), and a passive optical phase modulator (13
a).
(13b)によって所要の位相変化を生じてn形分岐導
波路(12a)、 (12bり端面F、側の端部から外
部へ放射され、残りの他の部分がn形主幹導波路αυの
端面F1側の端面から外部へ放射される。そして、これ
らのn形分岐導波路(12a)、 (12b)およびn
形主幹導波路0υの端面F1側の端面がら外部へ放射さ
れるレーザ光の干渉によって所要の放射パターンが得ら
れる。(13b) causes a required phase change, and the n-type branch waveguide (12a) is radiated to the outside from the end of the n-type main waveguide αυ (12b). It is radiated to the outside from the end face on the F1 side.Then, these n-type branch waveguides (12a), (12b) and n
A desired radiation pattern is obtained by interference of laser light emitted to the outside from the end face on the end face F1 side of the shaped main waveguide 0υ.
この実施例では、放射パターンを変化させようとする場
合には、駆動電極(14a ) 、 (14b)への逆
方向バイアス電圧を変化させることによって、放射出力
を変化させることなく、放射パターンのみを変化させる
ことができる。従って、放射出方のみを変化させようと
する場合には、主幹素子部(1)への順方向電流の変化
によって放射パターンも変化するが、この放射パターン
の変化を1.駆動電極(14a)。In this embodiment, when changing the radiation pattern, only the radiation pattern can be changed by changing the reverse bias voltage to the drive electrodes (14a) and (14b) without changing the radiation output. It can be changed. Therefore, when trying to change only the direction of radiation output, the radiation pattern also changes due to the change in the forward current to the main element section (1). Drive electrode (14a).
(14b)への逆方向バイアス電圧の変化によって容易
になくすことができる。This can be easily eliminated by changing the reverse bias voltage to (14b).
要するに、この実施例では、放射パターンの変化を放射
出力の変化とは独立に行うことが奄きる3第3図(蜀は
この発明の第2の実施例の半導体レーザ素子を示す平面
図、第3図(B)は第3図(A)の■B−■B線での断
面図、第3図(0)は第3図(A)の■c −4Hc線
での断面図である。In short, in this embodiment, it is possible to change the radiation pattern independently of the change in the radiation output. FIG. 3(B) is a cross-sectional view taken along the line ■B--■B of FIG. 3(A), and FIG. 3(0) is a cross-sectional view taken along the line ■c-4Hc of FIG. 3(A).
図において、第1図および第2図に示した符号と同一符
号は同等部分を示すっ(12c)l−i、n形結晶層か
らなりn形りラッド層(2)の主面のn形主幹導波路Q
l)の外側の一方の部分上に一方の端部側の側面がn形
主幹導波路(11)の端面F2側の端部の側面に光学的
に結合され他方の端部側が第1の部分(1201)と第
2の部分(x2cz)とに部分されてこれらの部分(1
2C1) 、 (12c 2)の端面がn形りラッド層
(2)の端面F1と同一平面になるように形成さinn
形分岐導波路0υ導波するレーザ光の一部を分岐して第
1の部分(12cl)の端面と第2の部分(1202)
の端面とから外部へ放射するn形分岐導波路、(13c
l)および(13c2)はp形結晶層からなりそれぞれ
n形分岐導波路(12c)の第1の部分(12cl)お
よび第2の部分(12c2)の主面上の一部分に第1の
部分(12cl)および第2の部分(12c2)との間
にpn接合を形成するように設けられ第1の部分(12
01)および第2の部分(12c2)によって導波され
外部へ放射されるレーザ光の位相を変化させる第1およ
び第2の受動光位相変調部、αOはn形主幹導波路0υ
のn形りラッド層(2)と接する界面部に設けられn形
主幹導波路αυを伝搬するレーザ光がn形主幹導波路α
υの両端面から外部へほとんど放射されな−ようにする
だめの波状の凹凸の回折格子である。In the figure, the same reference numerals as those shown in FIGS. 1 and 2 indicate equivalent parts. Main waveguide Q
l), the side surface on one end side is optically coupled to the side surface on the end surface F2 side of the n-type main waveguide (11), and the other end side is the first part. (1201) and a second part (x2cz).
2C1), (12c2) is formed so that its end face is flush with the end face F1 of the n-shaped rad layer (2).
A part of the laser light guided by the 0υ type branch waveguide is branched to the end face of the first part (12cl) and the second part (1202).
An n-type branch waveguide radiating to the outside from the end face of (13c
l) and (13c2) are p-type crystal layers, and the first part ( The first part (12c2) is provided so as to form a pn junction between the first part (12cl) and the second part (12c2).
01) and the second part (12c2), the first and second passive optical phase modulators change the phase of the laser beam guided and radiated to the outside, αO is the n-type main waveguide 0υ
The laser light propagating through the n-type main waveguide αυ provided at the interface in contact with the n-type rad layer (2) is transmitted through the n-type main waveguide αυ.
It is a diffraction grating with wavy irregularities that prevents almost no radiation from being emitted to the outside from both end faces of υ.
この実施例では、回折格子α時によってn形主幹導波路
(11)の端面からレーザ光が外部へほとんど放射され
ないので、n形分岐導波路(12c )の第1の部分(
12cl)の端面と第2の部分(12c2)の端面とか
ら放射されるレーザ光のみの干渉によって放射パターン
が得られる。従って、放射出方を変化させたときに、n
形主幹導波路(1])の端面からレーザ光がほとんど放
射されないので、放射出力の変化による放射パターンの
変化をほとんどないようにすることができる。In this embodiment, since almost no laser light is emitted to the outside from the end face of the n-type main waveguide (11) due to the diffraction grating α, the first portion (
A radiation pattern is obtained by interference of only the laser beams emitted from the end face of the second portion (12cl) and the end face of the second portion (12c2). Therefore, when changing the radiation output direction, n
Since almost no laser light is emitted from the end face of the shaped main waveguide (1), it is possible to minimize changes in the radiation pattern due to changes in radiation output.
なお、第1の実施例において、n形分岐導波路(12a
) 、、(12b )のうちの例えば第2のn形分岐
導波路(12b)を省略しても第1の実施例と同様の効
果があり、また第2のn形分岐導波路(12’b)を省
略して第1のn形分岐導波路(12a)の端面F1側の
端部を二分割以上に分割しても第1の実施例と同様の効
果がある。また、第2の実施例では、n形分岐導波路(
12c)の端面F、側の端部を二分割したが、三分割以
上に分割してもよい、また、第2の実施例では、n形主
幹導波路θηの端面から外部へのレーザ光の放射を少な
くするために回折格子Q$を用いたが、主幹素子部(1
)の共振器の反射率を十分大きくするようにしてもよい
。Note that in the first embodiment, an n-type branch waveguide (12a
), , (12b), for example, the second n-type branch waveguide (12b) can be omitted, the same effect as in the first embodiment can be obtained, and the second n-type branch waveguide (12' Even if b) is omitted and the end portion of the first n-type branch waveguide (12a) on the end face F1 side is divided into two or more parts, the same effect as in the first embodiment can be obtained. In addition, in the second embodiment, an n-type branch waveguide (
Although the end face F of 12c) is divided into two, it may be divided into three or more parts.In addition, in the second embodiment, the laser beam is transmitted from the end face of the n-type main waveguide θη to the outside. A diffraction grating Q$ was used to reduce radiation, but the main element part (1
) may be made to have a sufficiently large reflectance.
上記第1および第2の実施例では、受動光位相変調部と
n形分岐導波路との間に形成される接合がpn接合であ
る場合について述べたが、この発明はこれに限らず、シ
ョットキー接合やM工S接合である場合にも適用するこ
とができる。1だ、上記第1および第2の実施例では、
n形結晶基板を用いる場合について述べたが、この発明
はこれに限らず、p形結晶基板を用いる場合にも適用す
ることができる。この場合には、上記第1および第2の
実施例において、n影領域をp影領域にし、p影領域を
n影領域にすればよい。In the first and second embodiments described above, the case where the junction formed between the passive optical phase modulator and the n-type branch waveguide is a pn junction, but the present invention is not limited to this. It can also be applied to key joints and M/S joints. 1. In the first and second embodiments above,
Although the case where an n-type crystal substrate is used has been described, the present invention is not limited thereto, and can also be applied to a case where a p-type crystal substrate is used. In this case, in the first and second embodiments, the n shadow area may be changed to the p shadow area, and the p shadow area may be changed to the n shadow area.
以上、説明したように、この発明の半導体レーザ素子で
は、主面上に活性層が形成されこの活性層が発振するレ
ーザ光が導波されて外部へ放射される主幹導波路とその
一部に光学的に結合されこの主幹導波路が導波するレー
ザ光の一部を分岐して外部へ放射する分岐導波路とを有
し、この分岐導波路の一部にこの分岐導波路によって導
波され外部へ放射されるレーザ光の位相を変化させ得る
受動光位相変調部を設けたので、上記主幹導波路および
上記分岐導波路からそれぞれ外部へ放射されるレーザ光
の干渉によってできる放射パターンを変化させる場合に
は、上記受動光位相変調部によって上記分岐導波路で導
波されるレーザ光の位相を変化させることによって、上
記主幹導波路および上記分岐導波路から外部へ放射され
るレーザ光の放射出力を変化させることなく、放射パタ
ーンのみを変化させることができる。要するに、放射パ
ターンの変化を放射出力の変化とは独立に行うことがで
きる。As explained above, in the semiconductor laser device of the present invention, the active layer is formed on the main surface, and the laser light oscillated by the active layer is guided and emitted to the outside through the main waveguide and a part thereof. It has a branching waveguide that is optically coupled and branches a part of the laser light guided by this main waveguide and radiates it to the outside, and a part of the branching waveguide is guided by this branching waveguide. Since a passive optical phase modulation section capable of changing the phase of the laser light emitted to the outside is provided, the radiation pattern formed by interference of the laser light emitted to the outside from the main waveguide and the branch waveguide, respectively, is changed. In this case, by changing the phase of the laser light guided in the branch waveguide by the passive optical phase modulation section, the radiation output of the laser light radiated to the outside from the main waveguide and the branch waveguide can be adjusted. It is possible to change only the radiation pattern without changing the radiation pattern. In short, changes in the radiation pattern can be made independently of changes in the radiation output.
第1図(A)は従来の半導体レーザ素子の一例を示す平
面図、第1図(B)は第1図(A)のIB−IB線での
断面図、第2図(A)はこの発明の第1の実施例の半導
体レーザ素子を示す平面図、第2図(B)は第2図(A
)のIIB−IB線での断面図、第3図(A)はこの発
明の第2の実施例の半導体レーザ素子を示す平面図、第
3図(B)は第3図(A)のIflB−111B線での
断面図、第3図(0)は第3図(A)の■0−■0線で
の断面図である。
図において、(1)はn形結晶基板1第16電形の結晶
基板) 、(2)はn形りラッド層(第1導電形のクラ
ッド層)、(3a)はp形活性層(第2導電形の活性1
i1N)、(4a)はp形りラッド層(第2導電形のク
ラッド層L(8a)は主幹電極、00は共通電極、01
)はn形主幹導波路(第1導電形の主幹導波路)、(1
2a) 、 (12b)および(工2c)はn形分岐導
波路(第2導電形の分岐導波路)、 (1201)およ
び(12c2) はn形分岐導波路(12Q )が部分
された第1および第2の部分、(13a)、(13b)
、(13cl)および(13c2)は受動光位相変調部
、(14a )および(14b)は駆動電極、(1Gは
回折格子である。
なお、図中同一符号はそれぞれ同一または相当部分を示
す。
代理人 大岩増雄
第1図
(A)
(B)
I II
第2図
CB)
第3 iM
■(A)(ご)
AFIG. 1(A) is a plan view showing an example of a conventional semiconductor laser device, FIG. 1(B) is a sectional view taken along line IB-IB of FIG. 1(A), and FIG. 2(A) is a plan view of this example. A plan view showing the semiconductor laser device of the first embodiment of the invention, FIG. 2(B) is similar to FIG.
), FIG. 3(A) is a plan view showing a semiconductor laser device according to a second embodiment of the present invention, and FIG. 3(B) is a cross-sectional view taken along line IIB-IB of FIG. 3(A). 3(0) is a sectional view taken along line -111B, and FIG. 3(0) is a sectional view taken along line ■0--■0 in FIG. 3(A). In the figure, (1) is an n-type crystal substrate (16th conductivity type crystal substrate), (2) is an n-type rad layer (first conductivity type cladding layer), and (3a) is a p-type active layer (16th conductivity type crystal substrate). 2 conductivity type activity 1
i1N), (4a) are p-type cladding layers (the second conductivity type cladding layer L (8a) is the main electrode, 00 is the common electrode, 01
) is an n-type main waveguide (first conductivity type main waveguide), (1
2a), (12b) and (2c) are n-type branch waveguides (branch waveguides of the second conductivity type), (1201) and (12c2) are the first branch waveguides from which the n-type branch waveguide (12Q) is divided. and the second part, (13a), (13b)
, (13cl) and (13c2) are passive optical phase modulators, (14a) and (14b) are drive electrodes, and (1G is a diffraction grating. In addition, the same reference numerals in the figures indicate the same or corresponding parts. Person Masuo Oiwa Figure 1 (A) (B) I II Figure 2 CB) 3rd iM ■(A) (Go) A
Claims (1)
形成された第1導電形のクラッド層、この第1導電形の
クラッド層の主面上の一部分に上記第1導電形のクラッ
ド層の第1の端面がらこの第1の端直に背向する第2の
端面にわたってストライプ状に形成されレーザ光が導波
される第1導電形の主幹導波路、この主幹導波路の主面
上に形成されレーザ光を発振する第2導電形の活性層、
上記第1導電形のクラッド層の主面の上記主幹導波路の
外側の少なくとも一方の部分上に一方の端部側の側面が
上記主幹導波路の上記第2の端面側の端部の側面に光学
的に結合され他方の端部側が上記主幹導波路との間に間
隔をおいてその端面が上記第1導電形のクラッド層の上
記第1の端面と同一平面になるよって形成され上記主幹
導波路によって導波されるレーザ光の一部を分岐して上
記第1の端面側の端面から外部へ放射する第1導電形の
分岐導波路、この分岐導波路の主面の上記第1の端面側
の端部上に上記分岐導波路との間に接合を形成するよう
に設けられ上記分岐導波路によって導波され外部へ放射
されるレーザ光の位相を変化させる受動光位相変調部、
上記第1導電形のクラッド層の主面上に上記主幹導波路
、上記活性層。 上記分岐導波路および上記受動光位相変調部を覆うよう
形成された第2導電形のクラッド層、この第2導電形の
クラッド層の主面上の上記活性層に対応する部分に形成
された主幹電極、上記第2導電形のクラッド層の主面上
の上記受動光位相変調部に対応する部分に形成され上記
受動光位相変調部を駆動する駆動電極、並びに上記結晶
基板の主面上に形成された共通電極を備えた半導体レー
ザ素子。 (2)受動光位相変調部と分岐導波路との間に形成され
る接合がpn接合であることを特徴とする特許請求の範
囲第1項記載の半導体レーザ素子っ(3)分岐導波路の
第1の端面側の端部が棲数個に分割されたことを特徴と
する特許請求の範囲第1項または第2項記載の半導体レ
ーザ素子。 (4) 主幹導波路の第1導電形のクラッド層と接する
界面部に上記主幹導波路を導波するレーザ光が上記主幹
導波路の両端面から外部へほとんど放射されなりように
する回折格子が設けられたことを特徴とする特許請求の
範囲第3項記載の半導体レーザ素子。[Scope of Claims] (1) A crystal substrate of a first conductivity type, a cladding layer of a first conductivity type formed on a main surface of this crystal substrate, and a portion on the main surface of this cladding layer of a first conductivity type. a main waveguide of the first conductivity type, which is formed in a stripe shape from a first end face of the cladding layer of the first conductivity type to a second end face directly opposite to the first end face, and through which the laser beam is guided; , an active layer of a second conductivity type that is formed on the main surface of the main waveguide and oscillates a laser beam;
A side surface of the main surface of the first conductivity type cladding layer on at least one outside of the main waveguide, and a side surface of the main waveguide on the second end surface side of the main waveguide. The main waveguide is optically coupled, and the other end side thereof is spaced apart from the main waveguide, and the end face thereof is flush with the first end face of the cladding layer of the first conductivity type. A branching waveguide of a first conductivity type that branches a part of the laser light guided by the waveguide and radiates it to the outside from an end face on the side of the first end face, and the first end face of the main face of the branching waveguide. a passive optical phase modulation section that is provided on the side end so as to form a junction with the branch waveguide and changes the phase of the laser light that is guided by the branch waveguide and radiated to the outside;
The main waveguide and the active layer are provided on the main surface of the cladding layer of the first conductivity type. A cladding layer of a second conductivity type formed to cover the branch waveguide and the passive optical phase modulation section; an electrode, a drive electrode formed on the main surface of the second conductivity type cladding layer at a portion corresponding to the passive optical phase modulation section and driving the passive optical phase modulation section, and formed on the main surface of the crystal substrate. A semiconductor laser device with a common electrode. (2) The semiconductor laser device according to claim 1, wherein the junction formed between the passive optical phase modulator and the branching waveguide is a pn junction. (3) The branching waveguide 3. The semiconductor laser device according to claim 1, wherein the end portion on the first end face side is divided into several pieces. (4) A diffraction grating is provided at the interface of the main waveguide in contact with the cladding layer of the first conductivity type so that most of the laser light guided through the main waveguide is not radiated to the outside from both end surfaces of the main waveguide. 4. A semiconductor laser device according to claim 3, further comprising a semiconductor laser device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11750183A JPS607791A (en) | 1983-06-27 | 1983-06-27 | Semiconductor laser element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11750183A JPS607791A (en) | 1983-06-27 | 1983-06-27 | Semiconductor laser element |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS607791A true JPS607791A (en) | 1985-01-16 |
Family
ID=14713302
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11750183A Pending JPS607791A (en) | 1983-06-27 | 1983-06-27 | Semiconductor laser element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS607791A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018195062A1 (en) * | 2017-04-19 | 2018-10-25 | Macom Technology Solutions Holdings, Inc. | Far field spatial modulation |
-
1983
- 1983-06-27 JP JP11750183A patent/JPS607791A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018195062A1 (en) * | 2017-04-19 | 2018-10-25 | Macom Technology Solutions Holdings, Inc. | Far field spatial modulation |
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