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JPS6489325A - Aligner - Google Patents

Aligner

Info

Publication number
JPS6489325A
JPS6489325A JP62245206A JP24520687A JPS6489325A JP S6489325 A JPS6489325 A JP S6489325A JP 62245206 A JP62245206 A JP 62245206A JP 24520687 A JP24520687 A JP 24520687A JP S6489325 A JPS6489325 A JP S6489325A
Authority
JP
Japan
Prior art keywords
mask
substrate
grating
ray
aligning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62245206A
Other languages
Japanese (ja)
Other versions
JPH06105679B2 (en
Inventor
Noboru Nomura
Kazuhiro Yamashita
Keisuke Koga
Masaki Suzuki
Yuichiro Yamada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP62245206A priority Critical patent/JPH06105679B2/en
Publication of JPS6489325A publication Critical patent/JPS6489325A/en
Publication of JPH06105679B2 publication Critical patent/JPH06105679B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To accurately align a mask with a pattern on a substrate through an interference fringes generated from a reference grating, to observe an alignment signal during exposure and to reduce an error in case of moving by introducing a luminous flux obliquely to the mask and the substrate. CONSTITUTION:An X-ray is irradiated from the window 2 of an X-ray source 1 to a mask 5 and a wafer 6. An optical system having an aligning light source 11, a reference mask 13 formed with a reference grating 14, Fourier transforming lenses 15, 17 coupled at a Fourier spectral plane and a space filter 16 is disposed on a region irradiated with the X-ray. Two spectra are selected by the filter 16, and an interference fringes are generated on a focusing surface with two luminous fluxes passed through the lens 17. The luminous flux is irradiately obliquely to an aligning grating 18 on the mask 5 and an aligning grating 19 on the substrate, the movement of the radiated position during exposure is observed by a photodetector 20, and the mask 5 is accurately aligned with the pattern of the substrate.
JP62245206A 1987-09-29 1987-09-29 Exposure equipment Expired - Lifetime JPH06105679B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62245206A JPH06105679B2 (en) 1987-09-29 1987-09-29 Exposure equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62245206A JPH06105679B2 (en) 1987-09-29 1987-09-29 Exposure equipment

Publications (2)

Publication Number Publication Date
JPS6489325A true JPS6489325A (en) 1989-04-03
JPH06105679B2 JPH06105679B2 (en) 1994-12-21

Family

ID=17130202

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62245206A Expired - Lifetime JPH06105679B2 (en) 1987-09-29 1987-09-29 Exposure equipment

Country Status (1)

Country Link
JP (1) JPH06105679B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007180548A (en) * 2005-12-27 2007-07-12 Asml Netherlands Bv Pattern alignment method and lithographic apparatus
CN102692827A (en) * 2011-03-21 2012-09-26 上海微电子装备有限公司 Aligning device for photolithography equipment
US8355139B2 (en) 2009-02-26 2013-01-15 Samsung Electronics Co., Ltd. Semiconductor apparatus including alignment tool
JP2024149505A (en) * 2019-02-28 2024-10-18 エーエスエムエル ネザーランズ ビー．ブイ． Apparatus for assembling a reticle assembly - Patent application

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6286722A (en) * 1985-10-11 1987-04-21 Matsushita Electric Ind Co Ltd Exposure device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6286722A (en) * 1985-10-11 1987-04-21 Matsushita Electric Ind Co Ltd Exposure device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007180548A (en) * 2005-12-27 2007-07-12 Asml Netherlands Bv Pattern alignment method and lithographic apparatus
US8355139B2 (en) 2009-02-26 2013-01-15 Samsung Electronics Co., Ltd. Semiconductor apparatus including alignment tool
CN102692827A (en) * 2011-03-21 2012-09-26 上海微电子装备有限公司 Aligning device for photolithography equipment
JP2024149505A (en) * 2019-02-28 2024-10-18 エーエスエムエル ネザーランズ ビー．ブイ． Apparatus for assembling a reticle assembly - Patent application
US12449726B2 (en) 2019-02-28 2025-10-21 Asml Netherlands B.V. Apparatus for assembly of a reticle assembly

Also Published As

Publication number Publication date
JPH06105679B2 (en) 1994-12-21

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