JPS6421920A - Close-up type exposure device - Google Patents

Abstract

PURPOSE:To improve the transfer accuracy of a mask pattern, by providing a substrate measuring means, which measures a gap with a substrate without contact, a substrate moving means, which moves the substrate on a plane and in the slanted and up/down directions, a mask measuring means, which measures a gap with a plane for forming the mask pattern in a noncontact manner, a mask moving means, and the like. CONSTITUTION:The following parts are provided: a table member 7, which moves a substrate chuck 2 in the horizontal direction; a substrate moving means, which moves the substrate in the up and down directions and inclines the substrate; a mask moving means 14, which moves a mask chuck in the up and down directions and inclines the chuck; a substrate measuring means, which measures the height of the substrate that is scanned with the movement of the table member 7 in the horizontal direction with a substrate displacement gage; a mask measuring means, which measures the height of a mask 9 at the same time as the movement of the table member 7 in the horizontal direction with a mask didplacement gage 8 that is fixed on the table 7; and a control means, which controls the substrate moving means 4 so that the height of the substrate 1 that is measured with said substrate measuring means becomes constant and controls the mask moving means 14 so that the height of the mask 9 that is measured with said mask measuring means becomes constant.