JPS6414855A - Ion implantation device - Google Patents
Ion implantation deviceInfo
- Publication number
- JPS6414855A JPS6414855A JP62171502A JP17150287A JPS6414855A JP S6414855 A JPS6414855 A JP S6414855A JP 62171502 A JP62171502 A JP 62171502A JP 17150287 A JP17150287 A JP 17150287A JP S6414855 A JPS6414855 A JP S6414855A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- pullout
- detector
- light
- predetermined position
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005468 ion implantation Methods 0.000 title 1
- 238000005259 measurement Methods 0.000 abstract 3
Landscapes
- Electron Sources, Ion Sources (AREA)
Abstract
PURPOSE:To enable the simple adjustment of a pullout electrode in a short time by providing a detector and a display corresponding to respective illuminants so as to detect light from a plurlaity of the illuminants when the pullout electrode is at the predetermined position. CONSTITUTION:A slit 10 is so set as to allow a maximum amount of light from an illuminant 9 when a pullout electrode 2a is set at the predetermined position. The light from the illuminant 9 provided in an ion source part 1 passes the slit 10 of the pullout electrode 2a and is received by a detector 11 provided at the rear of the electrode 2a. As a detected signal from the detector 11 gives a voltage change depending upon a light receiving amount, the voltage is measured by a measurement instrument 12 and the result of the measurement is shown on a display 13. By controlling the position of the pullout electrode 2a in such a way as to obtain the maximum value of measurement with each instrument 12, therefore, the position of the electrode 2a can be adjusted to the predetermined position.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62171502A JPS6414855A (en) | 1987-07-08 | 1987-07-08 | Ion implantation device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62171502A JPS6414855A (en) | 1987-07-08 | 1987-07-08 | Ion implantation device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6414855A true JPS6414855A (en) | 1989-01-19 |
Family
ID=15924291
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62171502A Pending JPS6414855A (en) | 1987-07-08 | 1987-07-08 | Ion implantation device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6414855A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007076759A (en) * | 2005-09-12 | 2007-03-29 | Mitsubishi Electric Corp | Cable fixing device |
| JP2008258084A (en) * | 2007-04-09 | 2008-10-23 | Seiko Instruments Inc | Ion beam inspection device and method, semiconductor manufacturing device, and ion source device |
| JP2021166702A (en) * | 2020-03-25 | 2021-10-21 | フェンウォール、インコーポレイテッド | Dynamic adjustment of components of detection assembly |
-
1987
- 1987-07-08 JP JP62171502A patent/JPS6414855A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007076759A (en) * | 2005-09-12 | 2007-03-29 | Mitsubishi Electric Corp | Cable fixing device |
| JP2008258084A (en) * | 2007-04-09 | 2008-10-23 | Seiko Instruments Inc | Ion beam inspection device and method, semiconductor manufacturing device, and ion source device |
| KR101421737B1 (en) * | 2007-04-09 | 2014-07-22 | 세이코 인스트루 가부시키가이샤 | Ion beam inspection apparatus, ion beam inspection method, semiconductor manufacturing apparatus, and ion source apparatus |
| JP2021166702A (en) * | 2020-03-25 | 2021-10-21 | フェンウォール、インコーポレイテッド | Dynamic adjustment of components of detection assembly |
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