[go: up one dir, main page]

JPS57133631A - Exposing device - Google Patents

Exposing device

Info

Publication number
JPS57133631A
JPS57133631A JP56019099A JP1909981A JPS57133631A JP S57133631 A JPS57133631 A JP S57133631A JP 56019099 A JP56019099 A JP 56019099A JP 1909981 A JP1909981 A JP 1909981A JP S57133631 A JPS57133631 A JP S57133631A
Authority
JP
Japan
Prior art keywords
light
mirror
spherical mirrors
integrator
constitution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56019099A
Other languages
Japanese (ja)
Inventor
Hideyuki Hirose
Masatoshi Komatani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP56019099A priority Critical patent/JPS57133631A/en
Publication of JPS57133631A publication Critical patent/JPS57133631A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To efficiently utilize light by a method wherein, in the exposing device using an optical integrator of its optical system, the integrator is composed of a plurality of small spherical mirrors or small parabolic reflectors or the like. CONSTITUTION:The flux of light emitted from an extra-high pressure mercury lamp 11 is caught by an elliptic concave mirror 12, the direction of the light is changed by a plane mirror 13, the direction of the light is further changed by the collimeter mirror 14 consisting of a convex mirror and at the same time, the light is formed in parallel. Then, the intensity of illumination of the flux of light is uniformalized by an optical integrator, and at the same time, the direction of the light is changed, formed into parallel with the focusing by the condenser mirror 16 consisting of a concave mirror, a change of direction is performed again, and irradiated on a mask face 18. In this constitution, the integrator 15 has the constitution wherein a plurality of small spherical mirrors 20 are supported by a case 21, and the outer circumference of the small spherical mirrors is formed into a hexagonal shape, and aluminum is coated on the reflecting surface. The small spherical mirrors 20 may be formed in a square or round shape, but a hexagonal shape is desirable to prevent the generation of clearance at the adjoining section. Small parabolic reflectors may be used instead of the above.
JP56019099A 1981-02-13 1981-02-13 Exposing device Pending JPS57133631A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56019099A JPS57133631A (en) 1981-02-13 1981-02-13 Exposing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56019099A JPS57133631A (en) 1981-02-13 1981-02-13 Exposing device

Publications (1)

Publication Number Publication Date
JPS57133631A true JPS57133631A (en) 1982-08-18

Family

ID=11990020

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56019099A Pending JPS57133631A (en) 1981-02-13 1981-02-13 Exposing device

Country Status (1)

Country Link
JP (1) JPS57133631A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5555135A (en) * 1989-06-29 1996-09-10 Dainippon Screen Manufacturing Co., Ltd. Illumination system
KR100486073B1 (en) * 2001-07-27 2005-04-29 캐논 가부시끼가이샤 Illumination system, projection exposure apparatus and device manufacturing method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5555135A (en) * 1989-06-29 1996-09-10 Dainippon Screen Manufacturing Co., Ltd. Illumination system
KR100486073B1 (en) * 2001-07-27 2005-04-29 캐논 가부시끼가이샤 Illumination system, projection exposure apparatus and device manufacturing method

Similar Documents

Publication Publication Date Title
US4683525A (en) Lamp having segmented reflector
CA2141684A1 (en) Concentrating and collecting optical system using concave toroidal reflectors
CA2080083A1 (en) Optical arrangement for exposure apparatus
FI875385A0 (en) BELYSNINGSANORDNING FOER CYKEL.
US4713738A (en) Light fixture using a holographic optical reflector
JPS57211109A (en) Microscope
JPS57133631A (en) Exposing device
JPS5493974A (en) Projection-system mask alignment unit
JPS6286340A (en) Lighting fixture for photography
JPS54148546A (en) Reflection type light source
KR950001868A (en) Exposure device using lighting device and copper device
JPS544076A (en) Irradiation unit for far ultraviolet ray exposure
US3215829A (en) Illumination device
GB825638A (en) Improvements relating to lighting apparatus
JPS54161769A (en) Lamp for automobile
JPS63293547A (en) Optical device for illumination
JPS52140348A (en) Optical device for photo-processing
SU383957A1 (en) DEVICE FOR RADIATION RADIATION
JPS6476720A (en) Illumination optical system for semiconductor exposure device
SU700743A1 (en) Lighting fixture
JPS57204425A (en) Artificial light source device with variable intensity
JPS52134369A (en) Reflecting mirror for exposing light source
JPS6126162B2 (en)
SU956908A1 (en) Light radiation point source
JPS557714A (en) Luminous flux corrector