[go: up one dir, main page]

JPS57119442A - Scanning electron microscope device - Google Patents

Scanning electron microscope device

Info

Publication number
JPS57119442A
JPS57119442A JP56005699A JP569981A JPS57119442A JP S57119442 A JPS57119442 A JP S57119442A JP 56005699 A JP56005699 A JP 56005699A JP 569981 A JP569981 A JP 569981A JP S57119442 A JPS57119442 A JP S57119442A
Authority
JP
Japan
Prior art keywords
sample
sample surface
electromagnetic
electron microscope
scanning electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56005699A
Other languages
Japanese (ja)
Inventor
Sachiko Hirota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP56005699A priority Critical patent/JPS57119442A/en
Publication of JPS57119442A publication Critical patent/JPS57119442A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/026—Means for avoiding or neutralising unwanted electrical charges on tube components

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Sampling And Sample Adjustment (AREA)

Abstract

PURPOSE:To make the device possible to observe a sample surface through the secondary electron image while the sample surface is not charged, by neutralizing the charge on the sample surface by generating glow discharge. CONSTITUTION:An incident electron beam 2 introduced from an electron gun 1 is focused step wise with two electromagnetic lenses comprising an electromagnetic focusing lens 3 and electromagnetic objective lens 5, and irradiated on a sample 7. When, the electron beam can scan two-dimensionally on the sample surface with a scanning coil 4 and auxiliary deflecting coil 6. Electrons emitted from the sample 7 are catched by a detector 9, and the secondary electron image of the sample surface is observed. A glow discharge generator 10 is provided in the vicinity of the sample 7, and charges on the sample 7 is neutralized by glow discharging.
JP56005699A 1981-01-16 1981-01-16 Scanning electron microscope device Pending JPS57119442A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56005699A JPS57119442A (en) 1981-01-16 1981-01-16 Scanning electron microscope device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56005699A JPS57119442A (en) 1981-01-16 1981-01-16 Scanning electron microscope device

Publications (1)

Publication Number Publication Date
JPS57119442A true JPS57119442A (en) 1982-07-24

Family

ID=11618345

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56005699A Pending JPS57119442A (en) 1981-01-16 1981-01-16 Scanning electron microscope device

Country Status (1)

Country Link
JP (1) JPS57119442A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5089710A (en) * 1989-09-04 1992-02-18 Tokyo Electron Limited Ion implantation equipment
US5352894A (en) * 1992-10-19 1994-10-04 Sharp Kabushiki Kaisha Electron spectroscopy analyzer and a method of correcting a shift of spectral line in electron spectroscopy
EP1296352A4 (en) * 2000-06-27 2007-04-18 Ebara Corp Charged particle beam inspection apparatus and method for fabricating device using that inspection apparatus
JP2008191166A (en) * 2008-04-02 2008-08-21 Keio Gijuku Glow discharge drilling apparatus and glow discharge drilling method
JP2020187873A (en) * 2019-05-10 2020-11-19 日本製鉄株式会社 Sample analysis method
JP2020187872A (en) * 2019-05-10 2020-11-19 日本製鉄株式会社 Sample analysis method

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5089710A (en) * 1989-09-04 1992-02-18 Tokyo Electron Limited Ion implantation equipment
US5352894A (en) * 1992-10-19 1994-10-04 Sharp Kabushiki Kaisha Electron spectroscopy analyzer and a method of correcting a shift of spectral line in electron spectroscopy
EP1296352A4 (en) * 2000-06-27 2007-04-18 Ebara Corp Charged particle beam inspection apparatus and method for fabricating device using that inspection apparatus
US7241993B2 (en) 2000-06-27 2007-07-10 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US7411191B2 (en) 2000-06-27 2008-08-12 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US8053726B2 (en) 2000-06-27 2011-11-08 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US8368031B2 (en) 2000-06-27 2013-02-05 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US8803103B2 (en) 2000-06-27 2014-08-12 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US9368314B2 (en) 2000-06-27 2016-06-14 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
JP2008191166A (en) * 2008-04-02 2008-08-21 Keio Gijuku Glow discharge drilling apparatus and glow discharge drilling method
JP2020187873A (en) * 2019-05-10 2020-11-19 日本製鉄株式会社 Sample analysis method
JP2020187872A (en) * 2019-05-10 2020-11-19 日本製鉄株式会社 Sample analysis method

Similar Documents

Publication Publication Date Title
EP0592899B1 (en) A scanning electron microscope
KR850001390B1 (en) Secondary Electronic Detection Device
GB1426359A (en) Microbeam probe apparatus
EP0782170A3 (en) Phase-contrast electron microscope and phase plate therefor
US4587425A (en) Electron beam apparatus and electron collectors therefor
JPS5730253A (en) Secondary electron detector for scan type electron microscope
US5045705A (en) Charged particle beam apparatus with charge-up compensation
US3717761A (en) Scanning electron microscope
EP0084850B1 (en) Apparatus for irradiation with charged particle beams
JPS57119442A (en) Scanning electron microscope device
EP0537961B1 (en) Charged particle energy analysers
GB1514339A (en) Slit-scanning image converter tube
US3792263A (en) Scanning electron microscope with means to remove low energy electrons from the primary electron beam
US3946268A (en) Field emission gun improvement
JP3432091B2 (en) Scanning electron microscope
JP2002025492A (en) Method and apparatus for imaging a sample using a low profile electron detector for a charged particle beam imager including an electrostatic mirror
US3345514A (en) Television camera combined with an electron microscope and having a plurality of cathodoconductive targets
RU2100867C1 (en) Pulse electrooptical transducer for time analysis of images
JPS6410561A (en) Electrostatic lens with secondary electron detector function
JPS62186451A (en) scanning electron microscope
JPS6415604A (en) Measuring apparatus for length by electron beam
JPS6047358A (en) Electron ray device
GB799425A (en) Improvements in or relating to arrangements embodying pick-up tubes
JPS5714252A (en) Multistylus electrode device using cathode ray tube
JPS57130012A (en) Noctovision device