JPS56828Y2 - - Google Patents
Info
- Publication number
- JPS56828Y2 JPS56828Y2 JP1978108706U JP10870678U JPS56828Y2 JP S56828 Y2 JPS56828 Y2 JP S56828Y2 JP 1978108706 U JP1978108706 U JP 1978108706U JP 10870678 U JP10870678 U JP 10870678U JP S56828 Y2 JPS56828 Y2 JP S56828Y2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Warehouses Or Storage Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1978108706U JPS56828Y2 (en) | 1978-08-08 | 1978-08-08 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1978108706U JPS56828Y2 (en) | 1978-08-08 | 1978-08-08 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5524959U JPS5524959U (en) | 1980-02-18 |
| JPS56828Y2 true JPS56828Y2 (en) | 1981-01-10 |
Family
ID=29054004
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1978108706U Expired JPS56828Y2 (en) | 1978-08-08 | 1978-08-08 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56828Y2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6914114B2 (en) | 2000-07-17 | 2005-07-05 | Honeywell International Inc. | Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography |
| US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
| US8992806B2 (en) | 2003-11-18 | 2015-03-31 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5645472Y2 (en) * | 1977-12-29 | 1981-10-23 |
-
1978
- 1978-08-08 JP JP1978108706U patent/JPS56828Y2/ja not_active Expired
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6914114B2 (en) | 2000-07-17 | 2005-07-05 | Honeywell International Inc. | Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography |
| US8992806B2 (en) | 2003-11-18 | 2015-03-31 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
| US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5524959U (en) | 1980-02-18 |