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JPH11281560A - Repose angle measuring device - Google Patents

Repose angle measuring device

Info

Publication number
JPH11281560A
JPH11281560A JP10086896A JP8689698A JPH11281560A JP H11281560 A JPH11281560 A JP H11281560A JP 10086896 A JP10086896 A JP 10086896A JP 8689698 A JP8689698 A JP 8689698A JP H11281560 A JPH11281560 A JP H11281560A
Authority
JP
Japan
Prior art keywords
electric furnace
pedestal
gas
measuring
funnel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP10086896A
Other languages
Japanese (ja)
Inventor
Takeshi Aoki
猛 青木
Takashi Ina
孝 伊奈
Yukichi Yanaka
佑吉 谷中
Hiroshi Suzumura
鈴村  洋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Toho Gas Co Ltd
Japan Gas Association
Original Assignee
Mitsubishi Heavy Industries Ltd
Toho Gas Co Ltd
Japan Gas Association
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd, Toho Gas Co Ltd, Japan Gas Association filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP10086896A priority Critical patent/JPH11281560A/en
Publication of JPH11281560A publication Critical patent/JPH11281560A/en
Withdrawn legal-status Critical Current

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  • Length Measuring Devices By Optical Means (AREA)

Abstract

PROBLEM TO BE SOLVED: To measure with high accuracy, workability and safety by setting a measurement particle-supplying means set above a rotary stage for dropping measurement particles onto the rotary pedestal and a heating means, and measuring an inclination angle of a particle layer piled on the rotary stage. SOLUTION: A vacuum container 21 has a cylindrical electric furnace 22 inside. A funnel 24 is arranged at an upper part inside the electric furnace 22, and a rotary pedestal 25 is disposed at a bottom part inside the electric furnace. A feed pipe 28 for feeding measurement particles is set at an upper part of the funnel 24. After a predetermined quantity is injected, a hole of a bottom part of the funnel is shut by a stopper 29 having a circular conical leading end. A light-emitting part 31 with observation windows 30a, 30b and an image pickup device 32 as a light-detecting part are arranged at the side of two holes 23 of the electric furnace 22. In this constitution, the air in the vacuum container 21 is removed, gas is supplied from a cylinder 45 and heated by the electric furnace 22. Then, the stopper 29 is opened and measurement particles are injected from the funnel 24. When a predetermined pile is formed, light is projected from the light-emitting part 31 and the inclination of a shadow at the side of the other observation window 30b is measured.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は安息角測定装置に関
し、特に高温下における物質粒子の挙動を調べるための
安息角測定装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus for measuring the angle of repose, and more particularly to an apparatus for measuring the angle of repose for examining the behavior of material particles at high temperatures.

【0002】[0002]

【従来の技術】従来、高温における物質粒子の挙動を調
べるための安息角測定装置としては、図3及び図4
(A),(B)に示すものが知られている。ここで、図
3は従来の安息角測定装置の全体図、図4(A)は図3
の装置において粉粒体の安息角測定に用いた回転容器の
側面図、図4(B)は図4(A)のX−X矢視図を示
す。
2. Description of the Related Art Conventionally, as a repose angle measuring device for examining the behavior of a material particle at a high temperature, FIGS.
(A) and (B) are known. Here, FIG. 3 is an overall view of a conventional repose angle measuring apparatus, and FIG.
FIG. 4B is a side view of the rotary container used for measuring the angle of repose of the granular material in the apparatus shown in FIG.

【0003】図中の符番1は一定速度で一定方向に回転
する回転容器であり、その上部に測定粒子2を入れるた
めの入口1aを有している。前記回転容器1には、該回
転容器1を上述したように回転させることが可能な回転
軸3が取り付けられ、これにより回転容器1内の測定粒
子2に強制的に安息角を生じさせる。前記回転容器1の
端面1bは透明な端面となっており、該端面1bより回
転容器1中の測定粒子2の安息角を撮影装置4により観
察することができるようになっている。
[0003] Reference numeral 1 in the figure denotes a rotating container which rotates at a constant speed and in a constant direction, and has an inlet 1a for introducing measurement particles 2 at an upper portion thereof. The rotating container 1 is provided with a rotating shaft 3 capable of rotating the rotating container 1 as described above, thereby forcibly generating a repose angle on the measurement particles 2 in the rotating container 1. The end surface 1b of the rotating container 1 is a transparent end surface, and the angle of repose of the measurement particles 2 in the rotating container 1 can be observed by the photographing device 4 from the end surface 1b.

【0004】前記回転容器1の軸部には該回転容器1内
部のガスを抜くためのガス排気管5が接続されており、
抜いたガスは排ガス処理装置6により大気に排出される
ようになっている。回転容器1の内部を真空にした後、
測定粒子2が実際に置かれる環境に合せるべく該環境と
同じガスを注入して環境設定する。こうした操作のため
にガス供給管7が回転容器1の軸部に接続され、ボンベ
8から流量調節バルブ9を介して例えば水素を常時供給
し、回転容器1内をプラス圧にして空気が回転容器1内
に入ってこないようにしている。
[0004] A gas exhaust pipe 5 for removing gas from the inside of the rotary container 1 is connected to a shaft portion of the rotary container 1.
The extracted gas is discharged to the atmosphere by an exhaust gas treatment device 6. After evacuating the inside of the rotating container 1,
The environment is set by injecting the same gas as the environment to match the environment where the measurement particles 2 are actually placed. For such an operation, a gas supply pipe 7 is connected to the shaft of the rotary container 1, and for example, hydrogen is constantly supplied from a cylinder 8 via a flow rate control valve 9, and the inside of the rotary container 1 is made to have a positive pressure, so that air is supplied to the rotary container 1. I try not to get inside.

【0005】ここで、水素を回転容器1に入れるのは、
実現象と同じ雰囲気を模擬するためである。また、水素
を常時回転容器1に供給するのは、空気が流れ込むと、
水素と空気中の酸素が反応して爆発を起こす可能性があ
るからである。前記回転容器1は、高温の環境を作るた
めに円筒形の電気炉10により囲まれている。前記回転容
器1には熱電対11が接続されている。なお、回転容器1
内の温度を一定に保つには、回転容器1内にガスを閉じ
込めるよりも、流しながら若干量を抜く方が容易と考え
られている。
Here, the reason for putting hydrogen into the rotary container 1 is as follows.
This is to simulate the same atmosphere as the actual phenomenon. In addition, the constant supply of hydrogen to the rotating container 1 is caused by the flow of air.
This is because hydrogen and oxygen in the air may react and cause an explosion. The rotary container 1 is surrounded by a cylindrical electric furnace 10 to create a high-temperature environment. A thermocouple 11 is connected to the rotating container 1. In addition, the rotating container 1
It is thought that it is easier to keep the temperature in the chamber constant and to remove a small amount while flowing the gas, rather than to confine the gas in the rotating container 1.

【0006】図5〜図7は、それぞれ常温における安息
角測定例を示す。図5は注入法で、ロート13内の粒子14
を水平面15に落下させて、粒子層16の水平面15と粒子層
形成線17との安息角θ1 を測定するものである。なお、
図5で水平面15は回転しないようになっている。図6は
排出法で、底部中央に孔を有する円筒容器18内の粒子14
を落下させ、落下時の円筒容器18内における粒子14の水
平面15と粒子層形成線17との安息角θ2 を測定するもの
である。図7は傾斜法で、水平円筒容器19を転がし、該
水平円筒容器19内の粒子14の粒子層形成線17と水平面15
との安息角θ3を測定するものである。
FIGS. 5 to 7 show examples of the angle of repose measurement at room temperature. FIG. 5 shows the injection method, in which the particles 14
It was allowed to fall to the horizontal plane 15, which measures the angle of repose theta 1 between a horizontal plane 15 and the particle layer forming beam 17 of the particle layer 16. In addition,
In FIG. 5, the horizontal plane 15 is not rotated. FIG. 6 shows a discharge method, in which particles 14 in a cylindrical container 18 having a hole in the bottom center.
Is dropped, and the angle of repose θ 2 between the horizontal plane 15 of the particle 14 and the particle layer forming line 17 in the cylindrical container 18 at the time of falling is measured. FIG. 7 shows an inclined method in which a horizontal cylindrical container 19 is rolled, and a particle layer forming line 17 of the particles 14 in the horizontal cylindrical container 19 and a horizontal plane 15 are formed.
To measure the angle of repose θ 3 .

【0007】[0007]

【発明が解決しようとする課題】しかしながら、従来技
術は、回転容器1の透明な端面1bの一面のみの安息角
しか測定できないので、粉体を取り扱った測定値として
測定回数が少なくては精度上問題がある。従って、測定
回数を多くする必要があり、測定回数を多くするにはそ
れに費やす時間が多くなるという課題であった。
However, in the prior art, only the angle of repose of one surface of the transparent end face 1b of the rotary container 1 can be measured. There's a problem. Therefore, it is necessary to increase the number of times of measurement, and to increase the number of times of measurement, there is a problem that the time spent for the time is increased.

【0008】本発明はこうした事情を考慮してなされた
もので、回転台座と、この回転台座の上方に配置され、
該回転台座上に測定粒子を落下させる測定粒子供給手段
と、前記回転台座周辺及び測定粒子供給手段周辺を加熱
する加熱手段と、前記回転台座上に積層した粒子層の回
転台座水平面に対する傾斜角を測定する粒子層形成線観
察手段とを具備する構成とすることにより、容易に多数
の安息角測定値が得られ、精度上、作業性の点で優れた
安息角測定装置を提供することを目的とする。
The present invention has been made in view of such circumstances, and has a rotating pedestal, and is disposed above the rotating pedestal.
Measuring particle supply means for dropping measurement particles on the rotating pedestal, heating means for heating the periphery of the rotating pedestal and around the measuring particle supplying means, and an inclination angle of a particle layer laminated on the rotating pedestal with respect to a rotating pedestal horizontal plane. With the configuration including the particle layer forming line observing means for measurement, it is possible to easily obtain a large number of repose angle measurement values and to provide a repose angle measurement apparatus excellent in accuracy and workability. And

【0009】また、本発明は、前記回転台座、測定粒子
供給手段及び加熱手段を収容する真空容器と、この真空
容器内のガスを別なガスに置換するガス置換手段とを更
に有する構成とすることにより、加熱手段周辺に最初か
ら存在するガスと反応性の高いガスとの反応を回避しえ
る安全性の高い安息角測定装置を提供することを目的と
する。
Further, the present invention further comprises a vacuum vessel for accommodating the rotary pedestal, the measuring particle supply means and the heating means, and gas replacement means for replacing the gas in the vacuum vessel with another gas. Accordingly, it is an object of the present invention to provide a highly safe repose angle measuring device capable of avoiding a reaction between a gas existing at the periphery of the heating means and a highly reactive gas.

【0010】[0010]

【課題を解決するための手段】本発明は、回転台座と、
この回転台座の上方に配置され、該回転台座上に測定粒
子を落下させる測定粒子供給手段と、前記回転台座周辺
及び測定粒子供給手段周辺を加熱する加熱手段と、前記
回転台座上に積層した粒子層の回転台座水平面に対する
傾斜角を測定する粒子層形成線観察手段とを具備するこ
とを特徴とする安息角測定装置である。
SUMMARY OF THE INVENTION The present invention provides a rotating pedestal,
A measuring particle supply unit disposed above the rotating pedestal and configured to drop measurement particles on the rotating pedestal; a heating unit configured to heat the periphery of the rotating pedestal and the periphery of the measuring particle supplying unit; and particles stacked on the rotating pedestal. And a particle layer forming line observation means for measuring an inclination angle of the layer with respect to a horizontal surface of the rotating pedestal.

【0011】本発明においては、更に前記回転台座、測
定粒子供給手段及び加熱手段を収容する真空容器と、こ
の真空容器内のガスを別なガスに置換するガス置換手段
とを具備する構成にすることが好ましい。これは、加熱
手段周辺に最初から存在するガス例えば空気中の酸素
と、加熱手段に送るガス例えば水素とが反応して爆発が
起こる危険性を回避するためである。
According to the present invention, the apparatus further comprises a vacuum vessel accommodating the rotary pedestal, the measuring particle supply means and the heating means, and a gas replacement means for replacing the gas in the vacuum vessel with another gas. Is preferred. This is to avoid a risk that an explosion occurs due to a reaction between a gas, such as oxygen in the air, which initially exists around the heating means, such as oxygen in the air, and a gas, such as hydrogen, sent to the heating means.

【0012】本発明において、前記加熱手段としては、
例えば後述する実施例で説明するような円筒形の電気炉
(例えばヒータ)が挙げられる。本発明において、前記
粒子層形成線観察手段としては、例えば後述する実施例
で説明するように、加熱炉を挟んで真空容器の2側面に
観察窓が夫々設けられ、これら観察窓側にさらに発光
部,受光部が設けられているが、前記受光部として設け
られた撮像装置に内臓された例えばカメラが挙げられ
る。
In the present invention, the heating means includes:
For example, a cylindrical electric furnace (for example, a heater) as described in an embodiment to be described later may be used. In the present invention, as the particle layer forming line observing means, for example, as described in Examples described later, observing windows are provided on two sides of a vacuum vessel with a heating furnace interposed therebetween, and a light emitting unit is further provided on the observing window side. , A light receiving unit, for example, a camera built in an imaging device provided as the light receiving unit.

【0013】本発明において、前記ガス置換手段は、例
えば真空容器内の空気を抜取る真空ポンプと、測定粒子
の環境と同じガスに置換するためのボンベと、真空容器
とボンベを連結する流量調節バルブを介装したガス供給
管とから構成されている。
In the present invention, the gas replacement means includes, for example, a vacuum pump for extracting air from the vacuum vessel, a cylinder for replacing the gas with the same environment as the environment of the particles to be measured, and a flow rate controller for connecting the vacuum vessel and the cylinder. And a gas supply pipe with a valve interposed.

【0014】本発明において、安息角の測定方法として
は、注入法、排出法、及び傾斜法が挙げられる。ここ
で、「注入法」とは、水平面上に上方から漏斗等で粉体
を静かに落下させて生ずる円錐状堆積層の傾斜角を測定
する方法を示す。「排出法」とは、円筒容器に粉体を入
れ、底面を水平に保ってその中心部の残留層の傾斜角を
測定する方法を示す。「傾斜法」とは、水平軸の回りに
回転する円筒容器に粉体とその内容積の1/2乃至1/
3ぐらい入れてゆっくり回転し、層表面に滑りが生ずる
とき、その面の傾斜角を測定する方法を示す。
In the present invention, the method of measuring the angle of repose includes an injection method, a discharge method, and a tilt method. Here, the “injection method” refers to a method of measuring the inclination angle of a conical sedimentary layer formed by gently dropping powder from above on a horizontal plane using a funnel or the like. The "discharge method" refers to a method in which powder is placed in a cylindrical container, and the bottom surface is kept horizontal, and the inclination angle of the residual layer at the center is measured. "Inclination method" means that a cylindrical container rotating about a horizontal axis and a powder and 1/2 to 1 /
A method for measuring the inclination angle of the surface when a slip occurs on the surface of the layer by slowly rotating it after inserting about 3 will be described.

【0015】[0015]

【発明の実施の形態】以下、本発明の一実施例を図1
(A),(B),(C)及び図2を参照して説明する。
ここで、図1(A)は本実施例に係る安息角測定装置の
全体を示す説明図で、図1(B)は同装置の一構成であ
る電気炉の斜視図、図1(C)は図1(B)の平面図
を、図2は図1(A)の装置における粉粒体の安息角測
定部の詳細図である。なお、測定粒子の置かれる環境
は、可燃性ガス雰囲気の場合と不燃性ガス雰囲気の場合
とがあるが、本実施例では前者の場合について以下に説
明する。
BRIEF DESCRIPTION OF THE DRAWINGS FIG.
This will be described with reference to (A), (B), (C) and FIG.
Here, FIG. 1A is an explanatory view showing the whole repose angle measuring apparatus according to the present embodiment, and FIG. 1B is a perspective view of an electric furnace as one configuration of the same apparatus, and FIG. 1 is a plan view of FIG. 1B, and FIG. 2 is a detailed view of a repose angle measuring unit of the granular material in the apparatus of FIG. 1A. The environment in which the measurement particles are placed may be a flammable gas atmosphere or a non-flammable gas atmosphere. In the present embodiment, the former case will be described below.

【0016】図中の符番21は、内部に加熱手段としての
円筒形の電気炉22を有する真空容器である。前記電気炉
22は、図1(B),(C)に示すように円筒体22aの周
囲に可視光部Xを除いて筒状のヒータ22bを形成した構
成となっている。前記ヒータ22bは、縦方向に2つに分
割可能でかつ円筒体22aを挟み込むような構成となって
いる。前記電気炉22の側面には、2つの穴23が対向して
設けられている。前記電気炉22の内側上部には測定粒子
供給手段としてのロート24が、かつ内側底部には回転台
座25が配置されている。前記加熱炉22により、回転台座
25周辺やロート24周辺が加熱されるようになっている。
Reference numeral 21 in the figure denotes a vacuum vessel having a cylindrical electric furnace 22 as heating means therein. The electric furnace
As shown in FIGS. 1B and 1C, the tube 22 has a configuration in which a cylindrical heater 22b is formed around a cylindrical body 22a except for a visible light portion X. The heater 22b can be divided into two parts in the vertical direction, and is configured to sandwich the cylindrical body 22a. On the side surface of the electric furnace 22, two holes 23 are provided to face each other. A funnel 24 serving as a measurement particle supply means is disposed at an upper portion inside the electric furnace 22, and a rotating pedestal 25 is disposed at a lower portion inside. By the heating furnace 22, the rotating pedestal
The area around 25 and the area around funnel 24 are heated.

【0017】前記回転台座25は、特殊なガス環境で測定
粒子の均一な山(粒子層26)を形作るとともに、測定粒
子に及ぼす温度影響を均一にするために、回転軸27によ
り回転できる構成としている。前記ロート24には測定粒
子を供給するための供給管28が上部に設けられており、
所定量を注入した後、先端が円錐状のストッパー29でロ
ート底部の穴が塞がれる。ここで、ストッパー29は、一
定量の粉体を上部の供給管28にためるにある。
The rotary pedestal 25 has a configuration in which a uniform peak (particle layer 26) of the measurement particles is formed in a special gas environment and the rotation pedestal 25 can be rotated by a rotation shaft 27 in order to make the temperature effect on the measurement particles uniform. I have. A supply pipe 28 for supplying measurement particles is provided at the upper part of the funnel 24,
After injecting a predetermined amount, a hole at the bottom of the funnel is closed by a stopper 29 having a conical tip. Here, the stopper 29 accumulates a certain amount of powder in the upper supply pipe 28.

【0018】前記電気炉22の2つの穴23側には、電気炉
22を挟むように観察窓30a,30bを夫々有した発光部3
1、受光部としてのカメラ(粒子層形成線観察手段)を
内臓した撮像装置32が配置されている。つまり、発光部
31から発光された光を一方の観察窓30a、穴23を通して
電気炉22内の粒子層26に照射させ、他方の観察窓30b側
のカメラにてその影を観察して粒子の安息角を形成でき
るような構成となっている。
At the two holes 23 side of the electric furnace 22, an electric furnace
A light emitting unit 3 having observation windows 30a and 30b respectively so as to sandwich 22
1. An imaging device 32 having a built-in camera (particle layer forming line observation means) as a light receiving unit is arranged. That is, the light emitting unit
The light emitted from 31 is applied to the particle layer 26 in the electric furnace 22 through one observation window 30a and the hole 23, and the shadow of the particle is observed by the camera on the other observation window 30b to form the angle of repose of the particles. It has a configuration that allows it.

【0019】前記真空容器21には、該真空容器21内を真
空にするための真空ポンプ33がガス排気管34を介して接
続されている。前記真空ポンプ33には、排ガス処理装置
35を介装したガス排気管36が接続されている。更に、前
記真空ポンプ33には、電源スイッチ37、真空ポンプスイ
ッチ38、電気炉スイッチ39、前記電気炉22の温度を調節
する温度調節器40、及び真空容器21内の圧力,回転台座
24の温度,ガスの流量等を記録する記録計41が取り付け
られた制御盤42が取り付けられている。
A vacuum pump 33 for evacuating the inside of the vacuum vessel 21 is connected to the vacuum vessel 21 via a gas exhaust pipe 34. The vacuum pump 33 has an exhaust gas treatment device
A gas exhaust pipe 36 with 35 interposed is connected. Further, the vacuum pump 33 includes a power switch 37, a vacuum pump switch 38, an electric furnace switch 39, a temperature controller 40 for controlling the temperature of the electric furnace 22, a pressure in the vacuum vessel 21, and a rotating base.
A control panel 42 to which a recorder 41 for recording the temperature, gas flow rate, etc. of the 24 is attached is attached.

【0020】前記真空容器21には、ガス排気件流量調節
弁43を介装したガス供給管44を介して水素を収容したガ
ス置換手段としてのボンベ45が接続されている。ここ
で、水素を真空容器21に入れるのは、実現象と同じ雰囲
気を模擬するためである。前記ロート22、回転台座25に
は熱電対46,47がそれぞれ接続され、これら熱電対46,
47による温度が前記温度調節器40にフィードバックされ
るようになっている。なお、図中の付番26´は注入前の
粒子層を示す。
A cylinder 45 serving as gas replacement means for storing hydrogen is connected to the vacuum vessel 21 via a gas supply pipe 44 provided with a gas exhaust control flow rate control valve 43. Here, the reason why hydrogen is put into the vacuum vessel 21 is to simulate the same atmosphere as the actual phenomenon. Thermocouples 46 and 47 are connected to the funnel 22 and the rotary base 25, respectively.
The temperature by 47 is fed back to the temperature controller 40. The number 26 'in the figure indicates the particle layer before injection.

【0021】こうした構成の安息角測定装置の操作は、
次のようにして行う。まず、真空容器21内の空気を真空
ポンプ33を用いて抜き、その後特殊環境のガス例えば水
素をボンベ45から流量調節バルブ43を調節しながら真空
容器21内に供給する。このとき、電気炉22も加熱を始め
る。真空容器21の内部のガスが全て置換ガスで置換さ
れ、電気炉22が所定の温度に加熱されたら、次にストッ
パー29を開き、測定粒子をロート24から注入する。ここ
で、測地粒子の注入の際には、回転台座24は回転しなが
ら注入するようにし、測定粒子の山が均一になるように
する。
The operation of the repose angle measuring apparatus having such a configuration is as follows.
This is performed as follows. First, the air in the vacuum vessel 21 is evacuated using the vacuum pump 33, and then a gas of a special environment, for example, hydrogen is supplied from the cylinder 45 into the vacuum vessel 21 while adjusting the flow control valve 43. At this time, the electric furnace 22 also starts heating. When all the gas inside the vacuum vessel 21 is replaced with the replacement gas and the electric furnace 22 is heated to a predetermined temperature, the stopper 29 is opened, and the measurement particles are injected from the funnel 24. Here, when the geodesic particles are injected, the rotary pedestal 24 is injected while rotating, so that the peaks of the measured particles are uniform.

【0022】測定粒子の山が所定の大きさになったら、
一方の観察窓30a側の発光部31から光を照射し、他方の
観察窓30b側のカメラにてその影を観察する。この影の
傾斜を計測することにより、回転台座25の水平面51に対
する粒子層形成線52が求められる。粒子層形成線52の観
察のインターバルを短くとることにより計測精度を向上
させることができる。
When the peak of the measurement particles has reached a predetermined size,
Light is emitted from the light emitting unit 31 on one observation window 30a side, and the shadow is observed by a camera on the other observation window 30b side. By measuring the inclination of the shadow, a particle layer forming line 52 with respect to the horizontal plane 51 of the rotating pedestal 25 is obtained. The measurement accuracy can be improved by shortening the interval of observation of the particle layer forming line 52.

【0023】上記実施例に係る安息角測定装置によれ
ば、回転台座24の上に上方のロート24から注入すること
により形成される粒子層26を、回転台座24を回転させそ
の都度粒子層26とその水平面51との角度を撮像装置32の
カメラにより写真撮影する構成となってるため、注入法
により容易に多数の安息角(θ)測定値が得られる。従
って、従来と比べ、精度に優れ作業性も良好となる。ま
た、前記回転台座25、ロート24及び加熱炉22を収容する
真空容器21と、この真空容器21内の空気を水素に置換す
るボンベ45とを有するため、加熱炉周辺に最初から存在
する空気中の酸素と真空容器21に送る水素とが反応して
爆発が起こる危険性を回避できる。更に、前記電気炉22
で回転台座25周辺及びロート24周辺を加熱して一定の温
度に保持するような構成になっているため、測定粒子周
辺の雰囲気温度が安定し、安定したた安息角の測定が可
能となる。
According to the apparatus for measuring the angle of repose according to the above embodiment, the particle layer 26 formed by injecting the powder from the upper funnel 24 onto the rotating pedestal 24 is turned into the particle layer 26 each time the rotating pedestal 24 is rotated. And the angle between the horizontal plane 51 and the horizontal plane 51 are photographed by the camera of the imaging device 32, so that a large number of measured values of the angle of repose (θ) can be easily obtained by the injection method. Therefore, the precision is excellent and the workability is good as compared with the conventional case. In addition, since it has the vacuum vessel 21 for accommodating the rotary pedestal 25, the funnel 24 and the heating furnace 22, and the cylinder 45 for replacing the air in the vacuum vessel 21 with hydrogen, the air existing in the vicinity of the heating furnace from the beginning is used. It is possible to avoid the danger of explosion due to the reaction of the oxygen with the hydrogen sent to the vacuum vessel 21. Further, the electric furnace 22
In this configuration, the periphery of the rotating pedestal 25 and the periphery of the funnel 24 are heated and maintained at a constant temperature. Therefore, the ambient temperature around the measurement particles is stabilized, and stable measurement of the angle of repose becomes possible.

【0024】なお、上記実施例では、真空容器やボンベ
を用いた場合について述べたが、測定粒子雰囲気の空気
中の酸素と危険な反応を起こさなければ、必ずしも必要
なものではない。また、ボンベから真空容器へ送るガス
も水素に限らず、他のガスでもよい。更に、上記実施例
では、ヒータが2つに分割される構成のものを用いた
が、これに限定されない。
In the above embodiment, the case where a vacuum vessel or a cylinder is used has been described. However, this is not always necessary unless a dangerous reaction occurs with oxygen in the air in the atmosphere of the measurement particles. The gas sent from the cylinder to the vacuum vessel is not limited to hydrogen, but may be another gas. Further, in the above embodiment, the heater is configured to be divided into two, but the invention is not limited to this.

【0025】[0025]

【発明の効果】以上詳述したように本発明によれば、回
転台座と、この回転台座の上方に配置され、該回転台座
上に測定粒子を落下させる測定粒子供給手段と、前記測
定粒子を加熱する加熱手段と、前記回転台座上に積層し
た粒子層の回転台座主面に対する傾斜角を測定する粒子
層形成線観察手段とを具備する構成とすることにより、
容易に多数の安息角測定値が得られ、精度上、作業性の
点で優れ、しかも安全性の高いた安息角測定装置を提供
できる。
As described above in detail, according to the present invention, the rotating pedestal, the measuring particle supply means disposed above the rotating pedestal, for dropping the measuring particles onto the rotating pedestal, Heating means for heating, by comprising a particle layer formation line observation means for measuring the inclination angle of the particle layer stacked on the rotary pedestal with respect to the rotary pedestal main surface,
A large number of repose angle measurement values can be easily obtained, and a highly safe repose angle measurement device that is excellent in accuracy and workability can be provided.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施例に係る安息角測定装置の説明
図。
FIG. 1 is an explanatory diagram of a repose angle measuring apparatus according to one embodiment of the present invention.

【図2】図1の装置の装置における粉粒体の安息角測定
部の詳細図。
FIG. 2 is a detailed view of a repose angle measuring unit of the granular material in the apparatus of the apparatus of FIG.

【図3】従来の安息角測定装置の全体図。FIG. 3 is an overall view of a conventional repose angle measuring apparatus.

【図4】図3の装置において粉粒体の安息角測定に用い
た回転容器の説明図。
FIG. 4 is an explanatory view of a rotating container used for measuring the angle of repose of the granular material in the apparatus of FIG. 3;

【図5】注入法による常温下での安息角測定例の説明
図。
FIG. 5 is an explanatory diagram of an example of a repose angle measurement at room temperature by an injection method.

【図6】排出法による常温下での安息角測定例の説明
図。
FIG. 6 is an explanatory diagram of an example of measuring the angle of repose at normal temperature by the discharge method.

【図7】傾斜法による常温下での安息角測定例の説明
図。
FIG. 7 is an explanatory diagram of an example of measuring a repose angle at room temperature by a tilt method.

【符号の説明】[Explanation of symbols]

21…真空容器、 22…電気炉、 24…ロート、 25…回転台座、 26,26´…粒子層、 30a,30b…観察窓、 31…発光部、 32…撮像装置、 33…真空ポンプ、 31…排ガス処理装置、 35…排ガス処理装置、 45…ボンベ。 21: vacuum vessel, 22: electric furnace, 24: funnel, 25: rotating base, 26, 26 ': particle layer, 30a, 30b: observation window, 31: light emitting unit, 32: imaging device, 33: vacuum pump, 31 ... exhaust gas treatment equipment, 35 ... exhaust gas treatment equipment, 45 ... cylinders.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 伊奈 孝 愛知県東海市新宝町507の2 東邦瓦斯株 式会社内 (72)発明者 谷中 佑吉 東京都千代田区丸の内二丁目5番1号 三 菱重工業株式会社内 (72)発明者 鈴村 洋 広島県広島市西区観音新町四丁目6番22号 三菱重工業株式会社広島研究所内 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Takashi Ina Inventor 507-2 Shinhocho-cho, Tokai City, Aichi Prefecture Inside Toho Gas Co., Ltd. (72) Inventor Yukichi Yanaka 2-5-1 Marunouchi, Chiyoda-ku, Tokyo (72) Inventor Hiroshi Suzumura 4-6-22 Kannonshinmachi, Nishi-ku, Hiroshima-shi, Hiroshima Inside Hiroshima Research Laboratory, Mitsubishi Heavy Industries, Ltd.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 回転台座と、この回転台座の上方に配置
され、該回転台座上に測定粒子を落下させる測定粒子供
給手段と、前記回転台座周辺及び測定粒子供給手段周辺
を加熱する加熱手段と、前記回転台座上に積層した粒子
層の回転台座水平面に対する傾斜角を測定する粒子層形
成線観察手段とを具備することを特徴とする安息角測定
装置。
A rotating pedestal; a measuring particle supply means disposed above the rotating pedestal for dropping measurement particles onto the rotating pedestal; and a heating means for heating the periphery of the rotating pedestal and the periphery of the measuring particle supplying means. And a particle layer forming line observing means for measuring an angle of inclination of the particle layer laminated on the rotary pedestal with respect to a horizontal plane of the rotary pedestal.
【請求項2】 前記回転台座、測定粒子供給手段及び加
熱手段を収容する真空容器と、この真空容器内のガスを
別なガスに置換するガス置換手段とを具備することを特
徴とする請求項1記載の安息角測定装置。
2. A vacuum container accommodating said rotary pedestal, measurement particle supply means and heating means, and gas replacement means for replacing a gas in said vacuum vessel with another gas. A repose angle measuring apparatus according to claim 1.
JP10086896A 1998-03-31 1998-03-31 Repose angle measuring device Withdrawn JPH11281560A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10086896A JPH11281560A (en) 1998-03-31 1998-03-31 Repose angle measuring device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10086896A JPH11281560A (en) 1998-03-31 1998-03-31 Repose angle measuring device

Publications (1)

Publication Number Publication Date
JPH11281560A true JPH11281560A (en) 1999-10-15

Family

ID=13899607

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10086896A Withdrawn JPH11281560A (en) 1998-03-31 1998-03-31 Repose angle measuring device

Country Status (1)

Country Link
JP (1) JPH11281560A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009133765A (en) * 2007-11-30 2009-06-18 Toyota Motor Corp Method and apparatus for evaluating viscosity of coating film
CN102288095A (en) * 2011-05-13 2011-12-21 北京航空航天大学 Box type measurement device for slide angle of scattered material and measurement method thereof
JP2012225720A (en) * 2011-04-19 2012-11-15 Hosokawa Micron Corp Angle measurement apparatus of powder sedimentation layer
CN104048574A (en) * 2014-07-08 2014-09-17 河南中医学院 Dial scale for repose angle rapid-determination device and manufacturing method thereof
CN108240949A (en) * 2017-12-14 2018-07-03 华中农业大学 A device and method for measuring the angle of repose of bulk materials
CN113830585A (en) * 2021-10-15 2021-12-24 河南科技大学 Method for forming material angle of repose and material angle of repose measuring instrument

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009133765A (en) * 2007-11-30 2009-06-18 Toyota Motor Corp Method and apparatus for evaluating viscosity of coating film
JP2012225720A (en) * 2011-04-19 2012-11-15 Hosokawa Micron Corp Angle measurement apparatus of powder sedimentation layer
CN102288095A (en) * 2011-05-13 2011-12-21 北京航空航天大学 Box type measurement device for slide angle of scattered material and measurement method thereof
CN104048574A (en) * 2014-07-08 2014-09-17 河南中医学院 Dial scale for repose angle rapid-determination device and manufacturing method thereof
CN104048574B (en) * 2014-07-08 2016-08-24 河南中医学院 Angle of repose rapid determination device dial and preparation method thereof
CN108240949A (en) * 2017-12-14 2018-07-03 华中农业大学 A device and method for measuring the angle of repose of bulk materials
CN113830585A (en) * 2021-10-15 2021-12-24 河南科技大学 Method for forming material angle of repose and material angle of repose measuring instrument

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