JPH11280648A - Rotary compressor - Google Patents
Rotary compressorInfo
- Publication number
- JPH11280648A JPH11280648A JP8395998A JP8395998A JPH11280648A JP H11280648 A JPH11280648 A JP H11280648A JP 8395998 A JP8395998 A JP 8395998A JP 8395998 A JP8395998 A JP 8395998A JP H11280648 A JPH11280648 A JP H11280648A
- Authority
- JP
- Japan
- Prior art keywords
- roller
- rotary compressor
- hard carbon
- outer peripheral
- peripheral surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910021385 hard carbon Inorganic materials 0.000 claims abstract description 39
- 239000000463 material Substances 0.000 claims abstract description 35
- 150000002500 ions Chemical class 0.000 claims abstract description 16
- 238000005121 nitriding Methods 0.000 claims abstract description 12
- 238000004544 sputter deposition Methods 0.000 claims abstract description 5
- 239000011248 coating agent Substances 0.000 claims description 44
- 238000000576 coating method Methods 0.000 claims description 44
- 230000002093 peripheral effect Effects 0.000 claims description 23
- 239000010410 layer Substances 0.000 claims description 21
- 229910052710 silicon Inorganic materials 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 13
- 239000000470 constituent Substances 0.000 claims description 10
- 229910052799 carbon Inorganic materials 0.000 claims description 9
- 229910052757 nitrogen Inorganic materials 0.000 claims description 9
- -1 polyol ester Chemical class 0.000 claims description 8
- 229910052719 titanium Inorganic materials 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 5
- 229910052726 zirconium Inorganic materials 0.000 claims description 5
- 239000000654 additive Substances 0.000 claims description 4
- 230000000996 additive effect Effects 0.000 claims description 4
- 229910003481 amorphous carbon Inorganic materials 0.000 claims description 4
- 229910003460 diamond Inorganic materials 0.000 claims description 4
- 239000010432 diamond Substances 0.000 claims description 4
- 150000004767 nitrides Chemical class 0.000 claims description 4
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 229920005862 polyol Polymers 0.000 claims description 3
- 229920001289 polyvinyl ether Polymers 0.000 claims description 3
- 239000002344 surface layer Substances 0.000 claims description 3
- 229910052721 tungsten Inorganic materials 0.000 claims description 3
- 239000002131 composite material Substances 0.000 claims description 2
- 238000005057 refrigeration Methods 0.000 claims 1
- 239000000758 substrate Substances 0.000 abstract description 12
- 229910052742 iron Inorganic materials 0.000 abstract description 3
- 230000001678 irradiating effect Effects 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 14
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 12
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 11
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 239000003507 refrigerant Substances 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 230000001133 acceleration Effects 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000003921 oil Substances 0.000 description 3
- 229910001018 Cast iron Inorganic materials 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000007373 indentation Methods 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- 229910005347 FeSi Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910001315 Tool steel Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000001552 radio frequency sputter deposition Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
Landscapes
- Applications Or Details Of Rotary Compressors (AREA)
- Physical Vapour Deposition (AREA)
- Compressor (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、硬質炭素系被膜を
形成した回転圧縮機に関し、特に圧縮機用部品、電気シ
ェーバー等の刃物、スクリーン印刷用マスク、スクリー
ン印刷用スキージ、オフィスオートメーション(OA)
機器部品、その他摺動部品、或いは太陽電池、磁気ヘッ
ド、SAWデバイス等の電子デバイス、半導体等の機能
性被膜に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a rotary compressor having a hard carbon-based coating formed thereon, and more particularly to a compressor component, a blade such as an electric shaver, a screen printing mask, a screen printing squeegee, and office automation (OA).
The present invention relates to functional parts such as equipment parts, other sliding parts, electronic devices such as solar cells, magnetic heads, and SAW devices, and semiconductors.
【0002】[0002]
【従来の技術】従来、例えばFe系母材等の鋼表面に窒素
を浸透させることによって表面を硬化する、いわゆる窒
化処理を施すことがある。その窒化処理の具体的な手法
が「若い技術者のための機械・金属材料、矢島他著、丸
善株式会社」の152頁に記載されている。その手法と
は、ガス窒化をする部品を清浄し、油気を除き、これを
密閉できる窒化箱に納めて、アンモニアガスを通じなが
ら500℃乃至550℃に50乃至100時間加熱する
と、0.1mm乃至0.3mm程度の硬化層ができる。2. Description of the Related Art Conventionally, a so-called nitriding treatment, in which a surface of a steel such as an Fe-based base material is hardened by infiltrating nitrogen into the steel, is sometimes performed. A specific method of the nitriding treatment is described on page 152 of "Machine and Metallic Materials for Young Engineers, written by Yajima et al., Maruzen Co., Ltd." The method is to clean the parts to be gas-nitrided, remove the oil, put them in a tightly closed nitriding box, and heat them to 500 ° C to 550 ° C for 50 to 100 hours while passing ammonia gas. A cured layer of about 0.3 mm is formed.
【0003】[0003]
【発明が解決しようとする課題】しかし、この手法にお
いて、母材の最表面にその母材の材料と窒素とが結合し
た窒化物(Fe系材料の場合、Fe2N)が生成され、この母材
上に硬質炭素系被膜を形成する場合に、母材と硬質炭素
系被膜との間の密着性が低下することがある。従って、
本発明の目的は、このような従来の問題点を解消し、窒
化処理された母材に対して優れた密着性を有する硬質炭
素系被膜を回転圧縮機の主に摺動部品に形成することに
ある。However, in this method, a nitride (Fe 2 N in the case of an Fe-based material) in which the material of the base material and nitrogen are bonded is generated on the outermost surface of the base material. When a hard carbon-based coating is formed on a base material, the adhesion between the base material and the hard carbon-based coating may decrease. Therefore,
An object of the present invention is to solve such a conventional problem and to form a hard carbon-based coating having excellent adhesion to a nitrided base material mainly on sliding parts of a rotary compressor. It is in.
【0004】更に、プラズマ中のイオンやラジカルを利
用して母材の表面を窒化するイオン窒化、ラジカル窒化
等の方法もある。Further, there are methods such as ion nitriding and radical nitriding in which the surface of a base material is nitrided by utilizing ions and radicals in plasma.
【0005】[0005]
【課題を解決するための手段】本発明の回転圧縮機は、
窒化処理した母材上に硬質炭素系被膜を形成する際に、
予め母材上に形成する被膜の構成原子、或いは構成分子
のイオンを照射し、該イオンの運動エネルギーを利用し
て、前記窒化処理の際に形成された前記母材の最表面層
をスパッタリングすると共に、前記被膜の構成原子、或
いは構成分子と母材の構成原子との結合を有する混合層
を形成し、該混合層上に硬質炭素系被膜を形成したこと
を特徴とする。The rotary compressor according to the present invention comprises:
When forming a hard carbon-based coating on a nitrided base material,
Irradiation of ions of constituent atoms or constituent molecules of the film formed on the base material in advance, and using the kinetic energy of the ions, sputters the outermost surface layer of the base material formed during the nitriding treatment. In addition, a mixed layer having a bond between a constituent atom of the coating or a constituent molecule and a constituent atom of the base material is formed, and a hard carbon-based coating is formed on the mixed layer.
【0006】また、前記母材は、Fe系、Al系、Cu系の溶
製材、或いはこれらをベースにした焼結、複合材を特徴
とする。[0006] The base material is characterized by Fe-based, Al-based, Cu-based ingots, or sintered or composite materials based on these.
【0007】また、前記イオンの種類がC、Si、Ti、Z
r、Ge、Ru、Mo、Wであることを特徴とする。The type of the ions is C, Si, Ti, Z
r, Ge, Ru, Mo, W.
【0008】更に、本発明の回転圧縮機は、回転するク
ランク軸の偏心部に取り付けられた、外周面を有するロ
ーラと、前記ローラを収納し、前記ローラの外周面に接
して摺動する摺動面を内面に有するシリンダと、前記シ
リンダの内面に形成された溝内に収納され、先端部が前
記ローラの外周面に接して摺動するベーンとを備え、前
記ベーンの少なくとも先端部又は側面部に前記硬質炭素
系被膜を用いたことを特徴とする。Further, a rotary compressor according to the present invention has a roller attached to an eccentric portion of a rotating crankshaft, the roller having an outer peripheral surface, and a slide housing the roller and sliding in contact with the outer peripheral surface of the roller. A cylinder having a moving surface on the inner surface thereof, and a vane housed in a groove formed on the inner surface of the cylinder and having a tip portion which slides in contact with an outer peripheral surface of the roller, at least a tip portion or a side surface of the vane. Characterized in that the hard carbon-based coating is used for the portion.
【0009】回転するクランク軸の偏心部に取り付けら
れた、外周面を有するローラと、前記ローラを収納し、
前記ローラの外周面に接して摺動する摺動面を内面に有
するシリンダと、前記シリンダの内面に形成された溝内
に収納され、先端部が前記ローラの外周面に接して摺動
するベーンとを備え、前記ローラの外周面に前記硬質炭
素系被膜を用いたことを特徴とする。A roller having an outer peripheral surface attached to an eccentric portion of a rotating crankshaft;
A cylinder having an inner surface having a sliding surface that slides in contact with the outer peripheral surface of the roller, and a vane housed in a groove formed in the inner surface of the cylinder and having a leading end portion that slides in contact with the outer peripheral surface of the roller. Wherein the hard carbon-based coating is used on the outer peripheral surface of the roller.
【0010】回転するクランク軸の偏心部に取り付けら
れた、外周面を有するローラと、前記ローラを収納し、
前記ローラの外周面に接して摺動する摺動面を内面に有
するシリンダと、前記シリンダの内面に形成された溝内
に収納され、先端部が前記ローラの外周面に接して摺動
するベーンとを備え、前記シリンダの溝の内面に前記硬
質炭素系被膜を用いたことを特徴とする。A roller having an outer peripheral surface attached to an eccentric portion of a rotating crankshaft;
A cylinder having an inner surface having a sliding surface that slides in contact with the outer peripheral surface of the roller, and a vane housed in a groove formed in the inner surface of the cylinder and having a leading end portion that slides in contact with the outer peripheral surface of the roller. Wherein the hard carbon-based coating is used on the inner surface of the groove of the cylinder.
【0011】前記硬質炭素系被膜と、前記ベーン、前記
ローラの外周面、又は前記シリンダの溝の内面との間に
中間層が形成されていることを特徴とする。[0011] An intermediate layer is formed between the hard carbon-based coating and the vane, the outer peripheral surface of the roller, or the inner surface of the groove of the cylinder.
【0012】前記中間層が、Si、Ti、Zr、Ge、Ru、Mo、
W又はこれらの酸化物、これらの窒化物、もしくはこれ
らの炭化物から形成されていることを特徴とする。The intermediate layer is made of Si, Ti, Zr, Ge, Ru, Mo,
It is characterized by being formed from W, an oxide thereof, a nitride thereof, or a carbide thereof.
【0013】前記硬質炭素系被膜が、Si、N、Ta、Cr、
F、及びBからなるグループより選ばれる少なくとも1種
の添加元素を含有していることを特徴とする。The hard carbon-based coating is made of Si, N, Ta, Cr,
It is characterized by containing at least one additional element selected from the group consisting of F and B.
【0014】前記硬質炭素系被膜は、該硬質炭素系被膜
の表面に近い部分の添加元素濃度が表面から離れた部分
よりも高くなるような添加元素濃度の傾斜を有している
ことを特徴とする。[0014] The hard carbon-based coating has a gradient of additive element concentration such that the concentration of the additive element in a portion near the surface of the hard carbon-based coating is higher than in a portion away from the surface. I do.
【0015】前記回転圧縮機において、冷凍油として、
ポリオールエステル、又はポリビニールエーテルを用い
ることを特徴とする。In the rotary compressor, as the refrigerating oil,
It is characterized by using a polyol ester or polyvinyl ether.
【0016】前記硬質炭素系被膜は、ダイヤモンド被
膜、ダイヤモンド構造と非晶質炭素構造との混合膜、又
は非晶質炭素被膜から構成されている。The hard carbon-based coating comprises a diamond coating, a mixed film of a diamond structure and an amorphous carbon structure, or an amorphous carbon coating.
【0017】[0017]
【発明の実施の形態】図1は、本発明における硬質炭素
系被膜形成のための装置の一例を示す概略断面図であ
る。FIG. 1 is a schematic sectional view showing an example of an apparatus for forming a hard carbon-based film according to the present invention.
【0018】図1を参照して、真空チャンバ8には、プ
ラズマ発生室4が設けられている。プラズマ発生室4に
は、導波管2の一端が取り付けられており、導波管2の
他端には、マイクロ波供給手段1が設けられている。マ
イクロ波供給手段1で発生したマイクロ波は、導波管2
及びマイクロ波導入窓3を通って、プラズマ発生室4に
導かれる。プラズマ発生室4には、プラズマ発生室4内
にアルゴン(Ar)ガスなどの放電ガスとメタン(C
H4)、水素(H2)などの原料ガスを導入させるためのガ
ス導入管5が設けられている。Referring to FIG. 1, a plasma generating chamber 4 is provided in vacuum chamber 8. One end of the waveguide 2 is attached to the plasma generation chamber 4, and the microwave supply means 1 is provided at the other end of the waveguide 2. The microwave generated by the microwave supply means 1
And through the microwave introduction window 3 to the plasma generation chamber 4. The plasma generation chamber 4 contains a discharge gas such as an argon (Ar) gas and methane (C) in the plasma generation chamber 4.
A gas introduction pipe 5 for introducing a raw material gas such as H 4 ) and hydrogen (H 2 ) is provided.
【0019】また、プラズマ発生室4の周囲には、プラ
ズマ磁界発生装置6が設けられている。マイクロ波によ
る高周波磁界と、プラズマ磁界発生装置6からの磁界を
作用させることにより、プラズマ発生室4内に高密度の
ECRプラズマが形成される。真空チャンバ8内には基板
ホルダ7が設けられている。本実施の形態では、サンプ
ル10としてFe系材料に窒化処理を施した回転圧縮機のベ
ーンを用いた。A plasma magnetic field generator 6 is provided around the plasma generation chamber 4. The high-frequency magnetic field generated by the microwaves and the magnetic field from the plasma magnetic field generator 6 act to generate a high-density
An ECR plasma is formed. A substrate holder 7 is provided in the vacuum chamber 8. In the present embodiment, a vane of a rotary compressor in which a Fe-based material is subjected to nitriding treatment is used as sample 10.
【0020】また、プラズマ発生室4で分解された炭素
系イオンは、グリッド9によって加速され、真空チャン
バ8内に引き出される。この時、グリッド9に印加され
る電圧の大きさにより、イオンの加速エネルギーは制御
される。The carbon-based ions decomposed in the plasma generation chamber 4 are accelerated by the grid 9 and drawn out into the vacuum chamber 8. At this time, the acceleration energy of the ions is controlled by the magnitude of the voltage applied to the grid 9.
【0021】また、中間層の形成が必要な場合はマグネ
トロンRFスパッタ法などにより可能となる。ターゲット
をアルゴンプラズマ中のイオンでスパッタし、膜形成を
行うものであり、ターゲットとして、Si、Ti、Zr、W、M
o、Ru、Ge等を用いる。When the formation of the intermediate layer is necessary, it can be performed by a magnetron RF sputtering method or the like. The target is formed by sputtering a target with ions in argon plasma to form a film.Si, Ti, Zr, W, M
o, Ru, Ge, etc. are used.
【0022】また、スパッタと同時にチャンバー内に酸
素、或いは窒素ガスを導入するとSi、Ti、Zr、W、Mo、R
u、Geの単体、或いはこれらの酸化物、窒化物の形成が
可能となる。When oxygen or nitrogen gas is introduced into the chamber simultaneously with sputtering, Si, Ti, Zr, W, Mo, R
It becomes possible to form a simple substance of u and Ge, or an oxide or nitride thereof.
【0023】ここで、本発明の硬質炭素系被膜が形成さ
れる回転圧縮機の概略断面を図2に示す。Here, a schematic cross section of a rotary compressor on which the hard carbon-based coating of the present invention is formed is shown in FIG.
【0024】同図において、12は密閉容器、20は図
示しない電動機によって駆動されるクランク軸、30は
クランク軸20の偏心部に取り付けられたローラであ
り、このローラ30はモニクロ鋳鉄から構成されてい
る。In FIG. 1, reference numeral 12 denotes a sealed container, reference numeral 20 denotes a crankshaft driven by an electric motor (not shown), reference numeral 30 denotes a roller attached to an eccentric portion of the crankshaft 20, and the roller 30 is made of monochromatic cast iron. I have.
【0025】40はローラ30を収納した円筒状シリン
ダであり、このシリンダ40は鋳鉄から構成されてい
る。50はベーン60が往復運動するために設けられた
シリンダ溝、60は円筒状シリンダ40内の空間を高圧
部と低圧部に仕切るためのベーンであり、このベーン6
0は高速度工具鋼(SKH51)から構成されている。Reference numeral 40 denotes a cylindrical cylinder housing the roller 30, and this cylinder 40 is made of cast iron. Numeral 50 is a cylinder groove provided for the vane 60 to reciprocate, and numeral 60 is a vane for partitioning the space inside the cylindrical cylinder 40 into a high-pressure section and a low-pressure section.
0 is made of high-speed tool steel (SKH51).
【0026】70はベーン60をローラ30側に付勢す
るためのバネである。80は円筒状シリンダ40内へ冷
媒を供給する吸入管、90は円筒状シリンダ内部で圧縮
された圧力、及び温度が上昇した冷媒を圧縮機外部に吐
出させる吐出管である。尚、本発明の回転圧縮機の冷凍
油としては、ポリオールエステル、又はポリビニールエ
ーテルが用いられることが好ましい。Reference numeral 70 denotes a spring for biasing the vane 60 toward the roller 30. Reference numeral 80 denotes a suction pipe for supplying the refrigerant into the cylindrical cylinder 40, and reference numeral 90 denotes a discharge pipe for discharging the refrigerant having the pressure and the temperature increased inside the cylindrical cylinder to the outside of the compressor. In addition, as the refrigerating oil of the rotary compressor of the present invention, a polyol ester or polyvinyl ether is preferably used.
【0027】前述のように構成された回転圧縮機の動作
説明を次に行う。The operation of the rotary compressor configured as described above will now be described.
【0028】電動機によってクランク軸20が駆動さ
れ、クランク軸20偏心部に取り付けられたローラ30
は、円筒状シリンダ40内を円周に沿って回転する。ベ
ーン60は高圧ガス、及びバネ70を付勢を受けている
ため、このローラ30の回転に伴ってベーン60は、ロ
ーラ30の外周面と常時接触しながら、シリンダ溝50
内を往復運動する。The crankshaft 20 is driven by an electric motor, and a roller 30 attached to an eccentric portion of the crankshaft 20 is provided.
Rotates along the circumference in the cylindrical cylinder 40. Since the vane 60 is biased by the high-pressure gas and the spring 70, the vane 60 is constantly in contact with the outer peripheral surface of the roller 30 with the rotation of the roller 30, and the cylinder groove 50.
Reciprocate inside.
【0029】この運動を連続的に繰り返すことによっ
て、円筒状シリンダ40内へ吸入管80を介して吸い込
まれた冷媒が、円筒状シリンダ40内部で圧縮され、圧
力、及び温度が上昇した後、吐出管90を介して回転圧
縮機外部に吐出される。By continuously repeating this motion, the refrigerant sucked into the cylindrical cylinder 40 via the suction pipe 80 is compressed inside the cylindrical cylinder 40, and after the pressure and temperature rise, the refrigerant is discharged. It is discharged to the outside of the rotary compressor through the pipe 90.
【0030】以下、硬質炭素系被膜を形成する実施の形
態について説明する。 (実施例1)まず、真空チャンバ8内を10-5〜10-7Torr
に排気する。プラズマ発生室4内にSiH4ガス2.0×10-4T
orr導入し、この母材に対して、シリコンイオンを加速
電圧1kVで母材に注入した。この時、最表面をESCA分析
した結果、SiとN、及びFeとSiの結合が観察され、この
結合状態の概念図を図3(a)に示す。同図に示すよう
に、基体(母材)中に形成された窒素拡散層中の最表面
にFe2N、SiN、及びFeSiの混合層が形成されている。An embodiment for forming a hard carbon-based coating will be described below. (Example 1) First, the inside of the vacuum chamber 8 is set to 10 -5 to 10 -7 Torr.
Exhaust. SiH 4 gas 2.0 × 10 -4 T in plasma generation chamber 4
Orr was introduced, and silicon ions were implanted into the base material at an acceleration voltage of 1 kV. At this time, as a result of the ESCA analysis of the outermost surface, a bond between Si and N and a bond between Fe and Si were observed, and a conceptual diagram of this bond state is shown in FIG. As shown in the figure, a mixed layer of Fe 2 N, SiN, and FeSi is formed on the outermost surface in a nitrogen diffusion layer formed in a base (base material).
【0031】次に、真空チャンバ8内にArガスを5.7×1
0-4Torr供給して、ターゲット11と基板ホルダー7と
の間にArプラズマを発生させ、プラズマ中のイオンによ
り、Siターゲットをスパッタし、Si中間層を形成する。Next, 5.7 × 1 Ar gas is introduced into the vacuum chamber 8.
By supplying 0 -4 Torr, Ar plasma is generated between the target 11 and the substrate holder 7, and the Si target is sputtered by ions in the plasma to form a Si intermediate layer.
【0032】更に、マグネトロンスパッタ法によるSi中
間層形成プロセスを止めて、プラズマ発生室4内にArガ
スを2.5×10-4Torr、CH4ガスを3.0×10-4Torr供給し
て、プラズマ発生室4にAr及びCH4のプラズマを発生さ
せる。最後に、グリッド9に印加する電圧を400Vとして
硬質炭素系被膜を形成した。Further, the process of forming the Si intermediate layer by the magnetron sputtering method is stopped, and 2.5 × 10 −4 Torr of Ar gas and 3.0 × 10 −4 Torr of CH 4 gas are supplied into the plasma generation chamber 4 to generate plasma. A plasma of Ar and CH 4 is generated in the chamber 4. Finally, the voltage applied to the grid 9 was set to 400 V to form a hard carbon-based coating.
【0033】このようにして作製した被膜の密着性の評
価をビッカース圧子による押し込み試験(荷重:1kg)
により行った。比較例としてシリコンイオンを注入せず
に作製した膜の結果もあわせて表1に示す。(試験サン
プル個数:50個)Evaluation of the adhesion of the coating film thus prepared was carried out by using a Vickers indenter indentation test (load: 1 kg).
Was performed. Table 1 also shows the results of a film produced without implanting silicon ions as a comparative example. (Number of test samples: 50)
【0034】[0034]
【表1】 【table 1】
【0035】表1に示すように、本発明の膜は明らかに
密着性においても、優れていることが分かる。 (実施例2)まず、真空チャンバ8内を10-5〜10-7Torr
に排気する。プラズマ発生室4内にCH4ガス2.0×10-4To
rr導入し、この母材に対して、炭素イオンを加速電圧1k
Vで母材に注入した。この時、最表面をESCA分析した結
果、CとN、及びFeとCの結合が観察され、この結合状態
の概念図を図3(b)に示す。同図に示すように、基体
(母材)中に形成された窒素拡散層中の最表面にFe2N、
CN、及びFeCの混合層が形成されている。As shown in Table 1, it is clear that the film of the present invention is clearly excellent also in adhesion. (Example 2) First, the inside of the vacuum chamber 8 is set to 10 -5 to 10 -7 Torr.
Exhaust. CH 4 gas into the plasma generation chamber 4 2.0 × 10 -4 To
rr is introduced and carbon ions are accelerated to this base material at an acceleration voltage of 1k.
V injected into the base metal. At this time, as a result of the ESCA analysis of the outermost surface, the bonds of C and N and the bonds of Fe and C were observed, and FIG. 3 (b) shows a conceptual diagram of the bonding state. As shown in the figure, the outermost surface of the nitrogen diffusion layer formed in the base (base material) is Fe 2 N,
A mixed layer of CN and FeC is formed.
【0036】次に、真空チャンバ8内にArガスを5.7×1
0-4Torr供給して、ターゲット11と基板ホルダー7と
の間にArプラズマを発生させ、プラズマ中のイオンによ
り、Siターゲットをスパッタし、Si中間層を形成する。Next, 5.7 × 1 Ar gas was introduced into the vacuum chamber 8.
By supplying 0 -4 Torr, Ar plasma is generated between the target 11 and the substrate holder 7, and the Si target is sputtered by ions in the plasma to form a Si intermediate layer.
【0037】次に、マグネトロンスパッタ法によるSi中
間層形成プロセスを止めて、プラズマ発生室4内にArガ
スを2.5×10-4Torr、CH4ガスを3.0×10-4Torr供給し
て、プラズマ発生室4にAr及びCH4のプラズマを発生さ
せる。最後に、グリッド9に印加する電圧を400Vとして
硬質炭素系被膜を形成した。Next, the process of forming the Si intermediate layer by the magnetron sputtering method was stopped, and 2.5 × 10 −4 Torr of Ar gas and 3.0 × 10 −4 Torr of CH 4 gas were supplied into the plasma generation chamber 4. A plasma of Ar and CH 4 is generated in the generation chamber 4. Finally, the voltage applied to the grid 9 was set to 400 V to form a hard carbon-based coating.
【0038】このようにして作製した被膜の密着性の評
価をビッカース圧子による押し込み試験(荷重:1kg)
により行った。比較例として炭素イオンを注入せずに作
製した膜の結果もあわせて表2に示す。(試験サンプル
個数:50個)The adhesion of the coating film thus prepared was evaluated by an indentation test using a Vickers indenter (load: 1 kg).
Was performed. Table 2 also shows the results of a film formed without carbon ion implantation as a comparative example. (Number of test samples: 50)
【0039】[0039]
【表2】 [Table 2]
【0040】表2に示すように、本発明の膜は明らかに
密着性においても、優れていることが分かる。As shown in Table 2, it can be seen that the film of the present invention is clearly excellent also in adhesion.
【0041】前述したように、Fe系からなる母材を窒
化処理した場合、一般的に母材の最表面にはFe2N等が
形成されている。このため、母材に硬質炭素系被膜を形
成する前に予めそのFe2N層の一部をCN、或いはSiNに変
化させることによって、CN、或いはSiNが、母材と硬質
炭素系被膜との間の結合力を高めて密着性向上に寄与す
る。As described above, when a base material made of Fe is nitrided, Fe 2 N or the like is generally formed on the outermost surface of the base material. For this reason, before forming the hard carbon-based coating on the base material, by changing a part of the Fe 2 N layer to CN or SiN in advance, CN or SiN is formed between the base material and the hard carbon-based coating. It enhances the bonding strength between them and contributes to the improvement of adhesion.
【0042】尚、前述の実施の形態では、回転圧縮機の
ベーン60に硬質炭素系被膜を形成したが、これには限
られず、回転圧縮機の部品(部材)であるローラ30の
表面、或いはシリンダの溝50の内面に硬質炭素系被膜
を形成しても、ベーンと同様な効果が得られることを実
験により確認した。In the above-described embodiment, the hard carbon-based coating is formed on the vane 60 of the rotary compressor. However, the present invention is not limited to this. The surface of the roller 30 which is a component (member) of the rotary compressor, or Experiments have confirmed that the same effect as the vane can be obtained even when a hard carbon-based coating is formed on the inner surface of the groove 50 of the cylinder.
【0043】[0043]
【発明の効果】以上の説明から明らかなように、本発明
によれば、窒化処理された母材上に硬質炭素系被膜を形
成する場合、予めシリコンイオン、或いは炭素イオンを
母材に向かって照射し、窒化処理の際に形成された母材
の最表面層をスパッタリングすると共に、シリコン、或
いは炭素と窒素との結合を有する混合層を形成すること
によって、母材上に密着性良く硬質炭素系被膜を形成す
ることができる効果を奏する。As is apparent from the above description, according to the present invention, when a hard carbon-based coating is formed on a nitrided base material, silicon ions or carbon ions are previously directed toward the base material. Irradiation and sputtering of the outermost surface layer of the base material formed during the nitriding treatment, and formation of silicon or a mixed layer having a bond of carbon and nitrogen to form a hard carbon layer on the base material with good adhesion. An effect that a system coating can be formed is exhibited.
【図1】本発明における硬質炭素系被膜形成のための装
置の一例を示す概略断面図である。FIG. 1 is a schematic sectional view showing an example of an apparatus for forming a hard carbon-based film according to the present invention.
【図2】本発明の硬質炭素系被膜が形成される回転圧縮
機の概略断面図である。FIG. 2 is a schematic sectional view of a rotary compressor on which a hard carbon-based coating of the present invention is formed.
【図3】窒化処理された母材の表面における結合状態の
概念図である。FIG. 3 is a conceptual diagram of a bonding state on a surface of a base material subjected to a nitriding treatment.
1…マイクロ波供給手段 2…導波管 3…マイクロ波導入窓 4…プラズマ発生室 5…ガス導入管 6…プラズマ磁界発生装置 7…基体ホルダ 8…真空チャンバ 9…グリッド 10…基体 11…ターゲット DESCRIPTION OF SYMBOLS 1 ... Microwave supply means 2 ... Waveguide 3 ... Microwave introduction window 4 ... Plasma generation chamber 5 ... Gas introduction tube 6 ... Plasma magnetic field generator 7 ... Base holder 8 ... Vacuum chamber 9 ... Grid 10 ... Base 11 ... Target
───────────────────────────────────────────────────── フロントページの続き (72)発明者 堂本 洋一 大阪府守口市京阪本通2丁目5番5号 三 洋電機株式会社内 ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Yoichi Domoto 2-5-5 Keihanhondori, Moriguchi-shi, Osaka Sanyo Electric Co., Ltd.
Claims (12)
を形成する際に、予め母材上に形成する被膜の構成原
子、或いは構成分子のイオンを照射し、該イオンの運動
エネルギーを利用して、前記窒化処理の際に形成された
前記母材の最表面層をスパッタリングすると共に、前記
被膜の構成原子、或いは構成分子と母材の構成原子との
結合を有する混合層を形成し、該混合層上に硬質炭素系
被膜を形成したことを特徴とする回転圧縮機。When a hard carbon-based coating is formed on a nitrided base material, ions of constituent atoms or constituent molecules of the coating formed on the base material are irradiated in advance, and the kinetic energy of the ions is used. Then, while sputtering the outermost surface layer of the base material formed at the time of the nitriding treatment, to form a mixed layer having bonding between constituent atoms of the coating, or constituent molecules and constituent atoms of the base material, A rotary compressor, wherein a hard carbon-based coating is formed on the mixed layer.
材、或いはこれらをベースにした焼結、複合材を特徴と
する請求項1記載の回転圧縮機。2. The rotary compressor according to claim 1, wherein the base material is an Fe-based, Al-based, or Cu-based ingot, or a sintered or composite material based on these materials.
e、Ru、Mo、Wであることを特徴とする請求項1記載の回
転圧縮機。3. The type of the ions is C, Si, Ti, Zr, G
The rotary compressor according to claim 1, wherein the rotary compressor is e, Ru, Mo, or W.
けられた、外周面を有するローラと、前記ローラを収納
し、前記ローラの外周面に接して摺動する摺動面を内面
に有するシリンダと、前記シリンダの内面に形成された
溝内に収納され、先端部が前記ローラの外周面に接して
摺動するベーンとを備え、前記ベーンの少なくとも先端
部又は側面部に請求項1乃至3のうちいずれかに記載の
硬質炭素系被膜を用いたことを特徴とする回転圧縮機。4. A roller having an outer peripheral surface attached to an eccentric portion of a rotating crankshaft, and a cylinder accommodating the roller and having a sliding surface on the inner surface that slides in contact with the outer peripheral surface of the roller. A vane housed in a groove formed on the inner surface of the cylinder and having a leading end sliding in contact with the outer peripheral surface of the roller, wherein at least the leading end or the side surface of the vane is provided on the vane. A rotary compressor using the hard carbon-based coating described in any one of the above.
けられた、外周面を有するローラと、前記ローラを収納
し、前記ローラの外周面に接して摺動する摺動面を内面
に有するシリンダと、前記シリンダの内面に形成された
溝内に収納され、先端部が前記ローラの外周面に接して
摺動するベーンとを備え、前記ローラの外周面に請求項
1乃至3のうちいずれかに記載の硬質炭素系被膜を用い
たことを特徴とする回転圧縮機。5. A roller having an outer peripheral surface attached to an eccentric portion of a rotating crankshaft, and a cylinder accommodating the roller and having an inner sliding surface which slides in contact with the outer peripheral surface of the roller. And a vane housed in a groove formed on the inner surface of the cylinder and having a leading end portion that slides in contact with the outer peripheral surface of the roller, wherein the outer peripheral surface of the roller is provided with a vane. A rotary compressor characterized by using the hard carbon-based coating described in the above.
けられた、外周面を有するローラと、前記ローラを収納
し、前記ローラの外周面に接して摺動する摺動面を内面
に有するシリンダと、前記シリンダの内面に形成された
溝内に収納され、先端部が前記ローラの外周面に接して
摺動するベーンとを備え、前記シリンダの溝の内面に請
求項1乃至3のいずれかに記載の硬質炭素系被膜を用い
たことを特徴とする回転圧縮機。6. A roller having an outer peripheral surface attached to an eccentric portion of a rotating crankshaft, and a cylinder accommodating the roller and having a sliding surface on the inner surface that slides in contact with the outer peripheral surface of the roller. A vane that is housed in a groove formed on the inner surface of the cylinder, and has a tip portion that slides in contact with the outer peripheral surface of the roller, wherein the inner surface of the groove of the cylinder is provided with the vane. A rotary compressor characterized by using the hard carbon-based coating described in the above.
前記ローラの外周面、又は前記シリンダの溝の内面との
間に中間層が形成されていることを特徴とする請求項4
乃至6のうちいずれかに記載の回転圧縮機。7. The hard carbon-based coating, the vane,
5. An intermediate layer is formed between an outer peripheral surface of the roller and an inner surface of a groove of the cylinder.
7. The rotary compressor according to any one of claims 6 to 6.
Mo、W又はこれらの酸化物、これらの窒化物、もしくは
これらの炭化物から形成されていることを特徴とする請
求項7記載の回転圧縮機。8. The method according to claim 1, wherein the intermediate layer is made of Si, Ti, Zr, Ge, Ru,
The rotary compressor according to claim 7, wherein the rotary compressor is made of Mo, W, an oxide thereof, a nitride thereof, or a carbide thereof.
r、F、及びBからなるグループより選ばれる少なくとも
1種の添加元素を含有していることを特徴とする請求項
4乃至8のうちいずれかに記載の回転圧縮機。9. The method according to claim 9, wherein the hard carbon-based coating is made of Si, N, Ta, C
The rotary compressor according to any one of claims 4 to 8, comprising at least one additional element selected from the group consisting of r, F, and B.
系被膜の表面に近い部分の添加元素濃度が表面から離れ
た部分よりも高くなるような添加元素濃度の傾斜を有し
ていることを特徴とする請求項9記載の回転圧縮機。10. The method according to claim 1, wherein the hard carbon-based coating has a gradient of the additive element concentration such that the concentration of the additive element in a portion near the surface of the hard carbon-based coating is higher than that in a portion away from the surface. The rotary compressor according to claim 9, wherein:
において、冷凍油として、ポリオールエステル、又はポ
リビニールエーテルを用いることを特徴とする回転圧縮
機。11. The rotary compressor according to claim 4, wherein a polyol ester or polyvinyl ether is used as the refrigeration oil.
ド被膜、ダイヤモンド構造と非晶質炭素構造との混合
膜、又は非晶質炭素被膜から構成されていることを特徴
とする請求項4乃至10のうちいずれかに記載の回転圧
縮機。12. The method according to claim 4, wherein the hard carbon-based coating is formed of a diamond coating, a mixed film of a diamond structure and an amorphous carbon structure, or an amorphous carbon coating. The rotary compressor according to any one of the above.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8395998A JPH11280648A (en) | 1998-03-30 | 1998-03-30 | Rotary compressor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8395998A JPH11280648A (en) | 1998-03-30 | 1998-03-30 | Rotary compressor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH11280648A true JPH11280648A (en) | 1999-10-15 |
Family
ID=13817114
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8395998A Pending JPH11280648A (en) | 1998-03-30 | 1998-03-30 | Rotary compressor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH11280648A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006196433A (en) * | 2004-12-13 | 2006-07-27 | Matsushita Electric Ind Co Ltd | Positive electrode active material, method for producing the same, and non-aqueous electrolyte secondary battery |
JP2007100517A (en) * | 2005-09-30 | 2007-04-19 | Mitsubishi Electric Corp | Hermetic compressor |
US20180154449A1 (en) * | 2016-12-06 | 2018-06-07 | Miba Sinter Austria Gmbh | Method for producing a swashplate |
-
1998
- 1998-03-30 JP JP8395998A patent/JPH11280648A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006196433A (en) * | 2004-12-13 | 2006-07-27 | Matsushita Electric Ind Co Ltd | Positive electrode active material, method for producing the same, and non-aqueous electrolyte secondary battery |
JP2007100517A (en) * | 2005-09-30 | 2007-04-19 | Mitsubishi Electric Corp | Hermetic compressor |
US20180154449A1 (en) * | 2016-12-06 | 2018-06-07 | Miba Sinter Austria Gmbh | Method for producing a swashplate |
US10792733B2 (en) * | 2016-12-06 | 2020-10-06 | Miba Sinter Austria Gmbh | Method for producing a swashplate |
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