JPH11242169A - Exposure equipment - Google Patents

Abstract

(57) Abstract: An image forming apparatus that forms an image by an exposure device that collectively exposes a plurality of light beams to prevent the image from being deteriorated due to a shift in a writing start position of each light beam. An exposure apparatus according to the present invention includes first to fourth semiconductor laser elements having different emission wavelengths of light beams to be emitted, and a photoconductor which collectively emits light beams emitted from the laser elements. A deflecting device 123 that scans toward the drum, a beam position detector 151 that detects a part of the light beam deflected by the deflecting device, and outputs a signal that can be used to generate a horizontal synchronization signal; Has a spectral prism 153 that separates a light beam incident on the prism in order of wavelength. Accordingly, it is possible to prevent the writing start position of the image of each light beam from being deviated due to the deviation of the interval between the light beams and the deviation between the photodetectors, thereby deteriorating the image quality.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention is used in, for example, a multi-drum type color copier or color printer, a multicolor color copier or multicolor printer, or a single-color high-speed digital copier or high-speed printer. The present invention relates to a multi-beam exposure apparatus for simultaneously exposing two or more light beams.

[0002]

2. Description of the Related Art For example, in an image forming apparatus such as a color printer or a color copying apparatus using an image forming unit including a plurality of photosensitive drums, or a high-speed printer for simultaneously exposing a plurality of lines of monochrome image data,
2. Description of the Related Art An exposure apparatus that simultaneously exposes a plurality of light beams corresponding to color components subjected to color separation or a plurality of image data processed in parallel for a plurality of lines is used.

This type of exposure apparatus emits two or more semiconductor laser elements that emit image data for each color component separated by color or a predetermined number of light beams processed in parallel for a plurality of lines. A first lens group for narrowing the cross-sectional beam diameter of the light beam to a predetermined size and shape for each light beam, a light beam group narrowed to a predetermined shape and size by the first lens group, A deflecting device that deflects by continuously reflecting in a direction perpendicular to a direction in which a recording medium on which image data is formed by a light beam is transported in a direction perpendicular to a direction in which the recording medium is conveyed; The second lens group, etc., which forms an image at the position of.

The above-described exposure apparatus uses a plurality of exposure apparatuses corresponding to respective image data in accordance with an image forming apparatus to be applied, and a multi-beam apparatus in which a plurality of light beams are collectively exposed by one exposure apparatus. And an example using an exposure apparatus.

In the above-described multi-beam exposure apparatus, parallel exposure of image data of the same color is performed by using a single light beam if the number of image data to be exposed in parallel is N. Thus, it is possible to provide a high-speed printer capable of forming an image at an image forming speed that is N times as fast as the apparatus.

By the way, in order to simultaneously scan a plurality of light beams, the distance between the light beams on the image plane is one.
It is necessary to bring the light beams close to the pixel (beam spot diameter). Particularly, when a plurality of light beams are collectively exposed by one exposure apparatus, the light beams are close to each other even in the exposure apparatus. Treated in state.

However, even when a plurality of light beams are collectively exposed by one exposure apparatus, the synchronous detection (and the setting of the image writing position, that is, the generation timing of the image generation signal) is performed for all the light beams. Since it is necessary to perform the operation, the number of beam position detectors for receiving the light beams and performing photoelectric conversion is required in a number corresponding to the number of the light beams.

In this case, each beam position detector determines a position based on one of the light beams, for example, the first light beam, and detects the position corresponding to the second light beam and subsequent light beams. The position of the detector is set to a relative position obtained from the input timing of each light beam and the image start position with reference to the first light beam. In addition,
The detector corresponding to the first light beam is incident on the detector corresponding to the first light beam even when the light beams subsequent to the second light beam are incident with a large deviation. In this case, the detector corresponding to the first light beam is also shifted in the scanning direction with respect to the other detectors so that the light beam is first incident.

[0009]

By the way, as described above, the detector corresponding to the first light beam and the detector corresponding to the second light beam are displaced in the scanning direction, and first serve as a reference. When the first light laser beam is detected, and the second light beam, the third light beam,... Are sequentially detected, the distance from the image start position is Δx, and the distance from the image start position is Δx. Is Δt, the f-value of the fθ lens is f, and the angular velocity of the deflector is ω, theoretically, Δx = f · ω · Δt (= F (Δt); Is established, but this relationship is for the entire lens, and the above relationship is not always locally established.

That is, in a limited area,
For example, the time between the synchronous detection of the first light beam and the start of the image is T ₁ , the time between the synchronous detection of the second light beam and the start of the image is T ₂ , the first detector and the second detection Assuming that the interval in the scanning direction of the detector is ΔX ₁₂ , ΔX ₁₂ ≠ F (T ₁ −T ₂ ), that is, T ₁ ≠ T ₂ + F−1 (ΔX ₁₂ ).

This relationship holds regardless of the number of light beams. In this case, a deviation occurs between the synchronization detection of each light beam and the start of the image, and the deviation appears as it is.

[0012] For the above reasons, the image may be adversely affected. SUMMARY OF THE INVENTION An object of the present invention is to provide an image forming apparatus capable of preventing image deterioration due to a shift in a writing start position of each light beam in an image forming apparatus that forms an image using an exposure apparatus that exposes a plurality of light beams at a time. It is in.

[0013]

SUMMARY OF THE INVENTION The present invention has been made based on the above-mentioned problems, and comprises a plurality of light sources which emit light of different wavelengths, and a light emitted from each of the plurality of light sources. A first optical system that converts light or condensed light, a deflecting device that deflects light that has passed through the optical system, and a second optical system that images light deflected by the deflecting device at a predetermined position. A separation optical system that emits the light that has passed through the second optical system at a timing corresponding to the wavelength of each light, and a photoelectric conversion that sequentially detects the light separated by the separation optical system and performs photoelectric conversion. And an exposure apparatus.

The present invention also provides a plurality of light sources that emit light of different wavelengths from each other, a first optical system that converts light emitted from each of the plurality of light sources into parallel light or focused light, A deflecting device that deflects light passed through the optical system in a first direction, a second optical system that forms an image of light deflected by the deflecting device at a predetermined position, and a light that passes through the second optical system. Separated optical system that emits the separated light at a timing of a predetermined time difference according to the wavelength of each light in the first direction, and a photoelectric converter that sequentially detects the light separated by the separated optical system and performs photoelectric conversion. And a conversion device.

Further, the present invention provides a plurality of light sources that emit light of different wavelengths, a first optical system that converts light emitted from each of the plurality of light sources into parallel light or converged light, A deflecting device that deflects light passed through the optical system in a first direction, a second optical system that forms an image of light deflected by the deflecting device at a predetermined position, and a light that passes through the second optical system. The separated light, with respect to the first direction, a separation optical system that emits at a timing of a predetermined time difference according to the ascending or descending order of the wavelength of each light, and sequentially detect the light separated by the separation optical system. And a photoelectric conversion device that performs photoelectric conversion.

Still further, the present invention provides a plurality of light sources that emit light having different wavelengths from each other, a first optical system that converts light emitted from each of the plurality of light sources into parallel light or focused light, A deflecting device that deflects light passed through the optical system in a first direction, a second optical system that forms an image of light deflected by the deflecting device at a predetermined position, and passes through the second optical system. The separated light, with respect to the first direction, a separation optical system that emits at a timing of a predetermined time difference according to the ascending or descending order of the wavelength of each light, and the light separated by the separation optical system is sequentially detected. A photoelectric conversion device for performing photoelectric conversion on the basis of an output from the photoelectric conversion device, and an image output device for applying an image signal at a predetermined timing to each of the plurality of light sources based on an output from the photoelectric conversion device. Providing equipment It is intended.

Further, the present invention provides a plurality of light sources that emit light of different wavelengths from each other, a first optical system that converts light emitted from each of the plurality of light sources into parallel light or converged light, A deflecting device that deflects light passed through the optical system in a first direction, a second optical system that forms an image of light deflected by the deflecting device at a predetermined position, and passes through the second optical system. The separated light, with respect to the first direction, a spectral prism that splits and emits the light in the ascending or descending order of the wavelength of each light, and sequentially detects light separated based on a wavelength difference by the spectral prism. An exposure apparatus comprising: a photoelectric conversion device that performs photoelectric conversion; and an image output device that applies an image signal at a predetermined timing to each of the plurality of light sources based on an output from the photoelectric conversion device. I will provide a Than it is.

Still further, the present invention provides a first light source for emitting light of a first wavelength, and a second light source for emitting light of a second wavelength different from the wavelength of light from the first light source. And a deflecting device that deflects light from the first light source and light from the second light source in a first direction, and is disposed between the deflecting device and the respective light sources; In the first direction, the light emitted from the light source becomes a single light when viewed from a plane direction, and has a predetermined interval in a second direction orthogonal to the first direction. As such, a first optical device group to be superimposed, and a second optical device group that forms the respective light deflected by the deflecting device at a predetermined position corresponding to the magnitude of deflection by the deflecting device, The respective lights passed through this second optical device group,
Based on the wavelengths of the respective lights, in the first direction, a separation device that separates at a predetermined timing, and a photoelectric conversion device that sequentially detects the light separated by the separation device and performs photoelectric conversion. An exposure apparatus is provided.

Further, the present invention provides a first light source for emitting light of a first wavelength, and a second light source for emitting light of a second wavelength different from the wavelength of light from the first light source. And a deflecting device that deflects light from the first light source and light from the second light source in a first direction, and is disposed between the deflecting device and the respective light sources; In the first direction, the light emitted from the light source becomes a single light when viewed from a plane direction, and has a predetermined interval in a second direction orthogonal to the first direction. As such, a first optical device group to be superimposed, and a second optical device group that forms the respective light deflected by the deflecting device at a predetermined position corresponding to the magnitude of deflection by the deflecting device, The respective lights passed through this second optical device group,
A separation device that separates at a predetermined timing in the first direction based on the wavelength of each light, a photoelectric conversion device that sequentially detects the light separated by the separation device and performs photoelectric conversion, An exposure apparatus, comprising: an image output device that applies an image signal to each of the plurality of light sources at a predetermined timing based on an output from a conversion device.

[0020]

Embodiments of the present invention will be described below in detail with reference to the drawings. FIG. 1 shows a digital copying machine as an image forming apparatus having a multi-beam exposure apparatus according to an embodiment of the present invention.

As shown in FIG. 1, the digital copying apparatus 1 has, for example, an image reading unit 10 and a printer unit 20 as an image forming unit. The scanner unit 10 has a first carriage 11 movably formed in the direction of the arrow, a second carriage 12 that is moved in accordance with the first carriage 11, and light from the second carriage 12 that has a predetermined imaging characteristic. The optical lens 13 to be applied, the photoelectric conversion element 14 that photoelectrically converts light having predetermined imaging characteristics given by the optical lens 13 and outputs an electric signal, the original table 15 for holding the original O, and the original O on the original table 15 It has a document fixing cover 16 to be pressed.

The first carriage 11 is illuminated with a light source 17 for illuminating the original O,
There is provided a mirror 18A for reflecting the reflected light from the second carriage 12 toward the second carriage 12.

The second carriage 12 has a mirror 18B for bending the light transmitted from the mirror 18A of the first carriage 11 by 90 ° and a mirror 18C for bending the light bent by the mirror 18B further by 90 °.

The original O placed on the original table 15 is a light source 1
7, and reflects reflected light in which the brightness of light corresponding to the presence or absence of an image is distributed. The reflected light of the original O is used as image information of the original O as mirrors 18A, 18B and 1
The light enters the optical lens 13 via 8C.

The reflected light from the document O guided to the optical lens 13 is transmitted by the optical lens 13 to the photoelectric conversion element (CC).
The light is focused on the light receiving surface of the D sensor 14. Hereinafter, the first carriage 11 and the second carriage 12 are driven at a relative speed of 2: 1 by driving a carriage driving motor (not shown).
5, the image information of the original O, that is, the reflected light from the original O is cut out at a predetermined width along the direction in which the mirror 18A extends, and the mirror 18A
Are sequentially taken out in a direction orthogonal to the extending direction, and all image information of the document O is guided to the CCD sensor 14.

As described above, the image of the document O placed on the document table 15 is not shown by the CCD sensor 14 for each line along the first direction in which the mirror 18A extends. The image processing unit converts the image into a digital image signal of, for example, 8 bits indicating the density of the image.

The printer section 20 includes a multi-beam exposure apparatus 21 described later with reference to FIGS. 2 to 9 and an electrophotographic image forming section 22 capable of forming an image on a recording sheet P as an image forming medium. have.

The image forming section 22 is a drum-shaped photosensitive member (hereinafter referred to as a photosensitive member) on which image data, that is, an electrostatic latent image corresponding to the image of the original O is formed by irradiating a light beam from the multi-beam exposure device 21. 23), a charging device 24 for applying a surface potential of a predetermined polarity to the surface of the photosensitive drum 23, and toner as a visualizing material for an electrostatic latent image formed on the photosensitive drum 23 by a multi-beam exposure device. Developing device 25 that supplies and develops the toner image, a transfer device 26 that applies a predetermined electric field to the toner image formed on the outer periphery of the photosensitive drum 23 by the developing device 25, and transfers the toner image to the recording paper P. The separated recording paper P and the toner between the recording paper P and the photosensitive drum 23 are released from the electrostatic attraction to the photosensitive drum 23 and separated (from the photosensitive drum 23). And a cleaning device 28 that removes transfer residual toner remaining on the outer periphery of the photoconductor drum 23 and returns the potential distribution of the photoconductor drum 23 to a state before the surface potential is supplied by the charging device 24. .
The charging device 24, the developing device 25, the transfer device 26, the separating device 27, and the cleaning device 28 are sequentially arranged in the direction of the arrow in which the photosensitive drum 23 rotates. The exposure beam (light beam) from the multi-beam exposure device 21 is applied to a predetermined position X on the photosensitive drum 23 between the charging device 24 and the developing device 25.

The image signal read from the original O by the scanner unit 10 is converted into a print signal by a process such as contour correction or gradation processing for halftone display in an image processing unit (not shown). The light intensity of the laser beam emitted from the semiconductor laser element described below of the exposure device 21 can be used to record an electrostatic latent image on the outer periphery of the photosensitive drum 23 to which a predetermined surface potential is given by the charging device 24. It is converted into a laser modulation signal for changing either the intensity or the intensity at which the electrostatic latent image is not recorded.

Each of the following semiconductor laser elements of the multi-beam exposure apparatus 21 is intensity-modulated in accordance with the above-mentioned laser modulation signal, and is electrostatically charged at a predetermined position on the photosensitive drum 23 in accordance with predetermined image data. To record the image,
Emits light. The light from the semiconductor laser device is directed in the same direction as the reading line of the scanner unit 10 by the deflection device described below in the multi-beam exposure device 21.
And irradiates a predetermined position X on the outer periphery of the photosensitive drum 23.

Thereafter, the photosensitive drum 23 is rotated in the direction of the arrow at a predetermined speed, so that the first carriage 11 and the second carriage 12 of the scanner section 10 are deflected in the same manner as the original carriage 7 is moved. The laser beam from the semiconductor laser device, which is sequentially deflected by the apparatus, is exposed on the outer periphery of the photosensitive drum 23 at a predetermined interval line by line.

In this way, an electrostatic latent image corresponding to the image signal is formed on the outer periphery of the photosensitive drum 23. The electrostatic latent image formed on the outer periphery of the photosensitive drum 23 is
5 and is conveyed to a position facing the transfer device 26 by the rotation of the photosensitive drum 23, and is fed from the paper cassette 29 to the paper feed roller 30 and the separation roller 3.
1, one sheet is taken out, and is transferred onto a recording sheet P supplied at an aligned timing by the aligning roller 32 by an electric field from the transfer device 26.

The recording paper P on which the toner image has been transferred is separated together with the toner by the separation device 27 and the conveyance device 33
To the fixing device 34. After the toner (toner image) is fixed on the recording paper P guided by the fixing device 34 by the heat and pressure from the fixing device 34, the recording paper P is discharged.
5 is discharged to the tray 36.

On the other hand, after the transfer device 26 has transferred the toner image (toner) to the recording paper P, the photosensitive drum 23
Is a transfer residual toner (residual toner) remaining opposite to the cleaning device 28 as a result of the subsequent rotation and remaining on the outer periphery.
Is removed, and the state is returned to the initial state before the surface potential is supplied by the charging device 24, so that the next image can be formed.

By repeating the above process, a continuous image forming operation becomes possible. As described above, the image information of the original O set on the original platen 15 is read by the scanner unit 10 and the read image information is transferred to the printer unit 2.
At 0, the image is converted to a toner image and output to the recording paper P, so that the image is copied.

FIG. 2 is a schematic plan view showing a multi-beam exposure apparatus used in the digital copying apparatus shown in FIG. As shown in FIG. 2, the multi-beam exposure apparatus 21
Is a first fixed at a predetermined position of a housing (not shown).
To the fourth four light sources 101A, 101B, 101C
And 101D. Each of the light sources is a semiconductor laser device that emits laser beams LA, LB, LC, and LD having a predetermined wavelength, and the laser beams LA, LB emitted by each of the laser devices 101A, 101B, 101C, and 101D. , LC and L
D have different emission wavelengths, and their wavelengths λ
(A, B, C and D) are each λ
_A (LA) = 640 ± 10 nm, λ _B (LB) = 660 ±
10 nm, λ _C (LC) = 680 ± 10 nm and λ
_D (LD) = 700 ± 10 nm.

First to fourth semiconductor laser elements 101
The laser beams LA, LB, LC, and LD emitted from A, 101B, 101C, and 101D are transmitted to the pre-deflection optical system 102 (102A, 102B, 102C, and 10D).
2D) and is guided to the deflecting device 123.

Note that the pre-deflection optical system 102 is common to any or all of the laser beams LA, LB, LC and LD and the four laser beams LA, LB, LC and LD. Since there are parts provided separately, the parts provided individually will be described by adding suffixes A, B, C and D.

The pre-deflection optical system 102 (102A, 102
B, 102C, 102D) are the laser elements 101A, 1
The laser beams LA, LB, LC, and LD emitted from the laser elements 01B, 101C, and 101D are shaped to have predetermined cross-sectional beam spots. The divergent laser beams emitted from the laser elements 101A, 101B, 101C, and 101D are respectively provided. Finite focus lens 103 for giving predetermined convergence to laser beams LA, LB, LC and LD
A, 103B, 103C and 103D, laser beams LA and L which have passed through finite focus lenses 103A, 103B, 103C and 103D and have been given a predetermined convergence.
Stops 104A, 104B, 104C and 104 for adjusting the cross-sectional beam shapes of B, LC and LD to a predetermined shape
D, apertures 104A, 104B, 104C and 104D
The laser beams LA, LB, LC, and LD whose cross-sectional beam shapes are adjusted to a predetermined shape are bent toward the deflecting device 123, and the laser beams LA, LB, LC, and LD on the photosensitive drum 23 are combined with the laser beams LA, LB, LC, and LD. Galvano mirrors 105A, 105B, 105C as optical path changing mechanisms for changing and reflecting the positions of the laser beams LA, LB, LC, and LD in the first direction toward the deflecting device 123 so that the intervals in the scanning direction become predetermined. 105D. Each pre-deflection optical system 102 (A, B, C)
And D), the finite focus lens 103 (A, B,
C and D), aperture 104 (A, B, C and D) and semiconductor laser element 101 (A, B, C and D)
As described below with reference to FIG.
0 (A, B, C, and D) are fixed so that each has a fixed positional relationship. The light emitting units 110 (A, B, C, and D) are fixed to a positioning portion provided at a predetermined position of a housing (not shown) with screws or the like.

The finite focus lenses 103A, 103B, 10
3C and 103D include, for example, UV (ultraviolet) not shown on an aspherical glass lens or a spherical glass lens.
A single lens in which a cured plastic aspheric lens is bonded is used.

The finite focus lens 103 (A, B, C)
And D) and the diaphragm 104 (A, B, C, and D) are integrally held by a lens holder (or barrel) 107 (A, B, C, and D), respectively, as shown in FIG. ing. At this time, the lens 103 (A, B, C and D) is moved by the leaf spring 106 (A, B, C and D).
The lens holder 107 (A, B, C, and D) is pressed toward a positioning portion, and after being adjusted in focus, is fixed by bonding or the like.

The lens holder 107 (A, B, C, and D) is also made of, for example, aluminum die-cast or plastic (for example, PPS = polystyrene) and has a semiconductor laser element 101 (A, B, C, and D). Laser holder 108 fixed at the position
(A, B, C, and D) correspond to the lens holder 107 (A,
After the optical axes have been adjusted with respect to B, C and D), they are fixed, for example, by screws or by bonding.

Galvanometer mirrors 105A, 105B, 10
Reference numerals 5C and 105D denote optical path changing devices, for example, mirrors with a mirror surface rotating mechanism, which can slightly change the direction of reflecting each laser beam to an arbitrary direction. The galvanomirrors 105A, 105B, 105C and 10
In 5D, the angle of the mirror is independently changed in an arbitrary direction by a galvanomirror driving circuit described below with reference to FIG.

On the optical path of the pre-deflection optical system 102 near the deflecting device 123, the laser beam LA from the first laser element 101A reflected by the galvanomirror 105A and the second laser element reflected by the galvanomirror 105B A first half mirror 120, which combines the laser beam LB from 101B into a combined laser beam L (= LA + LB) having a predetermined distance in the sub-scanning direction when viewed from the plane, and this first half mirror The laser beam LC from the third laser element 101C reflected by the galvanomirror 105C to the laser beam L (LA + LB) combined by the laser beam 120 is one beam when viewed from the planar direction and has a predetermined interval in the sub-scanning direction. A second laser for further synthesizing the laser beam L (= LA + LB + LC) Mirror 121, the laser beam L (= LA gathered by the second half mirror 121
+ LB + LC), the laser beam LD from the fourth laser element 101D reflected by the galvanometer mirror 105D
Is a laser beam L (= LA + LB + LC) having one beam in the sub-scanning direction when viewed from the plane direction.
+ LD) Third half mirror 12
2. A cylinder lens 1 that further converges the laser beam L (= LA + LB + LC + LD) combined by the third half mirror 122 in the sub-scanning direction.
25 are provided in order.

As shown in FIG. 5, the cylinder lens 125 is composed of a plastic cylinder lens 125P and a TaSF formed of a plastic material such as polymethyl methacryl (PMMA) having the same curvature in the sub-scanning direction.
A glass cylinder lens 125G formed of a glass material such as 21 is pressed from a predetermined direction toward the positioning member (not shown) by bonding between the exit surface of the plastic lens 125P and the entrance surface of the glass lens 125G. Thus, they are integrally formed. In this case, the plastic lens 125P is
25G may be integrally molded. The first lens of PMMA has a substantially flat surface in contact with air.

The cylinder lens 125 is fitted into a positioning portion of a holding member 125A provided in a housing (not shown), and is formed by a leaf spring or the like (not shown).
03A, 103B, 103C, and 103D are fixed so as to be at an accurate distance from each other, and the holding member 125A is fixed to a positioning portion of a housing (not shown), so that each of the finite focus lenses 103A, 103C.
B, 103C and 103D are fixed at precise intervals. According to such a fixing structure,
By moving the holding member 125A in the optical axis direction,
The focal position of the laser beam in the sub-scanning direction can be adjusted.

As a result, the image forming position of the laser beam formed by the two image forming lenses 130A and 130B of the post-deflection optical system 130 described below becomes large in relation to the change in the refractive index due to the change in temperature. ± 0.5m to fluctuate
m. That is, as compared with a conventional optical system in which the cylinder lens 125 of the pre-deflection optical system 102 is a glass lens and the post-deflection optical system 130 is a plastic lens, it is caused by a change in the refractive index due to a temperature change of the lens of the post-deflection optical system 130. Chromatic aberration in the sub-scanning direction, which is generated as a result, can be corrected.

Next, control of the exposure apparatus shown in FIG. 2 will be described. FIG. 6 is a schematic block diagram illustrating an example of a control system of the exposure apparatus 21 illustrated in FIG.

As shown in FIG. 6, each of the semiconductor laser elements 101A to 101D has an image exposure beam (laser) whose light intensity is changed at predetermined timing in accordance with image data by laser driving circuits 71A to 71D. Beams) LA, LB, LC and LD. Each of the semiconductor laser elements 101A to 101D outputs a laser beam output by a pre-driving current described in detail later until the rotation of the polygon mirror 123A of the deflecting device (polygon mirror) 123 reaches a predetermined number of rotations. It is controlled so as to be able to start up steeply, and shows a stable rotation speed from a mirror motor (not shown) of the deflecting device 123.
When the LL (Phase Loop Lock) signal is output, the laser drive circuit 71A is controlled by the CPU 60.
A predetermined control command is output and energized to each of the laser beams LA, LB, LC and L.
Emit D. The laser beams LA, LB, LC, and LD are applied with a predetermined surface potential SP to the photosensitive drum 23, a predetermined developing bias voltage is applied to the developing roller of the developing device 25, and each polygon mirror 1 of the polygon mirror 123.
When the rotation angle of the laser beam 23 a can deflect (scan) the laser beams LA, LB, LC, and LD at a predetermined position on the photosensitive drum 23, light that can write an electrostatic latent image on the photosensitive drum 23 is used. Has strength. Note that the laser beams LA, LB, LC and LD are
(Non-volatile memory) Galvano mirror 105A in which the reflection angle is independently set based on the amount of rotation stored in 62
And 105D are reflected so as to be at a predetermined interval in the sub-scanning direction.
The light is combined in order by 121 and 122, and is scanned collectively in the main scanning direction by the polygon mirror 123A of the deflecting device 123.

Each of the laser beams LA, LB, LC
And LD are also incident on the beam position detector 151 so that the horizontal synchronization signal HS
Output YNC. In addition, once each laser beam is
When the HSYNC signal is output, it is normally continuously emitted until image data is supplied.

Next, the characteristics of the laser beam emitted from each laser element will be described in detail. The laser beam LA from the first laser element 101A is given a predetermined convergence by the finite focus lens 103A, and the stop 104
A, the cross-sectional beam shape is shaped into a predetermined shape, and the beam is reflected by the galvanomirror 105A toward a predetermined position in the first direction with respect to the reflecting surface of the deflecting device 123. This laser beam LA passes through the first half mirror 120.

The laser beam LB from the second laser element 101B is given a predetermined convergence by the finite focus lens 103B, and the sectional beam shape is shaped into a predetermined shape by the stop 104B. The light is reflected by the galvanomirror 105B toward the reflecting surface of the deflecting device 123 such that the distance in the sub-scanning direction becomes a predetermined distance. Note that the laser beam LB is reflected by the first half mirror 120 and is combined with the first laser beam LA.

The laser beam LC from the third laser element 101C is emitted from the laser element 101C so as to provide a predetermined beam interval in the sub-scanning direction with respect to the laser beam LB from the second laser element 101B. A predetermined convergence is given by the focusing lens 103C, and the aperture 104C
, The cross-sectional beam shape is adjusted to a predetermined shape, and is reflected by the galvanomirror 105C to form the second half mirror 1
Guided to 21. The laser beam LC guided to the half mirror 121 is reflected by the half mirror 121 and is combined with the laser beam L by the first half mirror 120.
(= LA + LB).

The laser beam LD from the fourth laser element 101D is emitted from the laser element 101D so as to provide a predetermined beam interval in the sub-scanning direction with respect to the laser beam LC from the third laser element 101C. A predetermined convergence is given by the focusing lens 103D, and the aperture 104D
, The cross-sectional beam shape is adjusted to a predetermined shape.
Guided to 22. The laser beam LD guided to the half mirror 122 is reflected by the half mirror 122 and further combined with the laser beam L (= LA + LB + 1C) combined by the second half mirror 121.

In this way, when viewed from the plane, one laser beam L (= LA + LB + LC + LD) having a predetermined interval in the sub-scanning direction is emitted from the pre-deflection optical system 10.
2 and are further converged only in the sub-scanning direction by the cylinder lens 125, and are emitted toward the reflecting surface of the deflecting device 123.

In this manner, four laser beams LA, LB, LC, and LD which are one when viewed from the plane direction and have a predetermined interval only in the sub-scanning direction.
Is one laser beam L (LA + LB + LC + LD)
Are simultaneously deflected (scanned) by the deflecting device 123 to form an image at a predetermined position on the photosensitive drum 23. Therefore, when the number of reflection surfaces and the number of rotations of the deflecting device 123 are the same as those in an ordinary one-line exposure exposure device, an image can be recorded at four times the speed in the sub-scanning direction.

The deflecting device 123 is, for example, a polygon mirror body 123 in which eight plane reflecting mirrors (reflecting surfaces) are arranged in a regular polygon.
A and the polygon mirror body 123A in the main scanning direction (second direction).
And a motor (not shown) that rotates at a predetermined speed.

Each reflecting surface of the deflecting device 123 moves in a predetermined direction between the deflecting device 123 and the image plane, that is, a position corresponding to the exposure position X on the outer periphery of the photosensitive drum 23 and at the designed focal plane. Deflected (scanned) laser beam (LA
+ LB + LC + LD) to give a predetermined optical property to the first
And a two-piece lens composed of the second imaging lenses 130A and 130B, an emission mirror 131 that collectively emits each laser beam toward the exposure position X, and a dust-proof airtightness between the multi-beam exposure apparatus 21 and the printer unit 20. Post-deflection optical system 130 including glass 132, post-deflection optical system 13
0, that the laser beams LA, LB, LC and LD of the laser beam L (= LA + LB + LC + LD) emitted from the second imaging lens 130B have reached a predetermined position before the area where an image is written. Beam position detector 151 for detecting the position (passing timing), second lens 130B of post-deflection optical system 130
And the four laser beams LA and L, which are disposed between the laser beam detector 151 and the second laser 130B.
Folding mirror 152 that reflects part of B, LC, and LD toward beam position detector 151, and a laser beam that is disposed between folding mirror 152 and beam position detector 151 and that is incident on beam position detector 151 L (= LA + LB + LC + LD), the laser beam L
Are arranged to provide a permutation corresponding to the respective emission wavelengths of the individual LA + LB + LC + LD.

The beam position detector 151 is an equivalent image surface whose light receiving surface, which will be described in detail later with reference to FIG. It is arranged at a position corresponding to the vicinity of the end of the drum 23.

Next, the galvanomirror will be described in detail. FIG. 4 is a perspective view of the galvanomirror. The mirror 160 is elastically supported by an elastic support so as to be displaceable by a small angle. The elastic support has a holding surface used to connect the support surface for supporting the mirror 160 and the yoke 161 as a frame, and two torsionally deformed portions (twisted torsion portions) for connecting the support surface and the holding surface. It is adhered to a leaf spring 162. That is, the mirror 160
Is rotatable in the direction of arrow R by twisting the torsion portion of the leaf spring 162 in a predetermined direction. The reflection surface, that is, the vapor deposition surface of the mirror 160 is defined on the side opposite to the side indicated by the leaf spring 162.

On the other hand, the galvanomirror 105A,
105B, 105C and 105D are each orthogonal to the sub-scanning direction, and in the plane including the main scanning direction, the angle of the reflection surface can be minutely changed with the axis of the main scanning direction as the rotation axis, and each of the laser elements 101A, 101B , 101C, and 101D, the distance in the sub-scanning direction between the laser beam L guided to the deflecting device 123, ie, the above-described LA + LB + LC + LD, can be set freely. That is, the position of the laser beam LA guided from the first laser element 101A to the deflecting device 123 in the sub-scanning direction is set by the first galvanomirror 105A, and the second to fourth lasers are set based on the laser beam LA. Beam LB, LC
And LD in the sub-scanning direction by setting the second to fourth galvanometer mirrors 105B, 10C and 105D.
The optimal setting can be achieved by adjusting the angle of the mirror.

More specifically, since the resolution of the exposure device 21, that is, the printing density is 600 DPI (dots per inch), the diameter of one dot on the photosensitive member 23 is 42.3.
μm, the distance between the first laser beam LA and the second laser beam LB on the image plane is 42.3 μm, similarly, the distance between the laser beams LA and LC is 84.6 μm, and the distance between the first laser beam LA and the second laser beam LB is 84.6 μm. The distance from the laser beam LD is 12
The galvanomirror 105B, 1 is set to 6.9 μm.
The angles of the mirrors 05C and 105D are set.

The angle of the mirror 160 of each of the galvanometer mirrors 105 B, 105 C, and 105 D is adjusted so that the laser beam L is applied to the photodetector (position sensor) 151 for detecting horizontal synchronization.
By detecting the position where (LA + LB + LC + LD) is incident, it is easily matched as shown below.

As shown in FIG. 7, the beam position detector 151 includes four light receiving units arranged on the same column in the scanning direction (vertical direction on the paper) and at an interval of about 42.3 μm in the sub-scanning direction. Area. In addition, each light receiving area is
As described below with reference to FIG. 8, the image is divided into two at the center in the sub-scanning direction.

The laser beam L is applied to the beam position detector 151.
Upon passing above, the detector 151, as shown in FIG.
It is detected whether the beam cross section of each of the laser beams LA, LB, LC and LD has passed through the center of the two divided regions or has passed in any one of the regions. Therefore, the angle of the mirror 160 of the galvanometer mirror 105 may be set so that the cross section of each laser beam passes through the center of each detection area. Note that the horizontal synchronizing signal is output at the timing when the reference laser beam LA is received in the first light receiving region, and the horizontal synchronizing signals of the remaining laser beams LB, LC, and LD are output after a lapse of a predetermined time from the laser beam LA. Is output.

The number of light receiving areas provided in the beam position detector 151 and the interval in the sub-scanning direction are determined by the exposure device 2
Needless to say, the number is set arbitrarily based on the number N of semiconductor laser elements incorporated in the device 1 and the resolution required for the exposure device 21 (image forming device 1).

For example, if the required resolution is 400 DPI
In this case, the interval between the light receiving regions in the sub-scanning direction is 63.5 μm. That is, assuming that the printing density is I and the number of laser beams (the number of semiconductor laser elements) is N, the number of light receiving regions to be provided in the beam position detector 151 is N, and the interval between the light receiving regions is 25.4. / Imm
Becomes

The beam position detector 151 is connected to the substrate 1
51A is arranged so as to be finely movable in each of the main scanning direction and the sub-scanning direction, and can be fixed at an optimum position by adjusting the position of the substrate 151A.

Next, each laser beam L (=) guided to the light receiving surfaces of the spectral prism 153 and the beam position detector 151
(LA + LB + LC + LD) will be described. As described with reference to FIG. 7, the beam position detector 151 is on the same column in the scanning direction and about 42.3 in the sub-scanning direction.
Four light receiving regions arranged at intervals of μm are provided.

The laser beam L incident on the beam position detector 151 is, as shown in FIG.
53, the laser beam L forming the laser beam L
Wavelengths of A, LB, LC and LD, that is, λ
_A = 640 nm, λ _B = 660 nm, λ _C = 680 nm, and λ _D = 700 nm. The light is separated in the main scanning direction in accordance with the difference in refractive index n, and the detectors 1 are arranged in ascending order of wavelength.
It is guided to the light receiving surface 51.

That is, the laser beams LA, LB, LC
And LD is the spectral prism 153 is given a different argument, each argument i _n, spectral prism apex angle alpha, splits the n prism refractive index, angle of incidence i ₀ by the spectral prism, to _{when, i n = i 0 -α +} sin -1 (nsin (sin -1 (si
as demonstrated by _{ni 0 / n) -α))} , the laser beam LA, LB, represents the wavelength by different sizes of the LC and LD, declination shorter laser beam wavelength is increased i _n.

The relationship between the refractive index n and the wavelength λ is A ₀
To when a constant depending on the type of the optical glass constituting the prism ^{_{A 5, n 2 = A 0}} + A 1 λ 2 + A 2 λ -2 + A 3 λ -4 + A 4 λ -6
+ A ₅ λ ^-8 .

Accordingly, each of the laser beams LA, L
The position at which the beam spot reaches depends on the wavelengths of B, LC, and LD. In the above-described embodiment, the beam is incident on the detector 151 in the order of LA, LB, LC, and LD, that is, in ascending order.

Since the relationship between the direction of the apex angle of the beam position detector 151 and the wavelengths of the laser beams LA, LB, LC and LD is constant, the direction of the beam position detector 151 in the sub-scanning direction and the By appropriately setting the length of the wavelength of the laser beam, the order of the laser beams guided to the photodetector 151 can be arbitrarily set.

Hereinafter, a method of synchronous detection of the beam detector 151 will be described. As shown in FIG. 9, the laser beam L (LA + LB + LC) guided to the spectral prism 153
+ LD) is largely refracted by the spectral prism 153 in order of decreasing wavelength, so that firstly, the laser beam LA
(Λ _A = 640 nm) is incident on the beam position detector 151.

The laser beam LA incident on the beam position detector 151 is photoelectrically converted by the detector 151 and
CPU 60 via the beam position detection circuit 74 shown in FIG.
Is entered.

Thus, after a lapse of a predetermined timing (time t from the detection of the laser beam to the generation of the image signal),
The first laser beam LA is modulated by an image signal (an image is written). A horizontal synchronization signal HS serving as a reference of an image start position.
YNC is output to the image memory 63. Hereinafter, the magnitude of the laser drive current supplied from the laser drive circuit 71A to the laser element 101A is changed based on the image data output from the image memory 63, and the intensity of the recording laser beam LA is modulated in accordance with the image data. Is the photosensitive drum 2
Irradiated at a predetermined position (position X shown in FIG. 1), an electrostatic latent image is formed on the photosensitive drum 23.

The second laser beam LB, the third laser beam LC,... Are successively incident on the beam position detector 151, and are successively incident on the beam position detector 151 in accordance with the order of each wavelength separated by the spectral prism 153. It is input to the CPU 60 via the beam position detection circuit 74. At this time, since each of the laser beams LB, LC,... Is divided by the spectral prism 153 in an optically conjugate relationship, each of the laser beams LB, LC,. The time t until signal generation is the same.

In other words, each laser beam includes a mechanical shift due to, for example, a shift of the optical axis until it enters the spectral prism 153, but is simultaneously formed by passing through the spectral prism.

Therefore, when the modulation of the laser beam by the image signal, that is, the writing of the image is started after a predetermined time t with respect to the laser beam LA first incident on the detector 151, the same applies to the laser beam subsequently incident. The modulation by the image signal, that is, the writing of the image may be started after a predetermined time t.

As a result, it is possible to prevent the above-described deviation of the incident position from deviating from the writing start position, thereby preventing the image quality from deteriorating. FIG. 10 shows another embodiment of the exposure apparatus shown in FIG. 2, which is compared with the first to fourth semiconductor laser elements 201A to 201D as light sources and the exposure apparatus shown in FIG. There is a spectral prism 253 arranged so that the direction of the apex angle is opposite in the sub-scanning direction.
In the exposure apparatus 221, the same components as those shown in FIG. 2 are denoted by the same reference numerals, and detailed description thereof will be omitted. Further, each of the laser elements 201A to 201D
Λ (A, B,
C and D) are respectively λ _A (LA) = 7 at room temperature.
00 ± 10 nm, λ _B (LB) = 680 ± 10 nm, λ _C
(LC) = 660 ± 10 nm and λ _D (LD) = 64
0 ± 10 nm.

[0082] According to the exposure apparatus shown in FIG. 10, the laser beam L is the spectral prism 253, a short laser beam LD wavelength, the LC, the argument i _n the order of magnitude of LB and LA are given When viewed from the photodetector 151, the laser beam LD having a shorter wavelength is later incident on the photodetector 151 than the laser beam LA having a longer wavelength, depending on the spectral pattern and the orientation of the prism 253 shown in FIG. Therefore, the laser beams LA, LB, LC, and LD are guided to the photodetector 151 in the descending order, that is, in the descending order.

FIG. 12 is a schematic plan view showing an example for a color printer different from the exposure apparatus shown in FIGS. Note that the same components as those shown in FIG. 2 or FIG. 10 are denoted by the same reference numerals, and detailed description thereof will be omitted.

The exposure device 321 shown in FIG. 12 corresponds to the separated color components of yellow (yellow, hereinafter referred to as Y), magenta (crimson, hereinafter referred to as M) and cyan (blue-violet, hereinafter referred to as C). First to sixth semiconductor laser elements 301YA and 30 that emit 2 × 3 sets of laser beams
1YB, 301MA, 301MB, 301CA and 3
01CB and black (black,
7 and 8, which emit two laser beams corresponding to the following (B).
1BB. Each of the semiconductor laser elements is provided with laser beams LYA and LYB, LMA and LMB, LMB having different emission wavelengths for each set corresponding to each color component.
It generates CA and LCB and LBA and LBB, and their wavelengths λ (Y, M, C and B) are
At room temperature, λ _Y (LY) = 660 ± 10 nm,
λ _M (LM) = 680 ± 10 nm, λ _C (LC) = 700
± 10 nm and λ _B (LB) = 640 ± 10 nm.

First to eighth semiconductor laser elements 301
YA, 301YB, 301MA, 301MB, 301C
A, laser beams LYA, LYB, LMA, LMB emitted from 301CB, 301BA and 301BB,
LCA, LCB, LBA and LBB are respectively provided corresponding finite focus lenses 303YA and 303Y.
B, 303MA, 303MB, 303CA, 303C
Apertures 305YA, 305YB, 305MA, 30 provided with predetermined convergence by B, 303BA, and 303BB and combined with respective finite focus lenses.
5MB, 305CA, 305CB, 305BA and 3
After a predetermined cross-sectional shape is given by 05BB, one laser beam L (a total of four) is provided for each color component by half mirrors 306Y, 306M, 306C and 306B.
It is synthesized into Y, LM, LC and LB.

The laser beams LY, LM, LC and LB combined into one for each color component are supplied to the cylinder lenses 125Y, 125M, 12
The beams are further converged in the sub-scanning direction by 5C and 125B, are collectively synthesized at a predetermined interval in the sub-scanning direction by the beam synthesizing mirror 327, and are guided to the deflection device 123 as a laser beam L.

The laser beam L is transmitted to the deflection device 123
Are collectively scanned in the main scanning direction by the polygon mirror 123A. Laser beam L scanned by deflection device 123
The first and second imaging lenses 130a and 130b increase the interval in the sub-scanning direction as compared with the position reflected by the polygon mirror 123A of the deflecting device 123, and increase the distance of the polygon mirror 123A of the deflecting device 123. A predetermined image forming characteristic is given so that the amount of rotation and the distance in the main scanning direction at the image forming position are proportional to each other, and four image forming units 350 as shown in FIG.
Mirrors 333B, 333Y, 335Y, 337Y, 333 for Y, 350M, 350C and 350B.
M, 335M, 337M, 333C, 335C and 3
Guided by 37C.

A part of the laser beam L scanned by the deflecting device 123 is reflected by the folding mirror 152 toward the beam position detector 151, and is divided by the spectral prism 153 into LB, LY, and LM according to the wavelength of the laser beam. And LC in the order given, the beam position detector 1
Guided to 51.

The laser beam LB incident on the beam position detector 151 is photoelectrically converted by the detector 151 and
In a signal processing unit (control circuit) (not shown) configured in the same manner as described above, after a predetermined timing (time t from the detection of the laser beam to the generation of the image signal), the first laser beam LB is modulated with the image signal. This is used to output a horizontal synchronization signal HSYNC as a reference for the image start position to be executed.

Hereinafter, in the color image forming apparatus shown in FIG. 13, each of the image forming units 350B, 350Y, 350
M and 350C photoconductor drums 358B, 358Y,
In each of 358M and 358C, first to fourth intensity-modulated corresponding to image data from an image memory (not shown) with reference to first laser beam LB first guided to beam position detector 151. The recording laser beams LB, LY, LM, and LC are reflected by the mirrors 333B, 333Y, 335Y, 337 of the exposure device 321 described above.
Y, 333M, 335M, 337M, 333C, 335
Irradiation is performed sequentially via C and 337C.

Thus, each photosensitive drum 35
8B, 358Y, 358M and 358C, electrostatic images are formed on the respective photosensitive drums which have been charged to a predetermined surface potential in advance by charging devices 360B, 360Y, 360M and 360C. Developing device 362 arranged corresponding to the photosensitive drum
The toner is supplied from B, 362Y, 362M, and 362C to form a total of four color toner images on each photosensitive drum.

Each photosensitive drum 358B, 358Y, 35
The toner images of four colors formed on 8M and 358C are pulled out of the cassette 370 by the paper feed roller 372,
The registration roller 374 sets the timing to a horizontal synchronization signal HSYNC generated based on the laser beam LB detected by the beam position detector 151, and sets the horizontal synchronization signal HSYNC at a predetermined position on the transport belt 352 by the suction roller 376. The transfer roller 364B, 364Y, 364M and 364C contacting the conveyed sheet P with the respective photosensitive drums from the opposite side of the conveyance belt 352, the Y toner image, the M toner image, the C toner image and the B toner image. Are used for superimposed output in the order of.

The four color toner images transferred to the sheet P are fixed on the sheet P by the fixing device 378. On the other hand, each photosensitive drum 358B, 358Y, 358M and 358
The transfer residual toner remaining in C is cleaned by a cleaning device 366.
B, 366Y, 366M and 366C. Further, each of the photosensitive drums 358B, 358Y, 358
The residual charges remaining on M and 358C are erased.

In the exposure apparatus shown in FIG.
The emission wavelength of the laser beam emitted from each set of semiconductor laser elements is set in the same manner as in the example described with reference to FIG.
Even if they are set in the reverse order and the direction of the apex angle of the prism 353 is arranged in the opposite direction, each of the laser beams LB, LY,
LM and LC can be detected in order.

[0095]

As described above, the exposure apparatus of the present invention detects a plurality of light beams which are collectively exposed by the photodetectors provided corresponding to the respective light beams, and detects the When obtaining a synchronization signal, it is possible to prevent a shift in the writing position of an image of each light beam due to a shift between the light beams and a shift between the photodetectors. That is,
By providing a spectral prism in front of the photodetector, each light beam is split into shorter and longer wavelengths, and synchronous detection is performed in that order, resulting in misalignment due to mechanical and electrical factors. Synchronization can be detected without any need. In this case, the timing of passing the lens with respect to the image signal of each light beam can be performed at the same time, and the influence on the image due to the synchronization detection shift can be minimized.

Therefore, the advanced position adjustment required for the semiconductor laser device for generating the light beam and the photodetector for detecting the light beam and outputting the horizontal synchronizing signal and the work time required for the adjustment are reduced. The manufacturing cost is reduced.

Further, it is possible to relax the tolerance of the precision of components such as a holding member for holding the semiconductor laser element, a supporting member for supporting the photodetector, and a housing to which the components are attached, and the cost of parts is reduced.

[Brief description of the drawings]

FIG. 1 is a schematic diagram illustrating an example of an image forming apparatus in which an exposure apparatus according to an embodiment of the present invention is incorporated.

FIG. 2 is a schematic plan view of an exposure device of the image forming apparatus shown in FIG.

FIG. 3 is a schematic view showing a light emitting unit (laser element) incorporated in the exposure apparatus shown in FIG.

FIG. 4 is a schematic diagram schematically showing a galvanomirror incorporated in the exposure apparatus shown in FIG. 2;

FIG. 5 is a schematic diagram showing an example of a pre-deflection optical system of the exposure apparatus shown in FIG.

FIG. 6 is a schematic block diagram showing an example of a control system of the exposure apparatus shown in FIG.

FIG. 7 is a schematic diagram showing an example of a light receiving surface of a beam position detector incorporated in the exposure apparatus shown in FIG.

FIG. 8 is a schematic diagram showing an example of one light receiving area of a light receiving surface of the beam position detector shown in FIG. 7;

9 is a schematic diagram illustrating the composition of the laser beam incident on the light receiving surface of the beam position detector shown in FIG. 7 and a state in which the laser beam is separated for each composition by the spectral prism.

FIG. 10 is a schematic plan view illustrating another embodiment of the exposure apparatus shown in FIG.

11 is a schematic diagram illustrating a state where a laser beam is separated for each composition by a spectral prism in the exposure apparatus shown in FIG.

FIG. 12 is a schematic plan view illustrating still another embodiment of the exposure apparatus shown in FIG.

FIG. 13 is a schematic diagram showing an example of a color image forming apparatus to which the exposure device shown in FIG. 12 is applied.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 ... Digital copier, 10 ... Scanner part, 11 ... 1st carriage, 14 ... Photoelectric conversion element, 20 ... Printer part, 21 ... Exposure device, 22 ... Image Forming unit, 23: photosensitive drum, 32: aligning roller, 60: CPU, 61: clock generation circuit, 62: NVM, 63: image memory, 64: Image bus, 71 (A, B, C, and D): laser drive circuit; 72 (A, B, C, and D): galvanometer mirror drive circuit; 73: polygon motor drive circuit; A beam position detection circuit, 81 ... an operation panel, 101 (A, B, C, and D) ... a semiconductor laser element, 102 ... a pre-deflection optical system, 102 (A, B, C, and D) ..Optical system before deflection, 1 03 (A, B, C, and D): a finite focus lens; 104 (A, B, C, and D): an aperture; 105 (A, B, C, and D): a galvanomirror, 110 ( A, B, C, and D): Light-emitting unit, 120: First half mirror, 121: Second half mirror, 122: Third half mirror, 123: Deflection device , 125 ... cylinder lens, 130 ... post-deflection optical system, 130A ... first lens, 130B ... second lens, 131 ... mirror 132 ... dustproof glass, 151 ... beam Position detector, 152 ... folding mirror, 153 ... spectral prism.

Claims (9)

[Claims] 1. A plurality of light sources that emit light of different wavelengths from each other, a first optical system that converts light emitted from each of the plurality of light sources into parallel light or converged light, and passing through the optical system. A deflecting device for deflecting the deflected light, a second optical system for forming an image of the light deflected by the deflecting device at a predetermined position, and a wavelength of each of the light passing through the second optical system. An exposure apparatus, comprising: a separation optical system that emits light at a timing according to the following; and a photoelectric conversion device that sequentially detects light separated by the separation optical system and performs photoelectric conversion. 2. A plurality of light sources that emit light having different wavelengths from each other, a first optical system that converts light emitted from each of the plurality of light sources into parallel light or convergent light, and passing through the optical system. A deflecting device that deflects the deflected light in a first direction, a second optical system that forms an image of the light deflected by the deflecting device at a predetermined position, and a light that has passed through the second optical system. With respect to the first direction, a separation optical system that emits light at a timing of a predetermined time difference according to the wavelength of each light, a photoelectric conversion device that sequentially detects light separated by the separation optical system and performs photoelectric conversion, An exposure apparatus comprising: 3. A plurality of light sources that emit light of different wavelengths from each other, a first optical system that converts light emitted from each of the plurality of light sources into parallel light or focused light, and passing through the optical system. A deflecting device that deflects the deflected light in a first direction, a second optical system that forms an image of the light deflected by the deflecting device at a predetermined position, and a light that has passed through the second optical system. In the first direction, a separation optical system that emits light at a timing of a predetermined time difference according to an ascending order or a descending order of the wavelength of each light, and a photoelectric device that sequentially detects light separated by the separation optical system and performs photoelectric conversion. An exposure apparatus, comprising: a conversion device. 4. A plurality of light sources for emitting light having different wavelengths from each other, a first optical system for converting light emitted from each of the plurality of light sources into parallel light or convergent light, and passing through the optical system. A deflecting device that deflects the deflected light in a first direction, a second optical system that forms an image of the light deflected by the deflecting device at a predetermined position, and a light that has passed through the second optical system. In the first direction, a separation optical system that emits light at a timing of a predetermined time difference according to an ascending order or a descending order of the wavelength of each light, and a photoelectric device that sequentially detects light separated by the separation optical system and performs photoelectric conversion. An exposure apparatus, comprising: a conversion device; and an image output device that applies an image signal to each of the plurality of light sources at a predetermined timing based on an output from the photoelectric conversion device. 5. A plurality of light sources for emitting light having different wavelengths from each other, a first optical system for converting light emitted from each of the plurality of light sources into parallel light or convergent light, and passing through the optical system. A deflecting device that deflects the deflected light in a first direction, a second optical system that forms an image of the light deflected by the deflecting device at a predetermined position, and a light that has passed through the second optical system. A spectral prism that splits and emits light in the ascending or descending order of the wavelength of each light in the first direction, and a photoelectric conversion that sequentially detects and separates light separated by the spectral prism based on a wavelength difference. An exposure apparatus comprising: a device; and an image output device that applies an image signal to each of the plurality of light sources at a predetermined timing based on an output from the photoelectric conversion device. 6. A first light source that emits light of a first wavelength, a second light source that emits light of a second wavelength different from the wavelength of light from the first light source, and the first light source. Light from the light source and light from the second light source,
A deflecting device for deflecting in a first direction, disposed between the deflecting device and the respective light sources,
The light emitted from each of the light sources is directed in a first direction,
A first optical device group that is superimposed so as to be one light when viewed from a plane direction and at a predetermined interval in a second direction orthogonal to the first direction; A second optical device group that forms the respective lights deflected by the device at predetermined positions corresponding to the magnitude of the deflection by the deflecting device; and the respective optical devices that have passed through the second optical device group. A separation device that separates light at a predetermined timing in the first direction based on the wavelength of each of the light, and a photoelectric conversion device that sequentially detects the light separated by the separation device and performs photoelectric conversion. An exposure apparatus comprising: 7. An exposure apparatus according to claim 6, wherein said separation device is a spectral prism whose apex angle is directed in said first direction. 8. The photoelectric conversion device according to claim 1, wherein:
7. The ink jet recording apparatus according to claim 6, wherein the light emitting elements are arranged at predetermined intervals.
Exposure apparatus according to the above. 9. A first light source that emits light of a first wavelength, a second light source that emits light of a second wavelength different from the wavelength of light from the first light source, and the first light source. Light from the light source and light from the second light source,
A deflecting device for deflecting in a first direction, disposed between the deflecting device and the respective light sources,
The light emitted from each of the light sources is directed in a first direction,
A first optical device group that is superimposed so as to be one light when viewed from a plane direction and at a predetermined interval in a second direction orthogonal to the first direction; A second optical device group that forms the respective lights deflected by the device at predetermined positions corresponding to the magnitude of the deflection by the deflecting device; and the respective optical devices that have passed through the second optical device group. A separation device that separates light at a predetermined timing in the first direction based on the wavelength of each of the light, and a photoelectric conversion device that sequentially detects the light separated by the separation device and performs photoelectric conversion. An exposure apparatus, comprising: an image output device that applies an image signal to each of the plurality of light sources at a predetermined timing based on an output from the photoelectric conversion device.