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JPH11236448A - Polyimide film and manufacturing method thereof - Google Patents

Polyimide film and manufacturing method thereof

Info

Publication number
JPH11236448A
JPH11236448A JP4185798A JP4185798A JPH11236448A JP H11236448 A JPH11236448 A JP H11236448A JP 4185798 A JP4185798 A JP 4185798A JP 4185798 A JP4185798 A JP 4185798A JP H11236448 A JPH11236448 A JP H11236448A
Authority
JP
Japan
Prior art keywords
polyimide film
polyamic acid
film
solution
general formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4185798A
Other languages
Japanese (ja)
Other versions
JP3676073B2 (en
Inventor
Shigeru Tanaka
田中  滋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kanegafuchi Chemical Industry Co Ltd
Original Assignee
Kanegafuchi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kanegafuchi Chemical Industry Co Ltd filed Critical Kanegafuchi Chemical Industry Co Ltd
Priority to JP4185798A priority Critical patent/JP3676073B2/en
Publication of JPH11236448A publication Critical patent/JPH11236448A/en
Application granted granted Critical
Publication of JP3676073B2 publication Critical patent/JP3676073B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/032Organic insulating material consisting of one material
    • H05K1/0346Organic insulating material consisting of one material containing N

Landscapes

  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)

Abstract

(57)【要約】 【課題】 耐熱性に優れ、また、高い弾性率等の優れた
機械的特性や低吸水性をあわせ有するポリイミドフィル
ムとその製造方法を提供することを目的とする。 【解決手段】 一般式(1) 【化1】 (但し、式中、R1は、 【化2】 (RZはH、CH3,Cl、Brから選択される少なくと
も1種、Zは0〜4の整数を表す。)で表される有機基
から選択される少なくとも1種、R2は 【化3】 (Rm、RnはH、CH3、Cl、Brから選択される少
なくとも1種、Zは0〜4の整数を表す。)で表される
有機基から選択される少なくとも1種示す。)で表され
る繰り返し単位を含有してなるポリイミドフィルムとそ
のとその製造方法を提供する。
(57) [Problem] To provide a polyimide film having excellent heat resistance, excellent mechanical properties such as high elastic modulus, and low water absorption, and a method for producing the same. SOLUTION: General formula (1) (Wherein, R1 is: (R Z is at least one selected from H, CH 3 , Cl, and Br, Z is an integer of 0 to 4), and R 2 is at least one selected from the group consisting of ] (R m and R n are at least one selected from H, CH 3 , Cl, and Br, and Z is an integer of 0 to 4). The present invention provides a polyimide film containing a repeating unit represented by the formula (1), and a method for producing the same.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、弾性率に代表され
る機械的特性に優れ、更に低吸水性や耐熱性に優れた新
規なポリイミドフィルムとその製造方法に関するもので
ある。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a novel polyimide film having excellent mechanical properties such as elasticity, low water absorption and heat resistance, and a method for producing the same.

【0002】[0002]

【従来の技術】従来、ポリイミドフィルムとして、ピロ
メリット酸二無水物と4,4’−ジアノジフェニルエ−
テルからなるポリイミドや3,3’,4,4’−ビフェ
ニルテトラカルボン酸二無水物とパラフェニレンジアミ
ンからなるポリイミドが広く用いられており、特にその
優れた耐熱性と電気絶縁特性によりフレキシブルプリン
ト配線板(以下、FPC)や半導体装置におけるリ−ド
オンチップ(LOC)テ−プ用ベ−スフィルム等の電子
材料として多く利用いられている。更に、ポリイミドフ
ィルムは、耐放射線性や極低温特性にも優れることか
ら、航空機材料、宇宙材料用途等にも多く利用されてい
る。
2. Description of the Related Art Conventionally, as a polyimide film, pyromellitic dianhydride and 4,4'-dianodiphenyl ether
Polyimides made of tellurium and polyimides made of 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride and paraphenylenediamine are widely used. In particular, flexible printed wiring is used due to its excellent heat resistance and electrical insulation properties. It is widely used as an electronic material such as a board (hereinafter, FPC) or a base film for a lead-on-chip (LOC) tape in a semiconductor device. Furthermore, polyimide films have excellent radiation resistance and cryogenic characteristics, and are therefore often used in aircraft materials, space materials, and the like.

【0003】[0003]

【発明が解決しようとする課題】近年、コンピュ−タや
携帯電話等の電子機器の小型化、薄型化、軽量化に伴っ
てそれらに用いられる電子部品の小型化、薄型化、軽量
化が強く求められるようになってきた。そのため、電子
部品の材料として、ポリイミドフィルムに対しても厚み
が10ミクロン以下という極めて薄いフィルムが求めら
れてきている。しかしながら、従来のポリイミドフィル
ムでは、弾性率が不十分であり薄手化が困難になりつつ
あった。また、高耐熱性、高弾性率が要求される薄型の
高密度磁気記録テ−プ用ベ−スフィルムにも使用でき
ず、高弾性率のポリイミドフィルムへの要求が高まりつ
つあった。
In recent years, as electronic devices such as computers and mobile phones have become smaller, thinner, and lighter, electronic components used in them have become increasingly smaller, thinner, and lighter. It has become required. Therefore, as a material for electronic parts, a very thin film having a thickness of 10 μm or less has been required for a polyimide film. However, a conventional polyimide film has an insufficient elastic modulus and is becoming difficult to be thin. Further, it cannot be used as a thin base film for high-density magnetic recording tape requiring high heat resistance and high elastic modulus, and a demand for a polyimide film having high elastic modulus has been increasing.

【0004】弾性率が1000kg/mm2を超える高
弾性率ポリイミドフィルムとして、4,4’−ジアミノ
ベンズアニリドをジアミン成分、ピロメリット酸または
3,3’,4,4’−ビフェニルテトラカルボン酸二無
水物等の酸二無水物とを用いたポリイミドフィルムが提
案されている。(特開昭62−280224)しかしな
がら、ジアミノベンズアニリドは極性の高いアミド基を
有するため、得られるポリイミドフィルムの吸水率が高
くなってしまうという問題を有していた。
As a polyimide film having a high elastic modulus exceeding 1000 kg / mm 2, 4,4′-diaminobenzanilide is composed of a diamine component, pyromellitic acid or 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride. A polyimide film using an acid dianhydride such as a product has been proposed. However, since diaminobenzanilide has a highly polar amide group, it has a problem that the polyimide film obtained has a high water absorption.

【0005】ポリイミドフィルムの吸水率が高いと吸湿
寸法安定性に劣り、また半導体装置を製造する際、封止
工程時にフィルムが吸収していた多量の水分を一気に放
出することによってパッケ−ジクラックを発生させてし
まう等加工性や信頼性の点で問題となる。そこで本発明
者らは、かかる実状に鑑み、従来の問題点を解決し、耐
熱性に優れ、また、高い弾性率等の優れた機械的特性や
低吸水性をあわせ有するポリイミドフィルムを提供する
ことを目的に鋭意検討を重ねた結果、本発明に至ったの
である。
[0005] If the water absorption of the polyimide film is high, the dimensional stability of moisture absorption is inferior. In the manufacture of a semiconductor device, a large amount of water absorbed by the film at the time of the encapsulation step is released at a stretch to cause package cracks. It causes problems in terms of processability and reliability. In view of the above circumstances, the present inventors have solved the conventional problems and provided a polyimide film having excellent heat resistance and excellent mechanical properties such as a high elastic modulus and low water absorption. As a result of diligent studies for the purpose of the present invention, the present invention has been reached.

【0006】[0006]

【課題を解決するための手段】本発明にかかるポリイミ
ドフィルムの要旨とするところは、一般式(1)
The gist of the polyimide film according to the present invention is that of the general formula (1)

【0007】[0007]

【化4】 Embedded image

【0008】(但し、式中、R1は、(Where R1 is:

【0009】[0009]

【化5】 Embedded image

【0010】(RZはH、CH3、Cl、Brから選択さ
れる少なくとも1種、Zは0〜4の整数を表す。)で表
される有機基から選択される少なくとも1種、R2は、
(R Z is at least one selected from H, CH 3 , Cl, and Br, Z is an integer of 0 to 4), and R 2 is at least one selected from an organic group represented by ,

【0011】[0011]

【化6】 Embedded image

【0012】(Rm、RnはH、CH3、Cl、Brから
選択される少なくとも1種、Zは0〜4の整数を表
す。)で表される有機基から選択される少なくとも1種
示す。)で表される繰り返し単位を含有してなる、弾性
率が1000kg/mm2以上を有し、かつ吸水率が
1.5%以下を併せ有することにある(請求項1)。本
発明にかかるポリイミドフィルムの製造方法の要旨とす
るところは、テトラカルボン酸二無水物類とジアミン類
との重縮合反応によって得られるポリイミドフィルムの
前駆体であるポリアミド酸の溶液から流延法にて請求項
1に記載するポリイミドフィルムを製造する方法におい
て、前記ポリアミド酸の重量平均分子量が15万以上で
あることにある(請求項2)。
(R m and R n are at least one kind selected from H, CH 3 , Cl and Br, and Z is an integer of 0 to 4). Show. ), Which has a modulus of 1000 kg / mm2 or more and a water absorption of 1.5% or less (claim 1). The gist of the method for producing a polyimide film according to the present invention is to cast a solution of a polyamic acid that is a precursor of a polyimide film obtained by a polycondensation reaction between tetracarboxylic dianhydrides and diamines. In the method for producing a polyimide film according to claim 1, the weight average molecular weight of the polyamic acid is 150,000 or more (claim 2).

【0013】[0013]

【発明の実施の形態】以下、本発明にかかるポリイミド
フィルムの実施形態の1例について説明する。本発明の
ポリイミドフィルムは、一般式(A)
BEST MODE FOR CARRYING OUT THE INVENTION One embodiment of a polyimide film according to the present invention will be described below. The polyimide film of the present invention has the general formula (A)

【0014】[0014]

【化7】 Embedded image

【0015】(式中R1は、一般式(1)におけるR1
と同じ2価の有機基を示す。)で表されるエステル基を
含むテトラカルボン酸二無水物及び一般式(B) H2N−R2−NH2 (B) (式中R2は、一般式(1)におけるR2と同じ2価の
有機基を示す。)で表される芳香族ジアミンを原料とし
て得ることができる。
(Wherein R1 represents R1 in the general formula (1))
And the same divalent organic group as described above. And a tetracarboxylic dianhydride containing an ester group represented by the following general formula (B): H 2 N—R 2 —NH 2 (B) wherein R 2 is the same divalent as R 2 in the general formula (1). An aromatic diamine represented by the following formula: can be obtained as a raw material.

【0016】一般式(A)で表されるテトラカルボン酸
二無水物の最も代表的な例としては、1,4−ヒドロキ
ノンジベンゾエ−ト−3,3’,4,4’−テトラカル
ボン酸二無水物、2,5−ジメチル−1,4−ヒドロキ
ノンジベンゾエ−ト−3,3’,4,4’−テトラカル
ボン酸二無水物、2,5−ジクロロ−1,4−ヒドロキ
ノンジベンゾエ−ト−3,3’,4,4’−テトラカル
ボン酸二無水物、2−クロロ−1,4−ヒドロキノンジ
ベンゾエ−ト−3,3’,4,4’−テトラカルボン酸
二無水物等が挙げられ、1種または2種以上混合して用
いることもできる。
The most typical example of the tetracarboxylic dianhydride represented by the general formula (A) is 1,4-hydroquinone dibenzoate-3,3 ', 4,4'-tetracarboxylic acid. Dianhydride, 2,5-dimethyl-1,4-hydroquinone dibenzoate-3,3 ', 4,4'-tetracarboxylic dianhydride, 2,5-dichloro-1,4-hydroquinone dibenzoe -To-3,3 ', 4,4'-tetracarboxylic dianhydride, 2-chloro-1,4-hydroquinone dibenzoate-3,3', 4,4'-tetracarboxylic dianhydride And the like, and one kind or a mixture of two or more kinds can also be used.

【0017】ここで、一般式(A)で表されるテトラカ
ルボン酸二無水物は、トリメリット酸無水物モノクロラ
イドと2価フェノ−ル類とを室温以下で反応させる方
法、あるいは、トリメリット酸無水物と2価フェノ−ル
類のジメチルエステルとを200〜300℃の高温で反
応させる方法によって合成され得る。また、上記の原料
となる2価フェノ−ル類としては、ハイドロキノン、2
−クロロハイドロキノン、2,5−ジクロロハイドロキ
ノン、2,3,5,6−テトラクロロハイドロキノン、
2,5−ジメチルハイドロキノン等が挙げられる。
The tetracarboxylic dianhydride represented by the general formula (A) is prepared by reacting trimellitic anhydride monochloride with divalent phenols at room temperature or lower, or It can be synthesized by a method in which an acid anhydride and a dimethyl ester of a dihydric phenol are reacted at a high temperature of 200 to 300 ° C. The divalent phenols used as the raw materials include hydroquinone,
-Chlorohydroquinone, 2,5-dichlorohydroquinone, 2,3,5,6-tetrachlorohydroquinone,
2,5-dimethylhydroquinone and the like.

【0018】次に一般式(B)で表されるジアミンの代
表例としては、4,4’−ジアミノベンズアニリド、
4、4’−ジアミノ−3,3’−ジクロロベンズアニリ
ド、1,4−ビス(4−アミノフェニルカルバモイル)
ベンゼン等が挙げられ、1種または2種以上混合して用
いることができる。一般式(1)で表される繰り返し単
位は、全繰り返し単位中50モル%以上、好ましくは7
0モル%以上、さらに好ましくは、90モル%以上含有
することが必要である。
Next, typical examples of the diamine represented by the general formula (B) include 4,4'-diaminobenzanilide,
4,4'-diamino-3,3'-dichlorobenzanilide, 1,4-bis (4-aminophenylcarbamoyl)
Benzene and the like can be mentioned, and one kind or a mixture of two or more kinds can be used. The repeating unit represented by the general formula (1) accounts for at least 50 mol%, preferably 7 mol%, of all repeating units.
It is necessary to contain 0 mol% or more, more preferably 90 mol% or more.

【0019】一般式(1)で表される繰り返し単位の含
有率が50%以下であると、高弾性率と低吸水率を併せ
有するフィルムを得ることが困難である。本発明のポリ
イミドフィルムは、一般式(1)で表される繰り返し単
位の全繰り返し単位中の含有形式に限定されない。即
ち、ランダム共重合体であってもよいし、交互共重合体
であってもよい。特に、一般式(1)のくり返し単位が
存在するセグメントの長さが重合体分子内において一定
である部分を20モル%以上、好ましくは50モル%以
上有する共重合体が機械的強度上好ましい。
When the content of the repeating unit represented by the general formula (1) is 50% or less, it is difficult to obtain a film having both a high elastic modulus and a low water absorption. The polyimide film of the present invention is not limited to the content form of the repeating unit represented by the general formula (1) in all the repeating units. That is, the copolymer may be a random copolymer or an alternating copolymer. In particular, a copolymer having at least 20 mol%, preferably at least 50 mol% of a segment in which the length of the segment where the repeating unit of the general formula (1) is present in the polymer molecule is preferable in terms of mechanical strength.

【0020】上記のように製造される一般式(1)で表
されるくり返し単位を含有するポリイミドフィルムは、
1000kg/mm2以上の弾性率と1.5%以下の吸
水率を併せ有することができる。次に、本発明にかかる
ポリイミドフィルムの製造方法について、具体的に説明
する。
The polyimide film containing the repeating unit represented by the general formula (1) produced as described above,
It can have an elastic modulus of 1000 kg / mm2 or more and a water absorption of 1.5% or less. Next, the method for producing a polyimide film according to the present invention will be specifically described.

【0021】本発明のポリイミドフィルムは、その前駆
体である一般式(2)
The polyimide film of the present invention has a precursor represented by the general formula (2)

【0022】[0022]

【化8】 Embedded image

【0023】(式中R1、R2は、一般式(1)におけ
るR1、R2と同じ有機基である。)で表されるポリア
ミド酸溶液から得られるが、このポリアミド酸溶液は公
知の方法で製造することができる。即ちテトラカルボン
酸二無水物類と芳香族ジアミン類を実質等モル使用し有
機極性溶媒中で重合して得られる。ポリアミド酸溶液を
得るのに用いるテトラカルボン酸二無水物類としては、
1,4−ヒドロキノンジベンゾエ−ト−3,3’,4,
4’−テトラカルボン酸二無水物、2,5−ジメチル−
1,4−ヒドロキノンジベンゾエ−ト−3,3’,4,
4’−テトラカルボン酸二無水物、2,5−ジクロロ−
1,4−ヒドロキノンジベンゾエ−ト−3,3’,4,
4’−テトラカルボン酸二無水物、2−クロロ−1,4
−ヒドロキノンジベンゾエ−ト−3,3’,4,4’−
テトラカルボン酸二無水物等が挙げられ、1種または2
種以上混合して用いることもできる。
(Wherein R1 and R2 are the same organic groups as R1 and R2 in the general formula (1)). The polyamic acid solution is prepared by a known method. can do. That is, it is obtained by polymerizing tetracarboxylic dianhydrides and aromatic diamines in an organic polar solvent using substantially equimolar amounts. Tetracarboxylic dianhydrides used to obtain a polyamic acid solution include:
1,4-hydroquinone dibenzoate-3,3 ', 4
4'-tetracarboxylic dianhydride, 2,5-dimethyl-
1,4-hydroquinone dibenzoate-3,3 ', 4
4'-tetracarboxylic dianhydride, 2,5-dichloro-
1,4-hydroquinone dibenzoate-3,3 ', 4
4'-tetracarboxylic dianhydride, 2-chloro-1,4
-Hydroquinone dibenzoate-3,3 ', 4,4'-
Tetracarboxylic dianhydride and the like;
A mixture of two or more species can be used.

【0024】また、一般式(A)で表されるテトラカル
ボン酸二無水物とその他のテトラカルボン酸二無水物類
を1種以上混合して用いることもできる。その他のテト
ラカルボン酸二無水物類としては、3,3’,4,4’
−ジフェニルエ−テルテトラカルボン酸二無水物、3,
3’,4,4’−ビフェニルテトラカルボン酸二無水
物、ピロメリット酸二無水物、3,3’,4,4’−ベ
ンゾフェノンテトラカルボン酸二無水物等が挙げられ
る。
Further, one or more kinds of the tetracarboxylic dianhydride represented by the general formula (A) and other tetracarboxylic dianhydrides may be mixed and used. Other tetracarboxylic dianhydrides include 3,3 ′, 4,4 ′
-Diphenyl ether tetracarboxylic dianhydride, 3,
3 ', 4,4'-biphenyltetracarboxylic dianhydride, pyromellitic dianhydride, 3,3', 4,4'-benzophenonetetracarboxylic dianhydride and the like can be mentioned.

【0025】一般式(A)で表されるテトラカルボン酸
二無水物類と、その他の酸二無水物類を混合して用いる
場合、低吸水性の点で一般式(A)で表されるエステル
基を有するテトラカルボン酸二無水物類を主成分とする
ことが好ましい。エステル基含有のテトラカルボン酸二
無水物類を用いたポリイミドフィルムの低吸水性につい
ては、そのメカニズムは明らかになっていないが、電子
吸引性の基であるエステル基がイミド基の分極を弱めて
いるからであると推測している。
When the tetracarboxylic dianhydride represented by the general formula (A) is mixed with other acid dianhydrides, the mixture is represented by the general formula (A) in terms of low water absorption. It is preferable to use a tetracarboxylic dianhydride having an ester group as a main component. The mechanism of low water absorption of polyimide films using tetracarboxylic dianhydrides containing ester groups is not clear, but the ester groups, which are electron-withdrawing groups, weaken the polarization of imide groups. I guess it is.

【0026】芳香族ジアミン類としては、4,4’−ジ
アミノベンズアニリド、4,4’−ジアミノ−3,3’
−ジクロロベンズアニリド、1,4−ビス(4−アミノ
フェニルカルバモイル)ベンゼン等が挙げられ、1種ま
たは2種以上混合して用いることができる。一般式
(B)で表されるジアミン類とその他のジアミン類を1
種類以上混合して用いることもできる。その他のジアミ
ン類としては、パラフェニレンジアミン、2−クロロパ
ラフェニレンジアミン、2,5−ジクロロパラフェニレ
ンジアミン、4,4’−ジアミノ−2,2’−ジメチル
ビフェニル、4,4’−ジアミノ−2,2’−ジクロロ
ビフェニル、4,4’−ジアミノジフェニルエ−テル類
などが挙げられる。特に高弾性率の点から、屈曲性の基
が少なくかつ置換基のない4,4’−ジアミノベンズア
ニリドを主成分とすることが好ましい。
As aromatic diamines, 4,4'-diaminobenzanilide, 4,4'-diamino-3,3 '
-Dichlorobenzanilide, 1,4-bis (4-aminophenylcarbamoyl) benzene, and the like, and these can be used alone or in combination of two or more. Diamines represented by the general formula (B) and other diamines
More than one kind can be mixed and used. Other diamines include paraphenylenediamine, 2-chloroparaphenylenediamine, 2,5-dichloroparaphenylenediamine, 4,4′-diamino-2,2′-dimethylbiphenyl, and 4,4′-diamino-2. , 2'-dichlorobiphenyl, 4,4'-diaminodiphenyl ethers and the like. Particularly, from the viewpoint of a high elastic modulus, it is preferable that 4,4′-diaminobenzanilide having few flexible groups and having no substituent is a main component.

【0027】ここで、該ポリアミド酸の生成反応に使用
される有機溶剤としては、ジメチルスルホキシド、ジエ
チルスルホキシド等のスルホキシド系溶媒、N,N−ジ
メチルホルムアミド、N,N−ジエチルホルムアミド等
のホルムアミド系溶媒、N,N−ジメチルアセトアミ
ド、N,N−ジエチルアセトアミド等のアセトアミド系
溶媒、N−メチル−2−ピロリドン、N−ビニル−2−
ピロリドン等のピロリドン系溶媒、フェノ−ル、o−,
m−,またはp−クレゾ−ル等のフェノ−ル系溶媒等を
挙げることができ、これらを単独または混合物として用
いるのが望ましいが、更にキシレン、トルエンのような
芳香族炭化水素の使用も可能である。また、このポリア
ミド酸は、前記の有機極性溶媒中に1〜40重量%、好
ましくは5〜25重量%溶解されているのが取り扱いの
面からも望ましい。
The organic solvent used in the polyamic acid formation reaction includes sulfoxide solvents such as dimethyl sulfoxide and diethyl sulfoxide, and formamide solvents such as N, N-dimethylformamide and N, N-diethylformamide. , Acetamide solvents such as N, N-dimethylacetamide, N, N-diethylacetamide, N-methyl-2-pyrrolidone, N-vinyl-2-
Pyrrolidone solvents such as pyrrolidone, phenol, o-,
Phenol-based solvents such as m- or p-cresol can be mentioned, and it is desirable to use these alone or as a mixture, but it is also possible to use aromatic hydrocarbons such as xylene and toluene. It is. It is desirable from the viewpoint of handling that the polyamic acid is dissolved in the organic polar solvent in an amount of 1 to 40% by weight, preferably 5 to 25% by weight.

【0028】ポリアミド酸の重合においてポリアミド酸
の重量平均分子量は、15万以上が好ましく、20万以
上が更に好ましい。重量平均分子量が15万以下である
と、強度に劣るポリイミドフィルムが得られるからであ
る。このポリアミド酸溶液から本発明のポリイミドフィ
ルムを得るには、(1)熱的に脱水しイミド化する熱的
方法と(2)脱水剤を用いる化学的方法のいずれを用い
てもよいが、伸びや強度などの機械的特性の優れるフィ
ルムを得やすい化学的方法による方がより好ましい。
In the polymerization of polyamic acid, the weight average molecular weight of the polyamic acid is preferably 150,000 or more, more preferably 200,000 or more. When the weight average molecular weight is 150,000 or less, a polyimide film having poor strength can be obtained. In order to obtain the polyimide film of the present invention from the polyamic acid solution, any of (1) a thermal method of thermally dehydrating and imidizing and (2) a chemical method using a dehydrating agent may be used. It is more preferable to use a chemical method that makes it easy to obtain a film having excellent mechanical properties such as strength and strength.

【0029】以下に、ポリアミド酸溶液からフィルムを
製造する方法を例示する。(1)上記ポリアミド酸溶液
をドラムあるいはエンドレスベルト上に流延または塗布
して膜状とし、その膜を自己支持性を有するまで150
℃以下の温度で約5分〜60分乾燥させる。ついで、こ
れを支持体から引き剥がし端部を固定した後、膜の収縮
を制限しながら約100℃〜500℃のまで徐々に加熱
することにより乾燥及びイミド化し、冷却後これより取
り外し本発明のポリイミドフィルムを得る。
The following is an example of a method for producing a film from a polyamic acid solution. (1) The above polyamic acid solution is cast or coated on a drum or an endless belt to form a film, and the film is formed into a film until it has a self-supporting property.
Dry at a temperature below ℃ for about 5-60 minutes. Then, after peeling it off from the support and fixing the end, the film is dried and imidized by gradually heating to about 100 ° C. to 500 ° C. while restricting the shrinkage of the film, and after cooling, it is removed therefrom. Obtain a polyimide film.

【0030】上記製造方法において、自己支持性を有す
るフィルムを支持体から剥がれやすくするためにポリア
ミド酸溶液にかえてポリアミド酸溶液に剥離剤を加えた
混合溶液を用いてもよい。また、化学的方法によりポリ
イミドフィルムを得る場合は、ポリアミド酸溶液にかえ
て、ポリアミド酸溶液に化学量論以上の脱水剤と触媒量
の3級アミン類を加えた混合溶液を用いればよい。
In the above production method, a mixed solution of a polyamic acid solution and a release agent may be used in place of the polyamic acid solution in order to easily peel the self-supporting film from the support. When a polyimide film is obtained by a chemical method, a mixed solution of a polyamic acid solution and a dehydrating agent having a stoichiometric amount or more and a catalytic amount of a tertiary amine may be used instead of the polyamic acid solution.

【0031】ここで言う剥離剤としては、例えばジエチ
レングリコ−ルジメチルエ−テル、トリエチレングリコ
−ルジメチルエ−テル等の脂肪族エ−テル類、ピリジ
ン、ピコリンなどの3級アミン類、トリフェニルホスフ
ィン、トリフェニルホスフェ−ト等の有機りん化合物類
等が挙げられる。また、脱水剤としては、例えば無水酢
酸、無水フタル酸などの脂肪族あるいは芳香族酸無水物
類等が挙げられる。触媒としては、例えばトリエチルア
ミンなどの脂肪族3級アミン、ピリジン、ピコリン、イ
ソキノリン等の複素環式3級アミン類などが挙げられ
る。
Examples of the releasing agent include aliphatic ethers such as diethylene glycol dimethyl ether and triethylene glycol dimethyl ether, tertiary amines such as pyridine and picoline, triphenylphosphine and triphenyl. Organic phosphorus compounds such as phosphates are exemplified. Examples of the dehydrating agent include aliphatic or aromatic acid anhydrides such as acetic anhydride and phthalic anhydride. Examples of the catalyst include aliphatic tertiary amines such as triethylamine, and heterocyclic tertiary amines such as pyridine, picoline and isoquinoline.

【0032】更に、フィルムを乾燥またはイミド化させ
る際に、延伸してもよい。延伸することにより機械的特
性に優れるフィルムを得やすいからである。また、フィ
ルムに接着性や耐熱性、または滑り性等の各種特性を向
上させることを目的に、フィルム中に、酸化チタン、炭
酸カルシウム、アルミナ、シリカゲル等の微粒子を含有
させたり、フィルム表面を、シランカップリング剤など
の表面改質剤や微粒子とバインダ−樹脂を含む溶液等を
塗布したり、コロナ処理やプラズマ処理などの放電処理
などを施してもよい。
Further, when the film is dried or imidized, it may be stretched. This is because a film having excellent mechanical properties can be easily obtained by stretching. Also, for the purpose of improving various properties such as adhesiveness, heat resistance, or slipperiness of the film, the film contains fine particles such as titanium oxide, calcium carbonate, alumina, and silica gel, A surface modifier such as a silane coupling agent or a solution containing fine particles and a binder resin may be applied, or a discharge treatment such as a corona treatment or a plasma treatment may be performed.

【0033】以上、本発明にかかるポリイミドフィルム
について、製造方法も含め説明したが、本発明は、これ
らの実施の形態のみに限定されるものではなく、その趣
旨を逸脱しない範囲内で当事業者の知識に基づき種々な
る改良、修正、変形を加えた態様で実施し得るものであ
る。
As described above, the polyimide film according to the present invention has been described, including the manufacturing method. However, the present invention is not limited to only these embodiments, and the present invention is not limited thereto. Various modifications, modifications, and variations can be made based on the knowledge of the above.

【0034】[0034]

【実施例】次に、本発明の実施例をより具体的に説明す
るが、本発明はこれらの実施例のみによって限定される
ものではない。実施例中、DABAは4,4’−ジアミ
ノベンズアニリド、BDABAは、1,4−ビス(4−
アミノフェニルカルバモイル)ベンゼン、ODAは、
4,4’−ジアミノジフェニルエ−テル、TMHQは
1,4−ヒドロキノンジベンゾエ−ト−3.3’,4,
4’−テトラカルボン酸二無水物、PMDAはピロメリ
ット酸二無水物、ODPAは3,3’,4,4’−ジフ
ェニルエ−テルテトラカルボン酸二無水物、NMPはN
−メチル−2−ピロリドンを表す。
Next, examples of the present invention will be described in more detail, but the present invention is not limited only to these examples. In the examples, DABA was 4,4'-diaminobenzanilide, and BDABA was 1,4-bis (4-
Aminophenylcarbamoyl) benzene and ODA are
4,4′-diaminodiphenyl ether and TMHQ are 1,4-hydroquinone dibenzoate-3.3 ′, 4,4
4'-tetracarboxylic dianhydride, PMDA is pyromellitic dianhydride, ODPA is 3,3 ', 4,4'-diphenylethertetracarboxylic dianhydride, NMP is N
Represents -methyl-2-pyrrolidone.

【0035】(実施例1)室温下において、攪拌機を備
えた1リットルの三口セパラブルフラスコにDABA
0.1molのNMP溶液にTMHQ 0.095mo
lの粉体を加え、窒素雰囲気で1時間攪拌した。次い
で、この溶液にゆっくりとTMHQ 0.005mol
のNMP溶液を加えて15重量%のポリアミド酸を得
た。
Example 1 At room temperature, DABA was placed in a 1-liter three-neck separable flask equipped with a stirrer.
TMHQ 0.095mo in 0.1mol NMP solution
of powder was added, and the mixture was stirred for 1 hour in a nitrogen atmosphere. Then, slowly add TMHQ 0.005 mol to this solution.
Was added to obtain a 15% by weight polyamic acid.

【0036】上記の操作により得られたポリアミド酸溶
液から化学的方法によりポリイミドフィルムを作製し
た。フィルムの作製は、以下のようにして行う。100
gのポリアミド酸溶液に無水酢酸15g、β−ピコリン
5g、NMP10gを加え充分攪拌した後、PETフィ
ルム上にコ−タ−で塗布し、80℃で10分間加熱し自
己支持性を有する膜を得た。この膜をPETから剥した
のち、端部を固定して100℃〜450℃へ連続的に加
熱し、更に450℃で5分間加熱しイミド化させて、厚
みが15μmのポリイミドフィルム得た。
From the polyamic acid solution obtained by the above operation, a polyimide film was prepared by a chemical method. The production of the film is performed as follows. 100
g of polyamic acid solution, 15 g of acetic anhydride, 5 g of β-picoline, and 10 g of NMP were added, and the mixture was sufficiently stirred. The mixture was coated on a PET film with a coater and heated at 80 ° C. for 10 minutes to obtain a film having self-supporting properties. Was. After peeling this film from PET, the end was fixed and continuously heated to 100 ° C. to 450 ° C., and further heated at 450 ° C. for 5 minutes to imidize to obtain a polyimide film having a thickness of 15 μm.

【0037】得られたフィルムを用い引張試験をAST
MD−882に準拠して行い、フィルムの弾性率と強度
を求め、結果を表1に示した。更に得られたフィルムの
吸水率をASTMD−570に準拠し測定し、結果を表
1に示した。 (実施例2)室温下において、攪拌機を備えた1リット
ルの三口セパラブルフラスコにBDABA 0.1mo
lのNMP溶液にTMHQ 0.095molの粉体を
加え、窒素雰囲気で1時間攪拌した。次いで、この溶液
にゆっくりとTMHQ 0.005molのNMP溶液
を加えて15重量%のポリアミド酸を得た。
Using the obtained film, a tensile test was performed by AST.
The elastic modulus and strength of the film were determined according to MD-882, and the results are shown in Table 1. Further, the water absorption of the obtained film was measured according to ASTM D-570, and the results are shown in Table 1. Example 2 At room temperature, BDABA 0.1 mol was placed in a 1-liter three-neck separable flask equipped with a stirrer.
0.095 mol of TMHQ was added to 1 liter of the NMP solution, and the mixture was stirred for 1 hour in a nitrogen atmosphere. Next, a NMP solution of 0.005 mol of TMHQ was slowly added to the solution to obtain 15% by weight of polyamic acid.

【0038】得られたポリアミド酸溶液を用いて実施例
1と同様にポリイミドフィルムを得て、弾性率、強度と
吸水率を測定した。その結果を表1に示す。 (実施例3)室温下において、攪拌機を備えた1リット
ルの三口セパラブルフラスコにDABA 0.1mol
のNMP溶液にTMHQ 0.075molとODPA
0.02molの粉体を加え、窒素雰囲気で1時間攪
拌した。次いで、この溶液にゆっくりとTMHQ 0.
005molのNMP溶液を加えて15重量%のポリア
ミド酸を得た。得られたポリアミド酸溶液を用いて実施
例1と同様にポリイミドフィルムを得、弾性率、強度と
吸水率を測定した。その結果を表1に示す。
Using the obtained polyamic acid solution, a polyimide film was obtained in the same manner as in Example 1, and the elastic modulus, strength and water absorption were measured. Table 1 shows the results. Example 3 At room temperature, 0.1 mol of DABA was placed in a 1-liter three-neck separable flask equipped with a stirrer.
0.075mol TMHQ and ODPA in NMP solution
0.02 mol of powder was added, and the mixture was stirred for 1 hour in a nitrogen atmosphere. The solution was then slowly added to TMHQ 0.1.
005 mol of NMP solution was added to obtain 15% by weight of polyamic acid. Using the obtained polyamic acid solution, a polyimide film was obtained in the same manner as in Example 1, and the elastic modulus, strength and water absorption were measured. Table 1 shows the results.

【0039】(実施例4)室温下において、攪拌機を備
えた1リットルの三口セパラブルフラスコにDABA
0.08molとODA 0.02molのNMP溶液
にTMHQ 0.095molの粉体を加え、窒素雰囲
気で1時間攪拌した。次いで、この溶液にゆっくりとT
MHQ 0.005molのNMP溶液を加えて15重
量%のポリアミド酸を得た。得られたポリアミド酸溶液
を用いて実施例1と同様にポリイミドフィルムを得、弾
性率、強度と吸水率を測定した。その結果を表1に示
す。
EXAMPLE 4 At room temperature, DABA was placed in a 1-liter three-neck separable flask equipped with a stirrer.
A powder of 0.095 mol of TMHQ was added to an NMP solution of 0.08 mol and 0.02 mol of ODA, followed by stirring for 1 hour in a nitrogen atmosphere. The solution is then slowly added to T
An NMP solution of 0.005 mol of MHQ was added to obtain 15% by weight of polyamic acid. Using the obtained polyamic acid solution, a polyimide film was obtained in the same manner as in Example 1, and the elastic modulus, strength and water absorption were measured. Table 1 shows the results.

【0040】(比較例1)室温下において、攪拌機を備
えた1リットルの三口セパラブルフラスコにODA
0.1molのNMP溶液にTMHQ 0.095mo
lの粉体を加え、窒素雰囲気で1時間攪拌した。次い
で、この溶液にゆっくりとTMHQ 0.005mol
のNMP溶液を加えて15重量%のポリアミド酸を得
た。
(Comparative Example 1) At room temperature, ODA was placed in a 1-liter three-neck separable flask equipped with a stirrer.
TMHQ 0.095mo in 0.1mol NMP solution
of powder was added, and the mixture was stirred for 1 hour in a nitrogen atmosphere. Then, slowly add TMHQ 0.005 mol to this solution.
Was added to obtain a 15% by weight polyamic acid.

【0041】得られたポリアミド酸溶液を用いて実施例
1と同様にポリイミドフィルムを得て、弾性率、強度と
吸水率を測定した。その結果を表1に示す。 (比較例2)室温下において、攪拌機を備えた1リット
ルの三口セパラブルフラスコにODA 0.1molの
NMP溶液にPMDA 0.095molの粉体を加
え、窒素雰囲気で1時間攪拌した。次いで、この溶液に
ゆっくりとPMDA 0.005molのNMP溶液を
加えて15重量%のポリアミド酸を得た。
Using the obtained polyamic acid solution, a polyimide film was obtained in the same manner as in Example 1, and the elastic modulus, strength and water absorption were measured. Table 1 shows the results. (Comparative Example 2) At room temperature, a powder of 0.095 mol of PMDA was added to an NMP solution of 0.1 mol of ODA in a 1-liter three-neck separable flask equipped with a stirrer, followed by stirring for 1 hour in a nitrogen atmosphere. Then, a NDA solution of 0.005 mol of PMDA was slowly added to this solution to obtain 15% by weight of polyamic acid.

【0042】得られたポリアミド酸溶液を用いて実施例
1と同様にポリイミドフィルムを得て、弾性率、強度と
吸水率を測定した。その結果を表1に示す。
Using the obtained polyamic acid solution, a polyimide film was obtained in the same manner as in Example 1, and the elastic modulus, strength and water absorption were measured. Table 1 shows the results.

【0043】[0043]

【表1】 [Table 1]

【0044】[0044]

【発明の効果】以上のように、本発明にかかるポリイミ
ドフィルムは、弾性率が1000kg/mm2以上、吸
水率が1.5%以下という、高弾性かつ低吸水性をあわ
せ有している。
As described above, the polyimide film according to the present invention has both high elasticity and low water absorption, such as an elastic modulus of 1000 kg / mm2 or more and a water absorption of 1.5% or less.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 下記一般式(1) 【化1】 (但し、式中、R1は、下記 【化2】 (RZはH、CH3、Cl、Brから選択される少なくと
も1種、Zは0〜4の整数を表す。)で表される有機基
から選択される少なくとも1種、R2は下記 【化3】 (Rm、RnはH、CH3、Cl、Brから選択される少
なくとも1種、Zは0〜4の整数を表す。)で表される
有機基から選択される少なくとも1種示す。)で表され
る繰り返し単位を含有してなる、弾性率が1000kg
/mm2以上を有し、かつ吸水率が1.5%以下を併せ
有することを特徴とするのポリイミドフィルム。
[Claim 1] The following general formula (1) (Wherein, R1 represents the following: (R Z is at least one selected from H, CH 3 , Cl, and Br, Z is an integer of 0 to 4), and at least one selected from the organic groups represented by 3] (R m and R n are at least one selected from H, CH 3 , Cl, and Br, and Z is an integer of 0 to 4). ), Having a modulus of elasticity of 1000 kg
/ Mm2 or more and a water absorption of 1.5% or less.
【請求項2】 テトラカルボン酸二無水物類とジアミン
類との重縮合反応によって得られるポリイミドフィルム
の前駆体であるポリアミド酸の溶液から流延法にて請求
項1に記載するポリイミドフィルムを製造する方法にお
いて、前記ポリアミド酸の重量平均分子量が15万以上
であることを特徴とするポリイミドフィルムの製造方法
2. The polyimide film according to claim 1, which is produced by casting a solution of a polyamic acid, which is a precursor of a polyimide film obtained by a polycondensation reaction between tetracarboxylic dianhydrides and diamines. Wherein the weight average molecular weight of the polyamic acid is 150,000 or more.
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US12065543B2 (en) 2019-02-01 2024-08-20 Lg Chem, Ltd. Polyimide-based polymer film, substrate for display device, and optical device using the same
US12552900B2 (en) 2019-02-01 2026-02-17 Lg Chem, Ltd. Polyimide-based polymer film, substrate for display device, and optical device using the same

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