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JPH11228218A - Manufacturing method of ITO sintered body - Google Patents

Manufacturing method of ITO sintered body

Info

Publication number
JPH11228218A
JPH11228218A JP10023250A JP2325098A JPH11228218A JP H11228218 A JPH11228218 A JP H11228218A JP 10023250 A JP10023250 A JP 10023250A JP 2325098 A JP2325098 A JP 2325098A JP H11228218 A JPH11228218 A JP H11228218A
Authority
JP
Japan
Prior art keywords
sintered body
slurry
oxide powder
mixed
tin oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10023250A
Other languages
Japanese (ja)
Inventor
Isao Nakamura
村 功 中
Yoichiro Emori
森 洋一郎 江
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Kinzoku Co Ltd
Original Assignee
Mitsui Mining and Smelting Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Mining and Smelting Co Ltd filed Critical Mitsui Mining and Smelting Co Ltd
Priority to JP10023250A priority Critical patent/JPH11228218A/en
Publication of JPH11228218A publication Critical patent/JPH11228218A/en
Pending legal-status Critical Current

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Abstract

(57)【要約】 【課題】 ITO焼結体の泥漿鋳込み成形法で用いるス
ラリー中へ不純物の混入量が少ない、高密度ITO焼結
体の製造方法を提供する。 【解決手段】 酸化インジウム粉および酸化錫粉にイオ
ン交換水と有機添加剤を加えてボールミルで粉砕混合し
てスラリーを調製して、泥漿鋳込み成形を行い、得られ
た成形体を焼結してITO焼結体を製造する方法におい
て、予め酸化錫粉の比表面積1〜4m2 /g、平均粒子
径1μm以下に調整して使用することを特徴とする、粉
砕混合メディアからの不純物混入量の少ない高密度IT
O焼結体の製造方法。また、上記スラリーより作製され
た成形体を酸素雰囲気で焼成することを特徴とする粉砕
混合メディアからの不純物混入量の少ない高密度のIT
O焼結体の製造方法。
PROBLEM TO BE SOLVED: To provide a method for producing a high-density ITO sintered body having a small amount of impurities mixed into a slurry used in a slurry casting method for an ITO sintered body. SOLUTION: Ion-exchanged water and an organic additive are added to indium oxide powder and tin oxide powder, and the mixture is pulverized and mixed by a ball mill to prepare a slurry. In the method for producing an ITO sintered body, the tin oxide powder is adjusted to have a specific surface area of 1 to 4 m 2 / g and an average particle diameter of 1 μm or less in advance. Low-density IT
A method for producing an O sintered body. Further, a compact formed from the slurry is fired in an oxygen atmosphere.
A method for producing an O sintered body.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、スパッタリング法
で透明導電膜を形成する際に用いられる高密度ITOタ
ーゲットとして使用するのに好適なITO焼結体の製造
方法に関する。
The present invention relates to a method for producing an ITO sintered body suitable for use as a high-density ITO target used for forming a transparent conductive film by a sputtering method.

【0002】[0002]

【従来の技術】従来ITO焼結体を作製するための、酸
化インジウムと酸化錫の混合スラリーを調製する際に
は、粉砕混合メディアとしてはスラリーの比重より重
く、耐衝撃性、耐摩耗性に優れたジルコニアボールが一
般的に使用されている。
2. Description of the Related Art Conventionally, when preparing a mixed slurry of indium oxide and tin oxide for preparing an ITO sintered body, a pulverized mixing medium is heavier than the specific gravity of the slurry, and has poor impact resistance and abrasion resistance. Excellent zirconia balls are commonly used.

【0003】しかし、ジルコニアボールは耐衝撃性、耐
摩耗性に非常に優れているとは言え、湿式ボールミル粉
砕を長時間行うと数百ppmのオーダでスラリー中に不
純物としてジルコニア(ZrO2 )が混入してしまう。
鉄芯入り樹脂ボール等を粉砕混合メディアとして使用す
れば不純物の混入を防止することができるが、このよう
な条件ではスラリー粉砕の効率が低く、最終的に得られ
るITO焼結体の密度が十分に上がらないという問題が
ある。ITOスラリー中にボールミル粉砕混合メディア
からの不純物が増加すると、そのようなITO焼結体を
用いてスパッタリングによって成膜したITO透明導電
膜の成膜特性や膜特性に悪影響を及ぼすことになり好ま
しくない。
However, although zirconia balls are very excellent in impact resistance and abrasion resistance, zirconia (ZrO 2 ) is contained as an impurity in a slurry in the order of several hundred ppm when wet ball milling is performed for a long time. Will be mixed.
The use of iron core-containing resin balls or the like as the pulverization / mixing medium can prevent impurities from being mixed, but under such conditions, the efficiency of slurry pulverization is low and the density of the finally obtained ITO sintered body is not sufficient. There is a problem that does not go up. If the impurities from the ball mill pulverized mixed media increase in the ITO slurry, the film forming characteristics and film characteristics of the ITO transparent conductive film formed by sputtering using such an ITO sintered body are adversely affected, which is not preferable. .

【0004】[0004]

【発明が解決しようとする課題】本発明の目的は、IT
O焼結体を作製するための泥漿鋳込み成形法で用いるス
ラリー中へ、粉砕混合メディアからの不純物混入する量
が少ない、高密度ITO焼結体の製造方法を提供するこ
とにある。
SUMMARY OF THE INVENTION The object of the present invention is to provide an IT
An object of the present invention is to provide a method for producing a high-density ITO sintered body in which the amount of impurities mixed from a pulverized mixed medium into a slurry used in a slurry casting method for producing an O sintered body is small.

【0005】[0005]

【課題を解決するための手段】本発明者らは、酸化イン
ジウム粉および酸化錫粉とイオン交換水を、樹脂製ポッ
トに入れジルコニアボールを用いてボールミル粉砕を行
い、ジルコニア不純物量を測定した。酸化インジウム粉
は同一品を使用し、酸化錫は比表面積、平均粒子径の条
件が異なる粉を使用して酸化錫とジルコニア不純物混入
量の関係を調べた。その結果、比表面積が小さく、かつ
平均粒子径の大きい酸化錫を使用するとジルコニア不純
物混入量が増加することがわかった。ただし、ここで言
う酸化錫粉の平均粒子径は、レーザー散乱法による粒度
分布分析計で測定される値である。また、比表面積は、
BET法で測定される値である。
Means for Solving the Problems The present inventors put indium oxide powder and tin oxide powder and ion-exchanged water into a resin pot and performed ball milling using zirconia balls to measure the amount of zirconia impurities. Using the same indium oxide powder and tin oxide powder having different specific surface area and average particle size conditions, the relationship between tin oxide and the amount of mixed zirconia impurities was investigated. As a result, it was found that when tin oxide having a small specific surface area and a large average particle diameter was used, the amount of mixed zirconia impurities increased. Here, the average particle diameter of the tin oxide powder is a value measured by a particle size distribution analyzer using a laser scattering method. The specific surface area is
This is a value measured by the BET method.

【0006】そこで、本発明者らは、酸化錫粉の凝集を
予め粉砕し、平均粒子径を小さくし、同時に比表面積を
大きくすれば、粉砕混合メディアからの不純物混入量を
減少しうることに着目した。そして、酸化錫粉の比表面
積と、平均粒子径を特定範囲に調整することにより粉砕
混合メディアからの不純物混入量が効果的に抑制された
高密度ITO焼結体を得られることを見い出し、本発明
を完成させるに至った。
Therefore, the present inventors have found that if the agglomeration of tin oxide powder is pulverized in advance to reduce the average particle diameter and increase the specific surface area, the amount of impurities mixed from the pulverized mixed media can be reduced. I paid attention. By adjusting the specific surface area and average particle diameter of the tin oxide powder to specific ranges, it was found that a high-density ITO sintered body in which the amount of impurities mixed from the pulverized mixed media was effectively suppressed could be obtained. The invention has been completed.

【0007】本発明は、下記の通りのものである。酸化
インジウム粉および酸化錫粉にイオン交換水と有機添加
剤を加えてボールミル粉砕混合でスラリーを調製し、こ
のスラリーを泥漿鋳込み成形し、得られた成形体を焼結
してITO焼結体を製造する方法において、予め酸化錫
粉の比表面積を1〜4m2 /g、平均粒子径を1μm以
下に調整して使用することを特徴とする、粉砕混合メデ
ィアからの不純物混入の少ない高密度ITO焼結体の製
造方法。また、上記スラリーにより作製された成形体の
酸素雰囲気で焼成することを特徴とする、粉砕メディア
からの不純物混入量の少ない高密度ITO焼結体の製造
方法。
The present invention is as follows. Ion-exchanged water and an organic additive are added to indium oxide powder and tin oxide powder to prepare a slurry by ball mill pulverization and mixing, and this slurry is cast into a slurry, and the obtained compact is sintered to form an ITO sintered body. A high-density ITO containing less impurities from the pulverized mixed media, wherein the tin oxide powder is adjusted to have a specific surface area of 1 to 4 m 2 / g and an average particle diameter of 1 μm or less in advance. A method for manufacturing a sintered body. In addition, a method for producing a high-density ITO sintered body having a small amount of impurities mixed from a pulverizing medium, comprising firing a molded body produced from the slurry in an oxygen atmosphere.

【0008】本発明のITO焼結体の製造方法において
は酸化錫粉の比表面積を1〜4m2/gの範囲に予め調
整して使用するが、これは、比表面積が4m2 /gを超
えると得られるITO焼結体にクラックが発生するから
である。また、酸化錫粉の比表面積が1m2 /g以下の
状態は、粒成長または焼結により粒子径が大きくなった
状態であり、このような原料粉を使用した場合は前処理
での粉砕が難かしくなり、平均粒子径を小さくすること
ができず、結果的にZrO2 の混入量が増加する恐れが
ある。
[0008] Although in the manufacturing method of the ITO sintered body of the present invention used to precondition the specific surface area of the tin oxide powder in the range of 1 to 4 m 2 / g, which is a specific surface area of 4m 2 / g This is because cracking occurs in the obtained ITO sintered body if it exceeds the above. When the specific surface area of the tin oxide powder is 1 m 2 / g or less, the particle diameter is increased by grain growth or sintering. This makes it difficult to reduce the average particle diameter, which may result in an increase in the amount of ZrO 2 mixed.

【0009】[0009]

【発明の実施の形態】酸化インジウム粉は市販のものを
使用する。酸化錫粉は市販のものを使用し、予め鉄芯入
り樹脂ボールを用いたボールミル粉砕等、粉砕メディア
からの不純物混入の恐れがない手段を用いて酸化錫の比
表面積を1〜4m2 /g、平均粒子径を1μm以下の範
囲に調整する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Commercially available indium oxide powder is used. As the tin oxide powder, a commercially available tin oxide powder is used. The specific surface area of the tin oxide is set to 1 to 4 m 2 / g by using a means such as a ball mill pulverization using a resin ball containing an iron core in advance without a risk of impurities being mixed in from the pulverization media. The average particle diameter is adjusted to a range of 1 μm or less.

【0010】平均粒子径には特に下限値はないが、この
ような手段を用いて得られる酸化錫粉の平均粒子径は概
ね0.1μmを下回ることはない。この酸化錫粉と酸化
インジウム粉とジルコニアボールを、樹脂製ポットに入
れ乾式ボールミルで粉砕混合を行う。酸化錫の組成は5
〜10重量%が好ましい。この際、イオン交換水1〜5
重量%を加えておくと原料粉のポット壁への付着を減少
させ、粉砕混合を十分に行なえる効果が期待できる。ボ
ールミルのポットとしては不純物混入防止の観点から樹
脂製ポットを使用するのが好ましい。
Although there is no particular lower limit for the average particle diameter, the average particle diameter of the tin oxide powder obtained by using such means does not generally fall below 0.1 μm. The tin oxide powder, the indium oxide powder, and the zirconia balls are put into a resin pot and pulverized and mixed by a dry ball mill. The composition of tin oxide is 5
-10% by weight is preferred. At this time, deionized water 1-5
If the weight% is added, the effect of reducing the adhesion of the raw material powder to the pot wall and sufficiently performing the pulverization and mixing can be expected. It is preferable to use a resin pot as a ball mill pot from the viewpoint of preventing impurities from being mixed.

【0011】次に、前記ボールミルポット中へイオン交
換水を10〜25重量%、および有機添加剤(分散剤)
を添加し、湿式ボールミルで粉砕混合を行って原料粉を
分散させる。分散剤としてはポリカルボン酸系分散剤が
使用でき、添加量は0.2〜1.0重量%が好ましい。
Next, 10 to 25% by weight of ion-exchanged water is added to the ball mill pot, and an organic additive (dispersant) is added.
Is added and pulverized and mixed by a wet ball mill to disperse the raw material powder. As the dispersant, a polycarboxylic acid-based dispersant can be used, and the addition amount is preferably 0.2 to 1.0% by weight.

【0012】さらに、有機添加剤(バインダー)を添加
して混合を行いスラリーとした。バインダーとしてはワ
ックスエマルジョン系バインダーが使用でき、添加量は
0.3〜1.0重量%が好ましい。スラリー粘度として
は100cps以下のスラリーを調製することが好まし
い。スラリー粘度が高いと脱気が困難になったり、容器
やボールへの付着によってスラリー回収率が低下する。
最後に、スラリーに有機添加剤(消泡剤)を添加して減
圧脱気する。消泡剤としてはアミド系消泡剤が使用で
き、添加量は0.01〜0.5重量%が好ましい。
Further, an organic additive (binder) was added and mixed to form a slurry. As the binder, a wax emulsion-based binder can be used, and the addition amount is preferably 0.3 to 1.0% by weight. It is preferable to prepare a slurry having a slurry viscosity of 100 cps or less. If the slurry viscosity is high, deaeration becomes difficult, and the slurry recovery rate decreases due to adhesion to containers and balls.
Finally, an organic additive (antifoaming agent) is added to the slurry, and the slurry is degassed under reduced pressure. As the defoaming agent, an amide-based defoaming agent can be used, and the addition amount is preferably 0.01 to 0.5% by weight.

【0013】多孔質性の成形型にスラリーを鋳込み、ス
ラリー中の水分を除くことで成形体を得る。成形体を自
然乾燥後、400〜600℃で脱脂を行い成形体中の残
留水分およびバインダーを除去することが好ましい。そ
の後、成形体を焼成することによりITO焼結体を得
る。焼成温度は1400〜1600℃が好ましい。より
高密度のITO焼結体を得るには酸素雰囲気中で焼成す
るのが好ましい。
[0013] A slurry is cast into a porous mold, and a molded body is obtained by removing moisture in the slurry. After the molded body is naturally dried, it is preferable that degreasing is performed at 400 to 600 ° C. to remove residual moisture and a binder in the molded body. Thereafter, the formed body is fired to obtain an ITO sintered body. The firing temperature is preferably from 1400 to 1600 ° C. In order to obtain a higher density ITO sintered body, firing in an oxygen atmosphere is preferable.

【0014】[0014]

【実施例】以下に、本発明を実施例および比較例により
さらに説明する。実施例1 比表面積2.64m2 /g、平均粒子径8.4μmの酸
化錫粉と直径20mmの鉄芯入り樹脂ボールを樹脂製ポ
ットに入れて乾式ボールミル粉砕を72時間行い、比表
面積3.8m2 /g、平均粒子径を0.59μmに粉砕
した。このときの粉砕時間と比表面積および平均粒子径
の変化を、表1に示す。
The present invention will be further described below with reference to examples and comparative examples. Example 1 A resin ball containing a tin oxide powder having a specific surface area of 2.64 m 2 / g and an average particle diameter of 8.4 μm and an iron core having a diameter of 20 mm was placed in a resin pot, and subjected to dry ball mill pulverization for 72 hours. The powder was pulverized to 8 m 2 / g and the average particle diameter was 0.59 μm. Table 1 shows changes in the pulverizing time, the specific surface area and the average particle diameter at this time.

【0015】[0015]

【表1】 [Table 1]

【0016】酸化インジウム粉7200gと上記比表面
積の酸化錫粉800gおよびイオン交換水240gと直
径10mmのジルコニアボールを樹脂製ポットに入れ、
20時間ボールミル粉砕混合を行った。次に、ポットに
イオン交換水1440gとポリカルボン酸系分散剤56
gを入れ、1時間ボールミル粉砕混合した。1時間後に
ワックス系バインダーを80g添加し、9時間ボールミ
ル粉砕混合を行った。
A resin pot was charged with 7200 g of indium oxide powder, 800 g of tin oxide powder having the above specific surface area, 240 g of ion-exchanged water, and zirconia balls having a diameter of 10 mm.
The ball mill was crushed and mixed for 20 hours. Next, 1440 g of ion-exchanged water and polycarboxylic acid-based dispersant 56 were added to the pot.
g was added and mixed for 1 hour with a ball mill. One hour later, 80 g of a wax-based binder was added, and the mixture was pulverized and mixed by a ball mill for 9 hours.

【0017】この様にして調製したスラリーにアミド系
消泡剤1.6gを添加し、減圧脱気を行った。このスラ
リーの平均粒子径は0.5μmだった。このスラリーを
成形サイズ300mm×700mmの鋳込み型に鋳込
み、成形体を得た。成形体を自然乾燥後、600℃で脱
脂した。その後、酸素雰囲気にて1550℃で焼成し、
クラックのないITO焼結体を得た。このときのITO
焼結体の寸法は245mm×572mm×7.3mmで
あり、密度は98.7%(7.05g/cm3 )であっ
た。このときのジルコニア不純物量は30ppmであっ
た。
1.6 g of an amide-based antifoaming agent was added to the slurry thus prepared, and deaeration was performed under reduced pressure. The average particle size of this slurry was 0.5 μm. This slurry was cast into a casting mold having a molding size of 300 mm × 700 mm to obtain a molded body. After the molded body was naturally dried, it was degreased at 600 ° C. After that, firing at 1550 ° C. in an oxygen atmosphere,
A crack-free ITO sintered body was obtained. ITO at this time
The dimensions of the sintered body were 245 mm × 572 mm × 7.3 mm, and the density was 98.7% (7.05 g / cm 3 ). At this time, the zirconia impurity amount was 30 ppm.

【0018】比較例1 酸化インジウム粉7200gと比表面積2.6m2 /g
で平均粒子径が8.4μmの酸化錫粉800gおよびイ
オン交換水240gと直径10mmのジルコニアボール
を樹脂製ポットに入れ、20時間ボールミル粉砕混合を
行った。次に、ポットにイオン交換水1440gとポリ
カルボン酸系分散剤56gを入れ、1時間ボールミル粉
砕混合した。1時間後にワックス系バインダーを80g
添加し、19時間ボールミル粉砕混合を行った。このよ
うにして調製したスラリーにアミド系消泡剤1.6gを
添加し、減圧脱気を行った。このスラリーの平均粒子径
は0.5μmであった。
Comparative Example 1 Indium oxide powder 7200 g and specific surface area 2.6 m 2 / g
Then, 800 g of tin oxide powder having an average particle diameter of 8.4 μm, 240 g of ion-exchanged water, and zirconia balls having a diameter of 10 mm were placed in a resin pot, and ball milled and mixed for 20 hours. Next, 1440 g of ion-exchanged water and 56 g of a polycarboxylic acid-based dispersant were placed in the pot, and mixed by ball milling for 1 hour. After 1 hour, 80g of wax-based binder
The mixture was added and ball milled and mixed for 19 hours. 1.6 g of the amide-based antifoaming agent was added to the slurry thus prepared, and deaeration was performed under reduced pressure. The average particle size of this slurry was 0.5 μm.

【0019】このスラリーを成形サイズ300mm×7
00mmの実施例1で使用した鋳込み型に鋳込み、成形
体を得た。成形体を自然乾燥後、600℃で脱脂した。
その後、酸素雰囲気にて1550℃で焼成し、クラック
のないITO焼結体を得た。このときのITO焼結体の
寸法は247mm×578mm×7.3mmであり、密
度は98.1%(7.01g/cm3 )であった。ま
た、ジルコニア不純物量は220ppmであった。
The slurry was formed into a mold having a size of 300 mm × 7.
It was cast into a casting mold having a thickness of 00 mm used in Example 1 to obtain a molded body. After the molded body was naturally dried, it was degreased at 600 ° C.
Then, it was baked at 1550 ° C. in an oxygen atmosphere to obtain a crack-free ITO sintered body. At this time, the dimensions of the ITO sintered body were 247 mm × 578 mm × 7.3 mm, and the density was 98.1% (7.01 g / cm 3 ). The zirconia impurity amount was 220 ppm.

【0020】比較例2 酸化インジウム粉900gと比表面積9.5m2 /gで
平均粒子径が1.5μmの酸化錫粉100gおよびイオ
ン交換水30gと直径10mmのジルコニアボールを樹
脂製ポットに入れ、20時間ボールミル粉砕混合を行っ
た。次に、ポットにイオン交換水177gとポリカルボ
ン酸系分散剤8gを入れ、1時間ボールミル粉砕混合し
た。1時間後にワックス系バインダーを10g添加し、
19時間ボールミル粉砕混合を行った。このようにして
調製したスラリーにアミド系消泡剤0.2gを添加し、
減圧脱気を行った。このスラリーの平均粒子径は0.5
μmだった。
Comparative Example 2 900 g of indium oxide powder, 100 g of tin oxide powder having a specific surface area of 9.5 m 2 / g and an average particle diameter of 1.5 μm, 30 g of ion-exchanged water and zirconia balls having a diameter of 10 mm were put into a resin pot. The ball mill was crushed and mixed for 20 hours. Next, 177 g of ion-exchanged water and 8 g of a polycarboxylic acid-based dispersant were placed in the pot, and mixed by ball milling for 1 hour. After 1 hour, 10 g of a wax-based binder is added,
Ball milling and mixing were performed for 19 hours. 0.2 g of the amide-based antifoaming agent was added to the slurry thus prepared,
Vacuum deaeration was performed. The average particle size of this slurry is 0.5
μm.

【0021】このスラリーを成形サイズ190mmφの
鋳込み型に鋳込み、成形体を得た。成形体を自然乾燥
後、600℃で脱脂した。その後、酸素雰囲気にて15
50℃で焼成し、ITO焼結体を得た。このときのIT
O焼結体の寸法は157mmφ×5.8mmであり、密
度は98.3%(7.03g/cm3 )だった。この焼
結体には長さ10mmのクラックが発生していた。ま
た、このときのジルコニア不純物量は90ppmであっ
た。
This slurry was cast into a casting mold having a forming size of 190 mmφ to obtain a formed body. After the molded body was naturally dried, it was degreased at 600 ° C. Then, in an oxygen atmosphere,
It was fired at 50 ° C. to obtain an ITO sintered body. IT at this time
The size of the O sintered body was 157 mmφ × 5.8 mm, and the density was 98.3% (7.03 g / cm 3 ). This sintered body had a crack having a length of 10 mm. The zirconia impurity content at this time was 90 ppm.

【0022】[0022]

【発明の効果】本発明によれば、泥漿鋳込み成形法に用
いるITOスラリーを調製する際に酸化錫粉の比表面積
と平均粒子径を適正範囲に選択することにより、粉砕メ
ディアからの不純物混入量の少ない高密度ITO焼結体
が得られる。
According to the present invention, when preparing the ITO slurry used in the slurry casting method, the specific surface area and the average particle diameter of the tin oxide powder are selected within an appropriate range, so that the amount of impurities mixed from the pulverized media is reduced. And a high-density ITO sintered body having a low density can be obtained.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】酸化インジウム粉および酸化錫粉にイオン
交換水と有機添加剤を加えてボールミルで粉砕混合して
スラリーを調製して、泥漿鋳込み成形を行い、得られた
成形体を焼結してITO焼結体を製造する方法におい
て、比表面積1〜4m2 /g、平均粒子径1μm以下の
酸化錫粉を使用することを特徴とする、粉砕混合メディ
アからの不純物混入量の少ない高密度ITO焼結体の製
造方法。
1. A slurry is prepared by adding ion-exchanged water and an organic additive to indium oxide powder and tin oxide powder and pulverizing and mixing them in a ball mill to perform slurry casting and sintering the obtained compact. A tin oxide powder having a specific surface area of 1 to 4 m 2 / g and an average particle diameter of 1 μm or less in a method for producing an ITO sintered body by using a high-density mixture with a small amount of impurities mixed from a pulverized mixed medium. Manufacturing method of ITO sintered body.
【請求項2】請求項1に記載のスラリーを用いて製作さ
れた成形体を、酸素雰囲気で焼成することを特徴とす
る、粉砕混合メディアからの不純物混入量の少ない高密
度のITO焼結体の製造方法。
2. A high-density ITO sintered body having a small amount of impurities mixed from a pulverized mixed medium, wherein the molded body manufactured by using the slurry according to claim 1 is fired in an oxygen atmosphere. Manufacturing method.
JP10023250A 1998-02-04 1998-02-04 Manufacturing method of ITO sintered body Pending JPH11228218A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10023250A JPH11228218A (en) 1998-02-04 1998-02-04 Manufacturing method of ITO sintered body

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10023250A JPH11228218A (en) 1998-02-04 1998-02-04 Manufacturing method of ITO sintered body

Publications (1)

Publication Number Publication Date
JPH11228218A true JPH11228218A (en) 1999-08-24

Family

ID=12105362

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10023250A Pending JPH11228218A (en) 1998-02-04 1998-02-04 Manufacturing method of ITO sintered body

Country Status (1)

Country Link
JP (1) JPH11228218A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100787635B1 (en) 2007-01-22 2007-12-21 삼성코닝 주식회사 Indium tin oxide target, preparation method thereof and indium tin oxide transparent electrode prepared therefrom
JP2009029706A (en) * 2001-03-12 2009-02-12 Nikko Kinzoku Kk Tin oxide powder for ito sputtering target, production method of the powder, sintered body sputtering target for ito film formation and production method of the target
CN102176519A (en) * 2011-03-02 2011-09-07 湖南美特新材料科技有限公司 Method for preparing submicron-level lithium carbonate, lithium carbonate powder and application of lithium carbonate powder

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009029706A (en) * 2001-03-12 2009-02-12 Nikko Kinzoku Kk Tin oxide powder for ito sputtering target, production method of the powder, sintered body sputtering target for ito film formation and production method of the target
KR100787635B1 (en) 2007-01-22 2007-12-21 삼성코닝 주식회사 Indium tin oxide target, preparation method thereof and indium tin oxide transparent electrode prepared therefrom
CN101231431B (en) 2007-01-22 2011-02-23 三星康宁精密素材株式会社 Indium tin oxide target, its preparation method and transparent electrode prepared therefrom
CN102176519A (en) * 2011-03-02 2011-09-07 湖南美特新材料科技有限公司 Method for preparing submicron-level lithium carbonate, lithium carbonate powder and application of lithium carbonate powder

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