JPH11209879A - Workpiece plating method - Google Patents
Workpiece plating methodInfo
- Publication number
- JPH11209879A JPH11209879A JP1003398A JP1003398A JPH11209879A JP H11209879 A JPH11209879 A JP H11209879A JP 1003398 A JP1003398 A JP 1003398A JP 1003398 A JP1003398 A JP 1003398A JP H11209879 A JPH11209879 A JP H11209879A
- Authority
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- Prior art keywords
- plating
- treatment
- work
- plating film
- carbon
- Prior art date
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Abstract
(57)【要約】
【課題】 金属材と、非導電性材とカーボンの少なくと
も1種と、を含むワークに密着性に優れるめっき膜を形
成することのできるめっき処理方法の提供。
【解決手段】 (1)金属材と、非導電性材とカーボン
の少なくとも1種と、を含むワークに中性コロイダルパ
ラジウム処理を行う工程と、めっき処理を行う工程と、
からなるワークへのめっき処理方法。(2)金属材と、
非導電性材とカーボンの少なくとも1種と、を含むワー
クに亜鉛置換処理を行う工程と、中性コロイダルパラジ
ウム処理を行う工程と、めっき処理を行う工程と、から
なるワークへのめっき処理方法。
[PROBLEMS] To provide a plating method capable of forming a plating film having excellent adhesion on a work containing a metal material, a non-conductive material and at least one of carbon. SOLUTION: (1) A step of performing a neutral colloidal palladium treatment on a work including a metal material, a non-conductive material and at least one of carbon, a step of performing a plating treatment,
Plating method for workpieces consisting of (2) metal materials,
A plating method for a work, comprising a step of performing a zinc substitution treatment on a work containing a non-conductive material and at least one of carbon, a step of performing a neutral colloidal palladium treatment, and a step of performing a plating treatment.
Description
【0001】[0001]
【発明の属する技術分野】本発明は、金属材と、非導電
性材とカーボンの少なくとも1種と、を含むワークへの
めっき処理方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for plating a work containing a metal material, a non-conductive material and at least one of carbon.
【0002】[0002]
【従来の技術】ワークにめっき処理を施す前に亜鉛置換
処理あるいは酸性パラジウム処理を施す場合がある。亜
鉛置換処理はおもに、ワークがアルミニウムやマグネシ
ウム及びこれらの合金からなる場合に行われる。これら
のワークは表面に酸化皮膜が生じやすく、酸化皮膜によ
ってめっき膜との密着が阻害され密着性が低くなる。そ
のため、ワーク表面を亜鉛に置換した後にめっき処理を
し、ワークとめっき膜との密着性を高めることが知られ
ている。酸性パラジウム処理は、ワークがセラミックス
などの非導電性材や、カーボンなどのめっきが付きにく
いものなどからなる場合に行われる。めっき処理(無電
解めっきもしくは電解めっき)は導電性材に対してはめ
っき膜を形成する有効な方法となるが非導電性材には適
用できないので、ワークが非導電性材からなる場合は、
めっき処理を施す前に酸性パラジウム処理を施しワーク
表面に導電性を付与することが知られている。また、め
っきが付きにくいカーボンなどは、酸性パラジウム処理
により、めっきが付きやすくなることが知られている。2. Description of the Related Art In some cases, a workpiece is subjected to a zinc substitution treatment or an acidic palladium treatment before plating. The zinc substitution treatment is mainly performed when the work is made of aluminum, magnesium, or an alloy thereof. These workpieces tend to form an oxide film on the surface, and the oxide film hinders the adhesion to the plating film and lowers the adhesion. For this reason, it is known that plating is performed after replacing the work surface with zinc to enhance the adhesion between the work and the plating film. The acidic palladium treatment is performed when the work is made of a non-conductive material such as ceramics or a material such as carbon that is difficult to be plated. Plating treatment (electroless plating or electrolytic plating) is an effective method of forming a plating film on conductive materials, but cannot be applied to non-conductive materials.
It has been known that an acidic palladium treatment is performed before plating to impart conductivity to a work surface. Also, it is known that carbon or the like which is difficult to be plated is easily plated by acidic palladium treatment.
【0003】[0003]
【発明が解決しようとする課題】しかし、金属材とセラ
ミックス材の両方を含む、たとえばAl基複合材からな
るワークもしくは独立したAl(合金)部材とセラミッ
クス部材を結合して得たワークにめっき処理する場合、
従来知られている亜鉛置換処理を適用するとワークのセ
ラミックス材部分にはまったくめっき膜が形成されな
い。また、酸性パラジウム処理を適用すると、めっき膜
はほぼワーク全面に形成されるが、ワーク中のAl材が
酸性パラジウム液中に溶けるため、ワークとめっき膜と
の密着性が低いという問題がある。本発明の目的は、金
属材と、非導電性材とカーボンの少なくとも1種と、を
含むワークに、高い密着力を有するめっき膜を形成する
ことができるめっき処理方法を提供することにある。However, a plating treatment is performed on a work containing both a metal material and a ceramic material, for example, a work made of an Al-based composite material or a work obtained by combining an independent Al (alloy) member and a ceramic member. If you do
When a conventionally known zinc substitution process is applied, no plating film is formed on the ceramic material portion of the work. Further, when the acid palladium treatment is applied, the plating film is formed on almost the entire surface of the work, but there is a problem that the adhesion between the work and the plating film is low because the Al material in the work is dissolved in the acidic palladium solution. An object of the present invention is to provide a plating method capable of forming a plating film having high adhesion on a work containing a metal material, a non-conductive material and at least one of carbon.
【0004】[0004]
【課題を解決するための手段】上記目的を達成する本発
明はつぎの通りである。 (1) 金属材と、非導電性材とカーボンの少なくとも
1種と、を含むワークに中性コロイダルパラジウム処理
を行う工程と、めっき処理を行う工程と、からなるワー
クへのめっき処理方法。 (2) 金属材と、非導電性材とカーボンの少なくとも
1種と、を含むワークに亜鉛置換処理を行う工程と、中
性コロイダルパラジウム処理を行う工程と、めっき処理
を行う工程と、からなるワークへのめっき処理方法。The present invention to achieve the above object is as follows. (1) A plating method for a work, comprising a step of performing a neutral colloidal palladium treatment on a work including a metal material, a non-conductive material and at least one of carbon, and a step of performing a plating treatment. (2) a step of performing a zinc substitution treatment on a work containing a metal material, a non-conductive material and at least one of carbon, a step of performing a neutral colloidal palladium treatment, and a step of performing a plating treatment. Plating method for work.
【0005】上記(1)の方法では、金属材と、非導電
性材とカーボンの少なくとも1種と、を含むワークにめ
っき処理を施す前に、ワーク表面の金属を溶かすことの
ない中性コロイダルパラジウム処理を行うので、ワーク
との密着性に優れためっき膜を形成できる。上記(2)
の方法では、金属材と、非導電性材とカーボンの少なく
とも1種と、を含むワークにめっき処理を施す前に、亜
鉛置換処理と中性コロイダルパラジウム処理を行うこと
により、(1)の方法により得られるめっき膜よりワー
クとの密着性に優れるめっき膜を形成できる。In the above method (1), a neutral colloidal material that does not dissolve the metal on the surface of the work before plating the work containing a metal material, a non-conductive material and at least one of carbon. Since the palladium treatment is performed, it is possible to form a plating film having excellent adhesion to a work. The above (2)
In the method of (1), the zinc-substituted treatment and the neutral colloidal palladium treatment are performed before the plating treatment is performed on the work including the metal material, the non-conductive material, and at least one of carbon. Thus, a plating film having better adhesion to a work than a plating film obtained by the method can be formed.
【0006】[0006]
【発明の実施の形態】本発明の第1実施例を説明する。
本発明の第1実施例のめっき処理方法は、金属材と、非
導電性材とカーボンの少なくとも1種と、を含むワーク
に中性パラジウム処理を行う工程と、めっき処理を行う
工程からなる。金属材と、非導電性材とカーボンの少な
くとも1種と、を含むワークには、たとえば、金属基複
合材からなるワークがある。金属基複合材は母材と強化
材とからなる。母材には酸性液中で溶解しやすい金属、
たとえばアルミニウム、アルミニウム合金、マグネシウ
ム、マグネシウム合金、銅、銅合金、鉄、鉄合金などが
用いられ、強化材にはたとえば、炭化珪素、アルミナ、
ジルコニアなどのセラミックスなどの非導電性材や、カ
ーボンが用いられる。中性コロイダルパラジウム処理
は、中性コロイダルパラジウム水溶液中にワークを浸漬
することにより行う。中性コロイダルパラジウム水溶液
(pH5〜pH9)には、たとえば、吸着性を有する有
機物(三級アミンポリマーおよび/または四級アンモニ
ウムポリマー)が、その周りに吸着しているパラジウム
金属コロイド(金属まで還元されている状態)を含有し
た処理液が用いられる。めっき処理前に中性コロイダル
パラジウム処理を施すことにより非導電性材部分にもめ
っき膜が形成され、また、カーボンなどのめっき膜が付
きにくい部分に対してもめっき膜が形成されやすくな
る。めっきは無電解めっきであり、たとえばニッケルめ
っき、銅めっき、錫めっき、金めっき、銀めっき、パラ
ジウムめっき、などを用途に応じて行う。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A first embodiment of the present invention will be described.
The plating method according to the first embodiment of the present invention includes a step of performing a neutral palladium treatment on a work including a metal material, a non-conductive material and at least one of carbon, and a step of performing a plating treatment. Examples of a work including a metal material, a non-conductive material, and at least one of carbon include a work made of a metal-based composite material. The metal matrix composite comprises a matrix and a reinforcement. The base material is a metal that easily dissolves in acidic liquid,
For example, aluminum, aluminum alloys, magnesium, magnesium alloys, copper, copper alloys, iron, iron alloys and the like are used, and for the reinforcing material, for example, silicon carbide, alumina,
Non-conductive materials such as ceramics such as zirconia and carbon are used. The neutral colloidal palladium treatment is performed by immersing the work in a neutral colloidal palladium aqueous solution. In the neutral colloidal palladium aqueous solution (pH 5 to pH 9), for example, an adsorbing organic substance (tertiary amine polymer and / or quaternary ammonium polymer) is reduced to a palladium metal colloid (metal reduced to metal) adsorbed therearound. Is used. By performing the neutral colloidal palladium treatment before the plating treatment, a plating film is formed also on a non-conductive material portion, and a plating film is easily formed even on a portion where a plating film such as carbon hardly adheres. The plating is electroless plating, and for example, nickel plating, copper plating, tin plating, gold plating, silver plating, palladium plating, etc. are performed according to the application.
【0007】図1中には、SiCをシリカゾル(SiO
2 ゾル)などのバインダーによって800℃大気雰囲気
中で焼成した成形体を鋳型の中にセットし、高圧鋳造に
よってAl合金を含浸して素形材(たとえば、Al合
金:SiC=40:60(vol%))を形成し、たて
40mm、横20mm、厚さ3mmのテストピースに加
工し、適切な表面洗浄を施し、中性コロイダルパラジウ
ム液に約1〜2分浸漬し、水洗し、ニッケルめっき処理
を施し、形成されためっき膜のテストピースへの密着強
さを測定した結果を試験例1として示す。なお、テスト
ピース表面にはAl合金部分およびSiC部分の全面に
わたってめっき膜が形成されていた。また、比較のため
に、試験例1において使用したテストピースと同じテス
トピースに、中性コロイダルパラジウム液に浸漬するか
わりに酸性パラジウム液に浸漬することのほかは試験例
1と同様の方法の処理を施し、形成されためっき膜のテ
ストピースへの密着強さを測定した結果を図1中に比較
例1として示す。密着強さははんだ付け引張試験法(め
っき膜を形成したテストピースに銅棒ををはんだ付けし
テストピースと銅棒の間に引張力を付与する)により測
定した。In FIG. 1, SiC is converted to silica sol (SiO
(2 sol) and a molded body fired in an air atmosphere at 800 ° C. in a mold, impregnated with an Al alloy by high-pressure casting, and cast a cast material (for example, Al alloy: SiC = 40: 60 (vol. %)), Processed into a test piece having a length of 40 mm, a width of 20 mm and a thickness of 3 mm, subjected to an appropriate surface cleaning, immersed in a neutral colloidal palladium solution for about 1 to 2 minutes, washed with water, and nickel-plated. The result of measuring the adhesion strength of the plated film formed after the treatment to the test piece is shown as Test Example 1. In addition, a plating film was formed on the entire surface of the test piece over the Al alloy portion and the SiC portion. For comparison, the same test piece as that used in Test Example 1 was treated in the same manner as in Test Example 1 except that the test piece was immersed in an acidic palladium solution instead of a neutral colloidal palladium solution. The result of measuring the adhesion strength of the formed plating film to the test piece is shown as Comparative Example 1 in FIG. The adhesion strength was measured by a soldering tensile test method (a copper bar was soldered to a test piece on which a plating film was formed and a tensile force was applied between the test piece and the copper bar).
【0008】試験例1と比較例1のテストピースへのめ
っき膜の密着強さを比較すると、試験例1のほうが密着
強さが高い。したがって、Al基複合材からなるワーク
にめっき膜を形成する場合には、中性コロイダルパラジ
ウム処理をした後めっき処理を行うことにより、ワーク
全面にめっき膜が形成され、かつ酸性パラジウム処理を
行う場合に比べて密着性が高いめっき膜が得られる。酸
性パラジウム処理液中にはAl基複合材中のAl合金が
溶解するのに対し、中性コロイダルパラジウム水溶液中
にはAl基複合材中のAl合金が溶解しないので、めっ
き膜とワークとの高い密着力が得られる。また、複数の
ワークに中性コロイダルパラジウム処理を行う場合に、
Al合金が溶解して中性コロイダルパラジウム処理液が
劣化することがないので同じ液を繰り返し使用すること
ができ、生産性に優れる。[0008] Comparing the adhesion strength of the plating film to the test piece of Test Example 1 and Comparative Example 1, Test Example 1 has a higher adhesion strength. Therefore, when forming a plating film on a work made of an Al-based composite material, by performing a neutral colloidal palladium treatment and then performing a plating treatment, a plating film is formed on the entire surface of the work and performing an acidic palladium treatment. As a result, a plating film having higher adhesion can be obtained. Since the Al alloy in the Al-based composite material dissolves in the acidic palladium treatment solution, the Al alloy in the Al-based composite material does not dissolve in the neutral colloidal palladium aqueous solution, so that the plating film and the workpiece have high Adhesion is obtained. Also, when performing neutral colloidal palladium treatment on multiple workpieces,
Since the neutralized colloidal palladium treatment liquid does not deteriorate due to the dissolution of the Al alloy, the same liquid can be used repeatedly, resulting in excellent productivity.
【0009】つぎに、本発明の第2実施例を説明する。
本発明の第2実施例のめっき処理方法は、中性コロイダ
ルパラジウム処理を施す前に亜鉛置換処理を行う工程を
加えていることが、上記の第1実施例とは異なる。な
お、亜鉛置換処理としては、亜鉛を水酸化ナトリウムや
水酸化カリウム等の強アルカリ性溶液に溶解させた亜鉛
ジンケート浴を一般的に用い、ワーク表面をエッチン
グ、酸洗により活性化させた後に行う。なお、亜鉛ジン
ケート浴に錯化剤とともに鉄やニッケルを少量混在させ
た亜鉛合金浴を用いてもよい。本発明の第2実施例のめ
っき処理方法では、とくにワークが酸性液中で溶解しや
すく、かつ表面に酸化膜を形成しやすい金属、たとえば
アルミニウム、アルミニウム合金、マグネシウム、マグ
ネシウム合金、銅、銅合金などを含む場合に、ワークと
の密着力が優れるめっき膜が得られる。Next, a second embodiment of the present invention will be described.
The plating method according to the second embodiment of the present invention is different from the first embodiment in that a step of performing a zinc substitution treatment before applying a neutral colloidal palladium treatment is added. Note that the zinc substitution treatment is generally performed using a zinc zincate bath in which zinc is dissolved in a strongly alkaline solution such as sodium hydroxide or potassium hydroxide, and after activating the work surface by etching and pickling. A zinc alloy bath in which a small amount of iron or nickel is mixed with a complexing agent in a zinc zincate bath may be used. In the plating method according to the second embodiment of the present invention, in particular, a metal in which a work is easily dissolved in an acidic liquid and an oxide film is easily formed on the surface, for example, aluminum, aluminum alloy, magnesium, magnesium alloy, copper, copper alloy In such a case, a plating film having excellent adhesion to a workpiece can be obtained.
【0010】図1中に、試験例1に用いたテストピース
と同じテストピースに、エッチング、酸洗、亜鉛置換処
理を施した後、試験例1のテストピースに施した処理と
同様の処理を施して、形成されためっき膜の密着強さを
測定した結果を試験例2として示す。密着強さは試験例
1と同様にはんだ付け引張試験法により測定した。めっ
き膜ははんだ強度以上の高い密着力を有しており、引っ
張り試験中にはんだが割れるほどであった。In FIG. 1, the same test piece as the test piece used in Test Example 1 is subjected to etching, pickling, and zinc substitution, and then the same processing as that performed to the test piece in Test Example 1 is performed. The result of measuring the adhesion strength of the plated film thus formed is shown as Test Example 2. The adhesion strength was measured by the soldering tensile test method as in Test Example 1. The plating film had a high adhesive strength equal to or higher than the solder strength, and the solder cracked during the tensile test.
【0011】試験例1と試験例2のめっき膜のテストピ
ースへの密着強さを比較すると、試験例2のほうが密着
強さが高い。したがって、Al基複合材からなるワーク
にめっき膜を形成する場合には、亜鉛置換処理を行いワ
ーク表面に形成された酸化皮膜を亜鉛に置換した後に中
性コロイダルパラジウム処理を行うことにより、中性コ
ロイダルパラジウム処理を単独で行う場合に比べて密着
性の高いめっき膜が得られることがわかる。[0011] Comparing the adhesion strength of the plating films of Test Example 1 and Test Example 2 to the test piece, Test Example 2 has higher adhesion strength. Therefore, when a plating film is formed on a work made of an Al-based composite material, a neutral colloidal palladium treatment is performed after performing a zinc substitution treatment to replace an oxide film formed on the work surface with zinc. It can be seen that a plating film having higher adhesion can be obtained as compared with the case where the colloidal palladium treatment is performed alone.
【0012】また、図1中に、試験例3として母材がM
g、強化材がZrO2 であるMg基複合材からなるテス
トピースに対して、試験例2に示しためっき方法と同様
な方法のめっき処理を施して、形成されためっき膜の密
着強さを測定した結果を示す。めっき膜はテストピース
全面に形成されていた。試験例3より、Mg基複合材か
らなるワークに対しても、本発明の実施例のめっき方法
により高い密着力を有するめっき膜を形成できることが
わかる。FIG. 1 shows that the base material was M
g. A test piece made of a Mg-based composite material whose reinforcing material is ZrO 2 is subjected to plating treatment in the same manner as the plating method shown in Test Example 2 to reduce the adhesion strength of the formed plating film. The result of the measurement is shown. The plating film was formed on the entire test piece. Test Example 3 shows that a plating film having high adhesion can be formed by the plating method of the embodiment of the present invention even on a work made of an Mg-based composite material.
【0013】上記試験例1〜3では、テストピース全体
が金属基複合材である場合を例にしているが、一部が金
属基複合材からなり残部が金属材からなるテストピース
に対しても、本発明の第1実施例、第2実施例に示すめ
っき処理を施すことにより、テストピースの全面に密着
性に優れためっき膜が容易に得られる。具体的には、試
験例1と同様な方法で高圧鋳造を行ったあと、素形材か
らわざとAl合金部分を残して切り出し、図2に示すよ
うな、一部がAl/SiC複合材で残部がAl合金材の
みからなるテストピースを作成し、試験例2と同様な方
法でめっき処理を施し、形成されためっき膜の密着強さ
を測定した。めっき膜の密着強さは、テストピースのA
l合金材上に形成されためっき膜と、複合材上に形成さ
れためっき膜の両方を測定した。その結果、Al合金材
上に形成されためっき膜の密着強さは図1の試験例4に
示すとおり高く、複合材上に形成されためっき膜の密着
強さは図1の試験例2と同じであり、テストピース全面
に密着性に優れためっき膜が形成されていることがわか
る。また、金属材と非導電性材(たとえば、セラミック
ス材)を結合させたワークに対しても、本発明の実施例
のめっき処理を施すことにより、ワーク全面に密着性に
優れためっき膜が容易に得られる。In Test Examples 1 to 3, the case where the entire test piece is made of a metal-based composite material is taken as an example. However, a test piece in which a part is made of a metal-based composite material and the remainder is made of a metal material is also used. By performing the plating treatment shown in the first and second embodiments of the present invention, a plating film having excellent adhesion can be easily obtained on the entire surface of the test piece. Specifically, after high-pressure casting was performed in the same manner as in Test Example 1, an aluminum alloy portion was intentionally cut out from the cast material, and a portion was partially formed of an Al / SiC composite material as shown in FIG. A test piece made of only an Al alloy material was prepared, plated in the same manner as in Test Example 2, and the adhesion strength of the formed plating film was measured. The adhesion strength of the plating film depends on the test piece A
Both the plating film formed on the alloy material and the plating film formed on the composite material were measured. As a result, the adhesion strength of the plating film formed on the Al alloy material was high as shown in Test Example 4 in FIG. 1, and the adhesion strength of the plating film formed on the composite material was higher than that of Test Example 2 in FIG. This is the same, and it can be seen that a plating film having excellent adhesion is formed on the entire surface of the test piece. Also, by applying the plating treatment of the embodiment of the present invention to a work in which a metal material and a non-conductive material (for example, a ceramic material) are combined, a plating film having excellent adhesion can be easily formed on the entire surface of the work. Is obtained.
【0014】[0014]
【発明の効果】請求項1のめっき処理方法によれば、金
属材と、非導電性材とカーボンの少なくとも1種と、を
含むワークとの密着性が高いめっき膜が得られる。請求
項2のめっき処理方法によれば、請求項1のめっき処理
方法により得られるめっき膜より、金属材と、非導電性
材とカーボンの少なくとも1種と、を含むワークとの密
着性が高いめっき膜が得られる。According to the plating method of the first aspect, it is possible to obtain a plating film having high adhesion to a work containing a metal material, a non-conductive material and at least one of carbon. According to the plating method of the second aspect, the adhesion between the metal material and the work containing at least one of the non-conductive material and carbon is higher than the plating film obtained by the plating method of the first aspect. A plating film is obtained.
【図面の簡単な説明】[Brief description of the drawings]
【図1】本発明の全実施例にかかわるテストピースへの
めっき膜の密着強さを示すグラフである。FIG. 1 is a graph showing the adhesion strength of a plating film to a test piece according to all examples of the present invention.
【図2】本発明の実施例にかかわり、試験例4に用いる
テストピースの概略図である。FIG. 2 is a schematic view of a test piece used in Test Example 4 according to the embodiment of the present invention.
Claims (2)
くとも1種と、を含むワークに中性コロイダルパラジウ
ム処理を行う工程と、 めっき処理を行う工程と、からなるワークへのめっき処
理方法。1. A method of plating a work, comprising: a step of performing a neutral colloidal palladium treatment on a work including a metal material, a non-conductive material and at least one of carbon; and a step of performing a plating treatment. .
くとも1種と、を含むワークに亜鉛置換処理を行う工程
と、 中性コロイダルパラジウム処理を行う工程と、 めっき処理を行う工程と、からなるワークへのめっき処
理方法。2. A step of performing a zinc substitution treatment on a work including a metal material, a non-conductive material and at least one of carbon, a step of performing a neutral colloidal palladium treatment, a step of performing a plating treatment, Plating method for workpieces consisting of
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1003398A JPH11209879A (en) | 1998-01-22 | 1998-01-22 | Workpiece plating method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1003398A JPH11209879A (en) | 1998-01-22 | 1998-01-22 | Workpiece plating method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH11209879A true JPH11209879A (en) | 1999-08-03 |
Family
ID=11739087
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1003398A Pending JPH11209879A (en) | 1998-01-22 | 1998-01-22 | Workpiece plating method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH11209879A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6737173B2 (en) | 2002-03-29 | 2004-05-18 | Dowa Mining Co., Ltd. | Pretreating method before plating and composites having a plated coat |
| JP2004190042A (en) * | 2002-03-05 | 2004-07-08 | Daiwa Fine Chemicals Co Ltd (Laboratory) | Pretreatment solution for providing catalyst for electroless plating, pretreatment method using the solution, and electroless plated film and/or plated object produced by use of the method |
| WO2004067796A1 (en) * | 2003-01-23 | 2004-08-12 | H.C. Starck Inc. | Pre-plating surface treatments for enhanced galvanic-corrosion resistance |
-
1998
- 1998-01-22 JP JP1003398A patent/JPH11209879A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004190042A (en) * | 2002-03-05 | 2004-07-08 | Daiwa Fine Chemicals Co Ltd (Laboratory) | Pretreatment solution for providing catalyst for electroless plating, pretreatment method using the solution, and electroless plated film and/or plated object produced by use of the method |
| US6737173B2 (en) | 2002-03-29 | 2004-05-18 | Dowa Mining Co., Ltd. | Pretreating method before plating and composites having a plated coat |
| WO2004067796A1 (en) * | 2003-01-23 | 2004-08-12 | H.C. Starck Inc. | Pre-plating surface treatments for enhanced galvanic-corrosion resistance |
| US7368176B2 (en) | 2003-01-23 | 2008-05-06 | H.C. Starck Inc. | Pre-plating surface treatments for enhanced galvanic-corrosion resistance |
| US7645494B2 (en) | 2003-01-23 | 2010-01-12 | H.C. Starck Inc. | Pre-plating surface treatments for enhanced galvanic-corrosion resistance |
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