JPH11194212A - Color filter substrate, method of manufacturing the same, and liquid crystal element using the substrate - Google Patents

Abstract

(57) [Summary] [Problem] To support higher reliability and higher definition display,
Provided is a method for manufacturing a color filter substrate that also takes into consideration the health of workers. SOLUTION: The step of applying a colored ink to an ink receiving layer by an inkjet method or the step of applying a curable colored ink on a supporting substrate by an inkjet method is performed at a temperature of 20 to 30 ° C. and a humidity of 35% to 54%. In the environment described above to manufacture a color filter substrate.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a color filter substrate suitably used for a color liquid crystal display used in a color television, a personal computer, a pachinko game console, and the like, and a method of manufacturing the same. The present invention relates to a color filter substrate manufactured by using the same and a method for manufacturing the same, and further relates to a liquid crystal element formed using the color filter substrate.

[0002]

2. Description of the Related Art In recent years, the development of personal computers,
In particular, with the development of portable personal computers, the demand for liquid crystal displays, especially color liquid crystal displays, tends to increase. However, for further widespread use, it is necessary to reduce the cost of the liquid crystal display. In particular, there is an increasing demand for reducing the cost of a color filter having a high cost. Conventionally, various methods have been tried to satisfy the above requirements while satisfying the required characteristics of the color filter, but no method has yet been established that satisfies all the required characteristics. The respective methods will be described below.

The first method most frequently used is a dyeing method. In the dyeing method, a water-soluble polymer material, which is a material for dyeing, is applied on a glass substrate, and is patterned into a desired shape by a photolithography process. Get a pattern. By repeating this three times, R (red), G
(Green) and B (blue) coloring layers are formed.

As another example of this dyeing method, Japanese Patent Application Laid-Open No.
No. 88913 describes a method of providing a photosensitive layer on a substrate, pattern-exposing the photosensitive layer, and then dyeing the unexposed portion. This process is repeated three times to obtain three colors of R, G, and B. A method for producing such a color filter is described.

[0005] A second method is a pigment dispersion method, which is recently replacing the dyeing method. In this method, a photosensitive resin layer in which a pigment is dispersed is formed on a substrate, and a monochromatic pattern is obtained by patterning the photosensitive resin layer. By repeating this step three times, R, G, and B colored layers are formed.

A third method is an electrodeposition method. In this method, a transparent electrode is patterned on a substrate, and immersed in an electrodeposition coating solution containing a pigment, a resin, an electrolytic solution, and the like to electrodeposit a first color. This process is repeated three times to form R, G, and B colored layers, and finally firing.

A fourth method is to disperse a pigment in a thermosetting resin and repeat printing three times to obtain R,
After separately applying G and B, the resin is thermally cured to form a colored layer.

[0008] In any method, a protective layer is generally formed on the colored layer.

The common features of these methods are R,
In order to color the three colors G and B, the same process needs to be repeated three times, which increases the cost. In addition, there is a problem that the yield decreases as the number of steps increases. Further, in the electrodeposition method, since the pattern shape that can be formed is limited, it is difficult to apply the current technology for TFT. Further, the printing method is not suitable for forming a fine pitch pattern due to poor resolution and smoothness.

[0010]

SUMMARY OF THE INVENTION In order to solve the above problems, Japanese Patent Application Laid-Open Nos. 59-75205 and 63-23 are disclosed.
JP-A-5901 and JP-A-1-217320 disclose a method of manufacturing a color filter using an ink jet method.

An object of the present invention is to provide a method of manufacturing a color filter substrate using the ink jet system, which method has a higher reliability and is compatible with high-definition display. Another object of the present invention is to provide a liquid crystal element capable of performing better color display.

[0012]

The present invention firstly provides a method for manufacturing a color filter substrate having at least a color filter layer on a support substrate, the method comprising forming an ink receiving layer on the support substrate, In the step of forming a color filter layer by applying a color ink to the layer by an ink-jet method and coloring the layer into a predetermined color pattern, at least the step of applying the color ink to the ink receiving layer is performed at a humidity of 35%.
The present invention provides a method for manufacturing a color filter substrate, which is performed in an environment of about 54% and a temperature of 20 to 30 ° C.

The present invention also provides a method of manufacturing a color filter substrate having at least a color filter layer on a support substrate, comprising forming a partition portion on the support substrate and forming the partition portion along a predetermined coloring pattern. In the step of applying a curable colored ink by an inkjet method to a region surrounded by the portion and curing the same to form a color filter layer, at least the step of applying the curable colored ink is performed at a humidity of 3%.
An object of the present invention is to provide a method for manufacturing a color filter substrate, which is performed in an environment of 5 to 54% at a temperature of 20 to 30 ° C.

[0014] The present invention thirdly provides a color filter substrate characterized by being produced by the above-mentioned production method of the present invention.
A liquid crystal element having liquid crystal sandwiched between a pair of substrates,
Another object of the present invention is to provide a liquid crystal element characterized in that one of the substrates is formed using the color filter substrate of the present invention.

In the present invention, the step of applying the coloring ink to the ink receiving layer by the ink jet method or the step of applying the curable coloring ink to the supporting substrate by the ink jet method is performed at a humidity of 35 to 54% and a temperature of 20 to 30%. Performing in a specific environment of ° C. has the following effects.

(1) Spreading and bleeding of the colored ink are easily controlled, and color mixing, color unevenness, and white spots between adjacent pixels of different colors are less likely to occur.

(2) Problems such as a decrease in the surface smoothness of the color filter layer and a decrease in the light transmittance due to the aggregation of the coloring ink are less likely to occur.

(3) The above environment does not affect the worker's health.

Hereinafter, the above operations will be described in more detail.

(1) In the step of applying colored ink by the ink jet method, the spread and bleeding of the colored ink are affected by the surrounding humidity and temperature. For example, when the humidity is less than 35% in the step of applying the colored ink to the ink receiving layer, the solvent of the colored ink evaporates before the colored ink is absorbed by the ink receiving layer, and as a result, the spread of the colored ink is increased. It becomes smaller and white spots are more likely to occur. On the other hand, when the humidity exceeds 54%, bleeding easily occurs, and color mixing between adjacent pixels easily occurs.

Also, the effect of temperature is not as great as humidity,
When the temperature is higher than 30 ° C., the ink receiving capacity of the ink receiving layer decreases due to the progress of curing due to the temperature increase, and as a result, the spread of the colored ink becomes small, and white spots are easily generated. On the other hand, when the temperature is lower than 20 ° C., bleeding easily occurs, and color mixing between adjacent pixels easily occurs.

In the step of applying the curable coloring ink on the support substrate, at a low humidity of less than 35%, the solvent of the curable coloring ink evaporates, and the colored ink does not sufficiently spread to a predetermined area. White spots are likely to occur.

(2) Even when the ink receiving layer is colored,
Even when a curable coloring ink is applied, the aggregation of the coloring material in the coloring ink used depends on the temperature, humidity, and particularly humidity. For example, when the humidity exceeds 54%, the coloring material in the coloring ink easily aggregates, and the aggregated particles become large particles. As a result, there is a problem that the surface smoothness of the color filter layer decreases and the light transmittance decreases. Easy to occur.

(3) When the temperature exceeds 30 ° C. and the humidity exceeds 54%, ordinary workers feel discomfort,
It cannot withstand continuous work over a long period of time. In addition, dehydration may occur when performing long-term continuous operation at a temperature of 35 ° C. or more or a humidity of less than 35%. Therefore, the working environment has a temperature of 20 to
It is necessary to set the temperature in the range of 30 ° C. and the humidity of 35% to 54%.

Further, it is preferable to work in a clean room of class 1000 or less.

[0026]

FIG. 1 is a schematic partial cross-sectional view of an embodiment of the color filter substrate of the present invention. In the present embodiment, a color filter layer is formed by coloring an ink receiving layer with a coloring ink. In the figure, 1 is a support substrate, 2 is a black matrix, 5 is a color filter layer, and 3 is a non-colored portion. 4 colored portions. 6 is a protective layer.

FIG. 2 is a schematic partial cross-sectional view of one embodiment of a color filter substrate having a color filter layer formed by curing a curable coloring ink. Although the reference numerals in the drawing are the same as those in FIG. 1, in the present embodiment, the color filter layer 5 is composed of only a colored portion.

The manufacturing process of the color filter substrate of FIG. 1 will be described with reference to FIG. Note that (a) to (f) in FIG. 3 are schematic partial cross-sectional views corresponding to the following steps a to f, respectively.

Step-a A black matrix 2 is formed on the support substrate 1 which has been cleaned by a conventional method, if necessary. As the support substrate 1 used in the present invention, a glass substrate is usually used, but a plastic substrate or the like can also be used as long as it satisfies required characteristics such as transparency and strength as a color filter substrate. When a reflective liquid crystal element is formed, an opaque substrate provided with a reflective member or the like may be used.

In the color filter substrate of the present invention, a black matrix 2 or a black stripe may be formed as a light shielding layer for shielding the gap between adjacent pixels. Such a light-shielding layer is formed by depositing a metal such as chromium by sputtering or vapor deposition and patterning it into a predetermined shape, and its film thickness is usually about 0.1 to 0.5 μm. Alternatively, a colored resin composition or the like can be used. Further, the light-shielding layer can be formed on the color filter layer.

Step-b: An ink receiving layer 31 is formed on the entire surface of the support substrate 1. The coating method is as follows. A coating liquid prepared by dissolving or dispersing the material of the ink receiving layer in an appropriate solvent is applied by spin coating, roll coating, bar coating, spray coating, dip coating, etc., and oven, hot plate The solvent is evaporated by baking such as to form a film.
The thickness depends on the type of the coloring ink to be used, the applied amount, the method of use, and the like, but is suitably 0.1 to 20 μm.

The material of the ink receiving layer 31 used in the present invention needs to have an ink receiving ability, an excellent dot definition, and an excellent transparency. Process resistance such as adhesion to the layer 6 and heat resistance is also required. In addition, a non-colored portion 3 having no ink receiving ability is formed by a material that expresses (or improves) or loses (or decreases) the ink receiving ability by light irradiation or light irradiation and heating, and forms a non-colored portion 3 having no ink receiving ability by pattern exposure described later. It is desirable to prevent color mixing between the colored portions 4.

As such a material, a resin which is cured by light irradiation or light irradiation and heating to lose or reduce the ink receiving ability is preferably used. For example, acrylic resin, epoxy resin, silicone resin, hydroxy resin, etc. Examples thereof include cellulose derivatives such as propylcellulose, hydroxyethylcellulose, methylcellulose, and carboxymethylcellulose, and modified products thereof.

A photo-initiator (cross-linking agent) is used to promote the cross-linking reaction of these resins by light irradiation or light irradiation and heating.
Can also be used. As the photoinitiator, a dichromate, a bis azide compound, a radical initiator, a cationic initiator, an anionic initiator and the like can be used. Further, these photoinitiators can be used as a mixture or in combination with another sensitizer. In the case of curing by light irradiation, heat treatment may be performed after light irradiation in order to further promote the crosslinking reaction.

The ink receiving layer formed using the above resin has excellent heat resistance and water resistance, and can sufficiently withstand a high temperature or a washing step in a later step.

Step-c Using the photomask 32, the ink receiving layer 31 is subjected to pattern exposure in combination with appropriate heat treatment to form the non-colored portion 3. In order to enhance the effect of preventing color mixing between adjacent colored portions at the time of applying colored ink described later, it is desirable to apply a component that causes the non-colored portion 3 to exhibit ink repellency to the ink receiving layer 31. .

As shown in FIG. 3, when the non-colored portion 3 is formed, the non-colored portion 3 is formed at a position overlapping the black matrix 2, and is formed so as to be narrower than the width of the black matrix 2. In addition, a colored portion 4 described later is formed so as to extend to a position overlapping the black matrix 2, thereby preventing white spots.

In the present invention, it is also possible to color only a predetermined area without forming a non-colored portion.

Step-d According to a predetermined coloring pattern, the ink jet head 3
3, the colored inks 34 of R (red), G (green), and B (blue) are applied to the unexposed portions of the ink receiving layer 31. In the present invention, at least the step is performed at a temperature of 20 to 30.
It is performed in an environment at a temperature of 35 ° C. and a humidity of 35 to 54%.

The coloring ink 34 used in the present invention can be used in both a pigment type and a pigment type. Usually, in the ink jet method, the coloring ink is adjusted to an appropriate temperature range and discharged. Anything that can be used can be used.

In the present invention, as the ink jet system, a bubble jet type using an electrothermal converter or a piezo jet type using a piezoelectric element can be used as an energy generating element. It can be set arbitrarily.

Step-e The necessary process such as light irradiation and heat treatment is performed to cure the entire ink receiving layer, thereby forming a color filter layer including the colored portion 4 and the colored portion 3.

Step-f If necessary, a protective layer 6 is formed on the color filter layer. As the protective layer 6, a resin composition layer of a photo-curing type, a thermosetting type, or a combination of light and heat, or an inorganic film formed by vapor deposition, sputtering, or the like can be used. Specifically, a thermosetting acrylic resin or epoxy resin is preferably used. Preferred film thickness is 0.1 to
10 μm. In any case, any material can be used as long as it has transparency as a color filter substrate and can withstand the subsequent ITO forming step, alignment film forming step, and the like.

FIG. 5 shows an embodiment of a TFT color liquid crystal device incorporating the color filter substrate of the present embodiment.
In FIG. 5, 52 is a common electrode, 53 is an alignment film, 61 is a counter substrate, 62 is a pixel electrode, 63 is an alignment film, and 54 is a liquid crystal compound.

The color liquid crystal element is generally formed by combining a color filter substrate and a counter substrate 61 and enclosing a liquid crystal compound 54. TFTs (not shown) and transparent pixel electrodes 62 are formed in a matrix inside one substrate 61 of the liquid crystal element. Further, inside the other substrate 1, R and R are provided at positions facing the pixel electrodes 62.
The colored portions 4 of the color filter layer 5 so that G and B are arranged.
Is provided, and a transparent common electrode 52 is formed on one surface thereof. The black matrix 2 is usually formed on the color filter substrate side, but is formed on the opposite TFT substrate side in a BM-on-array type liquid crystal element. Further, alignment films 53 and 63 are formed in the planes of both substrates, and by subjecting them to rubbing treatment, liquid crystal molecules can be arranged in a certain direction. These substrates are disposed to face each other via a spacer (not shown), are adhered to each other with a sealing material (not shown), and the gap is filled with the liquid crystal compound 54.

The above-mentioned liquid crystal element is usually of a transmissive type.
A display is displayed by bonding a polarizing plate to the outside of each substrate and generally using a backlight that combines a fluorescent lamp and a scattering plate, and using a liquid crystal compound as an optical shutter that changes the transmittance of the backlight. Do.

In the above embodiment, a TFT type liquid crystal element has been described, but the present invention is not limited to this, and is preferably applied to other driving type liquid crystal elements such as a simple matrix type.

Further, in the liquid crystal element of the present invention, as long as it is constituted by using the color filter substrate of the present invention, the conventional technique can be used as it is for the other members. Therefore, as a liquid crystal compound, a TN type liquid crystal, a ferroelectric liquid crystal, or the like generally used can be used.

Next, a process of manufacturing the color filter substrate shown in FIG. 2 will be described with reference to FIG. (A) to (d) in FIG. 4 are schematic partial cross-sectional views corresponding to a to d in the following steps.

Step-a First, a partition is formed on the support substrate 1. The partition portion is a member for avoiding color mixture between inks of different colors adjacent to each other when a curable coloring ink described later is applied. In the present embodiment, the black matrix 2 also serves as a light shielding layer. Depending on the coloring pattern, black stripes are also possible. As such a light-shielding layer, a black pigment-containing resist is preferably used, and is patterned by a general photolithography method. The black matrix 2 is preferably provided with ink repellency in order to prevent color mixing between adjacent different inks when a curable coloring ink described later is applied. In the present invention, the thickness of the black matrix 2 is preferably 0.5 μm or more in consideration of the partition wall function and the light shielding function.

Step-b According to a predetermined coloring pattern, the ink jet head 3
3, the curable colored ink 41 of each color of R, G, B is applied so as to fill the opening of the black matrix 2. In the present invention, at least the step is performed at a temperature of 2
It is performed in an environment of 0 to 30 ° C and a humidity of 35 to 54%.

The curable coloring ink used in the present invention is composed of, for example, a curable resin composition and contains at least a coloring material and a resin which is cured by applying energy.

As the coloring material, dyes such as direct dyes, acid dyes, reactive dyes, disperse dyes and oil-soluble dyes are preferably used. As the resin that is cured by applying energy, for example, a resin that is cured by heating, light irradiation, or a combination thereof is preferable. As the thermosetting resin, for example, a combination of a known resin and a crosslinking agent can be used. Specifically, melamine resin, hydroxyl or carboxyl group-containing polymer and melamine, hydroxyl or carboxyl group-containing polymer and polyfunctional epoxy compound, hydroxyl or carboxyl group-containing polymer and cellulose reaction type compound, epoxy resin and resol type resin, epoxy Examples include resins and amines, epoxy resins and carboxylic acids or acid anhydrides, and epoxy compounds. As the photocurable resin, for example, a commercially available negative resist is preferably used.

The curable coloring ink according to the present invention includes:
Various solvents can be used, and a mixed solvent of water and a water-soluble organic solvent is preferably used from the viewpoint of dischargeability in an ink jet method.

In addition to the above components, a surfactant, an antifoaming agent, a preservative, and the like can be added in order to give desired properties if necessary. It can also be added.

Further, among the above-mentioned resins, a solvent other than water or a water-soluble organic solvent may be used as long as it can be stably ejected even if the resin is not dissolved in water or a water-soluble organic solvent. In particular, in the case of a resin that is polymerized by light, a solventless type in which a dye is dissolved in a monomer can also be used.

Step-c If necessary, the color filter layer 5 is obtained by curing the curable colored ink by subjecting it to drying, heating, light irradiation and the like.

Step-d Similarly to the step of FIG. 3 described above, a protective layer 6 is formed if necessary.

Also with the color filter substrate shown in FIG. 2, the liquid crystal element shown in FIG. 5 can be formed in the same manner as in the embodiment of FIG.

In the present invention, as described above,
At least the step of applying the coloring ink and the curable coloring ink by the inkjet method is performed at a temperature of 20 to 30 ° C. and a humidity of 3
Although it is performed under an environment of 5 to 54%, it is preferable that the other steps are also performed under the environment from the viewpoint of worker health. Specifically, it is desirable that the ink receiving layer coating step, the pattern exposure step of the ink receiving layer, the protective layer coating step, and the like be performed in the above environment.

[0061]

[Example 1] A glass substrate ("7059" manufactured by Corning Incorporated) was washed by a conventional method, and a glass substrate having a thickness of 0.
2 μm of chromium was deposited and patterned to form a black matrix. On top of that, as an ink receiving layer,
Hydroxypropyl cellulose (Nippon Soda Co., Ltd. “HPC
-L ”) was dried by a roll coater method to a dry film thickness of 5
The coating was performed to a thickness of μm, and baking was performed in an oven at 120 ° C. for 3 minutes.

According to a predetermined coloring pattern, the ink receiving layer is colored by applying a colored ink of each of the following compositions by an ink jet recording apparatus of the type in which the ink is foamed by thermal energy and ejected to form a color filter layer. did.

(Colored ink composition) Dye 5 parts by weight Ethylene glycol 10 parts by weight Isopropyl alcohol 3 parts by weight Deionized water 82 parts by weight I. Acid Red 118, G:
C. I. Acid Green 25, B: C.I. I. Acid Blue 113 was used.

Thereafter, baking was performed at 200 ° C. for 30 minutes to cure the entire ink receiving layer.

A thermosetting resin (“Hi-Coat LC-2001” manufactured by Sanyo Kasei Co., Ltd.) is applied on the color filter layer by a spinner so as to have a dry film thickness of 0.5 μm. 30 minutes pre-baking at 200 ° C for 30 minutes
This baking was performed for a minute to form a protective layer.

All of the above steps were performed in an environment at a temperature of 25 ° C. and a humidity of 45%, except that the heating step was performed in an oven.

When the obtained color filter substrate was observed with an optical microscope, no problems such as color mixing, color unevenness, color omission, and aggregation of the coloring material on the surface were observed. The worker's health was also good.

Example 2 Example 1 was the same as Example 1 except that an acrylic-silicone graft polymer (“CYMAC US-450” manufactured by Toagosei Co., Ltd.) was used instead of hydroxypropyl cellulose. As above, except that the predetermined heating step is performed in an oven,
All tests were performed in an environment at a temperature of 23 ° C. and a humidity of 40%.

When the obtained color filter substrate was observed with an optical microscope, no problems such as color mixing, color unevenness, color omission, and aggregation of the coloring material on the surface were observed. The worker's health was also good.

Example 3 A black pigment resist (“BK-739P” manufactured by Nippon Steel Chemical Co., Ltd.) was applied on a glass substrate by spin coating, and a black matrix having a thickness of 1.0 μm was formed by exposure, development and heat treatment. did.

Acrylic polymer having the following composition
10 parts by weight and N-methylol acrylamide 20 parts by weight Methyl methacrylate 25 parts by weight 2-hydroxyethyl methacrylate 50 parts by weight Acrylic acid 5 parts by weight Triphenylsulfonium trifluoromethylsulfonate 0.2 parts by weight ("TPS-" manufactured by Midori Kagaku KK) 10
5)), a composition having an aqueous ink-accepting ability and capable of lowering the ink-accepting ability of a portion irradiated with light by light irradiation is prepared, and spin-coated on the glass substrate;
Pre-baking for an ink receiving layer was performed. The film thickness was 1 μm.

Next, the ink receiving layer is pattern-exposed through a photomask having an opening narrower than the black matrix, and further exposed to a hot plate for 12 hours.
Baking was performed at 0 ° C. for 60 seconds to reduce the ink receptivity of the exposed portions.

After the same colored ink as in Example 1 was applied to the unexposed portion of the ink receiving layer according to a predetermined coloring pattern and colored, the ink was dried at 90 ° C. for 5 minutes.
Subsequently, the entire ink receiving layer was cured by a heat treatment at 230 ° C. for 1 hour to form a color filter layer.

In the above steps, except that the heating step was performed in an oven or on a hot plate,
The test was performed in an environment at a temperature of 45 ° C. and a humidity of 45%.

When the obtained color filter substrate was observed with an optical microscope, no problems such as color mixing, color unevenness, color loss, and aggregation of the coloring material on the surface were observed. The worker's health was also good.

Example 4 In Example 3, an ink receiving layer was formed by using a composition comprising polyvinylpyrrolidone and a bisazide compound (photoinitiator), which reduced the ink absorption capacity of the portion irradiated with light by light irradiation. A color filter substrate was manufactured in the same manner as in Example 3 except for performing the above.

All of the above steps were performed in an environment at a temperature of 27 ° C. and a humidity of 52%, except that the heating step was performed in an oven.

When the obtained color filter substrate was observed with an optical microscope, no problems such as color mixing, color unevenness, color omission, and aggregation of the coloring material on the surface were observed. The worker's health was also good.

Example 5 A black pigment resist (“CK-S171B” manufactured by Fuji Hunt) was applied on a glass substrate by spin coating, and a black matrix having a thickness of 1.0 μm was formed by exposure, development, and heat treatment. Formed.

A curable colored ink having the following composition was applied to the openings of the black matrix using an ink jet recording apparatus.

(Composition of Curable Coloring Ink) Dye 5 parts by weight Acrylic copolymer having the following composition 5 parts by weight N-methylolacrylamide 20 parts by weight N, N-dimethylaminoethyl methacrylate 10 parts by weight Methyl methacrylate 25 parts by weight 2-hydroxyethyl methacrylate 40 parts by weight Acrylic acid 5 parts by weight Ethylene glycol monoethyl ether 15 parts by weight Ethylene glycol 20 parts by weight Isopropyl alcohol 2 parts by weight Deionized water 53 parts by weight However, the dye is R: C. I. Acid Red 118, G:
C. I. Acid Green 25, B: C.I. I. Acid Blue 113 was used.

After applying the curable coloring ink, 2
Curing the ink by heat treatment at 30 ° C. for 30 minutes,
A color filter substrate was formed.

All of the above steps were performed in an environment at a temperature of 23 ° C. and a humidity of 47%, except that the heating step was performed in an oven.

When the obtained color filter substrate was observed with an optical microscope, no problems such as color mixing, color unevenness, color loss, and aggregation of the coloring material on the surface were observed. The worker's health was also good.

[Comparative Example 1] The color filter substrate of Example 1 was manufactured in an environment of a temperature of 35 ° C and a humidity of 60% except for the heating step.

When the obtained color filter substrate was observed with an optical microscope, blurring of the colored portion was large, and color mixing was observed. In addition, the worker was so tired that it was difficult to work for two hours or more continuously.

[Comparative Example 2] The color filter substrate of Example 3 was manufactured in an environment of a temperature of 35 ° C and a humidity of 65% except for the heating step.

When the obtained color filter substrate was observed with an optical microscope, bleeding of the colored portion was large, and color mixing was observed. In addition, aggregation of the coloring material occurred on the surface of the color filter layer, resulting in poor smoothness and low light transmittance. Further, the worker was tired, and it was difficult to work for two hours or more continuously.

[Comparative Example 3] The color filter substrate of Example 1 was manufactured in an environment of a temperature of 18 ° C and a humidity of 30% except for the heating step.

When the obtained color filter substrate was observed with an optical microscope, the spread of the coloring material was small, and white spots and color unevenness were observed. In addition, the worker was so tired that it was difficult to work for two hours or more continuously.

[Comparative Example 4] The color filter substrate of Example 3 was manufactured in an environment of a temperature of 35 ° C and a humidity of 30% except for the heating step.

When the obtained color filter substrate was observed with an optical microscope, the spread of the coloring material was small, and white spots and color unevenness were observed. In addition, the worker was so tired that it was difficult to work for two hours or more continuously. In addition, some workers experienced dehydration.

[Comparative Example 5] The color filter substrate of Example 3 was manufactured in an environment of a temperature of 18 ° C and a humidity of 70% except for the heating step.

When the obtained color filter substrate was observed with an optical microscope, blurring of the colored portion was large, and color mixing was observed. In addition, aggregation of the coloring material occurred on the surface of the color filter layer, resulting in poor smoothness and low light transmittance. Further, the worker was tired, and it was difficult to work for two hours or more continuously.

REFERENCE EXAMPLE A general photolithography process is used by the pigment method, except for the heating process at a temperature of 40 ° C. and a humidity of 70%.
A color filter substrate was produced under the following conditions. Specifically, on the substrate on which the black matrix is formed, apply the steps of pigment resist coating → baking → pattern exposure → development to red,
It performed about each color of green and blue.

Observation of the obtained color filter substrate with an optical microscope revealed that unevenness in film thickness caused partial unevenness in light and shade, and that the light transmittance also tended to decrease. In addition, workers were so tired that it was difficult to work for more than two hours continuously, and some of them suffered from dehydration.

[0097]

As described above, according to the present invention,
A liquid crystal with excellent color display characteristics that can produce a reliable color filter substrate with high color smoothness, high light transmittance, and high reliability without any color unevenness, color mixing, or white spots. The element can be provided at low cost.
Moreover, according to the manufacturing method of the present invention, it is possible to efficiently manufacture the color filter substrate while reducing the adverse effect on the health condition of the worker.

[Brief description of the drawings]

FIG. 1 is a schematic partial cross-sectional view of one embodiment of a color filter substrate of the present invention.

FIG. 2 is a schematic partial cross-sectional view of another embodiment of the color filter substrate of the present invention.

FIG. 3 is a manufacturing process diagram of the color filter substrate shown in FIG. 1;

FIG. 4 is a manufacturing process diagram of the color filter substrate shown in FIG. 2;

FIG. 5 is a schematic partial cross-sectional view of one embodiment of the liquid crystal element of the present invention using the color filter substrate shown in FIG.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Support substrate 2 Black matrix 3 Non-colored part 4 Colored part 5 Color filter layer 6 Protective layer 31 Ink receiving layer 32 Photomask 33 Ink jet head 34 Colored ink 41 Curable type ink 52 Common electrode 53 Alignment film 54 Liquid crystal compound 61 Opposite Substrate 62 Pixel electrode 63 Alignment film

 ────────────────────────────────────────────────── ─── Continuing on the front page (72) Inventor Masafumi Hirose 3-30-2 Shimomaruko, Ota-ku, Tokyo Inside Canon Inc.

Claims (5)

[Claims] 1. A method of manufacturing a color filter substrate having at least a color filter layer on a support substrate, comprising forming an ink receiving layer on the support substrate, and applying a color ink to the ink receiving layer by an inkjet method. In the step of forming a color filter layer by coloring in a predetermined coloring pattern, at least the step of applying the colored ink to the ink receiving layer is performed in an environment of a humidity of 35% to 54% and a temperature of 20 ° C to 30 ° C. Characteristic method for manufacturing a color filter substrate. 2. A method for manufacturing a color filter substrate having at least a color filter layer on a support substrate, wherein a partition is formed on the support substrate, and a region surrounded by the partition along a predetermined coloring pattern. In the step of forming a color filter layer by applying and curing a curable colored ink by an inkjet method, at least the step of applying the curable colored ink is performed at a humidity of 35% to 54% and a temperature of 2%.
A method for manufacturing a color filter substrate, which is performed in an environment of 0 to 30 ° C. 3. A color filter substrate having at least a color filter layer on a support substrate and manufactured by the manufacturing method according to claim 1. 4. The color filter substrate according to claim 3, further comprising a protective layer on said color filter layer. 5. A liquid crystal element having a liquid crystal sandwiched between a pair of substrates, wherein one of the substrates is formed using the color filter substrate according to claim 3. Liquid crystal element.