JPH11174459A - Spacer film for color liquid crystal display device - Google Patents
Spacer film for color liquid crystal display deviceInfo
- Publication number
- JPH11174459A JPH11174459A JP34172597A JP34172597A JPH11174459A JP H11174459 A JPH11174459 A JP H11174459A JP 34172597 A JP34172597 A JP 34172597A JP 34172597 A JP34172597 A JP 34172597A JP H11174459 A JPH11174459 A JP H11174459A
- Authority
- JP
- Japan
- Prior art keywords
- film
- liquid crystal
- photosensitive resin
- crystal display
- resin layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 125000006850 spacer group Chemical group 0.000 title claims abstract description 42
- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 30
- 229920005989 resin Polymers 0.000 claims abstract description 33
- 239000011347 resin Substances 0.000 claims abstract description 33
- 239000000758 substrate Substances 0.000 claims abstract description 28
- 125000003277 amino group Chemical group 0.000 claims abstract description 10
- 239000003999 initiator Substances 0.000 claims abstract description 4
- -1 dimethylaminoethyl group Chemical group 0.000 claims description 21
- 150000001875 compounds Chemical class 0.000 claims description 13
- 239000007864 aqueous solution Substances 0.000 claims description 7
- 150000007524 organic acids Chemical class 0.000 claims description 6
- 229920000620 organic polymer Polymers 0.000 claims description 4
- JKNCOURZONDCGV-UHFFFAOYSA-N 2-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)CCOC(=O)C(C)=C JKNCOURZONDCGV-UHFFFAOYSA-N 0.000 claims description 2
- 230000015572 biosynthetic process Effects 0.000 abstract description 2
- 229920000642 polymer Polymers 0.000 abstract description 2
- 239000002253 acid Substances 0.000 abstract 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 26
- 239000010410 layer Substances 0.000 description 23
- 239000011159 matrix material Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 9
- 230000001681 protective effect Effects 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 5
- 125000000217 alkyl group Chemical group 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 239000004743 Polypropylene Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000010030 laminating Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 229920006267 polyester film Polymers 0.000 description 3
- 229920001155 polypropylene Polymers 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- 206010034972 Photosensitivity reaction Diseases 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 230000036211 photosensitivity Effects 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 229920000098 polyolefin Polymers 0.000 description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 150000007934 α,β-unsaturated carboxylic acids Chemical class 0.000 description 2
- VZXPHDGHQXLXJC-UHFFFAOYSA-N 1,6-diisocyanato-5,6-dimethylheptane Chemical compound O=C=NC(C)(C)C(C)CCCCN=C=O VZXPHDGHQXLXJC-UHFFFAOYSA-N 0.000 description 1
- HSKPJQYAHCKJQC-UHFFFAOYSA-N 1-ethylanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2CC HSKPJQYAHCKJQC-UHFFFAOYSA-N 0.000 description 1
- 125000004206 2,2,2-trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 1
- MDKSQNHUHMMKPP-UHFFFAOYSA-N 2,5-bis(4-methoxyphenyl)-4-phenyl-1h-imidazole Chemical class C1=CC(OC)=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC(OC)=CC=2)N1 MDKSQNHUHMMKPP-UHFFFAOYSA-N 0.000 description 1
- NSWNXQGJAPQOID-UHFFFAOYSA-N 2-(2-chlorophenyl)-4,5-diphenyl-1h-imidazole Chemical class ClC1=CC=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 NSWNXQGJAPQOID-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- XIOGJAPOAUEYJO-UHFFFAOYSA-N 2-(2-methoxyphenyl)-4,5-diphenyl-1h-imidazole Chemical class COC1=CC=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 XIOGJAPOAUEYJO-UHFFFAOYSA-N 0.000 description 1
- SNFCQJAJPFWBDJ-UHFFFAOYSA-N 2-(4-methoxyphenyl)-4,5-diphenyl-1h-imidazole Chemical class C1=CC(OC)=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 SNFCQJAJPFWBDJ-UHFFFAOYSA-N 0.000 description 1
- GZYZPHPDKCTFFH-UHFFFAOYSA-N 2-(4-methylsulfanylphenyl)-4,5-diphenyl-1h-imidazole Chemical class C1=CC(SC)=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 GZYZPHPDKCTFFH-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- AXYQEGMSGMXGGK-UHFFFAOYSA-N 2-phenoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(=O)C(C=1C=CC=CC=1)OC1=CC=CC=C1 AXYQEGMSGMXGGK-UHFFFAOYSA-N 0.000 description 1
- MECNWXGGNCJFQJ-UHFFFAOYSA-N 3-piperidin-1-ylpropane-1,2-diol Chemical compound OCC(O)CN1CCCCC1 MECNWXGGNCJFQJ-UHFFFAOYSA-N 0.000 description 1
- CPHGOBGXZQKCKI-UHFFFAOYSA-N 4,5-diphenyl-1h-imidazole Chemical class N1C=NC(C=2C=CC=CC=2)=C1C1=CC=CC=C1 CPHGOBGXZQKCKI-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 description 1
- VMYMUQDQCKQELX-UHFFFAOYSA-N 5-[2-(2-fluorophenyl)phenyl]-4-phenyl-1H-imidazole Chemical class C1=CC=C(C=C1)C2=C(NC=N2)C3=CC=CC=C3C4=CC=CC=C4F VMYMUQDQCKQELX-UHFFFAOYSA-N 0.000 description 1
- YYVYAPXYZVYDHN-UHFFFAOYSA-N 9,10-phenanthroquinone Chemical compound C1=CC=C2C(=O)C(=O)C3=CC=CC=C3C2=C1 YYVYAPXYZVYDHN-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- LCFVJGUPQDGYKZ-UHFFFAOYSA-N Bisphenol A diglycidyl ether Chemical compound C=1C=C(OCC2OC2)C=CC=1C(C)(C)C(C=C1)=CC=C1OCC1CO1 LCFVJGUPQDGYKZ-UHFFFAOYSA-N 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- XXOHYUTZQHIVGK-UHFFFAOYSA-N ClC1=C(C=CC=C1)C=1NC(C(N1)(C1=CC=CC=C1)C1=CC(=CC=C1)OC)(C1=CC=CC=C1)C1=CC(=CC=C1)OC Chemical class ClC1=C(C=CC=C1)C=1NC(C(N1)(C1=CC=CC=C1)C1=CC(=CC=C1)OC)(C1=CC=CC=C1)C1=CC(=CC=C1)OC XXOHYUTZQHIVGK-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- 239000005041 Mylar™ Substances 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- IDCBOTIENDVCBQ-UHFFFAOYSA-N TEPP Chemical compound CCOP(=O)(OCC)OP(=O)(OCC)OCC IDCBOTIENDVCBQ-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- ARNIZPSLPHFDED-UHFFFAOYSA-N [4-(dimethylamino)phenyl]-(4-methoxyphenyl)methanone Chemical compound C1=CC(OC)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 ARNIZPSLPHFDED-UHFFFAOYSA-N 0.000 description 1
- MZVQCMJNVPIDEA-UHFFFAOYSA-N [CH2]CN(CC)CC Chemical group [CH2]CN(CC)CC MZVQCMJNVPIDEA-UHFFFAOYSA-N 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000008365 aromatic ketones Chemical class 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- QDVNNDYBCWZVTI-UHFFFAOYSA-N bis[4-(ethylamino)phenyl]methanone Chemical compound C1=CC(NCC)=CC=C1C(=O)C1=CC=C(NCC)C=C1 QDVNNDYBCWZVTI-UHFFFAOYSA-N 0.000 description 1
- HXTBYXIZCDULQI-UHFFFAOYSA-N bis[4-(methylamino)phenyl]methanone Chemical compound C1=CC(NC)=CC=C1C(=O)C1=CC=C(NC)C=C1 HXTBYXIZCDULQI-UHFFFAOYSA-N 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 238000011088 calibration curve Methods 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 235000015165 citric acid Nutrition 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 229920003145 methacrylic acid copolymer Polymers 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- OMNKZBIFPJNNIO-UHFFFAOYSA-N n-(2-methyl-4-oxopentan-2-yl)prop-2-enamide Chemical compound CC(=O)CC(C)(C)NC(=O)C=C OMNKZBIFPJNNIO-UHFFFAOYSA-N 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 229940059574 pentaerithrityl Drugs 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000001384 succinic acid Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Liquid Crystal (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、カラー液晶表示装
置等に用いられるスペーサーを形成するためのカラー液
晶表示装置用スペーサーフィルムに関し、詳しくは密着
性の高いカラー液晶表示装置用スペーサーフィルムに関
する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a spacer film for a color liquid crystal display for forming a spacer used in a color liquid crystal display or the like, and more particularly to a spacer film for a color liquid crystal display having high adhesion.
【0002】[0002]
【従来の技術】液晶カラーテレビ、液晶カラー表示のコ
ンピューターなどが実用化されているが、これらの液晶
表示装置は、透明電極を設けたガラス等の透明な基板を
1〜10μm程度の間隔をもうけて、その間に液晶物質
を封入し、電極間に印加した電圧により液晶物質を配向
しその濃淡により表示する仕組になっている。更に、カ
ラー表示のため、ガラスなどの光学的に透明な基板の表
面に2種以上の色相を異にする極めて微細なストライプ
状又はモザイク状のパターンを一定間隔に開けて、平行
又は交差して並べたカラーフィルタを設置している。2. Description of the Related Art Liquid crystal color televisions, computers for liquid crystal color display, and the like have been put to practical use. In these liquid crystal display devices, a transparent substrate such as glass provided with a transparent electrode is provided with an interval of about 1 to 10 μm. Then, a liquid crystal material is sealed in the meantime, the liquid crystal material is oriented by the voltage applied between the electrodes, and the density is displayed. Furthermore, for color display, two or more kinds of very fine stripe or mosaic patterns having different hues are spaced at regular intervals on the surface of an optically transparent substrate such as glass, and are parallel or intersected. Color filters are arranged.
【0003】カラーフィルタは、通常、透明基板、着色
パターン、保護膜、透明電極の順に形成されている。着
色パターンは2種以上の色相を異にする極めて微細なス
トライプ状又はモザイク状のパターンからなるものであ
る。A color filter is usually formed in the order of a transparent substrate, a colored pattern, a protective film, and a transparent electrode. The coloring pattern is composed of an extremely fine stripe or mosaic pattern having two or more different hues.
【0004】カラーフィルタを設けたガラス基板等の透
明な基板とそれに相対する透明基板との間隔を正確に保
持しないと、液晶層の厚さに差が発生し、色むらやコン
トラスト異常になる。したがって、透明基板の間隔を正
確に保持するため、スペーサーと称される3〜10μm
のシリカ、アルミナ、合成樹脂等からなる粒子を分散さ
せて用いている。If the distance between a transparent substrate such as a glass substrate provided with a color filter and the transparent substrate facing the transparent substrate is not accurately maintained, a difference occurs in the thickness of the liquid crystal layer, resulting in color unevenness and abnormal contrast. Therefore, in order to accurately maintain the distance between the transparent substrates, a spacer called 3 to 10 μm
Of silica, alumina, synthetic resin and the like are dispersed and used.
【0005】このスペーサーを均一に分散させること
は、かなり困難で、色むらのない表示装置を得る歩留り
の低下をまねいている。そこで、特開平4−22344
3号公報等に示されるように分散・投入にさまざまな工
夫がなされている。これらの根本的な解決法として、カ
ラーフィルタの着色パターン間に設けられるブラックマ
トリックスを厚くし、スペーサーとする方法(特開昭6
3−237032号公報、特開平3−184022号公
報、特開平4−122914号公報等)が提案されてい
るが、厚くする部分のブラックマトリックスを塗布によ
り形成するため、厚さの制御が困難となっている。[0005] It is extremely difficult to uniformly disperse the spacers, which leads to a decrease in the yield of a display device having no color unevenness. Therefore, Japanese Patent Application Laid-Open No.
As disclosed in Japanese Unexamined Patent Application Publication No. 3 (1999), various devices have been devised for dispersion and introduction. As a fundamental solution to these problems, a method is known in which a black matrix provided between colored patterns of a color filter is made thicker and used as a spacer (Japanese Patent Laid-Open No.
3-237032, JP-A-3-184022, JP-A-4-122914) have been proposed, but since the black matrix of the thickened portion is formed by coating, it is difficult to control the thickness. Has become.
【0006】また、着色パターンを重ねることにより、
厚さを確保しスペーサーとすることも考えられている
(特開昭63−82405号公報)が、やはり塗布によ
り行われるため、膜厚の管理が困難である。更に、重ね
ても目的の厚さならないこともあり、困難な手法となっ
ている。[0006] Further, by overlapping the colored patterns,
It is also considered to secure the thickness and use it as a spacer (Japanese Unexamined Patent Publication No. 63-82405), but it is difficult to control the film thickness because it is also applied by coating. Further, even if they are stacked, the desired thickness may not be obtained, which is a difficult method.
【0007】また、着色パターンを作る際に、ブラック
マトリックス上にも着色パターンを塗布法により形成し
スペーサーとすることも提案されている(特開昭63−
237032号公報)が、前述と同様に均一な膜厚を得
ることが困難である。It has also been proposed that, when a colored pattern is formed, a spacer is formed by forming a colored pattern on a black matrix by a coating method (Japanese Patent Application Laid-Open No. Sho 63-163).
However, it is difficult to obtain a uniform film thickness as described above.
【0008】それらを解決する方法として、支持体フィ
ルム及び感光性樹脂層を有する感光性フィルムを用い
て、スペーサーにすることが提案されている(特開平7
−325298号公報)。確かに膜厚制御が可能で、均
一なスペーサーを形成できる方法であるが、無機アルカ
リ、例えば炭酸ナトリウムなどを用いて現像するため、
そのナトリウムイオンが液晶に悪影響を及ぼし表示不良
になったり、また樹脂ブラックマトリックスやポリイミ
ド配向膜に対する密着性が低く、微細なパターンのスペ
ーサーの形成が困難であるなどの問題がある。As a method for solving these problems, it has been proposed to use a photosensitive film having a support film and a photosensitive resin layer to form a spacer (Japanese Patent Application Laid-Open No. Hei 7 (1999)).
-325298). Certainly, it is a method that can control the film thickness and can form a uniform spacer, but since it is developed using an inorganic alkali such as sodium carbonate,
The sodium ions adversely affect the liquid crystal, resulting in display failure, and have poor adhesion to the resin black matrix or polyimide alignment film, making it difficult to form spacers with fine patterns.
【0009】[0009]
【発明が解決しようとする課題】本発明は、前記した従
来の技術の問題を解消し、有機酸水溶液により現像で
き、微細パターンのスペーサーを容易に形成できる密着
性に優れた感光性のカラー液晶表示装置用スペーサーフ
ィルムを提供するものである。SUMMARY OF THE INVENTION The present invention solves the above-mentioned problems of the prior art, and can be developed with an aqueous solution of an organic acid and can form a fine pattern spacer easily. A spacer film for a display device is provided.
【0010】[0010]
【課題を解決するための手段】本発明は、2枚の基板の
間に液晶を挟持したカラー液晶表示装置の基板間隔を保
持するスペーサーを形成するために用いられる、少なく
とも支持体フィルムと有機酸水溶液で現像可能な感光性
樹脂層とからなることを特徴とするカラー液晶表示装置
用スペーサーフィルムに関する。According to the present invention, at least a support film and an organic acid are used for forming a spacer for maintaining a distance between substrates of a color liquid crystal display device in which a liquid crystal is sandwiched between two substrates. The present invention relates to a spacer film for a color liquid crystal display device, comprising a photosensitive resin layer developable with an aqueous solution.
【0011】[0011]
【発明の実施の形態】本発明におけるスペーサーフィル
ムの支持体フィルムは、特に制限がなく公知のものを使
用できるが、通常、10〜100μm程度のポリエステ
ルフィルム、例えば、帝人製テトロンフィルム、デュポ
ン社製マイラーフィルム等のポリエステルフィルムが好
ましく用いられる。BEST MODE FOR CARRYING OUT THE INVENTION The support film of the spacer film in the present invention is not particularly limited, and a known film can be used. Usually, a polyester film of about 10 to 100 μm, for example, Tetron film manufactured by Teijin, manufactured by DuPont. A polyester film such as a Mylar film is preferably used.
【0012】また、スペーサーフィルムの感光性樹脂層
は、紫外線により露光され、有機酸水溶液で現像可能な
樹脂であれば特に限定されないが、好ましくは、(A)
アミノ基を有する分子量20,000〜300,000
の有機高分子化合物、(B)少なくとも2個のエチレン
性不飽和基を有する光重合性化合物及び(C)光重合開
始剤を含有する感光性樹脂層が用いられる。感光性樹脂
層の厚さは、好ましくは4〜7μm程度である。The photosensitive resin layer of the spacer film is not particularly limited as long as it can be exposed to ultraviolet light and can be developed with an organic acid aqueous solution.
Molecular weight of 20,000 to 300,000 having an amino group
And a photosensitive resin layer containing (B) a photopolymerizable compound having at least two ethylenically unsaturated groups and (C) a photopolymerization initiator. The thickness of the photosensitive resin layer is preferably about 4 to 7 μm.
【0013】(A)アミノ基を有する分子量20,00
0〜300,000の有機高分子化合物としては、好ま
しくは一般式−NR1R2(式中R1及びR2はそれぞれ独
立に水素又は炭素数1〜4のアルキル基である)で表さ
れるアミノ基を有する化合物が用いられる。またアミノ
基の濃度は好ましくは、0.29〜1.46ミリモル/
gである。0.29ミリモル/g未満であると現像性が
低下する傾向があり、1.46ミリモル/gを超えると
耐性が低下し、レジスト表面が荒れたり、剥離が生ずる
傾向がある。アミノ基を有する分子量20,000〜3
00,000の有機高分子化合物の具体例としては、例
えば(メタ)アクリル酸アルキルエステルと(メタ)ア
クリル酸ジメチルアミノエチルエステルとの共重合体
((メタ)アクリル酸はアクリル酸又はメタクリル酸を
意味する、以下同じ。)、(メタ)アクリル酸アルキル
エステルと(メタ)アクリル酸ジメチルアミノエチルエ
ステルとこれらと共重合し得るビニルモノマーとの共重
合体等が挙げられる。(メタ)アクリル酸アルキルエス
テルとしては、例えば(メタ)アクリル酸メチル、(メ
タ)アクリル酸エチル、(メタ)アクリル酸ブチル、
(メタ)アクリル酸2−エチルヘキシル等が挙げられ
る。また、(メタ)アクリル酸アルキルエステルや(メ
タ)アクリル酸とこれらと共重合し得るビニルモノマー
としては、(メタ)アクリル酸テトラヒドロフルフリ
ル、2,2,2−トリフルオロエチル(メタ)アクリレ
ート((メタ)アクリレートはメタアクリレート又はア
クリレートを意味する、以下同じ。)、2,2,3,3
−テトラフルオロプロピル(メタ)アクリレート、アク
リルアミド、ジアセトンアクリルアミド、スチレン、ビ
ニルトルエン等が挙げられる。更に(メタ)アクリル酸
ジメチルアミノエチルエステルの替りに(メタ)アクリ
ル酸ジエチルアミノエチルエステル、(メタ)アクリル
酸ジプロピルアミノエチルエステル等も用いることがで
きる。アミノ基を有する共重合成分、例えば(メタ)ア
クリル酸ジメチルアミノエチルエステルの共重合量は、
共重合成分の合計量の10〜30重量部が好ましい。1
0重量部未満では現像が困難になり、30重量部を超え
ると現像の制御が困難になったり、形成したスペーサー
の耐湿性が劣ったりする。アミノ基を有する共重合成分
としてメタクリル酸ジメチルアミノエチルエステルは、
現像性に優れ、入手が容易な点で好ましい。(A) a molecular weight of 20,000 having an amino group
The organic polymer compound having 0 to 300,000 is preferably represented by a general formula -NR 1 R 2 (wherein R 1 and R 2 are each independently hydrogen or an alkyl group having 1 to 4 carbon atoms). A compound having an amino group is used. The concentration of the amino group is preferably from 0.29 to 1.46 mmol /
g. If it is less than 0.29 mmol / g, the developability tends to decrease, and if it exceeds 1.46 mmol / g, the resistance tends to decrease, and the resist surface tends to be roughened or peeled off. Molecular weight of 20,000 to 3 having amino group
Specific examples of the organic polymer compound of 00000 include, for example, a copolymer of an alkyl (meth) acrylate and dimethylaminoethyl (meth) acrylate (where (meth) acrylic acid is acrylic acid or methacrylic acid). And the same shall apply hereinafter), and a copolymer of (meth) acrylic acid alkyl ester, (meth) acrylic acid dimethylaminoethyl ester and a vinyl monomer copolymerizable therewith. Examples of the alkyl (meth) acrylate include methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate,
2-ethylhexyl (meth) acrylate and the like. Examples of the vinyl monomer copolymerizable with the alkyl (meth) acrylate or (meth) acrylic acid include tetrahydrofurfuryl (meth) acrylate, 2,2,2-trifluoroethyl (meth) acrylate ( (Meth) acrylate means methacrylate or acrylate, the same shall apply hereinafter.), 2,2,3,3
-Tetrafluoropropyl (meth) acrylate, acrylamide, diacetone acrylamide, styrene, vinyltoluene and the like. Further, instead of dimethylaminoethyl (meth) acrylate, diethylaminoethyl (meth) acrylate, dipropylaminoethyl (meth) acrylate and the like can also be used. The copolymerization amount of a copolymer component having an amino group, for example, dimethylaminoethyl (meth) acrylate,
The total amount of the copolymer components is preferably 10 to 30 parts by weight. 1
If the amount is less than 0 parts by weight, development becomes difficult. If the amount exceeds 30 parts by weight, development control becomes difficult, and the formed spacer has poor moisture resistance. Methacrylic acid dimethylaminoethyl ester as a copolymer component having an amino group,
It is preferable in that it has excellent developability and is easily available.
【0014】有機高分子化合物の分子量が20,000
未満では感光性樹脂層の流動性及び粘着力が顕著に増大
し、透明支持体フィルムとの密着力が強くなりすぎるた
め感光性樹脂層と透明支持体フィルムの界面で剥離しず
らい、又は不可能になる傾向があり。又は、現像液への
溶解性が極端に増大するため、露光後の感光性樹脂層の
耐現像液性の低下が激しく、レジストとして使用できな
くなる傾向がある。分子量が300,000を超えると
感光性樹脂層の流動性及び粘着力が顕著に低下し、ラミ
ネート時に基板へ張り付かない、又はフィルムを基板サ
イズに切断する際、感光性樹脂層の微小な切断くずが出
やすくなり、周辺装置の汚れの原因になるなどの問題が
生ずる傾向がある。なお、この分子量はGPC法で測定
し標準ポリスチレン検量線を用いて換算した重量平均分
子量を意味する。The molecular weight of the organic high molecular compound is 20,000.
If it is less than 10, the fluidity and adhesive strength of the photosensitive resin layer are significantly increased, and the adhesion to the transparent support film becomes too strong, so that it is difficult to peel off at the interface between the photosensitive resin layer and the transparent support film, or it is difficult to remove. Tends to be possible. Alternatively, since the solubility in a developing solution is extremely increased, the developing solution resistance of the photosensitive resin layer after the exposure is greatly reduced, and the photosensitive resin layer tends to be unusable as a resist. When the molecular weight exceeds 300,000, the fluidity and adhesive strength of the photosensitive resin layer are remarkably reduced, and the photosensitive resin layer does not stick to the substrate at the time of lamination, or when the film is cut into the substrate size, a minute cut of the photosensitive resin layer Debris tends to be generated, and there is a tendency for problems such as contamination of peripheral devices to occur. In addition, this molecular weight means the weight average molecular weight measured by the GPC method and converted using a standard polystyrene calibration curve.
【0015】(A)成分の配合量は(A)成分と(B)
成分の総量100重量部に対して好ましくは30〜70
重量部である。この配合量が30重量部未満では塗膜性
が不十分となったり、現像性が低下する傾向があり、7
0重量部を超えると硬化物の膜特性が低下する傾向があ
る。[0015] The compounding amount of the component (A) is the combination of the component (A) and the component (B).
Preferably 30 to 70 parts by weight based on 100 parts by weight of the total amount of the components.
Parts by weight. If the amount is less than 30 parts by weight, the coating properties tend to be insufficient, and the developability tends to decrease.
If the amount exceeds 0 parts by weight, the film properties of the cured product tend to deteriorate.
【0016】(B)少なくとも2個のエチレン性不飽和
基を有する光重合性化合物としては、例えば、多価アル
コールにα,β−不飽和カルボン酸を付加して得られる
化合物(トリメチロールプロパンジ(メタ)アクリレー
ト、トリメチロールプロパントリ(メタ)アクリレー
ト、テトラメチロールメタントリ(メタ)アクリレー
ト、ジペンタエリスリトールヘキサ(メタ)アクリレー
ト等)、グリシジル基含有化合物にα,β−不飽和カル
ボン酸を付加して得られる化合物(トリメチロールプロ
パントリグリシジルエーテルトリアクリレート、ビスフ
ェノールAジグリシジルエーテルジ(メタ)アクリレー
ト等)、多価カルボン酸(無水フタル酸等)と水酸基及
びエチレン性不飽和基を有する化合物(β−ヒドロキシ
エチル(メタ)アクリレート等)とのエステル化合物、
(メタ)アクリル酸のアルキルエステル((メタ)アク
リル酸メチル、(メタ)アクリル酸エチル、(メタ)ア
クリル酸ブチル、(メタ)アクリル酸2−エチルヘキシ
ル等)、トリメチルヘキサメチレンジイソシアナートと
2価アルコールと(メタ)アクリル酸ヒドロキシモノエ
ステルとを反応させて得られるウレタンジアクリレート
化合物、2,2−ビス(4−メタクリロキシポリエトキ
シフェニル)プロパン等が挙げられる。これらの化合物
は2種以上用いてもよい。As the photopolymerizable compound (B) having at least two ethylenically unsaturated groups, for example, a compound obtained by adding an α, β-unsaturated carboxylic acid to a polyhydric alcohol (trimethylolpropane diamine) (Meth) acrylate, trimethylolpropane tri (meth) acrylate, tetramethylolmethane tri (meth) acrylate, dipentaerythritol hexa (meth) acrylate, etc.), and a glycidyl group-containing compound with an α, β-unsaturated carboxylic acid (Trimethylolpropane triglycidyl ether triacrylate, bisphenol A diglycidyl ether di (meth) acrylate, etc.), a compound having a polyvalent carboxylic acid (phthalic anhydride, etc.) and a hydroxyl group and an ethylenically unsaturated group (β -Hydroxyethyl (meth) acrylate Ester compound with
Alkyl (meth) acrylate (methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, etc.), trimethylhexamethylene diisocyanate and divalent Examples thereof include a urethane diacrylate compound obtained by reacting an alcohol with a (meth) acrylic acid hydroxymonoester, and 2,2-bis (4-methacryloxypolyethoxyphenyl) propane. Two or more of these compounds may be used.
【0017】(B)成分の配合量は(A)成分と(B)
成分の総量100重量部に対して好ましくは30〜70
重量部である。この配合量が30重量部未満では光感度
が不十分で硬化物の膜特性が低下しスペーサーとして使
用困難となり、70重量部を超えると塗膜性・現像性が
不十分となる傾向がある。The amount of the component (B) is between (A) and (B).
Preferably 30 to 70 parts by weight based on 100 parts by weight of the total amount of the components.
Parts by weight. If the amount is less than 30 parts by weight, the photosensitivity is insufficient, the film properties of the cured product are reduced, and it becomes difficult to use as a spacer. If the amount exceeds 70 parts by weight, the coating properties and developability tend to be insufficient.
【0018】(C)光重合開始剤としては、例えば、ベ
ンゾフェノン、4,4′−ジメチルアミノベンゾフェノ
ン(ミヒラーケトン)、4,4′−ジエチルアミノベン
ゾフェノン、4−メトキシ−4′−ジメチルアミノベン
ゾフェノン、2−エチルアントラキノン、フェナントレ
ンキノン等の芳香族ケトン、ベンゾインメチルエーテ
ル、ベンゾインエチルエーテル、ベンゾインフェニルエ
ーテル等のベンゾイン、2−(o−クロロフェニル)−
4,5−ジフェニルイミダゾール二量体、2−(o−ク
ロロフェニル)−4,5−ジ(m−メトキシフェニル)
−4,5−ジフェニルイミダゾール二量体、2−(o−
フルオロフェニル)−4,5−ジフェニルイミダゾール
二量体、2−(o−メトキシフェニル)−4,5−ジフ
ェニルイミダゾール二量体、2−(p−メトキシフェニ
ル)−4,5−ジフェニルイミダゾール二量体、2,4
−ジ(p−メトキシフェニル)−5−フェニルイミダゾ
ール二量体、2−(p−メトキシフェニル)−4,5−
ジフェニルイミダゾール二量体、2−(p−メチルメル
カプトフェニル)−4,5−ジフェニルイミダゾール二
量体等の2,4,5−トリアリールイミダゾール二量体
等が用いられる。(C) Examples of the photopolymerization initiator include benzophenone, 4,4'-dimethylaminobenzophenone (Michler's ketone), 4,4'-diethylaminobenzophenone, 4-methoxy-4'-dimethylaminobenzophenone, Aromatic ketones such as ethylanthraquinone and phenanthrenequinone; benzoin such as benzoin methyl ether, benzoin ethyl ether and benzoin phenyl ether; 2- (o-chlorophenyl)-
4,5-diphenylimidazole dimer, 2- (o-chlorophenyl) -4,5-di (m-methoxyphenyl)
-4,5-diphenylimidazole dimer, 2- (o-
(Fluorophenyl) -4,5-diphenylimidazole dimer, 2- (o-methoxyphenyl) -4,5-diphenylimidazole dimer, 2- (p-methoxyphenyl) -4,5-diphenylimidazole dimer Body, 2, 4
-Di (p-methoxyphenyl) -5-phenylimidazole dimer, 2- (p-methoxyphenyl) -4,5-
2,4,5-triarylimidazole dimer and the like such as diphenylimidazole dimer and 2- (p-methylmercaptophenyl) -4,5-diphenylimidazole dimer are used.
【0019】(C)成分の配合量は(A)成分と(B)
成分の総量100重量部に対して好ましくは0.1〜1
0重量部である。この配合量が0.1重量部未満では光
感度が不十分となり、10重量部を超えると露光の際感
光性樹脂層の表面での光吸収が増大し、内部の光硬化が
不十分となる傾向がある。The amounts of component (C) and component (A) and component (B)
Preferably 0.1 to 1 with respect to 100 parts by weight of the total amount of the components.
0 parts by weight. When the amount is less than 0.1 part by weight, the photosensitivity becomes insufficient. When the amount exceeds 10 parts by weight, light absorption on the surface of the photosensitive resin layer at the time of exposure increases, and the internal light curing becomes insufficient. Tend.
【0020】その他、感光性樹脂層には、顔料や染料な
どの着色剤、ポリマービーズ、無機充填剤、熱重合性成
分安定剤、メラミン樹脂など熱硬化性樹脂等を含有して
も構わない。In addition, the photosensitive resin layer may contain coloring agents such as pigments and dyes, polymer beads, inorganic fillers, stabilizers for thermopolymerizable components, and thermosetting resins such as melamine resins.
【0021】なお、感光性樹脂層の保護のため保護フィ
ルムを用いることが好ましい。この保護フィルムとして
は、例えば、ポリエステルフィルム、ポリオレフィンフ
ィルム等が用いられるが、価格、柔軟性、強度、硬度等
の面から、ポリオレフィンフィルム、中でもポリエチレ
ンフィルム又はポリプロピレンフィルムが好ましい。ま
た、その厚みは、10〜40μmであることが好まし
く、10μm未満では取扱性に劣る傾向にあり、40μ
mを超えると、コストアップとなる傾向にある。It is preferable to use a protective film for protecting the photosensitive resin layer. As the protective film, for example, a polyester film, a polyolefin film or the like is used, and from the viewpoints of price, flexibility, strength, hardness and the like, a polyolefin film, especially a polyethylene film or a polypropylene film is preferable. The thickness is preferably from 10 to 40 μm, and if it is less than 10 μm, the handleability tends to be inferior.
If it exceeds m, the cost tends to increase.
【0022】本発明のスペーサーフィルムは、支持体フ
ィルム面上に感光性樹脂の溶液をロールコータ、コンマ
コータ、グラビアコータ、エアーナイフコータ、ダイコ
ータ、バーコータなどで塗布し乾燥して感光性樹脂層を
形成した後に保護フィルムを積層することで製造され
る。The spacer film of the present invention forms a photosensitive resin layer by coating a photosensitive resin solution on a support film surface with a roll coater, comma coater, gravure coater, air knife coater, die coater, bar coater, etc. After that, it is manufactured by laminating a protective film.
【0023】本発明のスペーサーフィルムは、2枚の基
板の間に液晶を挟持したカラー液晶表示装置の基板間隔
を保持するスペーサーを形成するために用いられる。こ
の基板は、透明であれば特に制限はなく、その材質とし
て、例えばガラス、プラスチック等が挙げられる。ま
た、液晶は、特に制限はなく、公知のものが用いられ
る。基板上には通常ブラックマトリックスが設けられて
いるが、ブラックマトリックスとしては、特に制限はな
く、公知のものが用いられる。例えば、クロム等の金属
をスパッタリングし、次いでパターン状にエッチングす
ることにより、基板上にブラックマトリックスを設ける
ことができる。The spacer film of the present invention is used to form a spacer for maintaining a distance between substrates of a color liquid crystal display device in which a liquid crystal is sandwiched between two substrates. The substrate is not particularly limited as long as it is transparent, and examples of the material include glass and plastic. The liquid crystal is not particularly limited, and a known liquid crystal is used. Although a black matrix is usually provided on the substrate, the black matrix is not particularly limited, and a known black matrix is used. For example, a black matrix can be provided on a substrate by sputtering metal such as chromium and then etching it in a pattern.
【0024】本発明のスペーサーフィルムを用いたスペ
ーサーは次のようにして製造される。まず、透明基板上
にブラックマトリックス、着色パターン、必要に応じ保
護平坦化膜、透明電極、配向膜を形成したものに、必要
に応じてこの基板を加熱(100〜200℃、3〜30
分間)した後、その基板上にスペーサーフィルムの保護
フィルムを剥がしながら感光性樹脂層をラミネート(貼
合わせ)し、感光性樹脂層の表面の支持体フィルムを剥
離した後、感光性樹脂層上に所定パターンのネガマスク
を載せて露光させる。ラミネートは透明電極や配向膜の
形成前でも構わない。次いで末露光部分を現像液で現像
してスペーサー(パターン)が形成される。ラミネート
工程は、一般にホットロールと呼ばれる加熱可能なロー
ル又はヒートシューと呼ばれる加熱用のジャケットとラ
ミネートロールと呼ばれるロールにより、感光性樹脂層
を加熱し軟化しながら行う。A spacer using the spacer film of the present invention is manufactured as follows. First, a black matrix, a colored pattern, a protective flattening film, a transparent electrode, and an alignment film are formed on a transparent substrate, and if necessary, the substrate is heated (100 to 200 ° C., 3 to 30 ° C.).
Minutes), the photosensitive resin layer is laminated (laminated) while the protective film of the spacer film is peeled off on the substrate, and the support film on the surface of the photosensitive resin layer is peeled off. A negative mask having a predetermined pattern is placed and exposed. Lamination may be performed before the formation of the transparent electrode or the alignment film. Then, the exposed portion is developed with a developing solution to form a spacer (pattern). The laminating step is performed while heating and softening the photosensitive resin layer by a heatable roll generally called a hot roll or a heating jacket called a heat shoe and a roll called a laminating roll.
【0025】露光工程は、一般に専用の露光機があり、
接触又は非接触型のものを用いて行う。ランプとして
は、高圧水銀灯、超高圧水銀灯、メタルハライドラン
プ、キセノンランプ等の紫外線を有効に放射するものを
用いることができる。In the exposure step, there is generally a dedicated exposure machine,
This is performed using a contact or non-contact type. As the lamp, a lamp that effectively emits ultraviolet light, such as a high-pressure mercury lamp, an ultra-high-pressure mercury lamp, a metal halide lamp, or a xenon lamp, can be used.
【0026】現像方法は、ディップ法、スプレー法等が
挙げられ、高解像度化には高圧スプレー法が最適であ
る。現像液は、有機酸水溶液が用いられ、2〜10重量
%の酢酸水溶液を用いることが好ましい。濃度が2重量
%未満では現像が困難になる傾向があり、10重量%を
超えるとレジストが剥れる傾向がある。他に蟻酸、クエ
ン酸、シュウ酸、マロン酸、コハク酸等も用いることが
できる。Examples of the developing method include a dip method and a spray method, and a high-pressure spray method is most suitable for high resolution. As the developer, an organic acid aqueous solution is used, and it is preferable to use an aqueous acetic acid solution of 2 to 10% by weight. If the concentration is less than 2% by weight, development tends to be difficult, and if it exceeds 10% by weight, the resist tends to peel off. Besides, formic acid, citric acid, oxalic acid, malonic acid, succinic acid and the like can also be used.
【0027】[0027]
【実施例】次に、本発明を実施例により詳しく説明する
が、本発明はこれに限定されるものではない。EXAMPLES Next, the present invention will be described in more detail with reference to examples, but the present invention is not limited to these examples.
【0028】実施例 ガラス基板上に0.1μm厚のクロム金属をスパッタリ
ングで形成し、フォトレジストを用いてエッチングを行
い格子状のブラックマトリックスを得た。その後、感光
性フィルム型の顔料分散樹脂を用いて、赤、緑及び青色
のパターンを作製した。その上に、スピンコータを用い
てアクリル系樹脂の保護層を形成し平坦化を行った。そ
の上に透明電極のITOをスッパッタリングで形成し、
その上にポリイミドの配向膜を形成した。この基板を1
00℃で10分間加熱した後、その基板上に、表1の感
光性樹脂組成物の溶液をポリエチレンテレフタレートフ
ィルム(支持体フィルム20μm厚)上に均一に塗布
し、100℃の熱風対流式乾燥機で約10分間乾燥して
5.5μm厚の感光性樹脂層を形成した後、30μm厚
のポリプロピレンフィルムを保護フィルムとして積層し
たスペーサーフィルム(感光性フィルム)を、そのポリ
プロピレンフィルムを剥がしながら、感光性樹脂層をロ
ール温度100℃の加圧したロールで速度1.0m/分
でラミネートした。次いで、所定のパターンのネガマス
クを通して露光機HMW−590(3KW、超高圧水銀
灯、オーク製作所製)で露光した。その後、ポリエチレ
ンテレフタレートフィルムを除去し、30℃で5重量%
酢酸水溶液で30秒間スプレー現像をして未露光部分を
除去し、スペーサーを形成した。スペーサーの厚さは
5.0μmであった。得られた最小のパターンは6μm
角と優れたものであった。EXAMPLE A chromium metal having a thickness of 0.1 μm was formed on a glass substrate by sputtering, and was etched using a photoresist to obtain a grid-like black matrix. Then, red, green and blue patterns were prepared using a photosensitive film type pigment dispersion resin. A protective layer of an acrylic resin was formed thereon using a spin coater, and planarization was performed. A transparent electrode ITO is formed thereon by sputtering,
An alignment film of polyimide was formed thereon. This board is
After heating at 00 ° C. for 10 minutes, a solution of the photosensitive resin composition shown in Table 1 was evenly applied on a polyethylene terephthalate film (support film 20 μm thick) on the substrate, and a hot air convection dryer at 100 ° C. After drying for about 10 minutes to form a photosensitive resin layer of 5.5 μm thickness, a spacer film (photosensitive film) laminated with a 30 μm thick polypropylene film as a protective film is peeled off while removing the polypropylene film. The resin layer was laminated at a speed of 1.0 m / min using a pressurized roll at a roll temperature of 100 ° C. Next, exposure was carried out by an exposure machine HMW-590 (3 KW, ultra high pressure mercury lamp, manufactured by Oak Manufacturing Co., Ltd.) through a negative mask having a predetermined pattern. Thereafter, the polyethylene terephthalate film was removed, and 5% by weight at 30 ° C.
Unexposed portions were removed by spray development with an acetic acid aqueous solution for 30 seconds to form a spacer. The thickness of the spacer was 5.0 μm. The minimum pattern obtained is 6 μm
The corners were excellent.
【0029】次に、スペーサーを形成したカラーフィル
タ側の基板と対する電極基板をシール材でシールし液晶
を注入し、カラー液晶表示装置を作製した。このカラー
液晶表示装置は表示むらのない明るい優れた表示であっ
た。Next, a color liquid crystal display device was manufactured by sealing the electrode substrate facing the color filter side substrate on which the spacer was formed with a sealing material and injecting liquid crystal. This color liquid crystal display had a bright and excellent display without display unevenness.
【0030】比較例 用いたスペーサーフィルムの感光性樹脂層の組成を表2
に示すものに変更し、0.1重量%の炭酸ナトリウムで
30℃、15秒間現像した以外は実施例と同様に行っ
た。その結果、膜厚は5.0μmであったが、得られ最
小パターンは10μm角であった。Comparative Example Table 2 shows the composition of the photosensitive resin layer of the spacer film used.
Was carried out in the same manner as in Example except that the development was carried out at 30 ° C. for 15 seconds with 0.1% by weight of sodium carbonate. As a result, the film thickness was 5.0 μm, but the obtained minimum pattern was 10 μm square.
【0031】[0031]
【表1】 [Table 1]
【0032】[0032]
【表2】 [Table 2]
【0033】[0033]
【発明の効果】本発明の感光性のスペーサーフィルムを
使用すれば、微細パターンのスペーサーが形成でき、遮
光が少ないため明るい優れた品質のカラー液晶表示装置
を容易に作業性良く製造することができる。By using the photosensitive spacer film of the present invention, a spacer having a fine pattern can be formed, and a bright and excellent quality color liquid crystal display device can be easily manufactured with good workability due to little light shielding. .
Claims (3)
液晶表示装置の基板間隔を保持するスペーサーを形成す
るために用いられる、少なくとも支持体フィルムと有機
酸水溶液で現像可能な感光性樹脂層とからなることを特
徴とするカラー液晶表示装置用スペーサーフィルム。1. A photosensitive resin developable with at least a support film and an organic acid aqueous solution, which is used to form a spacer for maintaining a distance between substrates of a color liquid crystal display device in which a liquid crystal is sandwiched between two substrates. A spacer film for a color liquid crystal display device, comprising a layer.
る分子量20,000〜300,000の有機高分子化
合物、(B)少なくとも2個のエチレン性不飽和基を有
する光重合性化合物及び(C)光重合開始剤を含有し有
機酸水溶液で現像可能なものである請求項1記載のカラ
ー液晶表示装置用スペーサーフィルム。2. A photosensitive resin layer comprising: (A) an organic polymer compound having an amino group and a molecular weight of 20,000 to 300,000; and (B) a photopolymerizable compound having at least two ethylenically unsaturated groups. 2. The spacer film for a color liquid crystal display device according to claim 1, further comprising (C) a photopolymerization initiator and developable with an organic acid aqueous solution.
00〜300,000の有機高分子化合物がジメチルア
ミノエチルメタアクリレートから導かれたジメチルアミ
ノエチル基を有する有機高分子化合物である請求項2記
載のカラー液晶表示装置用スペーサーフィルム。(A) a molecular weight of 20,0 having an amino group
3. The spacer film for a color liquid crystal display device according to claim 2, wherein the organic polymer compound having a dimethylaminoethyl group derived from dimethylaminoethyl methacrylate has a molecular weight of from 00 to 300,000.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP34172597A JPH11174459A (en) | 1997-12-11 | 1997-12-11 | Spacer film for color liquid crystal display device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP34172597A JPH11174459A (en) | 1997-12-11 | 1997-12-11 | Spacer film for color liquid crystal display device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH11174459A true JPH11174459A (en) | 1999-07-02 |
Family
ID=18348299
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP34172597A Pending JPH11174459A (en) | 1997-12-11 | 1997-12-11 | Spacer film for color liquid crystal display device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH11174459A (en) |
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-
1997
- 1997-12-11 JP JP34172597A patent/JPH11174459A/en active Pending
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