JPH11143076A - Positive photosensitive composition and photosensitive lithographic printing plate - Google Patents
Positive photosensitive composition and photosensitive lithographic printing plateInfo
- Publication number
- JPH11143076A JPH11143076A JP30191597A JP30191597A JPH11143076A JP H11143076 A JPH11143076 A JP H11143076A JP 30191597 A JP30191597 A JP 30191597A JP 30191597 A JP30191597 A JP 30191597A JP H11143076 A JPH11143076 A JP H11143076A
- Authority
- JP
- Japan
- Prior art keywords
- group
- dye
- photosensitive composition
- color
- positive photosensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 44
- 238000007639 printing Methods 0.000 title claims abstract description 18
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims abstract description 20
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 15
- 229920000620 organic polymer Polymers 0.000 claims abstract description 9
- 229920005989 resin Polymers 0.000 claims description 29
- 239000011347 resin Substances 0.000 claims description 29
- 125000001424 substituent group Chemical group 0.000 claims description 27
- 239000000463 material Substances 0.000 claims description 23
- 125000000217 alkyl group Chemical group 0.000 claims description 21
- 125000004432 carbon atom Chemical group C* 0.000 claims description 18
- 229920001665 Poly-4-vinylphenol Polymers 0.000 claims description 15
- 229920003986 novolac Polymers 0.000 claims description 15
- -1 trimethylsilyloxy group Chemical group 0.000 claims description 13
- 125000003277 amino group Chemical group 0.000 claims description 11
- 125000003545 alkoxy group Chemical group 0.000 claims description 10
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 10
- 238000006243 chemical reaction Methods 0.000 claims description 9
- 239000000126 substance Substances 0.000 claims description 8
- 125000004423 acyloxy group Chemical group 0.000 claims description 7
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims description 7
- 125000003118 aryl group Chemical group 0.000 claims description 7
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims description 6
- 229920003987 resole Polymers 0.000 claims description 6
- 125000005843 halogen group Chemical group 0.000 claims description 5
- 239000006229 carbon black Substances 0.000 claims description 4
- 125000005647 linker group Chemical group 0.000 claims description 4
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 4
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 claims description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 125000002252 acyl group Chemical group 0.000 claims description 3
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 claims description 3
- URSLCTBXQMKCFE-UHFFFAOYSA-N dihydrogenborate Chemical compound OB(O)[O-] URSLCTBXQMKCFE-UHFFFAOYSA-N 0.000 claims description 3
- 125000000623 heterocyclic group Chemical group 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- OROGUZVNAFJPHA-UHFFFAOYSA-N 3-hydroxy-2,4-dimethyl-2H-thiophen-5-one Chemical group CC1SC(=O)C(C)=C1O OROGUZVNAFJPHA-UHFFFAOYSA-N 0.000 claims description 2
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 claims description 2
- 150000002500 ions Chemical class 0.000 claims description 2
- 125000001261 isocyanato group Chemical group *N=C=O 0.000 claims description 2
- 125000002813 thiocarbonyl group Chemical group *C(*)=S 0.000 claims description 2
- 125000000686 lactone group Chemical group 0.000 claims 1
- 238000004040 coloring Methods 0.000 abstract description 8
- 239000000975 dye Substances 0.000 description 54
- 239000002585 base Substances 0.000 description 20
- 238000000576 coating method Methods 0.000 description 14
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 14
- 239000011248 coating agent Substances 0.000 description 13
- 238000000034 method Methods 0.000 description 13
- 239000000243 solution Substances 0.000 description 13
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 12
- 239000002904 solvent Substances 0.000 description 11
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 229910052782 aluminium Inorganic materials 0.000 description 9
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 9
- 150000001875 compounds Chemical class 0.000 description 9
- NKTOLZVEWDHZMU-UHFFFAOYSA-N 2,5-xylenol Chemical compound CC1=CC=C(C)C(O)=C1 NKTOLZVEWDHZMU-UHFFFAOYSA-N 0.000 description 8
- TUAMRELNJMMDMT-UHFFFAOYSA-N 3,5-xylenol Chemical compound CC1=CC(C)=CC(O)=C1 TUAMRELNJMMDMT-UHFFFAOYSA-N 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 7
- 230000035945 sensitivity Effects 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- 150000001299 aldehydes Chemical class 0.000 description 6
- 239000011159 matrix material Substances 0.000 description 6
- 239000000049 pigment Substances 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 5
- 239000003513 alkali Substances 0.000 description 5
- 150000001450 anions Chemical class 0.000 description 5
- 229910052801 chlorine Inorganic materials 0.000 description 5
- 150000002596 lactones Chemical group 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 239000005011 phenolic resin Substances 0.000 description 5
- XLLXMBCBJGATSP-UHFFFAOYSA-N 2-phenylethenol Chemical compound OC=CC1=CC=CC=C1 XLLXMBCBJGATSP-UHFFFAOYSA-N 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 125000001309 chloro group Chemical group Cl* 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 238000011161 development Methods 0.000 description 4
- 229910052736 halogen Inorganic materials 0.000 description 4
- 150000002367 halogens Chemical class 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 238000006552 photochemical reaction Methods 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 229960001755 resorcinol Drugs 0.000 description 4
- 230000003746 surface roughness Effects 0.000 description 4
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 3
- 238000013329 compounding Methods 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- XPFVYQJUAUNWIW-UHFFFAOYSA-N furfuryl alcohol Chemical compound OCC1=CC=CO1 XPFVYQJUAUNWIW-UHFFFAOYSA-N 0.000 description 3
- 238000005227 gel permeation chromatography Methods 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 230000031700 light absorption Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 125000001624 naphthyl group Chemical group 0.000 description 3
- 150000002989 phenols Chemical class 0.000 description 3
- WVIICGIFSIBFOG-UHFFFAOYSA-N pyrylium Chemical compound C1=CC=[O+]C=C1 WVIICGIFSIBFOG-UHFFFAOYSA-N 0.000 description 3
- 125000000446 sulfanediyl group Chemical group *S* 0.000 description 3
- OKYDCMQQLGECPI-UHFFFAOYSA-N thiopyrylium Chemical compound C1=CC=[S+]C=C1 OKYDCMQQLGECPI-UHFFFAOYSA-N 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- BBMCTIGTTCKYKF-UHFFFAOYSA-N 1-heptanol Chemical compound CCCCCCCO BBMCTIGTTCKYKF-UHFFFAOYSA-N 0.000 description 2
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 2
- JESXATFQYMPTNL-UHFFFAOYSA-N 2-ethenylphenol Chemical class OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 2
- HMNKTRSOROOSPP-UHFFFAOYSA-N 3-Ethylphenol Chemical compound CCC1=CC=CC(O)=C1 HMNKTRSOROOSPP-UHFFFAOYSA-N 0.000 description 2
- HXDOZKJGKXYMEW-UHFFFAOYSA-N 4-ethylphenol Chemical compound CCC1=CC=C(O)C=C1 HXDOZKJGKXYMEW-UHFFFAOYSA-N 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 2
- 239000007848 Bronsted acid Substances 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
- XUPYJHCZDLZNFP-UHFFFAOYSA-N butyl butanoate Chemical compound CCCCOC(=O)CCC XUPYJHCZDLZNFP-UHFFFAOYSA-N 0.000 description 2
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N butyric aldehyde Natural products CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- HGCIXCUEYOPUTN-UHFFFAOYSA-N cyclohexene Chemical compound C1CCC=CC1 HGCIXCUEYOPUTN-UHFFFAOYSA-N 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000866 electrolytic etching Methods 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- HYBBIBNJHNGZAN-UHFFFAOYSA-N furfural Chemical compound O=CC1=CC=CO1 HYBBIBNJHNGZAN-UHFFFAOYSA-N 0.000 description 2
- 125000002541 furyl group Chemical group 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- 125000001841 imino group Chemical group [H]N=* 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 2
- GJYCVCVHRSWLNY-UHFFFAOYSA-N ortho-butylphenol Natural products CCCCC1=CC=CC=C1O GJYCVCVHRSWLNY-UHFFFAOYSA-N 0.000 description 2
- 125000004430 oxygen atom Chemical group O* 0.000 description 2
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- 239000002985 plastic film Substances 0.000 description 2
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- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
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- 229910052717 sulfur Inorganic materials 0.000 description 2
- 125000004434 sulfur atom Chemical group 0.000 description 2
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- 230000004580 weight loss Effects 0.000 description 2
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- OSNILPMOSNGHLC-UHFFFAOYSA-N 1-[4-methoxy-3-(piperidin-1-ylmethyl)phenyl]ethanone Chemical compound COC1=CC=C(C(C)=O)C=C1CN1CCCCC1 OSNILPMOSNGHLC-UHFFFAOYSA-N 0.000 description 1
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- 239000000654 additive Substances 0.000 description 1
- 238000007754 air knife coating Methods 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- WLDHEUZGFKACJH-UHFFFAOYSA-K amaranth Chemical compound [Na+].[Na+].[Na+].C12=CC=C(S([O-])(=O)=O)C=C2C=C(S([O-])(=O)=O)C(O)=C1N=NC1=CC=C(S([O-])(=O)=O)C2=CC=CC=C12 WLDHEUZGFKACJH-UHFFFAOYSA-K 0.000 description 1
- 239000002280 amphoteric surfactant Substances 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 125000006615 aromatic heterocyclic group Chemical group 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- KSCQDDRPFHTIRL-UHFFFAOYSA-N auramine O Chemical compound [H+].[Cl-].C1=CC(N(C)C)=CC=C1C(=N)C1=CC=C(N(C)C)C=C1 KSCQDDRPFHTIRL-UHFFFAOYSA-N 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- 229950011260 betanaphthol Drugs 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- OBNCKNCVKJNDBV-UHFFFAOYSA-N butanoic acid ethyl ester Natural products CCCC(=O)OCC OBNCKNCVKJNDBV-UHFFFAOYSA-N 0.000 description 1
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 238000010538 cationic polymerization reaction Methods 0.000 description 1
- XRPLBRIHZGVJIC-UHFFFAOYSA-L chembl3182776 Chemical compound [Na+].[Na+].NC1=CC(N)=CC=C1N=NC1=CC=C(C=2C=CC(=CC=2)N=NC=2C(=CC3=CC(=C(N=NC=4C=CC=CC=4)C(O)=C3C=2N)S([O-])(=O)=O)S([O-])(=O)=O)C=C1 XRPLBRIHZGVJIC-UHFFFAOYSA-L 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 125000002433 cyclopentenyl group Chemical group C1(=CCCC1)* 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 125000004663 dialkyl amino group Chemical group 0.000 description 1
- 150000008049 diazo compounds Chemical class 0.000 description 1
- 229940061607 dibasic sodium phosphate Drugs 0.000 description 1
- WYACBZDAHNBPPB-UHFFFAOYSA-N diethyl oxalate Chemical compound CCOC(=O)C(=O)OCC WYACBZDAHNBPPB-UHFFFAOYSA-N 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 description 1
- ODQWQRRAPPTVAG-GZTJUZNOSA-N doxepin Chemical compound C1OC2=CC=CC=C2C(=C/CCN(C)C)/C2=CC=CC=C21 ODQWQRRAPPTVAG-GZTJUZNOSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- VYXSBFYARXAAKO-UHFFFAOYSA-N ethyl 2-[3-(ethylamino)-6-ethylimino-2,7-dimethylxanthen-9-yl]benzoate;hydron;chloride Chemical compound [Cl-].C1=2C=C(C)C(NCC)=CC=2OC2=CC(=[NH+]CC)C(C)=CC2=C1C1=CC=CC=C1C(=O)OCC VYXSBFYARXAAKO-UHFFFAOYSA-N 0.000 description 1
- KWWOQRSLYPHAMK-UHFFFAOYSA-N ethyl 2-hydroxybutanoate Chemical compound CCOC(=O)C(O)CC KWWOQRSLYPHAMK-UHFFFAOYSA-N 0.000 description 1
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- 229940117360 ethyl pyruvate Drugs 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000001056 green pigment Substances 0.000 description 1
- 230000008543 heat sensitivity Effects 0.000 description 1
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 1
- 125000001041 indolyl group Chemical group 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 239000001023 inorganic pigment Substances 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 1
- 229940057867 methyl lactate Drugs 0.000 description 1
- 238000001393 microlithography Methods 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- KELHQGOVULCJSG-UHFFFAOYSA-N n,n-dimethyl-1-(5-methylfuran-2-yl)ethane-1,2-diamine Chemical compound CN(C)C(CN)C1=CC=C(C)O1 KELHQGOVULCJSG-UHFFFAOYSA-N 0.000 description 1
- QVEIBLDXZNGPHR-UHFFFAOYSA-N naphthalene-1,4-dione;diazide Chemical class [N-]=[N+]=[N-].[N-]=[N+]=[N-].C1=CC=C2C(=O)C=CC(=O)C2=C1 QVEIBLDXZNGPHR-UHFFFAOYSA-N 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
- 229920002866 paraformaldehyde Polymers 0.000 description 1
- PGMYKACGEOXYJE-UHFFFAOYSA-N pentyl acetate Chemical group CCCCCOC(C)=O PGMYKACGEOXYJE-UHFFFAOYSA-N 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 125000004309 pyranyl group Chemical group O1C(C=CC=C1)* 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 239000007870 radical polymerization initiator Substances 0.000 description 1
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 1
- 229940043267 rhodamine b Drugs 0.000 description 1
- OARRHUQTFTUEOS-UHFFFAOYSA-N safranin Chemical compound [Cl-].C=12C=C(N)C(C)=CC2=NC2=CC(C)=C(N)C=C2[N+]=1C1=CC=CC=C1 OARRHUQTFTUEOS-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- FTUYQIPAPWPHNC-UHFFFAOYSA-M sodium;4-[[4-[benzyl(ethyl)amino]phenyl]-[4-[benzyl(ethyl)azaniumylidene]cyclohexa-2,5-dien-1-ylidene]methyl]benzene-1,3-disulfonate Chemical compound [Na+].C=1C=C(C(=C2C=CC(C=C2)=[N+](CC)CC=2C=CC=CC=2)C=2C(=CC(=CC=2)S([O-])(=O)=O)S([O-])(=O)=O)C=CC=1N(CC)CC1=CC=CC=C1 FTUYQIPAPWPHNC-UHFFFAOYSA-M 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 229910001935 vanadium oxide Inorganic materials 0.000 description 1
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
(57)【要約】
【課題】 露光部のコントラストと未露光部のコントラ
ストに優れ、画線部の残膜率が十分な感光性組成物及び
平版印刷版を提供する。
【解決手段】 フェノール性水酸基を有するアルカリ可
溶性有機高分子物質及び塩基発色性色素を含有すること
を特徴とするポジ型感光性組成物。PROBLEM TO BE SOLVED: To provide a photosensitive composition and a lithographic printing plate which are excellent in the contrast of an exposed portion and the contrast of an unexposed portion, and have a sufficient residual film ratio in an image portion. SOLUTION: A positive photosensitive composition comprising an alkali-soluble organic polymer having a phenolic hydroxyl group and a base coloring dye.
Description
【0001】[0001]
【発明の属する技術分野】本発明は、感光性平版印刷
版、簡易校正印刷用プルーフ、配線板、グラビア用銅エ
ッチングレジスト、フラットディスプレイ製造に使用さ
れるカラーフィルター用レジスト、LSI製造用フォト
レジストなどに用いられる紫外から近赤外の波長域の光
に対する新規なポジ型感光性組成物に関する。特に半導
体レーザーやYAGレーザー等を用いた直接製版に好適
なポジ型感光性組成物及びポジ型感光性平版印刷版に関
する。The present invention relates to a photosensitive lithographic printing plate, a proof for simple proof printing, a wiring board, a copper etching resist for gravure, a resist for a color filter used in flat display manufacturing, a photoresist for LSI manufacturing, and the like. The present invention relates to a novel positive-type photosensitive composition for light in the ultraviolet to near-infrared wavelength range used for (1). In particular, the present invention relates to a positive photosensitive composition and a positive photosensitive lithographic printing plate suitable for direct plate making using a semiconductor laser, a YAG laser, or the like.
【0002】[0002]
【従来の技術】コンピュータ画像処理技術の進歩に伴
い、デジタル画像情報から、銀塩マスクフィルムへの出
力を行わずに、レーザー光あるいはサーマルヘッド等に
より、直接レジスト画像を形成する感光または感熱ダイ
レクト製版システムが注目されている。2. Description of the Related Art With the advance of computer image processing technology, a photosensitive or heat-sensitive direct plate making in which a resist image is directly formed by a laser beam or a thermal head without outputting digital image information to a silver halide mask film. The system is drawing attention.
【0003】特に、高出力の半導体レーザーやYAGレ
ーザーを用いる、高解像度のレーザー感光ダイレクト製
版システムは、小型化、製版作業時の環境光や版材コス
トの面から、その実現が強く望まれていた。一方、従来
より、レーザー感光または感熱を利用した画像形成方法
としては、昇華転写色素を利用し色材画像を形成する方
法ならびに平版を作成する方法などが知られている。後
者においては、例えば、ジアゾ化合物の架橋反応を利用
し、平版印刷版を作成する方法(例えば、特開昭52−
151024号、特公平2−51732号、特開昭50
−15603号、特公平3−34051号、特公昭61
−21831号、特公昭60−12939号、米国特許
第3664737号等参照)、ニトロセルロースの分解
反応を利用し、平版印刷版を作製する方法(例えば、特
開昭50−102403号、特開昭50−102401
号等の公報参照)等が知られている。In particular, the realization of a high-resolution laser-sensitive direct plate-making system using a high-output semiconductor laser or YAG laser is strongly desired in view of miniaturization, environmental light during plate-making work, and plate material cost. Was. On the other hand, conventionally, as an image forming method using laser exposure or heat sensitivity, a method of forming a color material image using a sublimation transfer dye and a method of preparing a lithographic plate have been known. In the latter case, for example, a method of preparing a lithographic printing plate by utilizing a crosslinking reaction of a diazo compound (for example,
No. 151024, Japanese Patent Publication No. 2-51732,
No. -15603, Tokuhei 3-34051, Tokubo Sho61
21831, JP-B-60-12939, U.S. Pat. No. 3,664,737, etc.) and a method for preparing a lithographic printing plate by utilizing a decomposition reaction of nitrocellulose (for example, JP-A-50-102403, 50-102401
And other publications are known.
【0004】近年、化学増幅型のフォトレジストに長波
長光線吸収色素を組み合せた技術が散見される様になっ
た。例えば特開平6−43633号明細書には特定のス
クアリリウム色素に光酸発生剤およびバインダー等を組
合せた感光材料が開示されている。また、更にこれに類
する技法として赤外線吸収色素、潜伏性ブレンステッド
酸、レゾール樹脂およびノボラック樹脂を含む感光層を
半導体レーザー等により像状に露光し平版印刷版を作製
する技術が提案されており(特開平7−20629
号)、更に、前記潜伏性ブレンステッド酸に代えs−ト
リアジン化合物を用いる技術も知らされている(特開平
7−271029号)。In recent years, a technique of combining a chemically amplified photoresist with a long-wavelength light-absorbing dye has been found. For example, JP-A-6-43633 discloses a photosensitive material in which a specific squarylium dye is combined with a photoacid generator, a binder and the like. Further, as a technique similar to this, there has been proposed a technique of preparing a lithographic printing plate by imagewise exposing a photosensitive layer containing an infrared absorbing dye, a latent Bronsted acid, a resol resin and a novolak resin to an image by a semiconductor laser or the like ( JP-A-7-20629
Further, a technique using an s-triazine compound instead of the latent Bronsted acid is also known (Japanese Patent Application Laid-Open No. Hei 7-27129).
【0005】また、特開平9−43847号には、赤外
線の照射により加熱して感光材の結晶性を変化させるレ
ジスト材およびそれを利用したパターン形成方法が開示
されている。しかしながら、本発明者等の検討によれ
ば、これら従来の技術は実用上、その特性が必ずしも充
分ではなかった。例えば、露光後、加熱処理を要する感
光材の場合はその処理条件の振れに起因して、得られる
画像の品質安定性は必ずしも満足されなかった。一方、
その様な露光後の加熱処理を要しないタイプの感光材の
場合は露光部、未露光部におけるコントラストが不充分
であり、その結果、非画線部が充分に除去されなかった
り、画線部の残膜率が充分保持されなかった。Japanese Patent Application Laid-Open No. 9-43847 discloses a resist material which changes the crystallinity of a photosensitive material by heating by irradiation of infrared rays, and a pattern forming method using the same. However, according to the study by the present inventors, these conventional techniques have not always had sufficient characteristics in practical use. For example, in the case of a photosensitive material that requires a heat treatment after exposure, the stability of the quality of the obtained image is not always satisfied due to fluctuations in the processing conditions. on the other hand,
In the case of a photosensitive material that does not require such a heat treatment after exposure, the contrast in the exposed and unexposed areas is insufficient, and as a result, the non-image areas are not sufficiently removed, Was not sufficiently maintained.
【0006】[0006]
【発明が解決しようとする課題】本発明は、上記の諸問
題に鑑みなされたものであり、即ち、本発明の目的は、
コントラストに優れかつ画線部の残膜率が充分な新規ポ
ジ型感光性組成物及びポジ型感光性平版印刷版を提供す
ることにある。SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, that is, the object of the present invention is to
It is an object of the present invention to provide a novel positive photosensitive composition and a positive photosensitive lithographic printing plate which are excellent in contrast and have a sufficient residual film ratio in an image area.
【0007】[0007]
【課題を解決するための手段】本発明者等は鋭意検討を
重ね、塩基により発色する色素を用いることにより上記
問題を解決し得ることを知り、本発明を達成した。すな
わち、本発明の要旨はフェノール性水酸基を有するアル
カリ可溶性有機高分子物質及び少くとも塩基で発色する
性質を有する塩基発色性色素を含有することを特徴とす
るポジ型感光性組成物及びこれを用いたポジ型感光性平
版印刷板に存する。Means for Solving the Problems The present inventors have conducted intensive studies and have found that the above problem can be solved by using a dye that develops a color with a base, and have achieved the present invention. That is, the gist of the present invention is to provide a positive photosensitive composition characterized by containing an alkali-soluble organic polymer substance having a phenolic hydroxyl group and at least a base coloring matter having a property of coloring with a base, and using the same. Existing in the positive-working photosensitive lithographic printing plate.
【0008】[0008]
【発明の実施の形態】以下、本発明について詳細に説明
する。本発明組成物は、フェノール可溶性高分子物質及
び塩基の作用で発色する色素(以下、発色性色素と称す
る)を含有するものであり、該塩基発色性色素と該フェ
ノール性水酸基を有するアルカリ可溶性有機高分子物質
とが水素結合を介してマトリックス構造を形成し、その
結果、アルカリ可溶性有機高分子物質のアルカリ水溶液
に対する高い溶解抑制効果を発生させる。かかるマトリ
ックス構造形成の1例を下式に示す。BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described in detail. The composition of the present invention contains a phenol-soluble polymer and a dye that forms a color under the action of a base (hereinafter, referred to as a color-forming dye), and contains the base-color-forming dye and the alkali-soluble organic compound having the phenolic hydroxyl group. The polymer material forms a matrix structure through hydrogen bonding, and as a result, a high effect of suppressing dissolution of the alkali-soluble organic polymer material in an aqueous alkali solution is generated. One example of such a matrix structure formation is shown below.
【0009】[0009]
【化2】 Embedded image
【0010】かかるマトリックス構造は、光照射時に、
マトリックス構造を構成している塩基発色性色素の光化
学的変化或いは、光吸収により発生した熱による変化に
より水素結合が解離し、高い溶解抑制効果が消失するこ
と、更に、該マトリックスの水素結合が解離し単独にな
った塩基発色性色素が、現像処理時、現像液に接触する
と、塩基(OH- )が色素の−OHや−NH−基のプロ
トンを引き抜き、カルボニル基やイミノ基を生成させ、
ラクトン環を開環させて該色素が発色すると共に現像液
に対する溶解性が高くなるため、コントラストの高いポ
ジ画像を形成することが可能となる。色素の発色機構の
例を下記に示す。[0010] Such a matrix structure, when irradiated with light,
Hydrogen bonds are dissociated by the photochemical change of the base chromogenic dye constituting the matrix structure or the change due to heat generated by light absorption, and the high dissolution inhibiting effect is lost.Moreover, the hydrogen bonds of the matrix are dissociated. When the base color-forming dye alone comes into contact with the developing solution during the development processing, the base (OH − ) abstracts the protons of the —OH and —NH— groups of the dye to generate a carbonyl group or an imino group,
Since the lactone ring is opened to develop the color of the dye and increase the solubility in a developing solution, a positive image having high contrast can be formed. Examples of the coloring mechanism of the dye are shown below.
【0011】[0011]
【化3】 Embedded image
【0012】本発明組成物に使用されるフェノール性水
酸基を有するアルカリ可溶性有機高分子物質としては、
ノボラック樹脂、レゾール樹脂、ポリビニルフェノール
樹脂、フェノール性の水酸基を有するアクリル酸誘導体
の共重合体等が挙げられる。これらのうちノボラック樹
脂、レゾール樹脂またはポリビニルフェノール樹脂が好
ましい。特に好ましくは、ノボラック樹脂またはポリビ
ニルフェノール樹脂である。The alkali-soluble organic polymer having a phenolic hydroxyl group used in the composition of the present invention includes:
Novolak resins, resole resins, polyvinylphenol resins, copolymers of acrylic acid derivatives having a phenolic hydroxyl group, and the like. Among these, a novolak resin, a resol resin or a polyvinylphenol resin is preferred. Particularly preferred is a novolak resin or a polyvinylphenol resin.
【0013】ノボラック樹脂としては、フェノール、m
−クレゾール、o−クレゾール、p−クレゾール、2,
5−キシレノール、3,5−キシレノール、レゾルシ
ン、ピロガロール、ビスフェノール、ビスフェノール−
A、トリスフェノール、o−エチルフェノール、m−エ
チルフェノール、p−エチルフェノール、プロピルフェ
ノール、n−ブチルフェノール、t−ブチルフェノー
ル、1−ナフトール、2−ナフトール等の芳香族炭化水
素類の少なくとも1種を酸性触媒下、ホルムアルデヒ
ド、アセトアルデヒド、プロピオンアルデヒド、ベンズ
アルデヒド、フルフラール等のアルデヒド類及び、アセ
トン、メチルエチルケトン、メチルイソブチルケトンな
どのケトン類から選ばれた少なくとも1種のアルデヒド
類又はケトン類と重縮合させたものが挙げられる。As the novolak resin, phenol, m
-Cresol, o-cresol, p-cresol, 2,
5-xylenol, 3,5-xylenol, resorcinol, pyrogallol, bisphenol, bisphenol-
A, at least one kind of aromatic hydrocarbons such as trisphenol, o-ethylphenol, m-ethylphenol, p-ethylphenol, propylphenol, n-butylphenol, t-butylphenol, 1-naphthol and 2-naphthol; Polycondensation with aldehydes such as formaldehyde, acetaldehyde, propionaldehyde, benzaldehyde and furfural and at least one aldehyde or ketone selected from ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone under an acidic catalyst Is mentioned.
【0014】ホルムアルデヒド及びアセトアルデヒドの
代わりに、それぞれパラホルムアルデヒド及びパラアル
デヒドを使用してもよい。ノボラック樹脂のゲルパーミ
ュエーションクロマトグラフィー(以下、GPCと略
す)測定によるポリスチレン換算重量平均分子量(以
下、GPC測定による重量平均分子量をMwと略す)が
好ましくは1,000〜15,000、特に好ましくは
1,500〜10,000のものが用いられる。Instead of formaldehyde and acetaldehyde, paraformaldehyde and paraaldehyde, respectively, may be used. The weight average molecular weight in terms of polystyrene measured by gel permeation chromatography (hereinafter abbreviated as GPC) of the novolak resin (hereinafter, the weight average molecular weight measured by GPC is abbreviated as Mw) is preferably 1,000 to 15,000, particularly preferably. Of 1,500 to 10,000 are used.
【0015】ノボラック樹脂の芳香族炭化水素類として
は、より好ましくは、フェノール、o−クレゾール、m
−クレゾール、p−クレゾール、2,5−キシレノー
ル、及び3,5−キシレノール、レゾルシンから選ばれ
る少なくとも1種のフェノール類をホルムアルデヒド、
アセトアルデヒド、プロピオンアルデヒドなどのアルデ
ヒド類の中から選ばれる少なくとも1種と重縮合したノ
ボラック樹脂が挙げられる。The aromatic hydrocarbons of the novolak resin are more preferably phenol, o-cresol, m
-Cresol, p-cresol, 2,5-xylenol, and 3,5-xylenol, at least one phenol selected from resorcinol, formaldehyde,
Novolak resins polycondensed with at least one selected from aldehydes such as acetaldehyde and propionaldehyde are exemplified.
【0016】中でも、m−クレゾール:p−クレゾー
ル:2,5−キシレノール:3,5−キシレノール:レ
ゾルシンの混合割合がモル比で40〜100:0〜5
0:0〜20:0〜20:0〜20のフェノール類また
は、フェノール:m−クレゾール:p−クレゾールの混
合割合がモル比で1〜100:0〜70:0〜60のフ
ェノール類とアルデヒド類との重縮合物であるノボラッ
ク樹脂が好ましい。アルデヒド類の中でも、特にホルム
アルデヒドが好ましい。尚、本発明の感光性組成物は、
更に溶剤抑止剤を含んでいても良く、その場合、m−ク
レゾール:p−クレゾール:2,5−キシレノール:
3,5−キシレノール:レゾルシンの混合割合がモル比
で70〜100:0〜30:0〜20:0〜20のフェ
ノール類または、フェノール:m−クレゾール:p−ク
レゾールの混合割合がモル比で10〜100:0〜6
0:0〜40のフェノール類とアルデヒド類との重縮合
物であるノボラック樹脂が好ましい。In particular, the mixing ratio of m-cresol: p-cresol: 2,5-xylenol: 3,5-xylenol: resorcin is 40 to 100: 0 to 5 in molar ratio.
Phenols of 0: 0 to 20: 0 to 20: 0 to 20 or phenols and aldehydes having a molar ratio of phenol: m-cresol: p-cresol of 1 to 100: 0 to 70: 0 to 60 Novolak resins which are polycondensates with the compounds are preferred. Of the aldehydes, formaldehyde is particularly preferred. Incidentally, the photosensitive composition of the present invention,
It may further contain a solvent inhibitor, in which case m-cresol: p-cresol: 2,5-xylenol:
The mixing ratio of 3,5-xylenol: resorcinol in a molar ratio of 70 to 100: 0 to 30: 0 to 20: 0 to 20 or a mixing ratio of phenol: m-cresol: p-cresol in a molar ratio 10 to 100: 0 to 6
Novolak resins which are polycondensates of phenols and aldehydes at 0: 0 to 40 are preferred.
【0017】ポリビニルフェノール樹脂としては、o−
ヒドロキシスチレン、m−ヒドロキシスチレン、p−ヒ
ドロキシスチレン、2−(o−ヒドロキシフェニル)プ
ロピレン、2−(m−ヒドロキシフェニル)プロピレ
ン、2−(p−ヒドロキシフェニル)プロピレンなどの
ヒドロキシスチレン類の単独または2種以上の(共)重
合体が挙げられる。ヒドロキシスチレン類は芳香環に塩
素、臭素、ヨウ素、フッ素等のハロゲンあるいはC1 〜
C4 のアルキル基等の置換基を有していてもよく、従っ
てポリビニルフェノール類としては、芳香環にハロゲン
又はC1 〜C4 のアルキル基を有していても良いポリビ
ニルフェノールを包含する。As the polyvinylphenol resin, o-
Hydroxystyrenes such as hydroxystyrene, m-hydroxystyrene, p-hydroxystyrene, 2- (o-hydroxyphenyl) propylene, 2- (m-hydroxyphenyl) propylene, and 2- (p-hydroxyphenyl) propylene; Two or more (co) polymers are included. Hydroxystyrenes include halogen such as chlorine, bromine, iodine, fluorine, or C 1 to
It may have a substituent such as an alkyl group of C 4, thus Polyvinyl phenols, including good polyvinyl phenol which may have an alkyl group having halogen or C 1 -C 4 the aromatic ring.
【0018】ポリビニルフェノール樹脂は、通常、置換
基を有していてもよいヒドロキシスチレン類を単独で又
は2種以上をラジカル重合開始剤またはカチオン重合開
始剤の存在下で重合することにより得られる。かかるポ
リビニルフェノール樹脂は、一部水素添加を行なったも
のでもよい。又、t−ブトキシカルボニル基、ピラニル
基、フラニル基などでポリビニルフェノール類の一部の
OH基を保護した樹脂でもよい。ポリビニルフェノール
樹脂のMwは、好ましくは1,000〜100,00
0、特に好ましくは1,500〜50,000のものが
用いられる。The polyvinyl phenol resin is usually obtained by polymerizing hydroxystyrenes which may have a substituent alone or in combination of two or more hydroxystyrenes in the presence of a radical polymerization initiator or a cationic polymerization initiator. Such a polyvinyl phenol resin may be partially hydrogenated. Further, a resin in which some OH groups of polyvinylphenols are protected by a t-butoxycarbonyl group, a pyranyl group, a furanyl group, or the like may be used. Mw of the polyvinyl phenol resin is preferably 1,000 to 100,000.
0, particularly preferably 1,500 to 50,000.
【0019】ポリビニルフェノール樹脂としては、より
好ましくは、芳香環に炭素数C1 〜C4 のアルキル置換
基を有していてもよいポリビニルフェノールが挙げら
れ、未置換のポリビニルフェノールが特に好ましい。以
上のノボラック樹脂またはポリビニルフェノール樹脂の
Mwが、上記範囲よりも小さいと十分な塗膜が得られ
ず、この範囲よりも大きいと未露光部分のアルカリ現像
液に対する溶解性が小さくなり、パターンが得られない
傾向にある。The polyvinyl phenol resin is more preferably a polyvinyl phenol which may have an alkyl substituent having 1 to 4 carbon atoms on the aromatic ring, and an unsubstituted polyvinyl phenol is particularly preferred. If the Mw of the novolak resin or the polyvinyl phenol resin is smaller than the above range, a sufficient coating film cannot be obtained. Tend not to be.
【0020】また、レゾール樹脂はノボラック樹脂合成
において酸触媒を用いる替わりにアルカリ触媒を用いる
以外他は同様にして得ることができ、ノボラック樹脂と
同様の好ましい分子量、縮重合モノマー組成のものが好
ましい。フェノール性水酸基を有するアルカリ可溶性有
機高分子物質の配合率は、本発明の感光性組成物中の全
固形分に対して2〜98重量%、好ましくは5〜95重
量%、さらに好ましくは10〜90重量%である。The resol resin can be obtained in the same manner as in the novolak resin except that an alkali catalyst is used instead of an acid catalyst, and a resol resin having the same preferable molecular weight and polycondensation monomer composition as the novolak resin is preferable. The compounding ratio of the alkali-soluble organic polymer having a phenolic hydroxyl group is from 2 to 98% by weight, preferably from 5 to 95% by weight, more preferably from 10 to 95% by weight, based on the total solids in the photosensitive composition of the present invention. 90% by weight.
【0021】本発明組成物に使用される塩基発色性色素
は、塩基の作用により発色する機能を有する色素であれ
ば特に限定されるものではない。好ましくは構造中に
(チオ)ラクトンまたはスルホラクトン骨格を有し、p
H3以上、特に好ましくはpH5以上の水素イオン濃度
領域において、先に図示した如く、色素中の(チオ)ラ
クトン或いはスルホラクトン骨格が開環して発色する色
素が挙げられる。なお(チオ)ラクトンは、ラクトンま
たはチオラクトンを表す。塩基発色性色素として、より
具体的には下記一般式(A)で示される、塩基で発色す
る性質を有する色素が挙げられる。The base color-forming dye used in the composition of the present invention is not particularly limited as long as it has a function of forming a color by the action of a base. It preferably has a (thio) lactone or sulfolactone skeleton in its structure,
In the hydrogen ion concentration region of H3 or more, particularly preferably pH 5 or more, a dye which develops a color by opening the (thio) lactone or sulfolactone skeleton in the dye as shown above is exemplified. Note that (thio) lactone represents lactone or thiolactone. More specifically, examples of the base color-forming dye include a dye represented by the following general formula (A) and having the property of forming a color with a base.
【0022】[0022]
【化4】 Embedded image
【0023】(式中、Wはカルボニル基、チオカルボニ
ル基又はスルホニル基を表し、環A、環B、環Cは、そ
れぞれ独立して、1〜3環の芳香族炭化水素基又は1〜
3環の芳香族複素環基を表す。Ru1〜Ru12 は、それぞ
れ独立して、水素原子、置換基を有していてもよい炭素
数1〜15のアルキル基、置換基を有していてもよい炭
素数2〜15のアシル基、置換基を有していてもよい炭
素数1〜15のアルコキシ基、置換基を有していてもよ
い炭素数2〜15のアシルオキシ基、置換基を有してい
てもよい炭素数2〜15のアルコキシカルボニル基、ト
リメチルシリルオキシ基、置換基を有していてもよいア
ミノ基、水酸基、ハロゲン原子、ニトロ基、イソシアナ
ト基又はチオイソシアナト基を表す。また、環B及び環
Cは結合基を介して互いに結合していてもよい。)(Wherein W represents a carbonyl group, a thiocarbonyl group or a sulfonyl group, and ring A, ring B and ring C are each independently a 1 to 3 ring aromatic hydrocarbon group or 1 to 3 ring
Represents a three-ring aromatic heterocyclic group. R u1 to R u12 each independently represent a hydrogen atom, an alkyl group having 1 to 15 carbon atoms which may have a substituent, or an acyl group having 2 to 15 carbon atoms which may have a substituent; An alkoxy group having 1 to 15 carbon atoms which may have a substituent, an acyloxy group having 2 to 15 carbon atoms which may have a substituent, and 2 carbon atoms which may have a substituent 15 represents an alkoxycarbonyl group, trimethylsilyloxy group, optionally substituted amino group, hydroxyl group, halogen atom, nitro group, isocyanato group or thioisocyanato group. Ring B and ring C may be bonded to each other via a bonding group. )
【0024】一般式(A)において、好ましくは環Aは
ベンゼン環であり、環B及び環Cはベンゼン環、ナフタ
レン環又はインドール環である。Ru1〜Ru12 がアミノ
基の場合は、置換基として炭素数1〜15のアルキル
基、炭素数6〜15のアリール基、アミノカルボニル基
を有していても良く、これらは更に置換基を有していて
も良い。Ru1〜Ru12 で示されるアルキル基、アルコキ
シ基、及びアミノ基の置換基のアルキル基の炭素数は1
〜10が好ましく、更に好ましくは1〜5である。Ru1
〜Ru12 がアシルオキシ基、アルコキシカルボニル基、
アシル基の場合の炭素数は2〜10が好ましく、アミノ
基の置換基のアリール基の炭素数は6〜10が好まし
い。また、好ましいRu1〜Ru4としては、水素原子、水
酸基、臭素原子、ヨウ素原子、塩素原子、アルキル基、
アルコキシ基、アシルオキシ基、アルコキシカルボニル
基(これらアルキル基、アルコキシ基、アシルオキシ
基、アルコキシカルボニル基は、更に、置換基を有して
いてもよい)であり、Ru5〜Ru 12 が、水素原子、ア
ルキル基、アルコキシ基、アシルオキシ基、アルコキシ
カルボニル基(アルキル基、アルコキシ基、アシルオキ
シ基、アルコキシカルボニル基は置換基を有していても
よい)、臭素原子、塩素原子、ヨウ素原子、アミノ基、
置換アミノ基、水酸基、ニトロ基である。また、環Bと
Cが結合する際には、好ましくは0−位で結合され、6
員環を形成し、好ましい結合基としては、酸素原子、イ
オウ原子である。In the general formula (A), preferably, ring A is a benzene ring, and rings B and C are a benzene ring, a naphthalene ring or an indole ring. When R u1 to R u12 are amino groups, they may have an alkyl group having 1 to 15 carbon atoms, an aryl group having 6 to 15 carbon atoms, or an aminocarbonyl group as a substituent. You may have. The alkyl group of the alkyl group, the alkoxy group and the amino group represented by R u1 to R u12 has 1 carbon atom.
Is preferably from 10 to 10, and more preferably from 1 to 5. R u1
~ R u12 represents an acyloxy group, an alkoxycarbonyl group,
The number of carbon atoms in the case of an acyl group is preferably 2 to 10, and the number of carbon atoms of an aryl group as a substituent of an amino group is preferably 6 to 10. Preferred Ru1 to Ru4 include a hydrogen atom, a hydroxyl group, a bromine atom, an iodine atom, a chlorine atom, an alkyl group,
Alkoxy group, an acyloxy group, an alkoxycarbonyl group (the alkyl group, an alkoxy group, an acyloxy group, an alkoxycarbonyl group, further, may also have a substituent group), R u5 to R u 12 is a hydrogen atom , An alkyl group, an alkoxy group, an acyloxy group, an alkoxycarbonyl group (an alkyl group, an alkoxy group, an acyloxy group, and an alkoxycarbonyl group may have a substituent), a bromine atom, a chlorine atom, an iodine atom, an amino group,
A substituted amino group, a hydroxyl group, and a nitro group. When the rings B and C are bonded, they are preferably bonded at the 0-position,
A preferred linking group which forms a membered ring is an oxygen atom or a sulfur atom.
【0025】また特に好ましくは、Ru1〜Ru4が水素原
子、臭素原子、塩素原子、アルキル基でありRu5〜R
u12 が水素原子、水酸基、ニトロ基、アミノ基、置換ア
ミノ基、臭素原子、塩素原子であり、Wがカルボニル基
又はスルホニル基である。就中、Ru5〜Ru12 のうちの
少くとも1つが、塩基によりプロトンが引き抜かれ、カ
ルボニル基又はイミノ基を形成する水酸基又はアミノ基
であることが好ましい。Particularly preferably, R u1 to R u4 are a hydrogen atom, a bromine atom, a chlorine atom or an alkyl group, and R u5 to R u
u12 is a hydrogen atom, a hydroxyl group, a nitro group, an amino group, a substituted amino group, a bromine atom, a chlorine atom, and W is a carbonyl group or a sulfonyl group. In particular, it is preferable that at least one of Ru5 to Ru12 is a hydroxyl group or an amino group from which a proton is extracted by a base to form a carbonyl group or an imino group.
【0026】以下に、本発明の塩基発色性色素につい
て、表−1に具体例を挙げるが、本発明の塩基発色性色
素は、具体例に限定されることはない。尚、下記式中W
Aはカルボニル基又はスルホニル基を表わす。Hereinafter, specific examples of the base color-forming dye of the present invention are shown in Table 1, but the base color-forming dye of the present invention is not limited to the specific examples. In addition, W in the following formula
A represents a carbonyl group or a sulfonyl group.
【0027】[0027]
【表1】 [Table 1]
【0028】[0028]
【表2】 [Table 2]
【0029】また塩基発色性色素は2つ以上が直接或い
は結合基を介して結合した複数の色素を有する化合物で
もよい。本発明組成物中の塩基発色性色素の配合量は、
該色素が高分子の場合は、組成物の全固形分中の1〜9
8重量%、好ましくは3〜80重量%、更に好ましくは
5〜70重量%である。また、色素が高分子でない場合
は、全固形分中の1〜50重量%、好ましくは3〜40
重量%、更に好ましくは5〜30重量%である。The base color-forming dye may be a compound having a plurality of dyes in which two or more dyes are bonded directly or via a bonding group. The compounding amount of the base color-forming dye in the composition of the present invention,
When the dye is a polymer, it is 1 to 9 in the total solid content of the composition.
It is 8% by weight, preferably 3 to 80% by weight, more preferably 5 to 70% by weight. When the dye is not a polymer, it is 1 to 50% by weight, preferably 3 to 40% by weight of the total solid content.
%, More preferably 5 to 30% by weight.
【0030】本発明のポジ型感光性組成物は、光照射に
より、アルカリ可溶性有機高分子物質または塩基で発色
する色素、或いはプロトン移動錯体が光を吸収し、光化
学反応、或いは、光吸収で発生する熱の作用により前述
のプロトン移動錯体構造及びそれを中心としたアルカリ
可溶性有機高分子物質のマトリックス構造を破壊し、光
照射部分のアルカリ水溶液に対する溶解性を著しく向上
させることにより高いコントラストのポジ様の画像を得
ることが可能であるが、さらに、この光化学反応、或い
は光吸収で発生する熱による上記溶解性向上効果を高め
る目的で、該ポジ型感光性組成物中に光熱変換物質或い
は光化学反応の作用によりポジ型の画像を形成させるポ
ジ型光反応性化合物を配合させることが出来る。In the positive photosensitive composition of the present invention, an alkali-soluble organic polymer substance or a dye that forms a color with a base or a proton transfer complex absorbs light upon irradiation with light, and is generated by a photochemical reaction or light absorption. The action of heat destroys the above-mentioned proton transfer complex structure and the matrix structure of the alkali-soluble organic polymer substance centered on it, and significantly improves the solubility of the light-irradiated portion in an aqueous alkali solution, resulting in a high contrast positive appearance. Can be obtained. Further, in order to enhance the effect of improving the solubility by the heat generated by this photochemical reaction or light absorption, a photothermal conversion substance or a photochemical reaction is contained in the positive photosensitive composition. A positive-type photoreactive compound capable of forming a positive-type image by the action of (i) can be blended.
【0031】本発明のポジ型感光性組成物に用いられる
光熱変換物質は、光照射により熱を発生する物質であれ
ば特に限定されないが、より具体的には、波長域650
〜1300nmの一部又は全部に吸収帯を有する有機ま
たは無機の顔料、有機色素、金属などが挙げられる。具
体的には、例えば、カーボンブラック;黒鉛;チタン、
クロム等の金属;酸化チタン、酸化スズ、酸化亜鉛、酸
化バナジウム、酸化タングステン等の金属酸化物;チタ
ンカーバイド等の金属炭化物;金属ホウ化物;特開平4
−322219号公報に記載されている無機黒色顔料、
アゾ系のブラック顔料、「リオノールグリーン2Y
S」、「緑色顔料7」等の黒または緑の有機顔料が挙げ
られる。そして、上記のカーボンブラックとしては、三
菱化学社の商品である「MA−7」、「MA−10
0」、「MA−220」、「#5」、「#10」、「#
40」、デグッサ社の商品である「カラーブラックFW
2」、「FW20」、「プリンテックスV」等が挙げら
れる。The photothermal conversion material used in the positive photosensitive composition of the present invention is not particularly limited as long as it generates heat when irradiated with light. More specifically, the wavelength range is 650.
Organic or inorganic pigments, organic dyes, metals and the like having an absorption band in a part or the whole of 〜1300 nm are exemplified. Specifically, for example, carbon black; graphite; titanium;
Metals such as chromium; metal oxides such as titanium oxide, tin oxide, zinc oxide, vanadium oxide, and tungsten oxide; metal carbides such as titanium carbide; metal borides;
Inorganic black pigments described in -322219,
Azo black pigment, "Lionol Green 2Y"
S "and" green pigment 7 ". Examples of the carbon black include “MA-7” and “MA-10”, which are products of Mitsubishi Chemical Corporation.
0 "," MA-220 ","# 5 ","# 10 ","#
"Color Black FW", a product of Degussa
2 "," FW20 "," Printex V "and the like.
【0032】また、「特殊機能色素」(池森・柱谷編
集、1986年、(株)シーエムシー発行)、「機能性
色素の化学」(檜垣編集、1981年、(株)シーエム
シー発行)、「色素ハンドブック」(大河・平嶋・松岡
・北尾編集、講談社発行)、日本感光色素研究所が19
95年に発行したカタログ、Exciton Inc.
が1989年に発行したレーザー色素カタログ等に記載
の近赤外領域に吸収を有する色素が挙げられる。Also, "special functional pigments" (edited by Ikemori and Hashiya, 1986, published by CMC Corporation), "chemical chemistry of functional pigments" (edited by Higaki, 1981, published by CMC Corporation), " Dye Handbook "(edited by Okawa, Hirashima, Matsuoka, Kitao, published by Kodansha)
Exciton Inc., a catalog published in 1995.
And dyes having absorption in the near infrared region described in Laser Dye Catalog issued in 1989.
【0033】更には、特開平2−2074号、同207
5、同2076、特開平3−97590号、同9759
1号、同63185号、同26593号、同97589
号の各公報に記載された有機色素や日本化薬社の商品
「IR820B」等が挙げられる。光熱変換物質とし
て、近赤外領域に吸収を有する色素および顔料の代表例
を表−2に示す。Further, JP-A-2-2074, JP-A-2-2074
5, 2076, JP-A-3-97590, 9759
No. 1, No. 63185, No. 26593, No. 97589
And organic dyes described in each of the above publications and the product “IR820B” of Nippon Kayaku. Table 2 shows typical examples of dyes and pigments having absorption in the near infrared region as the light-to-heat conversion material.
【0034】[0034]
【表3】 [Table 3]
【0035】[0035]
【表4】 [Table 4]
【0036】[0036]
【表5】 [Table 5]
【0037】[0037]
【表6】 [Table 6]
【0038】[0038]
【表7】 [Table 7]
【0039】[0039]
【表8】 [Table 8]
【0040】[0040]
【表9】 [Table 9]
【0041】[0041]
【表10】 [Table 10]
【0042】[0042]
【表11】 [Table 11]
【0043】[0043]
【表12】 [Table 12]
【0044】[0044]
【表13】 [Table 13]
【0045】[0045]
【表14】 [Table 14]
【0046】[0046]
【表15】 [Table 15]
【0047】[0047]
【表16】 [Table 16]
【0048】[0048]
【表17】 [Table 17]
【0049】[0049]
【表18】 [Table 18]
【0050】[0050]
【表19】 [Table 19]
【0051】これらの内、シアニン色素、ポリメチン色
素、スクアリリウム色素、クロコニウム色素、ピリリウ
ム色素、チオピリリウム色素が好ましい、更に、シアニ
ン色素、ポリメチン色素、ピリリウム色素、チオピリリ
ウム色素がより好ましい。これらの内、特に好ましい色
素は、下記一般式〔I〕で表されるシアニン色素、一般
式〔II〕で表されるポリメチン色素、または下記一般式
〔III 〕で表わされるピリリウム色素もしくはチオピリ
リウム色素である。Of these, cyanine dyes, polymethine dyes, squarylium dyes, croconium dyes, pyrylium dyes, and thiopyrylium dyes are preferred, and cyanine dyes, polymethine dyes, pyrylium dyes, and thiopyrylium dyes are more preferred. Among these, a particularly preferred dye is a cyanine dye represented by the following general formula [I], a polymethine dye represented by the following general formula [II], or a pyrylium dye or a thiopyrylium dye represented by the following general formula [III]. is there.
【0052】[0052]
【化5】 Embedded image
【0053】〔式中、R1 、R2 は置換基を有していて
も良いC8 以下のアルキル基であり、該置換基は、フェ
ニル基、フェノキシ基、アルコキシ基、スルホン酸基、
カルボキシル基であり;Q1 は置換基を有していてもよ
いヘプタメチン基であり、該置換基は、C6 以下のアル
キル基、ハロゲン原子、アミノ基であるか、該ヘプタメ
チン基がその2つのメチン炭素上の置換基が相互に結合
して形成された置換基を有していても良いシクロヘキセ
ン環またはシクロペンテン環を含むものであっても良
く、該置換基はC6 以下のアルキル基またはハロゲン原
子であり;m1 、m 2 は各々が0または1であり;
Z1 、Z2 は含窒素複素環を形成するに必要な原子群で
あり;X- は対アニオンを示す。〕[Wherein, R1, RTwoHas a substituent
Good C8The following alkyl groups, wherein the substituents are
Nyl group, phenoxy group, alkoxy group, sulfonic acid group,
A carboxyl group; Q1May have a substituent
Heptamethine group, wherein the substituent is C6The following al
A kill group, a halogen atom, an amino group,
The tin group is bonded to the substituents on the two methine carbons
Optionally formed cyclohexene formed by
May contain a ring or a cyclopentene ring
And the substituent is C6The following alkyl groups or halogen sources
Child; m1, M TwoIs each 0 or 1;
Z1, ZTwoIs a group of atoms necessary to form a nitrogen-containing heterocyclic ring.
Yes; X-Represents a counter anion. ]
【0054】[0054]
【化6】 Embedded image
【0055】〔式中、R3 〜R6 はC8 以下のアルキル
基であり;Z4 、Z5 は置換基を有していてもよいアリ
ール基であり、該アリール基は、フェニル基、ナフチル
基、フリル基またはチエニル基であり、該置換基はC4
以下のアルキル基、C8 以下のアルキル基を有するジア
ルキルアミノ基、C8 以下のアルコキシ基およびハロゲ
ン原子である。Q2 はトリメチン基またはペンタメチン
基を示し;X- は対アニオンを示す。〕[Wherein, R 3 to R 6 are an alkyl group of C 8 or less; Z 4 and Z 5 are an aryl group which may have a substituent, and the aryl group is a phenyl group, naphthyl group, a furyl group or a thienyl group, the substituents C 4
An alkyl group, a dialkylamino group having a C 8 an alkyl group, a C 8 an alkoxy group and a halogen atom. Q 2 represents a trimethine group or a pentamethine group; X − represents a counter anion. ]
【0056】[0056]
【化7】 Embedded image
【0057】〔式中、Y1 、Y2 は酸素原子または硫黄
原子であり;R7 、R8 、R15およびR16は置換基を有
していてももよいフェニル基またはナフチル基であり、
該置換基はC8 以下のアルキル基もしくはC8 以下のア
ルコキシ基であり;l1 とl2は各々独立に0または1
を示し;R9 〜R14は水素原子またはC8 以下のアルキ
ル基を示すかあるいは各々独立にR9 とR10、R11とR
12またはR13とR14とが相互に結合してWherein Y 1 and Y 2 are an oxygen atom or a sulfur atom; R 7 , R 8 , R 15 and R 16 are a phenyl group or a naphthyl group which may have a substituent; ,
The substituent is an C 8 an alkyl group or a C 8 an alkoxy group; l 1 and l 2 are each independently 0 or 1
R 9 to R 14 each represent a hydrogen atom or an alkyl group of C 8 or less, or R 9 and R 10 , R 11 and R
12 or R 13 and R 14 are mutually bonded
【0058】[0058]
【化8】 Embedded image
【0059】(但しR17〜R19は水素原子またはC6 以
下のアルキル基であり、nは0または1を示す。)の連
結基を形成しても良く;Z3 はハロゲン原子または水素
原子、Xは対アニオンを示す。〕 以上の〔I〕、〔II〕および〔III 〕式における対アニ
オンX- は、例えば、Cl- 、Br- 、I- 、ClO4
- 、BF4 - 、PF6 - 等の無機酸アニオン、ベンゼン
スルホン酸、p−トルエンスルホン酸、ナフタレンスル
ホン酸、酢酸、有機ホウ酸の様な有機酸のアニオンを挙
げることができる。(Provided that R 17 to R 19 are a hydrogen atom or an alkyl group having a carbon number of 6 or less, and n represents 0 or 1); Z 3 may be a halogen atom or a hydrogen atom. , X represents a counter anion. The counter anion X − in the above formulas [I], [II] and [III] is, for example, Cl − , Br − , I − , ClO 4
- , BF 4 - and PF 6- and the like, and anions of organic acids such as benzenesulfonic acid, p-toluenesulfonic acid, naphthalenesulfonic acid, acetic acid and organic boric acid.
【0060】特に、有機ホウ酸アニオンを対イオンに有
する色素は、塗布溶剤に対する溶解性に優れる為、塗布
溶液の製造が容易になると共に、低沸点の溶剤を使用可
能なため、未乾燥感光性層の塗布ラインローラー等への
貼り付き等の発生を抑制出来、高速塗布が可能となり、
高い生産性を得ることができる。これらの光熱変換物質
の本発明の感光性組成物の全固型分中の配合率は、0〜
30重量%、好ましくは0〜20重量%、更に好ましく
は0〜15重量%である。具体的にこのような、有機ホ
ウ酸アニオンとしては、下記式(L)で示されるものが
挙げられる。In particular, a dye having an organic borate anion as a counter ion is excellent in solubility in a coating solvent, so that a coating solution can be easily produced, and a solvent having a low boiling point can be used. The layer can be prevented from sticking to the application line roller, etc., and high-speed application becomes possible.
High productivity can be obtained. The mixing ratio of these photothermal conversion materials in the total solid content of the photosensitive composition of the present invention is from 0 to
It is 30% by weight, preferably 0-20% by weight, more preferably 0-15% by weight. Specifically, examples of such an organic borate anion include those represented by the following formula (L).
【0061】[0061]
【化9】 Embedded image
【0062】(式中、RQ1〜RQ4はそれぞれ水素原子、
炭素数1〜15のアルキル基、置換基を有していてもよ
い炭素数6〜15の芳香族炭化水素環基、置換基を有し
ていてもよい炭素数4〜15の複素環基を表わす。) さらに具体的にはRQ1〜RQ4がそれぞれ、−CH3 、−
C2 H5 、−C3 H7、−C4 H9 、−C4 H9 −t、(Wherein, R Q1 to R Q4 each represent a hydrogen atom,
An alkyl group having 1 to 15 carbon atoms, an aromatic hydrocarbon ring group having 6 to 15 carbon atoms which may have a substituent, and a heterocyclic group having 4 to 15 carbon atoms which may have a substituent. Express. More specifically, R Q1 to R Q4 are each -CH 3 ,-
C 2 H 5, -C 3 H 7, -C 4 H 9, -C 4 H 9 -t,
【0063】[0063]
【化10】 Embedded image
【0064】等を挙げることができる。また、感光性層
中には、必要に応じ、光熱変換物質以外の着色材料を含
有させることが出来る。着色材料としては、顔料または
染料が使用され、例えば、ビクトリアピュアブルー(4
2595)、オーラミンO(41000)、カチロンブ
リリアントフラビン(ベーシック13)、ローダミン6
GCP(45160)、ローダミンB(45170)、
サフラニンOK70:100(50240)、エリオグ
ラウシンX(42080)、ファーストブラックHB
(26150)、No.120/リオノールイエロー
(21090)、リオノールイエローGRO(2109
0)、シムラーファーストイエロー8GF(2110
5)、ベンジジンイエロー4T−564D(2109
5)、シムラーファーストレッド4015(1235
5)、リオノールレッドB4401(15850)、フ
ァーストゲンブルーTGR−L(74160)、リオノ
ールブルーSM(26150)等が挙げられる。なお、
上記の( )内の数字はカラーインデックス(C.
I.)を意味する。And the like. The photosensitive layer may contain a coloring material other than the light-to-heat conversion material, if necessary. As a coloring material, a pigment or a dye is used. For example, Victoria Pure Blue (4
2595), Auramine O (41000), Katilon Brilliant Flavin (Basic 13), Rhodamine 6
GCP (45160), Rhodamine B (45170),
Safranin OK70: 100 (50240), Erioglaucine X (42080), First Black HB
(26150), No. 120 / Lionol Yellow (21090), Lionol Yellow GRO (2109
0), Shimla First Yellow 8GF (2110
5), benzidine yellow 4T-564D (2109)
5), Shimla Fast Red 4015 (1235)
5), Lionol Red B4401 (15850), Fast Gen Blue TGR-L (74160), Lionol Blue SM (26150) and the like. In addition,
The numbers in parentheses above indicate the color index (C.I.
I. ).
【0065】該着色材料を含む場合、その配合率は全感
光性層組成物の固形分中1〜50重量%、好ましくは2
〜30重量%である。次に、本発明組成物の光化学反応
の作用によりポジ型の画像を形成させるポジ型光反応性
化合物としては、特開平60−175046に記載のオ
ニウム塩化合物、米国特許3666473、同4115
128、同4173470、特開平9−127690、
特開平9−106070、L.F.Thompson
「Introduction to Microlit
hography」ACS出版、No.2、19号、P
112〜121等に記載のナフトキノンジアジド化合
物、及び特開昭48−89003、同51−12071
4、同53−133429、同55−12995、同5
5−126236、同56−17345、同60−36
25、同60−10247、同60−37549、同6
0−121446、同59−45439、同60−36
25、同62−229242、同63−27829、同
63−36240、同63−250642等に記載され
ている露光により酸を発生する化合物及び該酸発生化合
物とその酸により解離し、溶解性を増大させる化合物等
を挙げることが出来る。これらポジ型光反応性化合物の
配合率は感光性組成物の全固形分中、0〜50重量%、
好ましくは0〜30重量%、さらに好ましくは0〜20
重量%である。When the coloring material is contained, its compounding ratio is 1 to 50% by weight, preferably 2% by weight, based on the solid content of the whole photosensitive layer composition.
3030% by weight. Next, examples of the positive-type photoreactive compound capable of forming a positive-type image by the action of the photochemical reaction of the composition of the present invention include onium salt compounds described in JP-A-60-175046, and US Pat. Nos. 3,666,473 and 4,115.
128, 4173470, JP-A-9-127690,
JP-A-9-106070; F. Thompson
"Introduction to Microlit
hography "ACS Publishing, No. 2,19, P
Naphthoquinonediazide compounds described in 112-121, etc., and JP-A-48-89003 and JP-A-5-12071.
4, 53-133429, 55-12995, 5
5-126236, 56-17345, 60-36
25, 60-10247, 60-37549, 6
0-112446, 59-45439, 60-36
25, 62-229242, 63-27829, 63-36240, 63-250642, etc., compounds which generate an acid upon exposure and dissociated by the acid-generating compound and the acid to increase solubility And the like. The mixing ratio of these positive-type photoreactive compounds is 0 to 50% by weight based on the total solid content of the photosensitive composition.
Preferably 0 to 30% by weight, more preferably 0 to 20%
% By weight.
【0066】本発明の感光性組成物は、通常、上記各成
分を適当な溶媒に溶解して用いられる。溶媒としては、
使用成分に対して十分な溶解度を持ち、良好な塗膜性を
与える溶媒であれば特に制限はないが、メチルセロソル
ブ、エチルセロソルブ、メチルセロソルブアセテート、
エチルセロソルブアセテートなどのセロソルブ系溶媒、
プロピレングリコールモノメチルエーテル、プロピレン
グリコールモノエチルエーテル、プロピレングリコール
モノブチルエーテル、プロピレングリコールモノメチル
エーテルアセテート、プロピレングリコールモノエチル
エーテルアセテート、プロピレングリコールモノブチル
エーテルアセテート、ジプロピレングリコールジメチル
エーテルなどのプロピレングリコール系溶媒、酢酸ブチ
ル、酢酸アミル、酪酸エチル、酪酸ブチル、ジエチルオ
キサレート、ピルビン酸エチル、エチル−2−ヒドロキ
シブチレート、エチルアセトアセテート、乳酸メチル、
乳酸エチル、2−メトキシプロピオン酸メチルなどのエ
ステル系溶媒、ヘプタノール、ヘキサノール、ジアセト
ンアルコール、フルフリルアルコールなどのアルコール
系溶媒、シクロヘキサノン、メチルアミルケトンなどの
ケトン系溶媒、ジメチルホルムアミド、ジメチルアセト
アミド、N−メチルピロリドンなどの高極性溶媒、ある
いはこれらの混合溶媒、さらにはこれらに芳香族炭化水
素を添加したものなどが挙げられる。溶媒の使用割合
は、感光性組成物の総量に対して通常重量比で1〜20
倍程度の範囲である。The photosensitive composition of the present invention is usually used by dissolving each of the above components in a suitable solvent. As the solvent,
There is no particular limitation as long as the solvent has sufficient solubility for the components used and gives good coating properties, but methylcellosolve, ethylcellosolve, methylcellosolve acetate,
Cellosolve solvents such as ethyl cellosolve acetate,
Propylene glycol solvents such as propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monobutyl ether acetate, and dipropylene glycol dimethyl ether; butyl acetate; acetic acid Amyl, ethyl butyrate, butyl butyrate, diethyl oxalate, ethyl pyruvate, ethyl-2-hydroxybutyrate, ethyl acetoacetate, methyl lactate,
Ester solvents such as ethyl lactate and methyl 2-methoxypropionate; alcohol solvents such as heptanol, hexanol, diacetone alcohol and furfuryl alcohol; ketone solvents such as cyclohexanone and methyl amyl ketone; dimethylformamide; dimethylacetamide; N Highly polar solvents such as -methylpyrrolidone, or a mixed solvent thereof, or a mixture of these with an aromatic hydrocarbon. The proportion of the solvent used is usually 1 to 20 by weight based on the total amount of the photosensitive composition.
The range is about double.
【0067】なお、本発明の感光性組成物は、その性能
を損なわない範囲で種々の添加剤、例えば塗布性改良
剤、現像改良剤、密着性改良剤、感度改良剤、感脂化剤
等を含有することも可能である。本発明の感光性組成物
は支持体上に塗設して感光性平版印刷版として有利に使
用できる。支持体表面に感光性層を設ける際に用いる塗
布方法としては、従来公知の方法、例えば、回転塗布、
ワイヤーバー塗布、ディップ塗布、エアーナイフ塗布、
ロール塗布、ブレード塗布及びカーテン塗布等を用いる
ことが可能である。その乾燥温度または加熱温度として
は、例えば20〜170℃、好ましくは30〜150℃
が採用される。The photosensitive composition of the present invention may contain various additives such as a coating improver, a development improver, an adhesion improver, a sensitivity improver, a sensitizer and the like within a range that does not impair the performance of the composition. It is also possible to contain. The photosensitive composition of the present invention can be advantageously used as a photosensitive lithographic printing plate by coating on a support. As a coating method used when providing the photosensitive layer on the support surface, conventionally known methods, for example, spin coating,
Wire bar coating, dip coating, air knife coating,
Roll coating, blade coating, curtain coating and the like can be used. The drying temperature or the heating temperature is, for example, 20 to 170 ° C, preferably 30 to 150 ° C.
Is adopted.
【0068】感光性層の膜厚は、通常0.3〜7μm、
好ましくは0.5〜5μm、更に好ましくは1.0〜3
μmである。本発明の感光性組成物を用いた感光層を設
ける支持体としては、アルミニウム、亜鉛、鋼、銅等の
金属板、並びにクロム、亜鉛、銅、ニッケル、アルミニ
ウム、鉄等がメッキ又は蒸着された金属板、紙、プラス
チックフィルム及びガラス板、樹脂が塗布された紙、ア
ルミニウム等の金属箔が張られた紙、親水化処理したプ
ラスチックフィルム等のシート等が挙げられる。感光性
平版印刷版用の支持体としては、塩酸または硝酸溶液中
での電解エッチングまたはブラシ研磨による砂目立て処
理、硫酸溶媒中での陽極酸化処理および必要に応じて封
孔処理等の表面処理が施されているアルミニウム板を用
いることがより好ましい。The thickness of the photosensitive layer is usually 0.3 to 7 μm,
Preferably 0.5-5 μm, more preferably 1.0-3
μm. As a support on which a photosensitive layer using the photosensitive composition of the present invention is provided, a metal plate such as aluminum, zinc, steel, and copper, and chromium, zinc, copper, nickel, aluminum, and iron are plated or evaporated. Examples include a metal plate, paper, a plastic film and a glass plate, paper coated with resin, paper covered with a metal foil such as aluminum, and a sheet such as a plastic film subjected to hydrophilic treatment. As the support for the photosensitive lithographic printing plate, surface treatment such as graining treatment by electrolytic etching or brush polishing in a hydrochloric acid or nitric acid solution, anodizing treatment in a sulfuric acid solvent, and if necessary, sealing treatment, etc. It is more preferable to use a coated aluminum plate.
【0069】支持体表面の粗面度に関しては、一般的
に、表面粗さRaの値で示される。これは表面粗度計を
用いて測定することができる。本発明において用いられ
る支持体としてはその平均粗さRaが0.3〜1.0μ
mのアルミニウム板が好ましく、更に、0.4〜0.8
μmのものがより好ましい。本支持体は、必要に応じ、
更に有機酸化合物による表面処理を施して用いることが
できる。The surface roughness of the support is generally indicated by the value of surface roughness Ra. This can be measured using a surface roughness meter. The support used in the present invention has an average roughness Ra of 0.3 to 1.0 μm.
m of an aluminum plate is preferable.
μm is more preferred. This support may be used as required.
Further, it can be used after being subjected to a surface treatment with an organic acid compound.
【0070】本発明の感光性組成物を画像露光する光源
としてはキセノンランプ、高圧水銀灯、低圧水銀灯、ハ
ロゲンランプ、メタルハライドランプ等のランプ光源、
HeNeレーザー、アルゴンイオンレーザー、YAGレ
ーザー、HeCdレーザー、半導体レーザー、ルビーレ
ーザー等のレーザー光源が挙げられ、特に、光を吸収
し、発生した熱により画像形成させる場合には、650
〜1300nmの近赤外レーザー等の光線を発生する光
源が好ましく、例えばルビーレーザー、YAGレーザ
ー、半導体レーザー、LED、その他の固体レーザー等
を挙げることが出来、特に小型で長寿命の半導体レーザ
ーやYAGレーザーが好ましい。これらのレーザー光源
により、通常、走査露光後、現像液にて現像し画像を得
ることができる。The light source for imagewise exposing the photosensitive composition of the present invention includes lamp light sources such as a xenon lamp, a high-pressure mercury lamp, a low-pressure mercury lamp, a halogen lamp, and a metal halide lamp.
A laser light source such as a HeNe laser, an argon ion laser, a YAG laser, a HeCd laser, a semiconductor laser, and a ruby laser may be mentioned. In particular, when an image is formed by absorbing light and generating heat, 650 is used.
A light source that emits light such as a near-infrared laser having a wavelength of about 1300 nm is preferable, and examples thereof include a ruby laser, a YAG laser, a semiconductor laser, an LED, and other solid-state lasers. Lasers are preferred. With these laser light sources, usually, after scanning exposure, development can be performed with a developer to obtain an image.
【0071】また、レーザー光源は、通常、レンズによ
り集光された高強度の光線(ビーム)として感光材表面
を走査するが、それに感応する本発明のポジ型平版印刷
版の感度特性(mJ/cm2 )は感光材表面で受光する
レーザービームの光強度(mJ/s・cm2 )に依存す
ることがある。ここで、レーザービームの光強度(mJ
/s・cm2 )は、版面上でのレーザービームの単位時
間当たりのエネルギー量(mJ/s)を光パワーメータ
ーにより測定し、また感光材表面におけるビーム径(照
射面積;cm2 )を測定し、単位時間当たりのエネルギ
ー量を照射面積で除することにより求めることができ
る。レーザービームの照射面積は、通常、レーザーピー
ク強度の1/e2 強度を超える部分の面積で定義される
が、簡易的には相反則を示す感光材を感光させて測定す
ることもできる。The laser light source normally scans the surface of the photosensitive material as a high-intensity light beam (beam) condensed by a lens. The sensitivity characteristic of the positive type lithographic printing plate of the present invention (mJ / cm 2 ) may depend on the light intensity (mJ / s · cm 2 ) of the laser beam received on the photosensitive material surface. Here, the light intensity of the laser beam (mJ
/ S · cm 2 ) is the amount of energy (mJ / s) of the laser beam on the plate surface per unit time measured with an optical power meter, and the beam diameter (irradiated area; cm 2 ) on the surface of the photosensitive material It can be obtained by dividing the amount of energy per unit time by the irradiation area. The irradiation area of the laser beam is usually defined as the area of the portion exceeding 1 / e 2 intensity of the laser peak intensity, but it can be simply measured by exposing a photosensitive material exhibiting a reciprocity law.
【0072】本発明に用いられる光源の光強度として
は、2.0×106 mJ/s・cm2以上であることが
好ましく、1.0×107 mJ/s・cm2 以上である
ことが更に好ましい。光強度が上記の範囲であれば、本
発明のポジ型感光性組成物の感度特性が向上し、走査露
光時間を短くすることができ実用的に大きな利点が得ら
れる。The light intensity of the light source used in the present invention is preferably 2.0 × 10 6 mJ / s · cm 2 or more, and 1.0 × 10 7 mJ / s · cm 2 or more. Is more preferred. When the light intensity is within the above range, the sensitivity characteristics of the positive photosensitive composition of the present invention are improved, and the scanning exposure time can be shortened.
【0073】本発明の感光性組成物の現像に用いる現像
液としては特にアルカリ水溶液を主体とするアルカリ現
像液が好ましい。上記アルカリ現像液としては、例え
ば、水酸化ナトリウム、水酸化カリウム、炭酸ナトリウ
ム、炭酸カリウム、メタケイ酸ナトリウム、メタケイ酸
カリウム、第二リン酸ナトリウム、第三リン酸ナトリウ
ム等のアルカリ金属塩の水溶液が挙げられる。アルカリ
金属塩の濃度は0.1〜20重量%が好ましい。又、該
現像液中に必要に応じアニオン性界面活性剤、両性界面
活性剤等やアルコール等の有機溶媒を加えることができ
る。The developer used for developing the photosensitive composition of the present invention is particularly preferably an alkali developer mainly composed of an aqueous alkali solution. Examples of the alkaline developer include aqueous solutions of alkali metal salts such as sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, sodium metasilicate, potassium metasilicate, dibasic sodium phosphate, and tertiary sodium phosphate. No. The concentration of the alkali metal salt is preferably from 0.1 to 20% by weight. If necessary, an anionic surfactant, an amphoteric surfactant, or an organic solvent such as alcohol can be added to the developer.
【0074】[0074]
【実施例】以下に本発明を実施例により更に具体的に説
明するが、本発明はその要旨を越えない限り、これらの
実施例に限定されるものではない。 〔アルミニウム板の作製〕厚さ0.24mmのアルミニ
ウム板(材質1050、調質H16)を、5重量%の水
酸化ナトリウム水溶液中で60℃で1分間脱脂処理を行
なった後、0.5モル/リットルの濃度の塩酸水溶液中
において、温度28℃、電流密度60A/dm2 、処理
時間40秒の条件で電解エッチング処理を行なった。次
いで4重量%水酸化ナトリウム水溶液中で60℃、12
秒間のデスマット処理を施した後、20重量%硫酸溶液
中で、温度20℃、電流密度3.5A/dm2 、処理時
間1分の条件で陽極酸化処理を行なった。更に、80℃
の熱水で20秒間熱水封孔処理を行ない、平版印刷版用
支持体のアルミニウム板を作製した。この板の平均粗さ
Raの値は0.60μmであった。このRa値は表面粗
度計SE−3DH(小坂研究所社製)を用い、スキャン
長さ4mm、高域カットオフ無し、低域カットオフ0.
8mmの条件で測定した。EXAMPLES The present invention will be described in more detail with reference to the following Examples, which should not be construed as limiting the scope of the invention. [Production of Aluminum Plate] A 0.24 mm-thick aluminum plate (material 1050, tempered H16) was degreased in a 5% by weight aqueous sodium hydroxide solution at 60 ° C. for 1 minute, and then 0.5 mol In a hydrochloric acid aqueous solution having a concentration of 1 / liter, electrolytic etching was performed under the conditions of a temperature of 28 ° C., a current density of 60 A / dm 2 , and a processing time of 40 seconds. Then, in a 4% by weight aqueous sodium hydroxide solution at 60 ° C., 12
After a desmutting treatment for 2 seconds, an anodic oxidation treatment was carried out in a 20% by weight sulfuric acid solution at a temperature of 20 ° C., a current density of 3.5 A / dm 2 and a treatment time of 1 minute. In addition, 80 ° C
Hot water sealing treatment was performed for 20 seconds to prepare an aluminum plate as a lithographic printing plate support. The value of the average roughness Ra of this plate was 0.60 μm. The Ra value was measured using a surface roughness meter SE-3DH (manufactured by Kosaka Laboratory Co., Ltd.), scan length 4 mm, no high-frequency cutoff, low-frequency cutoff 0.
It was measured under the condition of 8 mm.
【0075】〔感光層の塗膜量の測定法〕支持体上に以
下の実施例にて示した条件で感光液を塗布、乾燥、加熱
処理して得られた感光性平版印刷版を10cm角の大き
さに切り取り、試料とした。試料片の重量を測定後、ア
セトンにより感光層を溶解除去し、再度、重量を測定し
てその減量分を求め、その値から1m2 当りの重量とし
て塗膜量を求めた。[Measurement Method of Coating Amount of Photosensitive Layer] A photosensitive lithographic printing plate obtained by coating a photosensitive solution on a support under the conditions shown in the following Examples, drying and heat-treating was used to form a 10 cm square plate. The sample was cut to the size of a sample. After measuring the weight of the sample piece, the photosensitive layer was dissolved and removed with acetone, the weight was measured again to determine the weight loss, and the weight per 1 m 2 was calculated from the value to determine the weight loss.
【0076】〔残膜率〕残膜率は実施例及び比較例に記
載の方法で現像後の非画線部の残存塗膜量を上記と同様
な方法で求め、初期塗膜量との比から求め下記基準で判
定した。 A:残膜が90重量%以上残存している。 B:残膜が70重量%以上90重量%未満残存してい
る。 C:残膜が50重量%以上70重量%未満残存してい
る。 D:残膜が50重量%未満残存している。[Remaining film ratio] The remaining film ratio was determined by the method described in Examples and Comparative Examples, in which the amount of the remaining coating film in the non-image area after development was determined in the same manner as described above. And determined according to the following criteria. A: 90% by weight or more of the remaining film remains. B: A residual film of 70% by weight or more and less than 90% by weight remains. C: 50% by weight or more and less than 70% by weight of the residual film remain. D: Less than 50% by weight of the remaining film remains.
【0077】実施例1〜10及び比較例1〜3 下記成分よりなる感光液を前述の方法で作製したアルミ
ニウム板上にワイヤーバーで塗布し、90℃にて2分間
乾燥させた後、55℃で16時間加熱処理し平版印刷版
を得た。塗膜量は2.8g/m2 であった。Examples 1 to 10 and Comparative Examples 1 to 3 A photosensitive solution comprising the following components was applied on an aluminum plate prepared by the above-mentioned method using a wire bar, dried at 90 ° C. for 2 minutes, and then dried at 55 ° C. For 16 hours to obtain a lithographic printing plate. The amount of the coating film was 2.8 g / m 2 .
【0078】 (感光液) アルカリ可溶性高分子化合物:フェノール:m−クレゾール:p−クレゾール 20:50:30モル比)をホルムアルデヒドと共縮合させたノ ボラック樹脂(Mw4000) 100重量部 光吸収色材:表−Aに記載のもの 5重量部 塩基発色性色素:表−Aに記載のもの 10重量部 溶媒:シクロヘキサノン 900重量部(Photosensitive solution) 100 parts by weight of a novolak resin (Mw 4000) obtained by co-condensing an alkali-soluble polymer compound: phenol: m-cresol: p-cresol at a molar ratio of 20:50:30) with formaldehyde : Those described in Table-A 5 parts by weight Base color-forming dyes: those described in Table-A 10 parts by weight Solvent: cyclohexanone 900 parts by weight
【0079】次に、上記試料を830nmの半導体レー
ザーを光源とする感光性平版印刷版露光装置(クレオ社
製Trend Setter 3244T.)を用いて
各種の露光エネルギーで212線、3〜97%の網点画
像を画像露光し、次いでアルカリ性現像液(コニカ社製
SDR−1を7倍に希釈したもの)を用い、28℃で現
像を行った。3%の網点画像が再現する露光量を用い
て、感度の評価を行った。露光量が低い程、高い感度を
示している。結果を表−Aに示す。Next, the sample was exposed to a lithographic printing plate exposure apparatus (Trend Setter 3244T, manufactured by Creo Corporation) using a 830 nm semiconductor laser as a light source at 212 lines of 3 to 97% at various exposure energies. The point image was image-exposed, and then developed at 28 ° C. using an alkaline developer (a 7-fold dilution of Konica SDR-1). The sensitivity was evaluated using the exposure amount at which a 3% halftone dot image was reproduced. The lower the exposure, the higher the sensitivity. The results are shown in Table-A.
【0080】[0080]
【表20】 [Table 20]
【0081】*1;使用した色素は以下のものである。 〔塩基発色性色素〕* 1: The dyes used are as follows. (Base coloring dye)
【0082】[0082]
【化11】 Embedded image
【0083】[0083]
【化12】 Embedded image
【0084】〔塩基発色性でない色素〕[Dye which is not base-color-forming]
【0085】[0085]
【化13】 Embedded image
【0086】*2;S−53、S−54、S−57は対
応する表−2の化合物を使用した。カーボンブラックは
三菱化学社製、MA220;一酸化チタンは三菱マテリ
アル社製、チタンブラック12Sを使用した。 *3;「F」は感度の場合、全面溶解し画像を形成しな
かったことを示し、残膜率の場合は、評価しなかったこ
とを示す。* 2: For S-53, S-54 and S-57, the corresponding compounds in Table 2 were used. Carbon black was manufactured by Mitsubishi Chemical Corporation, MA220; titanium monoxide was manufactured by Mitsubishi Materials Corporation, titanium black 12S. * 3: "F" indicates that the film was completely dissolved and no image was formed in the case of sensitivity, and the evaluation was not performed in the case of the residual film ratio.
【0087】[0087]
【発明の効果】本発明による塩基発色性色素を含有する
感光性組成物は、830nmの露光に対し、優れた感度
を有し、画線部の残膜率も優れている。The photosensitive composition containing the base color-forming dye according to the present invention has excellent sensitivity to exposure at 830 nm and an excellent residual film ratio in the image area.
Claims (11)
溶性有機高分子物質及び少なくとも塩基で発色する性質
を有する塩基発色性色素を含有することを特徴とするポ
ジ型感光性組成物。1. A positive photosensitive composition comprising an alkali-soluble organic polymer having a phenolic hydroxyl group and a base-color-forming dye having the property of forming a color with at least a base.
オン濃度で発色する色素であることを特徴とする請求項
1記載のポジ型感光性組成物。2. The positive photosensitive composition according to claim 1, wherein the base color-forming dye is a dye that forms a color at a hydrogen ion concentration of pH 3 or more.
溶性有機高分子物質が、ノボラック樹脂、レゾール樹脂
及びポリビニルフェノール樹脂から選ばれる少なくとも
1種の樹脂であることを特徴とする請求項1又は2記載
のポジ型感光性組成物。3. The positive electrode according to claim 1, wherein the alkali-soluble organic polymer having a phenolic hydroxyl group is at least one resin selected from a novolak resin, a resol resin and a polyvinylphenol resin. -Type photosensitive composition.
オラクトン骨格を有する構造の色素であることを特徴と
する請求項1乃至3の何れかに記載のポジ型感光性組成
物。4. The positive photosensitive composition according to claim 1, wherein the base color-forming dye is a dye having a structure having a lactone skeleton or a thiolactone skeleton.
を有する構造の色素であることを特徴とする請求項1乃
至3の何れかに記載のポジ型感光性組成物。5. The positive photosensitive composition according to claim 1, wherein the base color-forming dye is a dye having a structure having a sulfolactone skeleton.
示される、塩基で発色する性質を有する色素であること
を特徴とする請求項1乃至5の何れかに記載のポジ型感
光性組成物。 【化1】 (式中、Wはカルボニル基、チオカルボニル基又はスル
ホニル基を表し、環A、環B、環Cは、それぞれ独立し
て、1〜3環の芳香族炭化水素基又は1〜3環の芳香族
複素環基を表す。Ru1〜Ru12 は、それぞれ独立して、
水素原子、置換基を有していてもよい炭素数1〜15の
アルキル基、置換基を有していてもよい炭素数2〜15
のアシル基、置換基を有していてもよい炭素数1〜15
のアルコキシ基、置換基を有していてもよい炭素数2〜
15のアシルオキシ基、置換基を有していてもよい炭素
数2〜15のアルコキシカルボニル基、トリメチルシリ
ルオキシ基、置換基を有していてもよいアミノ基、水酸
基、ハロゲン原子、ニトロ基、イソシアナト基又はチオ
イソシアナト基を表す。また、環B及び環Cは結合基を
介して互いに結合していてもよい。)6. The positive photosensitive material according to claim 1, wherein the base color-forming dye is a dye represented by the following general formula (A) and having the property of forming a color with a base. Composition. Embedded image (Wherein W represents a carbonyl group, a thiocarbonyl group or a sulfonyl group, and ring A, ring B and ring C are each independently a 1 to 3 ring aromatic hydrocarbon group or 1 to 3 ring aromatic Represents a group heterocyclic group, wherein R u1 to R u12 each independently represent
A hydrogen atom, an alkyl group having 1 to 15 carbon atoms which may have a substituent, 2 to 15 carbon atoms which may have a substituent
An acyl group having 1 to 15 carbon atoms which may have a substituent
An alkoxy group having 2 to 2 carbon atoms which may have a substituent
15 acyloxy groups, an optionally substituted alkoxycarbonyl group having 2 to 15 carbon atoms, a trimethylsilyloxy group, an optionally substituted amino group, a hydroxyl group, a halogen atom, a nitro group, an isocyanato group Or a thioisocyanato group. Ring B and ring C may be bonded to each other via a bonding group. )
変換する光熱変換物質を含有することを特徴とする請求
項1乃至6の何れかに記載のポジ型感光性組成物。7. The positive photosensitive composition according to claim 1, further comprising a photothermal conversion material that absorbs light from an image exposure light source and converts the light into heat.
ことを特徴とする請求項7記載のポジ型感光性組成物。8. The positive photosensitive composition according to claim 7, wherein the photothermal conversion substance is a near infrared absorbing dye.
を対イオンとして有することを特徴とする請求項8記載
のポジ型感光性組成物。9. The positive photosensitive composition according to claim 8, wherein the near infrared absorbing dye has an organic borate anion as a counter ion.
はチタンブラックであることを特徴とする請求項7に記
載のポジ型感光性組成物。10. The positive photosensitive composition according to claim 7, wherein the photothermal conversion material is carbon black or titanium black.
に記載のポジ型感光性組成物からなる層を有することを
特徴とするポジ型感光性平版印刷版。11. A positive-working photosensitive lithographic printing plate comprising a support and a layer comprising the positive-working photosensitive composition according to claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30191597A JP3681268B2 (en) | 1997-11-04 | 1997-11-04 | Positive photosensitive composition and photosensitive lithographic printing plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30191597A JP3681268B2 (en) | 1997-11-04 | 1997-11-04 | Positive photosensitive composition and photosensitive lithographic printing plate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH11143076A true JPH11143076A (en) | 1999-05-28 |
| JP3681268B2 JP3681268B2 (en) | 2005-08-10 |
Family
ID=17902653
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30191597A Expired - Fee Related JP3681268B2 (en) | 1997-11-04 | 1997-11-04 | Positive photosensitive composition and photosensitive lithographic printing plate |
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| Country | Link |
|---|---|
| JP (1) | JP3681268B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2373508A (en) * | 2001-03-21 | 2002-09-25 | Kalibrant Ltd | Long wavelength fluorescent dyes with 2-(2-{2-chloro-3-[2-(2,3-dihydro-1H-indol-2-yliden)ethylidene]cyclohex-1-enyl}eth-1-enyl)-1H-benzo[e]indolium skeleton |
| JP2004163732A (en) * | 2002-11-14 | 2004-06-10 | Fuji Photo Film Co Ltd | Lithographic printing original plate |
| US7018774B2 (en) | 2002-09-30 | 2006-03-28 | Fuji Photo Film Co., Ltd. | Infrared sensitive composition and lithographic printing plate precursor |
-
1997
- 1997-11-04 JP JP30191597A patent/JP3681268B2/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2373508A (en) * | 2001-03-21 | 2002-09-25 | Kalibrant Ltd | Long wavelength fluorescent dyes with 2-(2-{2-chloro-3-[2-(2,3-dihydro-1H-indol-2-yliden)ethylidene]cyclohex-1-enyl}eth-1-enyl)-1H-benzo[e]indolium skeleton |
| US7018774B2 (en) | 2002-09-30 | 2006-03-28 | Fuji Photo Film Co., Ltd. | Infrared sensitive composition and lithographic printing plate precursor |
| JP2004163732A (en) * | 2002-11-14 | 2004-06-10 | Fuji Photo Film Co Ltd | Lithographic printing original plate |
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| Publication number | Publication date |
|---|---|
| JP3681268B2 (en) | 2005-08-10 |
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