JPH11149869A - Method for manufacturing fluorescent screen of color cathode ray tube - Google Patents

Abstract

(57) Abstract: A method for producing a phosphor screen of a color cathode-ray tube capable of reducing streak-like luminance unevenness along the edge of such a light absorbing film is provided. A photosensitive film (2) is formed on the inner surface of a panel (1) of a color cathode ray tube, and light is applied to the photosensitive film (2) through an electron beam passage hole of an electron beam arrival position determining means, and the photosensitive film (2) is developed. The unexposed portion is removed to form a resist film 2 'on the inner surface of the panel 1, and a light absorbing film 3 is formed on the inner surface of the panel 1 and the resist film 2'. 2 'and the light absorbing film 3 on the resist film 2' are removed to leave the light absorbing film 3 on the inner surface of the panel 1,
The phosphors R, G, and B of each color are formed on the inner surface of the panel 1 where the light absorbing film 3 is formed, and the thickness of the resist film is 0.10 mg / cm ^{2 to} 0.15 mg / cm ^2. It has been selected.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a method for producing a fluorescent screen of a color cathode ray tube.

[0002]

2. Description of the Related Art A method for producing a phosphor screen of a color cathode ray tube by a photographic printing method will be described. First, a photosensitive material is applied on the inner surface of the panel of the color cathode ray tube and dried to form a photosensitive film on the inner surface of the panel. This photosensitive material contains polyvinylpyrrolidone (PVP) and sodium diazidostilbene sulfonate (DAS) as main components.

[0003] Next, the photosensitive film is exposed to ultraviolet rays through means for determining an electron beam arrival position such as an aperture grill and a shadow mask, and then the photosensitive film is developed to remove unexposed portions. Then, a resist film (PVP film) having a pattern corresponding to the electron beam passage hole of the electron beam arrival position determining means is formed.

A light-absorbing paint mainly composed of graphite is applied so as to cover the inner surface of the panel and the resist film, and then dried to form a light-absorbing film covering the inner surface of the panel and the resist film. I do.

[0005] A resist film is formed on the inner surface of the panel, and the light absorbing film formed so as to cover the inner surface of the panel and the resist film is treated with a hydrogen peroxide solution to form a resist film on the inner surface of the panel. And a light absorbing film (carbon film) corresponding to the pattern of the electron beam non-transmissive portion of the means for determining an electron beam reaching position by removing the light absorbing film thereon.
Is obtained on the inner surface.

Then, red, green, and blue phosphors are separately applied to respective color phosphors on a portion of the panel where the light absorption film (carbon film) is formed on the inner surface where the light absorption film is not formed. , Stripe-shaped red, green and blue phosphors sequentially and cyclically arranged on the inner surface of the panel, and a light absorbing film (carbon film) provided on a portion without the red, green and blue phosphors
Is formed on the inner surface of the panel.

[0007]

However, in such a color phosphor screen, there is a problem that unevenness in the edge portion of the light absorbing film (carbon film) causes streak-like luminance unevenness along the edge of the light absorbing film. there were.

Hereinafter, the cause of the stripe-like uneven brightness along the edge of the light absorbing film will be discussed with reference to FIG.
FIG. 2 shows the characteristics of the amplitude (μm) of the edge of the light absorbing film (carbon film) with respect to the thickness of the resist film (PVP film thickness), that is, the mass (mg) per 1 cm ^{2 of} the resist film. In this case, the small amplitude of the edge of the light absorbing film means that the unevenness of the edge of the light absorbing film is small.

When the PVP film thickness is 0.10 mg / cm ² , the edge amplitude of the light absorbing film is 0.315 μm, and when the PVP film thickness is 0.14 mg / cm ² , the edge amplitude is 0. .375 μm, PVP film thickness 0.15 mg / c
The amplitude of the edge of the light absorbing film when m ² is 0.4125 μm
m, when the PVP film thickness was 0.16 mg / cm ² , the edge amplitude of the light absorbing film was 0.505 μm.

From the characteristics shown in FIG. 2, the PVP film thickness (resist film thickness) was about 0.16 mg / cm ² or more in the conventional method for producing a fluorescent screen of a color cathode ray tube. Since the amplitude was large, that is, the unevenness of the light absorbing film was relatively large, it was found that streak-like luminance unevenness along the edge of the light absorbing film clearly appeared.

In view of such a point, the present invention intends to propose a method of manufacturing a fluorescent screen of a color cathode ray tube which can reduce the stripe-like luminance unevenness along the edge of the light absorbing film. .

[0012]

According to the present invention, a photosensitive film is formed on an inner surface of a panel of a color cathode ray tube, and light is irradiated on the photosensitive film through an electron beam passage hole of an electron beam arrival position determining means. Developing the photosensitive film, removing the unexposed portions, forming a resist film on the inner surface of the panel, forming a light absorbing film on the inner surface of the panel and over the resist film,
The resist film and the light absorbing film on the resist film are removed, and the light absorbing film on the inner surface of the panel is left. In the method for producing a fluorescent screen of a color cathode ray tube, the thickness of the resist film is set to 0.10 mg / cm.
It is obtained by selecting the ^{2 ~0.15mg} / cm ^2.

In the method of manufacturing a phosphor screen of a color cathode ray tube, when the thickness of the resist film is selected to be 0.16 g / cm ² or more, the amplitude of the edge of the light absorbing film is 0.5.
However, when the thickness of the resist film is selected to be 0.15 g / cm ² or less as in the present invention, the width of the edge of the light absorbing film becomes 0.4125 μm or less, and the thickness of the resist film becomes Is thinner, the amplitude of the edge of the light absorbing layer is smaller.

However, when the thickness of the resist film is 0.10 mg
If less than / cm ^2, since the inverted remaining problems such as resist film occurs, the thickness of the resist film is 0.10 mg / cm
^Two or more is desirable.

[0015]

DETAILED DESCRIPTION OF THE INVENTION In the present invention, a photosensitive film is formed on the inner surface of a panel of a color cathode ray tube, and light is irradiated on the photosensitive film through an electron beam passage hole of an electron beam arrival position determining means. Developing the film to remove the unexposed portions, forming a resist film on the inner surface of the panel, forming a light absorbing film on the inner surface of the panel and over the resist film, forming a resist film and the resist film A color cathode ray in which the light absorbing film on the panel is removed, the light absorbing film on the inner surface of the panel is left, and the phosphors of the respective colors are formed on the inner surface of the panel where the light absorbing film is formed. The configuration is based on the method of manufacturing the fluorescent screen of the tube.

In the method of manufacturing a fluorescent screen of a color cathode ray tube, the thickness of the resist film is set to 0.10 mg /
cm ^{2 to} 0.15 mg / cm ² .

The above-mentioned photosensitive film can be, for example, one containing polyvinylpyrrolidone and sodium diazidostilbene sulfonate as main components.

The electron beam passage hole of the above-mentioned electron beam arrival position determining means is a vertical slit.

(Embodiment) An embodiment of the present invention will be described below in detail with reference to FIG. First, as shown in FIG. 1A, a photosensitive material is applied on the inner surface of a panel 1 of a color cathode ray tube, and is dried to form a photosensitive film 2 on the inner surface of the panel 1. This photosensitive material contains polyvinylpyrrolidone (PVP) and sodium diazidostilbene sulfonate (DAS) as main components.

Next, the photosensitive film 2 of FIG. 1A is passed through an aperture grill having an electron beam transmitting hole as a vertical slit, an electron beam reaching position determining means such as a shadow mask or the like having an electron beam transmitting hole in a dot shape. Exposure is performed using ultraviolet light, and then the photosensitive film 2 is developed to remove the unexposed portion, thereby forming a pattern corresponding to the electron beam passage hole of the electron beam arrival position determining means as shown in FIG. 1B. Is formed.

Then, the thickness of the resist film 2 'is set to 0.
It is intended to select the ^{10mg / cm 2 ~0.15mg / cm 2} .

In the method of manufacturing the fluorescent screen of the color cathode ray tube, when the thickness of the resist film is selected to be 0.16 g / cm ² or more, as shown in FIG. When the thickness of the resist film is selected to be 0.15 g / cm ² or less, the edge width of the light absorbing film becomes 0.4125 μm or less, and the thickness of the resist film becomes thin. The smaller the amplitude, the smaller the amplitude of the edge of the light absorbing layer.

However, when the thickness of the resist film is 0.10 mg
If less than / cm ^2, since the inverted remaining problems such as resist film occurs, the thickness of the resist film is 0.10 mg / cm
^Two or more is desirable.

A light-absorbing paint containing graphite as a main component is applied so as to cover the inner surface of the panel 1 shown in FIG. 1B and the resist film 2 ', and then dried, as shown in FIG. 1C. A light absorbing film 3 is formed on the inner surface and covering the resist film 2 '.

A resist film 2 'formed on the inner surface 1 of the panel shown in FIG. 1C and a light absorbing film 3 formed so as to cover the inner surface of the panel 1 and the resist film 2' is replaced with hydrogen peroxide. The resist film 2 ′ on the inner surface of the panel 1 and the light absorbing film 3 thereon are peeled off by treatment with water, and as shown in FIG. The panel 1 in which the light absorbing film (carbon film) 3 corresponding to the above pattern is formed on the inner surface is obtained.

Then, as shown in FIG. 1, the light absorbing film 3 of the panel 1 in which the light absorbing film (carbon film) 3 is formed on the inner surface.
By forming red, green, and blue phosphors separately for each color phosphor on portions where no is formed, striped or dot-shaped red, which is sequentially circulated on the inner surface of the panel 1, From the light absorbing film (carbon film) 3 having stripe-shaped or dot-shaped holes in portions where the green and blue phosphors R, G, B and the red, green and blue phosphors R, G, B are not formed. The color phosphor screen 4 is formed on the inner surface of the panel 1.

The thickness of the resist film (PVP film thickness), that is,
For the mass (mg) per 1 cm ^{2 of the} resist film,
FIG. 2 showing the characteristics of the amplitude (μm) of the edge of the light absorbing film (carbon film) will be described. 0.10mg PVP film thickness
/ Cm ² , the amplitude of the edge of the light absorbing film is 0.315
[mu] m, the amplitude of the edge of the light absorbing film when the amplitude of the edge of the light absorbing film 0.375Myuemu, the PVP film thickness of 0.15 mg / cm ² when the PVP film thickness 0.14 mg / cm ² is 0. 4125 μm, PVP film thickness 0.16 mg / cm
^{In the case of 2} , the amplitude of the edge of the light absorbing film was 0.505 μm.

According to this, the PVP film thickness is 0.16 mg.
/ Cm ² , the amplitude of the edge of the light absorbing film sharply increases, and when the PVP film thickness is 0.15 mg / cm ² or less, the amplitude of the edge of the light absorbing layer decreases to 0.4125 μm or less, The smaller the PVP film thickness, the smaller the amplitude of the edge of the light absorbing layer. However, if the PVP film thickness is less than 0.10 mg / cm ² , problems such as the above-described inversion of the resist film formed of the photosensitive film occur. Therefore, the resist film thickness is preferably 0.10 mg / cm ² or more.
Therefore, the thickness of the resist film 2 'is set to 0.10 mg / cm ²
０．１0.15 mg / cm ² .

FIGS. 3 to 6 show that the thickness of the PVP film was 0.10 mg / cm ² , 0.14 mg / cm ² , 0.1, respectively.
The light absorbing film selected at 5 mg / cm ² and 0.16 mg / cm ² is input to an image processor, and the edge of the light absorbing film is regarded as a kind of wave, and Fourier analysis is performed. The amplitude of the edge is quantitatively evaluated. The horizontal axis indicates the wavelength (μm) of the edge of the light absorbing layer (film), and the vertical axis indicates the amplitude (μm) of the edge of the light absorbing film.

In the evaluation of FIGS. 3 to 6, when the pitch of the color phosphor screen (the pitch between phosphors of the same color) is P, the wavelength (μm) of the edge of the light absorbing layer (film) is p = P / 3
The magnitude (μm) of the edge of the light absorbing layer (film) in a portion equal to or larger than (the pitch between adjacent phosphors or between adjacent light absorbing films) is evaluated. The pitch P between the phosphors of the same color is, for example, 270 out of 260 μm to 280 μm.
μm, the pitch p is p = P / 3 = 90 μm
Becomes Therefore, the wavelength of the edge of the light absorbing layer (film) is 90
μm or more, for example, 100 μm, 150 μm, 2
It can be seen that the smaller the average value of the amplitude (μm) of the edge of the light absorbing layer (film) at 00 μm and 250 μm, the less the luminance unevenness along the edge of the light absorbing film.

FIG. 3 shows that the PVP film thickness is 0.100 mg / c.
The characteristics at the time of m ² are shown. The wavelength of the edge of the light absorbing layer (film) is 90 microns or more, for example, 100 μm,
The amplitude (μm) of the edge of the light absorbing layer (film) at 50 μm, 200 μm, and 250 μm was 0.33 μm, respectively.
m, 0.34 μm, 0.29 μm and 0.30, the average value is 0.315 μm.

FIG. 4 shows that the PVP film thickness is 0.140 mg / c.
The characteristics at the time of m ² are shown. The wavelength of the edge of the light absorbing layer (film) is 90 microns or more, for example, 100 μm,
The amplitude (μm) of the edge of the light absorbing layer (film) at 50 μm, 200 μm, and 250 μm is 0.32 μm, respectively.
m, 0.38 μm, 0.39 μm and 0.41, the average value is 0.375 μm.

FIG. 5 shows that the PVP film thickness is 0.150 mg / c.
The characteristics at the time of m ² are shown. The wavelength of the edge of the light absorbing layer (film) is 90 microns or more, for example, 100 μm,
The amplitude (μm) of the edge of the light absorbing layer (film) at 50 μm, 200 μm, and 250 μm is 0.28 μm, respectively.
m, 0.42 μm, 0.48 μm and 0.47, the average value is 0.4125 μm.

FIG. 6 shows that the PVP film thickness is 0.160 mg / c.
The characteristics at the time of m ² are shown. The wavelength of the edge of the light absorbing layer (film) is 90 microns or more, for example, 100 μm,
The amplitude (μm) of the edge of the light absorbing layer (film) at 50 μm, 200 μm, and 250 μm is 0.37 μm, respectively.
m, 0.66 μm, 0.50 μm and 0.59, the average value of which is 0.505 μm.

Each PVP film thickness is 0.100 mg / c
m ² , 0.140 mg / cm ² , 0.150 mg / cm
² , the edge evaluation value at 0.160 mg / cm ² is
0.315 μm, 0.375 μm, 0.412 respectively
5 μm and 0.505 μm. It can be seen that the smaller the PVP film thickness, the lower the film thickness, and the larger the PVP film, the higher the film thickness.

[0036]

According to the present invention described above, a photosensitive film is formed on the inner surface of a panel of a color cathode ray tube, and light is irradiated on the photosensitive film through an electron beam passage hole of an electron beam arrival position determining means. Developing the photosensitive film, removing the unexposed portions, forming a resist film on the inner surface of the panel, forming a light absorbing film on the inner surface of the panel and over the resist film,
The resist film and the light-absorbing film on the resist film are removed, and the light-absorbing film on the inner surface of the panel is left, and phosphors of each color are formed on the inner surface of the panel where the light-absorbing film is formed. In the method for producing a fluorescent screen of a color cathode ray tube, the thickness of the resist film is set to 0.10 mg / cm.
Having selected the ^{2 ~0.15mg} / cm ^2, it is possible to obtain a method for manufacturing a phosphor screen of a color cathode ray tube capable of reducing the luminance unevenness streaky along the edges of the light absorbing film.

[Brief description of the drawings]

FIG. 1 is a process diagram showing a method for producing a fluorescent screen of a color cathode ray tube according to an embodiment of the present invention in a sectional view.

FIG. 2 is a characteristic diagram showing a characteristic of an amplitude (edge shape) of an edge of a light absorption film with respect to a PVP film thickness (resist film thickness).

FIG. 3 shows a PVP film thickness (resist film thickness) of 0.100 μm.
FIG. 9 is a characteristic curve diagram showing a relationship between the wavelength of the edge of the light absorbing layer (film) and the amplitude of the edge of the light absorbing layer (film) at the time of (1).

FIG. 4 shows a PVP film thickness (resist film thickness) of 0.140 μm.
FIG. 9 is a characteristic curve diagram showing a relationship between the wavelength of the edge of the light absorbing layer (film) and the amplitude of the edge of the light absorbing layer (film) at the time of (1).

FIG. 5 shows a PVP film thickness (resist film thickness) of 0.150 μm.
FIG. 9 is a characteristic curve diagram showing a relationship between the wavelength of the edge of the light absorbing layer (film) and the amplitude of the edge of the light absorbing layer (film) at the time of (1).

FIG. 6 shows a PVP film thickness (resist film thickness) of 0.160 μm.
FIG. 9 is a characteristic curve diagram showing a relationship between the wavelength of the edge of the light absorbing layer (film) and the amplitude of the edge of the light absorbing layer (film) at the time of (1).

[Explanation of symbols]

1. A panel of a color cathode ray tube, a 2 photosensitive film, a 2 'resist film, a 3 light absorbing film, a 4 color phosphor screen, an R red phosphor, a G green phosphor and a B blue phosphor.

Claims (3)

[Claims] A photosensitive film is formed on an inner surface of a panel of a color cathode ray tube, and the photosensitive film is irradiated with light through an electron beam passage hole of an electron beam arrival position determining means to develop the photosensitive film. An unexposed portion is removed to form a resist film on the inner surface of the panel, a light absorbing film is formed on the inner surface of the panel and over the resist film, and the resist film and the resist film are formed. The light-absorbing film is removed to leave the light-absorbing film on the inner surface of the panel, and the phosphors of each color are formed on the inner surface of the panel where the light-absorbing film is formed. In the method for producing a fluorescent screen of a color cathode ray tube, the thickness of the resist film is set to 0.10 mg / cm ^{2 to} 0.1
A method for producing a phosphor screen of a color cathode ray tube, wherein the phosphor screen is selected to be 5 mg / cm ² . 2. The method according to claim 1, wherein the photosensitive film is mainly composed of polyvinylpyrrolidone and sodium diazidostilbene sulfonate. How to make a phosphor screen. 3. The color cathode ray tube according to claim 1, wherein the electron beam passage hole of said electron beam arrival position determining means is a slit in a vertical direction. Method for producing a fluorescent screen.