JPH11145603A - Thermosetting adhesive for temporary fixing of electronic components and method of fixing electronic components using the same - Google Patents
Thermosetting adhesive for temporary fixing of electronic components and method of fixing electronic components using the sameInfo
- Publication number
- JPH11145603A JPH11145603A JP31910197A JP31910197A JPH11145603A JP H11145603 A JPH11145603 A JP H11145603A JP 31910197 A JP31910197 A JP 31910197A JP 31910197 A JP31910197 A JP 31910197A JP H11145603 A JPH11145603 A JP H11145603A
- Authority
- JP
- Japan
- Prior art keywords
- seconds
- adhesive
- electronic component
- temperature
- fixing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/303—Surface mounted components, e.g. affixing before soldering, aligning means, spacing means
- H05K3/305—Affixing by adhesive
Landscapes
- Adhesives Or Adhesive Processes (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
Abstract
(57)【要約】 (修正有)
【課題】 ハンダの融点よりも低い温度で硬化するにも
かかわらず、ハンダの溶融にともなう電子部品の沈み込
みやセルフアライメントを阻害せず、大型の樹脂モール
ド部品を基板にハンダ付け及び接着剤で固定化する場合
であっても、十分な接着強度を与える電子部品仮止め用
熱硬化性接着剤の提供。
【解決手段】 電子部品仮止め用熱硬化性接着剤であっ
て、170℃における硬化時間が80〜200秒である
こと、150℃における硬化時間が400〜800秒で
あること、60±30秒で室温から150±20℃まで
昇温し、70±30秒間150±20℃で保温し、30
±10秒で150±20℃から230±20℃まで昇温
し、40±20秒で230±20℃から170±10℃
まで冷却したときの水平方向の広がり率が20〜50%
及びダレ率が60〜90%であること。(57) [Abstract] (Modified) [Problem] Despite curing at a temperature lower than the melting point of solder, it does not inhibit sinking of electronic components and self-alignment due to melting of solder, and a large resin mold Provided is a thermosetting adhesive for temporarily fixing electronic components, which provides sufficient adhesive strength even when components are soldered to a substrate and fixed with an adhesive. A thermosetting adhesive for temporarily fixing electronic components, wherein the curing time at 170 ° C. is 80 to 200 seconds, the curing time at 150 ° C. is 400 to 800 seconds, 60 ± 30 seconds. The temperature is raised from room temperature to 150 ± 20 ° C. and kept at 150 ± 20 ° C. for 70 ± 30 seconds.
Temperature rises from 150 ± 20 ° C to 230 ± 20 ° C in ± 10 seconds, and 230 ± 20 ° C to 170 ± 10 ° C in 40 ± 20 seconds
20% to 50% horizontal spread when cooled to
And the sag rate is 60 to 90%.
Description
【0001】[0001]
【発明の属する技術分野】本発明は、電子部品仮止め用
熱硬化性接着剤及び電子部品の接着方法に関する。The present invention relates to a thermosetting adhesive for temporarily fixing electronic parts and a method for bonding electronic parts.
【0002】[0002]
【従来の技術】従来の電子部品仮止め用熱硬化性接着剤
(以下、接着剤ともいう)は、加熱による広がり率が小
さく、クリームハンダ(以下、ハンダともいう)の融点
(183℃)よりも低い温度で硬化するとともに固化す
るために、ハンダの溶融時には、電子部品は既にその接
着剤により強く固定化されてしまう。そのため、ハンダ
の溶融にともなう電子部品の沈み込みやセルフアライメ
ントが阻害され、電子部品の電極の接地不良(以下、単
に接地不良ともいう)や電子部品のプリント基板(以
下、単に基板ともいう)に対する位置ズレが生じやすか
った。前記問題点を解決する方法として、ハンダの融点
よりも高い温度で硬化する電子部品仮止め用接着剤が提
案されている(特開平8−130363号公報参照)。
この接着剤は、ハンダの溶融にともなう電子部品の沈み
込みやセルフアライメントを阻害しないが、接着剤の硬
化温度が高いため、例えば、大型の樹脂モールド部品S
OP(Small Outline Package)や
QFT(Quad Flat Package)等を基板
にハンダ付け及び接着剤で固定化する場合、一般的に前
記のような大型の樹脂モールド部品真下の温度は、基板
表面温度より20〜30℃低いため、その部分に塗布し
た接着剤は硬化不良となりやすく、接着剤による基板と
電子部品との間の接着力は非常に弱いものとなった。こ
のような電子部品と基板との間の接着力が弱いものは、
これを裏返しにして基板の裏面に対して同様にして電子
部品を接着しようとすると、その電子部品がSOPやQ
FT等の場合には、それが基板から脱落する等の問題を
生じやすかった。2. Description of the Related Art A conventional thermosetting adhesive for temporarily fixing electronic components (hereinafter, also referred to as an adhesive) has a small spread ratio upon heating and has a melting point (183 ° C.) of cream solder (hereinafter, also referred to as solder). However, the electronic component is already firmly fixed by the adhesive when the solder is melted, because it is hardened and solidified at a low temperature. Therefore, sinking and self-alignment of the electronic component due to the melting of the solder are hindered, and poor grounding of the electrodes of the electronic component (hereinafter, also simply referred to as grounding) and the printed circuit board of the electronic component (hereinafter, also simply referred to as substrate). Positional deviation was easy to occur. As a method for solving the above-mentioned problem, an adhesive for temporarily fixing an electronic component which cures at a temperature higher than the melting point of solder has been proposed (see Japanese Patent Application Laid-Open No. H8-130363).
This adhesive does not inhibit the sinking and self-alignment of the electronic component due to the melting of the solder, but since the curing temperature of the adhesive is high, for example, a large resin mold component S
When soldering OP (Small Outline Package), QFT (Quad Flat Package), or the like to a substrate and fixing the same with an adhesive, the temperature directly below the large resin mold component as described above is generally 20 degrees below the substrate surface temperature. Since the temperature was lower by 3030 ° C., the adhesive applied to that portion was liable to be cured poorly, and the adhesive strength between the substrate and the electronic component by the adhesive became very weak. Those with weak adhesive force between such electronic components and the board,
When this is turned over and the electronic component is to be bonded to the back surface of the substrate in the same manner, the electronic component becomes SOP or Q.
In the case of FT or the like, problems such as dropping off from the substrate are likely to occur.
【0003】[0003]
【発明が解決しようとする課題】本発明は、ハンダの融
点よりも低い温度で硬化する電子部品仮止め用熱硬度性
接着剤であるにもかかわらず、ハンダの溶融にともなう
電子部品の沈み込みやセルフアライメントを阻害せず、
大型の樹脂モールド部品を基板にハンダ付け及び接着剤
で固定化する場合であっても、十分な接着強度を与える
電子部品仮止め用熱硬化性接着剤及びそれを用いた電子
部品の固定化方法を提供することをその課題とする。SUMMARY OF THE INVENTION The present invention is directed to a thermosetting adhesive for temporarily fixing electronic components which cures at a temperature lower than the melting point of solder, but the sinking of electronic components due to the melting of solder. And self-alignment,
Thermosetting adhesive for temporarily fixing electronic components that provides sufficient adhesive strength even when a large resin mold component is soldered to a substrate and fixed with an adhesive, and an electronic component fixing method using the same Is to provide
【0004】[0004]
【課題を解決するための手段】本発明者らは、前記課題
を解決すべく鋭意研究を重ねて結果、本発明を完成する
に至った。即ち、本発明によれば、プリント基板にクリ
ームハンダと電子部品仮止め用熱硬化性接着剤とを介し
て電子部品を固定化させる電子部品の固定化方法に用い
る電子部品仮止め用熱硬化性接着剤であって、(i)そ
の170℃における硬化時間が80〜200秒であるこ
と、(ii)その150℃における硬化時間が400〜8
00秒であること、(iii)それを60±30秒で室温
から150±20℃まで昇温し、 70±30秒間150±20℃で保温し、 30±10秒で150±20℃から230±20℃ま
で昇温し、 40±20秒で230±20℃から170±10℃ま
で冷却したときの水平方向の広がり率が20〜50%及
びそのダレ率が60〜90%であること、を特徴とする
電子部品の仮止め用熱硬化性接着剤が提供される。ま
た、本発明によれば、プリント基板に電子部品を固定化
させる方法において、(i)プリント基板に対してクリ
ームハンダと前記電子部品仮止め用熱硬化性接着剤とを
塗布する工程、(ii)電子部品の電極部がクリームハン
ダ塗布部上に位置し、電子部品の非電極部が接着剤塗布
部上に位置するように電子部品を搭載する工程、(iii)
加熱炉で基板上に塗布されたクリームハンダと接着剤と
を 60±30秒で室温から150±20℃まで昇温し、 70±30秒間150±20℃で保温し、 30±10秒で150±20℃から230±20℃ま
で昇温して、クリームハンダを溶融させるとともに、接
着剤を徐々に硬化させる工程、 基板上の溶融クリームハンダを40±20秒で230
±20℃から170±10℃まで冷却し、固化する工
程、からなる前記の方法が提供される。Means for Solving the Problems The present inventors have made intensive studies to solve the above problems, and as a result, have completed the present invention. That is, according to the present invention, the thermosetting electronic component temporary fixing method used in the electronic component fixing method for fixing the electronic component to the printed circuit board via the cream solder and the electronic component temporary fixing thermosetting adhesive. An adhesive, wherein (i) the curing time at 170 ° C. is 80 to 200 seconds, and (ii) the curing time at 150 ° C. is 400 to 8 seconds.
(Iii) It is heated from room temperature to 150 ± 20 ° C. in 60 ± 30 seconds, kept at 150 ± 20 ° C. for 70 ± 30 seconds, and 230 ± 150 ° C. in 30 ± 10 seconds. When the temperature is raised to ± 20 ° C and the horizontal spread rate is 20 to 50% and the sag rate is 60 to 90% when cooled from 230 ± 20 ° C to 170 ± 10 ° C in 40 ± 20 seconds, The present invention provides a thermosetting adhesive for temporarily fixing an electronic component. Further, according to the present invention, in the method for fixing an electronic component to a printed board, (i) applying cream solder and the thermosetting adhesive for temporarily fixing the electronic component to the printed board, And (iii) mounting the electronic component such that the electrode portion of the electronic component is located on the cream solder application portion and the non-electrode portion of the electronic component is located on the adhesive application portion.
The temperature of the cream solder and the adhesive applied on the substrate in the heating furnace is raised from room temperature to 150 ± 20 ° C. in 60 ± 30 seconds, kept at 150 ± 20 ° C. for 70 ± 30 seconds, and 150 ± 30 seconds in 30 ± 10 seconds. A step of raising the temperature from ± 20 ° C. to 230 ± 20 ° C. to melt the cream solder and gradually cure the adhesive;
Cooling from ± 20 ° C. to 170 ± 10 ° C. and solidifying.
【0005】[0005]
【発明の実施の形態】本発明の電子部品仮止め用熱硬化
性接着剤は、ハンダの溶融温度183℃より低い温度で
硬化するものであり、170℃における硬化時間が80
〜200秒、好ましくは、120〜180秒であり、1
50℃における硬化時間が400〜800秒、好ましく
は、500〜700秒である。170℃における硬化時
間が80秒より速いと、また150℃における硬化時間
が400秒より速いと、接着剤の広がりが不十分にな
り、接着不良になりやすいという問題があり、一方、1
70℃における硬化時間が200秒より遅いと、また1
50℃における硬化時間が800秒より遅いと、接着剤
が十分に硬化せず、特に、大型樹脂モールド部品の場
合、基板から脱落しやすいという問題がある。DESCRIPTION OF THE PREFERRED EMBODIMENTS The thermosetting adhesive for temporarily fixing electronic parts according to the present invention cures at a temperature lower than the melting temperature of solder of 183.degree. C., and the curing time at 170.degree.
To 200 seconds, preferably 120 to 180 seconds, and 1
The curing time at 50 ° C. is 400 to 800 seconds, preferably 500 to 700 seconds. If the curing time at 170 ° C. is faster than 80 seconds, and if the curing time at 150 ° C. is faster than 400 seconds, there is a problem that the spread of the adhesive becomes insufficient and the adhesive tends to be defective.
If the curing time at 70 ° C. is slower than 200 seconds,
If the curing time at 50 ° C. is longer than 800 seconds, the adhesive is not sufficiently cured, and particularly in the case of a large resin molded part, there is a problem that the adhesive easily falls off the substrate.
【0006】本発明の電子部品仮止め用接着剤は、これ
を60±30秒で室温から150±20℃まで昇温
し、70±30秒間150±20℃で保温し、30
±10秒で150±20℃から230±20℃まで昇温
し、40±20秒で230±20℃から170±10
℃まで冷却したときの水平方向の広がり率(以下、単に
広がり率ともいう)が20〜50%、垂直方向のダレ率
(以下、単にダレ率ともいう)が60〜90%であるの
が好ましく、より好ましくは、広がり率が20〜40
%、ダレ率が70〜85%である。広がり率が20%未
満であると、ハンダ溶融にともなう電子部品の沈み込み
やセルフアライメントが不十分になりやすく、位置ズレ
や接地不良が生じやすくなるという問題があり、50%
より大きいと、特に、基板に小型のチップ部品をハンダ
付け及び接着剤で固定化する場合、接着剤が基板の電極
にまで広がりやすく、ハンダ付け不良が生じやすくなる
という問題がある。また、ダレ率が60%未満である
と、ハンダ溶融にともなう電子部品の沈み込みが不十分
になりやすく、接地不良が生じやすくなるという問題が
あり、90%より大きいと、特に、基板に小型のチップ
部品をハンダ付け及び接着剤で固定化する場合、接着剤
が基板の電極にまで広がりやすく、ハンダ付け不良を生
じやすくなるという問題がある。The adhesive for temporarily fixing electronic parts of the present invention is heated from room temperature to 150 ± 20 ° C. in 60 ± 30 seconds, and kept at 150 ± 20 ° C. for 70 ± 30 seconds.
The temperature is raised from 150 ± 20 ° C to 230 ± 20 ° C in ± 10 seconds, and from 230 ± 20 ° C to 170 ± 10 in 40 ± 20 seconds.
It is preferable that the horizontal spread rate (hereinafter, also simply referred to as spread rate) when cooled to ℃ is 20 to 50%, and the vertical sag rate (hereinafter, also simply referred to as sag rate) is 60 to 90%. , More preferably, the spread rate is 20 to 40.
% And the sag rate are 70 to 85%. If the spread ratio is less than 20%, there is a problem that sinking of the electronic component due to the melting of the solder and self-alignment are likely to be insufficient, and misalignment and poor grounding are likely to occur.
If it is larger, there is a problem that the adhesive tends to spread to the electrodes of the substrate, and soldering failure is likely to occur, particularly when a small chip component is soldered to the substrate and fixed with an adhesive. Further, when the sag rate is less than 60%, there is a problem that the sinking of the electronic component due to the melting of the solder is apt to be insufficient, and a poor grounding is liable to occur. When the chip component is soldered and fixed with an adhesive, there is a problem that the adhesive easily spreads to the electrodes of the substrate, and soldering failure is likely to occur.
【0007】本発明の接着剤は前記特性を有するもので
あり、そのような特性を有する限り本発明の目的に適合
する接着剤として用いることができる。本発明の接着剤
の好ましい成分組成例を示すと、例えば、本発明の接着
剤は、(1)ビスフェノールA型エポキシ樹脂及び/又
はビスフェニールF型エポキシ樹脂と、(2)反応希釈
剤と、(3)酸ヒドラジド系硬化剤と、(4)アルキル
尿素系硬化促進剤及び/又は尿素アダクト系硬化促進剤
と、(5)有機物系レオロジー添加剤と、(6)無機充
填剤とからなるものである。ビスフェノールA型エポキ
シ樹脂としては、エポキシ当量が170〜230で、2
5℃で液体状のものが好ましい。ビスフェノールF型エ
ポキシ樹脂としては、エポキシ当量が150〜185
で、25℃で液体状のものが好ましい。ビスフェノール
A型エポキシ樹脂とビスフェノールF型エポキシ樹脂と
の混合物を用いる場合、その重量混合比率は、40:6
0〜60:40が好ましい。両者の重量混合比率が前記
範囲を外れると、結晶化を起こすことがあるので好まし
くない。[0007] The adhesive of the present invention has the above-mentioned properties, and as long as it has such properties, it can be used as an adhesive suitable for the purpose of the present invention. As an example of a preferred component composition of the adhesive of the present invention, for example, the adhesive of the present invention comprises (1) a bisphenol A type epoxy resin and / or a bisphenyl F type epoxy resin, (2) a reaction diluent, (3) an acid hydrazide-based curing agent, (4) an alkyl urea-based curing accelerator and / or a urea adduct-based curing accelerator, (5) an organic rheology additive, and (6) an inorganic filler. It is. The bisphenol A type epoxy resin has an epoxy equivalent of 170 to 230 and 2
Preferred is a liquid at 5 ° C. The bisphenol F type epoxy resin has an epoxy equivalent of 150 to 185.
And a liquid at 25 ° C. is preferred. When a mixture of bisphenol A type epoxy resin and bisphenol F type epoxy resin is used, the weight mixing ratio is 40: 6.
0 to 60:40 is preferred. If the weight mixing ratio of the two is out of the above range, crystallization may occur, which is not preferable.
【0008】反応希釈剤としては、n−ブチルグリシジ
ルエーテル、アリルグリシジルエーテル、2−エチルヘ
キシルグリシジルエーテル、スチレンオキサイド、フェ
ニルグリシジルエーテル、クレジルグリシジルエーテ
ル、p.sec−ブチルフェニルグリシジルエーテル、
グリシジルメタクリレート、ビニルシクロヘキセンモノ
エポキサイド、α−ピネンオキサイド、3級カルボン酸
グリシジルエステル、ジグリシジルエーテル等のモノエ
ポキサイド、(ポリ)エチレングリコールジグリシジル
エーテル、(ポリ)プロピレングリコールジグリシジル
エーテル、ブタンジオールジグリシジルエーテル、ビニ
ルシクロヘキセンジオキサイド、ネオベンチルグリコー
ルジグリシジルエーテル、ジグリシジルアニリン等のジ
エポキサイド等を挙げることができる。反応性希釈剤の
好ましい配合量は、エポキシ樹脂100重量部に対し
て、1〜50重量部、より好ましくは、5〜20重量部
である。Examples of the reaction diluent include n-butyl glycidyl ether, allyl glycidyl ether, 2-ethylhexyl glycidyl ether, styrene oxide, phenyl glycidyl ether, cresyl glycidyl ether, p. sec-butylphenyl glycidyl ether,
Glycidyl methacrylate, vinylcyclohexene monoepoxide, α-pinene oxide, tertiary carboxylic acid glycidyl ester, monoepoxide such as diglycidyl ether, (poly) ethylene glycol diglycidyl ether, (poly) propylene glycol diglycidyl ether, butanediol diglycidyl Examples thereof include ethers, vinylcyclohexene dioxide, neoepenyl glycol diglycidyl ether, and diepoxides such as diglycidylaniline. The preferable amount of the reactive diluent is 1 to 50 parts by weight, more preferably 5 to 20 parts by weight, based on 100 parts by weight of the epoxy resin.
【0009】酸ヒドラジド系硬化剤としては、25℃で
固体状のもの、例えば、アジピン酸ジヒドラジド、セバ
シン酸ジヒドラジド、コハク酸ジヒドラジド、ドデカン
二酸ジヒドラジド、エイコサン二酸ジヒドラジド、ヘキ
サデカン二酸ジヒドラジド、イソフタル酸ジヒドラジド
等を挙げることができる。酸ヒドラジド系硬化剤の好ま
しい配合量は、エポキシ樹脂に対して、当量比で、1.
0〜0.7、より好ましくは1.0〜0.8である。硬
化剤として、ジシアンジアミドを用いた場合には、耐湿
性が悪くなり、イミダゾール系化合物を用いた場合に
は、保存安定性が悪くなるという問題がある。アルキル
尿素系硬化促進剤としては、25℃で固体状のもの、例
えば、3−(3,4−ジクロロフェニル)−1,1−ジ
メチルウレア等のフェニルジメチルウレア、トルエンビ
スジメチルウレア、メチレンビスジメチルウレア等のフ
ェニルビスジメチルウレア等を挙げることができる。尿
素アダクト系硬化促進剤としては、25℃で固体状のも
の、例えば、「フジキュア FXB−1050」(富士
化成工業社製)等を挙げることができる。アルキル尿素
系硬化促進剤及び/又は尿素アダクト系硬化促進剤の好
ましい配合量は、エポキシ樹脂100重量部に対して、
0.1〜5.0重量部、より好ましくは0.5〜3.0
重量部である。Examples of the acid hydrazide-based curing agent include those which are solid at 25 ° C., for example, adipic dihydrazide, sebacic dihydrazide, succinic dihydrazide, dodecane diacid dihydrazide, eicosane diacid dihydrazide, hexadecane diacid dihydrazide, isophthalic acid. Dihydrazide and the like can be mentioned. The preferred compounding amount of the acid hydrazide-based curing agent is 1.
0 to 0.7, more preferably 1.0 to 0.8. When dicyandiamide is used as a curing agent, there is a problem that moisture resistance is deteriorated, and when an imidazole-based compound is used, storage stability is deteriorated. Examples of the alkylurea-based curing accelerator include those which are solid at 25 ° C., for example, phenyldimethylurea such as 3- (3,4-dichlorophenyl) -1,1-dimethylurea, toluenebisdimethylurea, and methylenebisdimethylurea. And the like. Examples of the urea adduct-based curing accelerator include those in a solid state at 25 ° C., for example, “Fujicure FXB-1050” (manufactured by Fuji Kasei Kogyo Co., Ltd.). The preferred compounding amount of the alkyl urea-based curing accelerator and / or urea adduct-based curing accelerator is based on 100 parts by weight of the epoxy resin.
0.1 to 5.0 parts by weight, more preferably 0.5 to 3.0 parts by weight.
Parts by weight.
【0010】有機物系レオロジー添加剤としては、融点
150℃以下の従来公知の各種のもの、例えば、変性ひ
まし油系レオロジー添加剤や、有機アミド系レオロジー
添加剤等を挙げることができる。融点が150℃より高
いと、接着剤の広がりが不十分になり、接地不良になり
やすいという問題がある。有機物系レオロジー添加剤の
好ましい融点は、150〜60℃、より好ましくは、1
00〜70℃である。有機物系レオロジー添加剤の好ま
しい配合量は、エポキシ樹脂100重量部に対して、1
〜20重量部、より好ましくは3〜10重量部である。
無機充填剤としては、従来公知の各種のものを用いるこ
とができるが、特に薄片状のものを好ましく用いること
ができる。このような無機充填剤としては、タルク、焼
成タルク、雲母が挙げられるが、好ましくは焼成タルク
である。無機充填剤の好ましい配合量は、エポキシ樹脂
100重量部に対して、5〜150重量部、より好まし
くは10〜100重量部である。Examples of the organic rheology additive include various conventionally known ones having a melting point of 150 ° C. or lower, such as a modified castor oil rheology additive and an organic amide rheology additive. If the melting point is higher than 150 ° C., there is a problem that the spread of the adhesive becomes insufficient and a ground failure is likely to occur. The preferred melting point of the organic rheological additive is 150 to 60 ° C, more preferably 1 to 60 ° C.
00-70 ° C. The preferred amount of the organic rheological additive is 1 to 100 parts by weight of the epoxy resin.
To 20 parts by weight, more preferably 3 to 10 parts by weight.
As the inorganic filler, various types of conventionally known inorganic fillers can be used, and particularly, flaky ones can be preferably used. Examples of such an inorganic filler include talc, calcined talc, and mica, and preferably calcined talc. The preferred compounding amount of the inorganic filler is 5 to 150 parts by weight, more preferably 10 to 100 parts by weight, based on 100 parts by weight of the epoxy resin.
【0011】本発明の接着剤には、必要に応じ、無機物
系レオロジー添加剤、界面活性剤、シランカップリング
剤、着色剤等の慣用の補助成分を適量添加することがで
きる。To the adhesive of the present invention, if necessary, an appropriate amount of a conventional auxiliary component such as an inorganic rheological additive, a surfactant, a silane coupling agent, and a coloring agent can be added.
【0012】本発明の接着剤は、プリント基板にハンダ
と接着剤とを介して電子部分を固定化する場合の電子部
分仮止め用接着剤として用いられる。この場合の電子部
品を基板に固定化させるための基本的操作は従来公知の
方法に従って行うことができる。The adhesive of the present invention is used as an adhesive for temporarily fixing an electronic part when an electronic part is fixed to a printed circuit board via solder and an adhesive. In this case, the basic operation for fixing the electronic component to the substrate can be performed according to a conventionally known method.
【0013】本発明の接着剤と従来のクリームハンダと
を用いて基板上に電子部品を固定化させる好ましい方法
を示すと、先ず、基板上にハンダをその所定の個所に塗
布する。この場合、ハンダは、その基板上の電極部上に
塗布される。このハンダの塗布は、従来公知の各種の方
法、例えば、スクリーン印刷により行うことができる。
次に、接着剤を基板上の所定の個所に塗布する。この場
合、その接着剤は、通常、基板上の電極部間に塗布され
る。この接着剤の塗布は、従来公知の方法、例えば、デ
ィスペンサのノズルを介して行う。次に、基板に対する
前記ハンダと接着剤のその塗布終了後には、所定の電子
部品を搭載する。この搭載は従来公知の方法により行う
ことができる。即ち、電子部品の電極部(リードワイヤ
ー)をハンダ塗布部上に位置させ、電子部品の非電極部
を接着剤塗布部上に位置させる。この電子部品の搭載工
程により、その電子部品は、その接着剤の接着力によ
り、弱い接着力ではあるが、基板上に仮止めされる。A preferred method for fixing an electronic component on a substrate using the adhesive of the present invention and a conventional cream solder will be described. First, solder is applied to a predetermined position on a substrate. In this case, the solder is applied on the electrodes on the substrate. The application of the solder can be performed by various conventionally known methods, for example, screen printing.
Next, an adhesive is applied to a predetermined location on the substrate. In this case, the adhesive is usually applied between the electrode portions on the substrate. The application of the adhesive is performed by a conventionally known method, for example, through a nozzle of a dispenser. Next, after the application of the solder and the adhesive to the substrate is completed, predetermined electronic components are mounted. This mounting can be performed by a conventionally known method. That is, the electrode portion (lead wire) of the electronic component is located on the solder application portion, and the non-electrode portion of the electronic component is located on the adhesive application portion. In the mounting process of the electronic component, the electronic component is temporarily fixed on the substrate, although the electronic component has a weak adhesive force due to the adhesive force of the adhesive.
【0014】次に、前記のようにして電子部品を搭載さ
せた基板は、これをリフロー装置の加熱炉に入れ、ここ
で基板を加熱する。この場合の基板の加熱は、従来公知
の方法で実施することができる。この加熱により、基板
上のハンダ及び接着剤は加熱され、ハンダは溶融し、一
方、接着剤はその硬化を開始し、徐々に硬化して行く。
この場合の加熱温度は、ハンダが溶融する温度であり、
この場合の基板の加熱は、好ましくは、60±30秒
で室温から150℃±20℃まで昇温し、70±30
秒間150±20℃で保温し、30±10秒で150
±20℃から230±20℃まで昇温する加熱工程で行
う。前記加熱工程においては、ハンダの溶融が起こると
ともに、液体状の接着剤は前記した硬化特性を有するも
のであることから、徐々に時間をかけて硬化し、最終的
には固体状の固化物となり、これによって基板に対する
電子部品の固定化が達成される。即ち、基板に搭載され
た電子部品の電極部は、その電子部品の自重と溶融ハン
ダの表面張力により、溶融ハンダ中に十分に沈み込むと
同時に、電子部品は、セルフアライメントし、その硬化
が進んで接着力の増強した接着剤により固定化され、最
終的には、その接着剤の強い接着力で基板上に固着され
る。Next, the substrate on which the electronic components are mounted as described above is placed in a heating furnace of a reflow device, where the substrate is heated. The heating of the substrate in this case can be performed by a conventionally known method. By this heating, the solder and the adhesive on the substrate are heated, and the solder melts, while the adhesive starts to harden and gradually hardens.
The heating temperature in this case is the temperature at which the solder melts,
In this case, the substrate is preferably heated from room temperature to 150 ° C. ± 20 ° C. in 60 ± 30 seconds, and heated to 70 ± 30 ° C.
Keep at 150 ± 20 ° C for 150 seconds and 150 ± 30 seconds for 30 ± 10 seconds.
This is performed in a heating step of raising the temperature from ± 20 ° C. to 230 ± 20 ° C. In the heating step, as the solder melts and the liquid adhesive has the above-mentioned curing characteristics, it gradually cures over time, and finally becomes a solid solidified product. Thus, the electronic component is fixed to the substrate. That is, the electrode portion of the electronic component mounted on the substrate sufficiently sinks into the molten solder due to the weight of the electronic component and the surface tension of the molten solder, and at the same time, the electronic component self-aligns and its hardening proceeds. And is finally fixed on the substrate with the strong adhesive force of the adhesive.
【0015】次に、前記のようにして加熱された基板
は、40±20秒で230±20℃から170±10
℃まで冷却され、その溶融ハンダは固化される。Next, the substrate heated as described above is heated from 230 ± 20 ° C. to 170 ± 10 ° C. in 40 ± 20 seconds.
C. and the molten solder is solidified.
【0016】前記のようにして基板の表面に対する電子
部品の固定化が終了した後、必要に応じ、その基板を裏
返し、その基板の裏面に対しても、同様にして電子部品
の固定化を行うことができる。本発明の接着剤は、ハン
ダの溶融温度よりも低い温度でその硬化を開始し、その
流動性を維持しながら、ハンダの溶融時に徐々に液体状
から固体状へ向けて硬化していくことから、ハンダの溶
融時に、電子部品のリード線等がその溶融ハンダ中に沈
み込むのを阻害せず、また、電子部品がその自重で接着
剤塗布物上に徐々に沈み込み、セルフアライメントする
のを阻害せず、しかも、そのハンダの溶融時において最
終的には十分硬化する。これによって、電子部品は強い
接着力で基板上に固着される。即ち、本発明の接着剤を
用いることにより、電子部品を位置ずれや接地不良、ハ
ンダ付け不良等を生じることなく、円滑に基板上に固定
化させるこができる。また、本発明の接着剤を用いると
きには、その電子部品と基板との間の接着力が強固であ
ることから、基板を裏返してその裏面に電子部品を固定
化する場合に、その電子部品が重量のあるものでも脱落
するようなこともない。After the electronic components have been fixed to the surface of the substrate as described above, the substrate is turned over as necessary, and the electronic components are similarly fixed to the rear surface of the substrate. be able to. The adhesive of the present invention starts its curing at a temperature lower than the melting temperature of the solder and gradually hardens from a liquid state to a solid state when the solder is melted while maintaining its fluidity. When the solder is melted, it does not hinder the lead wires of the electronic parts from sinking into the molten solder, and prevents the electronic parts from gradually sinking on the adhesive applied material by their own weight, thereby performing self-alignment. It does not hinder, and finally cures sufficiently when the solder is melted. Thereby, the electronic component is fixed on the substrate with a strong adhesive force. That is, by using the adhesive of the present invention, the electronic component can be smoothly fixed on the substrate without causing displacement, grounding failure, soldering failure, and the like. Further, when the adhesive of the present invention is used, since the adhesive force between the electronic component and the substrate is strong, when the substrate is turned upside down and the electronic component is fixed on the back surface, the electronic component becomes heavy. Even if there is something, it will not drop out.
【0017】[0017]
【実施例】次に本発明を実施例によりさらに詳細に説明
する。Next, the present invention will be described in more detail with reference to examples.
【0018】実施例1 表1の組成物No.1の接着剤を用い、以下の工程によ
り、電子部品を基板上に固定化した。 (1)接着塗布工程 プリント基板上の電極(銅箔)上にクリームハンダを常
法により塗布した後、ディスペンサにより接着剤をその
電極間に常法により塗布する。 (2)電子部品搭載工程 次に、電子部品を、常法により基板に搭載する。即ち、
電子部品のリード線をハンダ上に接触(接地)させ、電
子部品の本体部を接着剤塗布物上に接触させる。 (3)加熱工程 前記基板を加熱炉に入れて、基板表面に熱気を吹き当て
て、60秒で室温から150℃まで昇温し、70秒
間150℃で保温し、30秒で150℃から230℃
まで昇温して、ハンダを溶融させる。前記加熱により、
基板上のハンダは溶融し、電子部品のリード線は、その
電子部品の自重とハンダの表面張力とによりそのハンダ
中に沈み込む。一方、接着剤塗布物は、前記加熱により
その硬化を開始し、徐々に硬化して、前記加熱工程内に
十分に硬化する。この場合、接着剤はその硬化の進行に
応じて接着力を高め、十分に硬化した時には、固体とな
り、電子部品を基板上に強く固着させる。本発明の接着
剤は、その流動性を維持しながら徐々に硬化して行くた
め、接着剤が固体状の硬化物となる以前に、電子部品の
リード線の溶融ハンダ中への沈み込みが起こり、その電
子部品のリード線の溶融ハンダ中への沈み込みが阻害さ
れることはない。また、電子部品の自重による接着剤塗
布物への沈み込みも阻害されることはない。 (4)冷却工程 前記加熱後、基板は、常法により、空気ファンにより、
40秒で230℃から170℃まで冷却後、室温に冷
却され、これによって溶融ハンダの固化が起こり、電子
部品のリード線が基板の電極部に固着される。基板に対
する前記電子部品の固定化方法(搭載方法)によれば、
接着剤が固体状に硬化する以前に、ハンダの溶融が起こ
るので、接着剤は、電子部品のリード線の溶融ハンダへ
の沈み込み及び電子部品自体の自重による沈み込みは実
質上阻害されることはなく、電子部品を確実に基板上に
固定化させることができる。Example 1 Composition No. 1 in Table 1 Using the adhesive of No. 1, an electronic component was fixed on a substrate by the following steps. (1) Adhesive coating step After applying cream solder on an electrode (copper foil) on a printed circuit board by an ordinary method, an adhesive is applied between the electrodes by a dispenser by an ordinary method. (2) Electronic Component Mounting Step Next, the electronic component is mounted on the substrate by an ordinary method. That is,
The lead wire of the electronic component is brought into contact with the solder (ground), and the main body of the electronic component is brought into contact with the adhesive applied material. (3) Heating Step The substrate is placed in a heating furnace, and hot air is blown against the substrate surface, the temperature is raised from room temperature to 150 ° C. in 60 seconds, kept at 150 ° C. for 70 seconds, and reduced from 150 ° C. to 230 in 30 seconds. ° C
Temperature to melt the solder. By the heating,
The solder on the substrate is melted, and the lead wires of the electronic component sink into the solder due to the weight of the electronic component and the surface tension of the solder. On the other hand, the adhesive applied material starts to be cured by the heating, gradually cures, and sufficiently cures in the heating step. In this case, the adhesive increases the adhesive strength as the curing progresses, and when sufficiently cured, becomes solid and firmly fixes the electronic component on the substrate. Since the adhesive of the present invention gradually cures while maintaining its fluidity, the lead wire of the electronic component may sink into the molten solder before the adhesive becomes a solid cured product. The sinking of the lead wire of the electronic component into the molten solder is not hindered. Further, sinking of the electronic component into the adhesive applied material due to its own weight is not hindered. (4) Cooling Step After the heating, the substrate is blown by an air fan by a conventional method.
After cooling from 230 ° C. to 170 ° C. in 40 seconds, it is cooled to room temperature, whereby solidification of the molten solder occurs, and the lead wire of the electronic component is fixed to the electrode portion of the substrate. According to the method of fixing the electronic component to the substrate (mounting method),
Since the melting of the solder occurs before the adhesive hardens to a solid state, the adhesive is substantially prevented from sinking the lead wires of the electronic component into the molten solder and sinking due to the weight of the electronic component itself. However, the electronic component can be securely fixed on the substrate.
【0019】表1に前記組成物の硬化時間、広がり率
(%)、ダレ率(%)、ハンダ付け性及び部品保持性を
示す。これらの特性は、以下のようにして測定、評価さ
れたものである。 (硬化時間(=ゲル化時間))JIS C 2104に
準拠して、150±1.5℃及び170±1.5℃の熱
板上の凹に接着剤試料0.4mlをとり、かき混ぜ棒で
60±5回/分の速度でかき混ぜ、試料が粘着性を失っ
て糸を引かなくなるまでの時間を硬化時間(=ゲル化時
間)とした。 (広がり率(%))接着剤試料(試料温度28℃)を、
ノズル先端内径1.0mmのディスペンサ(「KP−4
80」、JUKI社製)で塗布物直径が1.6mm(n
=10)と1.0mm(n=10)の円形になるよう
に、ソルダーレジストとその上にプリフラックスが塗布
されている縦100mm×横114mm×厚さ1.6m
mのガラスエポキシ基板上に塗布し、これをUV付きリ
フロー炉(「TMF−101」、三洋電機社製)で6
0秒で室温から150℃まで昇温し、70秒間150
℃で保温し、30秒で150℃から230℃まで昇温
し、40秒で230℃から170℃まで冷却後、室温
に冷却し、その基板上に形成された塗布物の直径を0.
5mmが測定可能なスケール付き光学顕微鏡で測定し、
接着剤の広がり率(%)を以下のようにして算出し、そ
の平均値を求めた。 広がり率(%)=(B−A)/A×100 A:塗布直後の接着剤塗布物の直径 B:硬化後の接着剤硬化物の直径 (ダレ率(%))接着剤試料(試料温度28℃)を、ノ
ズル先端内径1.0mmのディスペンサ(「KP−48
0」、JUKI社製)で塗布物直径が1.6mm(n=
10)の円形になるように、ソルダーレジストとその上
にプリフラックスが塗布されている縦100mm×横1
14mm×厚さ1.6mmのガラスエポキシ基板上に塗
布し、これをUV付きリフロー加熱炉(「TMF−10
1」、三洋電機社製)で60秒で室温から150℃ま
で昇温し、70秒間150℃で保温し、30秒で1
50℃から230℃まで昇温し、40秒で230℃か
ら170℃まで冷却後、室温に冷却し、その基板上に形
成された塗布物の高さを0.01mmが測定可能なマイ
クロメータで測定し、接着剤のダレ率(%)を以下のよ
うにして算出し、その平均値を求めた。 ダレ率(%)=(C−D)/C×100 C:塗布直後の接着剤塗布物の高さ D:硬化後の接着剤硬化物の高さ (ハンダ付け性)ソルダーレジストとその上にプリフラ
ックスが塗布されている縦100mm×横114mm×
厚さ1.6mmのガラスエポキシ基板の電極上に、融点
183℃のクリームハンダを所定量塗布し、次に、接着
剤試料を、ノズル先端内径0.4mmのディスペンサ
(「KP−480」、JUKI社製)で塗布物直径が
0.7mm(ピッチ0.9mmの2点打ち)の円形にな
るように4箇所(=8点)に塗布し、15mm角でリー
ドピッチが0.5mm、ピン数が100ピンのQFTの
電極部がクリームハンダ塗布部上に位置し、非電極部が
接着剤塗布部上に位置するように搭載し、これをUV付
きリフロー加熱炉(「TMF−101」、三洋電機社
製)で60秒で室温から150℃まで昇温し、70
秒間150℃で保温し、30秒で150℃から230
℃まで昇温し、40秒で230℃から170℃まで冷
却後、室温に冷却し、ハンダ付け性を以下の基準で評価
した。 ○:QFTの沈み込みやセルフアライメントが十分で、
接地不良や位置ズレがない。 ×:QFTの沈み込みやセルフアライメントが不十分
で、接地不良や位置ズレがある。 (部品保持性)前記ハンダ付け性を、QFTが基板の下
になるように裏返し、前記ハンダ付け性評価試験と同一
の加熱、冷却条件で再処理し、部品特性を以下の基準で
評価した。 ○:再加熱前と後のQFTの保持状態に変化がない。 ×:QFTの脱落や接地不良や位置ズレが生じた。 なお、表1に示した配合成分の内容は、次のとおりであ
る。Table 1 shows the curing time, spread rate (%), sag rate (%), solderability and part holding properties of the composition. These characteristics were measured and evaluated as follows. (Curing time (= gelling time)) In accordance with JIS C 2104, take 0.4 ml of the adhesive sample in a recess on a hot plate at 150 ± 1.5 ° C. and 170 ± 1.5 ° C., and stir with a stirring rod. The mixture was stirred at a rate of 60 ± 5 times / min, and the time required for the sample to lose tackiness and not to draw a string was defined as a curing time (= gelling time). (Spread rate (%)) Adhesive sample (sample temperature 28 ° C)
A dispenser with a nozzle tip inner diameter of 1.0 mm ("KP-4
80 "(manufactured by JUKI) with a diameter of 1.6 mm (n
= 10) and 1.0 mm (n = 10) so that a solder resist and a pre-flux are applied thereon to a length of 100 mm × width 114 mm × thickness 1.6 m.
m on a glass epoxy substrate, and this is coated in a UV reflow oven (“TMF-101”, manufactured by Sanyo Electric Co., Ltd.).
The temperature was raised from room temperature to 150 ° C. in 0 seconds, and 150 ° C. for 70 seconds.
The temperature was raised from 150 ° C to 230 ° C in 30 seconds, cooled from 230 ° C to 170 ° C in 40 seconds, and then cooled to room temperature to reduce the diameter of the coating material formed on the substrate to 0.1 ° C.
Measured with an optical microscope with a scale that can measure 5 mm,
The spread rate (%) of the adhesive was calculated as follows, and the average value was calculated. Spreading rate (%) = (BA) / A × 100 A: Diameter of adhesive applied immediately after application B: Diameter of cured adhesive after curing (Sag rate (%)) Adhesive sample (sample temperature) 28 ° C.) with a dispenser (“KP-48
0 "(manufactured by JUKI) and the coated material diameter is 1.6 mm (n =
10) A solder resist and a pre-flux are coated on the solder resist so as to have a circular shape of 10).
A 14 mm x 1.6 mm thick glass epoxy substrate was coated, and this was applied to a UV reflow heating furnace ("TMF-10").
1 ", manufactured by Sanyo Electric Co., Ltd.), the temperature was raised from room temperature to 150 ° C. in 60 seconds, kept at 150 ° C. for 70 seconds, and reduced to 1 in 30 seconds.
The temperature was raised from 50 ° C to 230 ° C, cooled from 230 ° C to 170 ° C in 40 seconds, then cooled to room temperature, and the height of the coating material formed on the substrate was measured with a micrometer capable of measuring 0.01 mm. It measured, the sag rate (%) of the adhesive was calculated as follows, and the average value was calculated. Sag rate (%) = (C−D) / C × 100 C: height of adhesive applied immediately after application D: height of cured adhesive after curing (solderability) Solder resist and Pre-flux coated 100mm long x 114mm wide x
A predetermined amount of cream solder having a melting point of 183 ° C. is applied on an electrode of a glass epoxy substrate having a thickness of 1.6 mm, and then the adhesive sample is dispensed with a dispenser (“KP-480”, JUKI Co., Ltd.) and applied to four places (= 8 points) so that the diameter of the applied material is 0.7 mm (two points with 0.9 mm pitch), the lead pitch is 15 mm square, the lead pitch is 0.5 mm, and the number of pins Is mounted such that the electrode portion of the 100-pin QFT is located on the cream solder application portion and the non-electrode portion is located on the adhesive application portion, and this is mounted in a reflow heating furnace with UV (“TMF-101”, Sanyo Temperature from room temperature to 150 ° C in 60 seconds,
Incubate at 150 ° C for 30 seconds, and from 150 ° C to 230 in 30 seconds.
The temperature was raised to 230 ° C., cooled from 230 ° C. to 170 ° C. in 40 seconds, then cooled to room temperature, and the solderability was evaluated according to the following criteria. ○: Sinking of QFT and self-alignment are sufficient,
There is no poor grounding or misalignment. ×: The sinking of QFT and the self-alignment are insufficient, and there are poor grounding and misalignment. (Part holding property) The solderability was reversed so that the QFT was below the substrate, reprocessed under the same heating and cooling conditions as in the solderability evaluation test, and the component characteristics were evaluated according to the following criteria. :: There is no change in the QFT holding state before and after reheating. ×: QFT was dropped, poor ground contact, or misalignment occurred. The contents of the components shown in Table 1 are as follows.
【0020】エポキシ樹脂(ZX−1059):商品名
「ZX−1059」、東部化成社製ビスフェノールA型
エポキシ樹脂とビスフェノールF型エポキシ樹脂との等
重量混合物、エポキシ当量165、粘度2000cps
(25℃) 反応性希釈剤(ネオトートE):商品名「ネオトート
E」、東部化成社製3級カルボン酸グリシジルエステ
ル、エポキシ当量240〜265、粘度5〜20cps
(25℃) 硬化剤(ADH):商品名「ADH」、大塚化学社製ア
ジピン酸ジヒドラジド 硬化促進剤(FXB−1050):商品名「フジキュア
FXB−1050」、富士化成工業社製、尿素アダクト
系硬化促進剤、平均粒径5μm 硬化促進剤(オミキュア52):商品名「オミキュア5
2」、オミクロンケミカル社製メチレンジフェニルビス
ジメチルウレア、平均粒径10μ以下 有機物系レオロジー添加剤(THIXCIN−R):商
品名「THIXCIN−R」、RHEOX社製水添ひま
し油、白色微粉末、融点86℃ 有機物系レオロジー添加剤(ターレンXA−79):商
品名「ターレンXA−79」、共栄社化学社製脂肪酸ア
マイドワックス系レオロジー添加剤、白色粉末、融点1
60℃ 無機充填剤(エンスタック24):商品名「エンスタッ
ク24」、浅田製粉社製タルク(タルクを1100℃で
焼成し、エンスタタイト化したもの)、平均粒径3.0
μmEpoxy resin (ZX-1059): trade name "ZX-1059", an equal weight mixture of bisphenol A type epoxy resin and bisphenol F type epoxy resin manufactured by Tobu Kasei Co., epoxy equivalent 165, viscosity 2000 cps
(25 ° C.) Reactive diluent (NEOTOT E): trade name “NEOTOT E”, tertiary carboxylic acid glycidyl ester manufactured by Tobu Kasei Co., epoxy equivalent 240-265, viscosity 5-20 cps
(25 ° C.) Curing agent (ADH): trade name “ADH”, adipate dihydrazide manufactured by Otsuka Chemical Co., Ltd. Curing accelerator (FXB-1050): trade name “Fujicure FXB-1050”, manufactured by Fuji Chemical Co., Ltd., urea adduct system Curing accelerator, average particle size 5 μm Curing accelerator (Omicure 52): trade name “Omicure 5”
2 ", methylene diphenylbisdimethylurea manufactured by Omicron Chemical Co., Ltd., average particle size: 10 μm or less Organic rheology additive (THIXCIN-R): trade name“ THIXCIN-R ”, hydrogenated castor oil manufactured by RHEOX, white fine powder, melting point 86 Organic rheological additive (Tallen XA-79): trade name "Tallen XA-79", a fatty acid amide wax-based rheological additive manufactured by Kyoeisha Chemical Co., white powder, melting point 1
60 ° C. Inorganic filler (Enstack 24): trade name “Enstack 24”, talc manufactured by Asada Flour Milling Co., Ltd. (talc fired at 1100 ° C. and made enstatite), average particle size 3.0
μm
【0021】[0021]
【表1】 [Table 1]
【0022】[0022]
【発明の効果】本発明の接着剤を用いることにより、プ
リント基板に対し、電子部品を接地不良や位置ズレ、ハ
ンダ付け不良等の不具合を生じることなく、円滑に固定
化することができる。By using the adhesive of the present invention, electronic components can be smoothly fixed to a printed circuit board without problems such as poor grounding, misalignment, and poor soldering.
Claims (3)
品仮止め用熱硬化性接着剤とを介して電子部品を固定化
させる電子部品の固定化方法に用いる電子部品仮止め用
熱硬化性接着剤であって、(i)その170℃における
硬化時間が80〜200秒であること、(ii)その15
0℃における硬化時間が400〜800秒であること、
(iii)それを60±30秒で室温から150±20℃
まで昇温し、 70±30秒間150±20℃で保温し、 30±10秒で150±20℃から230±20℃ま
で昇温し、 40±20秒で230±20℃から170±10℃ま
で冷却したときの水平方向の広がり率が20〜50%及
びそのダレ率が60〜90%であること、を特徴とする
電子部品の仮止め用熱硬化性接着剤。1. A thermosetting adhesive for temporarily fixing an electronic component, which is used in a method for fixing an electronic component to a printed circuit board via cream solder and a thermosetting adhesive for temporarily fixing an electronic component. (I) the curing time at 170 ° C. is 80 to 200 seconds; (ii) 15
That the curing time at 0 ° C. is 400 to 800 seconds;
(iii) It is heated from room temperature to 150 ± 20 ° C. in 60 ± 30 seconds.
The temperature is kept at 150 ± 20 ° C for 70 ± 30 seconds, and the temperature is raised from 150 ± 20 ° C to 230 ± 20 ° C in 30 ± 10 seconds, and 230 ± 20 ° C to 170 ± 10 ° C in 40 ± 20 seconds. A thermosetting adhesive for temporary fixing of electronic components, characterized in that the rate of spread in the horizontal direction when cooled down to 20 to 50% and the sag rate thereof is 60 to 90%.
が、ビスフェノールA型エポキシ樹脂及び/又はビスフ
ェノールF型エポキシ樹脂と、反応性希釈剤と、酸ヒド
ラジド系硬化剤と、アルキル尿素系硬化促進剤及び/又
は尿素アダクト系硬化促進剤と、有機物系レオロジー添
加剤と、無機充填剤とからなる液状エポキシ系樹脂組成
物である請求項1の電子部品仮止め用熱硬化性接着剤。2. The thermosetting adhesive for temporarily fixing an electronic component includes a bisphenol A type epoxy resin and / or a bisphenol F type epoxy resin, a reactive diluent, an acid hydrazide type curing agent, and an alkyl urea type curing agent. The thermosetting adhesive according to claim 1, which is a liquid epoxy resin composition comprising an accelerator and / or a urea adduct-based curing accelerator, an organic-based rheological additive, and an inorganic filler.
法において、(i)プリント基板に対してクリームハン
ダと請求項1又は2の電子部品仮止め用熱硬化性接着剤
とを塗布する工程、(ii)電子部品の電極部がクリーム
ハンダ塗布部上に位置し、電子部品の非電極部が接着剤
塗布部上に位置するように電子部品を搭載する工程、(i
ii)加熱炉で基板上に塗布されたクリームハンダと接着
剤とを 60±30秒で室温から150±20℃まで昇温し、 70±30秒間150±20℃で保温し、 30±10秒で150±20℃から230±20℃ま
で昇温して、クリームハンダを溶融させるとともに、接
着剤を徐々に硬化させる工程、 基板上の溶融クリームハンダを40±20秒で230
±20℃から170±10℃まで冷却し、固化する工
程、からなる前記の方法。3. A method for fixing an electronic component to a printed circuit board, wherein (i) applying cream solder and the thermosetting adhesive for temporarily fixing the electronic component according to claim 1 or 2 to the printed circuit board; (Ii) mounting the electronic component such that the electrode portion of the electronic component is located on the cream solder application portion and the non-electrode portion of the electronic component is located on the adhesive application portion;
ii) The temperature of the cream solder and the adhesive applied on the substrate in the heating furnace is raised from room temperature to 150 ± 20 ° C. in 60 ± 30 seconds, kept at 150 ± 20 ° C. for 70 ± 30 seconds, and 30 ± 10 seconds. A step of raising the temperature from 150 ± 20 ° C. to 230 ± 20 ° C. to melt the cream solder and gradually cure the adhesive;
Cooling from ± 20 ° C. to 170 ± 10 ° C. and solidifying.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31910197A JPH11145603A (en) | 1997-11-05 | 1997-11-05 | Thermosetting adhesive for temporary fixing of electronic components and method of fixing electronic components using the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31910197A JPH11145603A (en) | 1997-11-05 | 1997-11-05 | Thermosetting adhesive for temporary fixing of electronic components and method of fixing electronic components using the same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH11145603A true JPH11145603A (en) | 1999-05-28 |
Family
ID=18106489
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP31910197A Pending JPH11145603A (en) | 1997-11-05 | 1997-11-05 | Thermosetting adhesive for temporary fixing of electronic components and method of fixing electronic components using the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH11145603A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2012165321A1 (en) * | 2011-05-27 | 2015-02-23 | コニカミノルタ株式会社 | INK JET HEAD MANUFACTURING METHOD, INK JET HEAD, MANUFACTURING METHOD FOR INTERMEDIATE ELECTRIC STRUCTURE |
| JP2016023299A (en) * | 2014-07-24 | 2016-02-08 | 株式会社タムラ製作所 | Adhesive composition and method of bonding electronic component |
-
1997
- 1997-11-05 JP JP31910197A patent/JPH11145603A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2012165321A1 (en) * | 2011-05-27 | 2015-02-23 | コニカミノルタ株式会社 | INK JET HEAD MANUFACTURING METHOD, INK JET HEAD, MANUFACTURING METHOD FOR INTERMEDIATE ELECTRIC STRUCTURE |
| JP2016023299A (en) * | 2014-07-24 | 2016-02-08 | 株式会社タムラ製作所 | Adhesive composition and method of bonding electronic component |
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