JPH11130839A - Coating material for hydroid ic and production of insulation-treated hybrid ic - Google Patents
Coating material for hydroid ic and production of insulation-treated hybrid icInfo
- Publication number
- JPH11130839A JPH11130839A JP29842097A JP29842097A JPH11130839A JP H11130839 A JPH11130839 A JP H11130839A JP 29842097 A JP29842097 A JP 29842097A JP 29842097 A JP29842097 A JP 29842097A JP H11130839 A JPH11130839 A JP H11130839A
- Authority
- JP
- Japan
- Prior art keywords
- coating material
- hybrid
- group
- epoxy resin
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011248 coating agent Substances 0.000 title claims abstract description 36
- 238000000576 coating method Methods 0.000 title claims abstract description 36
- 239000000463 material Substances 0.000 title claims abstract description 25
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 8
- 238000009413 insulation Methods 0.000 title abstract description 3
- 241000243320 Hydrozoa Species 0.000 title abstract 2
- 239000003822 epoxy resin Substances 0.000 claims abstract description 18
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 18
- 229920003986 novolac Polymers 0.000 claims abstract description 12
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims abstract description 9
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 claims abstract description 8
- 239000004721 Polyphenylene oxide Substances 0.000 claims abstract description 8
- 229930003836 cresol Natural products 0.000 claims abstract description 8
- 229920000570 polyether Polymers 0.000 claims abstract description 8
- 229920001296 polysiloxane Polymers 0.000 claims abstract description 8
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims abstract description 6
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229920005989 resin Polymers 0.000 claims description 8
- 239000011347 resin Substances 0.000 claims description 8
- 229930185605 Bisphenol Natural products 0.000 abstract 1
- 239000004843 novolac epoxy resin Substances 0.000 abstract 1
- 239000010408 film Substances 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- 239000004593 Epoxy Substances 0.000 description 5
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 238000001723 curing Methods 0.000 description 4
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 4
- 239000004850 liquid epoxy resins (LERs) Substances 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 230000001846 repelling effect Effects 0.000 description 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 125000001183 hydrocarbyl group Chemical group 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 239000005011 phenolic resin Substances 0.000 description 3
- 230000035939 shock Effects 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 239000013065 commercial product Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000013329 compounding Methods 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 125000005394 methallyl group Chemical group 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- KWKAKUADMBZCLK-UHFFFAOYSA-N 1-octene Chemical group CCCCCCC=C KWKAKUADMBZCLK-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- NBNGHXWJFSMASY-UHFFFAOYSA-N 2,3,4-tris(dimethylamino)phenol Chemical compound CN(C)C1=CC=C(O)C(N(C)C)=C1N(C)C NBNGHXWJFSMASY-UHFFFAOYSA-N 0.000 description 1
- FTXPFQFOLRKRKF-UHFFFAOYSA-N 2-(5-methyl-1h-imidazol-2-yl)propanenitrile Chemical compound N#CC(C)C1=NC=C(C)N1 FTXPFQFOLRKRKF-UHFFFAOYSA-N 0.000 description 1
- UIDDPPKZYZTEGS-UHFFFAOYSA-N 3-(2-ethyl-4-methylimidazol-1-yl)propanenitrile Chemical compound CCC1=NC(C)=CN1CCC#N UIDDPPKZYZTEGS-UHFFFAOYSA-N 0.000 description 1
- RJAJIFKQGHMYMQ-UHFFFAOYSA-N 5-benzyl-2-ethyl-1h-imidazole Chemical compound N1C(CC)=NC(CC=2C=CC=CC=2)=C1 RJAJIFKQGHMYMQ-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 125000000732 arylene group Chemical group 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 125000002993 cycloalkylene group Chemical group 0.000 description 1
- 125000004956 cyclohexylene group Chemical group 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- -1 siloxane compound Chemical class 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明はハイブリッドICの
被覆材料、さらに詳しくは防湿、絶縁に適したハイブリ
ットICの被覆材料およびこれを用いて絶縁処理された
ハイブリッドICの製造法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a coating material for a hybrid IC, and more particularly to a coating material for a hybrid IC suitable for moisture proof and insulation, and a method for manufacturing a hybrid IC insulated using the same.
【0002】[0002]
【従来の技術】近年、民生機器や産業用機器に使用され
る電子機器が小型化および薄型化するにつれて、これに
使用されるハイブリッドIC(インテグラル・サーキッ
ト)もまた同様に小型化、薄型化および高集積化が図ら
れる傾向にある。従来のハイブリッドICの製造法にお
いては、回路が印刷されたアルミナ基板上に、IC、ト
ランジスタ、コンデンサなどを種々の方法で搭載した
後、外力からの保護と耐湿信頼性を向上するために外装
用樹脂で被覆する方法がとられている。外装用樹脂とし
ては、粉体エポキシ樹脂、液状フェノール樹脂、液状エ
ポキシ樹脂などが使用されており、粉体エポキシ樹脂で
は流動浸漬法により、液状フェノール樹脂および液状エ
ポキシ樹脂ではディッピング法により、ハイブリッドI
Cを被覆した後に加熱処理が行われ、硬化されている。2. Description of the Related Art In recent years, as electronic devices used for consumer and industrial equipment have become smaller and thinner, hybrid ICs (integrated circuits) used for them have also become smaller and thinner. And high integration. In the conventional hybrid IC manufacturing method, after mounting ICs, transistors, capacitors, etc. on an alumina substrate on which circuits are printed by various methods, it is used for exterior to improve protection from external force and improve humidity resistance reliability. A method of coating with a resin has been adopted. As the exterior resin, powdered epoxy resin, liquid phenolic resin, liquid epoxy resin, etc. are used. For the powdered epoxy resin, the fluid immersion method is used, and for the liquid phenolic resin and the liquid epoxy resin, the dipping method is used.
After coating with C, a heat treatment is performed and the resin is cured.
【0003】粉体エポキシ樹脂は大量生産ができるとい
う特徴を有しているが、最近さらに厳しくなっている耐
湿信頼性(プレッシャー・クッカー試験)に劣る欠点が
ある。一方、液状フェノール樹脂および液状エポキシ樹
脂は、プレッシャー・クッカー試験には良好な結果を示
すが、無機充填剤を多量に含んでいるため作業時に沈降
しやすく、しかも膜厚が500〜1000μmと厚くな
り、ハイブリッドICの薄型化ができにくく、また耐熱
衝撃性に劣るという欠点を有する。また、ハイブリッド
ICの薄型化のため、充填剤を含んでいない液状エポキ
シ樹脂による被覆が行われている。しかし、近年のVO
C規制によりハイブリッドICを洗浄処理しないで被覆
することから、残留フラックスまたはトランスファーモ
ールド処理された部品の表面に付着している剥離剤によ
って被覆された塗膜にハジキが発生し、ハイブリッドI
Cの隠蔽性および耐湿信頼性に劣るという欠点を有す
る。[0003] Powdered epoxy resins have the characteristic that they can be mass-produced, but have the disadvantage that they are inferior to the more rigorous moisture resistance reliability (pressure cooker test) that has recently become more severe. On the other hand, liquid phenol resin and liquid epoxy resin show good results in the pressure cooker test, but because they contain a large amount of inorganic filler, they tend to settle during work, and the film thickness is as thick as 500 to 1000 μm. In addition, there is a disadvantage that it is difficult to reduce the thickness of the hybrid IC and the heat shock resistance is poor. Further, in order to reduce the thickness of the hybrid IC, coating with a liquid epoxy resin containing no filler is performed. However, recent VO
Since the hybrid IC is coated without cleaning treatment in accordance with Regulation C, cissing occurs in the coating film coated with the residual flux or the release agent adhering to the surface of the transfer-molded component, and the hybrid I
C has the drawback of being inferior in concealing properties and humidity resistance reliability.
【0004】[0004]
【発明が解決しようとする課題】本発明の目的は、前記
の従来のハイブリッドIC用の被覆材料の欠点を改良
し、薄膜での塗膜のハジキを防止し、耐湿信頼性に優れ
たハイブリッドIC用被覆材料および絶縁処理されたハ
イブリッドICの製造法を提供することにある。SUMMARY OF THE INVENTION An object of the present invention is to improve the above-mentioned disadvantages of the conventional coating material for a hybrid IC, to prevent cissing of a coating film in a thin film, and to provide a hybrid IC excellent in moisture resistance reliability. It is an object of the present invention to provide a coating material for use and a method for producing an insulated hybrid IC.
【0005】[0005]
【課題を解決するための手段】本発明は、(a)ビスフ
ェノールA型エポキシ樹脂、(b)クレゾールノボラッ
ク型エポキシ樹脂、(c)フェノールノボラック樹脂、
(d)硬化促進剤、(e)プロピレングリコールモノメ
チルエーテルおよび(f)シリコーンポリエーテルコポ
リマー又はオリゴマーを含有してなるハイブリッドIC
用被覆材料に関する。本発明は、また、ハイブリットI
Cの表面に上記被覆材を塗布し、硬化して得られる絶縁
処理されたハイブリッドICの製造法に関する。The present invention provides (a) a bisphenol A type epoxy resin, (b) a cresol novolak type epoxy resin, (c) a phenol novolak resin,
Hybrid IC containing (d) a curing accelerator, (e) propylene glycol monomethyl ether and (f) a silicone polyether copolymer or oligomer
The present invention relates to a coating material for use. The present invention also provides a hybrid I
The present invention relates to a method for manufacturing an insulated hybrid IC obtained by applying the coating material on the surface of C and curing the coating material.
【0006】[0006]
【発明の実施の形態】本発明に使用される(a)ビスフ
ェノールA型エポキシ樹脂は、ビスフェノールAとエピ
クロルヒドリンから誘導されるエポキシ樹脂であり、こ
れらは耐熱衝撃性の点からエポキシ当量が250以上の
ものが好ましい。この市販品としては油化シェル社製E
P−1007(エポキシ当量2000)、EP−100
4(エポキシ当量950)などが挙げられる。BEST MODE FOR CARRYING OUT THE INVENTION The (a) bisphenol A type epoxy resin used in the present invention is an epoxy resin derived from bisphenol A and epichlorohydrin. These epoxy resins have an epoxy equivalent of 250 or more from the viewpoint of thermal shock resistance. Are preferred. This commercial product is Eika Shell E
P-1007 (epoxy equivalent 2000), EP-100
4 (epoxy equivalent: 950).
【0007】本発明に使用される(b)クレゾールノボ
ラック型エポキシ樹脂としては、クレゾールノボラック
樹脂とエピクロルヒドリンから誘導されるエポキシ樹脂
が用いられる。この市販品としては東都化成(株)製YD
CN−702(エポキシ当量210)、住友化成(株)製
ESCN−195(エポキシ当量220)などが挙げら
れる。該クレゾールノボラック型エポキシ樹脂の配合割
合は、全エポキシ樹脂の5〜55重量%とすることが好
ましく、8〜40重量%とすることがより好ましく、1
0〜30重量%とすることが特に好ましい。クレゾール
ノボラック型エポキシ樹脂の配合割合が5重量%より少
ないと耐熱性および耐湿信頼性が低下し、また55重量
%を超えると耐熱衝撃性が低下することがある。As the cresol novolak type epoxy resin (b) used in the present invention, an epoxy resin derived from cresol novolak resin and epichlorohydrin is used. As this commercial product, YD manufactured by Toto Kasei Co., Ltd.
CN-702 (epoxy equivalent 210), ESCN-195 (epoxy equivalent 220) manufactured by Sumitomo Chemical Co., Ltd., and the like. The compounding ratio of the cresol novolak type epoxy resin is preferably 5 to 55% by weight of the total epoxy resin, more preferably 8 to 40% by weight, and more preferably 1 to 40% by weight.
It is particularly preferred that the content be 0 to 30% by weight. If the blending ratio of the cresol novolac type epoxy resin is less than 5% by weight, heat resistance and moisture resistance reliability may be reduced, and if it exceeds 55% by weight, thermal shock resistance may be reduced.
【0008】本発明に使用される(c)フェノールノボ
ラック樹脂としては、フェノール類とホルムアルデヒド
の重縮合物が用いられ、この市販品としては明和化成
(株)製H−1(水酸基当量106)、日本化薬(株)製P
N(水酸基当量106)などが挙げられる。この配合量
は、耐熱劣化特性および強度の点から、エポキシ基1g
当量に対し0.7〜1.3モルとすることが好ましく、
0.8〜1.2モルとすることがより好ましく、0.8
5〜1.1モルとすることが特に好ましい。As the phenol novolak resin (c) used in the present invention, a polycondensate of phenols and formaldehyde is used.
H-1 (hydroxyl equivalent: 106) manufactured by Nippon Kayaku Co., Ltd.
N (hydroxyl equivalent 106) and the like. This compounding amount is 1 g of epoxy group from the viewpoint of heat deterioration characteristics and strength.
It is preferable to be 0.7 to 1.3 mol with respect to the equivalent,
More preferably 0.8 to 1.2 mol, 0.8
It is particularly preferred that the amount be 5 to 1.1 mol.
【0009】本発明に使用される(d)硬化促進剤とし
ては、イミダゾール、2−エチル−4−メチルイミダゾ
ール、1−シアノエチル−4−メチルイミダゾール、1
−ベンジル−2−エチルイミダゾール等のイミダゾール
およびその誘導体、トリスジメチルアミノフェノール、
ベンジルジメチルアミン等の第3級アミン類などが用い
られる。硬化促進剤の配合割合は、硬化性および安定性
のバランスから、フェノールノボラック樹脂に対して
0.3〜25重量%とすることが好ましく、1〜20重
量%とすることがより好ましく、3〜15重量%とする
ことが特に好ましい。The curing accelerator (d) used in the present invention includes imidazole, 2-ethyl-4-methylimidazole, 1-cyanoethyl-4-methylimidazole,
-Imidazole such as benzyl-2-ethylimidazole and derivatives thereof, trisdimethylaminophenol,
Tertiary amines such as benzyldimethylamine are used. The mixing ratio of the curing accelerator is preferably from 0.3 to 25% by weight, more preferably from 1 to 20% by weight, and more preferably from 3 to 20% by weight, based on the balance between curability and stability. It is particularly preferred to be 15% by weight.
【0010】本発明に使用される(e)プロピレングリ
コールモノメチルエーテルは、本被覆材料の溶剤として
用いられるものである。この配合割合は、被覆材料の粘
度および塗膜特性の点から、被覆材料の総重量の30〜
80重量%とすることが好ましく、40〜75重量%と
することがより好ましく、50〜70重量%とすること
が特に好ましい。The (e) propylene glycol monomethyl ether used in the present invention is used as a solvent for the present coating material. This mixing ratio is 30 to 30% of the total weight of the coating material in terms of the viscosity of the coating material and the characteristics of the coating film.
It is preferably 80% by weight, more preferably 40 to 75% by weight, and particularly preferably 50 to 70% by weight.
【0011】本発明に使用される(f)シリコンポリエ
ーテルコポリマー又はオリゴマーは、The (f) silicone polyether copolymer or oligomer used in the present invention comprises:
【化1】 (ただし、式中、Rは炭素数1〜20の一価の炭化水素
基、例えば、メチル基、エチル基、ヘキシル基、オクチ
ル基等のアルキル基、フェニル基等のアリール基、ベン
ジル基等のアラルキル基、ビニル基、アリル基、メタリ
ル基等のアルケニル基又はこれらの基において水素がハ
ロゲンで置換された基、R′はメチル基、エチル基、ヘ
キシル基、オクチル基等の炭素数1〜8のアルキル基、
xは0〜3の整数を示す)で表されるシロキサン化合物
を水及び酸性触媒の存在下に反応させて得られるシロキ
サンポリマー又はオリゴマーに、Embedded image (Wherein, R is a monovalent hydrocarbon group having 1 to 20 carbon atoms, for example, an alkyl group such as a methyl group, an ethyl group, a hexyl group, an octyl group, an aryl group such as a phenyl group, a benzyl group, etc.) An alkenyl group such as an aralkyl group, a vinyl group, an allyl group, and a methallyl group; or a group in which hydrogen is substituted with a halogen in these groups; and R ′ has 1 to 8 carbon atoms such as a methyl group, an ethyl group, a hexyl group, and an octyl group. An alkyl group of
x represents an integer of 0 to 3) to a siloxane polymer or oligomer obtained by reacting a siloxane compound represented by the following formulas in the presence of water and an acidic catalyst:
【化2】 (ただし、式中、R1は、炭素数1〜8の2価の炭化水
素基、例えば、メチレン基、エチレン基、ヘキシレン
基、オクチレン基等のアルキレン基、フェニレン基等の
アリーレン基、シクロヘキシレン基等のシクロアルキレ
ン基、R2は、炭素数1〜20の一価の炭化水素基、例
えば、メチル基、エチル基、ヘキシル基、オクチル基等
のアルキル基、フェニル基等のアリール基、ベンジル基
等のアラルキル基、ビニル基、アリル基、メタリル基等
のアルケニル基又はこれらの基において水素がハロゲン
で置換された基を示す)で表されるヒドロキシアルキル
エーテル化合物を反応させて得られるポリマー又はオリ
ゴマーである。Embedded image (Wherein, R 1 is a divalent hydrocarbon group having 1 to 8 carbon atoms, for example, an alkylene group such as a methylene group, an ethylene group, a hexylene group, an octylene group, an arylene group such as a phenylene group, and cyclohexylene. A cycloalkylene group such as a group, R 2 is a monovalent hydrocarbon group having 1 to 20 carbon atoms, for example, an alkyl group such as a methyl group, an ethyl group, a hexyl group, an octyl group; an aryl group such as a phenyl group; Or an alkenyl group such as an aralkyl group, a vinyl group, an allyl group, or a methallyl group, or a group in which hydrogen is substituted with a halogen in these groups). It is an oligomer.
【0012】本発明に使用される(f)シリコンポリエ
ーテルコポリマー又はオリゴマーは、被覆材料のハジキ
防止剤として用いるものである。この市販品としてはダ
ウ・コーニング社製ペインタッドA、ペインタッドQお
よびペインタッド57などが挙げられる。この配合割合
は、被覆材料のハジキ防止の点から、被覆材料の総重量
の0.01〜5重量%とすることが好ましく、0.1〜
3重量%とすることがより好ましく、0.5〜2重量%
とすることが特に好ましい。The (f) silicone polyether copolymer or oligomer used in the present invention is used as an anti-cissing agent for coating materials. Commercially available products include Paintad A, Paintad Q and Paintad 57 manufactured by Dow Corning. The mixing ratio is preferably from 0.01 to 5% by weight of the total weight of the coating material, from the viewpoint of preventing cissing of the coating material, and from 0.1 to 5% by weight.
More preferably 3% by weight, 0.5 to 2% by weight
It is particularly preferred that
【0013】本発明の被覆材料には必要に応じて着色
剤、カップリング剤、消泡剤および難燃剤を添加するこ
とができる。本発明の被覆材料を用いて一般に知られて
いるディッピング法によりハイブリットICを被覆し、
加熱硬化を行うことにより、絶縁処理されたハイブリッ
ドICを製造することができる。A coloring agent, a coupling agent, an antifoaming agent and a flame retardant can be added to the coating material of the present invention, if necessary. Using the coating material of the present invention to coat a hybrid IC by a generally known dipping method,
By performing the heat curing, an insulated hybrid IC can be manufactured.
【0014】[0014]
【実施例】以下、本発明を実施例により説明するが、本
発明はこれらにより制限されるものではない。 実施例1〜2および比較例1〜2 表1に示す配合組成および配合量(重量部)の材料をガ
ラス製フラスコ内で70〜100℃で3〜4時間溶解
し、透明な樹脂組成物を得た。得られた樹脂組成物を用
いてディップ方式によりハイブリッドICを外装被覆し
た後、120℃で1時間、次いで150℃で2時間加熱
硬化した。得られた硬化物について下記に示す方法で特
性の評価を行った。その結果を表2に示した。The present invention will be described below with reference to examples, but the present invention is not limited by these examples. Examples 1 and 2 and Comparative Examples 1 and 2 Materials having the composition and the amount (parts by weight) shown in Table 1 were dissolved in a glass flask at 70 to 100 ° C. for 3 to 4 hours to obtain a transparent resin composition. Obtained. After the exterior of the hybrid IC was coated by a dip method using the obtained resin composition, it was cured by heating at 120 ° C. for 1 hour and then at 150 ° C. for 2 hours. The properties of the obtained cured product were evaluated by the following methods. The results are shown in Table 2.
【0015】(1)膜厚の測定 外装被覆前後のハイブリッドICの基板平坦部の厚さの
差を測定し、二等分した値を片面の膜厚とした。 (2)耐湿信頼性試験(プレッシャー・クッカー試験) 121℃、2気圧、100%RHの水蒸気下に外装被覆
後のハイブリッドICを放置し、時間ごとに印刷抵抗の
変化を測定し、初期値が1.5%以上変化したものを不
良発生物とし、各時間ごとの不良発生数を調べた。この
試験は20個の試験片について行った。 (3)ハジキの有無観察 離型剤を塗布されているハイブリッドIC基板を用い、
外装被覆後にICのハジキの有無を観察した。(1) Measurement of Film Thickness The difference in the thickness of the flat portion of the substrate of the hybrid IC before and after the exterior coating was measured, and the value obtained by dividing the thickness into two was defined as the film thickness on one side. (2) Humidity Reliability Test (Pressure Cooker Test) The hybrid IC after the exterior coating was left under steam at 121 ° C., 2 atm, and 100% RH, and the change of the print resistance was measured every hour. Those which changed by 1.5% or more were regarded as defective products, and the number of defective products every hour was examined. This test was performed on 20 test pieces. (3) Observation of presence or absence of cissing Using a hybrid IC substrate coated with a release agent,
After the outer coating, the presence or absence of repelling of the IC was observed.
【0016】[0016]
【表1】 [Table 1]
【0017】 *1:油化シェル社製、エピ−ビス型エポキシ樹脂 *2:東都化学社製、クレゾールノボラック型エポキシ樹
脂 *3:明和化学社製、フェノールノボラック樹脂 *4:四国化学社製、1−シアノエチル−2−エチル−4
−メチルイミダゾール *5:プロピレングリコールモノメチルエーテル *6:信越化学社製、γ−グリシドキシプロピルトリメト
キシシラン *7:ダウ・コーニング社製、シリコーンポリエーテルコ
ポリー *8:ダウ・コーニング社製、シリコーンポリエーテルコ
ポリー* 1: Epi-bis epoxy resin manufactured by Yuka Shell Co., Ltd. * 2: Cresol novolak epoxy resin manufactured by Toto Chemical Co., Ltd. * 3: Phenol novolak resin manufactured by Meiwa Chemical Co., Ltd. * 4: Shikoku Chemical Co., Ltd. 1-cyanoethyl-2-ethyl-4
-Methylimidazole * 5: Propylene glycol monomethyl ether * 6: Shin-Etsu Chemical Co., Ltd., γ-glycidoxypropyltrimethoxysilane * 7: Dow Corning, silicone polyether copolymer * 8: Dow Corning, Silicone polyether copoly
【0018】[0018]
【表2】 [Table 2]
【0019】表2から、実施例1、2の被覆材料を用い
た場合には、薄膜で被覆した場合でも塗膜のハジキがな
く、かつ耐湿性に優れることが示される。これに対し、
シリコーンポリエーテルコポリマーを含有しない比較例
1、2の被覆材料を用いた場合には塗膜のハジキが発生
し、耐熱性に劣るものであった。Table 2 shows that when the coating materials of Examples 1 and 2 were used, even when coated with a thin film, the coating film had no repelling and was excellent in moisture resistance. In contrast,
When the coating materials of Comparative Examples 1 and 2 containing no silicone polyether copolymer were used, repelling of the coating film occurred, and the heat resistance was poor.
【0020】[0020]
【発明の効果】本発明のハイブリッドICの被覆材料
は、薄膜で被覆した場合でも塗膜にハジキの発生が見ら
れず、かつ耐湿信頼性に優れるため、信頼性の高い防湿
絶縁処理されたハイブリッドICを得ることができる。As described above, the coating material of the hybrid IC of the present invention does not show repelling even when coated with a thin film and has excellent moisture resistance reliability. IC can be obtained.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 FI H01L 23/31 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 6 Identification code FI H01L 23/31
Claims (2)
脂、(b)クレゾールノボラック型エポキシ樹脂、
(c)フェノールノボラック樹脂、(d)硬化促進剤、
(e)プロピレングリコールモノメチルエーテルおよび
(f)シリコーンポリエーテルコポリマー又はオリゴマ
ーを含有してなるハイブリッドIC用被覆材料。1. A bisphenol A type epoxy resin, (b) a cresol novolak type epoxy resin,
(C) a phenol novolak resin, (d) a curing accelerator,
A coating material for a hybrid IC comprising (e) propylene glycol monomethyl ether and (f) a silicone polyether copolymer or oligomer.
の被覆材料を塗布し、硬化することを特徴とする絶縁処
理されたハイブリッドICの製造法。2. A method for producing an insulated hybrid IC, wherein the coating material according to claim 1 is applied to the surface of the hybrid IC and cured.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29842097A JPH11130839A (en) | 1997-10-30 | 1997-10-30 | Coating material for hydroid ic and production of insulation-treated hybrid ic |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29842097A JPH11130839A (en) | 1997-10-30 | 1997-10-30 | Coating material for hydroid ic and production of insulation-treated hybrid ic |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH11130839A true JPH11130839A (en) | 1999-05-18 |
Family
ID=17859483
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP29842097A Pending JPH11130839A (en) | 1997-10-30 | 1997-10-30 | Coating material for hydroid ic and production of insulation-treated hybrid ic |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH11130839A (en) |
-
1997
- 1997-10-30 JP JP29842097A patent/JPH11130839A/en active Pending
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