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JPH108240A - Vacuum vapor deposition device - Google Patents

Vacuum vapor deposition device

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Publication number
JPH108240A
JPH108240A JP16401096A JP16401096A JPH108240A JP H108240 A JPH108240 A JP H108240A JP 16401096 A JP16401096 A JP 16401096A JP 16401096 A JP16401096 A JP 16401096A JP H108240 A JPH108240 A JP H108240A
Authority
JP
Japan
Prior art keywords
metal
dross
evaporation
molten metal
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP16401096A
Other languages
Japanese (ja)
Inventor
Takehiko Ogi
武彦 尾木
Tsukasa Shimakawa
司 島川
Etsuro Hirai
悦郎 平井
Naohiko Matsuda
直彦 松田
Keiji Tanizaki
桂二 谷崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP16401096A priority Critical patent/JPH108240A/en
Publication of JPH108240A publication Critical patent/JPH108240A/en
Withdrawn legal-status Critical Current

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  • Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)

Abstract

PROBLEM TO BE SOLVED: To evaporate a metallic film of a required thickness by evaporation on a band material by maintaining the evaporation of normal material vapor. SOLUTION: A shielding plate 1 is obliquely mounted below a molten metal surface 42 existing at the stationary level L1 in a crucible 51 to form a narrow dross shielding gap g2 between the inclined top end of this shielding plate 1 and the side wall of the crucible 51. A dross-passing gap g1 is formed between the inclined bottom end of the shielding plate 1 and the side wall of the crucible 51 and the device is provided with a lift 2 for lifting a melting furnace 54, therefore, even if the dross 41a gathers at the molten metal surface 42 existing at the stationary level L1 , the melting furnace 54 is lowered by a lifting device 2 to allow the molten metal 40 to pass the dross- passing gap g1 together with the dross 41a, by which the molten metal is lowered down to a refuge level L2 . Further, the molten metal surface 42 is risen again up to the stationary level L1 to shield the dross 41a with the inclined rear surface of the shielding plate 1. The dross 41a is then moved and gathered to the inclined top end, by which the dross 41a is moved and gathered to the inclined top end side. The gathering of the dross 41a to the molten metal surface 42 existing at the stationary level L1 is thereby prevented. The evaporation of the normal metal evaporation is thus maintained and the metal film of the required thickness is deposited by evaporation on the steel sheet.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、走行する被蒸着帯
材に略真空状態で金属皮膜を蒸着めっきする真空蒸着装
置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vacuum vapor deposition apparatus for vapor-depositing a metal film on a running material to be deposited in a substantially vacuum state.

【0002】[0002]

【従来の技術】図12に基づいて従来の真空蒸着装置を
説明する。図12には従来の真空蒸着装置の縦断面を示
してある。
2. Description of the Related Art A conventional vacuum deposition apparatus will be described with reference to FIG. FIG. 12 shows a longitudinal section of a conventional vacuum evaporation apparatus.

【0003】図12において、51はるつぼであり、る
つぼ51の周囲には誘導加熱器52が装着され、るつぼ
51は真空チャンバ61に内装されている。真空チャン
バ61には帯鋼搬入路63及び帯鋼搬出路64が設けら
れている。また、真空チャンバ61の外部下方には溶解
炉54が配設され、溶解炉54は真空チャンバ61を貫
通する吸引管53を介してるつぼ51に接続されてい
る。
In FIG. 12, reference numeral 51 denotes a crucible, and an induction heater 52 is mounted around the crucible 51, and the crucible 51 is housed in a vacuum chamber 61. The vacuum chamber 61 is provided with a steel strip carry-in path 63 and a steel strip take-out path 64. Further, a melting furnace 54 is provided below the outside of the vacuum chamber 61, and the melting furnace 54 is connected to the crucible 51 via a suction pipe 53 penetrating the vacuum chamber 61.

【0004】58は断熱箱であり、断熱箱58の上面及
び下面には帯鋼50が通過するスリット58aが穿設さ
れ、断熱箱58には加熱器59が内装されている。そし
て、断熱箱58は真空チャンバ61に内装されている。
また、56は蒸着路であり、蒸着路56は帯鋼50の走
行路となって開口部56aが対向するように二股に分か
れており、蒸着路56は断熱箱58に内装されている。
そして、蒸着路56はシャッタ57と断熱箱58を貫通
する供給管55とを介してるつぼ51に接続されてい
る。62は排気管であり、排気管62には図示しない真
空吸引装置が接続されている。
A heat insulation box 58 is provided with slits 58a through which a steel strip 50 passes, on the upper and lower surfaces of the heat insulation box 58, and a heater 59 is provided inside the heat insulation box 58. The heat insulation box 58 is provided inside the vacuum chamber 61.
Reference numeral 56 denotes a vapor deposition path. The vapor deposition path 56 is a traveling path of the steel strip 50 and is bifurcated so that the opening 56a is opposed to the vapor deposition path.
Further, the vapor deposition path 56 is connected to the crucible 51 via a shutter 57 and a supply pipe 55 penetrating the heat insulation box 58. An exhaust pipe 62 is connected to a vacuum suction device (not shown).

【0005】例えば、Mg或いはZn等の金属を溶解炉
54によって溶融金属40に溶解すると共に、断熱箱5
8内を加熱器59によって加熱し、真空チャンバ61内
を排気管62から吸引して例えば10-3torrの略真空状
態に減圧する。この真空チャンバ61の内部と外部との
気圧差によって溶解炉54内の溶融金属40を吸引管5
3からるつぼ51に吸い上げ、溶融金属40を誘導加熱
器52によって所要の温度に加熱して金属蒸気40aを
蒸発させ、供給管55及びシャッタ57から金属蒸気4
0aを蒸着路56に供給して双方の開口部56aから吐
出させる。そして、金属蒸気40aよりも低温の帯鋼5
0を帯鋼搬入路63、断熱箱58のスリット58aから
双方の開口部間を走行させ、帯鋼50の両面に金属蒸気
40aを蒸着して帯鋼搬出路64から搬出する。
For example, while melting a metal such as Mg or Zn into a molten metal 40 by a melting furnace 54,
The inside of the vacuum chamber 8 is heated by the heater 59, and the inside of the vacuum chamber 61 is sucked from the exhaust pipe 62 to reduce the pressure to a substantially vacuum state of, for example, 10 −3 torr. Due to the pressure difference between the inside and outside of the vacuum chamber 61, the molten metal 40 in the melting furnace
3 into the crucible 51, the molten metal 40 is heated to a required temperature by the induction heater 52 to evaporate the metal vapor 40a, and the metal vapor 4a is supplied from the supply pipe 55 and the shutter 57.
0a is supplied to the vapor deposition path 56 and discharged from both the openings 56a. And, the steel strip 5 having a lower temperature than the metal vapor 40a.
The steel strip 50 travels between the two openings through the steel strip carry-in path 63 and the slit 58a of the heat insulating box 58, and the metal vapor 40a is vapor-deposited on both sides of the steel strip 50 and is carried out from the steel strip take-out path 64.

【0006】[0006]

【発明が解決しようとする課題】しかし、従来の真空蒸
着装置では、溶融金属40内の溶融金属面42の下方で
生成したドロス41aが浮上して集合し、溶融金属面4
2の蒸発面積を狭くして金属蒸気40aの蒸発を妨げて
しまっていた。このため、蒸着路56の開口部56aへ
供給する金属蒸気40a及び帯鋼50への蒸着量が少な
くなり、金属被膜の形成に支障をきたすことがあった。
However, in the conventional vacuum vapor deposition apparatus, the dross 41a generated below the molten metal surface 42 in the molten metal 40 floats and gathers to form the molten metal surface 4.
Thus, the evaporation area of No. 2 was narrowed to prevent the evaporation of the metal vapor 40a. For this reason, the amount of metal vapor 40a supplied to the opening 56a of the vapor deposition path 56 and the amount of vapor deposition on the steel strip 50 are reduced, which may hinder the formation of the metal film.

【0007】また、従来の真空蒸着装置は、るつぼ51
の外壁の周囲から誘導加熱器52によってるつぼ51内
の溶融金属を加熱して金属蒸気40aを蒸発させるよう
になっているので、ほとんどのスプラッシュ41bがる
つぼ51の内壁近傍の蒸発面42で発生し、金属蒸気4
0aと共にスプラッシュ41bが供給路55、シャッタ
57及び蒸着路56を通過して開口部56aから吐出し
てしまう。このため、双方の蒸着路56の開口部56a
の間を走行する帯鋼50スプラッシュ41bが付着し、
帯鋼50の品質を著しく低下させてしまうことがあっ
た。
[0007] Further, the conventional vacuum vapor deposition apparatus includes a crucible 51.
Since the molten metal in the crucible 51 is heated from the periphery of the outer wall by the induction heater 52 to evaporate the metal vapor 40a, most of the splash 41b is generated on the evaporation surface 42 near the inner wall of the crucible 51. , Metal vapor 4
The splash 41b passes through the supply path 55, the shutter 57, and the vapor deposition path 56 together with 0a, and is discharged from the opening 56a. For this reason, the openings 56a of both the vapor deposition paths 56
Between the steel strip 50 splash 41b running between
In some cases, the quality of the strip 50 was significantly reduced.

【0008】[0008]

【課題を解決するための手段】上記課題を解決するため
の本発明の請求項1に係る真空蒸着装置の構成は、真空
チャンバに金属蒸発槽を内装し、前記金属蒸発槽と前記
真空チャンバ外下方の金属溶解炉とを吸引管によって接
続し、被蒸着帯材が走行する蒸着室を前記真空チャンバ
内の前記金属蒸発槽の上方に設けた真空蒸着装置であっ
て、前記金属蒸発槽内の定常レベルの溶融金属の下面に
遮蔽板を傾斜して装着し、前記遮蔽板の傾斜上端と前記
金属蒸発槽の側壁との間に狭いドロス遮蔽隙間を形成す
ると共に、前記遮蔽板の傾斜下端と前記金属蒸発槽の側
壁との間にドロス通過隙間を形成し、溶融金属面を昇降
させる溶融金属面昇降手段を設けたことを特徴とする。
According to a first aspect of the present invention, there is provided a vacuum evaporation apparatus comprising: a vacuum chamber having a metal evaporation tank provided therein; and a metal evaporation tank provided outside the vacuum chamber. A vacuum deposition apparatus in which a lower metal melting furnace is connected by a suction pipe, and a deposition chamber in which a material to be deposited travels is provided above the metal evaporation tank in the vacuum chamber. A shielding plate is inclined and mounted on the lower surface of the molten metal at a steady level, and a narrow dross shielding gap is formed between the inclined upper end of the shielding plate and the side wall of the metal evaporation tank. A dross passage gap is formed between the side wall of the metal evaporation tank and a molten metal surface elevating means for elevating and lowering the molten metal surface.

【0009】また、上記課題を解決するための本発明の
請求項2に係る真空蒸着装置の構成は、真空チャンバに
金属蒸発槽を内装し、前記金属蒸発槽内の溶融金属を誘
導加熱器によって加熱し、蒸発面から金属蒸気を蒸発さ
せて被蒸着帯材に蒸着する真空蒸着装置であって、前記
金属蒸発槽の内壁面との間で所要の蒸発面距離を形成す
るスプラッシュ遮蔽板を下端が前記溶融金属に浸漬する
状態に設けたことを特徴とする。
According to a second aspect of the present invention, there is provided a vacuum evaporation apparatus having a metal evaporation tank provided in a vacuum chamber and a molten metal in the metal evaporation tank being heated by an induction heater. A vacuum evaporation apparatus for heating and evaporating metal vapor from an evaporation surface and evaporating the vapor on a band to be evaporated, wherein a splash shielding plate for forming a required evaporation surface distance with an inner wall surface of the metal evaporation tank has a lower end. Is provided in a state of being immersed in the molten metal.

【0010】また、上記課題を解決するための本発明の
請求項3に係る真空蒸着装置の構成は、金属蒸発槽と、
前記金属蒸発槽の金属蒸気蒸発面の上方に接続した金属
蒸気供給路と、前記金属蒸気供給路に接続した帯材蒸着
部とを真空チャンバに内装した真空蒸着装置であって、
前記金属蒸気供給路の下部にドロス受け部を設けると共
に、ドロス掬い取り板を前記金属蒸発槽内の溶融金属に
浸漬する位置から前記ドロス受け部へ回動するように設
けたことを特徴とする。
[0010] In order to solve the above-mentioned problem, the structure of a vacuum evaporation apparatus according to claim 3 of the present invention comprises a metal evaporation tank,
A metal vapor supply path connected above the metal vapor evaporation surface of the metal vaporization tank, and a band vapor deposition unit connected to the metal vapor supply path, a vacuum vapor deposition apparatus having a vacuum chamber built therein.
A dross receiving portion is provided at a lower portion of the metal vapor supply path, and a dross scooping plate is provided so as to rotate from a position where it is immersed in the molten metal in the metal evaporation tank to the dross receiving portion. .

【0011】また、上記課題を解決するための本発明の
請求項4に係る真空蒸着装置の構成は、真空チャンバに
金属蒸発槽を内装し、前記金属蒸発槽と前記真空チャン
バ外下方の金属溶解炉とを吸引管によって接続し、被蒸
着帯材が走行する蒸着室を前記真空チャンバ内の前記金
属蒸発槽の上方に設けた真空蒸着装置であって、前記金
属蒸発槽内の定常レベルの溶融金属の下面に遮蔽板を傾
斜して装着し、前記遮蔽板の傾斜上端と前記金属蒸発槽
の側壁との間に狭いドロス遮蔽隙間を形成すると共に、
前記遮蔽板の傾斜下端と前記金属蒸発槽の側壁との間に
ドロス通過隙間を形成し、溶融金属面を昇降させる溶融
金属面昇降手段を設ける一方、前記金属蒸発槽の内壁面
との間で所要の蒸発面距離を形成するスプラッシュ遮蔽
板を下端が前記溶融金属に浸漬する状態に設けたことを
特徴とする。
According to a fourth aspect of the present invention, there is provided a vacuum evaporation apparatus comprising: a vacuum evaporation chamber provided with a metal evaporation tank; A vacuum evaporation apparatus in which a furnace is connected by a suction pipe, and a deposition chamber in which the material to be deposited travels is provided above the metal evaporation tank in the vacuum chamber; A shielding plate is attached to the lower surface of the metal at an angle, and a narrow dross shielding gap is formed between the inclined upper end of the shielding plate and the side wall of the metal evaporation tank,
A dross passage gap is formed between the inclined lower end of the shielding plate and the side wall of the metal evaporation tank, and a molten metal surface elevating means for elevating and lowering the molten metal surface is provided. A splash shield plate for forming a required evaporation surface distance is provided with its lower end immersed in the molten metal.

【0012】また、上記課題を解決するための本発明の
請求項5に係る真空蒸着装置の構成は、真空チャンバに
金属蒸発槽を内装し、前記金属蒸発槽の金属蒸気蒸発面
の上方に金属蒸気供給路を接続し、前記金属蒸発槽と前
記真空チャンバ外下方の金属溶解炉とを吸引管によって
接続し、被蒸着帯材が走行する蒸着室を前記真空チャン
バ内の前記金属蒸発槽の上方に設けた真空蒸着装置であ
って、前記金属蒸発槽内の定常レベルの溶融金属の下面
に遮蔽板を傾斜して装着し、前記遮蔽板の傾斜上端と前
記金属蒸発槽の側壁との間に狭いドロス遮蔽隙間を形成
すると共に、前記遮蔽板の傾斜下端と前記金属蒸発槽の
側壁との間にドロス通過隙間を形成し、溶融金属面を昇
降させる溶融金属面昇降手段を設ける一方、前記金属蒸
気供給路の下部にドロス受け部を設けると共に、ドロス
掬い取り板を前記金属蒸発槽内の溶融金属に浸漬する位
置から前記ドロス受け部へ回動するように設けたことを
特徴とする。
According to a fifth aspect of the present invention, there is provided a vacuum evaporation apparatus having a metal evaporation tank provided in a vacuum chamber, and a metal evaporation tank provided above a metal vapor evaporation surface of the metal evaporation tank. A vapor supply path is connected, the metal evaporation tank and the metal melting furnace below the vacuum chamber are connected by a suction pipe, and a vapor deposition chamber in which the material to be vaporized travels above the metal evaporation tank in the vacuum chamber. In the vacuum evaporation apparatus provided in the metal evaporation tank, a shielding plate is inclined and mounted on the lower surface of the molten metal at a steady level in the metal evaporation tank, and between the inclined upper end of the shielding plate and the side wall of the metal evaporation tank. While forming a narrow dross shielding gap, a dross passing gap is formed between the inclined lower end of the shielding plate and the side wall of the metal evaporation tank, and a molten metal surface elevating means for elevating and lowering the molten metal surface is provided. At the bottom of the steam supply channel Provided with a loss receiving portion, characterized in that the dross scoop up plate provided from a position immersed in the molten metal of the metal evaporating tank to rotate into the dross receptacle.

【0013】[0013]

【発明の実施の形態】請求項1に係る真空蒸着装置で
は、真空チャンバ内を略真空に減圧し、金属溶解路で溶
解した溶融金属を真空チャンバの内部と外部との気圧差
によって金属溶解炉から金属蒸発槽に吸い上げる。この
金属蒸発槽によって溶融金属から金属蒸気を蒸発させて
蒸着室に供給し、走行する帯材に蒸着して所要の金属被
膜を形成する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS In a vacuum deposition apparatus according to the present invention, the inside of a vacuum chamber is depressurized to a substantially vacuum, and a molten metal melted in a metal melting path is caused by a pressure difference between the inside and the outside of the vacuum chamber. To a metal evaporator tank. The metal vapor is evaporated from the molten metal by the metal evaporation tank, supplied to the vapor deposition chamber, and vapor-deposited on the traveling strip to form a required metal film.

【0014】この蒸着時間の経過と共に金属蒸発槽内の
溶融金属面にドロスが集合して金属蒸気の蒸発を妨げる
と、溶融金属を溶融金属面昇降手段によってドロス通過
隙間及びドロス遮蔽隙間を通過させ、溶融金属面を定常
レベルから退避レベルまで下降させる。溶融金属面を溶
融金属面昇降手段によって再度定常レベルまで上昇させ
ると、溶融金属面に浮上しているドロスの大部分が遮蔽
板の下面の傾斜に当たって傾斜上端側に集まり、ドロス
が通過不能な隙間によって遮蔽される。このようにし
て、定常レベルにある溶融金属面にあるドロスのほとん
どが除去され、正常な金属蒸気の発生を維持する。
When the dross collects on the molten metal surface in the metal evaporation tank and evaporates the metal vapor with the elapse of the evaporation time, the molten metal is passed through the dross passage gap and the dross shielding gap by the molten metal surface elevating means. Then, the molten metal surface is lowered from the steady level to the retreat level. When the molten metal surface is raised to the steady level again by the molten metal surface elevating means, most of the dross floating on the molten metal surface hits the lower surface of the shielding plate and gathers at the upper end of the slope, so that the dross cannot pass through. Shielded by In this way, most of the dross on the molten metal surface at steady levels is removed, maintaining normal metal vapor generation.

【0015】請求項2に係る真空蒸着装置では、真空チ
ャンバ内を略真空に減圧し、金属蒸発槽内の溶融金属を
誘導加熱器によって所要の温度に加熱し、蒸発面から金
属蒸気を蒸発させて帯材蒸着部に供給し、帯材蒸着部を
走行する帯材に金属蒸気を蒸着して所要の金属被膜を形
成する。
In the vacuum evaporation apparatus according to the second aspect, the inside of the vacuum chamber is reduced to a substantially vacuum, the molten metal in the metal evaporation tank is heated to a required temperature by an induction heater, and the metal vapor is evaporated from the evaporation surface. Then, a metal vapor is vapor-deposited on the strip running through the strip deposition section to form a required metal coating.

【0016】この金属蒸気の蒸発の際に、スプラッシュ
が蒸発面から金属蒸気と共に発生するが、金属蒸発槽内
の溶融金属を誘導加熱器によって加熱する方式では、ス
プラッシュのほとんどが金属蒸発槽の内壁近傍で発生す
るので、スプラッシュ遮蔽板によってスプラッシュを遮
蔽する。このようにして、金属蒸気と共に蒸発するスプ
ラッシュのほとんどを除去して帯材への付着を防止す
る。
During the evaporation of the metal vapor, a splash is generated from the evaporation surface together with the metal vapor. In the method in which the molten metal in the metal evaporation tank is heated by an induction heater, most of the splash is formed on the inner wall of the metal evaporation tank. Since the splash is generated in the vicinity, the splash is shielded by the splash shielding plate. In this way, most of the splash evaporating with the metal vapor is removed to prevent adhesion to the strip.

【0017】請求項3に係る真空蒸着装置では、真空チ
ャンバ内を略真空に減圧し、金属蒸発槽内の溶融金属に
ドロス掬い板を浸漬しておき、金属蒸発槽内溶融金属か
ら金属蒸気を蒸発させて金属蒸気供給路から帯材蒸着部
に供給し、走行する帯材に金属蒸気を蒸着して所要の金
属被膜を形成する。
In the vacuum vapor deposition apparatus according to the third aspect, the pressure in the vacuum chamber is reduced to substantially a vacuum, the dross scooping plate is immersed in the molten metal in the metal evaporation tank, and the metal vapor is discharged from the molten metal in the metal evaporation tank. The strip is evaporated and supplied to the strip evaporation section from the metal steam supply path, and the required strip is formed by depositing metal vapor on the running strip.

【0018】この金属蒸気の蒸発と共に溶融金属内で発
生したドロスが浮上し、金属蒸気蒸発面に集合して金属
蒸気の蒸発を妨げると、溶融金属に浸漬させてあるドロ
ス掬い板を上方へ回動してドロスを掬い取り、ドロス受
けの上方まで回動してドロス受けにドロスを落下させて
移載する。このようにして、溶融金属内で発生及び浮上
して金属蒸気蒸発面に集合したドロスのほとんどを除去
して正常な金属蒸気の蒸発を維持する。
When the dross generated in the molten metal rises with the evaporation of the metal vapor and gathers on the evaporation surface of the metal vapor to prevent the evaporation of the metal vapor, the dross scooping plate immersed in the molten metal is turned upward. The dross is moved to scoop up the dross, and is rotated to the position above the dross receiver to drop the dross onto the dross receiver and transferred. In this manner, most of the dross generated and levitated in the molten metal and gathered on the metal vapor evaporation surface is removed to maintain normal evaporation of the metal vapor.

【0019】請求項4に係る真空蒸着装置では、溶融金
属面昇降手段によって溶融金属面を変化させることによ
り、スプラッシュ遮蔽板の下端の浸漬程度を調整するこ
とができる。また、請求項5に係る真空蒸着装置では、
溶融金属面昇降手段によって溶融金属面を掬い取り板の
下回転位置より下にした状態で、掬い取り板を下位置ま
で回転させ、溶融金属面昇降手段によって溶融金属面を
上昇させた後、掬い取り板を上方に回転させることで、
ドロスを完全に掬い取ることができる。
In the vacuum vapor deposition apparatus according to the fourth aspect, the degree of immersion at the lower end of the splash shielding plate can be adjusted by changing the molten metal surface by the molten metal surface raising / lowering means. Further, in the vacuum evaporation apparatus according to claim 5,
With the molten metal surface lowered by the molten metal surface elevating means below the lower rotation position of the scooping plate, rotate the scooping plate to the lower position, raise the molten metal surface by the molten metal surface elevating means, and then scoop. By rotating the take up plate,
Dross can be completely scooped.

【0020】[0020]

【実施例】図1には本発明の第1実施例に係る真空蒸着
装置の縦断面、図2には図1中のるつぼ及び溶解炉を拡
大した縦断面、図3、図4には図2中の溶融金属面の退
避レベルへの下降及び定常レベルへの復帰を表す縦断面
を示してある。図示の第1実施例は請求項1に相当す
る。尚、図12で示した真空蒸着装置と同一の部材及び
部位には同一の符号を付して重複する説明は省略してあ
る。
FIG. 1 is a longitudinal section of a vacuum evaporation apparatus according to a first embodiment of the present invention, FIG. 2 is an enlarged longitudinal section of a crucible and a melting furnace in FIG. 1, and FIGS. 2 is a vertical cross-section showing the lowering of the molten metal surface in 2 to the retreat level and the return to the steady level. The illustrated first embodiment corresponds to claim 1. Note that the same members and portions as those of the vacuum evaporation apparatus shown in FIG. 12 are denoted by the same reference numerals, and redundant description is omitted.

【0021】図1及び図2において、51は金属蒸発槽
としてのるつぼであり、るつぼ51の周囲には誘導加熱
器52が装着され、るつぼ51の底面には下端が溶解炉
54に浸漬した吸引管53が装着されている。るつぼ5
1内の定常レベルL1の溶融金属面42の下方には遮蔽板
1が傾斜して装着されている。遮蔽板1の傾斜下端とる
つぼ51の側壁との間にはドロス通過隙間g1が形成さ
れ、遮蔽板1の傾斜上端とるつぼ51の側壁との間には
狭いドロス遮蔽隙間g2が形成されている。
In FIGS. 1 and 2, reference numeral 51 denotes a crucible as a metal evaporating tank. An induction heater 52 is mounted around the crucible 51, and a lower end of the crucible 51 is immersed in a melting furnace 54 by suction. A tube 53 is mounted. Crucible 5
Below the molten metal surface 42 of the steady level L1 in 1, the shielding plate 1 is mounted in an inclined manner. Between the side walls of the inclined bottom and the crucible 51 of the shielding plate 1 is formed dross passage gap g 1, narrow dross shield gap g 2 is formed between the side wall of the inclined upper and crucible 51 of the shielding plate 1 ing.

【0022】溶解炉54の下面には昇降シリンダ3及び
ガイド4を備えた溶融金属面昇降手段としての昇降装置
2が設けられている。昇降装置2により溶解炉54を昇
降させることで、るつぼ51内の溶融金属面42を定常
レベルL1と退避レベルL2との間で移動させるようになっ
ている。尚、溶融金属面昇降手段としては、真空チャン
バ61内の気圧を調整する調整手段を設け、調整手段に
より真空チャンバ61内の気圧を調整して溶融金属面4
2を移動させるようにしてもよい。
On the lower surface of the melting furnace 54, an elevating device 2 as a molten metal surface elevating means provided with an elevating cylinder 3 and a guide 4 is provided. The lifting device 2 by elevating the melting furnace 54, is adapted to move the molten metal surface 42 of the crucible 51 between the steady-state level L 1 and a retracted level L 2. Adjusting means for adjusting the air pressure in the vacuum chamber 61 is provided as the molten metal surface elevating means, and the adjusting means adjusts the air pressure in the vacuum chamber 61 to adjust the molten metal surface 4.
2 may be moved.

【0023】その他の構成は、図12で示した真空蒸着
装置と同一である。尚、シャッタ57の開閉や操業制御
等に応じて蒸発室内の真空度が変化すると、溶融金属面
42が上下動するが、溶融金属面42は一定が好ましい
ので、るつぼ51の縦方向に間隔をおいて熱電対を設
け、温度の変化により溶融金属面42のレベルを検知し
て検知信号により昇降装置2を制御して溶解炉54が昇
降され、溶融金属面42が一定に保たれている。
The other structure is the same as that of the vacuum evaporation apparatus shown in FIG. When the degree of vacuum in the evaporating chamber changes in accordance with the opening and closing of the shutter 57, operation control, and the like, the molten metal surface 42 moves up and down. However, since the molten metal surface 42 is preferably constant, the gap in the longitudinal direction of the crucible 51 is increased. In addition, a thermocouple is provided, the level of the molten metal surface 42 is detected by a change in temperature, and the elevating device 2 is controlled by the detection signal to move the melting furnace 54 up and down so that the molten metal surface 42 is kept constant.

【0024】上述した真空蒸着装置の作用を図1乃至図
4を参照して説明する。
The operation of the above-described vacuum deposition apparatus will be described with reference to FIGS.

【0025】図1に示すように、断熱箱58内を加熱器
59によって加熱し、排気管62から図示しない真空吸
引装置によって真空チャンバ61内を吸引し、真空チャ
ンバ61内を例えば10-3torrの略真空状態に減圧す
る。真空チャンバ61の内部と外部との気圧差によって
溶解炉54内の溶融金属40を吸引管53からるつぼ5
1内の定常レベルL1まで吸い上げ、るつぼ51を誘導加
熱器52によって加熱して金属蒸気40aを蒸発させ、
供給管55及びシャッタ57から二股に分かれている蒸
着路56に金属蒸気40aを供給する。
As shown in FIG. 1, the inside of the heat insulating box 58 is heated by the heater 59, it sucks the vacuum chamber 61 by the vacuum suction device (not shown) from the exhaust pipe 62, the inside of the vacuum chamber 61 for example 10 -3 torr The pressure is reduced to a substantially vacuum state. The molten metal 40 in the melting furnace 54 is moved from the suction pipe 53 to the crucible 5 by the pressure difference between the inside and the outside of the vacuum chamber 61.
Siphoning to a steady level L 1 in 1, by heating the crucible 51 by induction heater 52 to evaporate the metal vapor 40a,
The metal vapor 40a is supplied from the supply pipe 55 and the shutter 57 to the forked vapor deposition path 56.

【0026】そして、金属蒸気40aよりも低温の帯鋼
50を金属蒸気40aを吐出している双方の開口部56
a間で走行させ、帯鋼50に金属蒸気40aを蒸着して
所要の厚さの金属被膜を形成する。
The steel strip 50 having a lower temperature than the metal vapor 40a is supplied to both the openings 56 for discharging the metal vapor 40a.
a, and the metal vapor 40a is deposited on the steel strip 50 to form a metal coating having a required thickness.

【0027】図2に示すように、この蒸着時間の経過と
共にるつぼ51内の定常レベルL1にある溶融金属面42
の下方にドロス41aが浮上して集合することにより金
属蒸気40aの蒸発が妨げられる。金属蒸気40aの蒸
発が妨げられると、図3に示すように、昇降装置2によ
って溶解炉54を下降させて溶融金属面42を定常レベ
ルL1から退避レベルL2の高さにする。これにより、定常
レベルL1にある溶融金属面42がドロス通過隙間g1及び
ドロス遮蔽隙間g2を通過し、溶融金属面42を吸引管5
3内の退避レベルL2まで下降させる。この時、ドロス4
1aはドロス通過隙間g1を通過する。
As shown in FIG. 2, the molten metal surface 42 at the steady level L 1 in the crucible 51 with the elapse of the deposition time.
The dross 41a floats below and gathers to prevent evaporation of the metal vapor 40a. When evaporation of the metal vapor 40a is prevented, as shown in FIG. 3, it lowers the melting furnace 54 by the lifting device 2 to the molten metal surface 42 to the height of the retraction level L 2 from a steady level L 1. Thus, the molten metal surface 42 on the steady-state level L 1 passes through the dross passage gaps g 1 and dross shield gap g 2, suction pipe molten metal surface 42 5
To the retracted level L 2 of the 3 is lowered. At this time, dross 4
1a passes through the dross passage gap g 1.

【0028】そして、図4に示すように、昇降装置2に
よって溶解炉54を再度上昇させて溶融金属面42を定
常レベルL1まで上昇させると、ドロス遮蔽隙間g2は上昇
する溶融金属面42の上方の溶融金属40のみを通過さ
せドロス41aを遮蔽する。従って、溶融金属面42に
浮上しているドロス41aの大部分は遮蔽板1の下面の
傾斜に当たって傾斜上端側に集まる。このようにして、
定常レベルL1にある溶融金属面42に浮上するドロス4
1aのほとんどが除去され、正常な状態で金属蒸気40
aの蒸発を維持する。
[0028] Then, as shown in FIG. 4, when raising the melting furnace 54 again raise the molten metal surface 42 to a steady level L 1 by the lifting device 2, the molten metal surface 42 dross shield gap g 2 rises Only the molten metal 40 above is passed to shield the dross 41a. Therefore, most of the dross 41 a floating on the molten metal surface 42 is concentrated on the upper end side of the slope when the lower surface of the shield plate 1 is inclined. In this way,
Dross 4 floated on the molten metal surface 42 on the steady-state level L 1
1a is mostly removed and the metal vapor 40
Maintain the evaporation of a.

【0029】上述した真空蒸着装置では、るつぼ51内
の定常レベルL1にある溶融金属面42の下方に遮蔽板1
を傾斜して装着し、遮蔽板1の傾斜上端とるつぼ51の
側壁との間に狭いドロス遮蔽隙間g2を形成すると共に、
遮蔽板1の傾斜下端とるつぼ51の側壁との間にドロス
通過隙間g1を形成し、溶解炉54を昇降させる昇降装置
2を設けたので、定常レベルL1にある溶融金属面42に
ドロス41aが集合しても、昇降装置2によって溶解炉
54を下降させ、溶融金属40をドロス41aと共にド
ロス通過隙間g1を通過させて退避レベルL2まで下降さ
せ、更に、溶融金属面42を再度定常レベルL1まで上昇
させてドロス41aを遮蔽板1の傾斜した下面で遮蔽
し、ドロス41aを傾斜上端側に移動させて集めること
ができる。
[0029] In a vacuum vapor deposition apparatus described above, the shielding plate 1 below the molten metal surface 42 on the steady-state level L 1 in the crucible 51
With an inclined by mounting, to form a narrow dross shield gap g 2 between the side wall of the inclined upper and crucible 51 of the shielding plate 1,
Between the side wall of the inclined lower end crucible 51 of the shielding plate 1 to form a dross passage gap g 1, is provided with the lifting device 2 for raising and lowering the melting furnace 54, dross in the molten metal surface 42 on the steady-state level L 1 even 41a is set, by the lifting device 2 to lower the melting furnace 54, molten metal 40 is lowered to the retracted level L 2 is passed through the dross passage gap g 1 with dross 41a, further, the molten metal surface 42 again is raised to steady-state level L 1 dross 41a shielded by the inclined lower surface of the shielding plate 1, it can be collected by moving the dross 41a on the inclined upper side.

【0030】従って、定常レベルL1にある溶融金属面4
2へのドロス41aの集合を防止することが可能にな
り、正常な金属蒸気40aの蒸発を維持して帯鋼50に
所要の厚さの金属被膜を蒸着することができる。
Therefore, the molten metal surface 4 at the steady level L 1
This makes it possible to prevent the dross 41a from accumulating in the metal strip 2 and maintain a normal evaporation of the metal vapor 40a, thereby depositing a metal coating of a required thickness on the steel strip 50.

【0031】図5乃至図7に基づいて本発明の第2実施
例を説明する。図5には本発明の第2実施例に係る真空
蒸着装置の縦断面、図6には図5中のるつぼを拡大した
縦断面、図7には図5中のVII-VII 線矢視状態を示して
ある。図示の第2実施例は請求項2に相当する。尚、図
12で示した従来の真空蒸着装置、及び図1乃至図4で
示した第1実施例に係る真空蒸着装置と同一の部材及び
部位には同一の符号を付して重複する説明は省略してあ
る。
A second embodiment of the present invention will be described with reference to FIGS. FIG. 5 is a longitudinal section of a vacuum evaporation apparatus according to a second embodiment of the present invention, FIG. 6 is an enlarged longitudinal section of the crucible in FIG. 5, and FIG. 7 is a view taken along line VII-VII in FIG. Is shown. The illustrated second embodiment corresponds to claim 2. Note that the same members and parts as those of the conventional vacuum evaporation apparatus shown in FIG. 12 and the vacuum evaporation apparatus according to the first embodiment shown in FIGS. Omitted.

【0032】図において、るつぼ51内には内壁面と所
要の蒸発面距離を形成するスプラッシュ遮蔽板5が設け
られ、スプラッシュ遮蔽板5はフランジ6を介してるつ
ぼ51と供給路55とに介装されている。スプラッシュ
遮蔽板5の下端はるつぼ51内の溶融金属40に浸漬す
る状態になっている。
In the figure, a splash shield plate 5 for forming a required evaporation surface distance from the inner wall surface is provided in the crucible 51, and the splash shield plate 5 is interposed between the crucible 51 and the supply path 55 via the flange 6. Have been. The lower end of the splash shielding plate 5 is immersed in the molten metal 40 in the crucible 51.

【0033】その他の構成は、図12で示した真空蒸着
装置、及び図1乃至図4で示した第1実施例に係る真空
蒸着装置と同一である。上述した真空蒸着装置の作用を
説明する。
The other structures are the same as those of the vacuum evaporation apparatus shown in FIG. 12 and the vacuum evaporation apparatus according to the first embodiment shown in FIGS. The operation of the above-described vacuum deposition apparatus will be described.

【0034】第1実施例と同様に、断熱箱58内を加熱
器59によって加熱し、排気管62から図示しない真空
吸引装置によって真空チャンバ61内を吸引し、真空チ
ャンバ61内を例えば10-3torrの略真空状態に減圧す
る。真空チャンバ61の内部と外部との気圧差によって
溶解炉54内の溶融金属40を吸引管53からるつぼ5
1内の定常レベルL1まで吸い上げ、るつぼ51を誘導加
熱器52によって加熱して金属蒸気40aを蒸発させ、
供給管55及びシャッタ57から二股に分かれている蒸
着路56に金属蒸気40aを供給する。
[0034] Similar to the first embodiment, the inside of the heat insulating box 58 is heated by the heater 59, the exhaust pipe 62 sucks the vacuum chamber 61 by the vacuum suction device (not shown) from the inside of the vacuum chamber 61, for example, 10 -3 The pressure is reduced to a substantially vacuum state of torr. The molten metal 40 in the melting furnace 54 is moved from the suction pipe 53 to the crucible 5 by the pressure difference between the inside and the outside of the vacuum chamber 61.
Siphoning to a steady level L 1 in 1, by heating the crucible 51 by induction heater 52 to evaporate the metal vapor 40a,
The metal vapor 40a is supplied from the supply pipe 55 and the shutter 57 to the forked vapor deposition path 56.

【0035】そして、金属蒸気40aよりも低温の帯鋼
50を金属蒸気40aを吐出している双方の開口部56
a間で走行させ、帯鋼50に金属蒸気40aを蒸着して
所要の厚さの金属被膜を形成する。
Then, the steel strip 50 having a lower temperature than the metal vapor 40a is supplied to both the openings 56 for discharging the metal vapor 40a.
a, and the metal vapor 40a is deposited on the steel strip 50 to form a metal coating having a required thickness.

【0036】金属蒸気40aの蒸発の際に、スプラッシ
ュ41bが金属蒸発面42から金属蒸気40aと共に発
生する。るつぼ51内の溶融金属40を誘導加熱器52
によって加熱する時には、スプラッシュ41bのほとん
どはるつぼ51の内壁近傍で発生するので、発生したス
プラッシュ41bがスプラッシュ遮蔽板5によって遮蔽
されるようになっている。このようにして、金属蒸気4
0aと共に蒸発するスプラッシュ41bのほとんどを除
去することができ、帯鋼50へのスプラッシュ41bの
付着を防止することができる。
During the evaporation of the metal vapor 40a, a splash 41b is generated from the metal evaporation surface 42 together with the metal vapor 40a. The molten metal 40 in the crucible 51 is heated by an induction heater 52.
When heating is performed, most of the splash 41 b is generated near the inner wall of the crucible 51, so that the generated splash 41 b is shielded by the splash shielding plate 5. Thus, the metal vapor 4
Most of the splash 41b that evaporates together with 0a can be removed, and adhesion of the splash 41b to the strip 50 can be prevented.

【0037】上述した真空蒸着装置では、るつぼ51の
内壁面と所要の蒸発面距離を形成するスプラッシュ遮蔽
板5を、その下端が溶融金属40に浸漬するように設け
たので、るつぼ51の内壁近傍で発生するスプラッシュ
41bのほとんどをスプラッシュ遮蔽板5によって遮蔽
することができる。従って、るつぼ51で発生するスプ
ラッシュ41bのほとんどを金属蒸気40aから除去し
て帯鋼50へのスプラッシュ41bの付着を防止し、帯
鋼50の品質を向上させることができる。
In the above-described vacuum evaporation apparatus, the splash shielding plate 5 for forming a required evaporation surface distance from the inner wall surface of the crucible 51 is provided so that its lower end is immersed in the molten metal 40. Most of the splash 41 b generated in the above can be shielded by the splash shield plate 5. Therefore, most of the splash 41b generated in the crucible 51 is removed from the metal vapor 40a to prevent the splash 41b from adhering to the strip 50, and the quality of the strip 50 can be improved.

【0038】尚、スプラッシュ41bの発生は誘導加熱
特有のものではなく、るつぼ51の側面から加熱する方
式のものでは、るつぼ51の内壁近傍でスプラッシュ4
1bが発生する。加熱手段としては、誘導加熱器52以
外にも電熱ヒータ等が用いられる。
The generation of the splash 41b is not peculiar to induction heating. In the case of heating from the side of the crucible 51, the splash 41b is generated near the inner wall of the crucible 51.
1b occurs. As the heating means, an electric heater or the like is used in addition to the induction heater 52.

【0039】また、上述した真空蒸着装置では、昇降装
置2によって溶解炉54を昇降自在にしている。溶解炉
54を昇降させることにより、スプラッシュ遮蔽板5の
溶融金属40への浸漬程度を調整することができる(請
求項4)。
In the above-described vacuum vapor deposition apparatus, the melting furnace 54 can be moved up and down by the elevating device 2. By raising and lowering the melting furnace 54, the degree of immersion of the splash shield plate 5 in the molten metal 40 can be adjusted (claim 4).

【0040】図8乃至図10に基づいて本発明の第3実
施例を説明する。図8には本発明の第3実施例に係る真
空蒸着装置の縦断面、図9には図8中のるつぼ及び掬い
取り板を拡大した縦断面、図10には図9中のX-X 線矢
視状態を示してある。図示の第3実施例は請求項3に相
当する。尚、図12で示した従来の真空蒸着装置、及び
図1乃至図7で示した第1、2実施例に係る真空蒸着装
置と同一の部材及び部位には同一の符号を付して重複す
る説明は省略してある。
A third embodiment of the present invention will be described with reference to FIGS. 8 is a longitudinal section of a vacuum evaporation apparatus according to the third embodiment of the present invention, FIG. 9 is an enlarged longitudinal section of the crucible and the scooping plate in FIG. 8, and FIG. 10 is a line XX in FIG. The visual state is shown. The illustrated third embodiment corresponds to claim 3. The same members and parts as those of the conventional vacuum evaporation apparatus shown in FIG. 12 and the vacuum evaporation apparatuses according to the first and second embodiments shown in FIGS. The description is omitted.

【0041】図8及び図9において、るつぼ51の上方
には供給管15が接続され、供給管15は断熱箱58内
に配されている。断熱箱58の内部における供給管15
の下部には掬い取り板回動室16及びドロス受け部17
が設けられている。11は掬い取り板であり、掬い取り
板11は、掬い取り板回動室16を貫通する軸受18に
回動自在に支承された回動軸14と、掬い取り板回動室
16内を回動するように回動軸14に固着された枠12
と、枠12に装着された例えば2mmメッシュの金属製の
金網13とによって構成されている。尚、金属製の金網
13に代えてセラミックス製を用いることも可能であ
る。
8 and 9, the supply pipe 15 is connected above the crucible 51, and the supply pipe 15 is disposed in the heat insulation box 58. Supply pipe 15 inside heat insulation box 58
The scooping plate rotation chamber 16 and the dross receiving portion 17
Is provided. Reference numeral 11 denotes a scooping plate. The scooping plate 11 rotates around a rotation shaft 14 rotatably supported by a bearing 18 that penetrates the scooping plate rotation chamber 16 and inside the scooping plate rotation chamber 16. Frame 12 fixed to a rotating shaft 14 so as to move
And a metal wire mesh 13 of, for example, a 2 mm mesh attached to the frame 12. Note that ceramics can be used instead of the metal wire mesh 13.

【0042】その他の構成は、図12で示した真空蒸着
装置、及び図1乃至図7で示した第1、2実施例に係る
真空蒸着装置と同一である。上述した真空蒸着装置の作
用を説明する。
The other structures are the same as those of the vacuum evaporation apparatus shown in FIG. 12 and the vacuum evaporation apparatuses according to the first and second embodiments shown in FIGS. The operation of the above-described vacuum deposition apparatus will be described.

【0043】図8に示すように、断熱箱58内を加熱器
59によって加熱し、排気管62から図示しない真空吸
引装置によって真空チャンバ61内を吸引し、真空チャ
ンバ61内を例えば10-3torrの略真空状態に減圧す
る。そして、掬い取り板11をるつぼ51内に回動して
下降させておき、真空チャンバ61の内部と外部との気
圧差によって溶解炉54内の溶融金属40を吸引管53
からるつぼ51内の金属蒸発面42まで吸い上げ、誘導
加熱器52によって加熱して金属蒸気40aを蒸発さ
せ、掬い取り板回動室16、供給路15及びシャッタ5
7から二股に分かれている蒸着路56に金属蒸気40a
を供給する。
As shown in FIG. 8, the inside of the heat insulating box 58 is heated by the heater 59, it sucks the vacuum chamber 61 by the vacuum suction device (not shown) from the exhaust pipe 62, the inside of the vacuum chamber 61 for example 10 -3 torr The pressure is reduced to a substantially vacuum state. Then, the scooping plate 11 is turned down into the crucible 51 and lowered, and the molten metal 40 in the melting furnace 54 is drawn into the suction pipe 53 by the pressure difference between the inside and the outside of the vacuum chamber 61.
The metal vapor 40a is sucked up to the metal evaporation surface 42 in the crucible 51, heated by the induction heater 52 to evaporate the metal vapor 40a, and the scooping plate rotating chamber 16, the supply path 15, and the shutter 5
The metal vapor 40a is supplied to the vapor deposition path 56 which is divided into two from 7
Supply.

【0044】そして、金属蒸気40aよりも低温の帯鋼
50をスリット58aから導入して金属蒸気40aを吐
出している双方の開口部56a間で走行させ、帯鋼50
に金属蒸気40aを蒸着して所要の厚さの金属被膜を形
成する。
Then, the strip 50 having a temperature lower than that of the metal vapor 40a is introduced from the slit 58a, and is run between the two openings 56a discharging the metal vapor 40a.
A metal vapor 40a is deposited on the substrate to form a metal film having a required thickness.

【0045】図9に示すように、金属蒸気40aの蒸発
と共に溶融金属40内で発生したドロス41aが金属蒸
発面42に集合して金属蒸気40aの蒸発を妨げると、
溶融金属40に浸漬させてある掬い取り板11を上方へ
回動して金網13でドロス41aを掬い取る。更に、掬
い取り板11をドロス受け部17の上方まで回動してド
ロス41aをドロス受け部17に落下させて移載する。
As shown in FIG. 9, when the dross 41a generated in the molten metal 40 together with the evaporation of the metal vapor 40a gathers on the metal evaporation surface 42 and hinders the evaporation of the metal vapor 40a.
The scooping plate 11 immersed in the molten metal 40 is rotated upward to scoop the dross 41 a with the wire net 13. Further, the scooping plate 11 is rotated to a position above the dross receiving portion 17, and the dross 41a is dropped onto the dross receiving portion 17 and transferred.

【0046】このようにして、溶融金属40の金属蒸発
面42に集合したドロス41aのほとんどを除去し、正
常な金属蒸気40aの蒸発を維持する。尚、ドロス41
aは装置の立ち上がり時に著しく多量の発生し、正常運
転に移行するとドロス41aの発生は少なくなる。
In this way, most of the dross 41a gathered on the metal evaporation surface 42 of the molten metal 40 is removed, and normal evaporation of the metal vapor 40a is maintained. Dross 41
a is generated in a remarkably large amount at the start of the apparatus, and when the operation is shifted to the normal operation, the generation of the dross 41a is reduced.

【0047】上述した真空蒸着装置では、供給路15の
下部にドロス受け部17を設けると共に、掬い取り板1
1をるつぼ51内の溶融金属40に浸漬する位置からド
ロス受け部17へ回動するように設けたので、金属蒸発
面42にドロス41aが集合して蒸発面積が小さくなり
金属蒸気40aの蒸発量が減少しても、るつぼ51内の
溶融金属40に浸漬させてある掬い取り板11を上方に
回動してドロス41aを掬い取り、ドロス受け部17に
移載することができる。従って、金属蒸発面42へのド
ロス41aの集合を防止することが可能になり、正常な
金属蒸気40aの蒸発を維持して帯鋼50に所要の厚さ
の金属被膜を蒸着することができる。
In the above-described vacuum evaporation apparatus, the dross receiving portion 17 is provided below the supply path 15 and the scooping plate 1 is provided.
1 is provided so as to rotate from the position where it is immersed in the molten metal 40 in the crucible 51 to the dross receiving portion 17, so that the dross 41 a gathers on the metal evaporation surface 42 to reduce the evaporation area, and the evaporation amount of the metal vapor 40 a Even if is reduced, the scooping plate 11 immersed in the molten metal 40 in the crucible 51 can be rotated upward to scoop up the dross 41a and transfer it to the dross receiving portion 17. Therefore, it is possible to prevent the dross 41a from gathering on the metal evaporation surface 42, and it is possible to deposit a metal film of a required thickness on the steel strip 50 while maintaining normal evaporation of the metal vapor 40a.

【0048】また、上述した真空蒸着装置では、昇降装
置2によって溶解炉54を昇降自在にしている。このた
め、昇降装置2により溶解炉54を下降させ、金属蒸発
面42を掬い取り板11の下回転位置より下にした状態
で掬い取り板11を下位置まで回転させ、この状態で昇
降装置2により溶解炉54を上げて金属蒸発面42を上
昇させた後、掬い取り板11を上方に回転させることに
より、ドロス41aを完全に掬い取ることが可能になる
(請求項5)。
In the above-described vacuum vapor deposition apparatus, the melting furnace 54 can be moved up and down by the elevating device 2. For this reason, the melting furnace 54 is lowered by the elevating device 2, and the scooping plate 11 is rotated to the lower position with the metal evaporation surface 42 being lower than the lower rotation position of the scooping plate 11. After raising the melting furnace 54 to raise the metal evaporation surface 42, the dross 41a can be completely scooped by rotating the scooping plate 11 upward (claim 5).

【0049】また、図11に示すように、るつぼ51に
遮蔽板1とスプラッシュ遮蔽板5を両方備えることも可
能である。これにより、ドロス41a及びスプラッシュ
41bの両方を除去することができる。
As shown in FIG. 11, the crucible 51 may be provided with both the shielding plate 1 and the splash shielding plate 5. Thereby, both the dross 41a and the splash 41b can be removed.

【0050】[0050]

【発明の効果】本発明の真空蒸着装置では、金属蒸発槽
内の定常レベルにある溶融金属面の下方に遮蔽板を傾斜
して装着し、遮蔽板の傾斜上端と金属蒸発槽の側壁との
間に狭いドロス遮蔽隙間を形成すると共に、遮蔽板の傾
斜下端と金属蒸発槽の側壁との間にドロス通過隙間を形
成し、溶融金属面昇降手段を設けたので、定常レベルに
ある溶融金属面にドロスが集合しても、溶融金属面昇降
手段によって溶融金属をドロスと共にドロス通過隙間を
通過させて退避レベルまで下降させ、更に、溶融金属面
を再度定常レベルまで上昇させてドロスを遮蔽板の傾斜
した下面で遮蔽し、ドロスを傾斜上端側に移動させて集
めることができる。この結果、定常レベルにある溶融金
属面へのドロスの集合を防止することが可能になり、正
常な金属蒸気の蒸発を維持して帯材に所要の厚さの金属
被膜を蒸着することができる。
According to the vacuum vapor deposition apparatus of the present invention, a shield plate is mounted obliquely below the molten metal surface at a steady level in the metal evaporation tank, and the inclined upper end of the shield plate and the side wall of the metal evaporation tank are connected. Since a narrow dross shielding gap is formed between the lower end of the shielding plate and a side wall of the metal evaporation tank, a dross passing gap is formed between the lower end of the shielding plate and the molten metal surface raising / lowering means. Even if the dross gathers, the molten metal is raised by the molten metal surface elevating means together with the dross through the dross passage gap and lowered to the evacuation level, and the molten metal surface is raised again to the steady level and the dross is shielded. The dross can be collected by moving the dross to the upper end of the slope by shielding it with the inclined lower surface. As a result, it becomes possible to prevent dross from accumulating on the molten metal surface at a steady level, and it is possible to deposit a metal film of a required thickness on a strip while maintaining normal evaporation of metal vapor. .

【0051】また、本発明の真空蒸着装置では、金属蒸
発槽の内壁面と所要の蒸発面距離を形成するスプラッシ
ュ遮蔽板を、その下端が溶融金属40に浸漬するように
設けたので、金属蒸気が溶融金属の蒸発面から蒸発する
際に、スプラッシュが金属蒸気と共に発生するが、金属
蒸発槽内を誘導加熱器等によって側面から加熱する方式
では、スプラッシュのほとんどが金属蒸発槽の内壁近傍
で発生するので、スプラッシュ遮蔽板によってスプラッ
シュを遮蔽することができる。この結果、金属蒸発槽で
発生するスプラッシュのほとんどを金属蒸気から除去し
て帯材への付着を防止し、帯材の品質を向上させること
ができる。
Further, in the vacuum vapor deposition apparatus of the present invention, the splash shielding plate for forming the required evaporation surface distance from the inner wall surface of the metal evaporation tank is provided so that its lower end is immersed in the molten metal 40. Splash is generated together with the metal vapor when the metal evaporates from the evaporation surface of the molten metal.However, in the method in which the inside of the metal evaporation tank is heated from the side by an induction heater etc., most of the splash occurs near the inner wall of the metal evaporation tank Therefore, the splash can be shielded by the splash shield plate. As a result, most of the splash generated in the metal evaporation tank is removed from the metal vapor to prevent the metal vapor from adhering to the strip, thereby improving the quality of the strip.

【0052】また、本発明の真空蒸着装置では、金属蒸
気供給路の下部にドロス受け部を設けると共に、ドロス
掬い取り板を金属蒸発槽内の溶融金属に浸漬する位置か
らドロス受け部へ回動するように設けたので、金属蒸発
面にドロスが集合して蒸発面積が小さくなり金属蒸気の
蒸発量が減少しても、金属蒸発槽内の溶融金属に浸漬さ
せてあるドロス掬い取り板を上方に回動してドロスを掬
い取り、ドロス受け部に移載することができる。この結
果、金属蒸発面へのドロスの集合を防止することが可能
になり、正常な金属蒸気の蒸発を維持して帯材に所要の
厚さの金属被膜を蒸着することができる。
In the vacuum evaporation apparatus of the present invention, a dross receiving portion is provided below the metal vapor supply passage, and the dross scooping plate is rotated from a position where the dross scooping plate is immersed in the molten metal in the metal evaporating tank to the dross receiving portion. Even if the dross gathers on the metal evaporation surface and the evaporation area decreases, the amount of evaporation of metal vapor decreases, the dross scooping plate immersed in the molten metal in the metal evaporation tank is raised upward. , The dross can be scooped up and transferred to the dross receiving portion. As a result, it is possible to prevent dross from accumulating on the metal evaporation surface, and it is possible to deposit a metal film of a required thickness on the strip while maintaining normal evaporation of the metal vapor.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の第1実施例に係る真空蒸着装置の縦断
面図。
FIG. 1 is a longitudinal sectional view of a vacuum evaporation apparatus according to a first embodiment of the present invention.

【図2】図1中のるつぼ及び溶解炉を拡大した縦断面
図。
FIG. 2 is an enlarged longitudinal sectional view of a crucible and a melting furnace in FIG.

【図3】溶融金属面の退避レベルへの下降を表す縦断面
図。
FIG. 3 is a longitudinal sectional view showing the lowering of a molten metal surface to a retreat level.

【図4】溶融金属面の定常レベルへの復帰を表す縦断面
図。
FIG. 4 is a longitudinal sectional view showing a return of a molten metal surface to a steady level.

【図5】本発明の第2実施例に係る真空蒸着装置の縦断
面図。
FIG. 5 is a longitudinal sectional view of a vacuum evaporation apparatus according to a second embodiment of the present invention.

【図6】図5中のるつぼを拡大した縦断面図。6 is an enlarged longitudinal sectional view of the crucible in FIG.

【図7】図6中のVII-VII 線矢視図。FIG. 7 is a view taken along line VII-VII in FIG. 6;

【図8】本発明の第3実施例に係る真空蒸着装置の縦断
面図。
FIG. 8 is a longitudinal sectional view of a vacuum evaporation apparatus according to a third embodiment of the present invention.

【図9】図8中のるつぼ及び掬い取り板を拡大した縦断
面図。
9 is an enlarged longitudinal sectional view of the crucible and the scooping plate in FIG.

【図10】図9中のX-X 線矢視図。FIG. 10 is a view taken along line XX in FIG. 9;

【図11】るつぼの他の実施例を表す断面図。FIG. 11 is a cross-sectional view illustrating another embodiment of a crucible.

【図12】従来の真空蒸着装置の縦断面図。FIG. 12 is a longitudinal sectional view of a conventional vacuum evaporation apparatus.

【符号の説明】[Explanation of symbols]

1 遮蔽板 2 昇降装置 3 昇降シリンダ 4 ガイド 5 スプラッシュ遮蔽板 6 フランジ 11 掬い取り板 12 枠 13 金網 14 回動軸 15 供給路 16 掬い取り板回動室 17 ドロス受け部 18 軸受 40 溶融金属 40a 金属蒸気 41a ドロス 41b スプラッシュ 42 溶融金属面 50 帯鋼 51 るつぼ 52 誘導加熱器 53 吸引管 54 溶解炉 55 供給管 57 シャッタ 61 真空チャンバ g1 ドロス通過隙間 g2 ドロス遮蔽隙間 L1 定常レベル L2 退避レベルREFERENCE SIGNS LIST 1 shielding plate 2 lifting device 3 lifting cylinder 4 guide 5 splash shielding plate 6 flange 11 scooping plate 12 frame 13 wire mesh 14 rotation shaft 15 supply path 16 scooping plate rotation chamber 17 dross receiving part 18 bearing 40 molten metal 40a metal steam 41a dross 41b splash 42 induction melting metal surface 50 steel strip 51 the crucible 52 heater 53 melting furnace 55 feed pipe 57 the shutter 61 the suction tube 54 the vacuum chamber g 1 dross passage gap g 2 dross shield gap L 1 constant level L 2 saving level

フロントページの続き (72)発明者 松田 直彦 広島県広島市西区観音新町四丁目6番22号 三菱重工業株式会社広島研究所内 (72)発明者 谷崎 桂二 広島県広島市西区観音新町四丁目6番22号 三菱重工業株式会社広島研究所内Continued on the front page (72) Inventor Naohiko Matsuda 4-2-2 Kannonshinmachi, Nishi-ku, Hiroshima-shi, Hiroshima Inside the Hiroshima Research Laboratory, Mitsubishi Heavy Industries, Ltd. (72) Keiji Tanizaki 4-6-1 Kannonshinmachi, Nishi-ku, Hiroshima-shi, Hiroshima No. 22 Hiroshima Research Laboratory, Mitsubishi Heavy Industries, Ltd.

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 真空チャンバに金属蒸発槽を内装し、前
記金属蒸発槽と前記真空チャンバ外下方の金属溶解炉と
を吸引管によって接続し、被蒸着帯材が走行する蒸着室
を前記真空チャンバ内の前記金属蒸発槽の上方に設けた
真空蒸着装置であって、前記金属蒸発槽内の定常レベル
の溶融金属の下面に遮蔽板を傾斜して装着し、前記遮蔽
板の傾斜上端と前記金属蒸発槽の側壁との間に狭いドロ
ス遮蔽隙間を形成すると共に、前記遮蔽板の傾斜下端と
前記金属蒸発槽の側壁との間にドロス通過隙間を形成
し、溶融金属面を昇降させる溶融金属面昇降手段を設け
たことを特徴とする真空蒸着装置。
A vacuum chamber is provided with a metal evaporation tank, and the metal evaporation tank is connected to a metal melting furnace below the vacuum chamber by a suction pipe. A vacuum evaporation apparatus provided above the metal evaporation tank in the metal evaporation tank, wherein a shielding plate is inclinedly mounted on a lower surface of the molten metal at a steady level in the metal evaporation tank, and an inclined upper end of the shielding plate and the metal A molten metal surface that forms a narrow dross shielding gap between the side wall of the evaporation tank and a dross passage gap between the inclined lower end of the shielding plate and the side wall of the metal evaporation tank and raises and lowers the molten metal surface A vacuum evaporation apparatus comprising a lifting means.
【請求項2】 真空チャンバに金属蒸発槽を内装し、前
記金属蒸発槽内の溶融金属を誘導加熱器によって加熱
し、蒸発面から金属蒸気を蒸発させて被蒸着帯材に蒸着
する真空蒸着装置であって、前記金属蒸発槽の内壁面と
の間で所要の蒸発面距離を形成するスプラッシュ遮蔽板
を下端が前記溶融金属に浸漬する状態に設けたことを特
徴とする真空蒸着装置。
2. A vacuum vapor deposition apparatus in which a metal evaporating tank is provided in a vacuum chamber, a molten metal in the metal evaporating tank is heated by an induction heater, and a metal vapor is evaporated from an evaporation surface to vapor-deposit on a strip to be vapor-deposited. A vacuum evaporation apparatus, wherein a splash shielding plate for forming a required evaporation surface distance with an inner wall surface of the metal evaporation tank is provided with a lower end immersed in the molten metal.
【請求項3】 金属蒸発槽と、前記金属蒸発槽の金属蒸
気蒸発面の上方に接続した金属蒸気供給路と、前記金属
蒸気供給路に接続した帯材蒸着部とを真空チャンバに内
装した真空蒸着装置であって、前記金属蒸気供給路の下
部にドロス受け部を設けると共に、ドロス掬い取り板を
前記金属蒸発槽内の溶融金属に浸漬する位置から前記ド
ロス受け部へ回動するように設けたことを特徴とする真
空蒸着装置。
3. A vacuum in which a metal evaporation tank, a metal vapor supply path connected above a metal vapor evaporation surface of the metal evaporation tank, and a band material deposition section connected to the metal vapor supply path are provided in a vacuum chamber. In a vapor deposition apparatus, a dross receiving portion is provided at a lower portion of the metal vapor supply path, and a dross scooping plate is provided so as to rotate from a position where it is immersed in molten metal in the metal evaporation tank to the dross receiving portion. A vacuum deposition apparatus.
【請求項4】 真空チャンバに金属蒸発槽を内装し、前
記金属蒸発槽と前記真空チャンバ外下方の金属溶解炉と
を吸引管によって接続し、被蒸着帯材が走行する蒸着室
を前記真空チャンバ内の前記金属蒸発槽の上方に設けた
真空蒸着装置であって、前記金属蒸発槽内の定常レベル
の溶融金属の下面に遮蔽板を傾斜して装着し、前記遮蔽
板の傾斜上端と前記金属蒸発槽の側壁との間に狭いドロ
ス遮蔽隙間を形成すると共に、前記遮蔽板の傾斜下端と
前記金属蒸発槽の側壁との間にドロス通過隙間を形成
し、溶融金属面を昇降させる溶融金属面昇降手段を設け
る一方、前記金属蒸発槽の内壁面との間で所要の蒸発面
距離を形成するスプラッシュ遮蔽板を下端が前記溶融金
属に浸漬する状態に設けたことを特徴とする真空蒸着装
置。
4. A vacuum evaporation chamber provided with a metal evaporation tank, the metal evaporation tank and a metal melting furnace located outside the vacuum chamber are connected by a suction pipe, and the evaporation chamber in which the material to be evaporated travels is formed in the vacuum chamber. A vacuum evaporation apparatus provided above the metal evaporation tank in the metal evaporation tank, wherein a shielding plate is inclinedly mounted on a lower surface of the molten metal at a steady level in the metal evaporation tank, and an inclined upper end of the shielding plate and the metal A molten metal surface that forms a narrow dross shielding gap between the side wall of the evaporation tank and a dross passage gap between the inclined lower end of the shielding plate and the side wall of the metal evaporation tank and raises and lowers the molten metal surface A vacuum evaporating apparatus, wherein the elevating means is provided, and a splash shield plate for forming a required evaporating surface distance with the inner wall surface of the metal evaporating tank is provided with its lower end immersed in the molten metal.
【請求項5】 真空チャンバに金属蒸発槽を内装し、前
記金属蒸発槽の金属蒸気蒸発面の上方に金属蒸気供給路
を接続し、前記金属蒸発槽と前記真空チャンバ外下方の
金属溶解炉とを吸引管によって接続し、被蒸着帯材が走
行する蒸着室を前記真空チャンバ内の前記金属蒸発槽の
上方に設けた真空蒸着装置であって、前記金属蒸発槽内
の定常レベルの溶融金属の下面に遮蔽板を傾斜して装着
し、前記遮蔽板の傾斜上端と前記金属蒸発槽の側壁との
間に狭いドロス遮蔽隙間を形成すると共に、前記遮蔽板
の傾斜下端と前記金属蒸発槽の側壁との間にドロス通過
隙間を形成し、溶融金属面を昇降させる溶融金属面昇降
手段を設ける一方、前記金属蒸気供給路の下部にドロス
受け部を設けると共に、ドロス掬い取り板を前記金属蒸
発槽内の溶融金属に浸漬する位置から前記ドロス受け部
へ回動するように設けたことを特徴とする真空蒸着装
置。
5. A vacuum chamber provided with a metal evaporation tank, a metal vapor supply passage connected above a metal vapor evaporation surface of the metal evaporation tank, and a metal melting furnace located outside the vacuum chamber and below the vacuum chamber. Are connected by a suction pipe, a vacuum deposition apparatus provided with a vapor deposition chamber in which the material to be vaporized travels above the metal evaporation tank in the vacuum chamber, wherein a steady level molten metal in the metal evaporation tank is provided. A shielding plate is inclinedly mounted on the lower surface to form a narrow dross shielding gap between the inclined upper end of the shielding plate and the side wall of the metal evaporation tank, and the inclined lower end of the shielding plate and the side wall of the metal evaporation tank. A molten metal surface elevating means for elevating and lowering the molten metal surface while forming a dross passing gap between the metal evaporation tank and a dross scooping plate provided at the lower portion of the metal vapor supply path. To the molten metal in the A vacuum vapor deposition device provided so as to rotate from a dipping position to the dross receiving portion.
JP16401096A 1996-06-25 1996-06-25 Vacuum vapor deposition device Withdrawn JPH108240A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16401096A JPH108240A (en) 1996-06-25 1996-06-25 Vacuum vapor deposition device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16401096A JPH108240A (en) 1996-06-25 1996-06-25 Vacuum vapor deposition device

Publications (1)

Publication Number Publication Date
JPH108240A true JPH108240A (en) 1998-01-13

Family

ID=15785063

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16401096A Withdrawn JPH108240A (en) 1996-06-25 1996-06-25 Vacuum vapor deposition device

Country Status (1)

Country Link
JP (1) JPH108240A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130199447A1 (en) * 2010-12-13 2013-08-08 Posco Continuous Coating Apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130199447A1 (en) * 2010-12-13 2013-08-08 Posco Continuous Coating Apparatus
JP2013545900A (en) * 2010-12-13 2013-12-26 ポスコ Continuous coating equipment
US9267203B2 (en) 2010-12-13 2016-02-23 Posco Continuous coating apparatus

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