JPH1081957A - Evaporation material - Google Patents
Evaporation materialInfo
- Publication number
- JPH1081957A JPH1081957A JP9157062A JP15706297A JPH1081957A JP H1081957 A JPH1081957 A JP H1081957A JP 9157062 A JP9157062 A JP 9157062A JP 15706297 A JP15706297 A JP 15706297A JP H1081957 A JPH1081957 A JP H1081957A
- Authority
- JP
- Japan
- Prior art keywords
- vapor deposition
- deposition material
- diameter
- pore
- powder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
- Y02T50/00—Aeronautics or air transport
- Y02T50/60—Efficient propulsion technologies, e.g. for aircraft
Landscapes
- Inorganic Compounds Of Heavy Metals (AREA)
- Physical Vapour Deposition (AREA)
Abstract
(57)【要約】
【課題】本発明の目的は、EB−PVD法によっても十
分に耐熱性及び耐衝撃性に優れている耐熱性被膜が形成
できる新規な被覆用蒸着材及びその蒸着材を使用する蒸
着方法を提供することにある。
【解決手段】安定化剤を含むジルコニアからなる焼結体
であり、単斜晶の含有率が25〜70%でかつ正方晶の
含有率が3%以下であり、残部が立方晶であり、また嵩
密度が3.0〜5.0g/cm3で、気孔率が15〜5
0%、気孔のモード径が0.5〜3μmでありかつ0.
1〜5μmの気孔体積が全気孔体積の90%以上を占め
ることを特徴とする蒸着材、及び、気孔径分布曲線の半
値範囲において、最大値が0.85μm以上であること
を特徴とする蒸着材、並びに、その蒸着材を使用する蒸
着方法。(57) Abstract: An object of the present invention is to provide a novel vapor deposition material for coating capable of forming a heat resistant film excellent in heat resistance and impact resistance even by the EB-PVD method, and a vapor deposition material for the same. It is to provide a vapor deposition method to be used. A sintered body made of zirconia containing a stabilizer, having a monoclinic content of 25 to 70%, a tetragonal content of 3% or less, and a balance of cubic, Further, the bulk density is 3.0 to 5.0 g / cm 3 and the porosity is 15 to 5
0%, the mode diameter of the pores is 0.5 to 3 μm and
A vapor deposition material characterized in that a pore volume of 1 to 5 μm occupies 90% or more of the total pore volume, and vapor deposition characterized in that a maximum value is 0.85 μm or more in a half value range of a pore diameter distribution curve. Material and a vapor deposition method using the vapor deposition material.
Description
【0001】[0001]
【発明の属する技術分野】本発明は、耐熱性及び耐衝撃
性に優れ、安定した溶融プールを形成し、蒸着を行うこ
とができる被覆用蒸着材に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an evaporation material for coating capable of forming a stable molten pool and having excellent heat resistance and impact resistance and capable of performing evaporation.
【0002】[0002]
【従来の技術】従来の耐熱性被膜の形成方法は、溶射法
が一般的であったが、最近の蒸着法の開発に伴ってPh
ysical Vapor Deposition法
(以下,PVD法と略す。)による耐熱性被膜の形成方
法が実用化された。中でもElectron−beam
を使用するEB−PVD法が注目され、文献(ADVA
NCED MATERIAL&PROCESS, Vo
l.140,No.6,No.12,p.18〜22
(1991))に記載されている様なEB−PVD法に
よる耐熱性被膜の形成方法が数多く開発されている。2. Description of the Related Art A conventional method of forming a heat-resistant film is generally a thermal spraying method.
A method for forming a heat-resistant film by a physical vapor deposition method (hereinafter abbreviated as PVD method) has been put to practical use. Among them, Electron-beam
Attention has been paid to the EB-PVD method using
NCED MATERIAL & PROCESS, Vo
l. 140, no. 6, No. 12, p. 18-22
(1991)), a number of methods for forming a heat-resistant film by the EB-PVD method have been developed.
【0003】上記のEB−PVD法による耐熱性被膜の
形成方法は、航空機エンジン等部品に対する耐熱被覆に
使用されている。この被覆材として使用される蒸着材
は、高温の燃焼ガスが直接当たる部分の部品に被覆され
るため、優れた耐熱性が必要であり、そのため融点が高
く高純度であることが必要であることが必要である。ま
た、金属部品との密着性、熱サイクルにより剥離しない
こと、燃焼ガスの成分により腐食しないこと、さらには
この被膜の目的である金属部品の耐久性を増すために熱
伝導度が低く、金属部品の表面温度の低下ができるだけ
大きくなることが望ましい。これらの要求を満たす材料
は現在迄数少なく、イットリアなどの安定化剤を含有し
たジルコニア粉末を成形した成形体を焼結して得られる
焼結体が主に使用されている。The above-mentioned method of forming a heat-resistant film by the EB-PVD method is used for heat-resistant coating on parts such as aircraft engines. The vapor deposition material used as the coating material is required to have excellent heat resistance because it is coated on parts where the high-temperature combustion gas is directly applied, and therefore it is necessary to have a high melting point and high purity. is necessary. In addition, it does not peel off due to adhesion to metal parts, does not peel off due to thermal cycling, does not corrode due to components of combustion gas, and has low thermal conductivity to increase the durability of metal parts, which is the purpose of this coating. It is desirable that the decrease in surface temperature be as large as possible. To date, few materials satisfy these requirements, and a sintered body obtained by sintering a molded body obtained by molding a zirconia powder containing a stabilizer such as yttria is mainly used.
【0004】この安定化剤を含有したジルコニア焼結体
から成る蒸着材は、融点が高く、更に高速で蒸着被膜を
形成する必要が有ることから、蒸着材を高エネルギーで
蒸発させることのできるエレクトロンビームを用いたE
B蒸着方法を用いて製膜に供せられる。[0004] The vapor deposition material made of a zirconia sintered body containing this stabilizer has a high melting point, and it is necessary to form a vapor deposition film at a high speed, so that an electron beam capable of evaporating the vapor deposition material with high energy. E using beam
The film is formed using a B vapor deposition method.
【0005】このEB蒸着法は、ルツボにセットされた
上記蒸着材に高エネルギーの電子ビームを急激に照射す
るため、通常の焼結体では熱衝撃により破壊を生じる。
この蒸着材に破壊が生じた場合、蒸着材の供給に支障を
きたすこととなり、電子ビームにより破損する蒸着材は
実用上使用に耐えないものである。In this EB vapor deposition method, a high energy electron beam is rapidly applied to the vapor deposition material set in a crucible, so that a normal sintered body is broken by thermal shock.
If the vapor deposition material is broken, the supply of the vapor deposition material is hindered, and the vapor deposition material damaged by the electron beam is not practically usable.
【0006】そこで、この電子ビームの衝撃による破壊
を解決する手段として、様々な特性を有する蒸着材が提
案されており、その中で、ある手法により多孔質化して
耐熱性及び耐熱衝撃性を向上させることが提案されてい
る。Therefore, as means for solving the destruction due to the impact of the electron beam, vapor deposition materials having various characteristics have been proposed. Among them, a porous material is made by a certain method to improve heat resistance and thermal shock resistance. It has been proposed to do so.
【0007】例えば、DE4302167C1に、Y2
O3を0.5〜25重量%含有し、密度3.0〜4.5
g/cm3 、単斜晶率5〜80%、残部が正方晶又は立
方晶であるジルコニア焼結体が記載されている。ジルコ
ニアが安定化されていない場合、蒸着材製造の熱処理の
際、高温では正方晶で安定であるが、降温時に正方晶か
ら単斜晶への相変化をおこし、この相変化にともなって
マイクロクラックが発生する。ここでは、この単斜晶の
存在に伴うマイクロクラックの存在により耐割れ性が向
上し、またある程度粒径を大きくすることによっても耐
割れ性が向上することが記載されている。[0007] For example, in DE4302167C1, Y 2
O 3 was contained 0.5 to 25 wt%, density 3.0 to 4.5
It describes a zirconia sintered body having a g / cm 3 , a monoclinic ratio of 5 to 80%, and a balance of tetragonal or cubic. If zirconia is not stabilized, during the heat treatment for vapor deposition material production, it is tetragonal and stable at high temperatures, but undergoes a phase change from tetragonal to monoclinic when the temperature drops, resulting in microcracking. Occurs. Here, it is described that the crack resistance is improved by the presence of the microcracks accompanying the presence of the monoclinic crystal, and the crack resistance is also improved by increasing the particle size to some extent.
【0008】しかしながら、このジルコニア焼結体を上
記用途に使用すると、耐熱性および耐熱衝撃性の向上が
不十分であり、高出力のEB照射による急加熱により、
割れが発生して長時間の定常作業が困難である。これは
単斜晶が存在しマイクロクラックにより亀裂の進展が抑
制される場合、又は、ある程度粒径を大きくした場合で
も、焼結助剤として働くY2O3との混合状態や気孔サイ
ズによってはEB照射時の急激な加熱により焼結が急激
に進行して焼結による収縮に伴う応力に耐えられず破壊
を生じてしまうことによると考えられる。However, when this zirconia sintered body is used in the above-mentioned applications, the heat resistance and the thermal shock resistance are insufficiently improved.
Cracks occur and long-term regular work is difficult. This is due to the presence of monoclinic crystals and the suppression of crack growth due to microcracks, or even when the particle size is increased to some extent, depending on the mixing state and pore size with Y 2 O 3 acting as a sintering aid. It is considered that sintering rapidly progresses due to rapid heating during EB irradiation, and the sintering cannot withstand the stress accompanying shrinkage due to sintering, resulting in destruction.
【0009】また、別のジルコニア焼結体として、特開
平7−82019に、純度99.8%以上、粒径0.1
〜10μmのジルコニア粒子と粒径1μm以下のイット
リア粒子を混合して、全体の70%以上が45〜300
μmの粒径となるように造粒し、熱処理を行い、球状集
合粉粒体全体の50%以上が45〜300μmとなるジ
ルコニア粉粒を焼結してなる焼結体であり、その焼結体
の気孔率が25〜50%で、かつ0.1〜5.0μmの
気孔径が全気孔の70%以上を占めるジルコニア質多孔
焼結体からなる耐熱被膜用蒸着材が提案されている。As another zirconia sintered body, Japanese Patent Application Laid-Open No. 7-82019 discloses that the purity is 99.8% or more and the particle size is 0.1.
A mixture of zirconia particles having a particle size of 10 μm to 10 μm and yttria particles having a particle size of 1 μm or less makes 70% or more of the mixture 45 to 300%
A sintered body obtained by granulating to a particle diameter of μm, performing heat treatment, and sintering zirconia particles in which 50% or more of the entire spherical aggregated particles have a diameter of 45 to 300 μm. A vapor deposition material for a heat-resistant coating comprising a zirconia porous sintered body having a porosity of 25 to 50% and a pore diameter of 0.1 to 5.0 μm occupying 70% or more of all pores has been proposed.
【0010】この方法において、従来の蒸着材よりもE
B照射による耐割れ性は改善されるが、上記の様に、こ
の蒸着材は、粒径が大きく異なる粉粒から構成されてい
るため、蒸着材の微細構造が不均一となり、蒸着を行う
ためEB照射により蒸着材を溶融させる際に、安定した
溶融プールを形成しにくく、製膜のための操作が困難に
なり、蒸着により形成される耐熱被膜の耐久性が劣ると
いう問題があった。In this method, E is higher than that of the conventional vapor deposition material.
Although the cracking resistance due to B irradiation is improved, as described above, since this vapor deposition material is composed of powder particles having greatly different particle diameters, the microstructure of the vapor deposition material becomes non-uniform, and vapor deposition is performed. When the vapor deposition material is melted by EB irradiation, it is difficult to form a stable molten pool, the operation for forming a film becomes difficult, and the durability of the heat-resistant film formed by vapor deposition is poor.
【0011】[0011]
【発明が解決しようとする課題】本発明の目的は、これ
ら従来の蒸着材が有する問題点であるEB照射時の耐熱
衝撃性の改善、EB照射により溶融した溶融液の突沸現
象の防止、安定した溶融プールの形成及び蒸発速度の安
定性を改善した新規被覆用蒸着材およびその蒸着材を使
用する蒸着方法を提供することにある。SUMMARY OF THE INVENTION An object of the present invention is to improve the thermal shock resistance during EB irradiation, which is a problem of these conventional vapor deposition materials, to prevent bumping of a molten liquid melted by EB irradiation, and to stabilize it. An object of the present invention is to provide a novel coating vapor deposition material having improved stability of the formation of a molten pool and the evaporation rate, and a vapor deposition method using the vapor deposition material.
【0012】[0012]
【課題を解決するための手段】本発明者らは、かかる課
題を解決するために鋭意検討した結果、本願発明を完成
するに至った。Means for Solving the Problems The present inventors have made intensive studies to solve the above problems, and as a result, completed the present invention.
【0013】すなわち、本願発明は、安定化剤を含むジ
ルコニアからなる焼結体であり、単斜晶の含有率が25
〜70%でかつ正方晶の含有率が3%以下であり、残部
が立方晶であり、また嵩密度が3.0〜5.0g/cm
3で、気孔率が15〜50%、気孔のモード径が0.5
〜3μmでありかつ0.1〜5μmの気孔体積が全気孔
体積の90%以上を占める蒸着材を使用するとEB照射
時に割れが生じないことを特徴とする新規な被覆用蒸着
材及びその蒸着材を使用する蒸着方法に関するものであ
る。That is, the present invention relates to a sintered body made of zirconia containing a stabilizer, wherein the monoclinic content is 25%.
-70% and the tetragonal content is 3% or less, the balance is cubic, and the bulk density is 3.0-5.0 g / cm.
3 , the porosity is 15 to 50% and the pore mode diameter is 0.5
Novel vapor deposition material for coating and a vapor deposition material characterized in that cracking does not occur during EB irradiation when a vapor deposition material having a pore volume of 3 to 3 μm and a pore volume of 0.1 to 5 μm occupies 90% or more of the total pore volume is used. The present invention relates to a vapor deposition method using
【0014】以下に本願発明の蒸着材の製造方法を説明
する。Hereinafter, a method for producing a deposition material according to the present invention will be described.
【0015】平均粒径が0.05μm〜10μmのジル
コニア粉末及び安定化剤を所定量調合した後、ボールミ
ルなどの混合装置で、水やエタノール等の有機溶媒を用
いて分散混合される。より粒径の大きい原料粉末を使用
する場合でも、ボールミル等により粉砕することによ
り、最終的に蒸着材の粒径が所定の範囲内になるなら
ば、当然用いることができる。混合の済んだスラリー
は、スプレードライヤー、減圧乾燥、フィルタープレス
等の通常の乾燥装置を使用することができる。また、ス
ラリー中の有機バインダーを添加し成形しやすくするこ
ともできる。After a predetermined amount of zirconia powder having an average particle size of 0.05 μm to 10 μm and a stabilizing agent are prepared, they are dispersed and mixed in a mixing device such as a ball mill using an organic solvent such as water or ethanol. Even when a raw material powder having a larger particle diameter is used, it can be used as long as the particle diameter of the deposition material finally falls within a predetermined range by pulverizing with a ball mill or the like. The mixed slurry can be used with a usual drying device such as a spray drier, vacuum drying, and filter press. Further, an organic binder in the slurry can be added to facilitate molding.
【0016】本願発明で言う安定化剤としては、イット
リア、酸化マグネシウム、酸化カルシウム、酸化スカン
ジウム、 IIIA族第6周期希土類金属酸化物(ランタ
ン、セリウム、プラセオジム、ネオジム、プロメチウ
ム、サマリウム、ユーロピウム、カドリニウム、テルビ
ミウム、ジスプロシウム、ホルミウム、エルビミウム、
ツリウム、イッテルビウム、ルテチウム)が例示され、
これらの安定化剤は単独で使用しても、2種以上の安定
化剤を使用してもよい。安定化剤はその用途に応じて
0.1〜40wt%添加する。Examples of the stabilizer referred to in the present invention include yttria, magnesium oxide, calcium oxide, scandium oxide, Group 6A rare earth metal oxides of lanthanum, cerium, praseodymium, neodymium, promethium, samarium, europium, cadolinium, Terbium, dysprosium, holmium, erbium,
Thulium, ytterbium, lutetium)
These stabilizers may be used alone, or two or more stabilizers may be used. The stabilizer is added in an amount of 0.1 to 40% by weight depending on the use.
【0017】安定化剤はその一部又は全部がジルコニア
に固溶しているが、完全に均一に固溶している場合、加
熱時に結晶粒子径が大きくなりすぎて耐熱衝撃性を損な
うので好ましくない。例えば、7.1wt%のY2O3を
添加したジルコニア焼結体の場合、EPMAにより1試
料について20ポイントをランダムにスポット分析を行
い、各点での安定化剤組成のwt%での仕込み組成から
のずれの標準偏差をとった際に、この数値が0.45以
上が好ましく、0.55以上がさらに好ましい。この数
値が小さい場合、即ち、安定化剤の固溶が均一である場
合、EB照射時の耐熱衝撃性が低く実用に供することが
できない。The stabilizer is partly or wholly dissolved in zirconia. However, if the stabilizer is completely and uniformly dissolved, the crystal particle diameter becomes too large upon heating, which impairs the thermal shock resistance. Absent. For example, in the case of a zirconia sintered body to which 7.1 wt% of Y 2 O 3 is added, spot analysis is performed at random on 20 points for one sample by EPMA, and the stabilizer composition at each point is charged in wt%. When the standard deviation of the deviation from the composition is taken, this value is preferably 0.45 or more, more preferably 0.55 or more. When this value is small, that is, when the solid solution of the stabilizer is uniform, the thermal shock resistance at the time of EB irradiation is low and cannot be put to practical use.
【0018】本願発明の成形体を得るために調製された
ジルコニア粉末及び安定化剤を含んだ粉末は、通常ゴム
型等に充填し、冷間静水圧成形(CIP)装置を使用
し、成形される。成形圧は本願発明では特に限定されな
い。The zirconia powder and the powder containing the stabilizer prepared to obtain the molded article of the present invention are usually filled in a rubber mold or the like, and molded using a cold isostatic pressing (CIP) apparatus. You. The molding pressure is not particularly limited in the present invention.
【0019】このようにして成形された成形体は通常熱
処理が行われる。この熱処理温度はバインダーや吸着物
が取り除かれる温度以上であれば特に限定されないが、
通常は1000℃以上で焼成することが好ましく、14
00℃以上で焼成することがより好ましい。本願発明の
熱処理前の成形体はそれ自身加熱による収縮が小さく、
1450℃で焼成した場合でも最大10%程度の収縮率
である。収縮率が小さくとも、1000℃程度の温度域
から収縮が起こる場合、EB照射時の加熱で焼結が進行
する領域がより大きくなり、それに伴い応力の発生範囲
も広がるため割れが起こりやすくなることから、この焼
成は電子ビームによる加熱時の焼結進行による収縮を減
らし、割れの抑制に効果がある。The molded body thus formed is usually subjected to a heat treatment. The heat treatment temperature is not particularly limited as long as it is equal to or higher than the temperature at which the binder and the adsorbed material are removed,
Usually, it is preferable to bake at 1000 ° C. or more.
It is more preferable to fire at a temperature of 00 ° C. or higher. The compact before heat treatment of the present invention has a small shrinkage due to heating itself,
Even when fired at 1450 ° C., the shrinkage rate is about 10% at the maximum. Even if the shrinkage rate is small, if shrinkage occurs from a temperature range of about 1000 ° C., the area where sintering proceeds by heating during EB irradiation becomes larger, and the range of stress generation also increases with the shrinkage. Therefore, this firing is effective in reducing shrinkage due to the progress of sintering during heating by the electron beam and suppressing cracking.
【0020】更に本発明を詳細に説明する。本発明の蒸
着材は主として安定化剤を含むジルコニアからなる焼結
体で構成され、焼結体の結晶相は単斜晶の含有比率が2
5〜70%でかつ、正方晶の含有比率が3%以下で、残
部が立方晶である。単斜晶率が25%未満の場合、熱膨
張及び結晶粒子径が大きくなり過ぎて耐熱衝撃性が損な
われ好ましくない。一方、単斜晶率が70%を超える場
合、相転移に伴う亀裂の発生が多くなり、割れが生じた
り、強度が著しく低下するために好ましくない。この単
斜晶率は、30%〜60%が、耐熱衝撃性の維持及び相
転移に伴う亀裂の抑制の面から好ましい。即ち、単斜晶
は成形体の1000℃以上の温度での焼結時に、正方晶
へ相転移を起こし、この時に体積が約4%減少するた
め、熱膨張による体積膨脹を打ち消し、耐熱衝撃性を高
め、また、単斜晶の存在は焼結体中に多くのマイクロク
ラックを生成させ、このマイクロクラックは亀裂の成長
を抑制する効果を持つ。以上のように、単斜晶の存在は
耐熱衝撃性の向上に寄与する。The present invention will be described in more detail. The vapor deposition material of the present invention is mainly composed of a sintered body made of zirconia containing a stabilizer, and the crystal phase of the sintered body has a monoclinic content ratio of 2%.
5 to 70%, the content of tetragonal crystal is 3% or less, and the remainder is cubic. When the monoclinic ratio is less than 25%, the thermal expansion and the crystal particle diameter become too large, and the thermal shock resistance is impaired, which is not preferable. On the other hand, when the monoclinic crystal ratio exceeds 70%, cracks are often generated due to the phase transition, cracks are generated, and the strength is unpreferably reduced. The monoclinic ratio is preferably from 30% to 60% from the viewpoint of maintaining thermal shock resistance and suppressing cracks accompanying phase transition. That is, the monoclinic phase undergoes a phase transition to a tetragonal phase during sintering of the compact at a temperature of 1000 ° C. or more, and at this time, the volume is reduced by about 4%. And the presence of monoclinic crystals produces many microcracks in the sintered body, and these microcracks have an effect of suppressing crack growth. As described above, the presence of the monoclinic contributes to an improvement in thermal shock resistance.
【0021】正方晶は3%以下であり、実質上0%であ
るのが好ましい。その理由は、正方晶が多くなると、安
定化剤のジルコニアへの固溶が進んでおり、蒸着材の組
成が均一であり、このような場合、EB照射の加熱によ
り結晶粒子が大きくなりすぎ耐熱衝撃性が低下して好ま
しくないからである。The tetragonal content is less than 3%, preferably substantially 0%. The reason is that, when the number of tetragonal crystals increases, the solid solution of the stabilizer in zirconia advances, and the composition of the vapor deposition material is uniform. This is because the impact strength is undesirably reduced.
【0022】また、嵩密度は3.0〜5.0g/cm3
であるが、その理由は、この嵩密度が5.0g/cm3
を超える場合、EB照射時の局部的な加熱により熱応力
により破壊が生じるので好ましくなく、一方、嵩密度が
3.0g/cm3未満の場合、機械的強度が低下して取
扱いが困難となり好ましくないからである。The bulk density is 3.0 to 5.0 g / cm 3.
The reason is that the bulk density is 5.0 g / cm 3
If the bulk density is more than 3.0 g / cm 3 , it is not preferable because the local stress during EB irradiation causes breakage due to thermal stress. On the other hand, if the bulk density is less than 3.0 g / cm 3 , the mechanical strength decreases and handling becomes difficult. Because there is no.
【0023】その気孔率は15〜50%であり、かつ
0.1〜5μmの気孔体積が全気孔体積の90%以上を
占めることを特徴とし、95%以上にすることが好まし
い。気孔率を15〜50%に限定する理由は、気孔率が
15%未満の場合、EB照射時の局部的な加熱膨脹によ
る熱応力により破壊が生じるため好ましくなく、逆に、
気孔率が50%をこえる場合、機械的強度が低下して取
り扱いが困難となり好ましくないからである。また、
0.1〜5μmの気孔径の気孔体積が90%未満になる
と耐熱衝撃性が不十分なものとなり好ましくない。The porosity is 15 to 50%, and the pore volume of 0.1 to 5 μm occupies 90% or more of the total pore volume, preferably 95% or more. The reason for limiting the porosity to 15% to 50% is that if the porosity is less than 15%, it is not preferable because breakage occurs due to thermal stress due to local thermal expansion during EB irradiation.
If the porosity exceeds 50%, the mechanical strength is reduced and handling becomes difficult, which is not preferable. Also,
When the pore volume of the pore diameter of 0.1 to 5 μm is less than 90%, the thermal shock resistance becomes insufficient, which is not preferable.
【0024】気孔の分布は、気孔モード径が0.5〜3
μmの範囲にある必要がある。この理由は、気孔モード
径が0.5μmより小さく、小さい気孔の量が多くなる
と、EB照射時の加熱により気孔は焼結の進行により消
滅してしまい、多孔質化の機能が消失してしまうからで
あり、逆に、気孔モード径が3μmを超える場合は、大
きい気孔の量が多いため、蒸着材の機械的強度の低下
や、蒸着材の溶融プールの安定性が損なわれるからであ
る。The pore distribution is such that the pore mode diameter is 0.5-3.
It must be in the range of μm. The reason for this is that if the pore mode diameter is smaller than 0.5 μm and the amount of small pores increases, the pores disappear due to the progress of sintering due to heating during EB irradiation, and the function of making porous is lost. Conversely, when the pore mode diameter exceeds 3 μm, the amount of large pores is large, so that the mechanical strength of the vapor deposition material is reduced and the stability of the molten pool of the vapor deposition material is impaired.
【0025】また、図1で示されている気孔径の分布曲
線の半値範囲(C−D)において、最大値(D)が0.
85μm以上であることが好ましい。その理由は、その
最大値が0.85μm未満であると、気孔径0.1〜5
μmの気孔体積が全気孔体積の90%以上を占めていて
も、全体として径の小さい気孔の量が多くなり、EB蒸
着時の加熱の際に気孔が消滅しやすく、耐熱衝撃性が不
十分なものとなる。In the half-value range (CD) of the pore diameter distribution curve shown in FIG.
It is preferably at least 85 μm. The reason is that if the maximum value is less than 0.85 μm, the pore diameter is 0.1 to 5 μm.
Even if the pore volume of μm occupies 90% or more of the total pore volume, the amount of pores having a small diameter increases as a whole, and the pores are easily extinguished during heating during EB deposition, and the thermal shock resistance is insufficient. It becomes something.
【0026】また、粒子の粒径は10μm以下であり、
20μm以上の凝集粒子を含まないことが好ましい。粒
子の粒径が10μmを越えたり、また20μm以上の凝
集粒子を含む場合、EB照射して蒸着材の溶融させて溶
融プールを形成する際に、部分的に溶融しにくくなり、
均一で安定した溶融プールの形成が困難となり、蒸着の
ための操作が難しくなりかつ蒸着により形成される耐熱
被膜の質が低下して耐久性が低くなる。The particle size is 10 μm or less,
Preferably, it does not contain aggregated particles of 20 μm or more. If the particle size exceeds 10 μm or contains aggregated particles of 20 μm or more, it becomes difficult to partially melt when forming a molten pool by EB irradiation and melting the deposition material,
It becomes difficult to form a uniform and stable molten pool, the operation for vapor deposition becomes difficult, and the quality of the heat-resistant coating formed by vapor deposition deteriorates, and the durability decreases.
【0027】また、たとえば1400℃で焼結を行った
場合、粒成長が起こって蒸着材の粒径が原料粉末の粒径
より大きくなるが、このような場合でも蒸着材の粒径が
10μm以下であることが好ましい。また、分散混合が
不十分であることや、分散媒中での原料粉末の凝集など
により蒸着材中に20μm以上の凝集粒子を含まないこ
とが好ましい。ここで言う蒸着材中の凝集粒子とは、粒
子どうしが緻密に集合したもので、その凝集粒子の有無
は走査型電子顕微鏡により明確に確認することが可能で
ある。In the case of sintering at 1400 ° C., for example, grain growth occurs and the particle diameter of the vapor deposition material becomes larger than the particle diameter of the raw material powder. In such a case, the particle diameter of the vapor deposition material is 10 μm or less. It is preferred that Further, it is preferable that the vapor deposition material does not contain aggregated particles having a size of 20 μm or more due to insufficient dispersion and mixing or aggregation of the raw material powder in the dispersion medium. The agglomerated particles in the deposition material referred to here are densely aggregated particles, and the presence or absence of the agglomerated particles can be clearly confirmed by a scanning electron microscope.
【0028】また、更に本願発明は、電子ビーム蒸着装
置により、本願発明の蒸着材を使用して、金属、セラミ
ックス等の基板上にジルコニア薄膜を形成する方法及び
この方法によって得られた金属等の部品を提供するもの
である。The present invention further provides a method of forming a zirconia thin film on a substrate of metal, ceramics or the like using an evaporation material of the present invention by an electron beam evaporation apparatus, and a method of forming a metal or the like obtained by this method. Provide parts.
【0029】上記で説明したように、蒸着材が望ましい
範囲の物性をもつように、原料粉末の物性や混合条件を
選定し、得られた混合粉末を成形、焼成することにより
EB照射時に割れが生じず、安定して蒸着を行うことが
できる新規な耐熱被覆用蒸着材を作製することができ
る。As described above, the physical properties and mixing conditions of the raw material powder are selected so that the vapor-deposited material has the desired range of physical properties, and the obtained mixed powder is molded and fired to prevent cracking during EB irradiation. It is possible to produce a novel heat-resistant coating material capable of performing stable vapor deposition without generation.
【0030】また、更に本願発明は、その被覆用蒸着材
を使用し電子ビーム等のエネルギービーム照射型蒸着方
法により所望の基材に蒸着する方法をも包含するもので
ある。Further, the present invention also includes a method of using the vapor deposition material for coating to vapor-deposit on a desired substrate by an energy beam irradiation type vapor deposition method such as an electron beam.
【0031】[0031]
【実施例】以下の実施例により本発明を具体的に説明す
るが、本発明はこれらの実施例により何等限定されるも
のでない。The present invention will be described in more detail with reference to the following examples, but the present invention is not limited to these examples.
【0032】実施例1 平均粒径0.5μmのジルコニア粉末83.6gと平均
粒径0.2μmのイットリア粉末6.4gに有機バイン
ダーを5wt%(10g)を加えて、ボールミル(容
積:1リットル、ボール:2.5kg)で1時間混合
後、乾燥して得られた粉末をゴム型に詰めて(直径35
mm,厚さ100mm)、湿式冷間静水圧加圧装置(神
戸製鋼社製、4KB×150D×500L型)により圧
力1トン/cm2で成形し、1420℃で焼結して蒸着
材を作製した。Example 1 An organic binder was added to 83.6 g of zirconia powder having an average particle size of 0.5 μm and 6.4 g of yttria powder having an average particle size of 0.2 μm, and 5 wt% (10 g) of an organic binder was added thereto. , Balls: 2.5 kg) for 1 hour, and then dried. The powder obtained was packed in a rubber mold (diameter 35).
mm, thickness 100 mm), molded at a pressure of 1 ton / cm 2 by a wet cold isostatic pressing device (manufactured by Kobe Steel, 4 KB × 150 D × 500 L), and sintered at 1420 ° C. to produce a vapor deposition material. did.
【0033】実施例2 平均粒径0.8μmのジルコニア粉末83.6gと平均
粒径0.2μmのイットリア粉末6.4gに有機バイン
ダーを5wt%(10g)を加えて、ボールミル(容
積:1リットル、ボール:2.5kg)で1時間混合
後、乾燥して得られて粉末をゴム型に詰めて(直径35
mm,厚さ100mm)、湿式冷間静水圧加圧装置(神
戸製鋼社製、4KB×150D×500L型)により圧
力1トン/cm2で成形し、1420℃で焼結して蒸着
材を作製した。Example 2 An organic binder was added to 83.6 g of zirconia powder having an average particle diameter of 0.8 μm and 6.4 g of yttria powder having an average particle diameter of 0.2 μm, and 5 wt% (10 g) was added to a ball mill (volume: 1 liter). , Ball: 2.5 kg) for 1 hour, and then dried. The powder obtained was packed in a rubber mold (diameter 35).
mm, thickness 100 mm), molded at a pressure of 1 ton / cm 2 by a wet cold isostatic pressing device (manufactured by Kobe Steel, 4 KB × 150 D × 500 L), and sintered at 1420 ° C. to produce a vapor deposition material. did.
【0034】実施例3 平均粒径1.5μmのジルコニア粉末83.6gと平均
粒径0.2μmのイットリア粉末6.4gに有機バイン
ダーを5wt%(10g)を加えて、ボールミル(容
積:1リットル、ボール:2.5kg)で1時間混合
後、乾燥して得られて粉末をゴム型に詰めて(直径35
mm,厚さ100mm)、湿式冷間静水圧加圧装置(神
戸製鋼社製、4KB×150D×500L型)により圧
力1トン/cm2で成形し、1630℃で焼結して蒸着
材を作製した。Example 3 An organic binder was added to 83.6 g of zirconia powder having an average particle size of 1.5 μm and 6.4 g of yttria powder having an average particle size of 0.2 μm, and 5 wt% (10 g) was added to a ball mill (volume: 1 liter). , Ball: 2.5 kg) for 1 hour, and then dried. The powder obtained was packed in a rubber mold (diameter 35).
mm, thickness 100 mm), molded at a pressure of 1 ton / cm 2 by a wet cold isostatic pressing device (manufactured by Kobe Steel, 4 KB × 150 D × 500 L), and sintered at 1630 ° C. to produce a vapor deposition material did.
【0035】実施例4 平均粒径5μmのジルコニア粉末1393.6gと平均
粒径2μmのイットリア粉末106.4gを加えて、ボ
ールミル(容積:2.5リットル、ボール:7.5k
g)で1時間混合後、乾燥して得られて粉末をゴム型に
詰めて(直径35mm,厚さ100mm)、湿式冷間静
水圧加圧装置(神戸製鋼社製、4KB×150D×50
0L型)により圧力1トン/cm2で成形し、1490
℃で焼結して蒸着材を作製した。Example 4 1393.6 g of zirconia powder having an average particle diameter of 5 μm and 106.4 g of yttria powder having an average particle diameter of 2 μm were added to a ball mill (volume: 2.5 liter, ball: 7.5 k).
g) for 1 hour, dried, and the powder obtained was packed in a rubber mold (diameter 35 mm, thickness 100 mm), and wet cold isostatic pressing device (Kobe Steel, 4 KB × 150 D × 50).
0L type) at a pressure of 1 ton / cm 2 and 1490
Sintering was carried out at ℃ to produce a deposition material.
【0036】比較例1 平均粒径0.8μmのジルコニア粉末83.6gと平均
粒径0.2μmのイットリア粉末6.4gに有機バイン
ダーを5wt%(10g)を加えて、ボールミル(容
積:1リットル、ボール:2.5kg)で16時間混合
後、乾燥して得られて粉末をゴム型に詰めて(直径35
mm,厚さ100mm)、湿式冷間静水圧加圧装置(神
戸製鋼社製、4KB×150D×500L型)により圧
力1トン/cm2で成形し、1350℃で焼結して蒸着
材を作製した。Comparative Example 1 An organic binder was added to 83.6 g of zirconia powder having an average particle diameter of 0.8 μm and 6.4 g of yttria powder having an average particle diameter of 0.2 μm, and 5 wt% (10 g) was added to a ball mill (volume: 1 liter). , Ball: 2.5 kg) for 16 hours, and then dried. The powder obtained was packed in a rubber mold (diameter 35).
mm, thickness 100 mm), molded at a pressure of 1 ton / cm 2 with a wet cold isostatic pressing device (manufactured by Kobe Steel, 4 KB × 150 D × 500 L type), and sintered at 1350 ° C. to produce a deposition material did.
【0037】比較例2 平均粒径1.5μmのジルコニア粉末83.6gと平均
粒径0.2μmのイットリア粉末6.4gに有機バイン
ダーを5wt%(10g)を加えて、ボールミル(容
積:1リットル、ボール:2.5kg)で1時間混合
後、乾燥して得られて粉末をゴム型に詰めて(直径35
mm,厚さ100mm)、湿式冷間静水圧加圧装置(神
戸製鋼社製、4KB×150D×500L型)により圧
力1トン/cm2で成形し、1350℃で焼結して蒸着
材を作製した。COMPARATIVE EXAMPLE 2 5 wt% (10 g) of an organic binder was added to 83.6 g of zirconia powder having an average particle size of 1.5 μm and 6.4 g of yttria powder having an average particle size of 0.2 μm. , Ball: 2.5 kg) for 1 hour, and then dried. The powder obtained was packed in a rubber mold (diameter 35).
mm, thickness 100 mm), molded at a pressure of 1 ton / cm 2 with a wet cold isostatic pressing device (manufactured by Kobe Steel, 4 KB × 150 D × 500 L type), and sintered at 1350 ° C. to produce a deposition material did.
【0038】比較例3 平均粒径0.2μmの4モル%のイットリアが固溶して
いるジルコニア粉末100gをゴム型に詰めて(直径3
5mm,厚さ100mm)、湿式冷間静水圧加圧装置
(神戸製鋼社製、4KB×150D×500L型)によ
り圧力1トン/cm2で成形し、1350℃で焼結して
蒸着材を作製した。Comparative Example 3 A rubber mold was filled with 100 g of zirconia powder in which 4 mol% of yttria having an average particle size of 0.2 μm was dissolved in solid form (diameter 3).
5 mm, thickness 100 mm), molded at a pressure of 1 ton / cm 2 with a wet cold isostatic press (Kobe Steel, 4 KB × 150 D × 500 L type), and sintered at 1350 ° C. to produce a deposition material did.
【0039】比較例4 平均粒径0.2μmの4モル%のイットリアが固溶して
いるジルコニア粉末を平均粒径100μmの顆粒に造粒
し、これを1200℃で仮焼した後、この粉末95gに
有機バインダー5gを加え、ボールミル(容積:1リッ
トル、ボール:2.5kg)で1時間粉砕混合し、乾燥
して得られた粉末をゴム型に詰めて(直径35mm,厚
さ100mm)、湿式冷間静水圧加圧装置(神戸製鋼社
製、4KB×150D×500L型)により圧力1トン
/cm2で成形し、1350℃で焼結して蒸着材を作製
した。Comparative Example 4 Zirconia powder in which 4 mol% of yttria having an average particle diameter of 0.2 μm was dissolved in solid form was granulated into granules having an average particle diameter of 100 μm, which was calcined at 1200 ° C. 5 g of an organic binder was added to 95 g, and the mixture was pulverized and mixed in a ball mill (volume: 1 liter, balls: 2.5 kg) for 1 hour, and the powder obtained by drying was packed in a rubber mold (diameter 35 mm, thickness 100 mm). It was molded at a pressure of 1 ton / cm 2 by a wet cold isostatic press (manufactured by Kobe Steel Co., Ltd., 4 KB × 150 D × 500 L), and sintered at 1350 ° C. to produce a deposition material.
【0040】実施例1〜4及び比較例1〜4で得られた
蒸着材の気孔率(%)、気孔のモード径(μm)、0.
1〜5μmの気孔径分布(%)、気孔径分布曲線の半値
範囲(μm)、単斜晶率(%)及び正方晶率(%)を以
下の表1に示す。The porosity (%), the mode diameter of pores (μm), and the porosity of the vapor deposition material obtained in Examples 1 to 4 and Comparative Examples 1 to 4.
Table 1 below shows the pore diameter distribution (%) of 1 to 5 μm, the half value range (μm) of the pore diameter distribution curve, the monoclinic crystal ratio (%), and the tetragonal crystal ratio (%).
【0041】[0041]
【表1】 [Table 1]
【0042】表1に示された蒸着材の各物性値は、以下
に示す方法により求めた。Each physical property value of the vapor deposition material shown in Table 1 was determined by the following method.
【0043】嵩密度:蒸着材の嵩密度は、円柱状をした
試料を電子天秤で測定した重量とマイクロメーターで測
定した形状寸法から算出した。Bulk density: The bulk density of the vapor deposition material was calculated from the weight of a cylindrical sample measured by an electronic balance and the shape and dimensions measured by a micrometer.
【0044】気孔率、気孔径分布、気孔モード径、気孔
体積、気孔径分布の半値範囲及びその最大値:水銀ポロ
シメーター(ポアサイザ:島津製作所社製、MIC−9
320型)により測定した。Porosity, pore diameter distribution, pore mode diameter, pore volume, half-value range of pore diameter distribution and its maximum value: mercury porosimeter (pore sizer: MIC-9, manufactured by Shimadzu Corporation)
320 type).
【0045】水銀ポロシメーターで得られる測定値は、
水銀に圧力を掛けて気孔を有するサンプル中に水銀を圧
入し、圧力と侵入した水銀の積算容積の関係から得られ
る。すなわち、ある直径を有する気孔に水銀が入るため
の圧力は、Washburnの方程式があり、この式を
用いることにより、圧入圧力と侵入した水銀の積算容積
の関係が気孔の直径とその直径よりも大きな直径を有す
る気孔に侵入した水銀の容積の関係として求めることが
できる。そして、この侵入した水銀の容積は水銀の密度
で除することにより、その気孔径よりも大きな気孔の容
積を示す。The measurements obtained with the mercury porosimeter are:
It is obtained by applying pressure to mercury and injecting mercury into a sample having pores, and obtaining a relationship between the pressure and the integrated volume of mercury that has entered. That is, the pressure for mercury to enter a pore having a certain diameter has a Washburn equation, and by using this equation, the relationship between the injection pressure and the integrated volume of mercury that has penetrated is larger than the diameter of the pore and its diameter. It can be obtained as a relation of the volume of mercury that has entered pores having a diameter. Then, the volume of the intruded mercury is divided by the density of the mercury to show a pore volume larger than the pore diameter.
【0046】この気孔径と気孔容積の関係は通常、水銀
の表面張力、接触角や測定装置の構造からくる水銀頭な
どの必要な補正がなされる。The relationship between the pore diameter and the pore volume is usually corrected as necessary, for example, the surface tension of mercury, the contact angle, and the mercury head coming from the structure of the measuring device.
【0047】水銀ポロシメーターで得られた気孔径と気
孔の積算容積の関係から以下の価が求められる。更に、
以下測定値の説明の中で使用したAからDの意味を図1
中に説明した。The following values are determined from the relationship between the pore diameter obtained by the mercury porosimeter and the cumulative volume of the pores. Furthermore,
The meaning of A to D used in the description of the measured values is shown in FIG.
Explained inside.
【0048】気孔率(%) :(得られた全気孔容積/
サンプルの見掛け容積)×100% 気孔モード径(B):気孔径と積算気孔容積の関係の変
化率(微分値)の曲線(A)、すなわち、気孔径分布曲
線(A)における最大ピーク値に相当する気孔径(B) 気孔径分布と半値範囲(C〜D)及びその最大値
(D):図1に示した気孔径分布曲線(A)のピーク高
さの1/2の気孔径のピーク幅を気孔径分布の半値範囲
(C〜D)とする。また、半値範囲の大きい方の気孔径
を最大値(D)とする。Porosity (%): (Total pore volume obtained /
Apparent volume of sample) × 100% Pore mode diameter (B): Curve (A) of change rate (differential value) of relationship between pore diameter and integrated pore volume, ie, maximum peak value in pore diameter distribution curve (A) Corresponding pore diameter (B) Pore diameter distribution and half-value range (C to D) and its maximum value (D): the pore diameter of half the peak height of the pore diameter distribution curve (A) shown in FIG. The peak width is defined as a half value range (C to D) of the pore diameter distribution. Further, the pore diameter of the larger half value range is defined as the maximum value (D).
【0049】平均粒子径:粉末の平均粒子径の測定は、
粉末をあらかじめ成形した後、平面を出した面を走査型
電子顕微鏡を観察し、インタセプト法により求めた。Average particle size: The average particle size of the powder is measured as follows:
After the powder was preliminarily molded, the surface of the flat surface was observed with a scanning electron microscope and determined by an intercept method.
【0050】蒸着材の場合も、同様に平面をだした後、
平面を走査型電子顕微鏡を観察し、インタセプト法によ
り求めた。Similarly, in the case of a vapor deposition material, after a flat surface is formed,
The plane was observed with a scanning electron microscope and determined by the intercept method.
【0051】単斜晶率及び正方晶率は、X線回折機(マ
ックサイエンス社製、M×p3 VA型)により、回折ピ
ークを得て、以下の計算式、数1及び数2により求め
た。The monoclinic crystal ratio and the tetragonal crystal ratio were obtained by obtaining a diffraction peak with an X-ray diffractometer (manufactured by Mac Science Co., Ltd., M × p 3 VA type) and using the following formulas and formulas 1 and 2. Was.
【0052】[0052]
【数1】 (Equation 1)
【0053】[0053]
【数2】 (Equation 2)
【0054】また、EB出力0.27kw及び5kwの
2種類のEBで照射試験(EB照射試験1、測定条件:
加速電圧9kV、電流30mA、減圧1〜2×10-5T
orr,EB照射試験2、測定条件:加速電圧5kV、
電流1A)を行い蒸着材の亀裂の発生の有無を検討し
た。その結果を表1に示した。また出力5kwのEBで
蒸着材の溶融状態を検討した。その結果も表1に示し
た。Further, an irradiation test (EB irradiation test 1, measurement conditions: EB output: 0.27 kW and 5 kW) was performed with two types of EBs.
Acceleration voltage 9 kV, current 30 mA, reduced pressure 1-2 × 10 -5 T
orr, EB irradiation test 2, measurement condition: acceleration voltage 5 kV,
An electric current of 1 A) was performed to examine the occurrence of cracks in the vapor deposition material. The results are shown in Table 1. Further, the molten state of the vapor deposition material was examined with the EB having an output of 5 kW. The results are also shown in Table 1.
【0055】[0055]
【発明の効果】本発明の方法により、EB照射によって
も割れの生じない被覆用蒸着材が得られ、この蒸着材
は、例えば、航空機エンジン等部品に対する耐熱被覆に
使用される。According to the method of the present invention, a coating vapor deposition material which does not crack even by EB irradiation can be obtained, and this vapor deposition material is used for heat-resistant coating on components such as aircraft engines.
【図1】気孔径分布曲線の半値範囲を得る方法を示す図
である。FIG. 1 is a diagram showing a method for obtaining a half-value range of a pore diameter distribution curve.
A:気孔径分布曲線 B:モード径 C:半値の最小値 D:半値の最大値 CからD:半値範囲 h:ピークの高さ 1/2h:ピークの高さの1/2 A: pore diameter distribution curve B: mode diameter C: minimum value of half value D: maximum value of half value C to D: half value range h: peak height 1 / 2h: peak height 1/2
Claims (6)
であり、単斜晶の含有率が25〜70%でかつ正方晶の
含有率が3%以下であり、残部が立方晶であり、また嵩
密度が3.0〜5.0g/cm3で、気孔率が15〜5
0%、気孔のモード径が0.5〜3μmでありかつ0.
1〜5μmの気孔体積が全気孔体積の90%以上を占め
ることを特徴とする蒸着材。1. A sintered body made of zirconia containing a stabilizer, having a monoclinic content of 25 to 70%, a tetragonal content of not more than 3%, and a balance of cubic. And a bulk density of 3.0 to 5.0 g / cm 3 and a porosity of 15 to 5
0%, the mode diameter of the pores is 0.5 to 3 μm and
A vapor deposition material, wherein a pore volume of 1 to 5 μm occupies 90% or more of the total pore volume.
分布曲線の半値範囲において、最大値が0.85μm以
上であることを特徴とする蒸着材。2. The vapor deposition material according to claim 1, wherein the maximum value is 0.85 μm or more in the half value range of the pore diameter distribution curve.
いて、正方晶の含有率が実質0%であることを特徴とす
る蒸着材。3. The deposition material according to claim 1, wherein the content of the tetragonal crystal is substantially 0%.
子の粒径が10μm以下であり、20μm以上の凝集粒
子を含まないことを特徴とする蒸着材。4. The vapor deposition material according to claim 1, wherein the particle diameter of the particles is 10 μm or less and no aggregated particles of 20 μm or more are included.
着方法。5. A vapor deposition method using the vapor deposition material according to claim 1.
方法がエレクトロンビーム照射型蒸着方法であることを
特徴とする蒸着方法。6. The vapor deposition method according to claim 5, wherein the vapor deposition method is an electron beam irradiation type vapor deposition method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9157062A JPH1081957A (en) | 1996-06-13 | 1997-06-13 | Evaporation material |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8-152499 | 1996-06-13 | ||
| JP15249996 | 1996-06-13 | ||
| JP9157062A JPH1081957A (en) | 1996-06-13 | 1997-06-13 | Evaporation material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH1081957A true JPH1081957A (en) | 1998-03-31 |
Family
ID=26481404
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9157062A Pending JPH1081957A (en) | 1996-06-13 | 1997-06-13 | Evaporation material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH1081957A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005133210A (en) * | 2003-10-09 | 2005-05-26 | Snecma Moteurs | Target that evaporates upon receiving an electron beam, method for manufacturing the same, heat shield and coating obtained from the target, and mechanical component including the coating |
| JP2011214135A (en) * | 2010-03-15 | 2011-10-27 | Mitsubishi Materials Corp | Vapor deposition material for forming thin film, thin film sheet having the thin film, and laminated sheet |
| KR101113157B1 (en) | 2010-01-29 | 2012-02-13 | 한국원자력연구원 | Molding method of zirconium oxide powder using magnetic pulse compression molding apparatus and zirconium oxide molded sintered body manufactured thereby |
| US20220212999A1 (en) * | 2019-04-25 | 2022-07-07 | Tosoh Corporation | Sintered body, powder and method for producing the same |
-
1997
- 1997-06-13 JP JP9157062A patent/JPH1081957A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005133210A (en) * | 2003-10-09 | 2005-05-26 | Snecma Moteurs | Target that evaporates upon receiving an electron beam, method for manufacturing the same, heat shield and coating obtained from the target, and mechanical component including the coating |
| JP2010209472A (en) * | 2003-10-09 | 2010-09-24 | Snecma | Target for vaporizing under electron beam, method for manufacturing the same, thermal barrier material and coating obtained from the target, and mechanical parts including the coating |
| KR101113157B1 (en) | 2010-01-29 | 2012-02-13 | 한국원자력연구원 | Molding method of zirconium oxide powder using magnetic pulse compression molding apparatus and zirconium oxide molded sintered body manufactured thereby |
| JP2011214135A (en) * | 2010-03-15 | 2011-10-27 | Mitsubishi Materials Corp | Vapor deposition material for forming thin film, thin film sheet having the thin film, and laminated sheet |
| US20220212999A1 (en) * | 2019-04-25 | 2022-07-07 | Tosoh Corporation | Sintered body, powder and method for producing the same |
| US12391621B2 (en) * | 2019-04-25 | 2025-08-19 | Tosoh Corporation | Sintered body, powder and method for producing the same |
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