JPH10300921A - Black matrix production method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To produce a black matrix substrate for a color filter which has high resolution and has little residue after alkali development. SOLUTION: A black pigment, a copolymer having a carboxyl group, a photopolymerizable monomer, and a photopolymerization starter are exposed when a coating film formed from a black resist is exposed and developed with an alkali developer to produce a black matrix substrate. A resist containing an agent, and selecting a combination of a resist and an alkaline developer exhibiting development characteristics such that the maximum diameter of particles present in the alkali developer after development is 1 μm or less,
The selected resist is applied to a substrate to form a coating film, the formed coating film is exposed, and then developed with the above-mentioned selected developer to produce a black matrix substrate. There is also provided a black matrix substrate having a haze value of the opening of 0.3 or less, a color filter and a color display panel using the same.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a method for manufacturing a resin black matrix substrate used for a color display panel such as a liquid crystal color display.

[0002]

2. Description of the Related Art In recent years, in the field of electronics, color panels such as a liquid crystal display, a plasma display, and an electroluminescence (EL) display have been developed. In a color panel, a black matrix is formed between red, green and blue pixels in order to increase the contrast of the screen and make the image easier to see. As a material of the black matrix, a metal thin film such as a low-reflection chrome laminated with chromium metal or chromium oxide is mainly used. To form a black matrix using these materials, a metal thin film of about 0.1 to 0.2 μm is formed on a substrate by a sputtering method or the like, and then,
Photolithography creates a photoresist pattern on a metal thin film, etches it to form a metal pattern, and finally removes the photoresist layer to create a black matrix. I have.

[0003] In recent years, the use of devices equipped with a liquid crystal display has remarkably diversified. In particular, when the device is used outdoors with strong external light, the contrast of the screen is reduced due to the light reflected by the black matrix. Problems such as difficulty in viewing the screen have been pointed out.
Therefore, a black matrix material having a low reflectance has been desired.

In order to form a black matrix layer having a low reflectance, (1) a method in which red, green and blue layers are superposed to form a light-shielding layer (JP-A-59-204009, JP-A-63-203) -40101 and JP-A-2-287303),
(2) Dyeing after pattern formation (Japanese Patent Application Laid-Open No. 62-14103)
And JP-A-62-14104), and (3) a method of forming a pattern with a photosensitive resin (resist) containing a black pigment such as carbon black has been proposed.

[0005]

Of these, the laminating method (1) and the dyeing method (2) are not necessarily sufficient in the reliability of the formed black matrix, such as light-shielding properties and heat resistance. Absent. On the other hand, the pigment method (3)
Since a black pigment is used, a higher light-shielding ratio can be obtained as compared with the methods (1) and (2). However, recently, since a black matrix having a thin film and a high light-shielding ratio is required, the content of the black pigment in the resist coating film tends to be increased. Problems have been clarified such that the pattern is chipped, line linearity is deteriorated, resolution is reduced, and residues are generated on the substrate.

An object of the present invention is to produce a color filter substrate, in particular, a black matrix substrate, with high resolution, little residue after alkali development, and without requiring a residue removing step.

[0007]

Means for Solving the Problems The inventors of the present invention have conducted intensive studies to solve the above-mentioned problems, and as a result, when a resist composition containing a black pigment and a certain binder resin is used, It has been found that the size of the particles present in the developer after alkali development greatly affects the linearity of the line and the remaining state of the development residue, and the resist composition is such that the size of the particles becomes a certain value or less. By using a combination of the product and an alkaline developer, the development residue was significantly reduced.

That is, the present invention relates to a method for producing a black matrix substrate for a color filter by exposing a coating film formed from a resist composition containing a black pigment and then developing the coating film with an alkaline developer. The resist composition contains, in addition to the black pigment, a copolymer having a carboxyl group, a photopolymerizable monomer, and a photopolymerization initiator, and the maximum diameter of the particles present in the alkali developer after development is increased. Selecting a combination of a resist composition exhibiting development characteristics of 1 μm or less and an alkali developer, applying the selected resist composition to a substrate to form a coating film,
An object of the present invention is to provide a method for producing a black matrix substrate by exposing the formed coating film and then developing it with the above-mentioned alkali developing solution.

The black matrix substrate thus obtained has very little development residue, and the opening substrate from which the resist has been removed by development has a low haze (transmission haze). Therefore, the present invention also provides a black pigment,
Produced by the above method from a resist composition containing a copolymer having a carboxyl group, a photopolymerizable monomer and a photopolymerization initiator, and having a haze value of 0.3 or less in a substrate at an opening portion dissolved in an alkali developing solution. A black matrix substrate for a color filter is also provided. Further, a color filter in which three color filter elements are arranged on the black matrix substrate and a color display panel in which the color filters are mounted are provided.

[0010]

DESCRIPTION OF THE PREFERRED EMBODIMENTS In the present invention, a resist composition containing a black pigment, a copolymer having a carboxyl group, a photopolymerizable monomer and a photopolymerization initiator is used. The black pigment used in this composition is CI Pigment Black 7
(Carbon black), CI Pigment Black 1
(Aniline black), CI pigment black 11
(Iron black) or the like. Also for toning,
Pigments other than black can also be used in combination. Examples of the pigment used in combination for toning include a violet pigment, a blue pigment, and a green pigment. When a toning pigment is used, it is used in a proportion of 40% by weight or less based on the total amount of the pigment.
Further, the pigment is used as a whole in a ratio of about 10 to 60% by weight based on the total solid content of the resist composition.

The copolymer having a carboxyl group serving as a binder resin of the resist composition may be a copolymer of acrylic acid or methacrylic acid and an acrylate or methacrylate having no carboxyl group in the molecule. This copolymer is soluble in a developing solution composed of a dilute aqueous alkaline solution. In such a copolymer, specific examples of acrylate or methacrylate copolymerized with acrylic acid or methacrylic acid include methyl acrylate, methyl methacrylate, benzyl acrylate, benzyl methacrylate,
Examples thereof include 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, oligoethylene glycol monoalkyl ester acrylate, and oligoethylene glycol monoalkyl ester methacrylate.

The copolymer having a carboxyl group is generally used in an amount of 5 to 90% by weight, preferably 20 to 90% by weight, based on the total solid content excluding the coloring material (usually a pigment) in the resist composition.
The content is 80% by weight, more preferably 40 to 80% by weight.

The photopolymerizable monomer constituting the resist composition may be a monofunctional monomer, a difunctional, trifunctional or other polyfunctional monomer. Specific examples of the monofunctional monomer include nonylphenyl carbitol acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-ethylhexyl carbitol acrylate, 2-hydroxyethyl acrylate, polyethylene glycol monoacrylate, polypropylene glycol monoacrylate, N- Examples include monofunctional acrylates such as vinylpyrrolidone and monofunctional methacrylates. Specific examples of the bifunctional monomer include polypropylene glycol diacrylate, polyethylene glycol diacrylate, trimethylolpropane diacrylate, neopentyl glycol diacrylate, and hexanediol. Diacrylate, bisphenol A diacrylate, bisphenol Z diacrylate, bisphenol Examples thereof include bifunctional acrylates such as fluorenone diacrylate and bifunctional methacrylates. Specific examples of the trifunctional monomer include trimethylolethane triacrylate, trimethylolpropane triacrylate, pentaerythritol triacrylate, and trimethylolpropane tris ( Acryloyloxypropyl)
Examples thereof include trifunctional acrylates and trifunctional methacrylates such as ether, tris (acryloyloxyethyl) isocyanurate, tris (acryloyloxyethyl) cyanurate, and glycerin triacrylate. Specific examples of other polyfunctional monomers include Examples thereof include pentaerythritol pentaacrylate and dipentaerythritol hexaacrylate. These photopolymerizable monomers each alone,
Alternatively, two or more kinds can be used in combination.

[0014] The photopolymerizable monomer is generally used in an amount when only one kind is used, or as a total amount when two or more kinds are used in combination, based on the total solid content excluding the coloring material in the resist composition. Is contained in the range of 5 to 60% by weight, preferably 20 to 50% by weight, and more preferably 20 to 40% by weight.

Specific examples of the photopolymerization initiator which is another component of the resist composition include benzoin such as benzoin, benzoin methyl ether, benzoin ethyl ether and benzoin isopropyl ether and their alkyl ethers; acetophenone, 2-dimethoxy-2-phenylacetophenone, 2,2-diethoxy-2-phenylacetophenone, 2,2-dichloroacetophenone, 1-hydroxycyclohexylphenyl ketone, 2-methyl-1- [4-methylthiophenyl] -2-morpho Acetophenones such as linopropanone-1, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butanone-1; 2,4
Thioxanthones such as diethylthioxanthone, 2,4-diisopropylthioxanthone and 2-chlorothioxanthone; ketals such as acetophenone dimethyl ketal and benzyl dimethyl ketal; benzophenones; anthraquinones; xanthones; Methyl) -6- (4-methoxyphenyl) triazine, 2,4-bis (trichloromethyl)-
And s-triazines such as 6- (4-methoxystyryl) triazine and 2,4-bis (trichloromethyl) -6- (4-methoxynaphthyl) triazine. These photopolymerization initiators can be used alone or in combination of two or more.

In addition to the photopolymerization initiator, a hexaarylbisimidazole compound or a hydrogen donor can be used in combination. Examples of hexaarylbisimidazole compounds include 2,2'-bis (o-chlorophenyl) -4,4 ', 5,5'-tetraphenyl-1,
2'-bisimidazole, 2,2'-bis (o-methoxyphenyl) -4,4 ', 5,5'-tetraphenyl-
1,2'-bisimidazole and the like; examples of hydrogen donors include 2-mercaptobenzothiazole,
-Aromatic mercaptan compounds such as mercaptobenzoxazole, ethyl 4-dimethylaminobenzoate,
An aromatic carboxylic acid ester compound having a tertiary amino group such as isoamyl 4-dimethylaminobenzoate is exemplified.

The photopolymerization initiator is used in an amount when only one type is used, as a total amount when two or more types are used together, and when a hexaarylbisimidazole compound or a hydrogen donor is used in combination. As a total amount including them, the total solid content excluding the coloring material in the resist composition is generally 5 to 30% by weight, preferably 5 to 30% by weight.
It is contained in the range of 20% by weight.

The resist composition contains a solvent in addition to the above-described black pigment, a copolymer having a carboxyl group, a photopolymerizable monomer and an initiator system containing a photopolymerization initiator or a combination thereof. The solvent used here can be any of those commonly used in this field. Specific examples include ethylene glycol monomethyl ethers, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monoalkyl ethers such as ethylene glycol monobutyl ether; diethylene glycol dimethyl ether;
Diethylene glycol dialkyl ethers such as diethylene glycol diethyl ether, diethylene glycol dipropyl ether and diethylene glycol dibutyl ether; ethylene glycol alkyl ether esters such as methyl cellosolve acetate and ethyl cellosolve acetate; propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate; Propylene glycol alkyl ether esters such as propylene glycol monopropyl ether acetate; ketones such as methyl ethyl ketone, acetone, methyl amyl ketone, methyl isobutyl ketone, cyclohexanone; ethanol;
Alcohols such as propanol, butanol, hexanol, cyclohexanol, ethylene glycol;
Esters such as butyl acetate and ethyl lactate; and cyclic esters such as γ-butyrolactone.
These solvents can be used alone or in combination of two or more.

The solvent is preferably used in an amount of generally 50 to 90% by weight based on the whole resist composition containing the solvent.
More preferably 60 to 90% by weight, even more preferably 6 to 90% by weight.
It is in the range of 5 to 85% by weight.

The resist composition used in the present invention can be prepared, for example, as follows. That is, the pigment is previously dispersed in a solvent together with a dispersant using a bead mill or the like. At this time, part or all of the copolymer having a carboxyl group can be mixed together with the pigment and the dispersant. Next, a copolymer having a carboxyl group, a photopolymerizable monomer, a photopolymerization initiator, and a solvent are added to the obtained pigment dispersion so as to have a predetermined concentration to obtain a desired resist composition.

For the purpose of improving the storage stability of the resist composition, a thermal polymerization inhibitor such as hydroquinone, methylhydroquinone, hydroquinone monomethyl ether and t-butylcatechol can be added. When a thermal polymerization inhibitor is used, it is usually added in the range of about 25 to 6,000 ppm based on the weight of the photopolymerizable monomer, preferably in the range of 50 to 4,000 ppm, more preferably in the range of 100 to 2,000 ppm. is there. Further, for the purpose of improving the coatability of the resist composition, a cationic surfactant, an anionic surfactant, a nonionic surfactant, a leveling agent or a flow control agent containing a fluorine atom or silicon, etc. are added. You can also. When these surfactants, leveling agents, flow control agents and the like are used, they are added in an amount of about 1 ppm to 5% by weight, preferably 1 ppm to 1% by weight, based on the whole resist composition. In addition, various additives can be blended as needed.

A black matrix pattern is formed by applying the above-described resist composition for a black matrix on a substrate and subjecting it to photo-curing and developing treatments. In forming a pattern, first, a resist solution is applied uniformly on a substrate (usually a glass substrate) using a spin coater, bar coater, roll coater, etc., and prebaked to remove the solvent by heating. To obtain a smooth coating film. At this time, the thickness of the coating film is usually 2 μm or less. In the coating film obtained in this way,
Through a negative mask to form the desired pattern,
Irradiate with ultraviolet light. At this time, it is preferable to use a device such as a contact exposure device, a proximity exposure device, and a stepper so that the entire exposure section is uniformly irradiated with ultraviolet rays. Next, this coating film is treated with an alkali developing solution to dissolve unexposed portions (uncured portions), thereby obtaining a desired pattern.

The developer used here is an aqueous solution containing an alkaline compound and usually containing a surfactant. As the alkaline compound, both inorganic and organic alkaline compounds can be used. Specific examples of the inorganic alkaline compound include sodium hydroxide, potassium hydroxide, disodium hydrogen phosphate, diammonium hydrogen phosphate, sodium dihydrogen phosphate, potassium dihydrogen phosphate, ammonium dihydrogen phosphate, sodium silicate, potassium silicate, Examples include sodium carbonate, potassium carbonate, sodium bicarbonate, potassium bicarbonate, sodium borate, potassium borate, and ammonia. Specific examples of the organic alkaline compound include tetramethylammonium hydroxide, 2-hydroxyethyltrimethylammonium hydroxide, monomethylamine, dimethylamine, trimethylamine, monoethylamine, diethylamine, triethylamine, monoisopropylamine, diisopropylamine, ethanolamine, and the like. Is mentioned. These inorganic and organic alkaline compounds can be used alone or in combination of two or more.

When only one kind of the alkaline compound is used, its concentration is used, and when two or more kinds are used in combination, the concentration is generally about 0.01 to 10% by weight in an alkali developing solution. The preferred alkali concentration is 0.05 to 5% by weight, more preferably 0.1 to 3% by weight.
% By weight.

The surfactant contained in the alkali developer may be any of a nonionic surfactant, an anionic surfactant and a cationic surfactant. Specific examples of the nonionic surfactant include polyoxyethylene alkyl ether, polyoxyethylene aryl ether,
Polyoxyethylene alkylaryl ether, other polyoxyethylene derivatives, oxyethylene / oxypropylene block copolymer, sorbitan fatty acid ester, polyoxyethylene sorbitan fatty acid ester,
Examples include polyoxyethylene sorbitol fatty acid ester, glycerin fatty acid ester, polyoxyethylene fatty acid ester, polyoxyethylene alkylamine, and the like. Specific examples of the anionic surfactant include sodium lauryl alcohol sulfate, higher alcohol sulfates such as sodium oleyl alcohol sulfate, sodium lauryl sulfate, alkyl sulfates such as ammonium lauryl sulfate, sodium dodecylbenzene sulfonate, Alkyl aryl sulfonates such as sodium dodecylnaphthalene sulfonate, and the like. Specific examples of the cationic surfactant include amine salts such as stearylamine hydrochloride, lauryltrimethylammonium chloride, and alkyldimethylbenzyl chloride, and quaternary ammonium salts. These surfactants can be used alone or in combination of two or more.

When only one type of surfactant is used, its concentration is used. When two or more types are used together, the total concentration of the surfactants is generally 0.01 to 1%.
The surfactant is used at a concentration of 0% by weight, and the preferred surfactant concentration is 0.05 to 8% by weight, more preferably 0.1 to 5% by weight.

FIGS. 1 to 6 show the particle size distribution of the particles present in the developing solution after the alkali development in Examples and Comparative Examples to be described later. And a cumulative curve representing the abundance of those below the particle size. In the figure, the horizontal axis represents the particle size (μm), the left vertical axis represents the frequency (%) corresponding to the bar graph, and the right vertical axis represents the cumulative amount (%) corresponding to the cumulative curve. 1 has a maximum particle size of about 0.5 μm, and FIG.
The maximum particle diameter is about 0.8 μm, that of FIG. 3 is about 0.7 μm, and that of FIG. 4 is about 0.6 μm, whereas that of FIG. 5 is that of FIG. Has a maximum particle size of about 2
μm, and that of FIG. 6 has a maximum particle size of about 5 μm. As shown in FIGS. 1 to 4, if the maximum diameter of the particles present in the developing solution after the development is 1 μm or less, the development residue is small in the opening (alkali dissolution part) on the substrate, and the lack of the line is also observed. Absent. On the other hand, as shown in FIGS. 5 and 6, the maximum diameter of the particles present in the developer after the development is 1 μm
Exceeds, the residue of the opening on the substrate becomes remarkably large,
Also, the lack of lines becomes noticeable.

Therefore, in the present invention, it is essential to select a combination of a resist composition exhibiting development characteristics such that the maximum diameter of particles present in the alkali developer after development is 1 μm or less, and an alkali developer.

In order to make such a combination, from the viewpoint of the resist composition, for example, the pigment may be sufficiently dispersed in the resist composition, or as a copolymer having a carboxyl group, It is conceivable to select a material which is easily soluble in an alkali developer or a material which is easily soluble in an alkali developer as a photopolymerizable monomer and / or a photopolymerization initiator. For example, for example, an alkaline aqueous solution having an appropriate dissolving ability for a resist is selected, an alkali concentration is set relatively low so as not to take in undissolved resin around pigment particles, or a development time is relatively set. There is a way to make it longer. However, the condition that the maximum diameter of the particles present in the alkali developer after development is 1 μm or less is not always unambiguously determined in many cases, and the condition that can be achieved for the first time by combining a plurality of the above measures is required. Since there are many cases, the conditions satisfying the requirements of the present invention can be set by conducting preliminary experiments as appropriate. For example, when the resist composition is specified as a certain one, the optimum conditions can be set by conducting experiments by appropriately changing the type and concentration of the alkaline developer. Further, the optimum conditions may be set by appropriately changing the components and the amounts thereof constituting the resist composition, and the components and the concentrations thereof constituting the alkaline developer within the range described above.

After development, washing with water is usually carried out to obtain a desired pattern.
250 ° C., preferably 120 to 250 ° C., more preferably 150 to 250 ° C., for about 10 to 120 minutes, preferably 10 to 60 minutes, more preferably 10 to 40 minutes,
It can be post-baked and post-cured.

As described above, the maximum diameter of the particles present in the developer after alkali development is 1 μm or less.
By selecting a combination of a resist composition and an alkaline developer, the development residue at the pattern opening is small, and the haze value (transmission haze) of the opening substrate is small. 3 or less black matrix substrates are obtained. Then, on this black matrix substrate, color filter elements of three colors, usually red, green and blue color filter elements, are arranged to form color filters. The formation of each color filter element other than the black matrix uses various colored resist compositions known in the art and employs a method similar to the formation of the above black matrix except for changing the pattern upon irradiation with ultraviolet light. it can. The order of forming the black matrix and each color filter element of the three colors is arbitrary, but generally, red, red, and black are formed on the substrate on which the black matrix is formed.
The green and blue color filter elements are formed in any order. Further, the color filter thus obtained is incorporated into a liquid crystal color display or the like to form a color display panel.

[0032]

EXAMPLES Hereinafter, the present invention will be described in more detail with reference to examples, but the present invention is not limited to these examples. In the examples, percentages and parts representing contents or amounts used are by weight unless otherwise specified.

Examples 1-4 and Comparative Examples 1-2 <Preparation of Pigment Dispersion> A solution prepared by dissolving 18.1 g of a nonionic surfactant as a dispersant in 225.0 g of propylene glycol monomethyl ether acetate was stirred at high speed. Meanwhile, 60.3 g of carbon black (“MA-100” manufactured by Mitsubishi Chemical Corporation) was gradually added thereto, and the mixture was premixed by continuing high-speed stirring for 30 minutes. Next, the premixed liquid was treated with a bead mill to prepare a pigment dispersion in which carbon black was uniformly dispersed.

<Preparation of Black Resist> While stirring the pigment dispersion prepared above, a copolymer having a carboxyl group and a copolymer of methacrylic acid and benzyl methacrylate in a molar ratio of 35/65 was added thereto. 35.7 g having a weight average molecular weight of about 50,000, 15.4 g of dipentaerythritol hexaacrylate as a photopolymerizable monomer, and 2,4-bis (trichloromethyl) -6- (4-methoxyphenyl) as a photopolymerization initiator. ) -1,3,3
5-triazine (hereinafter triazine-A) 10.5
g, and a photosensitive resin solution consisting of 335.0 g of propylene glycol monomethyl ether acetate (hereinafter, referred to as PGMEA) was gradually charged to prepare a black resist having the composition shown in Table 1.

[0035]

TABLE 1 1.50 parts of copolymer 5.10 parts of dipentaerythritol hexaacrylate 2.20 parts triazine -A having a composition of carbon black 8.62 parts carboxyl group of black resist PGMEA 80.00 parts dispersant 2.58 parts Total 100.00 parts

<Patterning> The black resist prepared above was spin-coated on a glass substrate so as to have a uniform film thickness, prebaked at 100 ° C. for 3 minutes, and dried.
The spin coating condition is that the film thickness after post-baking is 1.0 μm.
The rotation speed was set so that After pre-baking, it was cooled to room temperature, and then exposed at 40 mJ / cm ² using an ultra-high pressure mercury lamp (illuminance of 2.2 mW / cm ^{2 at a} wavelength of 365 nm), developed, washed, and post-baked at 220 ° C. for 30 minutes. And dried. For the development, a 5% aqueous solution of sodium carbonate containing 9% of an anionic surfactant was used as a stock solution, and a developer diluted at a dilution ratio shown in Table 2 was used.

<Measurement of Particle Size and Haze Value> The alkali developing solution after the development was directly applied to a Microtrac particle size analyzer (manufactured by Nikkiso Co., Ltd.) to measure the particle size distribution of the particles present in the developing solution. The results of each example are as shown in FIGS. 1 to 6, where the case where the maximum particle size was 1 μm or less was evaluated as ○, and the case where the maximum particle size exceeded 1 μm was evaluated as ×.
In addition, direct reading haze computer (Suga Test Machine Co., Ltd.)
The haze value (transmission haze) of the opening on the substrate, which is an index of the amount of residue, was measured. Table 2 shows the results.

<Evaluation of Line Linearity> A 10 μm line-and-space pattern patterned by the above method was observed with a reflection optical microscope with a magnification of 2,500 times. Those were evaluated as x. Table 2 shows the results.

[0039]

[Table 2] Results of resist evaluation ━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━ Example 1 Example 2 Example 3 Example 4 Comparative Example 1 Comparative Example 2 光学 Optical density^* 3.2 3.2 3.2 3.2 3.2 3.2 Developer dilution 50x 45x 40x 35x 25x 10x Particle size distribution Fig. 1 Fig. 2 Fig. 3 Fig. 4 Fig. 5 Fig. 6 Same judgment ○ ○ ○ ○ × × Haze value 0.1 0.1 0.1 0.1 1.8 0.5 Judgment of residue ○ ○ ○ ○ × × Line linearity ○ ○ ○ ○ × × ────────────────────────────── ────── Overall evaluation ○ ○ ○ ○ × × ━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━ ^* Optical density: Actual measured value at a dry film thickness of 1.0 μm after post-baking.

[0040]

According to the present invention, excellent line linearity is obtained.
In addition, a black matrix substrate with few residues in the openings can be manufactured. Therefore, a residue removing step is not required, and the yield in producing a black matrix can be increased. Then, on this black matrix substrate, color filter elements of the other three colors can be effectively formed to form a color filter and further a color display panel.

[Brief description of the drawings]

FIG. 1 shows the particle size distribution of particles present in a developer after alkali development in Example 1.

FIG. 2 shows a particle size distribution of particles present in a developer after alkali development in Example 2.

FIG. 3 shows the particle size distribution of particles present in a developer after alkali development in Example 3.

FIG. 4 shows a particle size distribution of particles present in a developer after alkali development in Example 4.

FIG. 5 shows a particle size distribution of particles present in a developer after alkali development in Comparative Example 1.

FIG. 6 shows a particle size distribution of particles present in a developer after alkali development in Comparative Example 2.

Claims (4)

[Claims] 1. A method for producing a black matrix substrate for a color filter by exposing a coating film formed from a resist composition containing a black pigment and then developing the coating film with an alkaline developer. Contains, in addition to the black pigment, a copolymer having a carboxyl group, a photopolymerizable monomer and a photopolymerization initiator, and the maximum diameter of the particles present in the alkali developer after development is 1 μm or less. Select a combination of a resist composition and an alkaline developer exhibiting the following developing characteristics, apply the selected resist composition to a substrate to form a coating film, and expose the formed coating film,
Then, the method is developed with the selected alkali developer. 2. An opening prepared by a method according to claim 1 from a resist composition containing a black pigment, a copolymer having a carboxyl group, a photopolymerizable monomer and a photopolymerization initiator and dissolved in an alkaline developer. A black matrix substrate for a color filter, wherein the haze value of the substrate is 0.3 or less. 3. A color filter comprising three color filter elements arranged on the black matrix substrate according to claim 2. 4. A color display panel comprising the color filter according to claim 3.