JPH1026701A - Filter for display device and display device - Google Patents

Abstract

(57) [Summary] (with correction) [PROBLEMS] To provide a filter for a display device having an antireflection property excellent in stain resistance, scratch resistance, processing resistance and the like. SOLUTION: The surface film provided on a plastic substrate 1 has a surface of a single-layer or multi-layer antireflection film 2 mainly composed of silicon dioxide, and is provided with a fluoroalkyl group or perfluoropolyether represented by the following general formula (I). A display device filter having an antireflection property coated with an alkoxysilane compound 3 having a group. R _f COX-R ₁ -Si (OR ₂ ) ₃
(I) (wherein, R _f represents a fluoroalkyl group or a perfluoropolyether group, X represents a bonding atom or a bonding atomic group, R ₁ represents a carbon atom chain containing an alkylene group, and R ₂ represents It represents an alkyl group or a carbon atom chain containing an alkyl group.)

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a filter for a display device having excellent anti-reflection properties such as stain resistance, abrasion resistance and processing resistance, and is further used as a front plate of a CRT. And a display device having the same.

[0002]

2. Description of the Related Art When an object is viewed through a transparent material, it is troublesome that the reflected light is strong and the reflected image is clear. For example, a reflected image called a ghost or a flare occurs in a lens for spectacles, causing discomfort to the eyes. Or Further, in the case of a looking glass or the like, there is a problem that the contents are not clear due to the reflected light on the glass surface.

Conventionally, a method of coating a substance having a refractive index different from that of a substrate on a substrate by a vacuum deposition method or the like to prevent reflection has been performed. In this case, in order to maximize the antireflection effect, it is known that it is important to select the thickness of the substance covering the substrate.

For example, in the case of a single-layer film, it is necessary to select a substance having a lower refractive index than that of the base material to have an optical thickness of 1/4 or an odd multiple of the target light wavelength, that is, a minimum reflectance, that is, a maximum transmittance. It is known to give. Here, the optical film thickness is given by the product of the refractive index of the film forming material and the film thickness of the film. Furthermore, it is possible to form a multilayer antireflection film, and in this case, several proposals have been made regarding the selection of the film thickness (Optical Technology Contact Vol. 9,
No. 8, page 17 (1971)).

On the other hand, JP-A-58-46301, JP-A-59-49501, and JP-A-59-50401.
Japanese Patent Application Laid-Open Publication No. H11-176,086 describes a method of forming an antireflection film comprising a plurality of layers, which satisfies the above-mentioned optical film thickness condition, using a liquid composition. In recent years, optical articles having plastics as a base material having antireflection properties have been devised and put to practical use, taking advantage of advantages such as light weight and safety and easy handling. Many of them adopt a film configuration having silicon dioxide as a surface layer film.

[0006]

The antireflection film formed by the vapor deposition method is mainly composed of an inorganic oxide or an inorganic halide as a film-forming material. In a plastic substrate, the antireflection film has an essentially high surface hardness. On the other hand, there is a drawback that dirt such as hand marks, fingerprints, sweat, hair liquid, hair spray and the like are conspicuous and the dirt is difficult to remove. Further, there is a problem in that the surface is poor in slipperiness and the scratches become thicker. In addition, since wettability to water is large, raindrops and water droplets spread greatly when they adhere, and there is a problem in that an object appears distorted over a large area in an eyeglass lens or the like.

JP-A-58-46301, JP-A-5-46301
In order to impart a hard surface hardness also to the antireflection film described in JP-A-9-49501 and JP-A-59-50401, the outermost layer film contains 30% by weight or more of an inorganic substance typified by silica fine particles or the like. However, the antireflection film obtained from such a film composition has problems such as poor surface slip and easy damage due to abrasion of a cloth or the like.

Various surface treatment agents have been proposed and marketed for the purpose of resolving these problems, but all of them have a temporary function because they are dissolved by water or various solvents. There was no durability and poor durability. Further, JP-A-3-266801 reports that a fluorine-based resin layer is formed in order to impart water repellency. However, although these fluororesins certainly increase the water repellency, satisfactory results with respect to friction or wear have not been obtained.

The present invention has been made in view of such circumstances, and provides a filter for a display device having an antireflection property excellent in stain resistance, abrasion resistance, processing resistance and the like, and a display device having the same. The purpose is to: Another object of the present invention is to provide a filter suitable for use as a front panel of a display device such as a CRT.

[0010]

The present inventors have made intensive studies to solve the above-mentioned problems, and as a result, have reached the present invention described below. That is, in order to achieve the above-mentioned object, the filter according to the present invention is characterized in that the surface of a single-layer or multilayer antireflection film provided on a plastic substrate has a fluoroalkyl group represented by the following general formula (I) A filter for a display device having an antireflection property, wherein the filter is coated with a surface modified film made of an alkoxysilane compound having a fluoropolyether group.

[0011]

Embedded image R _f COX—R ₁ —Si (OR ₂ ) ₃ (I) (where R _f represents a fluoroalkyl group or a perfluoropolyether group, and X is usually O, NH, S
R ₁ represents a carbon atom chain containing an alkylene group, and R ₂ represents an alkyl group or a carbon atom chain containing an alkyl group. In the present invention, it is preferable that the surface of the antireflection film is mainly made of silicon dioxide, and the surface modification film is formed on the surface.

In the filter according to the present invention, a solution obtained by diluting the above alkoxysilane compound with a solvent having a boiling point of 50 to 120 ° C. and a viscosity of 20 ° C. in the range of 0.5 to 4.0 cps is used as an antireflection film. It is preferable that a surface-modified film is formed by coating on the surface.

[0013]

In order to solve the above-mentioned problems in the prior art, the present inventors have improved the friction and abrasion resistance or the stain resistance by performing a surface treatment with a perfluoropolyether compound during various studies. I got the knowledge to do it. However, it was concluded that the surface treatment with this compound was very effective, but the effect was significantly reduced by chemical stability, for example, by solvent treatment. This is considered to be related to the interaction with SiO ₂ on the surface.

The inventors of the present invention have conducted further intensive studies and have found that an alkoxysilane compound having a fluoroalkyl group or a perfluoropolyether group represented by the general formula (I), particularly a perfluoropolyether group The present invention has solved the problem of abrasion resistance or contamination resistance of a filter for a display device having antireflection properties by coating with an alkoxysilane compound having the following.

That is, an alkoxysilane structure is included in the molecular structure in order to have an interaction with the SiO ₂ surface, and a strong bond is formed on the surface. Therefore, problems such as solvent resistance, which have been unsatisfactory in the past, can be overcome. Further, the alkoxysilane compound represented by the general formula (I) according to the present invention has water repellency and improves water stain resistance by containing a fluorine-containing group in the molecule.

The alkoxysilane compound having a fluoroalkyl group among the compounds represented by the general formula (I) is sufficient from the viewpoints of the above-mentioned solvent resistance, water stain resistance and the like. In terms of abrasion resistance and friction characteristics, the latter compound is preferable because it is inferior to the case of using an alkoxysilane compound having a perfluoropolyether group having excellent tribological characteristics in the molecular structure. .

By the way, the alkoxysilane compound having a perfluoropolyether group tends to cause coating unevenness after coating due to the solvent, which may cause problems in various properties such as stain resistance and visual observation. The coatability is affected by the boiling point of the solvent. In other words, the drying speed of the solvent is generally about 1 μm / s at a boiling point of 70 ° C., and the problem of drying after coating may remain with a high boiling point solvent, while at a low boiling point, the coating may be caused by stagnation during drying of the solvent. There is a report that unevenness is likely to occur (IEEE Trans MAG., Vol. 31, No. 6
(1995) pp. 2982-2984). On the other hand, if the viscosity is high, a large amount is applied at the time of pulling up by dip coating or at the time of adding a solution by gravure coating, so that the drying tends to be insufficient. In addition, the Reynolds number (see the following formula) at the time of coating is inversely proportional to the viscosity of the solvent. Therefore, there is a possibility that an optimum value exists from the viewpoint of the boiling point or the viscosity of the solvent.

[0018]

(Reynolds number) = vl / η (where, v is the pulling speed, l is the height of the meniscus at the time of pulling, and η is the viscosity) Therefore, the present inventors have further studied diligently. The above alkoxysilane compound,
In the case of an alkoxysilane compound having a perfluoropolyether group, this compound is converted to a compound having a boiling point of 50-12.
It has been found that by applying a solution diluted with a solvent having a viscosity in the range of 0.5 to 4.0 cps at 0 ° C. and a viscosity of 20 ° C., a uniform lubricating film having a uniform thickness can be obtained. is there.

[0019]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in more detail based on embodiments. FIG. 1 shows a sectional structure of a filter for a display device according to an embodiment of the present invention.

The filter 10 for a display device in the embodiment shown in FIG. 1 is provided with an antireflection film 2 on one surface of a plastic substrate 1 and a surface modification film 3 on an upper surface thereof.
Are formed. Filter 10 according to the present embodiment
Is bonded, for example, to the surface of a panel 101 of a cathode ray tube (CRT) 100 shown in FIG. 2 via an adhesive layer. The adhesive for bonding the device 1 of the filter 10 to the panel 101 is not particularly limited, and various known adhesives can be used. Generally, an ultraviolet curable resin-based adhesive is used, and the cured layer of the adhesive is used. It is preferable that the refractive index be close to the refractive index of the panel, for example, the difference be within 0.8%. Specifically, for example, a molecular weight of 55
0% or more of bisphenol A type epoxy (meth) acrylate 10% by weight, urethane (meth) acrylate 20% by weight, hydroxyl group-containing mono (meth) acrylate 70% by weight, photopolymerization initiator 3% and other additives several percent A composition or the like may be used.

In the present invention, the filter 1 shown in FIG.
The plastic substrate 1 of 0 is not particularly limited, and any substrate may be used as long as the substrate is made of an organic polymer. However, optical characteristics such as transparency, refractive index, and dispersion, and furthermore, In view of various properties such as impact resistance, heat resistance and durability, in particular, polymethyl methacrylate, methyl methacrylate and other alkyl (meth) acrylates,
(Meth) acrylic resins such as copolymers with vinyl monomers such as styrene; polycarbonate, diethylene glycol bisallyl carbonate (CR-39)
(Brominated) bisphenol A type di (meth) acrylate homopolymer or copolymer, (brominated) bisphenol A mono (meth)
Thermosetting (meth) acrylic resins such as polymers and copolymers of urethane-modified monomers of acrylates;
Polyester, especially polyethylene terephthalate, polyethylene naphthalate and unsaturated polyester; acrylonitrile-styrene copolymer, polyvinyl chloride, polyurethane, epoxy resin and the like are preferable. It is also possible to use an aramid resin in consideration of heat resistance. In this case, the upper limit of the heating temperature is 200 ° C. or higher, and the temperature range is expected to be wide.

The surface of the plastic substrate as described above may be coated with a coating material such as a hard coat. It is possible to improve various physical properties such as hardness, chemical resistance, durability and dyeability.

In order to improve the hardness, it is possible to use a material to which various materials conventionally known as a plastic surface hardening film are applied, for example, Japanese Patent Publication No. 50-28092.
Gazette, Japanese Patent Publication No. 50-28446, Japanese Patent Publication No. 51-
24368, JP-A-52-112698,
The technology disclosed in Japanese Patent Publication No. 57-2735 can be applied. Further, an acrylic cross-linked product using a (meth) acrylic acid ester and a cross-linking agent such as pentaerythritol, or an organopolysiloxane-based product may be used. These can be used alone or in appropriate combination.

The antireflection film 2 formed on the plastic substrate 1 has a single-layer or multi-layer structure, and various combinations are possible. In particular, in the case of a multilayer structure, the film configuration of the material forming the layer below the surface layer is required performance, for example, heat resistance, antireflection,
It can be determined appropriately based on experiments and the like according to the color of reflected light, durability, surface hardness and the like.

Silicon dioxide for forming these antireflection films
As a method of forming various inorganic materials including, vacuum deposition,
Each type represented by ion plating and sputtering
There is a kind of PVD (Physical Vapor Deposition) method.
In order to obtain an anti-reflection film, an inorganic substance suitable for the above-mentioned PVD method
As SiO_Two Besides, for example, Al_Two O_Three , Zr
O_Two , TiO_Two , Ta_Two O_Five , TaHf_Two , SiO, T
iO, Ti_Two O_Three , HfO_Two , ZnO, In_Two O_Three / S
nO_Two , Y_Two O _Three , Yb_Two O_Three , Sb_Two O_Three , MgO,
CeO_Two And the like. This is it
Outermost layer of anti-reflection coating formed by PVD method
The film should consist primarily of silicon dioxide.
Is preferred. Sufficient surface hardness except for silicon dioxide
Not only can not obtain the degree of contamination,
Improves dyeability, abrasion resistance, and durability of these properties
Is not likely to appear remarkably. However
Further, the present invention mainly relates to the surface of such an antireflection film.
Because it relates to the configuration of the surface-modified film that covers
It does not limit the material of the outermost surface layer of the anti-reflection film.
Alternatively, it may be made of something other than silicon dioxide.

The thickness of the outermost surface layer of the anti-reflection film should be determined depending on the required performance other than the anti-reflection effect. It is preferable to select the optical film thickness of the surface layer to be １ ／ of the target light wavelength or an odd multiple thereof, from the viewpoint of giving a minimum reflectance, that is, a maximum transmittance.

On the other hand, the structure of the lower layer of the surface layer is not particularly limited. That is, although it is possible to form the surface layer directly on the substrate, it is possible to form a film having a higher refractive index than the surface layer on the substrate in order to make the antireflection effect more remarkable. Coating is effective. Some proposals have also been made regarding the selection of the film thickness and the refractive index of these multilayer antireflection films (for example,
Optical Technology Contact Vol.9, No.8, p.17 (1971)).

It is also possible to provide an inorganic light transmitting film such as a carbon sputter film or a carbon CVD film in the lower layer. In the present invention, the surface of the single-layer or multi-layer antireflection film 2 as described above is treated by the following general formula (I).
Is coated with a surface-modified film 3 formed from an alkoxysilane compound having a fluoroalkyl group or a perfluoropolyether group represented by

[0029]

Embedded image R _f COX—R ₁ —Si (OR ₂ ) ₃ (I) (wherein, R _f represents a fluoroalkyl group or a perfluoropolyether group, and X represents a bonding atom or a bonding atom group) , R ₁ represents a carbon atom chain containing an alkylene group, and R ₂ represents an alkyl group or a carbon atom chain containing an alkyl group.) The molecular structure of the perfluoropolyether group as R _f is particularly limited. not, including but perfluoropolyether group various chain lengths, preferably perfluoropolyether a repeating unit a perfluoroalkyl group of about C ₁ -C _3. Specifically, for example, as a monofunctional one,
There are the following,

[0030]

Embedded image

The following are polyfunctional compounds.

[0032]

Embedded image

In the above chemical structural formula, l, m, n,
k, p and q each represent an integer of 1 or more. However, as described above, the molecular structure of the perfluoropolyether is not limited to those exemplified above. On the other hand, the molecular structure of the fluoroalkyl group as R _f is not particularly limited, and includes a fluoroalkyl group having various chain lengths and various degrees of fluorine substitution, but is preferably about ₅ to ₁₂ carbon atoms. It is a fluoroalkyl group.

It should be noted that as _Rf, as described above, more excellent wear resistance and friction characteristics can be obtained,
Perfluoropolyether groups are preferred. General formula (I)
The bonding atom or bonding atom group represented by X in X is not particularly limited, but is usually, for example, O, N
It is an atom or an atomic group such as H or S.

R ₁ and R ₂ in the general formula (I)
Is not particularly limited. For example, it may be a C _{1 to} C ₅ linear carbon atom chain.
Incidentally, as long as the flexibility or fluctuation of the carbon atom chain is not impaired, an unsaturated bond, a characteristic group, or a structure having a cyclic structure such as an aromatic ring may be used.
It may have a short branched chain or a side chain.

The molecular weight of the compound represented by the general formula (I) is not particularly limited, but is preferably about 500 to 10,000, more preferably about 500 to 4,000 in terms of number average molecular weight in terms of stability, ease of handling and the like. Things are used.
Further, the thickness of the surface-modified film formed of such a compound is not particularly limited, either. It is desirable that the thickness is about 5 nm to 50 nm, more preferably about 1 nm to 10 nm.

As the coating method, various methods used in a normal coating operation can be applied, and from the viewpoint of controlling the uniform film thickness, spin coating, dip coating, curtain flow coating, or the like is preferably used. Further, from the viewpoint of workability, a method of impregnating a material such as paper or cloth with a liquid and performing coating and casting is also preferably used.

In such a coating operation, the compound represented by the general formula (I) is usually used after being diluted with a volatile solvent. The solvent used is not particularly limited, but in consideration of the stability of the composition, the wettability of the outermost surface layer of the antireflection film to be coated, typically the silicon dioxide film, volatility, etc. Should be determined. In the present invention, an alcohol solvent is particularly preferable.

Further, the diluting solvent has a boiling point of 50 ° C.
0.5 to 4.0 cp at ~ 120 ° C and viscosity at 20 ° C
It is desirable to use those having a range of s. By diluting with a diluting solvent that satisfies such conditions and applying the coating, a coating film having a uniform thickness and no unevenness can be obtained.
For example, in the alcohol solvent, those satisfying such conditions include methanol, ethanol, and n.
-Propanol, i-propanol, n-butyl alcohol, i-butyl alcohol, sec-butyl alcohol, sec-amyl alcohol and the like. The diluting solvent can be used alone or as a mixture of two or more.

The degree of dilution with a diluting solvent when preparing a coating solution of the compound represented by the general formula (I) is not particularly limited, but may be, for example, 0.1 to 5.0.
It is appropriate to adjust the concentration to about 0% by weight. In addition, an acid or a base as a reaction catalyst can be added to the coating solution, if necessary. As the acid catalyst, for example, sulfuric acid, hydrochloric acid, nitric acid, phosphoric acid, acid clay, iron oxide, boric acid, trifluoroacetic acid and the like can be used.
As the base catalyst, an alkali metal hydroxide such as sodium hydroxide, potassium hydroxide, lithium hydroxide or the like can be used. Further, it is possible to increase the catalytic effect by adding a phosphate ester catalyst or a carbonyl compound such as acetylacetone. By the addition of the catalyst as described above, the interaction involving the bonding reaction between the silano group of the compound represented by the general formula (I) and SiO ₂ on the surface of the antireflection film is good without heating. Proceed to For this reason, in a thin film material on SiO ₂ , excellent demands for durability can be expected despite the strict requirements for durability due to its film thickness.

In applying the compound represented by the general formula (I) according to the present invention, it is preferable that the surface of the antireflection film to be applied is cleaned. Stain removal, degreasing with an organic solvent, steam cleaning with a fluorine-based gas, and the like are applied. It is also an effective means to perform various pretreatments for the purpose of improving adhesion and durability, and particularly preferably used methods include activating gas treatment, chemical treatment with an acid, alkali, or the like.

The antireflection filter for a display device obtained by the present invention is less liable to be stained than a normal antireflection film.
And dirt is not conspicuous. Furthermore, it has the advantage that dirt can be easily removed, or the surface slides well, so that it is not easily scratched. In addition to these properties, it has durability with respect to abrasion.

It should be noted that the present invention is not limited to the above-described embodiment, but can be variously modified within the scope of the present invention. For example, in the above-described embodiment, the filter 10 is used by bonding to the panel 101 of the CRT 100 shown in FIG. 2. However, the filter 10 according to the present invention does not necessarily need to be used by bonding to the surface of the panel 101. Instead, a filter of a type that can be detachably attached to the front surface of the panel 101 may be used.

The panel of the display device to which the filter 10 is attached is not limited to a panel having a curvature such as a CRT, but also a panel of a flat display device such as a liquid crystal display device or a plasma display. Panel of the display device. The filter according to the present invention may be attached to the panel of these display devices with an adhesive or the like, or may be detachably attached. When the filter is detachably mounted, a frame is attached to the outer periphery of the filter according to the present invention, and the filter according to the present invention is stretched over the frame.

The multilayer structure of the filter according to the present invention is not limited to the embodiment shown in FIG. 1, and various multilayer structures are conceivable.

[0046]

EXAMPLES Hereinafter, the present invention will be described more specifically with reference to examples, but the present invention is not limited to these examples. In the examples, "parts" indicates parts by weight.

Example 1 (1) Preparation of Antireflection Film A transparent polyethylene terephthalate (PET) film having a thickness of 100 μm was used as a substrate. One side of this PET film is previously subjected to a hard coat treatment for securing surface hardness, and a 120 nm-thick ITO is pre-deposited thereon by a vacuum deposition method as an anti-reflection film. SiO ₂ was formed by vapor deposition to a thickness of 70 nm. In addition, the hard coat treatment referred to here generally applies an acrylic cross-linkable resin material, cross-links and cures it with ultraviolet rays or electron beams, or applies a silicon-based, melamine-based, epoxy-based resin material, It is performed by heat curing. (2) Preparation of a coating composition containing an alkoxysilane compound having a perfluoropolyether group An alkoxysilane compound having a perfluoropolyether group (1) (molecular weight: about 1000; see Table 1) was mixed with 4 parts of methyl alcohol 200 Then, 1 cc of acetylacetone and 0.01 cc of concentrated hydrochloric acid were added to form a uniform solution, followed by filtration through a membrane filter to obtain a coating composition. (3) Coating and drying The coating composition prepared in (2) is dip-coated on the surface of the antireflection film obtained in (1) at a pulling rate of 5 cm / min, and then air-dried to have antireflection properties. An optical article was obtained. No temperature operation was performed in the coating and drying steps. (4) Performance Evaluation The performance of the obtained optical article was evaluated by conducting a test according to the following method. Table 2 shows test results of the following evaluation items (a) to (e). In order to check the solvent resistance, the same test was performed again after washing with ethanol. Table 2 shows the obtained results.

(A) Stain resistance test 5 ml of tap water was dripped on the filter surface, left for 48 hours in an atmosphere at room temperature (25 ° C. ± 2 ° C.), and the remaining state of the scale after wiping with a cloth was visually observed. And observed. The case where scale was successfully removed was defined as good, and the case where scale was not removed was defined as poor.

(B) Surface Slipperiness The degree of scratching when the surface was scratched with a pencil (hardness: 3H) was evaluated. The criteria are as follows. ：: Not caught at all.

Δ: If it is strengthened, it will be caught. X: Even if weakened, it is caught. (C) Abrasion resistance test The surface of the optical article was rubbed 30 times with steel wool # 0000 under a load of 200 g under a load of 200 g, and the surface was evaluated for scratches.
The criteria are as follows.

：: Not attached at all. Δ: Fine scratches are formed. X: The scratch is remarkable. (D) Difficulty of attaching dirt The difficulty of attaching dirt was visually evaluated. The criteria are as follows.

：: Even if attached, it is not conspicuous. Δ: attached, but easily removable. X: The appearance after attachment is conspicuous. (E) Contact angle The contact angle between water and methylene iodide was measured. The measurement is
This was performed using CA-A manufactured by Kyowa Interface Chemical Co., Ltd. The measured value of the contact angle is a measure of the residual ratio of the surface-modified film or the contamination with water or oil. Example 2 In Example 1, except that solvent 2 (ethanol) was used as shown in Table 2 instead of solvent 1 (methanol) in the preparation of the coating composition containing an alkoxysilane compound having a perfluoropolyether group. In the same manner as in Example 1, an optical article was obtained, and its performance was evaluated. Table 2 shows the obtained results. Examples 3 to 8 Example 1 was repeated except that the combination of the solvent and the alkoxysilane compound used in the preparation of the alkoxysilane compound-containing coating composition having a perfluoropolyether group was changed as shown in Table 2 in Example 1. An optical article was obtained in the same manner as in Example 1, and its performance was evaluated. Table 2 shows the obtained results. The alkoxysilane compounds used are listed in Table 1, and the solvents are listed in Table 3. Comparative Examples 1 to 4 In the preparation of the alkoxysilane compound-containing coating composition having a perfluoropolyether group in the preparation of the coating composition having the perfluoropolyether group in Example 1, the combination of the solvent and the alkoxysilane compound used was changed as shown in Table 2, respectively. An optical article was obtained in the same manner as in Example 1, and its performance was evaluated. Table 2 shows the obtained results. The alkoxysilane compounds used are listed in Table 1, and the solvents are listed in Table 3.

[0053]

[Table 1]

[0054]

[Table 2]

[0055]

[Table 3]

[0056]

As described above, in the filter according to the present invention, the surface of the single-layer or multi-layer antireflection film provided on the plastic substrate has a fluoroalkyl group or a peralkyl group represented by the general formula (I). This is a display device filter covered with a surface modified film made of an alkoxysilane compound having a fluoropolyether group. Therefore, the filter according to the present invention and the display device having the same,
It has the following effects. (1) It is hard to be stained by fingerprints, hand marks, and the like, and hardly noticeable. These effects are permanently maintained. (2) It can be easily removed even if it is dried due to adhesion of scale and the like. (3) Good surface slipperiness. (4) Dirt such as dust hardly adheres, and the usability is good. (5) There is durability against abrasion. (6) The drying temperature after application can be reduced to a low temperature of 50 ° C. or less.

Further, the above alkoxysilane compound is
An alkoxysilane compound having a perfluoropolyether group, which compound has a boiling point of 50 to 12
According to a filter and a display device in which a surface-modified film is formed by applying a solution diluted with a solvent having a viscosity of 0 ° C. and 20 ° C. in a range of 0.5 to 4.0 cps to an antireflection film, Not only the above-mentioned effects are remarkable, but also the coating unevenness can be reduced, so that the yield is improved, and the appearance is beautiful and there is no discomfort.

[Brief description of the drawings]

FIG. 1 is a drawing showing a cross-sectional structure of a display device filter according to an embodiment of the present invention.

FIG. 2 is a schematic perspective view of a CRT according to one embodiment of the present invention.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 ... Plastic base material, 2 ... Anti-reflection film, 3 ... Surface modification film, 10 ... Filter, 100 ... CRT, 1
01 ... Panel.

Claims (6)

[Claims] The surface of a single-layer or multi-layer antireflection film provided on a plastic substrate is made of an alkoxysilane compound having a fluoroalkyl group or a perfluoropolyether group represented by the following general formula (I). A display device filter having an antireflection property, which is coated with a surface modification film. Embedded image R _f COX—R ₁ —Si (OR ₂ ) ₃ (I) (wherein, R _f represents a fluoroalkyl group or a perfluoropolyether group, and X represents a bonding atom or a bonding atom group) , R ₁ represents a carbon atom chain containing an alkylene group, and R ₂ represents an alkyl group or a carbon atom chain containing an alkyl group.) 2. The alkoxysilane compound is an alloxysilane compound having a perfluoropolyether group, and the compound has a boiling point of 50 to 120.degree. 2. The display device filter according to claim 1, wherein a surface-modified film is formed by applying a solution diluted with a solvent in a range of 0 cps to a surface of the antireflection film. 3. The display device filter according to claim 1, wherein the surface of the antireflection film is mainly made of silicon dioxide, and a surface modification film is formed on the surface. 4. An alkoxysilane compound having a fluoroalkyl group or a perfluoropolyether group represented by the following general formula (I) on the surface of a single-layer or multilayer antireflection film provided on a plastic substrate. A display device having a filter having an antireflection property, which is covered with a surface modification film. Embedded image R _f COX—R ₁ —Si (OR ₂ ) ₃ (I) (wherein, R _f represents a fluoroalkyl group or a perfluoropolyether group, and X represents a bonding atom or a bonding atom group) , R ₁ represents a carbon atom chain containing an alkylene group, and R ₂ represents an alkyl group or a carbon atom chain containing an alkyl group.) 5. The alkoxysilane compound is an alloxysilane compound having a perfluoropolyether group, and the compound has a boiling point of 50 to 120.degree. The display device according to claim 4, wherein a surface-modified film is formed by applying a solution diluted with a solvent in a range of 0 cps to a surface of the antireflection film. 6. The display device according to claim 4, wherein the surface of the antireflection film is mainly made of silicon dioxide, and a surface modification film is formed on the surface.