JPH03209906A - Vapor deposition controller for adjusting frequency of crystal resonator - Google Patents

Abstract

PURPOSE:To form a vapor-deposited film through single-time operation up to frequencies as many as an optional number of lots in the same batch processing by calculating a threshold value according to the frequency of the vapor-deposited film while measuring its film thickness. CONSTITUTION:A work made of the substrate of the crystal resonator to be vapor-deposited is set on a vacuum depositing machine main body 10. A microprocessor MP1 sets the frequency, load capacity, threshold value, etc., of each lot and performs processing. Vapor deposition is carried out under specific conditions, lot by lot and while the film thickness of the vapor-deposited film is measured automatically with the output of an oscillation circuit 3, the frequency is fed back to the MP1. The difference between the frequency set frequency is calculated and the threshold value calculated by the MP1 is inputted to a control box 4; and a signal is sent to a vacuum vapor-deposition control system 9 when the threshold value is reached and the vapor deposition is completed.

Description

[Detailed Description of the Invention] [Industrial Application Field] This invention applies to the substrates of various types of crystal resonators.
The present invention relates to a vapor deposition control device for frequency adjustment of a crystal oscillator for forming vapor deposited films each having a predetermined frequency.

[Prior art] Conventionally, this type of evaporation control device for adjusting the frequency of crystal oscillators has been equipped with a vacuum evaporation machine control device attached to the main body of a vacuum evaporation machine that can set dozens of crystal oscillator substrates. However, the vacuum evaporation film can be applied to a predetermined number of crystal oscillator substrates in a batch manner by adjusting the film thickness regulators in several stages installed in the vacuum evaporation machine control device. Are known.

In addition, in the conventional example, the vacuum evaporation machine control device has multiple series, each of which has a built-in film thickness adjuster, and when applying a vacuum evaporation film to a predetermined number of substrates, each lot has a different film thickness. For example, it is also known that a vacuum deposition film is applied in a batch manner.

In any case, as for these conventional examples, firstly, while oscillating in the process of applying a vacuum-deposited film to a substrate,
There is a method that performs fine adjustment of the deposition so that the frequency is set in advance on a frequency counter.

Second, a monitor crystal oscillator is installed in the vacuum evaporation machine control device, and while the vacuum evaporation film is being applied to the substrate, the monitor's crystal oscillator is oscillated, and the beat frequency with this oscillation is zero. Some methods perform fine-tuned vapor deposition to adjust the frequency.

[Problems to be Solved by the Invention] According to the above-mentioned conventional example, in the batch type, it is necessary to adjust all batches to the same frequency. Therefore,
This is true even if the quantity is less than 1 hatch &-1
It was necessary to perform the work once.

In addition, in the case of the in-line type, it is necessary to stop the equipment and change the frequency each time, which has the disadvantage of greatly reducing work efficiency. In the case of a counter type, equipment that can process several types of frequencies in one batch has been developed, but in that case there is a limit to the wavelengths that can be adjusted, and a deposition control device must be installed for each frequency. Therefore, there are many restrictions on the deposition conditions, and the equipment has to be larger.

The evaporation control device for adjusting the frequency of a crystal oscillator of the present invention is intended to eliminate the above-mentioned drawbacks of the conventional example, and finely adjusts the frequency to a preset frequency on a frequency counter while oscillating the quartz oscillator during the evaporation process. When performing vapor deposition, at least one
An object of the present invention is to provide a vapor deposition control device for adjusting the frequency of a crystal resonator, which is capable of forming a vapor film from one frequency to an arbitrary number of lots in one operation.

[Means for Solving the Problems] That is, the vapor deposition control device for adjusting the frequency of a crystal oscillator according to the present invention includes a microprocessor for performing arithmetic processing, and a crystal oscillator connected to the microprocessor via a first control system. A frequency counter that reads the frequency of the crystal oscillator and feeds it back to the microprocessor via the interface. A control box receives the difference between the input frequency and the frequency set by the microprocessor, and a threshold value is input from the microprocessor via a second control system and a comparator, and the control box is connected to the control box via an interface. It is characterized by having a vacuum evaporator control system connected to the vacuum evaporator control system.

[Embodiment] Next, an embodiment of a vapor deposition control device for frequency adjustment of a crystal resonator according to the present invention will be described with reference to the drawings.

In FIG. 1, l is a microprocessor consisting of a microcomputer or the like that performs arithmetic processing, and an oscillation circuit that drives a crystal resonator during the vapor deposition process is connected to this microprocessor l via a first control system 2. 3 is connected. The frequency of the crystal resonator driven by this oscillation circuit 3 is read by a frequency counter 5 connected to this oscillation circuit 3, the microprocessor 1, and a control box 4 to be described later. The read frequency is fed back from this frequency counter 5 to the microprocessor 1 via an interface 6. That is, the frequency fed back from the oscillation circuit 3 via the frequency counter 5 is input to the microprocessor 1 via the interface 6, and the microprocessor 1 calculates the difference between the frequency and the preset frequency.

The control box 4, which is connected to the frequency counter 5 via a comparator 7, is simultaneously connected via the comparator 7 to the microprocessor 1 via a second control system 8. Via this second control system 8 and comparator 7, the threshold value calculated from the microprocessor 1 is input to this control box 4.

This control box 4 is connected to a vacuum evaporator control system 9 via an interface to automatically control the vacuum evaporator main body 10. Note that it is desirable that the vacuum evaporation machine control system 9 is also provided with a manual operation means to be able to deal with various troubles.

The storage device of the microprocessor 1 stores not only the frequency but also the load capacity, threshold value, etc., and can be freely retrieved and used at any time.

That is, it is possible to automatically tune the oscillator to a desired frequency or change conditions such as load capacity for each arbitrary quantity. Further, fine-tuned deposition conditions can be set at the same time, and fine-tuned deposition can be performed on all the crystal oscillator substrates in one batch to a desired frequency under each set condition.

The vapor deposition control device for adjusting the frequency of a crystal resonator according to the present invention operates as shown in the flowchart shown in FIG.

First, a workpiece consisting of a crystal oscillator substrate to be vapor deposited is set in the vacuum vapor deposition machine body 10. A predetermined jig is attached to the main body 10 of the vacuum deposition machine, and the workpiece is held by the jig.

Then, the microprocessor 1 sets the frequency, load capacity, threshold value, etc. for each lot and starts processing. Vapor deposition is performed on the workpieces under different conditions for each lot, and the oscillation circuit 3 generates oscillations to automatically measure the thickness of the vapor-deposited film while feeding back the frequency to the microprocessor 1. This frequency is input to the microprocessor 1 via the interface 6, and the microprocessor 1 calculates the difference between it and a preset frequency.

The threshold value calculated by the microprocessor 1 is input to the control box 4, and when the threshold value is reached, a signal is sent to the vacuum evaporator control system 9 to terminate the evaporation.

The vapor deposition conditions once input to the microprocessor 1 can be stored in a storage device and can be freely retrieved and used at any time.

Note that if this method is used, even if it is an in-line method, there is no need to temporarily stop the device during work, and the frequency etc. can be changed freely.

[Effects of the Invention] Since the present invention is configured as described above, when finely adjusting the deposition to the frequency set in the frequency counter in advance while oscillating the crystal oscillator during the deposition process,
Through computer control, it has become possible to form a deposited film from at least one frequency to frequencies of any number of lots in the same batch in one operation of 4 degrees.

[Brief explanation of drawings]

FIG. 1 is a schematic configuration diagram showing an embodiment of a vapor deposition control device for frequency adjustment of a crystal resonator according to the present invention, and FIG. 2 is a flowchart showing the processing process thereof. 1... Microprocessor 2... First control system 3... Oscillation circuit 4... Control box 5... Frequency counter 6... Interface 7... Comparator 8... Second control system Control system 9...
・Vacuum deposition machine control system 10...Vacuum deposition machine main body

Claims (1)

[Claims] 1. A microprocessor that performs arithmetic processing, an oscillation circuit that drives a crystal oscillator connected to the microprocessor via a first control system, and a frequency counter that reads the frequency of the crystal oscillator and feeds it back to the microprocessor via an interface. is connected to the microprocessor via an interface, and the frequency counter calculates the difference between the frequency input from the oscillation circuit and the frequency set by the microprocessor via the interface, and also the second control system and comparator. Vapor deposition control for frequency adjustment of a crystal oscillator, characterized in that it has a control box into which a threshold value is input from the microprocessor via the control box, and a vacuum vapor deposition machine control system connected to the control box via an interface. Device.