JPH0280571A - Member coated with carbon film and its formation - Google Patents
Member coated with carbon film and its formationInfo
- Publication number
- JPH0280571A JPH0280571A JP23316688A JP23316688A JPH0280571A JP H0280571 A JPH0280571 A JP H0280571A JP 23316688 A JP23316688 A JP 23316688A JP 23316688 A JP23316688 A JP 23316688A JP H0280571 A JPH0280571 A JP H0280571A
- Authority
- JP
- Japan
- Prior art keywords
- light
- film
- carbon
- electrodes
- transmissive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims description 42
- 229910052799 carbon Inorganic materials 0.000 title claims description 42
- 230000015572 biosynthetic process Effects 0.000 title description 5
- 238000006243 chemical reaction Methods 0.000 claims abstract description 15
- 239000011368 organic material Substances 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 239000012528 membrane Substances 0.000 claims description 2
- 239000007789 gas Substances 0.000 abstract description 24
- 239000000428 dust Substances 0.000 abstract description 9
- 238000000034 method Methods 0.000 abstract description 9
- 238000005268 plasma chemical vapour deposition Methods 0.000 abstract description 9
- 230000005611 electricity Effects 0.000 abstract description 7
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 abstract description 7
- 230000003068 static effect Effects 0.000 abstract description 7
- 238000000576 coating method Methods 0.000 abstract description 6
- 239000011248 coating agent Substances 0.000 abstract description 5
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 abstract description 5
- 239000000654 additive Substances 0.000 abstract description 4
- 229930195733 hydrocarbon Natural products 0.000 abstract description 3
- 150000002430 hydrocarbons Chemical class 0.000 abstract description 3
- 230000000996 additive effect Effects 0.000 abstract description 2
- 239000012159 carrier gas Substances 0.000 abstract description 2
- 238000005530 etching Methods 0.000 abstract description 2
- 229920001225 polyester resin Polymers 0.000 abstract description 2
- 239000004645 polyester resin Substances 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 39
- 239000000758 substrate Substances 0.000 description 19
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 7
- 229910052731 fluorine Inorganic materials 0.000 description 7
- 239000011737 fluorine Substances 0.000 description 7
- 239000001257 hydrogen Substances 0.000 description 6
- 229910052739 hydrogen Inorganic materials 0.000 description 6
- 230000001681 protective effect Effects 0.000 description 6
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 5
- 239000005977 Ethylene Substances 0.000 description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 239000002131 composite material Substances 0.000 description 3
- 230000001276 controlling effect Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 229920000180 alkyd Polymers 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- -1 composed of carbon Chemical compound 0.000 description 2
- 238000004031 devitrification Methods 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 229910052500 inorganic mineral Inorganic materials 0.000 description 2
- 239000011707 mineral Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000005416 organic matter Substances 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 239000004923 Acrylic lacquer Substances 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 206010028980 Neoplasm Diseases 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 201000011510 cancer Diseases 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- LTVOKYUPTHZZQH-UHFFFAOYSA-N difluoromethane Chemical compound F[C]F LTVOKYUPTHZZQH-UHFFFAOYSA-N 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- GVGCUCJTUSOZKP-UHFFFAOYSA-N nitrogen trifluoride Chemical compound FN(F)F GVGCUCJTUSOZKP-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
Landscapes
- Polymerisation Methods In General (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
「発明の利用分野」
本発明は、風雨に曝され得るとともに、風切りがなされ
る自動車、オートバイ、自転車、船舶、航空機等の輸送
手段のフロントウィンド等の窓その他に対し、透光性の
有機物の部材の表面を、炭素または炭素を主成分とする
保護用被膜で覆ったものである。そして耐摩耗性を向上
させ、はこりの付着を防ぎ、静電気の発生を防いだもの
である。DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention applies to windows such as front windshields of vehicles, motorcycles, bicycles, ships, aircraft, etc., which are exposed to wind and rain and are subject to wind protection. , the surface of a translucent organic member is covered with carbon or a protective coating mainly composed of carbon. It also improves abrasion resistance, prevents the adhesion of lumps, and prevents the generation of static electricity.
本発明はかかる薄膜として、可視領域で透光性を有する
とともに、硬度が十分な炭素または炭素を主成分とする
被膜を摩耗防止用保護膜としたものである。特にこの保
護膜は、有機物上に密着させ得るとともに、その電気的
固有抵抗として1×106〜5X10”Ωcmを有せし
めて、静電気の発生を防ぐとともに、表面に平滑性を有
せしめ、はこりの付着を防がんとしたものである。In the present invention, such a thin film is made of carbon or a coating mainly composed of carbon, which is transparent in the visible region and has sufficient hardness, as a wear-preventing protective film. In particular, this protective film can be closely attached to organic substances, has an electrical resistivity of 1 x 106 to 5 x 10'' Ωcm, prevents the generation of static electricity, and has a smooth surface to prevent lumps. It prevents adhesion to cancer.
本発明は、かかるフロントガラス、サイドガラス、リア
ウィンド等の窓にプラズマCVD法で炭素膜または炭素
を主成分とする被膜を形成せんとしたものである。The present invention aims to form a carbon film or a film containing carbon as a main component on windows such as windshields, side glasses, rear windows, etc. by plasma CVD.
「従来技術」
一般にプラズマCVD法においては、平坦面を有する導
電性基板上に平面状に成膜する方法が工業的に有効であ
るとされている。さらに、プラズマCVD法でありなが
ら、スパッタ効果を伴わせつつ成膜させる方法も知られ
ている。その代表例である炭素膜のコーティングに関し
ては、本発明人の出願になる特許願「炭素被膜を有する
複合体およびその作製方法J (特願昭56−1469
36 昭和56年9月17日出願)が知られている。"Prior Art" Generally, in the plasma CVD method, a method of forming a film in a planar shape on a conductive substrate having a flat surface is considered to be industrially effective. Furthermore, a method is also known in which a film is formed using a plasma CVD method while also producing a sputtering effect. Regarding carbon film coating, which is a typical example, the patent application filed by the present inventor is entitled "Composite with Carbon Film and Method for Preparing the Same J" (Japanese Patent Application No. 56-1469)
36 (filed on September 17, 1982) is known.
しかし、これらは一対の電極のみを用いる平行平板型の
一方の電極(カソード側)に基板を配設し、導体基板で
あるため、自ら発生するセルフバイアスを用いて平坦面
の上面に炭素膜を成膜する方法である。However, since these are conductive substrates with a substrate placed on one electrode (cathode side) of a parallel plate type using only a pair of electrodes, a carbon film is formed on the top surface of the flat surface using self-generated self-bias. This is a method of forming a film.
「従来の問題点」
しかし、かかるスパッタ効果を伴わせつつ成膜させる従
来例は、フロントウィンド、特に自動車またはオートバ
イ等の曲面を有する基体上または家の窓上に膜を作るこ
とができない。このため、大容量空間で一度に多数の部
材に対し膜を形成する方法が求められていた。本発明は
かかる目的のためになされたものである。``Conventional Problems'' However, in the conventional method of forming a film while producing a sputtering effect, it is not possible to form a film on a curved substrate such as a windshield, especially a car or motorcycle, or a window of a house. For this reason, there has been a need for a method of forming films on a large number of members at once in a large volume space. The present invention has been made for this purpose.
「問題を解決すべき手段」
本発明は、風雨に曝され得るとともに、風切りがなされ
る自動車、オートバイ、自転車、船舶、航空機等のフロ
ントウィンドその他の透光性を有する有機物の表面を有
する部材上に、保護膜として、炭素または炭素を主成分
とする被膜を設けたものである。この被膜に固有抵抗と
して1×lo6〜5X10”Ωcmを有せしめ、はこり
(一般に絶縁性または鉱物性)を伴う摩擦による静電気
の発生を防ぎ、ひいてはほこりの付着、はこりによる透
光性表面の微小傷の発生による失透または「にごりjを
防ぎ、常に鮮やかな透光性の面を保存せしめたものであ
る。"Means to Solve the Problem" The present invention is directed to the front windshield of automobiles, motorcycles, bicycles, ships, aircrafts, etc., which are exposed to the wind and rain, and which are exposed to the wind and wind, and other members having surfaces of transparent organic materials. In addition, carbon or a film containing carbon as a main component is provided as a protective film. This coating has a specific resistance of 1 x lo6 to 5 x 10" Ωcm, which prevents the generation of static electricity due to friction with chips (generally insulating or mineral), and also prevents dust from adhering to the surface and preventing the light-transmitting surface from being damaged by chips. This prevents devitrification or turbidity due to the occurrence of minute scratches, and maintains a bright translucent surface at all times.
本発明は、かかる目的の保護膜として、固有抵抗がビッ
カース硬度として600〜6000Kg/co+2の値
を有するプラズマ重合またはCVD法による炭素または
炭素を主成分とする膜を有機物上に密着せしめ得ること
の発見に基づく。The present invention provides that, as a protective film for this purpose, carbon or a film mainly composed of carbon, which has a specific resistance of 600 to 6000 Kg/co+2 in terms of Vickers hardness and is produced by plasma polymerization or CVD, can be closely adhered onto an organic substance. Based on findings.
本発明は、かかるプラズマ重合即ちプラズマCVD用と
して、反応空間の一端側および他端側に互いに離間して
第1の一対の電極(第1および第2の電極)を配設する
。さらにこの空間内に交流バイアスを加えるための第2
の一対の電極(第3および第4の電極)を設け、その間
に被形成面を有する基体、部材を基板または部材のホル
ダ(20)を用いて配設する。このホルダは接地レベル
の反応容器とはキャパシタ(19)を介して連結してい
る。反応性気体のプラズマ化のため、一対の電極間に第
1の交番電圧を印加する。このそれぞれの電極には、接
地に対して互いに位相が1800または06異なった高
周波電圧をそれぞれの高周波電源より印加し、互いに対
称または同相の交番電圧を印加する。そして結果として
合わせて実質的に1つの高周波の交番電圧として枠構造
内に印加し、反応性気体を完全に分解、電離させるため
の高周波プラズマを誘起させる。さらにそのそれぞれの
高周波電源の他端を接地せしめる。また基体または部材
を挟んで第2の一対の電極を具備せしめ、ここに第2の
交番電圧を印加する。すると第2の交番電圧で一方の電
極側で加速されたイオンが部材の被形成面上をスパッタ
しつつ、被形成面上に強く被膜化させる。この時、プラ
ズマ中であるため、部材が絶縁性であっても、この表面
のポジティブシースをへて不要電荷は反対面に至り、反
対面のプラズマ雰囲気を経て第2の一対の電極の他方に
電流を流すことができる。かくしてたとえ絶縁性の基体
または部材であっても、それを挾んで第2の一対の電極
を設け、その周波数を低くしてイオンを一方の電極から
他方の電極に半周期で到達できるように電極、反応圧力
、周波数を制御することにより、この絶縁性の基体また
は部材上にスパッタ効果を伴わせつつ薄膜を形成せんと
したものである。In the present invention, for such plasma polymerization or plasma CVD, a first pair of electrodes (first and second electrodes) are arranged at one end and the other end of a reaction space spaced apart from each other. Furthermore, a second
A pair of electrodes (third and fourth electrodes) are provided, and a substrate or member having a surface to be formed is placed therebetween using a holder (20) for the substrate or member. This holder is connected to the reaction vessel at ground level via a capacitor (19). A first alternating voltage is applied between the pair of electrodes to turn the reactive gas into plasma. High frequency voltages having phases different from each other by 1800 or 06 with respect to ground are applied from respective high frequency power sources to each electrode, and alternating voltages which are symmetrical or in phase with each other are applied. As a result, substantially one high-frequency alternating voltage is applied within the frame structure to induce a high-frequency plasma for completely decomposing and ionizing the reactive gas. Furthermore, the other end of each high frequency power source is grounded. Further, a second pair of electrodes is provided with the base body or member sandwiched therebetween, and a second alternating voltage is applied thereto. Then, ions accelerated on the one electrode side by the second alternating voltage sputter on the formation surface of the member and form a strong film on the formation surface. At this time, because it is in plasma, even if the member is insulating, the unnecessary charge passes through the positive sheath on this surface and reaches the opposite surface, and passes through the plasma atmosphere on the opposite surface to the other of the second pair of electrodes. Can conduct current. Thus, even if the substrate or member is insulating, a second pair of electrodes is provided between it and the frequency is lowered so that ions can reach from one electrode to the other in half a cycle. This method attempts to form a thin film on this insulating substrate or member while producing a sputtering effect by controlling the reaction pressure and frequency.
第1の交番電圧を1〜50MHzの反応性気体のプラズ
マグロー放電の生じやすい周波数とし、第2の交番電圧
を10Hz〜100KHzの反応性気体に運動エネルギ
を加え被形成面上にスパッタ作用を与える周波数として
それぞれを独立にその出力、周波数を制御して印加する
。この第2の交番電圧発生用の一対の電極はそれぞれ独
立の電源よりなり、位相を180°かえて加えている。The first alternating voltage is set to a frequency of 1 to 50 MHz, at which plasma glow discharge of the reactive gas is likely to occur, and the second alternating voltage is set to a frequency of 10 Hz to 100 KHz, which applies kinetic energy to the reactive gas to give a sputtering effect on the surface to be formed. Each is applied as a frequency by controlling its output and frequency independently. The pair of electrodes for generating the second alternating voltage are each provided with an independent power source, and the voltages are applied with their phases shifted by 180°.
その電源の位相は共通接地レベルとした。またこの第2
の交番電界により被形成面上には負の直流の自己バイア
スが重畳して印加される。この直流成分を外部にもらす
ことを防ぐため、ホルダと反応容器との間はキャパシタ
で遮断している。すると第1の交番電圧により、プラズ
マ活性化した気体を自己バイアスにより基体上に加速衝
突させて、基体上での不要のチャージアップした電荷を
交流の第2の電圧により除去する。かくして被形成面が
絶縁性を有する有機物であっても、その表面にも導体面
と実質的に同様に被膜形成を行い得るようにしたもので
ある。The phase of the power supply was set to the common ground level. Also this second
Due to the alternating electric field of , a negative direct current self-bias is superimposed and applied onto the surface to be formed. In order to prevent this direct current component from leaking to the outside, a capacitor is used to isolate the holder and the reaction vessel. Then, the first alternating voltage causes the plasma-activated gas to accelerate and collide onto the substrate by self-biasing, and the unnecessary charged-up charges on the substrate are removed by the second alternating voltage. In this way, even if the surface to be formed is an insulating organic material, a film can be formed on the surface in substantially the same manner as on a conductive surface.
この薄膜の形成の1例として、エチレン(C2H4)。One example of this thin film formation is ethylene (C2H4).
メタン(CH4)、アセチレン(CJz)のような炭化
水素気体またはこれと弗化窒素の混合気体またはCzF
a。Hydrocarbon gases such as methane (CH4) and acetylene (CJz) or mixed gases of these and nitrogen fluoride or CzF
a.
CJs、 CF4. CHzh等の弗化炭素の如き炭素
弗化物気体を導入し、分解せしめることによりSP3軌
道を有するダイヤモンドと類似のC−C結合をつくり、
比抵抗(固有抵抗HX 10’〜5X10′!Ωcm代
表的にはlXl0”〜5×1012Ωcmを有するとと
もに、光学的エネルギバンド巾(Egという)が1.O
eV以上、好ましくは1.5〜5.5eVを有する可視
領域で透光性のダイヤモンドと類似の特性を有する炭素
膜または炭素を主成分(副成分の主たるものは水素、弗
素、窒素である)とする被膜を形成した。CJs, CF4. By introducing a carbon fluoride gas such as carbon fluoride such as CHzh and decomposing it, a C-C bond similar to that of diamond having an SP3 orbital is created.
It has a specific resistance (specific resistance H
eV or more, preferably 1.5 to 5.5 eV, and a carbon film having properties similar to transparent diamond in the visible region, or carbon as the main component (the main subcomponents are hydrogen, fluorine, and nitrogen) A film was formed.
本発明を用いた透光性有機物は、固有抵抗1×10■5
Ωcm以上の絶縁性部材であり、材料は、ポリエステル
樹脂、アルキド樹脂、オイルフリーアルキド樹脂、不飽
和ポリエステル樹脂、アクリル樹脂、アミン樹脂が用い
られる。特に自動車ライン用にはアクリルラッカー、ア
クリルメラミン、ブロックアクリルウレタンの有機溶融
型の有機物とした。The translucent organic material used in the present invention has a specific resistance of 1×10×5
It is an insulating member with a resistance of Ωcm or more, and the materials used include polyester resin, alkyd resin, oil-free alkyd resin, unsaturated polyester resin, acrylic resin, and amine resin. In particular, for automobile lines, organic melting type organic materials such as acrylic lacquer, acrylic melamine, and block acrylic urethane were used.
本発明方法での成膜に際し、弗素の如きハロゲン元素と
窒素とを、プラズマCVD中に炭化物気体に加えて同時
に混入させて、厚さ方向に均一な濃度勾配を設けた炭素
を主成分とする被膜または添加物の有無を制御した多層
の複合膜を作ってもよい。When forming a film using the method of the present invention, a halogen element such as fluorine and nitrogen are mixed simultaneously with carbide gas during plasma CVD to create a film with a uniform concentration gradient in the thickness direction, and the main component is carbon. Multilayer composite membranes may be created with controlled presence or absence of coatings or additives.
以下に図面に従って本発明の作製方法を記す。The manufacturing method of the present invention will be described below according to the drawings.
「実施例1」
第2図は、自動車のフロントウィンド等の基体または部
材上に薄膜形成方法を実施するためのプラズマCVD装
置の概要を示す。"Example 1" FIG. 2 shows an outline of a plasma CVD apparatus for carrying out a method of forming a thin film on a substrate or member such as a front window of an automobile.
図面において、プラズマCVD装置の反応容器(7)は
ゲート弁(9)で外部と仕切られている。ガス系(30
)において、キャリアガスであるアルゴンを(31)よ
り、反応性気体である炭化水素気体、例えばメタン、エ
チレンを(32)より、添加物気体である弗化炭素(C
zF6.C:+Fs)を(33)より、反応容器のエツ
チング用気体である酸素を(34)より、バルブ(28
)、流量計(29)をへて反応系(50)中にノズル(
25)より導入する。エチレンと二弗化炭素とを導入す
ると、水素と弗素が添加されたsp’結合を多数有する
ダイヤモンド状炭素膜(DLCともいうが、添加物が添
加されたDLCを含めて本発明は炭素または炭素を主成
分とする被膜という)を成膜できる。In the drawing, a reaction vessel (7) of the plasma CVD apparatus is separated from the outside by a gate valve (9). Gas type (30
), the carrier gas argon is added from (31), the reactive gas hydrocarbon gas such as methane or ethylene is added from (32), and the additive gas fluorocarbon (C
zF6. C: +Fs) from (33), oxygen which is the etching gas for the reaction vessel from (34), and valve (28).
), the nozzle (
25). When ethylene and carbon difluoride are introduced, the diamond-like carbon film (also referred to as DLC, which has a large number of sp' bonds to which hydrogen and fluorine are added, and the present invention includes DLC to which additives are added) It is possible to form a film whose main component is
これと同一主成分の被膜を作るため、C2F4.C:l
F8を(32)より、またNH,を(33)より導入し
て形成してもよい。In order to make a film with the same main component as this, C2F4. C:l
It may also be formed by introducing F8 from (32) and NH, from (33).
この反応容器(7)の上下に第1の一対の電極を同一形
状を有せしめて第1および第2の電極(3−1)。A first pair of electrodes having the same shape are provided above and below this reaction container (7) to form first and second electrodes (3-1).
(3−2)をアルミニウムの金属メツシュで構成せしめ
る。反応性気体はノズル(25)より下方向に放出され
る。さらに第2の一対の電極である第3の電極(13−
1)、(13−2)、 ・・・(13−n)と他の第4
の電極(13’ −1) 、 (13°−2) ・・
・(13’−n)(それぞれを集合させて第3および第
4の電極という)を基体または部材を互いにはさみこみ
配置とする。基体または部材(1−) 、 (1−2)
・・・(1−n)は絶縁材料であるが、ここに第2の交
番電圧を加え、交流的には実質的に導体化してバイアス
を印加した。基体または部材(1)上の有機物の被形成
面(1°)には、プラズマ雰囲気またはポジティブシー
スができ、負の自己バイアスが印加される。この負の自
己バイアスが積極的に発生するよう、第2の交番電圧の
周波数をl0Hz〜100Kllzとイオンが第3と第
4の電極間を半周期(半サイクル)の間にゆきわたるよ
うに低い周波数とした。基体または部材(1)は有機物
の被形成面(1′)を有し、第1の高周波の交番電圧に
よりグロー放電のプラズマ化した反応性気体は、反応空
間(8)で均一に分散し、反応空間でのプラズマ電位を
均質にした。(3-2) is made of aluminum metal mesh. The reactive gas is emitted downward from the nozzle (25). Further, a third electrode (13-
1), (13-2), ... (13-n) and other fourth
electrodes (13'-1), (13°-2)...
- (13'-n) (collectively referred to as the third and fourth electrodes) are arranged by sandwiching the base or members between each other. Substrate or member (1-), (1-2)
... (1-n) is an insulating material, but a second alternating voltage is applied thereto to make it substantially conductive in terms of alternating current, and a bias is applied. A plasma atmosphere or a positive sheath is created on the surface (1°) on which the organic substance is formed on the substrate or member (1), and a negative self-bias is applied. In order to actively generate this negative self-bias, the frequency of the second alternating voltage is set to 10Hz to 100Kllz, a low frequency such that ions spread between the third and fourth electrodes during a half cycle. And so. The substrate or member (1) has a surface (1') on which an organic substance is formed, and the reactive gas that has been turned into plasma by glow discharge due to the first high-frequency alternating voltage is uniformly dispersed in the reaction space (8), The plasma potential in the reaction space was made homogeneous.
さらにプラズマ反応空間での電位分布をより等しくさせ
るため、電源系(40)には独立した二種類の周波数の
交番電圧が印加できるようになっている。第1の交番電
圧は1〜100MHz例えば13.56MtlzO高周
波であり、一対をなす2つの電源(15−1)。Furthermore, in order to make the potential distribution in the plasma reaction space more equal, alternating voltages of two independent frequencies can be applied to the power supply system (40). The first alternating voltage is a high frequency of 1 to 100 MHz, for example 13.56 MtlzO, and the two power supplies (15-1) form a pair.
(15−2)即ち(15)よりLCR回路でできたマツ
チングボックス(16−1) 、 (16−2)に至る
。このマツチングボックスでの互いの位相は位相調整器
(26)により調整し、互いに180°またはOoずれ
て供給できるようにしている。そして対称型または同相
型の出力を有し、電源(15−1) 、 (15−2)
のそれぞれの−端(4−1) 、 (4−2)は一対の
第1および第2の電極(3−1) 、 (3−2)にそ
れぞれ連結されている。また、それぞれの電源(15−
1) 、 (15−2)の他端は接地(5−1)(5−
2) されている。第2の10Hz〜100Ktlz例
えば50Hzの交番電圧が電源(17)即ち(17−1
) 、 (17−2)より一対の第3の電極(13−1
)、 ・・・(13−n)および第4の電極(13”
−1)・・・(13’−n)に連結されており、印加さ
れている。その一対の電極(13) 、 (13’ )
での出力はこの一対の電極にはさまれた基体または部材
(1)に自己バイアスがかかるようになされている。(15-2) That is, (15) leads to matching boxes (16-1) and (16-2) made of LCR circuits. The mutual phases in this matching box are adjusted by a phase adjuster (26), so that the signals can be supplied with a difference of 180 degrees or Oo from each other. It has a symmetrical or in-phase output, and the power supply (15-1), (15-2)
The respective negative ends (4-1) and (4-2) are connected to a pair of first and second electrodes (3-1) and (3-2), respectively. Also, each power supply (15-
1), (15-2) other end is grounded (5-1) (5-
2) It has been done. A second 10Hz to 100Ktlz, for example 50Hz alternating voltage is applied to the power supply (17), i.e. (17-1
), a pair of third electrodes (13-1) from (17-2)
), ... (13-n) and the fourth electrode (13"
-1)...(13'-n) and is applied. The pair of electrodes (13), (13')
The output is such that a self-bias is applied to the substrate or member (1) sandwiched between the pair of electrodes.
かくして反応空間にプラズマ(8)が発生する。Plasma (8) is thus generated in the reaction space.
排気系(25)は、圧力調整バルブ(21)、ターボ分
子ポンプ(22)、 ロータリーポンプ(23)を経て
不要気体を排気する。The exhaust system (25) exhausts unnecessary gas through a pressure regulating valve (21), a turbo molecular pump (22), and a rotary pump (23).
これらの反応性気体は、反応空間(60)で0.001
〜1.0torr例えば0.05torrとした。These reactive gases are present in the reaction space (60) at 0.001
~1.0 torr, for example, 0.05 torr.
かかる空間において、13.56MHzの周波数の0.
5〜5KW(単位面積あたり0.03〜3W/cm2)
例えばIKW(単位面積あたり0.6W/cm”の高エ
ネルギ)の第1の高周波電圧を加える。さらに第2の交
番電圧による交流バイアスの印加により、被形成面上に
は200〜−600V (例えばその出力は1に−)の
負の自己バイアス電圧が印加されており、この負の自己
バイアス電圧により加速された反応性気体を基体または
部材上にスパッタしつつ成膜し、かつ緻密な膜とするこ
とができた。In such a space, the frequency of 13.56 MHz is 0.
5~5KW (0.03~3W/cm2 per unit area)
For example, a first high frequency voltage of IKW (high energy of 0.6 W/cm" per unit area) is applied. Furthermore, by applying an alternating current bias with a second alternating voltage, a voltage of 200 to -600 V (for example, A negative self-bias voltage of 1 to -) is applied to the output, and a reactive gas accelerated by this negative self-bias voltage is sputtered onto a substrate or member to form a film, and a dense film is formed. We were able to.
反応性気体は、例えばエチレンと弗化炭素の混合気体と
した。その割合はCzFi/CzH4= 1/4〜4/
1とし、代表的には1/1である。この割合を可変する
ことにより、透過率および比抵抗を制御することができ
る。基体または部材(1)の温度は〜150°C1代表
的には外部加熱をすることなく室温に保持させる。かく
して被形成面上は比抵抗1×106〜5X10”Ωcm
を有し、有機樹脂上にも密着させて成膜させる。可視光
に対し、透光性のアモルファス構造または結晶構造を有
する弗素と水素とが添加された炭素または炭素を主成分
とする被膜を0.1〜8μm例えば0.5 μm(平面
部)、1〜3μm(凸部)に生成させた。成膜速度は1
00〜1000人/分を有していた。The reactive gas was, for example, a mixed gas of ethylene and carbon fluoride. The ratio is CzFi/CzH4= 1/4~4/
1, typically 1/1. By varying this ratio, transmittance and specific resistance can be controlled. The temperature of the substrate or member (1) is typically maintained at room temperature, ˜150° C., without external heating. Thus, the resistivity on the surface to be formed is 1×106 to 5×10”Ωcm.
The film is also formed in close contact with the organic resin. A film containing carbon or carbon as a main component to which fluorine and hydrogen have been added and has an amorphous or crystalline structure that is transparent to visible light is 0.1 to 8 μm thick, for example, 0.5 μm (flat portion), 1 ~3 μm (convex portion) was generated. The film formation rate is 1
00-1000 people/min.
かくして部材であるフロントウィンド、その他の部材に
炭素を主成分とする被膜、特に炭素中に水素を30原子
%以下含有するとともに、0.3〜1゜原子χ弗素が混
入した炭素を形成させることができた。有機物上に10
0〜2000人の厚さにエチレンのみによる第1の炭素
を設け、さらにその上に弗素と水素とが添加された炭素
を主成分とする被膜をも多層に形成させることができた
。Thus, it is possible to form a coating mainly composed of carbon on the front windshield and other components, especially carbon containing 30 atomic % or less of hydrogen and 0.3 to 1° of χ fluorine mixed therein. was completed. 10 on organic matter
It was possible to provide a first carbon film made of only ethylene to a thickness of 0 to 2,000 people, and then form a multilayer film on top of which the main component was carbon to which fluorine and hydrogen were added.
「実施例2」
この実施例は実施例1で用いた装置により、第1図に示
す如(、透光性有機物の部材要部上に炭素を主成分とす
る膜を作製した例である。"Example 2" This example is an example in which a film containing carbon as a main component was produced on the main part of a translucent organic material as shown in FIG. 1 using the apparatus used in Example 1.
第1図(A)において、自動車のフロントウィンド(1
)の縦断面図を示す。その横断面部を第1図(B)に示
す。In FIG. 1(A), the front window (1
) is shown. The cross section is shown in FIG. 1(B).
第1図(A) 、 (B)において、この透光性プラス
チックス(1)は軽量であり、例えばアクリル樹脂で設
けられている。その被形成面を有する基体または部材(
1)上に炭素または炭素を主成分とする耐摩耗性の保護
膜(45)を0.1〜8μmの厚さに設けた。In FIGS. 1A and 1B, the translucent plastic (1) is lightweight and is made of, for example, acrylic resin. Substrate or member having the surface to be formed (
1) A wear-resistant protective film (45) containing carbon or carbon as a main component was provided thereon with a thickness of 0.1 to 8 μm.
本発明において、特にこの炭素または弗素が添加された
炭素を主成分とする被膜は静電気の発生によるゴミの付
着を防ぐため、その比抵抗は1×106〜5×10′2
Ωcmの範囲、特に好ましくは1×107〜lXl0”
Ωcmの範囲とした。In the present invention, in order to prevent the adhesion of dust due to the generation of static electricity, the coating mainly composed of carbon or fluorine-added carbon has a specific resistance of 1 x 106 to 5 x 10'2.
in the range of Ωcm, particularly preferably from 1×107 to lXl0”
The range was set to Ωcm.
第1図(C)はこのウィンドの表面のみに形成したもの
である。この第1図(^)、(C)の縦断面図はサイド
ウィンド、ミラー表面であってもよい。大1図(D)は
球に対し、また(E)は円筒物上に形成したのものであ
る。これらは実使用上風切りが強く、また鉱物質のほこ
りが衝突しやすく、結果として失透、濁りが摩耗により
発生しやすいため、本発明は優れたものである。FIG. 1(C) shows the window formed only on the surface. The vertical cross-sectional views of FIGS. 1(^) and (C) may be of a side window or a mirror surface. Figure 1 (D) is for a sphere, and (E) is for a cylinder. The present invention is excellent because these materials are subject to strong wind blowing in actual use, and mineral dust is likely to collide with them, resulting in devitrification and turbidity due to abrasion.
「効果」
本発明は無機ガラス、有機物のいずれの透光性材料に対
しても有効であり、特にその上面を水はけのよい弗素が
添加されたビッカース硬度600〜3000Kg/cm
2の炭素を主成分とする被膜、またはビッカース硬度が
1000〜7000Kg/cm2の炭素(水素も添加さ
れている)の多層膜を有機物上に密着させてコートした
。その結果、風雨に曝され、またほこりを伴う風切りの
多い凸部により厚く耐摩耗性膜として形成することがで
きた。"Effects" The present invention is effective for both inorganic glass and organic translucent materials.In particular, the upper surface has a Vickers hardness of 600 to 3000 kg/cm with fluorine added for good drainage.
2, or a multilayer film of carbon (hydrogen is also added) having a Vickers hardness of 1,000 to 7,000 kg/cm 2 was coated in close contact with the organic material. As a result, it was possible to form a thick and wear-resistant film on convex portions that are exposed to the wind and rain and are exposed to dust.
これまでの自動車等のフロントウィンドは晴天時はこり
がきわめてつきやすかった。しかし本発明により、その
表面に絶縁性のほこりの衝突によって生ずる静電気の発
生およびそれに伴うほこりの付着を軽減することができ
た。Until now, the front windows of automobiles were extremely prone to becoming stiff on sunny days. However, according to the present invention, it has been possible to reduce the generation of static electricity caused by the collision of insulating dust on the surface and the accompanying dust adhesion.
以上に示す如く、透光性の風切りまたほこりの付着を防
ぐ窓に特に透光の遮光もDLCの光学的エネルギハンド
中を制御することにより可能であり、無機ガラスまたは
有機物において耐熱性を有さない有機物上にも密着させ
得ることはこれまで柔らかいためまったく使えなかった
プラスチック製ウィンドを作ることの可能性を実現した
ことで有効である。As shown above, by controlling the optical energy hand of DLC, it is possible to block light in windows that are transparent and prevent dust from adhering, and it is also possible to use inorganic glass or organic materials that have heat resistance. The ability to adhere tightly to organic materials that are not present is effective because it realizes the possibility of making plastic windows, which until now could not be used at all due to their softness.
以上の説明より明らかな如く、本発明は有機樹脂または
これらの多層膜をコーティングして設けたものに特に有
効である。この複合体は、他の多くの実施例にみられる
如く、その応用ははかりしれないものであり、特にこの
炭素が150°C以下の低温で形成でき、このため下地
の塗装面の有機物の変成による色調も変わらず、その硬
度また基体または部材に対する密着性がきわめて優れて
いるのが特徴である。As is clear from the above description, the present invention is particularly effective for materials coated with organic resins or multilayer films thereof. The applications of this composite, as seen in many other examples, are enormous, especially since the carbon can be formed at low temperatures below 150°C, and therefore it is difficult to transform the organic matter of the underlying painted surface. The color tone remains the same, and its hardness and adhesion to substrates or members are extremely excellent.
第1図は本発明のフロントウィンド等の部材上への炭素
膜または炭素を主成分とした保護膜をコートシた例およ
びその要部を示す。
第2図は本発明のプラズマCVD装置の製造装置の概要
を示す。FIG. 1 shows an example in which a carbon film or a protective film mainly composed of carbon is coated on a member such as a front window according to the present invention, and its essential parts. FIG. 2 shows an outline of a manufacturing apparatus for a plasma CVD apparatus according to the present invention.
Claims (1)
1×10^6〜5×10^1^2Ωcmの固有抵抗を有
する炭素膜または炭素を主成分とする膜が設けられたこ
とを特徴とする炭素膜で覆われた部材。 2、特許請求の範囲第1項において、透光性部材は風雨
に曝され得る自動車、オートバイ、自転車、船舶または
航空機のフロントウインド、リアウインド、サイドミラ
ー、サイドウインドよりなることを特徴とする炭素膜で
覆われた部材。 3、特許請求の範囲第1項において、透光性部材は有機
物よりなり、前記有機物上に透光性炭素膜が設けられた
ことを特徴とする炭素膜で覆われた部材。 4、反応容器内に高周波プラズマを発生させるための第
1の一対の電極を設け、前記反応容器内に絶縁性部材を
配設して、減圧下に保持して、前記部材を挟んで第2の
一対の電極を有し、この電極間に交流のバイアスを印加
するとともに、前記減圧下の雰囲気中に炭素化物気体を
導入して、前記第1の一対の電極に高周波電圧を印加し
て、前記気体をプラズマ化せしめることにより、前記部
材上に炭素または炭素を主成分とする被膜を形成するこ
とを特徴とする炭素膜で覆われた部材の 作製方法。[Scope of Claims] 1. A light-transmitting member having insulating properties, the main component being a carbon film or carbon having a specific resistance of 1×10^6 to 5×10^1^2 Ωcm on the member surface. A member covered with a carbon film, characterized in that it is provided with a film that protects the carbon film. 2. In claim 1, the light-transmitting member comprises a front window, rear window, side mirror, or side window of an automobile, motorcycle, bicycle, ship, or aircraft that can be exposed to wind and rain. A member covered with a membrane. 3. A member covered with a carbon film according to claim 1, wherein the light-transmitting member is made of an organic material, and a light-transmitting carbon film is provided on the organic material. 4. A first pair of electrodes for generating high-frequency plasma is provided in a reaction container, an insulating member is provided in the reaction container, and the second electrode is placed with the member in between. having a pair of electrodes, applying an alternating current bias between the electrodes, introducing a carbonide gas into the atmosphere under reduced pressure, and applying a high frequency voltage to the first pair of electrodes; A method for producing a member covered with a carbon film, characterized in that carbon or a film containing carbon as a main component is formed on the member by turning the gas into plasma.
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23316688A JP2736421B2 (en) | 1988-09-16 | 1988-09-16 | Member covered with carbon film and method of manufacturing the same |
| US07/403,821 US5041201A (en) | 1988-09-16 | 1989-09-07 | Plasma processing method and apparatus |
| KR1019890013120A KR920007022B1 (en) | 1988-09-16 | 1989-09-11 | Plasma treatment method and apparatus |
| EP89309352A EP0359567B1 (en) | 1988-09-16 | 1989-09-14 | Plasma processing method and apparatus |
| DE68917550T DE68917550T2 (en) | 1988-09-16 | 1989-09-14 | Method and device for plasma treatment. |
| CN 89107237 CN1025353C (en) | 1988-09-16 | 1989-09-16 | Plasma treatment method and apparatus |
| CN 93120148 CN1090889A (en) | 1988-09-16 | 1993-12-04 | Plasma treatment method and apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23316688A JP2736421B2 (en) | 1988-09-16 | 1988-09-16 | Member covered with carbon film and method of manufacturing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0280571A true JPH0280571A (en) | 1990-03-20 |
| JP2736421B2 JP2736421B2 (en) | 1998-04-02 |
Family
ID=16950757
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23316688A Expired - Lifetime JP2736421B2 (en) | 1988-09-16 | 1988-09-16 | Member covered with carbon film and method of manufacturing the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2736421B2 (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1999045168A1 (en) * | 1998-03-05 | 1999-09-10 | Nissin Electric Co., Ltd. | Plasma cvd method, plasma cvd apparatus, and electrode |
| US6136386A (en) * | 1996-06-27 | 2000-10-24 | Nissin Electric Co., Ltd. | Method of coating polymer or glass objects with carbon films |
| US6465057B1 (en) | 1995-09-13 | 2002-10-15 | Nissin Electric Co., Ltd. | Plasma CVD method and apparatus |
| US6893720B1 (en) | 1997-06-27 | 2005-05-17 | Nissin Electric Co., Ltd. | Object coated with carbon film and method of manufacturing the same |
| JP2006298485A (en) * | 2005-03-25 | 2006-11-02 | Jfe Steel Kk | Coil processing / conveying method and coil to which the method is applied |
-
1988
- 1988-09-16 JP JP23316688A patent/JP2736421B2/en not_active Expired - Lifetime
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6465057B1 (en) | 1995-09-13 | 2002-10-15 | Nissin Electric Co., Ltd. | Plasma CVD method and apparatus |
| US6136386A (en) * | 1996-06-27 | 2000-10-24 | Nissin Electric Co., Ltd. | Method of coating polymer or glass objects with carbon films |
| US6893720B1 (en) | 1997-06-27 | 2005-05-17 | Nissin Electric Co., Ltd. | Object coated with carbon film and method of manufacturing the same |
| WO1999045168A1 (en) * | 1998-03-05 | 1999-09-10 | Nissin Electric Co., Ltd. | Plasma cvd method, plasma cvd apparatus, and electrode |
| US6503579B1 (en) | 1998-03-05 | 2003-01-07 | Nissin Electric Co., Ltd. | Plasma CVD method, plasma CVD apparatus, and electrode |
| JP2006298485A (en) * | 2005-03-25 | 2006-11-02 | Jfe Steel Kk | Coil processing / conveying method and coil to which the method is applied |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2736421B2 (en) | 1998-04-02 |
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