JPH027040A - Processing vessel and processor for photographic sensitive material - Google Patents

Abstract

PURPOSE:To prevent the oxidation of processing solns., to reduce the size and weight of a processor and to effectively utilize the processing solns. by adjoining processing vessels each having slitlike inlet and outlet and a processing soln. reservoir. CONSTITUTION:A lower member 11A and upper members 11B, 11C, 11D are set and a film is led between the rollers 3A, 3B of a transferring system 3. When the system 3 is driven, in accordance with the rotation of the rollers 3A-3F, the film is transferred to processing parts and travels in processing soln. reservoirs 5A, 5B, 5C contg. processing solns. such as a developing soln., a bleach-fixing soln. and washing water. The solns. are fed by circulation pumps 6A, 6B, 6C through guide pipes 7A, 7B, 7C and discharged through discharge pipes 8A, 8B, 8C. By developing the film as mentioned above, the air oxidation of the processing solns. is prevented and cleaning is easily carried out. A small- sized lightweight processor ensuring easy maintenance is obtd.

Description

[Detailed Description of the Invention] [Industrial Application Field] The present invention is a method for developing a roll or sheet-like photographic material (including direct body color vapor, hereinafter simply referred to as a film). Regarding the processing tank and processing machine for photographic light-sensitive materials used for processing, in more detail, it is necessary to prevent atmospheric oxidation of the processing solution, to make it smaller and lighter, to be easy to maintain, and to perform development processing with a small amount of processing solution. The present invention relates to a processing tank and a processing machine for photographic materials suitable for.

[Prior Art] Conventionally, there are various methods for developing film, such as dipping, coating, and spraying or spraying. The method is a dipping treatment method in which the film is transported and sequentially treated while being immersed in the treatment liquid.

Also, among the immersion treatment methods, a multi-tank method is common. In an automatic developing machine using such an immersion processing method, #Kaisho 51-
No. 60526, No. 56-5544, Utility Model Publication No. 57-90
As described in No. 438, even a small one has a large capacity! Ij
The processing liquid is stored separately in multiple processing tanks of IfL size,
Each is heated to a temperature of m! by heating means such as a heater. ! The film is conveyed by a roller conveyance method, a belt conveyance method, or the like, and is configured to be guided to each processing tank. For example, in the case of a color developing tank, the processing liquid in the processing tank is drawn out little by little through a reflux pipe, recycled, and then returned to the processing tank.

Further, when the amount of the processing liquid decreases as the processing progresses, for example, when it is detected by a liquid level sensor or the like, or when the processing liquid becomes exhausted, replenishment of the replenishing liquid is performed.

[Problems to be Solved by the Invention] However, the processing liquid components of photographic light-sensitive materials are susceptible to air oxidation, and if they are not treated for a long period of time, the photographic performance after development will be adversely affected.

Therefore, in minilabs and the like that process small quantities, it is important to solve this problem of air oxidation.

Furthermore, if the treatment tank or treatment machine is left as is after treatment, components of the treatment liquid may precipitate, which may impede the next treatment.

On the other hand, in recent years, with the spread of small automatic processing machines called minilabs, it has become possible to receive prints within an hour of applying.

However, even in the case of a minilab system, the automatic processor is still quite large, and considering the situation in Japan where installation space is limited, there is a long-awaited need for an automatic or semi-automatic processor that is smaller and lighter. has been done. Furthermore, in the case of hobby use, it is desired to develop a processing tank and a processing machine for photographic materials that are easy to maintain and can be developed with a small amount of processing solution.

The present invention has been created in view of the above, and is capable of preventing air oxidation of a processing liquid, facilitating cleaning after processing, and being small and lightweight, and easy to maintain.
Moreover, the purpose is to clarify a processing tank and a processing machine for photographic light-sensitive materials that can be developed with a small amount of processing solution.Other objects and benefits of the present invention are as follows: This becomes clear from the following.

[Means for Solving the Problems] The photographic material processing tank of the present invention that achieves the above object has the following features:
■In a processing tank in which the photographic material is developed by being immersed in a processing solution stored in the tank, the entrance and exit of the photographic material to the tank is slit-shaped, and a liquid end holding portion is formed in the slit-shaped entrance and exit. ■ The liquid end holding part also serves as a film squeeze or scraper; ■ The liquid is held in contact with the liquid edge holding part to make the slit-shaped entrance and exit liquid-tight with the liquid; ■ The liquid is It is a cleaning liquid for transport system members; (1) The processing tank consists of an upper and lower member divided into upper and lower parts, and when the upper and lower members are set to process photographic material, a slit-shaped processing liquid reservoir is formed. 02 or more processing liquid reservoirs are formed adjacent to each other, and a transport system member is provided between the adjacent processing liquid reservoirs; (1) Cleaning liquid supply for pouring cleaning liquid into the transport system member. (2) The upper and lower surfaces of the upper and lower members forming the slit-shaped processing liquid reservoirs have means for reducing contact resistance with the photographic light-sensitive material.

Further, the processing machine (developing machine) for photographic light-sensitive materials of the present invention which achieves the above object has (1) a means for conveying the photographic light-sensitive materials, and the photographic light-sensitive materials are immersed in a processing liquid stored in a tank. In a processing machine for photographic light-sensitive materials, which is equipped with two or more processing tanks for developing the photographic material, the entrance and exit for the photographic light-sensitive material into the tank is in the form of a slit, and a liquid end holding portion is formed in the slit-shaped entrance and exit, so that the liquid can be carried out. The processing tank is configured to be held in contact with the liquid end holding portion to make the slit-shaped inlet and outlet liquid-tight with the liquid; When the upper and lower members are set, a slit-shaped processing liquid reservoir is formed, and two
The above processing liquid reservoirs are formed adjacent to each other, and a conveyance system member is provided between the adjacent treatment liquid reservoirs, and a cleaning liquid supply path for pouring the cleaning liquid to the conveyance system member is cleared; (1) conveyance system member; (2) A means for reducing contact resistance with the photographic material on the surfaces of the upper and lower members forming the slit-shaped processing liquid reservoir. It is characterized by having two or more processing tanks for photographic light-sensitive materials having the following characteristics: (1) The liquid end holding section also serves as a squeezing means.

[Example] Next, an example of a processing machine (developing machine) to which the present invention is applied will be described with reference to the accompanying drawings.

Fig. 1 is a schematic front view when the upper and lower members of the tank are set, Fig. 2 is a schematic front view when the set is released (the cleaning liquid supply path is omitted),
Fig. 3 is a plan view of the lower member of the tank, Fig. 4 is an explanatory view when the upper part of the liquid end holding part shown in Figs. 1 to 3 and Fig. 7 is made liquid-tight, and Fig. 5 is Fig. 8 is an explanatory view when the upper part of the liquid end holding part is made liquid-tight, Figs. FIG. 1O is an explanatory diagram showing two means for reducing the contact resistance of , and FIG. 1O is an explanatory diagram showing an example of stirring means.
1 is a frame, and this frame l has a light-shielding structure inside.
A processing section, which will be described later, is disposed inside, and in some cases, a waste liquid tank 2 may also be housed inside.

The film drive conveyance system 3 includes two rollers 3A, 3B, and 3C13D attached to each entrance and exit of the processing liquid reservoir.
, 3E, and 3F.

For the conveyance system roller 3A at the entrance of the processing liquid reservoir 5A,
The film may be left in place, or if desired, the leading edge of the film may be attached with a length of leader, and the leading edge of the trailing film may be connected to the trailing edge of the preceding film;
Alternatively, each film may be placed as it is, or a leader may be attached to it, and each film may be taken into the conveyance system one by one.

As shown in FIG. 1, the lower member 11A, upper members 11B, 11C1
When setting the IID, the leading film is guided as it is or between the leader rollers 3A and 3B, and when the drive conveyance system 3 is driven, the film is conveyed to each processing section as the rollers 3A to 3F rotate, and the film is transported to the processing liquid pool. 5A, 5B, 5
Drive in C.

In the illustrated embodiment, the processing liquid reservoir is a developing processing tank (
CD) 5A, a bleach-fixing tank (BF) 5B, and a washing tank (ST) 5C, but the processing solution pool may be divided in other ways. That is, for example, a developer tank (KCD) containing fogging agent -ST fixing tank (Fix), CD-Stop-BF, KCD-BF-3T, or CD-BF-
Fix -3T, CD-Bleach tank (BLix) -BF
-3T, CD-BF-13F-3T, etc. still,
The processing time in each processing tank can be adjusted by processing liquid reservoir 5A,
This may be done using the depth or distance of 5B and 5C.

Note that the transport rollers 3A to 3F may be configured to engage only on both sides of the film.

In one embodiment of the present invention, each processing liquid reservoir 5A, 5B, 5C
Each of the processing solutions is circulated by circulation pumps 6A, 6B, and 6C, and at least the development processing tank is desirably adjusted to an appropriate processing temperature.

That is, the processing liquid is passed through guide pipes 7A, 7B, 7C to the processing liquid reservoirs 5A, 5B, 5C by circulation pumps 6A, 6B, 6C prepared for each processing liquid reservoir 5A, 5B, 5C.
It has a circulation structure in which it is supplied to the water and discharged through discharge pipes 8A, 8B, and 8C.

The tips of the guide tubes 7A, 7B, 7C are connected to processing liquid reservoirs 5A, 5.
B, 5C are connected to the outlet side, and the discharge pipes 8A, 8B
, 8C are preferably connected to the inlet sides of the processing liquid reservoirs 5A, 5B, and 5C so that the processing liquid flows in the opposite direction to the film transport direction. There are also types that supply processing liquid in the forward and forward directions.
In the present invention included in the present invention, it is preferable to supply the processing liquid in a jet flow manner at a speed equal to or higher than the transport speed of the film. There is no particular limit to the jet speed, but the faster it is, the
This is preferable because the amount of treatment liquid that comes into contact with the film increases.

Note that the handling of the processing liquid is not limited to the above embodiment; (1) Prior to processing, the circulation pumps 6A, 6B, 6C
(2) A processing method in which the liquid circulation system is a separate stirring means; (3) A method in which the liquid circulation system is omitted and the so-called badge processing is performed (in this case, once to Any treatment method can be adopted, such as changing to a new solution after several treatments, reusing it, or replacing the entire lower member 11A in which the new solution is set. .

It is preferable that the cross-sectional shape of the slit-like processing liquid reservoirs 5A, 5B, and 5C, especially the width of the film running space, be as narrow as possible, and most of the processing liquid flow is directed toward the emulsion side of the film. It is preferable to set it to flow.

In the present invention, it is preferable to transfer the film in a meandering manner so that smooth conveyance can be achieved. In view of these demands, transport rollers 3B to 3E are arranged between the processing liquid pools 5A, 5B, and 5C so that adjacent processing liquid pools can be continuously transported, and guide members 10A to I
A meandering conveyance path is formed by the OD. The lower member 11A of the present invention has side walls 12A and 12B forming processing liquid reservoirs 5A, 5B and 5C.

However, 13A to 13F are processing liquid reservoirs 5A and 5B, respectively.
, 5C shows a liquid holding part that also serves as a squeeze valve, and 14A, ]4B, and 14C are temperature control heaters.

In the present invention, the entrance/exit for the photographic light-sensitive material to the processing tank is slit-shaped, and the slit-shaped entrance/exit is provided with a liquid end holding portion 13A.
~13F are formed respectively. And the liquid end holding part 1
3A to 13F also serve as squeezes or scrapers for the film, and are held in contact with the liquid residue holding parts 13A to 13F to form a slit-like entrance and exit in a liquid-tight manner (Water V, >
(See Figures 4 and 5). Most preferably, the liquid is a cleaning liquid (water, etc.) for the transport system members 3A to 3F, but is not limited to this, and is not limited to glycerin, higher alcohol,
The liquid-tight portion 15 may be directly filled with glycols such as ethylene glycol, diethylene glycol, and polyethylene glycol, alcohol amines such as monoethanolamine, jetanolamine, and triethanolamine, and other preservatives. may be mixed with the cleaning solution.

The liquid end holding parts 13A to 13F include a valve-like member curved upward as shown in FIG. 6, a valve-like member extending horizontally as shown in FIG. 7, and a valve-like member arranged in a V-shape as shown in FIG. Any member, such as a valve-shaped member, may be used as long as it can create a liquid-tight state by a liquid-tight part or a liquid reservoir 15 above the processing liquid level 16 and can allow the film to pass through. .

Since the liquid pool 15 disappears as the film passes through the liquid end holders 13A to 13F during processing, it is made liquid-tight again with a liquid such as a cleaning liquid after processing. Therefore, it is preferable that the transport systems 3A to 3F are located directly above the slit-like entrances and exits, and it is preferable that the exits of the liquid supply passages 17 are provided opposite to each other in each of the transport systems 3A to 3F.

The material of the upper and lower members 11A, IIB, IIC, and IID of the present invention does not matter, but it is preferable that they have chemical resistance.
It may also be made chemical resistant by surface treatment. Further, it is preferable to provide means for smoothly transporting the film through the slit-like liquid reservoirs 5A, 5B, and 5C. For example, surface treatment with silicone oil, Teflon, etc. to reduce surface resistance, or the upper and lower members 11
A, IIB, 11C1IID has hemispherical convex parts 4 on its surface.
Examples include providing a large number of protrusions A (see the left half of FIG. 9), or attaching fin-shaped protrusions 4B (see the left half of FIG. 9). Further, as the stirring means, the pump 6A,
Regardless of 6B, 60, etc., the styler as shown in FIG.
9 (magnetic type, etc.) may be used.

In Figure 1, 18 indicates a connecting rod for the upper member 11B, IIC, and IID, and F indicates a film.

[Effects of the Invention] According to the present invention, it is possible to prevent air oxidation of the processing solution, to facilitate cleaning after processing, and to be able to develop with a small and light weight, easy to maintain, and with a small amount of processing solution. It is possible to provide a processing tank and a processing machine for photographic materials that can be processed, and the solution pool is easy to clean and maintenance is easy, and the cleaning solution can be used to prevent air oxidation of the processing solution. There are also advantages.

[Brief explanation of the drawing]

Figure 1 is a schematic front view when the upper and lower members of the oak are set, Figure 2 is a schematic front view when the set is released (the cleaning liquid supply path is omitted), Figure 3 is a plan view of the lower member of the tank, and Figure 4 is a schematic front view when the upper and lower members of the oak are set. An explanatory diagram when the upper part of the liquid end holding part shown in Figs. 1 to 3 and Fig. 7 is made liquid-tight, and Fig. 5 is an explanatory diagram when the upper part of the liquid end holding part shown in Fig. 8 is made liquid-tight. FIG. 6 to FIG. 8 are explanatory diagrams showing three liquid-tight holding parts. FIG. 9 is an explanatory diagram showing the two sides of the means for reducing the contact resistance with the photographic light-sensitive material. FIG. 1O is an explanatory diagram showing an example of a stirring means. In the figure, each symbol indicates the following. 1: Frame 2: Waste liquid tank 3: Drive conveyance system 3A, 3B, 3C13D, 3E, 3F: Rollers 4A, 4
B: Convex portion, fins 5A, 5B, 5C: Processing liquid reservoir (processing tank) 6A, 6B,
6C: Pump 7A, 7B, 7C: Guide pipe 8A, 8B, 8C: Discharge pipe 9 Ni-styler 10A, IOB, IOC, IOD Ni-guide member 11
A, IIB, lIC111D: Upper and lower members 12A, 1
2B: Side wall 13A, 13B, 13C 113D, 13E, 13F Liquid end holding portion also serving as squeeze valve + 4A, 14B, 14C: Temperature control heater 15: Liquid-tight portion with cleaning water etc. 16: Processing liquid surface 17: Liquid supply path 18: Connection rod F of upper member: Film

Claims (1)

[Scope of Claims] 1. In a processing tank in which a photographic light-sensitive material is developed by being immersed in a processing solution stored in the tank, the entrance and exit of the photographic light-sensitive material to the tank is slit-shaped, and the slit-shaped entrance and exit A processing tank for photographic light-sensitive materials in which a liquid end holding portion is formed. 2. The processing tank for photographic materials according to claim 1, wherein the liquid end holding portion also serves as a film squeezer or scraper. 3. The processing tank for photographic light-sensitive materials according to claim 1 or 2, wherein the liquid is held in contact with the liquid end holding portion to make the slit-shaped inlet and outlet liquid-tight with the liquid. 4. The processing tank for photographic material according to claim 3, wherein the liquid is a cleaning liquid for transport system members. 5. Claim 1, wherein the processing tank is composed of upper and lower members divided into upper and lower parts, and a slit-shaped processing liquid reservoir is formed when the upper and lower members are set to process a photographic light-sensitive material.
, 2, 3 or 4. A processing tank for photographic material according to . 6. Processing of a photographic light-sensitive material according to any one of claims 1 to 5, wherein two or more processing liquid reservoirs are formed adjacent to each other, and a transport system member is provided between the adjacent processing liquid reservoirs. Tank. 7. The processing tank for photographic light-sensitive materials according to any one of claims 1 to 6, further comprising a cleaning liquid supply path for pouring cleaning liquid into the transport system member. 8. The processing bath for photographic light-sensitive materials according to any one of claims 5 to 7, further comprising means for reducing contact resistance with the photographic light-sensitive material on the surfaces of the upper and lower members forming the slit-shaped processing liquid reservoirs. 9. A processing machine for photographic light-sensitive materials comprising two or more processing tanks which have a means for transporting the photographic light-sensitive materials and develop the photographic light-sensitive materials by immersing them in a processing solution stored in the tanks,
A slit-shaped inlet/outlet for the photographic material into the tank, and a liquid end holding portion is formed in the slit-shaped inlet/outlet;
A photographic material processing machine that holds a liquid in contact with the liquid end holding portion to make a slit-shaped inlet and outlet liquid-tight with the liquid. 10. The processing tank is composed of upper and lower members divided into upper and lower parts, and when the upper and lower members are set to process a photographic material, a slit-shaped processing liquid reservoir is formed;
A processing machine for photographic light-sensitive materials, in which two or more processing liquid reservoirs are formed adjacent to each other, a conveying system member is provided between the adjacent processing liquid reservoirs, and a cleaning liquid supply path for pouring cleaning liquid into the conveying system member. . 11. Claim 1, wherein the conveyance system member is a conveyance drive roller and/or a floating roller that pinches and conveys the photosensitive material.
A processing machine for photographic material according to 0. 12. The photographic light-sensitive material according to claim 10 or 11, wherein the surfaces of the upper and lower members forming the slit-shaped processing liquid reservoir are provided with two or more processing tanks for the photographic light-sensitive material having means for reducing contact resistance with the photographic light-sensitive material. processing machine. 13. Claim 9, wherein the liquid end holding section also serves as a squeezing means.
13. A processing machine for photographic material according to any one of items 1 to 12.