JPH02132405A - Spectral filter and spectral measuring sensor - Google Patents
Spectral filter and spectral measuring sensorInfo
- Publication number
- JPH02132405A JPH02132405A JP63287265A JP28726588A JPH02132405A JP H02132405 A JPH02132405 A JP H02132405A JP 63287265 A JP63287265 A JP 63287265A JP 28726588 A JP28726588 A JP 28726588A JP H02132405 A JPH02132405 A JP H02132405A
- Authority
- JP
- Japan
- Prior art keywords
- wavelength
- cutoff
- filter
- spectral
- cutoff wavelength
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003595 spectral effect Effects 0.000 title claims abstract description 47
- 238000005259 measurement Methods 0.000 claims description 7
- 238000004611 spectroscopical analysis Methods 0.000 claims description 4
- 230000005540 biological transmission Effects 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 8
- 238000002834 transmittance Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012806 monitoring device Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/12—Generating the spectrum; Monochromators
- G01J3/26—Generating the spectrum; Monochromators using multiple reflection, e.g. Fabry-Perot interferometer, variable interference filters
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- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Optical Filters (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野コ
本発明は干渉フィルターを用いた分光フィルター及び分
光測定センサーに関するものであり、例えば分光計や真
空蒸着膜の膜厚監視装置に用いられるものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a spectral filter and a spectral measurement sensor using an interference filter, and is used, for example, in a spectrometer or a film thickness monitoring device for a vacuum-deposited film. be.
[従来の技術]
従来、一方向に沿って透過波長が連続的に変化する分光
フィルターの波長変化方向に沿って複数個の受光素子を
配列して成る分光測定センサーが提案されている(特公
昭58−49807号公報)。[Prior Art] A spectrometry sensor has been proposed in which a plurality of light-receiving elements are arranged along the wavelength change direction of a spectral filter whose transmitted wavelength changes continuously along one direction (Tokukō Shō). 58-49807).
同公報においては、膜厚を一方向に沿って連続的に変化
させることにより、膜厚の変化方向に沿って透過波長が
連続的に変化するくさび形の干渉フィルターを使用して
いる。この干渉フィルターの分光特性は、膜の構成によ
って決定される。分光特性の優劣は分光測定の精度に影
響し、半値幅が狭く、裾引きが小さいほど、分光測定の
精度が上がる。これは、各受光素子の分光出力が波長方
向についてお互いに重なっており、この重なりが少ない
程、1つの受光素子の分光出力の波長純度が上がるから
である。In this publication, a wedge-shaped interference filter is used in which the transmission wavelength changes continuously along the direction of change in film thickness by continuously changing the film thickness in one direction. The spectral characteristics of this interference filter are determined by the configuration of the membrane. The quality of spectral characteristics affects the accuracy of spectroscopic measurements, and the narrower the half-width and the smaller the tail, the higher the accuracy of spectroscopic measurements. This is because the spectral outputs of each light-receiving element overlap each other in the wavelength direction, and the smaller the overlap, the higher the wavelength purity of the spectral output of one light-receiving element.
[発明が解決しようとする課題]
上述のように、分光フィルターの波長純度を上げるには
、裾引きを抑えたままで半値幅を狭くする必要がある。[Problems to be Solved by the Invention] As described above, in order to increase the wavelength purity of a spectral filter, it is necessary to narrow the half-width while suppressing tailing.
それには、特定の波長で透過率が急激に立ち上がり、特
定の波長を外れると透過率が急激に立ち下がる必要があ
るが、単一の分光フィルターでそのような特性を得るこ
とは困難であった。また、上述のように、くさび形の干
渉フィルターの分光特性は膜の構成によって決定される
ので、ある条件で膜を作成すると、その分光特性を変え
ることはできず、例えば半値幅を変えることはできない
という問題があった。To do this, the transmittance must rise sharply at a specific wavelength, and drop sharply when the wavelength deviates from the specific wavelength, but it has been difficult to obtain such characteristics with a single spectral filter. . Furthermore, as mentioned above, the spectral characteristics of a wedge-shaped interference filter are determined by the structure of the film, so once a film is created under certain conditions, its spectral characteristics cannot be changed; for example, it is not possible to change the half-width. The problem was that I couldn't do it.
本発明はこのような点に鑑みてなされたものであり、そ
の目的とするところは、優れた分光特性を有し、しかも
分光特性を変えることができる分光フィルター及び分光
測定センサーを提供することにある。The present invention has been made in view of these points, and its purpose is to provide a spectral filter and a spectral measurement sensor that have excellent spectral characteristics and can change the spectral characteristics. be.
[課題を解決するための手段]
本発明に係る分光フィルターにあっては、上記の課題を
解決するために、第1図乃至第3図に示すように、一方
向に沿って遮断波長が単調に長くなり、遮断波長よりも
長い波長域の光を透過する第1の干渉フィルターF+と
、一方向に沿って遮断波長が単調に長くなり、遮断波長
よりも短い波長域の光を透過する第2の干渉フィルター
F2とを遮断波長の単調増加方向が一致するように重ね
合わせて成り、第1の干渉フィルターF1の遮断波長は
第2の干渉フィルターF2の対応する位置における遮断
波長よりも短いことを特徴とするものである。[Means for Solving the Problems] In order to solve the above problems, in the spectral filter according to the present invention, as shown in FIGS. 1 to 3, the cutoff wavelength is monotonous along one direction. A first interference filter F+ whose cutoff wavelength becomes monotonically longer in one direction and transmits light in a wavelength range longer than the cutoff wavelength, and a first interference filter F+ whose cutoff wavelength becomes monotonically longer in one direction and transmits light in a wavelength range shorter than the cutoff wavelength. 2 interference filters F2 are superimposed so that the monotonically increasing directions of their cutoff wavelengths coincide, and the cutoff wavelength of the first interference filter F1 is shorter than the cutoff wavelength at the corresponding position of the second interference filter F2. It is characterized by:
ここで、第1及び第2の干渉フィルターF,,F2は、
重ね合わせの位置関係を遮断波長の変化方向について可
変とすることが好ましい。Here, the first and second interference filters F, F2 are
It is preferable to make the positional relationship of the superposition variable with respect to the direction of change of the cutoff wavelength.
また、第1及び第2の干渉フィルターF l, F 2
の透過光を受光する複数個の受光素子■〜■を遮断波長
の変化方向に沿って配列すれば、分光測定センサーが得
られる。In addition, first and second interference filters F l, F 2
A spectrometry sensor can be obtained by arranging a plurality of light-receiving elements (1) to (4) along the direction of change in the cutoff wavelength.
[作用]
本発明にあっては、短波長遮断型の第1の干渉フィルタ
ーF1と、長波長遮断型の第2の干渉フィルターF2と
を重ね合わせ、前者の遮断波長を後者の対応する位置に
おける遮断波長よりも短くしたので、帯域通過型の干渉
フィルターを得ることができ、しかも、両者の遮断波長
の単調増加方向は一致しているので、一方向に沿って透
過波長が単調に変化する分光フィルターを得ることがで
きる。この分光フィルターの分光特性は、分光透過率の
ピーク波長を境として短波長側の遮断特性は第1の干渉
フィルターF1により決まり、長波長側の遮断特性は第
2の干渉フィルターF2により決まるので、単一の干渉
フィルターで得られる分光特性よりも優れた分光特性を
容易に得ることが可能となる。[Function] In the present invention, a first interference filter F1 of short wavelength cutoff type and a second interference filter F2 of long wavelength cutoff type are overlapped, and the cutoff wavelength of the former is set at a corresponding position of the latter. Since the cutoff wavelength is shorter than the cutoff wavelength, a bandpass type interference filter can be obtained.Moreover, since the monotonically increasing direction of the cutoff wavelength of both is the same, it is possible to obtain spectroscopy in which the transmitted wavelength changes monotonically along one direction. You can get filters. The spectral characteristics of this spectral filter are such that, with the peak wavelength of spectral transmittance as the boundary, the cutoff characteristics on the short wavelength side are determined by the first interference filter F1, and the cutoff characteristics on the long wavelength side are determined by the second interference filter F2. It becomes possible to easily obtain spectral characteristics superior to those obtained with a single interference filter.
また、第4図及び第5図に示すように、第1及び第2の
干渉フィルターF,,F2の重ね合わせの位置関係を可
変とすれば、分光特性、特に半値幅を制御することがで
きる。この際、第1の干渉フィルターF1の遮断波長が
第2の干渉フィルターF2の対応する位置における遮断
波長よりも短くなるように位置関係を変化させる必要が
あるが、両干渉フィルターF,,F2の遮断波長が一致
する直前の半値幅は極めて狭くなり、非常にシャープな
分光特性が得られる。Furthermore, as shown in FIGS. 4 and 5, if the positional relationship of the overlapping of the first and second interference filters F, F2 is made variable, the spectral characteristics, especially the half-value width, can be controlled. . At this time, it is necessary to change the positional relationship so that the cutoff wavelength of the first interference filter F1 is shorter than the cutoff wavelength of the second interference filter F2 at the corresponding position. The half-value width immediately before the cutoff wavelengths match becomes extremely narrow, resulting in extremely sharp spectral characteristics.
なお、遮断波長が一方向に沿って単調に変化する干渉フ
ィルターとしては、一方向に沿って膜厚が連続的に増加
するくさび形干渉フィルターや、膜厚が段階的に増加す
る階段形干渉フィルターを用いることができる。そして
、特に前者を用いる場合には、受光素子■〜■の配列方
向を膜厚の最大変化方向からずらすことにより、測定波
長域を狭く限定すると共に波長分解能を高くすることが
できる。Note that interference filters whose cutoff wavelength changes monotonically in one direction include wedge-shaped interference filters in which the film thickness increases continuously in one direction, and step-shaped interference filters in which the film thickness increases stepwise. can be used. In particular, when using the former method, by shifting the arrangement direction of the light receiving elements (1) to (4) from the direction of maximum film thickness change, it is possible to narrowly limit the measurement wavelength range and increase the wavelength resolution.
[実施例] 以下、本発明の実施例について説明する。[Example] Examples of the present invention will be described below.
第1図は第1の干渉フィルターF,を、第2図は第2の
干渉フィルターF2を、第3図は第1及び第2の干渉フ
ィルターF l, F 2を、それぞれ受光素子■〜■
の上に重ね合わせた状態と、同状態における各受光素子
■〜■の分光出力特性を示したものである。上記各図に
おいて、分図(a)は受光素子■〜■と干渉フィルター
F1又はF2の位置関係を示している。また、分図(b
)の縦軸は各受光素子■〜■の出力を、横軸は波長λ及
び受光素子■〜■の位置を表している。各曲線は変化部
分のみを図示してあり、変化の少ない部分は図示を省略
してある。各曲線に付した番号■〜■は、各受光素子■
〜■の番号と対応している。FIG. 1 shows the first interference filter F, FIG. 2 shows the second interference filter F2, and FIG. 3 shows the first and second interference filters F1, F2, respectively.
This figure shows the spectral output characteristics of each of the light-receiving elements (1) to (2) in the state superimposed on the figure and in the same state. In each of the above figures, diagram (a) shows the positional relationship between the light receiving elements (1) to (2) and the interference filter F1 or F2. Also, the minute diagram (b
) represents the output of each of the light receiving elements (1) to (2), and the horizontal axis represents the wavelength λ and the position of each of the light receiving elements (1) to (2). For each curve, only the portions that change are shown, and the portions that do not change much are not shown. The numbers ■~■ attached to each curve correspond to the respective light receiving elements■
It corresponds to the numbers ~■.
各干渉フィルターFl,F2は、別々のガラス基板G.
,G2に金属膜(例えばAg+Aj!)や誘電体膜を蒸
着して多層膜を構成したものであり、その膜厚は所定の
勾配で一方向に沿って増加している。Each interference filter Fl, F2 is provided on a separate glass substrate G.
, G2 are deposited with a metal film (for example, Ag+Aj!) or a dielectric film to form a multilayer film, and the film thickness increases along one direction at a predetermined gradient.
第1の干渉フィルターF1は膜厚の増加方向に沿って遮
断波長が連続的に長くなり、各部において遮断波長より
も長い波長域の光を透過する。第2の干渉フィルターF
2は膜厚の増加方向に沿って遮断波長が連続的に長くな
り、各部において遮断波長よりも短い波長域の光を透過
する。第1及び第2の干渉フィルターF + , F
2の膜厚の勾配を同じとしておけば、単位長さ当たりの
遮断波長の変化量は同じとなる。第3図(.)に示すよ
うに、第1及び第2の干渉フィルターF l, F 2
を遮断波長の増加方向が一致するように重ね合わせて、
各部における第1の干渉フィルターFlの遮断波長が第
2の干渉フィルターF2の遮断波長よりも短くなるよう
にすれば、第3図(b)に示すように、各受光素子■〜
■によりそれぞれ別の波長域についての光強度を検出す
ることができる。In the first interference filter F1, the cutoff wavelength becomes continuously longer in the direction of increase in film thickness, and each portion transmits light in a wavelength range longer than the cutoff wavelength. Second interference filter F
In No. 2, the cutoff wavelength becomes continuously longer along the direction of increase in film thickness, and each part transmits light in a wavelength range shorter than the cutoff wavelength. First and second interference filters F + , F
If the gradients of the film thicknesses of the two films are the same, the amount of change in the cutoff wavelength per unit length will be the same. As shown in FIG. 3(.), the first and second interference filters F l, F 2
are superimposed so that the increasing directions of the cutoff wavelengths match,
If the cutoff wavelength of the first interference filter Fl in each part is made shorter than the cutoff wavelength of the second interference filter F2, each light receiving element
(2) makes it possible to detect the light intensity in each different wavelength range.
なお、受光素子■〜■の個数は図示された個数に限定さ
れるものではなく、任意の個数とすることができる。ま
た、複数の受光素子は半導体集積回路上に構成しても良
い。Note that the number of light receiving elements (1) to (4) is not limited to the number shown in the drawings, but may be any number. Further, the plurality of light receiving elements may be configured on a semiconductor integrated circuit.
次に、第4図及び第5図は第1及び第2の干渉フィルタ
ーF,,F2の位置関係を膜厚変化方向にずらすことに
より、半値幅の制御を行う原理を示している。ただし、
便宜上、各干渉フィルターF1F2の分光特性を7段の
階段状に変化する特性として図示してある。上記各図に
おいて、分図(a)は第1の干渉フィルターF1の位置
と各部の分光透過率特性を、分図(b)は第2の干渉フ
ィルターF2の位置と各部の分光透過率特性を、分図(
0)は第1及び第2の干渉フィルターF,,F2の位置
関係と各部の分光透過率特性を、それぞれ示している。Next, FIGS. 4 and 5 show the principle of controlling the half-width by shifting the positional relationship of the first and second interference filters F, F2 in the direction of film thickness change. however,
For convenience, the spectral characteristics of each of the interference filters F1F2 are illustrated as characteristics that change in a stepwise manner in seven steps. In each of the above figures, the partial diagram (a) shows the position of the first interference filter F1 and the spectral transmittance characteristics of each part, and the partial diagram (b) shows the position of the second interference filter F2 and the spectral transmittance characteristics of each part. , minute diagram (
0) shows the positional relationship of the first and second interference filters F, F2 and the spectral transmittance characteristics of each part.
分光透過率特性において、横方向は波長λを、縦方向は
横長の各帯についてはフィルターの透過率Tを、各帯間
では位置関係を示している。In the spectral transmittance characteristics, the horizontal direction shows the wavelength λ, the vertical direction shows the transmittance T of the filter for each horizontally long band, and the positional relationship between the bands.
第4図は第1の干渉フィルターF1と第2の干渉フィル
ターF2のそれぞれ1段目が一致するように重ね合わせ
た状態を、第5図は第1の干渉フィルターF1の1段目
と第2の干渉フィルターF2の2段目とが一致するよう
に重ね合わせた状態を、それぞれ示している。図より明
らかなように、第4図の構成よりも第5図の構成の方が
、半値幅が広くなることが分かる。このように、第1及
び第2の干渉フィルターF + , F 2を重ね合わ
せる位置関係を遮断波長の変化方向についてずらすこと
により、重ね合わせにより得られる分光フィルターの半
値幅を自由に変えることが可能である。FIG. 4 shows the state in which the first stage of the first interference filter F1 and the second stage of the second interference filter F2 are overlapped, and FIG. The state in which the second stage of the interference filter F2 and the second stage of the interference filter F2 are overlapped so as to coincide with each other is shown. As is clear from the figure, the half-width is wider in the configuration shown in FIG. 5 than in the configuration shown in FIG. 4. In this way, by shifting the positional relationship in which the first and second interference filters F + and F 2 are superimposed in the direction of change of the cutoff wavelength, it is possible to freely change the half-width of the spectral filter obtained by superimposing them. It is.
この場合、物理的ずらし量と、半値幅の変化量との関係
は、各干渉フィルターFl+F2における単位長さ当た
りの遮断波長の変化量により決定される。すなわち、単
位長さ当たりの遮断波長の変化量が小さい干渉フィルタ
ーを用いた場合には、物理的ずらし量に対する半値幅の
変化量は小さく、逆に単位長さ当たりの遮断波長の変化
量が大きい干渉フィルターを用いた場合には、物理的ず
らし量に対する半値幅の変化量は大きくなる。In this case, the relationship between the amount of physical shift and the amount of change in half-width is determined by the amount of change in cutoff wavelength per unit length in each interference filter Fl+F2. In other words, when using an interference filter with a small amount of change in cutoff wavelength per unit length, the amount of change in half-width relative to the amount of physical shift is small, and conversely, the amount of change in cutoff wavelength per unit length is large. When an interference filter is used, the amount of change in half-width with respect to the amount of physical shift becomes large.
[発明の効果コ
本発明の分光フィルターにあっては、分光透過率のピー
ク波長を境として短波長側と長波長側の遮断特性がそれ
ぞれ別々の干渉フィルターにより決まるので、単一の干
渉フィルターで得られる分光特性よりも優れた分光特性
を容易に得ることができるという効果がある。[Effects of the Invention] In the spectral filter of the present invention, the cutoff characteristics on the short wavelength side and the long wavelength side are determined by separate interference filters, with the peak wavelength of spectral transmittance as the boundary, so a single interference filter can be used. There is an effect that spectral characteristics superior to those obtained can be easily obtained.
また、第1及び第2の干渉フィルターの重ね合わせの位
置関係を可変とすれば、2枚の分光フィルターを作成す
るだけで、種々の半値幅を持った分光フィルターが得ら
れ、そのため、分光フィルターの多品種少量生産が容易
となるものである。In addition, if the positional relationship of the superposition of the first and second interference filters is made variable, spectral filters with various half-widths can be obtained by simply creating two spectral filters. This facilitates high-mix, low-volume production.
また、被測定物によって半値幅を変えることができる分
光フィルター又は分光測定センサーを実現することがで
きる。Further, it is possible to realize a spectral filter or a spectral measurement sensor whose half width can be changed depending on the object to be measured.
第1図(a)は本発明の一実施例に用いる第1の干渉フ
ィルターと受光素子の位置関係を示す断面図、同図(b
)は同上の分光特性図、第2図(a)は上記実施例に用
いる第2の干渉フィルターと受光素子の位置関係を示す
断面図、同図(b)は同上の分光特性図、第3図(a)
は上記実施例に用いる第1及び第2の干渉フィルターと
受光素子の位置関係を示す断面図、同図(b)は同上の
分光特性図、第4図及び第5図は本発明による半値幅制
御の原理説明図である。
FI+F2は干渉フィルター、■〜■は受光素子である
。FIG. 1(a) is a sectional view showing the positional relationship between a first interference filter and a light receiving element used in an embodiment of the present invention, and FIG.
) is the same spectral characteristic diagram as above, FIG. Diagram (a)
is a cross-sectional view showing the positional relationship between the first and second interference filters and the light-receiving element used in the above embodiment, FIG. It is a diagram explaining the principle of control. FI+F2 is an interference filter, and ■ to ■ are light receiving elements.
Claims (4)
波長よりも長い波長域の光を透過する第1の干渉フィル
ターと、一方向に沿って遮断波長が単調に長くなり、遮
断波長よりも短い波長域の光を透過する第2の干渉フィ
ルターとを遮断波長の単調増加方向が一致するように重
ね合わせて成り、第1の干渉フィルターの遮断波長は第
2の干渉フィルターの対応する位置における遮断波長よ
りも短いことを特徴とする分光フィルター。(1) A first interference filter whose cutoff wavelength becomes monotonically longer along one direction and transmits light in a wavelength range longer than the cutoff wavelength; A second interference filter that transmits light in a wavelength range shorter than A spectral filter characterized by having a cutoff wavelength shorter than the cutoff wavelength at the specified position.
位置関係を遮断波長の変化方向について可変として成る
ことを特徴とする請求項1記載の分光フィルター。(2) The spectral filter according to claim 1, wherein the first and second interference filters have a positional relationship in which they are superimposed so as to be variable in a direction in which the cutoff wavelength changes.
第1及び第2の干渉フィルターの透過光を受光する複数
個の受光素子を遮断波長の変化方向に沿って配列して成
ることを特徴とする分光測定センサー。(3) In the spectral filter according to claim 1 or 2,
A spectrometry sensor comprising a plurality of light-receiving elements that receive light transmitted through first and second interference filters and arranged along a direction in which a cutoff wavelength changes.
ーを含み、膜厚の変化方向について透過波長が連続的に
変化する分光フィルターと、複数個の受光素子が一列に
配列された受光素子アレイとを重ね合わせて成り、膜厚
の最大変化方向と受光素子の配列方向のなす角度を可変
として成ることを特徴とする分光測定センサー。(4) A spectral filter that includes a wedge-shaped interference filter whose film thickness changes continuously, and whose transmission wavelength changes continuously in the direction of change in film thickness, and a light-receiving element in which multiple light-receiving elements are arranged in a line. A spectroscopic measurement sensor characterized in that the angle between the direction of maximum change in film thickness and the direction in which the light-receiving elements are arranged is variable.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63287265A JPH02132405A (en) | 1988-11-14 | 1988-11-14 | Spectral filter and spectral measuring sensor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63287265A JPH02132405A (en) | 1988-11-14 | 1988-11-14 | Spectral filter and spectral measuring sensor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02132405A true JPH02132405A (en) | 1990-05-21 |
Family
ID=17715165
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63287265A Pending JPH02132405A (en) | 1988-11-14 | 1988-11-14 | Spectral filter and spectral measuring sensor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02132405A (en) |
Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04126201U (en) * | 1991-05-09 | 1992-11-17 | 株式会社アドバンテスト | Multilayer dielectric film wavelength filter |
| JPH04338950A (en) * | 1991-01-31 | 1992-11-26 | Konica Corp | Evaporation/concentration device for aqueous solution |
| JPH05281480A (en) * | 1992-04-03 | 1993-10-29 | Fujitsu Ltd | Optical wavelength variable filter and its production |
| JPH08503312A (en) * | 1992-10-29 | 1996-04-09 | ザ・ダウ・ケミカル・カンパニー | Formable reflective multilayer objects |
| JP2004282793A (en) * | 2004-06-23 | 2004-10-07 | Fujitsu Ltd | Optical transmission system |
| JP2009294316A (en) * | 2008-06-03 | 2009-12-17 | Nikon Corp | Optical filter and optical device |
| JP2010520615A (en) * | 2007-03-01 | 2010-06-10 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | Photodetector device |
| JP2011253078A (en) * | 2010-06-03 | 2011-12-15 | Nikon Corp | Optical component and spectrophotometric apparatus |
| WO2015087594A1 (en) * | 2013-12-13 | 2015-06-18 | コニカミノルタ株式会社 | Spectroscopic unit and spectroscopic device using same |
| WO2016158853A1 (en) * | 2015-04-03 | 2016-10-06 | コニカミノルタ株式会社 | Spectral filter and spectrometry device |
| JP2016218144A (en) * | 2015-05-15 | 2016-12-22 | コニカミノルタ株式会社 | Spectral filter and spectroscopic measurement device |
| JP2018155645A (en) * | 2017-03-17 | 2018-10-04 | 倉敷紡績株式会社 | Spectral filter unit and spectrophotometric device |
| JP2020034687A (en) * | 2018-08-29 | 2020-03-05 | キヤノン電子株式会社 | Optical filter module and optical device |
| US10753793B2 (en) | 2015-08-05 | 2020-08-25 | Viavi Solutions Inc. | Optical filter and spectrometer |
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-
1988
- 1988-11-14 JP JP63287265A patent/JPH02132405A/en active Pending
Cited By (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04338950A (en) * | 1991-01-31 | 1992-11-26 | Konica Corp | Evaporation/concentration device for aqueous solution |
| JPH04126201U (en) * | 1991-05-09 | 1992-11-17 | 株式会社アドバンテスト | Multilayer dielectric film wavelength filter |
| JPH05281480A (en) * | 1992-04-03 | 1993-10-29 | Fujitsu Ltd | Optical wavelength variable filter and its production |
| JPH08503312A (en) * | 1992-10-29 | 1996-04-09 | ザ・ダウ・ケミカル・カンパニー | Formable reflective multilayer objects |
| JP2004282793A (en) * | 2004-06-23 | 2004-10-07 | Fujitsu Ltd | Optical transmission system |
| JP2010520615A (en) * | 2007-03-01 | 2010-06-10 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | Photodetector device |
| JP2009294316A (en) * | 2008-06-03 | 2009-12-17 | Nikon Corp | Optical filter and optical device |
| JP2011253078A (en) * | 2010-06-03 | 2011-12-15 | Nikon Corp | Optical component and spectrophotometric apparatus |
| US9841323B2 (en) | 2013-12-13 | 2017-12-12 | Konica Minolta, Inc. | Spectroscopic unit and spectroscopic device using same |
| WO2015087594A1 (en) * | 2013-12-13 | 2015-06-18 | コニカミノルタ株式会社 | Spectroscopic unit and spectroscopic device using same |
| US10564334B2 (en) | 2015-04-03 | 2020-02-18 | Konica Minolta, Inc. | Spectral filter and spectrometric device |
| JPWO2016158853A1 (en) * | 2015-04-03 | 2018-02-01 | コニカミノルタ株式会社 | Spectral filter and spectroscopic measurement device |
| EP3279710A4 (en) * | 2015-04-03 | 2018-03-21 | Konica Minolta, Inc. | Spectral filter and spectrometry device |
| WO2016158853A1 (en) * | 2015-04-03 | 2016-10-06 | コニカミノルタ株式会社 | Spectral filter and spectrometry device |
| JP2016218144A (en) * | 2015-05-15 | 2016-12-22 | コニカミノルタ株式会社 | Spectral filter and spectroscopic measurement device |
| US10753793B2 (en) | 2015-08-05 | 2020-08-25 | Viavi Solutions Inc. | Optical filter and spectrometer |
| US11237049B2 (en) | 2015-08-05 | 2022-02-01 | Viavi Solutions Inc. | Optical filter and spectrometer |
| US12135239B2 (en) | 2015-08-05 | 2024-11-05 | Viavi Solutions Inc. | Optical filter and spectrometer |
| JP2018155645A (en) * | 2017-03-17 | 2018-10-04 | 倉敷紡績株式会社 | Spectral filter unit and spectrophotometric device |
| JP2020034687A (en) * | 2018-08-29 | 2020-03-05 | キヤノン電子株式会社 | Optical filter module and optical device |
| JP2021140001A (en) * | 2020-03-04 | 2021-09-16 | キヤノン電子株式会社 | Optical device |
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