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JPH0210425Y2 - - Google Patents

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Publication number
JPH0210425Y2
JPH0210425Y2 JP1982123863U JP12386382U JPH0210425Y2 JP H0210425 Y2 JPH0210425 Y2 JP H0210425Y2 JP 1982123863 U JP1982123863 U JP 1982123863U JP 12386382 U JP12386382 U JP 12386382U JP H0210425 Y2 JPH0210425 Y2 JP H0210425Y2
Authority
JP
Japan
Prior art keywords
light
reflecting mirror
liquid crystal
electro
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1982123863U
Other languages
Japanese (ja)
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JPS5987632U (en
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Priority to JP1982123863U priority Critical patent/JPS5987632U/en
Publication of JPS5987632U publication Critical patent/JPS5987632U/en
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Publication of JPH0210425Y2 publication Critical patent/JPH0210425Y2/ja
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  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Exposure Control For Cameras (AREA)
  • Liquid Crystal (AREA)

Description

【考案の詳細な説明】 本考案は露出計等の測光装置に関し、特にその
受光角(測光範囲)を電気的に切換える測光装置
に関する。
[Detailed Description of the Invention] The present invention relates to a photometric device such as an exposure meter, and more particularly to a photometric device that electrically switches its light receiving angle (photometric range).

従来より露出計の受光角を切換える思想は公知
であり、絞り、レンズ、プリズム等の光学素子ま
たは受光素子を変位させるもの(例えば特公昭47
−49610号)、あるいは予め複数の受光系を構成し
ておき、その間の光経路を切換えるもの等、種々
の方法がある。
The idea of changing the light receiving angle of a light meter has been well known, and it is possible to change the light receiving angle of a light meter by displacing optical elements such as apertures, lenses, prisms, etc. (for example, Japanese Patent Publication No. 47
There are various methods, such as configuring a plurality of light receiving systems in advance and switching the optical paths between them.

しかしながら、これらのものは、その構成から
言つて、かなりの空間を必要とし、カメラ等の使
用可能な空間が限定されているものにおいては非
常に不都合であつた。
However, these devices require a considerable amount of space due to their configuration, which is very inconvenient for cameras and other devices where usable space is limited.

本考案の目的は、上記欠点を除去し、大きな空
間を必要とせずとも電気的信号の印加のみにて受
光角の切換えが可能な測光装置を提供するにあ
る。
SUMMARY OF THE INVENTION An object of the present invention is to eliminate the above-mentioned drawbacks and to provide a photometric device that can switch the light receiving angle only by applying an electrical signal without requiring a large space.

本考案は上記目的を達成するために、被写体か
らの光を反射鏡によつて所定方向に反射して受光
素子に導く測光装置において、光線散乱−非散乱
作用を電気信号の印加によつて切換制御可能とす
るとともに所定の平面的パターン形状及び厚さを
有する電気光学物質の層と、前記電気光学物質の
層に前記電気光学物質の層に前記電気信号を印加
するための透明電極とを前記反射鏡の前面に配置
して光線散乱手段を構成し、被写体からの光がい
つたん前記電気光学物質の層及び透明電極を介し
て前記反射鏡に入射し、そして前記反射鏡で反射
された被写体からの光を前記電気光学物質の層及
び透明電極を介して前記受光素子へ導く測光光路
を構成して成る測光装置を提供する。本考案によ
れば被写体からの光を受光素子に向つて反射する
反射鏡の前面に電気光学物質の層、透明電極を配
置して光線散乱手段を構成できるので受光角切換
のための構造が簡単になる。
In order to achieve the above object, the present invention uses a photometry device in which light from a subject is reflected in a predetermined direction by a reflecting mirror and guided to a light-receiving element, by switching between light scattering and non-scattering by applying an electrical signal. a layer of electro-optic material that is controllable and has a predetermined planar pattern shape and thickness; and a transparent electrode for applying the electrical signal to the layer of electro-optic material. A light scattering means is arranged in front of the reflecting mirror, and the light from the object is incident on the reflecting mirror via the electro-optic material layer and the transparent electrode, and the object is reflected by the reflecting mirror. The present invention provides a photometric device comprising a photometric optical path that guides light from the electro-optical material layer and the transparent electrode to the light receiving element. According to the present invention, the light scattering means can be constructed by arranging an electro-optic material layer and a transparent electrode in front of the reflecting mirror that reflects light from the object toward the light-receiving element, so the structure for switching the light-receiving angle is simple. become.

以下、本考案を図面に基づいて説明する。 Hereinafter, the present invention will be explained based on the drawings.

第1図は本考案による測光装置をカメラのミラ
ーツクス内に配設した露出計の実施例を示す。
FIG. 1 shows an embodiment of an exposure meter in which a photometric device according to the present invention is disposed within a mirror box of a camera.

図において、撮影レンズ1を透過した被写体か
らの光は、該撮影レンズ1とフイルム面2の間に
設けられたある主反射鏡3によつてフアインダ焦
点板4の方へ反射される。ここで、主反射鏡3の
一部分は半透過鏡化されており、前記透過光の一
部を光線散乱手段Eへ照射する。この光線散乱手
段Eは、支持体5、平面反射鏡6、2枚の透過電
極7a,7b、液晶層8、該液晶層8と電極7
a,7bとの間隔を保持し、かつこの両電極間を
絶縁するためのスペーサー9a,9bおよびカバ
ーグラス10から構成される。この液晶層はある
平面的パターンを有しており、これが測光光路に
臨んでいる。電極7a,7bは、各部から電圧を
印加するための端子11a,11bと接触可能で
ある。
In the figure, light from an object that has passed through a photographic lens 1 is reflected toward a focus plate 4 by a main reflecting mirror 3 provided between the photographic lens 1 and a film surface 2. Here, a part of the main reflecting mirror 3 is made into a semi-transmissive mirror, and irradiates a part of the transmitted light to the light scattering means E. This light scattering means E includes a support 5, a flat reflecting mirror 6, two transparent electrodes 7a and 7b, a liquid crystal layer 8, and the liquid crystal layer 8 and the electrode 7.
It is composed of spacers 9a, 9b and a cover glass 10 for maintaining the distance between the two electrodes 9a and 7b and insulating the two electrodes. This liquid crystal layer has a certain planar pattern, which faces the photometric optical path. The electrodes 7a, 7b can contact terminals 11a, 11b for applying voltage from each part.

主反射鏡3と光線散乱手段Eとは枢軸12によ
つて連結されており、測光時には、実線で示され
る位置に、撮影時には、撮影光路から退避して点
線で示される位置にある。測光時には電極7a,
7bと端子11a,11bが接触し、他の時には
接触しない。つまり、電極7a,7bと端子11
a,11bとは光線散乱手段が測光光路中の所定
位置に位置したときにのみ接触する。従つて第1
図示の状態でのみ電気信号の印加が可能になり、
撮影光路から退避した状態では該印加が不可能と
なる。
The main reflecting mirror 3 and the light scattering means E are connected by a pivot 12, and are located at the position shown by the solid line during photometry, and at the position shown by the dotted line after being withdrawn from the photographing optical path during photography. During photometry, the electrode 7a,
7b and the terminals 11a, 11b are in contact with each other, and are not in contact with each other at other times. In other words, the electrodes 7a, 7b and the terminal 11
a and 11b come into contact only when the light scattering means is positioned at a predetermined position in the photometric optical path. Therefore, the first
It is possible to apply electrical signals only in the state shown in the diagram.
This application is impossible in a state where it is retracted from the photographing optical path.

光線散乱手段Eで反射された光は、集光レンズ
13によつて露出計の光電変換素子14の受光面
に集められている。
The light reflected by the light scattering means E is collected by a condensing lens 13 onto the light receiving surface of the photoelectric conversion element 14 of the exposure meter.

次に、作用について説明する。 Next, the effect will be explained.

測光時において、電極7a,7b間に電圧が印
加されていない場合には、液晶層8は周知のごと
くほゞ透明である。従つて、光線散乱手段Eは平
面反射鏡6の機能を果しているにすぎない。すな
わち、フイルム面2上の測光範囲ACに相当する
領域の共役像が平面反射鏡6によつてA′C′に生
じており、これが集光レンズ13により光電変換
素子14へと導かれる。このとき、フイルム面2
上の点BおよびDに向う光は、集光レンズ13に
入ることはない。そのため、露出計の感度レベル
は高いものの第2図の曲線aで示すように測光範
囲はACの範囲である。
During photometry, when no voltage is applied between the electrodes 7a and 7b, the liquid crystal layer 8 is substantially transparent, as is well known. Therefore, the light scattering means E only functions as the plane reflecting mirror 6. That is, a conjugate image of an area corresponding to the photometric range AC on the film surface 2 is generated at A'C' by the plane reflecting mirror 6, and this is guided to the photoelectric conversion element 14 by the condenser lens 13. At this time, film surface 2
Light directed toward points B and D above does not enter the condenser lens 13. Therefore, although the sensitivity level of the exposure meter is high, the photometry range is within the AC range, as shown by curve a in FIG.

次に、不図示の制御手段から電極7a,7b間
に電圧が印加されると、液晶層8には散乱作用が
生ずる。従つて、撮影レンズ1の射出瞳の中心P
を通り、フイルム面2上の点BおよびDに向う光
は、この液晶層8により散乱せしめられて、集光
レンズ13の方へ偏向せしめられる。これが集光
レンズ13によつて光電変換素子14へ導かれ
る。従つて測光範囲はBDまで広がる。
Next, when a voltage is applied between the electrodes 7a and 7b from a control means (not shown), a scattering effect occurs in the liquid crystal layer 8. Therefore, the center P of the exit pupil of the photographic lens 1
The light passing through the liquid crystal layer 8 toward points B and D on the film surface 2 is scattered by the liquid crystal layer 8 and deflected toward the condenser lens 13. This is guided to the photoelectric conversion element 14 by the condensing lens 13. Therefore, the photometry range extends to BD.

詳述すると、フイルム面2上の点B〜Dに向う
光の各々は、液晶層8によつて、ある強度分布を
もつて放射状に分散される。そのため、いままで
集光レンズ13に入射不可能であつた点B、Dに
向う光の一部は、集光レンズ13を介して光電変
換素子14へ入射する。また、いままで集光レン
ズ13に入射していた点A、Cに向う光の一部
は、集光レンズ13に入射しなくなる。このよう
にして、第2図の曲線bで示すように、露出計の
感度レベルは低下するものの測定範囲はB、Dま
で拡大するのである。なお、このような光線散乱
作用が生ずる液晶としては、例えばDSM効果
(Dynamic Scattering Mode;動的散乱効果)
を有するネマテイツク液晶が知られている。そし
て、一般的には、数ミクロン〜数十ミクロン前後
の液晶に適当な電圧を印加すると(例えば10ミク
ロン程度の厚さの液晶に数ボルトの電圧を印加す
ると)、スリガラス程度の散乱効果が得られる。
これの散乱特性を考慮して液晶層の大きさ、配置
および受光系の大きさ、配置を決めることによ
り、第2図の曲線aで示すスポツト測光から同曲
線bで示すような平均測光に近づくような所望の
測光範囲に切り換えることが可能である。この際
液晶層に電圧を印加したときに生ずる受光角変化
はACからBDへと拡大するが、設計上の必要に
応じて液晶の組成、厚さ、あるいは印加電圧をも
適宜選定すればよいことは言うまでもない。但
し、液晶層の厚さが増加するにつれて応答が遅れ
たり、また印加電圧を増加させなければならない
ことを考慮する必要がある。(カメラの場合には
液晶層を極端に厚くすることは好ましくない。) 以上のような本実施例によれば、薄い液晶層で
もつて受光角の切換えが可能となるから、使用空
間が少ないカメラの測光装置が得られる。また、
本実施例によれば平面反射鏡6によるフイルム面
の共役面A′C′と平面反射鏡6との間に電気光学
物質の層(液晶層8)が配置されているので、次
のような効果が得られる。即ち、撮影レンズ1か
らフイルム面上の点A〜Dに向う光線のうち点B
へ向う光線に着目したとき、液晶層が透明のとき
に点Bへ向う光線のように平面反射鏡6で反射さ
れた後に光電変換素子14とは全く見当はずれの
方向、即ちレンズの射出瞳の中心へ戻る方向の光
線が、液晶の光線散乱作用が生起すると第1図の
点線図示の如く光電変換素子14へ導くことがで
きることになる。この効果は、第1図の配置にお
いて平面反射鏡6の前面にある液晶装置7a,7
b,8,9a,9b,10を共役面A′C′と光電
変換素子14との間に配置したものと比較すると
一層明らかになる。後者のように液晶装置を配置
すると、点A,Cへ向う光線の他に点Dへ向う光
線(概ね光電変換素子14へ向う方向性をもつて
いる)は光電変換素子14へ導くことができる
が、点Bへ向う光線を導くことはできない。それ
は第1図の点線図示の光線がそもそも存在しない
からである。
Specifically, each of the lights directed toward points B to D on the film surface 2 is radially dispersed by the liquid crystal layer 8 with a certain intensity distribution. Therefore, a portion of the light directed toward points B and D, which could not enter the condensing lens 13, enters the photoelectric conversion element 14 via the condensing lens 13. Further, a part of the light directed to points A and C, which had hitherto been incident on the condenser lens 13, no longer enters the condenser lens 13. In this way, as shown by curve b in FIG. 2, the measurement range is expanded to B and D, although the sensitivity level of the exposure meter is lowered. In addition, examples of liquid crystals that produce such a light scattering effect include the DSM effect (Dynamic Scattering Mode).
Nematic liquid crystals having the following characteristics are known. In general, when an appropriate voltage is applied to a liquid crystal with a thickness of several microns to several tens of microns (for example, when a voltage of several volts is applied to a liquid crystal with a thickness of about 10 microns), a scattering effect comparable to that of ground glass can be obtained. It will be done.
By determining the size and arrangement of the liquid crystal layer and the size and arrangement of the light receiving system in consideration of this scattering characteristic, the spot photometry shown by curve a in Figure 2 approaches the average photometry shown by curve b in the same figure. It is possible to switch to a desired photometry range. At this time, the change in acceptance angle that occurs when a voltage is applied to the liquid crystal layer expands from AC to BD, but the composition, thickness, and applied voltage of the liquid crystal can be selected appropriately depending on design needs. Needless to say. However, it is necessary to consider that as the thickness of the liquid crystal layer increases, the response will be delayed and the applied voltage will have to be increased. (In the case of a camera, it is not preferable to make the liquid crystal layer extremely thick.) According to this embodiment as described above, it is possible to switch the acceptance angle even with a thin liquid crystal layer, so it is possible to switch the light receiving angle even with a thin liquid crystal layer. A photometric device is obtained. Also,
According to this embodiment, an electro-optical material layer (liquid crystal layer 8) is disposed between the conjugate plane A'C' of the film surface formed by the plane reflection mirror 6 and the plane reflection mirror 6, so that the following Effects can be obtained. That is, among the rays of light that go from the photographic lens 1 to points A to D on the film surface, point B
When we focus on the light rays heading toward point B when the liquid crystal layer is transparent, after being reflected by the flat reflecting mirror 6, the light rays are directed in a completely misplaced direction from the photoelectric conversion element 14, that is, toward the exit pupil of the lens. When the light scattering effect of the liquid crystal occurs, the light beam returning to the center can be guided to the photoelectric conversion element 14 as shown by the dotted line in FIG. This effect is caused by the liquid crystal devices 7a and 7 located in front of the plane reflecting mirror 6 in the arrangement shown in FIG.
This becomes even clearer when compared with the case where b, 8, 9a, 9b, and 10 are arranged between the conjugate plane A'C' and the photoelectric conversion element 14. If the liquid crystal device is arranged in the latter manner, in addition to the light rays heading to points A and C, the light rays heading towards point D (which generally has a directionality toward the photoelectric conversion element 14) can be guided to the photoelectric conversion element 14. However, it is not possible to guide the ray toward point B. This is because the light rays shown by the dotted lines in FIG. 1 do not exist in the first place.

露出計の感度分布曲線を示す第2図において、
A,B,C,D,Oは第1図におけるフイルム面
2上の点を示す。
In Figure 2, which shows the sensitivity distribution curve of a light meter,
A, B, C, D, and O indicate points on the film surface 2 in FIG.

尚、測光範囲の切り換えに伴う露出計の感度の
レベルは液晶物質の選定および印加電圧の大き
さ、周波数等に関連して定まるが、その補正は従
来の露出計感度補正手段と適宜連動させればよ
い。
The sensitivity level of the exposure meter that occurs when switching the photometry range is determined by the selection of the liquid crystal material and the magnitude and frequency of the applied voltage, but the correction must be made in conjunction with conventional exposure meter sensitivity correction means as appropriate. Bye.

更に、光線散乱手段を構成する電極7a,7b
の平面的なパターン形状、液晶層8の厚さ等を局
所的に異ならしめて、場所によつて異なつた散乱
特性を持たせることも可能である。これにより、
例えば、露出計の感度分布曲線をフイルム画面の
中心軸POに関して上下方向に非対称となし、天
空部からの光に対して感度を落とすこと(第2図
中曲線w)もできる。
Furthermore, electrodes 7a and 7b constituting the light scattering means
It is also possible to locally vary the planar pattern shape, the thickness of the liquid crystal layer 8, etc. to provide different scattering characteristics depending on the location. This results in
For example, the sensitivity distribution curve of the exposure meter can be made asymmetrical in the vertical direction with respect to the central axis PO of the film screen to reduce the sensitivity to light from the sky (curve w in Figure 2).

それは第3図a,bに示したように、透明電極
7a,7bを光線散乱手段Eの周辺部に設け、中
央付近よりやや上部にはこの透明電極が存在しな
いような平面的パターンとすることによつて達成
され、この透明電極7a,7b間に電圧を印加す
ると、散乱性は周辺部のみで強く生ずるようにな
る。
As shown in FIGS. 3a and 3b, the transparent electrodes 7a and 7b are provided at the periphery of the light scattering means E, and the planar pattern is such that there are no transparent electrodes slightly above the center. When a voltage is applied between the transparent electrodes 7a and 7b, the scattering property is strongly generated only at the periphery.

第4図a,bは別の実施例を示すもので、一方
の透明電極7aの一部7cを透明な物質の層15
を介して平面反射鏡6に取り付けて液晶層8の厚
さを、透明電極7bと7cとが対向している所よ
りも透明電極7aと7bとが対向している所の方
が厚くなるようにしている。この透明電極間に電
圧を印加すると、透明電極7b,7cとが対向し
た所にはより強い電場が生じ、こゝで局所的に散
乱性が強くなる。この場合にも天空部からの光に
対して感度が落ちる。
FIGS. 4a and 4b show another embodiment in which a portion 7c of one transparent electrode 7a is covered with a layer 15 of transparent material.
The thickness of the liquid crystal layer 8 is set so that the thickness of the liquid crystal layer 8 is thicker where transparent electrodes 7a and 7b face each other than where transparent electrodes 7b and 7c face each other. I have to. When a voltage is applied between the transparent electrodes, a stronger electric field is generated where the transparent electrodes 7b and 7c face each other, thereby locally increasing the scattering property. In this case as well, the sensitivity to light from the sky is reduced.

また、本考案の光線散乱手段Eには、散乱特性
を示すものとして液晶を用いているが、何もこれ
に限定されるものではなく、電圧の印加によつて
光を偏向せしめる電気光学物質であつてもよい。
Further, although liquid crystal is used as a material exhibiting scattering properties in the light scattering means E of the present invention, it is not limited to this, and may be an electro-optical material that deflects light by applying a voltage. It may be hot.

以上のような構成の本考案によれば、電気光学
物質を含む光線散乱手段への電気信号の印加のみ
によつて受光角を切り換えられる。特に、散乱特
性を示す電気光学物質と透明電極とを反射鏡の前
面に配置するので構造が簡単になり、従来のよう
な受光角の切り換えに際しての空間をほとんど必
要としないから、使用可能な空間が極めて限定さ
れているカメラ等においては有効なものとなる。
更に本考案によれば、電気光学物質の層が光線散
乱作用を呈しているときに、層で散乱されて直接
光電変換素子へ向う光線と該層をいつたん透過し
た後に反射鏡で反射されて再び該層を透過して光
電変換素子へ向う光線(いわば二重散乱光線)が
存在するが、いずれも光電変換素子側へ向けて散
乱されるから光電変換素子へ光線を向ける効率が
向上する。
According to the present invention configured as described above, the light receiving angle can be switched only by applying an electric signal to the light scattering means including an electro-optic material. In particular, since the electro-optical material that exhibits scattering properties and the transparent electrode are placed in front of the reflecting mirror, the structure is simplified, and almost no space is required to switch the acceptance angle as in the conventional case, so the usable space is reduced. This is effective for cameras and the like in which there are extremely limited quantities.
Furthermore, according to the present invention, when the layer of electro-optic material exhibits a light scattering effect, the light that is scattered by the layer and goes directly to the photoelectric conversion element, and the light that is transmitted through the layer and then reflected by the reflecting mirror. There are light rays that pass through the layer again and head toward the photoelectric conversion element (so-called double scattered light rays), but since they are all scattered toward the photoelectric conversion element, the efficiency of directing the light rays toward the photoelectric conversion element is improved.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、本考案の実施例、第2図は、本考案
による露出計の感度分布曲線を示す。第3図a
は、第1図に示した光線散乱手段の別の実施例を
示す正面図である。第3図bは、第3図aのX−
X′断面図である。第4図aは、第1図に示した
光線散乱手段の別の実施例を示す正面図である。
第4図bは、第4図aのY−Y′断面図である。 主要部分の符号の説明、フイルム面……2、主
反射鏡……3、支持体……5、平面反射鏡……
6、透明電極……7a,7b、液晶層……8、ス
ペーサ……9a,9b、カバーグラス……10。
FIG. 1 shows an embodiment of the present invention, and FIG. 2 shows a sensitivity distribution curve of the light meter according to the present invention. Figure 3a
2 is a front view showing another embodiment of the light scattering means shown in FIG. 1. FIG. Figure 3b shows the X-
It is an X′ cross-sectional view. FIG. 4a is a front view showing another embodiment of the light scattering means shown in FIG. 1.
FIG. 4b is a sectional view taken along the line YY' in FIG. 4a. Explanation of the symbols of the main parts, Film surface...2, Main reflecting mirror...3, Support body...5, Plane reflecting mirror...
6. Transparent electrodes...7a, 7b, liquid crystal layer...8, spacers...9a, 9b, cover glass...10.

Claims (1)

【実用新案登録請求の範囲】 被写体からの光を反射鏡によつて所定方向に反
射して受光素子に導く測光装置において、 光線散乱−非散乱作用を電気信号の印加によつ
て切換制御可能とするとともに所定の平面的パタ
ーン形状及び厚さを有する電気光学物質の層と、
前記電気光学物質の層に前記電気信号を印加する
ための透明電極とを前記反射鏡の前面に配置して
光線散乱手段を構成し、 被写体からの光がいつたん前記電気光学物質の
層及び透明電極を介して前記反射鏡に入射し、そ
して前記反射鏡で反射された被写体からの光を前
記電気光学物質の層及び透明電極を介して前記受
光素子へ導く測光光路を構成して成ることを特徴
とする測光装置。
[Claims for Utility Model Registration] A photometric device in which light from a subject is reflected in a predetermined direction by a reflecting mirror and guided to a light receiving element, in which light scattering and non-scattering effects can be switched and controlled by applying an electrical signal. and a layer of an electro-optic material having a predetermined planar pattern shape and thickness;
A transparent electrode for applying the electric signal to the layer of electro-optic material is arranged in front of the reflecting mirror to constitute a light scattering means, and when light from the object passes through the layer of electro-optic material and the transparent electrode, A photometric optical path is configured to guide light from a subject that enters the reflecting mirror via an electrode and is reflected by the reflecting mirror to the light receiving element via the electro-optic material layer and the transparent electrode. Characteristic photometric device.
JP1982123863U 1982-08-16 1982-08-16 Photometric device Granted JPS5987632U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1982123863U JPS5987632U (en) 1982-08-16 1982-08-16 Photometric device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1982123863U JPS5987632U (en) 1982-08-16 1982-08-16 Photometric device

Publications (2)

Publication Number Publication Date
JPS5987632U JPS5987632U (en) 1984-06-13
JPH0210425Y2 true JPH0210425Y2 (en) 1990-03-15

Family

ID=30282576

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1982123863U Granted JPS5987632U (en) 1982-08-16 1982-08-16 Photometric device

Country Status (1)

Country Link
JP (1) JPS5987632U (en)

Also Published As

Publication number Publication date
JPS5987632U (en) 1984-06-13

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