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JPH01251384A - Semiconductor memory - Google Patents

Semiconductor memory

Info

Publication number
JPH01251384A
JPH01251384A JP63078616A JP7861688A JPH01251384A JP H01251384 A JPH01251384 A JP H01251384A JP 63078616 A JP63078616 A JP 63078616A JP 7861688 A JP7861688 A JP 7861688A JP H01251384 A JPH01251384 A JP H01251384A
Authority
JP
Japan
Prior art keywords
read
transistor
memory cell
write
gate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63078616A
Other languages
Japanese (ja)
Inventor
Yasushi Araoka
荒岡 慶志
Yoshitake Tsuruoka
鶴岡 義丈
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC IC Microcomputer Systems Co Ltd
Original Assignee
NEC IC Microcomputer Systems Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC IC Microcomputer Systems Co Ltd filed Critical NEC IC Microcomputer Systems Co Ltd
Priority to JP63078616A priority Critical patent/JPH01251384A/en
Publication of JPH01251384A publication Critical patent/JPH01251384A/en
Pending legal-status Critical Current

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  • Static Random-Access Memory (AREA)
  • Semiconductor Memories (AREA)

Abstract

PURPOSE:To solve nonconformity when a writing operation and a reading operation compete with each other by connecting the node of a memory cell connected to the drain of a transistor for the driving of reading to the gate of this transistor. CONSTITUTION:The memory cell has an information storing circuit composed of a 4-transistor type static cell having polycrystal silicon load resistance and a read only circuit composed of two serially connected transistors Q16 and Q17. Here, one of two nodes N10 and N11 to store information about a 4-transistor type dynamic cell is connected to the gate of the first transistor of the two serially connected transistors Q16 and Q17, a read only word selecting line RW is connected to a second transistor gate, and the drain of a second transistor is connected to a read only bit RB. Thus, a defect that correct information is not written to the memory cell when the writing operation and the reading operation compete with each other can be solved.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は半導体記憶装置に関し、特に書き込み動作およ
び読み出し動作が同時にかつ非同期に行なうことのでき
るMOS型回路などの半導体記憶装置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a semiconductor memory device, and particularly to a semiconductor memory device such as a MOS type circuit that can perform a write operation and a read operation simultaneously and asynchronously.

〔従来の技術〕[Conventional technology]

従来、この種の半導体記憶装置のメモリセルは、第2図
に示した様に情報を蓄積する2つのノード(N20・N
21)に対しそれぞれ書き込み用語選択線WWをゲート
とする転送用トランジスタ(Q22・Q23)および読
み出し用語選択線RWをゲートとする転送用トランジス
タ(Q24・Q25)が並列に接続されていた。WB、
WBは書き込み専用ビット線、WWは書き込み専用語選
択線、RB −RBは読み出し専用ビット線、RWは読
み出し専用語選択線、Q22・Q23は書き込み専用転
送トランジスタ、Q24・Q25は読み出し専用転送ト
ラジスタ、Q26・Q27はフリップフロップ駆動用ト
ランジスタ、R28・R29は負荷用多結晶シリコンで
ある。
Conventionally, a memory cell of this type of semiconductor memory device has two nodes (N20 and N20) that store information, as shown in FIG.
21), transfer transistors (Q22 and Q23) whose gates are connected to the write term selection line WW and transfer transistors (Q24 and Q25) whose gates are connected to the read term selection line RW are connected in parallel. W.B.
WB is a write-only bit line, WW is a write-only word selection line, RB - RB is a read-only bit line, RW is a read-only word selection line, Q22 and Q23 are write-only transfer transistors, Q24 and Q25 are read-only transfer transistors, Q26 and Q27 are flip-flop driving transistors, and R28 and R29 are polycrystalline silicon for load.

第4図は従来のメモリセルを用いた回路例を示す。WB
−WBは書き込み専用ビット線、WWは書き込み専用選
択線、RB −RB読み出し専用ビット線、RWは読み
出し専用語選択線、S、A。
FIG. 4 shows an example of a circuit using conventional memory cells. W.B.
-WB is a write-only bit line, WW is a write-only selection line, RB -RB is a read-only bit line, RW is a read-only word selection line, S, A.

はセンスアップ回路である。is a sense-up circuit.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上述した従来のメモリセルでは、書き込み動作と読み出
し動作が同時の行なわれた場合、書き込み用ビットと読
み出し用ビット線が電気的に接続された状態となるため
、例えば読み出し動作を行なっている状態で逆情報で書
き込もうとすると、メモリセルの情報を蓄積するノード
の電位が不安定になり、正しい情報が書き込まれない可
能性が生じる。
In the conventional memory cell described above, when a write operation and a read operation are performed at the same time, the write bit and the read bit line are electrically connected. If an attempt is made to write reverse information, the potential of the node that stores information in the memory cell will become unstable, and there is a possibility that correct information will not be written.

第3図に不具合が生じる場合のタイミングの例を示す。FIG. 3 shows an example of timing when a problem occurs.

ここでフリップフロップの2つのノードN20及びN2
1には初期状1(to)では各々n H”および”L”
になっていたとする。tlにおいて読み出し用選択線R
Wが”′L″→”l H1′にな第2図Q24およびQ
25かon状態となると読み出し用ビット線RBおよび
RBに、各々” H”および°′L°′が読みだされる
。この状態でメモリセルに逆情報を書き込むため、書き
込み用ビット線WB−W丁を各々II L”・H“とし
tlにおいて書き込み用選択線WWをII L”→“H
”°ととするとQ22及びQ23がon状態となり書き
込み用ビット線とメモリセル情報を蓄積するノード及び
読み出しビット線が接続される。このためメモリセルの
情報を蓄積するノード20はQ22とQ24の、またノ
ード21はQ2BとQ25の内部抵抗の比で決まる中途
半端な電位なる。
Here the two nodes of the flip-flop N20 and N2
1 has n H” and “L” in the initial state 1 (to), respectively.
Suppose that it was. At tl, read selection line R
W changes from "'L" to "l H1" in Figure 2 Q24 and Q
When the bit lines RB and RB are turned on, "H" and "L" are read out to the read bit lines RB and RB, respectively. In this state, in order to write reverse information to the memory cell, write bit lines WB-W are set to II L" and H" respectively, and write selection line WW is changed from II L" to "H" at tl.
``°'', Q22 and Q23 are turned on, and the write bit line, the node that stores memory cell information, and the read bit line are connected. Therefore, the node 20 that stores memory cell information is connected to Q22 and Q24. Further, the node 21 has an intermediate potential determined by the ratio of the internal resistances of Q2B and Q25.

またこの後時刻t3においてまず書き込み用語選択線w
wを°°H°゛→II L IIとするとQ22及びQ
23がoff状態となり、その後時刻t4において読み
出し用語選択線RWをII H”→IT L”とすると
Q24およびQ25がoff状態となりセモリセルの情
報を蓄積するノードは書き込み用ビット線及び読み出し
用ビット線より分離される。
Also, after this, at time t3, first write term selection line w
If w is °°H°゛→II L II, then Q22 and Q
23 is turned off, and then at time t4, the read term selection line RW is changed from II H" to IT L", Q24 and Q25 are turned off, and the node that stores information in the semory cell is connected to the write bit line and the read bit line. separated.

この時メモリセルの情報を蓄積するノードN20・N2
1は第3図に示した様にH”・”L″となり書き込み用
ビット線のデータが書き込まれず書き込み前のデータが
保持されてしまう。
At this time, nodes N20 and N2 that store information in memory cells
1 becomes H" and "L" as shown in FIG. 3, and the data on the write bit line is not written and the data before writing is held.

つまり書き込み動作と読み出し動作が競合した時には、
正しい情報がメモリセルに書き込まれない場合があると
いう欠点を有している。
In other words, when a write operation and a read operation conflict,
This has the disadvantage that correct information may not be written to the memory cells.

〔課題を解決するための手段〕[Means to solve the problem]

本発明のメモリセルは多結晶シリコン負荷抵抗を持つ4
トランジスタ型スタテツクセルから成る情報記憶回路お
よび2つの直列接続されたトランジスタから成る読み出
し専用回路とを有している。ここで4トランジスタ型ダ
イナミツクセルの情報を蓄積する2つのノードの内、一
方が前記直列接続された2つのトランジスの第一のトラ
ンジスタのゲートに接続され、第二のトランジスタゲー
トには読み出し専用語選択線が接続されかつ第二のトラ
ンジスタのドレインが読み出し専用ビットに接続された
ことを特徴としている。
The memory cell of the present invention has a polycrystalline silicon load resistance.
It has an information storage circuit consisting of a transistor-type static cell and a read-only circuit consisting of two series-connected transistors. Here, one of the two nodes for storing information of the four-transistor type dynamic cell is connected to the gate of the first transistor of the two transistors connected in series, and a read-only word is connected to the second transistor gate. The selection line is connected and the drain of the second transistor is connected to a read-only bit.

〔実施例〕〔Example〕

第1図は本発明の実施例の回路図である。WB・WBは
書き込み用ビット線、RBは読み出し用ビット線、WW
は書き込み用語選択線、RWは読み出し用語選択線、Q
12・QlBは書き込み用転送トランジスタ、Q14・
Q15はフリップフロップを形成する為の駆動用トラン
ジスタ、Q16は読み出し用転送トランジスタ、Q17
は読み出し用駆動トランジスタである。
FIG. 1 is a circuit diagram of an embodiment of the present invention. WB/WB is a write bit line, RB is a read bit line, WW
is the writing term selection line, RW is the reading term selection line, Q
12・QlB is a write transfer transistor, Q14・
Q15 is a driving transistor for forming a flip-flop, Q16 is a read transfer transistor, and Q17
is a read drive transistor.

ここで第5図に従い第1図のメモリセルの動作を説明す
る。
Here, the operation of the memory cell shown in FIG. 1 will be explained with reference to FIG.

初期状態(tO)に於てWB−WBをそれぞれ′。WB-WB in the initial state (tO), respectively.

H” ・”L“、WWをIT L”、N10・N11を
それぞれ”H”  、” L” 、RWを′L”、RB
をパH”であるとする。時刻tlにおいて読み出し動作
を行なう為にRWが”L”→+l Hl+に変化すると
読み出し駆動用トランジスタQ17がOn状態であるた
め読み出し転送用トランジスタQ16がonl、RBに
はIT L”状態が読み出される。
H", "L", WW as IT L", N10 and N11 as "H", "L", RW as 'L', RB
When RW changes from "L" to +l Hl+ to perform a read operation at time tl, the read drive transistor Q17 is in the on state, so the read transfer transistor Q16 changes to onl and RB. The “IT L” state is read.

この状態でt2において書き込み動作を行なう為にWW
を”L”→n H”に変化すると書き込み転送用トラン
ジスタQ12・Q13がon状fiとなり、NIO・N
llはそれぞれ”H”→IT L IT・”L ”→”
H”に変化する。ここで第1図のメモリセルにおいては
、従来のメモリセルと異なりメモリセルの内部ノードの
読み出し用ビット線がゲートによりアイソレートされた
形になっているため、書き込み動作前の状態に関わりな
く新しい情報が書き込めることになる。なお、R18、
R19は負荷用多結晶シリコンであるが、これは省略し
てもよい。
In this state, in order to perform a write operation at t2, WW
When it changes from “L” to nH, write transfer transistors Q12 and Q13 become on state fi, and NIO and N
ll is “H”→IT L IT・”L”→”
In the memory cell shown in FIG. 1, unlike conventional memory cells, the read bit line of the internal node of the memory cell is isolated by a gate, so the New information can be written regardless of the state of R18.
R19 is polycrystalline silicon for load, but this may be omitted.

〔発明の効果〕〔Effect of the invention〕

以上説明した様に本発明は、従来のメモリセルで読み出
し駆動用トランジスタのドレインに接続されていたメモ
リセルのノードを読み出し駆動用トランジスタのゲート
に接続することにより従来のメモリセルで問題とされた
書き込み動作と読み出し動作が競合した場合の不具合を
解消することが可能となった。
As explained above, the present invention solves the problems encountered in conventional memory cells by connecting the node of the memory cell, which was connected to the drain of the read drive transistor in the conventional memory cell, to the gate of the read drive transistor. This makes it possible to eliminate problems caused by conflict between write and read operations.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例の回路図、第2図。 第4図は従来の回路図、第3図は第2図の動作を示すタ
イミング図、第5図は第1図の動作を示すタイミング図
である。 WB −WB、・・・・・書き込み専用ビット線、WW
・・・・・・書き込み専用選択線、RB・旧・・読み出
し専用ビット線、RW・・・・・・読み出し専用語選択
線、NIO・Nil・・・・・・情報を蓄積するノード
、Q12・Q13・・・・・・書き込み専用転送トラン
ジスタ、Q14・Q15・・・・・・駆動用トランジス
タ、Q16・・・・・・読み出し専用転送トランジスタ
、Q17・・・・・・読み出し専用駆動トランジスタ。
FIG. 1 is a circuit diagram of an embodiment of the present invention, and FIG. 2 is a circuit diagram of an embodiment of the present invention. 4 is a conventional circuit diagram, FIG. 3 is a timing diagram showing the operation of FIG. 2, and FIG. 5 is a timing diagram showing the operation of FIG. 1. WB - WB, ... write-only bit line, WW
...Write-only selection line, RB/old...Read-only bit line, RW...Read-only word selection line, NIO/Nil...Node that stores information, Q12 -Q13...Write-only transfer transistor, Q14/Q15...Drive transistor, Q16...Read-only transfer transistor, Q17...Read-only drive transistor.

Claims (1)

【特許請求の範囲】[Claims] 書き込み動作に対して、読み出し動作が非同期で行なえ
る、記憶セルを有する半導体記憶装置において、前記記
憶セルが多結晶シリコン負荷抵抗を持つ4ランジスタ型
スタティックセルから成る情報記憶装置回路および読み
出し専用ビット線と接地電位の間に直列接続された2つ
のトランジスタから成る読み出し専用回路から構成され
、前記多結晶シリコン負荷抵抗を持つ4トランジスタ型
スタティックセルの情報を蓄積する2つのノードの内、
一方が前記直列接続された2つのトランジスタの第一の
トランジスタのゲートに接続され、第二のトランジスタ
のゲートには読み出し専用語選択線が接続されたことを
特徴とする半導体記憶装置。
A semiconductor memory device having a memory cell in which a read operation can be performed asynchronously with respect to a write operation, wherein the memory cell is a 4-transistor type static cell having a polycrystalline silicon load resistance, and a read-only bit line. Of the two nodes that store information of the four-transistor static cell having the polycrystalline silicon load resistor, the node is composed of a read-only circuit consisting of two transistors connected in series between
A semiconductor memory device, wherein one of the two transistors connected in series is connected to the gate of the first transistor, and a read-only word selection line is connected to the gate of the second transistor.
JP63078616A 1988-03-30 1988-03-30 Semiconductor memory Pending JPH01251384A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63078616A JPH01251384A (en) 1988-03-30 1988-03-30 Semiconductor memory

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63078616A JPH01251384A (en) 1988-03-30 1988-03-30 Semiconductor memory

Publications (1)

Publication Number Publication Date
JPH01251384A true JPH01251384A (en) 1989-10-06

Family

ID=13666820

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63078616A Pending JPH01251384A (en) 1988-03-30 1988-03-30 Semiconductor memory

Country Status (1)

Country Link
JP (1) JPH01251384A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04163790A (en) * 1990-10-29 1992-06-09 Nec Corp Semiconductor static memory
US6201758B1 (en) 1999-08-06 2001-03-13 Mitsubishi Denki Kabushiki Kaisha Semiconductor memory device permitting time required for writing data to be reduced
US7161868B2 (en) 2003-07-02 2007-01-09 Renesas Technology Corp. Multiport semiconductor memory device capable of sufficiently steadily holding data and providing a sufficient write margin

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS628395A (en) * 1985-07-03 1987-01-16 Hitachi Ltd Semiconductor memory circuit
JPS62170090A (en) * 1986-01-21 1987-07-27 Toshiba Corp Memory cell
JPS6356897A (en) * 1986-08-27 1988-03-11 Fujitsu Ltd Memory-mounted gate array
JPS63205890A (en) * 1987-02-23 1988-08-25 Hitachi Ltd semiconductor memory device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS628395A (en) * 1985-07-03 1987-01-16 Hitachi Ltd Semiconductor memory circuit
JPS62170090A (en) * 1986-01-21 1987-07-27 Toshiba Corp Memory cell
JPS6356897A (en) * 1986-08-27 1988-03-11 Fujitsu Ltd Memory-mounted gate array
JPS63205890A (en) * 1987-02-23 1988-08-25 Hitachi Ltd semiconductor memory device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04163790A (en) * 1990-10-29 1992-06-09 Nec Corp Semiconductor static memory
US6201758B1 (en) 1999-08-06 2001-03-13 Mitsubishi Denki Kabushiki Kaisha Semiconductor memory device permitting time required for writing data to be reduced
US7161868B2 (en) 2003-07-02 2007-01-09 Renesas Technology Corp. Multiport semiconductor memory device capable of sufficiently steadily holding data and providing a sufficient write margin

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