JPH01238106A - Corrosion-resistant ferromagnetic thin-film - Google Patents
Corrosion-resistant ferromagnetic thin-filmInfo
- Publication number
- JPH01238106A JPH01238106A JP6646788A JP6646788A JPH01238106A JP H01238106 A JPH01238106 A JP H01238106A JP 6646788 A JP6646788 A JP 6646788A JP 6646788 A JP6646788 A JP 6646788A JP H01238106 A JPH01238106 A JP H01238106A
- Authority
- JP
- Japan
- Prior art keywords
- corrosion
- magnetic
- resistant
- films
- ferromagnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000007797 corrosion Effects 0.000 title claims description 43
- 238000005260 corrosion Methods 0.000 title claims description 43
- 230000005294 ferromagnetic effect Effects 0.000 title claims description 33
- 239000010409 thin film Substances 0.000 title claims description 32
- 239000010408 film Substances 0.000 claims description 28
- 230000005291 magnetic effect Effects 0.000 claims description 28
- 229910045601 alloy Inorganic materials 0.000 claims description 17
- 239000000956 alloy Substances 0.000 claims description 17
- 239000000758 substrate Substances 0.000 claims description 14
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 8
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 229910052742 iron Inorganic materials 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 229910052802 copper Inorganic materials 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 229910052697 platinum Inorganic materials 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 150000002739 metals Chemical class 0.000 claims 2
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- 229910052750 molybdenum Inorganic materials 0.000 claims 1
- 229910052759 nickel Inorganic materials 0.000 claims 1
- 239000010410 layer Substances 0.000 description 26
- 230000005415 magnetization Effects 0.000 description 13
- 239000000463 material Substances 0.000 description 7
- 230000007423 decrease Effects 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 5
- 238000001704 evaporation Methods 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000003302 ferromagnetic material Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 229910017060 Fe Cr Inorganic materials 0.000 description 2
- 229910002544 Fe-Cr Inorganic materials 0.000 description 2
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 2
- 229910018104 Ni-P Inorganic materials 0.000 description 2
- 229910018536 Ni—P Inorganic materials 0.000 description 2
- UPHIPHFJVNKLMR-UHFFFAOYSA-N chromium iron Chemical compound [Cr].[Fe] UPHIPHFJVNKLMR-UHFFFAOYSA-N 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910020630 Co Ni Inorganic materials 0.000 description 1
- 229910002440 Co–Ni Inorganic materials 0.000 description 1
- 229910020516 Co—V Inorganic materials 0.000 description 1
- 229910002593 Fe-Ti Inorganic materials 0.000 description 1
- 229910017112 Fe—C Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910000808 amorphous metal alloy Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000010549 co-Evaporation Methods 0.000 description 1
- 239000011162 core material Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- FPVKHBSQESCIEP-JQCXWYLXSA-N pentostatin Chemical compound C1[C@H](O)[C@@H](CO)O[C@H]1N1C(N=CNC[C@H]2O)=C2N=C1 FPVKHBSQESCIEP-JQCXWYLXSA-N 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Landscapes
- Magnetic Heads (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は耐食性強磁性薄膜に関し、特に磁気記録媒体ま
たは磁気記録ヘッド材料として用いる強磁性薄膜に関す
る。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a corrosion-resistant ferromagnetic thin film, and particularly to a ferromagnetic thin film used as a magnetic recording medium or magnetic recording head material.
磁気記録技術はコンビエータ用リジッド磁気ディスク装
置、フレキシブル磁気ディスク装置をはじめ、ＶＴＲ％
テープレコーダ等の民生用まで幅広い分野で利用され、
さらに高記録密度化、高信頼性化が進められている。磁
気記録における高記録密度化は主として磁性層の薄層化
と高保磁力化及び磁気ヘッドの狭ギャップ化によって実
現されるが、磁性層の薄層化についてはＦｅ、Ｃｏ、Ｎ
ｉｉたはこれらの合金を主成分とする強磁性金属薄膜を
真空蒸澹、スパッタリングあるいは鍍金等の方法で基板
上に成膜して磁性層とする薄膜磁気記録媒体技術が注目
され、また、磁気ヘッドとしては狭ギヤツプ形成が容易
な薄膜プロセスを用い、コア材料としてＮｉＦｅ合金、
Ｃｏ系アモルファス合金等の強磁性薄膜を用いた薄膜磁
気ヘッド技術が注目されている。Magnetic recording technology includes rigid magnetic disk units for combiators, flexible magnetic disk units, and VTR%
It is used in a wide range of fields, including consumer products such as tape recorders.
Furthermore, efforts are being made to increase recording density and reliability. High recording density in magnetic recording is mainly achieved by making the magnetic layer thinner, increasing the coercive force, and narrowing the gap of the magnetic head.
ii) Thin-film magnetic recording media technology, in which a magnetic layer is formed by forming a ferromagnetic metal thin film containing these alloys as a main component on a substrate using methods such as vacuum evaporation, sputtering, or plating, has attracted attention. The head uses a thin film process that makes it easy to form a narrow gap, and the core material is NiFe alloy.
Thin film magnetic head technology using a ferromagnetic thin film such as a Co-based amorphous alloy is attracting attention.
このような強磁性薄膜を磁気ディスク、磁気ヘッド等の
デバイスとして実用化するためには、磁気記録装置使用
環境において耐食性を持つことが必要である。従来この
耐食性の実現手段にはアルミナ、８ｉ０□、８ｉ３Ｎ４
等の安定な材料で保＃！に＠を設けるとか（「磁気記録
技術」、昭和５８年日本工業センター刊）或いは耐食性
磁性元素との合金を形成するとかの方法（「金属表面工
学」、大谷南海男著昭和３７年日刊工業新聞社刊）があ
る。この場合、耐食性の非ａｍ元木として％ Ｃｌ８
ｉ１（”ＩＣｒ 、 ＡＩ、Ｍｏ 、 Ａｕ 、 Ｐ
を等が用いられる。In order to put such a ferromagnetic thin film into practical use as devices such as magnetic disks and magnetic heads, it is necessary to have corrosion resistance in the environment in which the magnetic recording device is used. Conventionally, the means to achieve this corrosion resistance are alumina, 8i0□, 8i3N4.
Protected with stable materials such as #! (``Magnetic Recording Technology'', published by Japan Industrial Center, 1981) or forming an alloy with a corrosion-resistant magnetic element (``Metal Surface Engineering'', written by Nankai Otani, published by Nikkan Kogyo Shimbun in 1960). (published by the company). In this case, %Cl8 as corrosion resistant non-am base wood
i1("ICr, AI, Mo, Au, P
etc. are used.
しかしながら１強磁性薄膜上に前者の如く保護膜を設け
る方法では、磁気記録媒体と磁気ヘッド間の空ｌｉ！（
スペーシング）が増大するので、再生信号出力低下の原
因となシ％また。後者の如く耐食性元素との合金を形成
する方法では、耐食性を上げるために耐食性元素の含有
量を増して行った場合飽和磁化量が低下する等の磁気特
性の劣化をひき起こす欠点がある。However, in the former method of providing a protective film on a ferromagnetic thin film, the space between the magnetic recording medium and the magnetic head is limited! (
Also, since the spacing increases, this will cause a decrease in the playback signal output. The latter method of forming an alloy with a corrosion-resistant element has the disadvantage that when the content of the corrosion-resistant element is increased in order to improve corrosion resistance, magnetic properties deteriorate, such as a decrease in saturation magnetization.
本発明の目的は、上記の情況に鑑み、強磁性薄膜の磁気
特性を損なうことなく、また、磁気ヘッド間の空隙を増
大せしめることなき耐食性強磁性薄膜を提供することで
ある。In view of the above circumstances, an object of the present invention is to provide a corrosion-resistant ferromagnetic thin film without impairing the magnetic properties of the ferromagnetic thin film or increasing the gap between magnetic heads.
本発明によれば、耐食性強磁性薄膜は、非磁性基板上に
強磁性薄膜と耐食性非磁性薄膜とを交互に積層する多層
膜構造からなることを含む。According to the present invention, the corrosion-resistant ferromagnetic thin film includes a multilayer film structure in which ferromagnetic thin films and corrosion-resistant nonmagnetic thin films are alternately laminated on a nonmagnetic substrate.
本発明の多層膜構造によれば、酸素の拡散は耐食性非磁
性層で阻止されるので耐食性を向上せしめ得る。また耐
食性非磁性元素との合金を形成した場合には、各強磁性
原子間の相互作用がこの耐食性非磁性元素によって阻害
されるので磁気特性の劣化を生じるが、多層膜中では強
磁性層線連続薄膜となっているので磁気特性の劣化は小
さく、耐食性の改善効果と比べれば全く問題を生じない
。According to the multilayer film structure of the present invention, the corrosion resistance can be improved because oxygen diffusion is blocked by the corrosion-resistant nonmagnetic layer. In addition, when an alloy is formed with a corrosion-resistant nonmagnetic element, the interaction between each ferromagnetic atom is inhibited by the corrosion-resistant nonmagnetic element, resulting in deterioration of magnetic properties.However, in a multilayer film, the ferromagnetic layer Since it is a continuous thin film, the deterioration of magnetic properties is small, and there is no problem at all compared to the effect of improving corrosion resistance.
以下図面を参照して本発明の詳細な説明する。The present invention will be described in detail below with reference to the drawings.
本実施例によれば１本発明の耐食性強磁性薄膜の一つは
、非磁性基板上と、その上に交互に積層された強磁性層
Ｂと耐食性非磁性層Ｃとの多層構造体を含み、また、他
の一つは、非磁性基板Ａと、その上に交互に積層された
第１の強磁性層Ｂ１および第２の強磁性層Ｂ２の積層多
層膜からなる強磁性層Ｂと耐食性非磁性層Ｃとの多層構
造体を含む。According to this embodiment, one of the corrosion-resistant ferromagnetic thin films of the present invention includes a multilayer structure of ferromagnetic layers B and corrosion-resistant nonmagnetic layers C alternately stacked on a nonmagnetic substrate. , and the other one is a non-magnetic substrate A, a ferromagnetic layer B consisting of a laminated multilayer film of a first ferromagnetic layer B1 and a second ferromagnetic layer B2 alternately laminated thereon, and a corrosion-resistant material. It includes a multilayer structure with a nonmagnetic layer C.
本発明に係わる非磁性基板Ａの材料には、Ａ１合金、表
面をアルマイト処理したＡ７合金、表面にＮ ｉ−Ｐメ
ツキを施し九アルミ合金およびガラス、またはＦｅ−Ｃ
ｏ、Ｆｅ−Ｎｉ 、Ｃｏ−Ｎｉ 、Ｆｅ−Ｔｉ 、Ｆｅ
−Ｃ。The materials of the nonmagnetic substrate A according to the present invention include A1 alloy, A7 alloy with anodized surface, 9 aluminum alloy and glass with Ni-P plating on the surface, or Fe-C
o, Fe-Ni, Co-Ni, Fe-Ti, Fe
-C.
Ｆｅ−８ｉ 、ｆ”ｅ −Ａｌ−８ｉ 、Ｃｏ−Ｖ 、
Ｃｏ−８ｍ、Ｃｏ−Ｐ、Ｃ。Fe-8i, f”e-Al-8i, Co-V,
Co-8m, Co-P, C.
−Ｎｉ−Ｐ等の強磁性合金、あるいはこれらに添加物を
加えたものの薄膜、更にはこれらのうち少くとも２種以
上を積層した多層膜を用いることができる。A thin film of a ferromagnetic alloy such as -Ni-P, or a ferromagnetic alloy with additives added thereto, or a multilayer film of at least two or more of these can be used.
また、本発明に係わる耐食性非磁性層Ｃの材料としては
、Ｃ，Ｓｉ、Ｃｕ、Ｃｒ、Ａ／、Ｍｏ、ＡｕおよびＰｔ
より選択された少くとも１種の元素、もしくは上記元素
を少くとも一種以上含有する合金の薄膜を用いることが
できる。Further, materials for the corrosion-resistant nonmagnetic layer C according to the present invention include C, Si, Cu, Cr, A/, Mo, Au, and Pt.
A thin film of an alloy containing at least one selected element or at least one of the above elements can be used.
上記の強磁性材料と耐食性非磁性材料とを２基の蒸発源
を持つ真空蒸着装置、もしくは２基のターゲットを持つ
スパッタリング装置で蒸発させ、２基の蒸発源のシャッ
ターを交互に開閉したシ或いは基体を２基の蒸発源上を
交互に通過させたシすることによって、基体上に２種類
の材料を交互に積層させることが出来る。また、特に第
１図および第２図に示した如く基板Ａ上の第１層と最表
面層とを耐食性非磁層Ｃとすることによって、さらに優
れた耐食性が与えられる。The above ferromagnetic material and corrosion-resistant non-magnetic material are evaporated in a vacuum evaporation device with two evaporation sources or a sputtering device with two targets, and the shutters of the two evaporation sources are alternately opened and closed, or By passing the substrate alternately over two evaporation sources, two types of materials can be alternately layered on the substrate. Furthermore, even better corrosion resistance can be provided by forming the first layer and the outermost surface layer on the substrate A as a corrosion-resistant non-magnetic layer C as shown in FIGS. 1 and 2.
以下、具体的な実験例を示して本発明をさらに詳細に説
明する。Hereinafter, the present invention will be explained in more detail by showing specific experimental examples.
〔実験例１〕
１０ Ｔｏｒｒ台の超高真空中で２基の電子線加熱装
置により、強磁性体であるＦｅと耐食性金属であるＣｒ
とを石英ガラス基板上に蒸着した。この時蒸着源上に設
けたシャッターの開閉時間を制御してＦｅ層とＣｒ層と
が交後に積層されるようにした。蒸着速度はに’ｅ、Ｃ
ｒ共にＩＯＡ／秒であった。[Experimental Example 1] Fe, a ferromagnetic material, and Cr, a corrosion-resistant metal, were heated using two electron beam heating devices in an ultra-high vacuum on a 10 Torr stand.
was deposited on a quartz glass substrate. At this time, the opening/closing time of a shutter provided on the evaporation source was controlled so that the Fe layer and the Cr layer were laminated after they were mixed. The deposition rate is 'e,C
Both r were IOA/sec.
同一条件下でシャッターの開閉時間だけを変えて、第１
表に示すＩＦｅ層、Ｃｒ層の厚さが異なる試料１〜６金
成膜した。ここで、１周期中のＦｅ層とＣｒ層の淳さは
それぞれ１００Ａとし、膜全体の厚さはいずれも約３０
０ＯＡとなるようにした。Under the same conditions, only the opening and closing time of the shutter was changed, and the first
Samples 1 to 6 with different thicknesses of the IFe layer and Cr layer shown in the table were formed into gold films. Here, the thickness of the Fe layer and the Cr layer during one cycle is each 100A, and the thickness of the entire film is approximately 30A.
It was set to 0OA.
次に試料１〜６と同一成膜条件で蒸着速度のみを変化さ
せた共蒸着によって、組成の異るＦｅ −Ｃｒ合金膜試
料７〜１２を成膜した。これらの試料の組成比を第２表
に示す。ここで、各試料の膜厚は実験例１と同じく約３
００ＯＡとし、以上１２個の試料につきその飽和磁化の
値を試料振動型磁力計でそれぞれ測定した。Next, Fe-Cr alloy film samples 7 to 12 having different compositions were formed by co-evaporation under the same film forming conditions as those for samples 1 to 6, with only the deposition rate changed. The composition ratios of these samples are shown in Table 2. Here, the film thickness of each sample is about 3
00OA, and the saturation magnetization value of each of the above 12 samples was measured using a sample vibrating magnetometer.
第３図は試料１〜１２の成膜直後の飽和磁化の値を示す
実測データ図である。図から明らかなように、Ｆｅ、Ｃ
ｒ多層膜の場合には飽和磁化は膜中のＦｅの含有量に比
例して変化しているが、Ｆｅ−Ｃｒ合金膜の場合には少
量のＣｒの添加によって飽和磁化が急激に減少し、４０
％以上のＣｒ添加で飽和磁化はＯ・になってしまい多層
膜とした時に比べて強磁性体として使える組成範囲は狭
い。FIG. 3 is a graph showing measured data showing the saturation magnetization values of samples 1 to 12 immediately after film formation. As is clear from the figure, Fe, C
In the case of an r multilayer film, the saturation magnetization changes in proportion to the Fe content in the film, but in the case of an Fe-Cr alloy film, the saturation magnetization decreases rapidly by adding a small amount of Cr. 40
% or more of Cr, the saturation magnetization becomes O. The composition range that can be used as a ferromagnetic material is narrower than when it is made into a multilayer film.
さらにこれらの試料を温度６０’Ｃ１相対湿度８０％の
恒温恒湿槽中に放置し、一定時間毎に取り出して腐食に
よる飽和磁化の低下を測定した。Further, these samples were left in a constant temperature and humidity chamber at a temperature of 60'C and a relative humidity of 80%, and were taken out at regular intervals to measure the decrease in saturation magnetization due to corrosion.
第４図は試料２と８の飽和磁化値の経時的変化を示す実
測データ図で、膜全体としてのＦｅ、Ｃｒの組成比が互
いに等しい試料２と８の飽和磁化の経時的変化を成膜直
後の値を１００として示したものである。この図は１合
金膜から成る試料８は腐食によって飽和磁化が大きく減
少するが、多層膜から成る試料２では飽和磁化の減少は
ほとんど見られず、良好な耐食性を示し、同等のＣｒ含
有量の膜では多層膜の方が合金膜に比べて耐食性に優れ
ていることを示している。Figure 4 is a diagram of actual measurement data showing the change over time in the saturation magnetization values of Samples 2 and 8. The value immediately after is shown as 100. This figure shows that Sample 8, which is made of a single-alloy film, has a large decrease in saturation magnetization due to corrosion, but Sample 2, which is made of a multilayer film, shows almost no decrease in saturation magnetization and exhibits good corrosion resistance. This shows that multilayer films have better corrosion resistance than alloy films.
〔実施例２〕
２基のターケラトを用いたＡｒガス中におけるＲ１”ス
パッタリングにより、Ａ１２０３−Ｔｉｅ基板上に第３
表に示す１１！ｉ４構成で多ＩＷＩ膜試料１３〜１７金
成臆した。また試料１３〜１７の作成に用いた強磁性層
のみを成膜し、試料１８〜２２とした。これらの試料の
膜厚は約１μｍである。これらの試料の成膜直後の飽和
磁化σ０と温度６０’Ｃ，相対湿度８０％の恒温恒湿槽
中に１０００時間放置した後の飽和磁化σを測定し、そ
の比（％）を同じく第３表にまとめた。[Example 2] A third layer was formed on an A1203-Tie substrate by R1'' sputtering in Ar gas using two Terkerat.
11 shown in the table! Multi-IWI film samples 13-17 were grown in the i4 configuration. In addition, only the ferromagnetic layer used in the preparation of Samples 13 to 17 was formed to form Samples 18 to 22. The film thickness of these samples is approximately 1 μm. The saturation magnetization σ0 of these samples immediately after film formation and the saturation magnetization σ after being left in a constant temperature and humidity chamber at a temperature of 60'C and a relative humidity of 80% for 1000 hours were measured, and the ratio (%) was calculated as follows. It is summarized in the table.
第３表から明らかなように１強磁性層と耐食性材料層と
を積層して多層膜とした試料（１８〜２２）は強磁性層
のみの試料に対して格段に優れた耐食性を示している。As is clear from Table 3, the samples (18 to 22), which are multilayer films made by laminating one ferromagnetic layer and a corrosion-resistant material layer, exhibit significantly superior corrosion resistance compared to samples with only a ferromagnetic layer. .
以上詳細に説明したように、本発明によれば、非磁性基
板上に強磁性金属薄膜と耐食性非磁性薄膜とを交互に積
層して多層膜とすることにより。As explained in detail above, according to the present invention, a ferromagnetic metal thin film and a corrosion-resistant nonmagnetic thin film are alternately laminated on a nonmagnetic substrate to form a multilayer film.
磁気記録媒体に磁気特性の大きな劣化を伴うことなく優
れた耐食性を付与し得る。Excellent corrosion resistance can be imparted to magnetic recording media without significant deterioration of magnetic properties.
第 ３ 表Table 3
第１図および第２図はそれぞれ本発明の一実施例を示す
耐食性強磁性薄膜の部分断面構造図、第３図は試料１〜
１２の成膜直後の飽和磁化の値を示す実測データ図、第
４図は試料２と８の飽和磁化値の経時的変化を示す実測
データ図である。
Ａ・・・非磁性基板％ ＢＩＢＩＩＢ２・・・強磁性
層、Ｃ・・・耐食性非磁性層。
代理人 弁理士 内 原 音
非七性纂様
第 ７ 図 勇 ２ｚ
０ ２０ ４０ ６０ ８０ １ｃ。
ＣＩ−含有量（幻
力 ３ に1 and 2 are partial cross-sectional structural diagrams of corrosion-resistant ferromagnetic thin films showing one embodiment of the present invention, and FIG. 3 shows samples 1 to 3.
FIG. 4 is an actual measurement data diagram showing the saturation magnetization value of samples 2 and 8 immediately after film formation, and FIG. A...Nonmagnetic substrate% BIBIIB2...Ferromagnetic layer, C...Corrosion resistant nonmagnetic layer. Agent Patent Attorney Uchihara Otohi Shichisho No. 7 Isamu 2z 0 20 40 60 80 1c. CI-Content (Phantom Power 3 to
Claims (4)
膜とを交互に積層する多層膜構造からなることを特徴と
する耐食性強磁性薄膜。(1) A corrosion-resistant ferromagnetic thin film characterized by having a multilayer film structure in which ferromagnetic metal thin films and corrosion-resistant nonmagnetic thin films are alternately laminated on a nonmagnetic substrate.
選択された少くとも１種の金属、または上記金属を少く
とも一種含有する合金、もしくはこれらの金属または合
金のうち少くとも２種以上を積層する多層膜からなるこ
とを特徴とする請求項（１）記載の耐食性強磁性薄膜。(2) The ferromagnetic metal thin film contains at least one metal selected from Fe, Co, and Ni, or an alloy containing at least one of the above metals, or at least two or more of these metals or alloys. 2. The corrosion-resistant ferromagnetic thin film according to claim 1, wherein the corrosion-resistant ferromagnetic thin film is composed of a laminated multilayer film.
Ａｌ，Ｍｏ，ＡｕおよびＰｔから選択される少くとも１
種の元素、もしくは上記元素を少くとも一種以上含有す
る合金からなることを特徴とする請求項（１）記載の耐
食性強磁性薄膜。(3) The corrosion-resistant nonmagnetic thin film is C, Si, Cu, Cr,
At least one selected from Al, Mo, Au and Pt
The corrosion-resistant ferromagnetic thin film according to claim 1, characterized in that it is made of a certain element or an alloy containing at least one of the above-mentioned elements.
耐食性非磁性薄膜からなることを特徴とする請求項（１
）記載の耐食性強磁性薄膜。(4) Claim (1) characterized in that both the first layer and the outermost layer on the non-magnetic substrate are made of corrosion-resistant non-magnetic thin films.
) Corrosion-resistant ferromagnetic thin film described.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6646788A JPH01238106A (en) | 1988-03-18 | 1988-03-18 | Corrosion-resistant ferromagnetic thin-film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6646788A JPH01238106A (en) | 1988-03-18 | 1988-03-18 | Corrosion-resistant ferromagnetic thin-film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01238106A true JPH01238106A (en) | 1989-09-22 |
Family
ID=13316614
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6646788A Pending JPH01238106A (en) | 1988-03-18 | 1988-03-18 | Corrosion-resistant ferromagnetic thin-film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01238106A (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01300504A (en) * | 1988-05-30 | 1989-12-05 | Nippon Telegr & Teleph Corp <Ntt> | Magnetic multilayered film |
| JPH03110809A (en) * | 1989-09-26 | 1991-05-10 | Matsushita Electric Ind Co Ltd | Soft magnetic thin film and magnetic head using the same |
| JPH04214203A (en) * | 1990-02-09 | 1992-08-05 | Internatl Business Mach Corp <Ibm> | Magnetic-film laminated body and magnetic recording head utilizing this body |
| US5277991A (en) * | 1991-03-08 | 1994-01-11 | Matsushita Electric Industrial Co., Ltd. | Magnetoresistive materials |
| JPH065423A (en) * | 1990-08-23 | 1994-01-14 | Internatl Business Mach Corp <Ibm> | High magnetic efficiency material and processing method of thin film head |
| US5578385A (en) * | 1991-03-29 | 1996-11-26 | Kabushiki Kaisha Toshiba | Magnetoresistance effect element |
| US5589221A (en) * | 1994-05-16 | 1996-12-31 | Matsushita Electric Industrial Co., Ltd. | Magnetic thin film, and method of manufacturing the same, and magnetic head |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59157826A (en) * | 1983-02-26 | 1984-09-07 | Dainippon Printing Co Ltd | Method for manufacturing magnetic recording media |
| JPS61290703A (en) * | 1985-06-19 | 1986-12-20 | Sony Corp | Soft magnetic thin film |
| JPS62279609A (en) * | 1986-05-28 | 1987-12-04 | Hitachi Ltd | ferromagnetic thin film |
-
1988
- 1988-03-18 JP JP6646788A patent/JPH01238106A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59157826A (en) * | 1983-02-26 | 1984-09-07 | Dainippon Printing Co Ltd | Method for manufacturing magnetic recording media |
| JPS61290703A (en) * | 1985-06-19 | 1986-12-20 | Sony Corp | Soft magnetic thin film |
| JPS62279609A (en) * | 1986-05-28 | 1987-12-04 | Hitachi Ltd | ferromagnetic thin film |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01300504A (en) * | 1988-05-30 | 1989-12-05 | Nippon Telegr & Teleph Corp <Ntt> | Magnetic multilayered film |
| JPH03110809A (en) * | 1989-09-26 | 1991-05-10 | Matsushita Electric Ind Co Ltd | Soft magnetic thin film and magnetic head using the same |
| JPH04214203A (en) * | 1990-02-09 | 1992-08-05 | Internatl Business Mach Corp <Ibm> | Magnetic-film laminated body and magnetic recording head utilizing this body |
| JPH065423A (en) * | 1990-08-23 | 1994-01-14 | Internatl Business Mach Corp <Ibm> | High magnetic efficiency material and processing method of thin film head |
| US5277991A (en) * | 1991-03-08 | 1994-01-11 | Matsushita Electric Industrial Co., Ltd. | Magnetoresistive materials |
| US5578385A (en) * | 1991-03-29 | 1996-11-26 | Kabushiki Kaisha Toshiba | Magnetoresistance effect element |
| US5589221A (en) * | 1994-05-16 | 1996-12-31 | Matsushita Electric Industrial Co., Ltd. | Magnetic thin film, and method of manufacturing the same, and magnetic head |
| US5849400A (en) * | 1994-05-16 | 1998-12-15 | Matsushita Electric Industrial Co., Ltd. | Magnetic thin film, and method of manufacturing the same, and magnetic head |
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