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JPH095701A - Liquid crystal display - Google Patents

Liquid crystal display

Info

Publication number
JPH095701A
JPH095701A JP15435195A JP15435195A JPH095701A JP H095701 A JPH095701 A JP H095701A JP 15435195 A JP15435195 A JP 15435195A JP 15435195 A JP15435195 A JP 15435195A JP H095701 A JPH095701 A JP H095701A
Authority
JP
Japan
Prior art keywords
liquid crystal
pixel electrode
substrate
display device
crystal layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15435195A
Other languages
Japanese (ja)
Inventor
Kishiro Iwasaki
紀四郎 岩▲崎▼
Masato Oe
昌人 大江
Sukekazu Araya
介和 荒谷
Junichi Hirakata
純一 平方
Katsumi Kondo
克己 近藤
Shin Yonetani
慎 米谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP15435195A priority Critical patent/JPH095701A/en
Publication of JPH095701A publication Critical patent/JPH095701A/en
Pending legal-status Critical Current

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  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

PURPOSE: To prevent the occurrence of the unequal display of a liquid crystal display device of a transverse electric field driving type by specifying the angle formed by the liquid crystal molecules held between a pixel electrode substrate and a non-pixel electrode substrate and the boundaries of the substrates and the thickness of a liquid crystal layer. CONSTITUTION: Common electrodes 1 are patterned on the one transparent glass substrate 7 of a liquid crystal element consisting of electrodes, driving means, oriented films and polarizing plates and signal electrodes 3 and the pixel electrodes 4 are formed on gate insulating films 2 formed the patterned electrodes. Insulating protective films and orientation control films 5 are applied and are subjected to orientation treatments. The liquid crystal layer is held between the transparent substrate (pixel electrode substrate) 7 and the other transparent substrate (non-pixel electrode substrate) 7 not formed with the electrodes. The pixel electrodes 4 impress the electric fields parallel with the substrates on the liquid crystal layer. The angle (pretilt angle) formed by the bar-shaped liquid crystal molecules 6 of the liquid crystal layer and the boundaries of the substrates 7 is specified to <=5 to 30 deg. and the thickness of the liquid crystal layer is specified to 4 to 10μm. As a result, the need for the selectivity of the refractive index anisotropy of the liquid crystals is eliminated and the thickness of the liquid crystal layer is increased.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、液晶の屈折率異方性Δ
nが大きくても、液晶層のギャップが大きくても低電圧
駆動が可能な横電界型液晶表示装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention
The present invention relates to a horizontal electric field type liquid crystal display device which can be driven at a low voltage even when n is large and a gap of a liquid crystal layer is large.

【0002】[0002]

【従来の技術】従来の液晶表示装置は、液晶に印加する
電界の方向基板界面にほぼ垂直な方向とすることで動作
する、ツイステッドネマチック(TN)表示方式に代表
される。一方、液晶に印加する電界の方向を基板界面に
ほぼ平行にする方式(横電界方式)として、櫛歯電極を
用いた方式が、例えば、特公昭63−21907 号,特表平5
−505247号公報により提案されている。この横電界方式
は従来のTN方式に比べて視野角が広いなどの利点があ
り注目されつつある。本発明のようなプレチルト角につ
いての記載は特表平5−505247 号公報にあるが、これに
ついての詳細な効果等の記述はない。
2. Description of the Related Art A conventional liquid crystal display device is typified by a twisted nematic (TN) display system which operates by setting a direction of an electric field applied to liquid crystal in a direction substantially perpendicular to a substrate interface. On the other hand, as a method (horizontal electric field method) for making the direction of the electric field applied to the liquid crystal substantially parallel to the substrate interface, for example, a method using comb-teeth electrodes is disclosed in Japanese Patent Publication No. 63-21907 and Japanese Patent Publication No.
-505247. This lateral electric field method is attracting attention because of its advantages such as a wider viewing angle than the conventional TN method. A description of the pretilt angle as in the present invention is found in Japanese Patent Publication No. H05-505247, but there is no description of the detailed effects thereof.

【0003】[0003]

【発明が解決しようとする課題】液晶の物性は駆動電
圧、応答時間及び透過率等の特性と関わりがあり、互い
に何らかの形で係っている。横電界方式を複屈折型で表
示する場合TNと同等の特性を得るためには、光の光路
長であるリターデーション(R)=Δnd(Δnは液晶
の屈折率異方性、dは液晶層の厚み)を4分の1波長程
度(例えば0.32μmにしなければならない。一方、
現状で市販されている実用的な液晶のΔnの最小値は
0.08 程度であるため、dの値は4μm近くとなる。
この厚みは市販されている多くの液晶素子に比べて非常
に小さい値である。一般に厚みが小さくなると厚みの不
均一による表示の色むらが顕著にでる。製品化に向けて
大きな障害となるのが必至である。
The physical properties of liquid crystals are related to characteristics such as driving voltage, response time, and transmittance, and are related to each other in some way. In order to obtain the same characteristics as TN in the case of displaying the in-plane switching mode as a birefringence type, in order to obtain characteristics equivalent to TN, retardation (R) = Δnd (Δn is a refractive index anisotropy of liquid crystal, d is a liquid crystal layer). Thickness of about 1/4 wavelength (eg 0.32 μm).
Since the minimum value of Δn of a practical liquid crystal commercially available at present is about 0.08, the value of d is close to 4 μm.
This thickness is a very small value as compared with many liquid crystal elements on the market. In general, when the thickness is reduced, display unevenness due to non-uniformity in thickness is remarkable. It will inevitably become a major obstacle to commercialization.

【0004】本発明の目的は表示むらのない横電界型液
晶表示装置を提供することにある。
An object of the present invention is to provide a horizontal electric field type liquid crystal display device having no display unevenness.

【0005】[0005]

【課題を解決するための手段】上記目的を達成するため
に、本発明では以下の手段を用いる。
In order to achieve the above object, the present invention uses the following means.

【0006】〔手段1〕電極と駆動手段と配向膜と偏光
板とからなる液晶素子のうち、一方の基板(画素電極基
板)上には画素電極が形成されており、他方の基板(非
画素電極基板)上には電極が形成されてなく、前記画素
電極が液晶層に主として基板面に平行な電界を印加する
構造を有する横電界駆動型の液晶表示装置において、前
記画素電極基板と非画素電極基板との間に挟まれた液晶
分子と前記基板の界面とのなす角(プレチルト角)が5
度以上30度以下であり、液晶層の厚み(ギャップ)が
4μmを越え10μm以下である液晶表示装置。
[Means 1] In a liquid crystal element including an electrode, a driving unit, an alignment film, and a polarizing plate, a pixel electrode is formed on one substrate (pixel electrode substrate) and the other substrate (non-pixel substrate). In the lateral electric field drive type liquid crystal display device in which no electrode is formed on the electrode substrate) and the pixel electrode applies an electric field mainly to the liquid crystal layer in parallel to the substrate surface, the pixel electrode substrate and the non-pixel The angle (pretilt angle) formed by the liquid crystal molecules sandwiched between the electrode substrate and the substrate is 5
A liquid crystal display device having a thickness of not less than 30 degrees and not more than 30 degrees, and a thickness (gap) of the liquid crystal layer exceeding 4 μm and not more than 10 μm.

【0007】〔手段2〕手段1において、前記画素電極
基板及び非画素電極基板上に形成した配向膜をラビング
し、互いのラビング方向をほぼ平行になるように組合
せ、それぞれの基板の外側に偏光板を設け、偏光板の偏
光軸を互いに直交させて複屈折型の表示モードとした液
晶表示装置。
[Means 2] In the means 1, the alignment films formed on the pixel electrode substrate and the non-pixel electrode substrate are rubbed, combined so that the rubbing directions are substantially parallel to each other, and polarized on the outside of each substrate. A liquid crystal display device in which a plate is provided and the polarization axes of the polarizing plates are orthogonal to each other to provide a birefringent display mode.

【0008】〔手段3〕手段1あるいは2において、前
記画素電極基板上にアクティブ素子が形成されている液
晶表示装置。
[Means 3] A liquid crystal display device according to the means 1 or 2, wherein an active element is formed on the pixel electrode substrate.

【0009】〔手段4〕手段1あるいは2において、非
画素電極基板上にRGBのカラーフイルタが形成されて
いる液晶表示装置。
[Means 4] A liquid crystal display device according to the means 1 or 2, wherein RGB color filters are formed on the non-pixel electrode substrate.

【0010】〔手段5〕手段1あるいは2において、前
記画素電極基板が櫛歯状に形成されている液晶表示装
置。
[Means 5] A liquid crystal display device according to the means 1 or 2, wherein the pixel electrode substrate is formed in a comb shape.

【0011】[0011]

【作用】一般にプレチルト角θをもたない液晶分子の屈
折率異方性ΔnはΔn=|n−n|で表される。し
かし、θがある角度をもったときの屈折率異方性(Δ
n′)は
In general, the refractive index anisotropy Δn of a liquid crystal molecule having no pretilt angle θ is represented by Δn = | n‖ −n⊥ |. However, the refractive index anisotropy (Δ
n ′) is

【0012】[0012]

【数1】 Δn′=√〔n 2cos2θ+n 2sin2θ〕−n…(数1) で表され見掛け上、Δn>Δn′となる。同じリターデ
ーション(R)とするならば、R=Δnd=Δn′d′
となり、よってd<d′となる(d′は見掛け上の液晶
層の厚み)。すなわち、プレチルト角がある大きさ以上
になると、屈折率異方性が小さくなり、液晶層の厚みを
大きくすることができる。最近、液晶層を厚くすれば、
厚みdの均一性が改善されることは経験的に知られてい
る。
[Equation 1] Δn ′ = √ [n 2 cos 2 θ + n 2 sin 2 θ] −n (Expression 1) and apparently Δn> Δn ′. If the same retardation (R) is used, R = Δnd = Δn′d ′
Therefore, d <d '(d' is the apparent thickness of the liquid crystal layer). That is, when the pretilt angle exceeds a certain value, the refractive index anisotropy becomes small and the thickness of the liquid crystal layer can be made large. Recently, if the liquid crystal layer is thickened,
It is empirically known that the uniformity of the thickness d is improved.

【0013】(1)横電界方式の動作原理 先ず初めに、本発明の必須構成である横電界方式の動作
原理を説明する。図2は電界方向9に対する界面近傍で
の液晶分子長軸(光学軸)方向10のなす角φLC,偏光
板の偏光透過軸11のなす角φP の定義を示す。偏光板
及び液晶界面はそれぞれ上下に一対あるので必要に応じ
てφP1,φP2,φLC1,φLC2と表記する。尚、図2は後
述する図1の正面図に対応する。
(1) Principle of operation of lateral electric field system First, the principle of operation of the lateral electric field system, which is an essential component of the present invention, will be described. FIG. 2 shows the definition of the angle φ LC formed by the liquid crystal molecule major axis (optical axis) direction 10 near the interface with respect to the electric field direction 9 and the angle φ P formed by the polarization transmission axis 11 of the polarizing plate. Since there are a pair of the polarizing plate and the liquid crystal interface above and below, respectively, they are denoted as φ P1 , φ P2 , φ LC1 , and φ LC2 as necessary. 2 corresponds to the front view of FIG. 1 described later.

【0014】図1(a),(b)は本発明の液晶パネル内
での液晶の動作を示す側断面を、図1(c),(d)はそ
の正面図を表す。図1には薄膜トランジスタ素子部は省
略され配線電極構造の一部が示されている。また、本発
明の表示装置は複数の画素で構成されるが、ここでは一
画素の中の部分のみを示した。電圧無印加時のセル側断
面を図1(a)に、その時の正面図を図1(c)に示
す。透明な一対の基板の内側に線状の電極1,4が形成
され、その上に保護膜および配向制御膜5が塗布及び配
向処理されている。この図では保護膜と配向制御膜が一
体化して描かれているが、一つの材料で兼用しても、二
つの材料を積層しても良い。間には液晶組成物が挟持さ
れている。棒状の液晶分子6は、電界無印加時には電極
1,4の長手方向(図1(c)正面図)に対して若干の
角度、即ち45度≦|φLC|<90度をもつように配向
されている。図1,図2では界面上の液晶分子長軸配向
0(ラビング)方向10を矢印で示した。上下界面上で
の液晶分子配向方向は、望ましい1例として平行、即ち
φLC1=φLC2(=φLC)となっている。液晶組成物の誘
電異方性は正を想定している。
1 (a) and 1 (b) are side sectional views showing the operation of the liquid crystal in the liquid crystal panel of the present invention, and FIGS. 1 (c) and 1 (d) are front views thereof. In FIG. 1, the thin film transistor element portion is omitted and a part of the wiring electrode structure is shown. Further, although the display device of the present invention is composed of a plurality of pixels, only a part within one pixel is shown here. FIG. 1A shows a cross section of the cell when no voltage is applied, and FIG. 1C shows a front view at that time. Linear electrodes 1 and 4 are formed inside a pair of transparent substrates, and a protective film and an orientation control film 5 are applied and oriented thereon. In this figure, the protective film and the orientation control film are integrally drawn, but one material may be used in common or two materials may be laminated. A liquid crystal composition is sandwiched between them. The rod-shaped liquid crystal molecules 6 are aligned such that they have a slight angle with respect to the longitudinal direction of the electrodes 1 and 4 (front view of FIG. 1C) when no electric field is applied, that is, 45 ° ≦ | φ LC | <90 °. Has been done. In FIG. 1 and FIG. 2, the long axis alignment 0 (rubbing) direction 10 of liquid crystal molecules on the interface is indicated by an arrow. As a desirable example, the alignment directions of liquid crystal molecules on the upper and lower interfaces are parallel, that is, φ LC1 = φ LC2 (= φ LC ). The dielectric anisotropy of the liquid crystal composition is assumed to be positive.

【0015】ここで、画素電極4と共通電極1のそれぞ
れに異なる電位を与えそれらの間に電位差を与えて液晶
組成物層に電界9を印加すると、液晶組成物が持つ誘電
異方性と電界との相互作用により図1(b),(d)に示
したように液晶分子が反応して電界方向にその向きを変
える。この時液晶組成物層の屈折率異方性と偏光板との
相互作用により明るさが変わる。
Here, when different electric potentials are applied to the pixel electrode 4 and the common electrode 1 and a potential difference is applied between them to apply the electric field 9 to the liquid crystal composition layer, the dielectric anisotropy and electric field of the liquid crystal composition are applied. As shown in FIGS. 1 (b) and 1 (d), the liquid crystal molecules react with each other due to the interaction with and change their direction to the direction of the electric field. At this time, the brightness changes due to the interaction between the refractive index anisotropy of the liquid crystal composition layer and the polarizing plate.

【0016】(2)プレチルト角の制御 プレチルト角は基板表面に形成した配向膜によって達成
される。具体的に無機配向膜としてはSiO斜方蒸着
法,グレーティング法が、有機配向膜としてはポリイミ
ド薄膜等の有機薄膜のラビング法(液晶デバイスハンド
ブック,日刊工業新聞社発行,p240)等が知られて
おり、何れの方法でも本発明の目的が達せられる。しか
し、生産性を考えるとポリイミド薄膜のラビング法が好
ましい。
(2) Control of Pretilt Angle The pretilt angle is achieved by the alignment film formed on the surface of the substrate. Specifically, the SiO oblique vapor deposition method and the grating method are known as the inorganic alignment film, and the rubbing method of an organic thin film such as a polyimide thin film (liquid crystal device handbook, published by Nikkan Kogyo Shimbun, p240) is known as the organic alignment film. Therefore, the object of the present invention can be achieved by either method. However, from the viewpoint of productivity, the rubbing method of a polyimide thin film is preferable.

【0017】[0017]

【実施例】本発明を実施例により具体的に説明する。EXAMPLES The present invention will be specifically described with reference to examples.

【0018】〔実施例1〕基板としては厚みが1.1mm
で表面を研磨した透明なガラス基板(200×270m
m)を2枚用いる。まずこれらの基板のうち一方の基板
の上に薄膜トランジスタを下記の手順で形成した。な
お、薄膜トランジスタおよび配線電極からなるマトリク
ス素子は横電界が印加出来るものであれば何でも良くそ
の製法は本発明の骨子には関係しないので、記述は簡単
化する。また、マトリクス素子の製法に関するここでの
記述は一例であって、これに限定されるものではない。
[Example 1] The substrate has a thickness of 1.1 mm.
Transparent glass substrate (200 × 270m
Use 2 m). First, a thin film transistor was formed on one of these substrates by the following procedure. The matrix element composed of the thin film transistors and the wiring electrodes may be any as long as a lateral electric field can be applied, and the manufacturing method thereof is not related to the essence of the present invention, and therefore the description will be simplified. Further, the description here regarding the manufacturing method of the matrix element is an example, and the present invention is not limited to this.

【0019】1画素の構造を示す図3のC−C′間の断
面図を模式的に表した図7,図8,図9を用いて本実施
例を説明する。
This embodiment will be described with reference to FIGS. 7, 8 and 9 which schematically show the cross-sectional view taken along the line CC ′ of FIG. 3 showing the structure of one pixel.

【0020】透明なガラス基板の一方7の上に、スパッ
タ法によりクロム膜を形成し、次に、ホトリソグラフィ
法によりゲート電極12と共通電極1をパターン化した
(図7(a))。その後、その上にCVD法により窒化
シリコン(SiN)からなるゲート絶縁膜2を形成し
(図7(b))、更にその上に同じくCVD法により、
表面層がn型非晶質シリコン(a−Si)膜であるa−
Si13を作製した(図7(c))。a−Si13の一
部を覆い薄膜トランジスタを形成するようにクロムから
なる信号電極(ドレイン電極)3及び画素電極4を、ス
パッタ法,ホトリソグラフィ法により形成した(図7
(d))。その上に、SiNからなる絶縁保護膜5を形
成した(図8(e))。その後、その上に遮光層22と
顔料のカラーフィルタ23cを形成し、更にその上に表
面平坦化用の樹脂23bをスピンコートした(図8
(f))。遮光層22としてはキャボット社製カーボン
微粒子(MONARCH800,粒径16nm)を1重量%混合し
たエポキシ樹脂を用いた。カラーフィルタの発色用顔料
は赤,緑,青の3原色に対してそれぞれフジハント社製
CR−6101,CG−5101,CB−6101を用
いた。スピンコートにより塗布し、85℃でプリベーク
した後、露光,現像を行い、最後に200℃でポストべ
ークして膜状のカラーフィルタを形成した。本実施例で
は、発色層として顔料を用いたが、本発明によればその
後の配向膜形成プロセスで高温に加熱する必要がないた
め、耐熱性の低いより色の鮮やかな染料タイプの発色剤
を使用しても良い。また、遮光層用材料としても本実施
例ではカーボンブラック微粒子のような液晶の比抵抗を
低下させる汚染源となる可能性のある材料を用いたが、
横電界方式そのものが汚染に強いため問題ない。むし
ろ、カーボンブラック微粒子は遮光率に極めて優れるた
め、より高い画質が実現出来る。もちろん、カーボンブ
ラック微粒子以外の顔料や染料等の他の絶縁製遮光剤を
用いてもなんら問題はない。またその上の平坦化用の樹
脂はエポキシ樹脂を用いたがこちらもこの材料に限定さ
れるものではない。次に、溶剤可溶型のポリイミド前駆
体であるRN−1046(日産化学社製)の溶液24a
をスピンコート法により塗布した(図8(g))。本実
施例では塗布方法としてスピンコート法を採用したが、
凸版印刷,オフセット印刷,スクリーン印刷等の各種の
印刷法,ロールコーティング法,ディップ法等均一な膜
厚に塗布出来る方法であればこれに限るものではない。
その後、この溶液を200℃まで加熱し、30分放置し
溶剤を除去した。このようにして緻密なポリイミド配向
膜24bを得た(図8(h))。次に、ラビングローラ
(24(c))に取り付けたバフ布(24(d))で、
この表面をラビング処理し、配向膜表面に液晶配向能を
付与した(図9(i))。本実施例では配向能を付与す
る方法として、ラビング法を採用したが、それ以外の例
えばSiO斜方蒸着も利用出来る。次に、同様の材料と
プロセスで配向膜表面に液晶配向能を付与した対向側の
基板と、それぞれの液晶分子配向能を有する表面24
(e)どうしを相対向させて、ポリマビーズからなるス
ペーサと周辺部のシール剤27とを介在させてセルを組
み立てた(図9(j))。このセルに液晶組成物6を真
空で注入し、紫外線硬化型樹脂からなる封止剤28で封
止した(図9(k))。その後、このセルに駆動回路,
偏光板,バックライト等を接続してモジュール化し、1
0.4 インチサイズの液晶表示装置を得た。
A chromium film was formed on one of the transparent glass substrates 7 by the sputtering method, and then the gate electrode 12 and the common electrode 1 were patterned by the photolithography method (FIG. 7A). After that, the gate insulating film 2 made of silicon nitride (SiN) is formed thereon by the CVD method (FIG. 7 (b)), and the CVD method is also formed thereon.
A- whose surface layer is an n-type amorphous silicon (a-Si) film
Si13 was produced (FIG. 7 (c)). A signal electrode (drain electrode) 3 and a pixel electrode 4 made of chromium were formed by a sputtering method or a photolithography method so as to cover a part of the a-Si 13 and form a thin film transistor (FIG. 7).
(D)). An insulating protective film 5 made of SiN was formed thereon (FIG. 8E). Thereafter, a light-shielding layer 22 and a pigment color filter 23c are formed thereon, and a surface planarizing resin 23b is spin-coated thereon (FIG. 8).
(F)). As the light-shielding layer 22, an epoxy resin containing 1% by weight of carbon fine particles (MONARCH 800, particle diameter 16 nm) manufactured by Cabot Corporation was used. As the color-developing pigment of the color filter, CR-6101, CG-5101 and CB-6101 manufactured by Fuji Hunt Co. were used for the three primary colors of red, green and blue, respectively. It was applied by spin coating, prebaked at 85 ° C., exposed and developed, and finally post-baked at 200 ° C. to form a film-like color filter. In this example, a pigment was used as the color-developing layer, but according to the present invention, since it is not necessary to heat to a high temperature in the subsequent alignment film forming process, a dye-type coloring agent having a low heat resistance and a brighter color is used. You may use it. Further, as the material for the light-shielding layer, in this embodiment, a material such as carbon black fine particles which may be a pollution source that lowers the specific resistance of the liquid crystal is used.
There is no problem because the lateral electric field method itself is resistant to contamination. Rather, since the carbon black fine particles have an extremely high light-shielding rate, higher image quality can be realized. Of course, there is no problem even if other insulating light-shielding agents such as pigments and dyes other than carbon black fine particles are used. Further, an epoxy resin was used as the resin for flattening the surface, but the resin is not limited to this material. Next, a solution 24a of RN-1046 (manufactured by Nissan Kagaku), which is a solvent-soluble polyimide precursor.
Was applied by spin coating (FIG. 8 (g)). In this embodiment, the spin coating method is adopted as the coating method,
It is not limited to this as long as it is a method capable of applying a uniform film thickness such as various printing methods such as letterpress printing, offset printing, screen printing, roll coating method, dip method and the like.
Then, this solution was heated to 200 ° C. and left for 30 minutes to remove the solvent. Thus, a dense polyimide alignment film 24b was obtained (FIG. 8 (h)). Next, with a buff cloth (24 (d)) attached to the rubbing roller (24 (c)),
This surface was subjected to a rubbing treatment to impart liquid crystal aligning ability to the surface of the alignment film (FIG. 9 (i)). In the present embodiment, the rubbing method was adopted as the method of imparting the orientation ability, but other methods such as SiO oblique vapor deposition can also be used. Next, a substrate on the opposite side in which the alignment film surface is provided with liquid crystal aligning ability by the same material and process, and the surface 24 having each liquid crystal molecule aligning ability.
(E) The cells were assembled with the spacers made of polymer beads and the sealing agent 27 in the peripheral portion interposed therebetween, with the cells facing each other (FIG. 9 (j)). The liquid crystal composition 6 was injected into this cell in a vacuum and sealed with a sealant 28 made of an ultraviolet curable resin (FIG. 9 (k)). After that, drive circuit to this cell,
Connects a polarizing plate, a backlight, etc. to make a module, 1
A 0.4 inch size liquid crystal display device was obtained.

【0021】次にこのようなプロセスで得た液晶表示装
置の構成について、より詳細に説明する。
Next, the structure of the liquid crystal display device obtained by the above process will be described in more detail.

【0022】上下界面上のラビング方向は互いにほぼ平
行で、かつ印加電界方向とのなす角度を88度(φLC1
=φLC2=88°)とした。これらの基板間に挟まれた
ネマチック液晶組成物の誘電率異方性Δεは正でその値
が9.0(1kHz,20℃)であり、屈折率異方性Δn
は0.0819(n=1.5603,n=1.478
4、但し波長589nm,20℃)である。液晶層の厚
み(ギャップ)dは球形のポリマビーズを基板間に分散
して挾持し、液晶封入状態で3μmから10μmの間を
1μmずつの8個の液晶表示装置を作製した。また、同
一の配向膜材料を同一プロセスでガラス基板上に形成
し、結晶回転法で液晶分子長軸のプレチルト角を測定し
たところ、20度であった。横電界型液晶表示装置にお
けるリターデーション(R)は0.28 から0.36μ
m の間が望ましいが、中間をとってRを0.32μm
として数1の計算からΔn′は0.0743となり、
d′は4.3μmとなる。
The rubbing directions on the upper and lower interfaces are substantially parallel to each other, and the angle with the direction of the applied electric field is 88 degrees (φ LC1
= Φ LC2 = 88 °). The dielectric anisotropy Δε of the nematic liquid crystal composition sandwiched between these substrates is positive and its value is 9.0 (1 kHz, 20 ° C.).
Is 0.0819 (n = 1.5603, n = 1.478
4, but with a wavelength of 589 nm and 20 ° C.). With respect to the thickness (gap) d of the liquid crystal layer, spherical polymer beads were dispersed and sandwiched between the substrates, and eight liquid crystal display devices each having a thickness of 3 μm to 10 μm and 1 μm each were manufactured in a state where the liquid crystal was enclosed. Further, the same alignment film material was formed on the glass substrate by the same process, and the pretilt angle of the liquid crystal molecule major axis was measured by the crystal rotation method. The retardation (R) in the horizontal electric field type liquid crystal display device is 0.28 to 0.36 μ.
m is desirable, but R is 0.32 μm in the middle
From the calculation of Equation 1, Δn ′ becomes 0.0743,
d'is 4.3 μm.

【0023】次に2枚の偏光板〔日東電工社製G122
0DU〕でパネルを挾み、一方の偏光板の偏光透過軸を
ラビング方向より若干小さな角度、即ちφP1=80°
(即ち、|φLC1−φP1|=8°)に設定し、他方をそれ
に直交、即ちφP2=−12°とした。これにより、画素
に印加される電圧VLCをゼロから徐々に増大させるにし
たがい明るさが減少し最小値をとる特性(図4)を得
た。本実施例では低電圧(VOFF)で暗状態,高電圧(V
ON)で明状態をとるノーマリクローズ特性を採用した。
Next, two polarizing plates [G122 manufactured by Nitto Denko Corporation]
0DU], and the polarization transmission axis of one polarizing plate is slightly smaller than the rubbing direction, that is, φ P1 = 80 °.
(That is, | φ LC1 −φ P1 | = 8 °), and the other is orthogonal, that is, φ P2 = −12 °. As a result, as the voltage V LC applied to the pixel was gradually increased from zero, the brightness decreased and reached the minimum value (FIG. 4). In this embodiment, a low voltage (V OFF ) causes a dark state, and a high voltage (V OFF ).
It has a normally closed characteristic that is bright when turned on.

【0024】薄膜トランジスタ及び各種電極の構造を図
3に示し、詳細に説明する。図3(a)は基板面に垂直
な方向から見た正面図、図3(b),(c)は側断面図を
表す。薄膜トランジスタ素子14は画素電極(ソース電
極)4,信号電極(ドレイン電極)3,走査電極(ゲー
ト電極)12、及びアモルファスシリコン13から構成
される。共通電極1と走査電極12、及び信号電極3と
画素電極4とはそれぞれ同一の金属層をパターン化して
構成した。容量素子16は、2本の共通電極1の間を結
合する領域(図3において点線で示した)において画素
電極4と共通電極1で絶縁保護膜2を挟む構造として形
成した。画素電極は正面図(図3(a))において、2本の
共通電極1の間に配置されている。画素ピッチは横方向
(すなわち信号配線電極間)は69μm、縦方向(すな
わち走査配線電極間)は207μmである。電極幅は、
複数画素間にまたがる配線電極である走査電極,信号電
極,共通電極配線部(走査配線電極に平行(図3で横方
向)に延びた部分)を広めにし、線欠陥を回避した。幅
はそれぞれ10μmである。一方、開口率向上のために
1画素単位で独立に形成した画素電極、及び共通電極の
信号配線電極の長手方向に伸びた部分の幅は若干狭く
し、それぞれ5μm,8μmとした。これらの電極の幅
を狭くしたことで異物等の混入により断線する可能性が
高まるが、この場合1画素の部分的欠落ですみ線欠陥に
は至らない。加えて、更にできるだけ高い開口率を実現
するために絶縁膜を介して共通電極と信号電極を若干
(1μm)重ねた。これにより、信号配線に平行な方向の
ブラックマトリクスは不要になる。そこで図3(c)に
示されているように、走査配線電極方向のみ遮光するブ
ラックマトリクス構造とした。このようにして、共通電
極と画素電極とのギャップが20μm,開口部の長手方
向の長さが157μmとなり、44.0% の高開口率が
得られた。画素数は640×3本の信号配線電極と48
0本の配線電極とにより640×3×480個とした。
複数画素から構成されるパネルの部分を図5,図6に示
す。図5ではブラックマトリクスを省略し、図6ではブ
ラックマトリクスで遮光した状態を示した。
The structures of the thin film transistor and various electrodes are shown in FIG. 3 and will be described in detail. FIG. 3A is a front view seen from a direction perpendicular to the substrate surface, and FIGS. 3B and 3C are side sectional views. The thin film transistor element 14 is composed of a pixel electrode (source electrode) 4, a signal electrode (drain electrode) 3, a scan electrode (gate electrode) 12, and amorphous silicon 13. The common electrode 1 and the scan electrode 12, and the signal electrode 3 and the pixel electrode 4 are formed by patterning the same metal layer. The capacitive element 16 is formed as a structure in which the insulating protective film 2 is sandwiched between the pixel electrode 4 and the common electrode 1 in a region (indicated by a dotted line in FIG. 3) connecting the two common electrodes 1. The pixel electrode is arranged between two common electrodes 1 in the front view (FIG. 3A). The pixel pitch is 69 μm in the horizontal direction (that is, between signal wiring electrodes) and 207 μm in the vertical direction (that is, between scanning wiring electrodes). The electrode width is
The scanning electrode, the signal electrode, and the common electrode wiring portion (the portion extending in parallel to the scanning wiring electrode (horizontal direction in FIG. 3)), which are wiring electrodes extending over a plurality of pixels, were widened to avoid line defects. Each width is 10 μm. On the other hand, in order to improve the aperture ratio, the widths of the pixel electrode formed independently for each pixel and the part of the common electrode extending in the longitudinal direction of the signal wiring electrode are slightly narrowed to 5 μm and 8 μm, respectively. By narrowing the width of these electrodes, the possibility of disconnection due to the inclusion of foreign matter or the like increases, but in this case, a partial defect of one pixel does not lead to a line defect. In addition, the common electrode and the signal electrode are slightly separated via an insulating film to achieve the highest possible aperture ratio.
(1 μm) stacked. As a result, the black matrix in the direction parallel to the signal wiring becomes unnecessary. Therefore, as shown in FIG. 3C, a black matrix structure that shields light only in the scanning wiring electrode direction is adopted. Thus, the gap between the common electrode and the pixel electrode was 20 μm, the length of the opening in the longitudinal direction was 157 μm, and a high aperture ratio of 44.0% was obtained. The number of pixels is 640 × 3 signal wiring electrodes and 48
The number of wiring electrodes was set to 640 × 3 × 480.
A panel portion composed of a plurality of pixels is shown in FIGS. In FIG. 5, the black matrix is omitted, and in FIG. 6, the black matrix is used to block light.

【0025】次に、回路構成及び駆動波形にいついて説
明する。各走査配線12および各信号配線3にはそれぞ
れ走査電極駆動用回路18および信号電極駆動用回路1
9を接続した。また、共通電極1にも共通電極駆動用回
路20を接続した(図10)。信号電極3には情報を有す
る信号波形が印加され、走査電極12には走査波形が信
号波形と同期をとって印加される。信号電極3から薄膜
トランジスタ14を介して画素電極4に情報信号が伝達
され、共通電極1との間で液晶部分に電圧が印加され
る。図11には駆動電圧波形の具体例を示す。なお、本
実施例の場合の振幅は、 VD-CENTER=14.0,VGH=28.0,VGL=0,VDH
=15.1,VDL=12.9,VCH=20,4,VCL
4.39 に設定し、その結果、ゲート電極とソース電極の間の寄
生容量による飛込み電圧ΔVGS(+),ΔVGS(-),画素電
極にかかる電圧VS ,液晶にかかる電圧VLCは下表のよ
うになった。なお、電圧の単位は以後すべてボルトとす
る。
Next, the circuit configuration and drive waveform will be described. A scanning electrode driving circuit 18 and a signal electrode driving circuit 1 are provided in each scanning wiring 12 and each signal wiring 3, respectively.
9 was connected. The common electrode driving circuit 20 was also connected to the common electrode 1 (FIG. 10). A signal waveform having information is applied to the signal electrode 3, and a scanning waveform is applied to the scanning electrode 12 in synchronization with the signal waveform. An information signal is transmitted from the signal electrode 3 to the pixel electrode 4 via the thin film transistor 14, and a voltage is applied to the liquid crystal portion between the signal electrode 3 and the common electrode 1. FIG. 11 shows a specific example of the drive voltage waveform. The amplitudes in this embodiment are V D-CENTER = 14.0, V GH = 28.0, V GL = 0, V DH
= 15.1, V DL = 12.9, V CH = 20, 4, V CL =
4.39, and as a result, the jump voltages ΔV GS (+) and ΔV GS (-) due to the parasitic capacitance between the gate electrode and the source electrode, the voltage V S applied to the pixel electrode, and the voltage V LC applied to the liquid crystal are It looks like the table below. The unit of voltage will be all volts hereinafter.

【0026】[0026]

【表1】 [Table 1]

【0027】図4に示すVON,VOFF はそれぞれ9.1
6ボルト,6.85ボルトとなった。プレチルト角が大
きくなった効果として、配向の不均一性がなくなり、表
示の均一性も高まった。表示性能を光電光度計で測定し
たところ、図15に示すように、VON時の透過率が液晶
層の厚み3μmから10μmの間でほぼ均一の35%
で、液晶層の厚み差による表示むらも一切見られず、均
一性の高い表示が得られた。
V ON and V OFF shown in FIG. 4 are 9.1 respectively.
It became 6 volts and 6.85 volts. As the effect of increasing the pretilt angle, the nonuniformity of the alignment is eliminated and the uniformity of the display is improved. When the display performance was measured with a photoelectric photometer, as shown in FIG. 15, the transmittance at V ON was almost uniform at 35% between the thickness of the liquid crystal layer of 3 μm and 10 μm.
Thus, no display unevenness due to the difference in the thickness of the liquid crystal layer was observed, and a highly uniform display was obtained.

【0028】〔実施例2〕実施例1のポリイミド配向膜
のRN−1046の代わりに、8Tシラン(信越化学
製)を2部とPIQ(日立化成製)98部の配向膜に変
えた以外は、実施例1と同様にして液晶表示装置を作製
した。このプレチルト角は30度であった。数1の計算
からΔn′は0.0635となり、d′は5.0μmとな
る。実施例1と同様にして評価したところ、図15に示
すようにプレチルト角が大きい分だけ透過率は40%に
増加したものの、液晶層の厚みによる変動は少なかっ
た。表示むらも一切見られず、均一性の高い表示が得ら
れた。
Example 2 Instead of the polyimide alignment film RN-1046 of Example 1, 8T silane (produced by Shin-Etsu Chemical Co., Ltd.) was used instead of 2 parts and PIQ (produced by Hitachi Chemical) 98 parts. A liquid crystal display device was manufactured in the same manner as in Example 1. This pretilt angle was 30 degrees. From the calculation of Equation 1, Δn ′ is 0.0635 and d ′ is 5.0 μm. When evaluated in the same manner as in Example 1, the transmittance increased to 40% as the pretilt angle increased as shown in FIG. 15, but the variation due to the thickness of the liquid crystal layer was small. No display irregularity was observed, and a highly uniform display was obtained.

【0029】〔実施例3〕実施例1のポリイミド配向膜
のRN−1046の代わりに、LQ−1800(日立化
成製)に変えた以外は、実施例1と同様にして液晶表示
装置を作製した。このプレチルト角は10度であった。
数1の計算からΔn′は0.0795 となり、d′は
4.0μm となる。実施例1と同様にして評価したとこ
ろ、図15に示すようにプレチルト角が小さい分だけ透
過率は30%と減少したものの、液晶層の厚みによる変
動は少なかった。液晶層の厚み差による表示むらも一切
見られず、均一性の高い表示が得られた。
[Example 3] A liquid crystal display device was produced in the same manner as in Example 1 except that LQ-1800 (manufactured by Hitachi Chemical Co., Ltd.) was used instead of RN-1046 of the polyimide alignment film of Example 1. . This pretilt angle was 10 degrees.
From the calculation of the equation 1, Δn ′ is 0.0795 and d ′ is 4.0 μm. When evaluated in the same manner as in Example 1, the transmittance decreased to 30% due to the small pretilt angle as shown in FIG. 15, but the variation due to the thickness of the liquid crystal layer was small. No display unevenness due to the difference in the thickness of the liquid crystal layer was observed, and a highly uniform display was obtained.

【0030】〔実施例4〕実施例1のポリイミド配向膜
のRN−1046の代わりに、RN−799(日産化学
社製)に変えた以外は、実施例1と同様にして液晶表示
装置を作製した。このプレチルト角は6度であった。数
1の計算からΔn′は0.0821 となり、d′は3.
9μm となる。実施例1と同様にして評価したとこ
ろ、図15に示すようにプレチルト角が小さい分だけ透
過率は26%と減少したものの、液晶層の厚みによる変
動は少なかった。液晶層の厚み差による表示むらも一切
見られず、均一性の高い表示が得られた。
[Example 4] A liquid crystal display device was produced in the same manner as in Example 1 except that RN-1046 (manufactured by Nissan Kagaku Co., Ltd.) was used in place of RN-1046 of the polyimide alignment film of Example 1. did. This pretilt angle was 6 degrees. From the calculation of Equation 1, Δn 'is 0.0821, and d'is 3.
It becomes 9 μm. When evaluated in the same manner as in Example 1, as shown in FIG. 15, the transmittance was reduced to 26% due to the small pretilt angle, but the variation due to the thickness of the liquid crystal layer was small. No display unevenness due to the difference in the thickness of the liquid crystal layer was observed, and a highly uniform display was obtained.

【0031】〔実施例5〕実施例1と同様にポリイミド
配向膜を用い、本実施例ではカラーフィルタを対向基板
側に形成した。本実施例の液晶表示装置の断面模式図を
図12に示す。対向側基板7の上に、複数の色を有する
カラーフィルタ23cを積層し、複数の色の境界がマト
リクス基板上の遮光層22の真上に配置されている。遮
光部の幅は50μmと一般的な液晶パネル組立て装置の
基板間のアライメント精度の3〜10μmに比べて大変
に広いため、極めて簡便に組み立てられる。また、本実
施例のカラーフィルタは、富士写真フィルム社製のポジ
型フィルム(FUJICHROME,PROVIA, 100DAYLIGHT, RDP II1
35)に1回の光照射で複数の色のパターンを形成して作
製した。フィルムはあらかじめ2枚の保護フィルムの間
に複数の発色層を有し、そのため液晶表示装置として必
要な色のパターンに対応したフォトマスクを通して光を
照射すれば、1回の光照射でカラーフィルタが得られ
る。この、カラーフィルタを対向基板の上にエポキシ系
接着剤により加圧しながら室温で接着した後、実施例1
と同様にして液晶表示装置を作製した。この装置の特性
を評価したところ、実施例1と同様な結果が得られ、液
晶層の厚み差による表示の色むらも一切見られず、均一
性の高い表示が得られた。このようなポジ型フィルムか
ら作製したカラーフィルタの色調は非常に鮮やかで、こ
れを用いた本発明の液晶表示装置の色も鮮やかになっ
た。
Example 5 A polyimide alignment film was used as in Example 1, and a color filter was formed on the counter substrate side in this example. FIG. 12 shows a schematic cross-sectional view of the liquid crystal display device of this example. A color filter 23c having a plurality of colors is laminated on the counter substrate 7, and boundaries of the plurality of colors are arranged right above the light shielding layer 22 on the matrix substrate. Since the width of the light-shielding portion is 50 μm, which is much wider than the alignment accuracy of 3 to 10 μm between the substrates of a general liquid crystal panel assembling apparatus, it can be assembled very easily. In addition, the color filter of this embodiment is a positive type film (FUJICHROME, PROVIA, 100DAYLIGHT, RDP II1 manufactured by Fuji Photo Film Co., Ltd.
In 35), a pattern of a plurality of colors was formed by single light irradiation. The film has a plurality of color-developing layers between two protective films in advance. Therefore, if light is irradiated through a photomask corresponding to a color pattern required for a liquid crystal display device, the color filter can be irradiated by one light irradiation. can get. After this color filter was adhered onto the counter substrate at room temperature while applying pressure with an epoxy adhesive,
A liquid crystal display device was produced in the same manner as in. When the characteristics of this device were evaluated, the same results as in Example 1 were obtained, no display color unevenness due to the difference in the thickness of the liquid crystal layer was observed, and a highly uniform display was obtained. The color tone of the color filter produced from such a positive type film was very vivid, and the color of the liquid crystal display device of the present invention using it was also vivid.

【0032】なお、本実施例では発色層を保護フィルム
の間にサンドイッチしたものを用い、カラーフィルタパ
ターンを形成した後にガラス基板と接着したが、初めか
らガラス基板上に発色層を形成してもよい。また、光露
光は1回が製造コストの点では望ましいが、複数回行っ
てもよい。
In this embodiment, a color-forming layer sandwiched between protective films was used and bonded to a glass substrate after forming a color filter pattern. However, even if the color-forming layer is formed on the glass substrate from the beginning. Good. Further, although it is preferable to perform the light exposure once in terms of manufacturing cost, it may be performed plural times.

【0033】〔実施例6〕実施例1と同様にポリイミド
配向膜を用い、本実施例では、Kodak 社製のポジ型フィ
ルムEKTACHROME DYNA 100 を用いて実施例5と同様のプ
ロセスでカラーフィルタを作製した。また、カラーフィ
ルタのパターンの中に遮光層を備え、アクティブ素子内
には遮光層を形成しなかった。図14は本実施例のカラ
ーフィルタ内の遮光層の配列を示す。図14(a)は側
断面を、図14(b)は正面から見たときのパターンを
表す。
[Example 6] A color filter was prepared by the same process as in Example 5, using a polyimide alignment film as in Example 1, and using a positive type film EKTACHROME DYNA 100 manufactured by Kodak in this example. did. In addition, the light shielding layer was provided in the color filter pattern, and the light shielding layer was not formed in the active element. FIG. 14 shows the arrangement of the light shielding layers in the color filter of this embodiment. FIG. 14A shows a side cross section and FIG. 14B shows a pattern when viewed from the front.

【0034】実施例1と同様に液晶表示装置を作製し、
特性を評価したところ実施例1と同様な結果が得られ、
液晶層の厚み差による表示の色むらも一切見られず、均
一性の高い表示が得られた。実施例4と同じく、このよ
うなポジ型フィルムから作製したカラーフィルタの色調
は非常に鮮やかで、これを用いた本実施例の液晶表示装
置の色も鮮やかになった。
A liquid crystal display device was manufactured in the same manner as in Example 1,
When the characteristics were evaluated, the same results as in Example 1 were obtained,
No display color unevenness due to the difference in the thickness of the liquid crystal layer was observed, and a highly uniform display was obtained. As in Example 4, the color tone of the color filter produced from such a positive type film was very vivid, and the color of the liquid crystal display device of this example using this was also vivid.

【0035】〔比較例1〕実施例1のポリイミド配向膜
のRN−1046の代わりに、PIQ(日立化成製)に
変えた以外は、実施例1と同様にして液晶表示装置を作
製した。このプレチルト角は1.0度であった。数1の
計算からΔn′は0.0865となり、d′は3.7μm
となる。実施例1と同様にして評価したところ、図1
5に示すようにプレチルト角が非常に小さいため透過率
は7%から24.5% まで変化し、液晶層の厚みによる
変化量は大きかった。液晶層の厚み差の変動による表示
の色むらが目立った。
Comparative Example 1 A liquid crystal display device was manufactured in the same manner as in Example 1 except that PIQ (manufactured by Hitachi Chemical Co., Ltd.) was used instead of RN-1046 of the polyimide alignment film of Example 1. This pretilt angle was 1.0 degree. From the calculation of Equation 1, Δn ′ is 0.0865 and d ′ is 3.7 μm.
Becomes When evaluated in the same manner as in Example 1, FIG.
As shown in 5, the pretilt angle was so small that the transmittance changed from 7% to 24.5%, and the change amount depending on the thickness of the liquid crystal layer was large. The display color unevenness was conspicuous due to the variation in the thickness difference of the liquid crystal layer.

【0036】〔比較例2〕実施例1のポリイミド配向膜
のRN−1046の代わりに、RN−718(日産化学
社製)に変えた以外は、実施例1と同様にして液晶表示
装置を作製した。このプレチルト角は4度であった。数
1の計算からΔn′は0.0842 となり、d′は3.
8μm となる。実施例1と同様にして評価したとこ
ろ、図15に示すようにプレチルト角が非常に小さいた
め透過率は14%から26%まで変化し、液晶層の厚み
による変化量は大きかった。液晶層の厚み差の変動によ
る表示の色むらが目立った。
[Comparative Example 2] A liquid crystal display device was produced in the same manner as in Example 1 except that RN-1046 (manufactured by Nissan Kagaku Co., Ltd.) was used in place of RN-1046 of the polyimide alignment film of Example 1. did. This pretilt angle was 4 degrees. From the calculation of Equation 1, Δn ′ is 0.0842 and d ′ is 3.
8 μm. When evaluated in the same manner as in Example 1, the transmittance changed from 14% to 26% because the pretilt angle was very small as shown in FIG. 15, and the amount of change due to the thickness of the liquid crystal layer was large. The display color unevenness was conspicuous due to the variation in the thickness difference of the liquid crystal layer.

【0037】以上実施例1から4により、横電界型の液
晶表示装置において、大きなプレチルト角を採用するこ
とにより、液晶層の厚みに対する裕度が増大し、表示む
らのない高画質の液晶表示装置が得られた。
According to Examples 1 to 4 described above, in the horizontal electric field type liquid crystal display device, by adopting a large pretilt angle, the margin with respect to the thickness of the liquid crystal layer is increased, and the liquid crystal display device with high image quality without display unevenness is obtained. was gotten.

【0038】[0038]

【発明の効果】本発明のように、横電界型の液晶表示装
置に高プレチルト角を導入することにより、液晶の屈折
率異方性(Δn)の選択性が不要で、液晶層の厚みが拡
大し、いわゆる製作プロセスに余裕度が増大し、表示む
らのない高画質の液晶表示装置が得られる。
According to the present invention, by introducing a high pretilt angle into a horizontal electric field type liquid crystal display device, the selectivity of the refractive index anisotropy (Δn) of the liquid crystal is unnecessary and the thickness of the liquid crystal layer is reduced. It is possible to obtain a high-quality liquid crystal display device which is enlarged and has increased margin in what is called a manufacturing process, and has no display unevenness.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の液晶表示装置における液晶の動作を示
す説明図。
FIG. 1 is an explanatory view showing an operation of liquid crystal in a liquid crystal display device of the present invention.

【図2】電界方向に対する、界面上の分子長軸配向方向
(ラビング方向)φLC,偏光板偏光軸方向φP のなす角
を示す説明図。
FIG. 2 is an explanatory diagram showing an angle formed by a molecular long axis orientation direction (rubbing direction) φ LC on the interface and a polarizing plate polarization axis direction φ P with respect to an electric field direction.

【図3】本発明の薄膜トランジスタ,電極,配線の構造
を示す説明図。
FIG. 3 is an explanatory diagram showing a structure of a thin film transistor, an electrode and a wiring of the present invention.

【図4】本発明の電気光学特性図。FIG. 4 is an electro-optical characteristic diagram of the present invention.

【図5】本発明の表示装置の複数画素の配置を示す説明
図。
FIG. 5 is an explanatory diagram showing an arrangement of a plurality of pixels of the display device of the present invention.

【図6】本発明の表示装置の複数画素の配置を示す説明
図。
FIG. 6 is an explanatory diagram showing an arrangement of a plurality of pixels of the display device of the present invention.

【図7】本発明の表示装置の製造プロセスを示す工程
図。
FIG. 7 is a process drawing showing the manufacturing process of the display device of the present invention.

【図8】本発明の表示装置の製造プロセスを示す工程
図。
FIG. 8 is a process drawing showing the manufacturing process of the display device of the present invention.

【図9】本発明の表示装置の製造プロセスを示す工程
図。
FIG. 9 is a process drawing showing the manufacturing process of the display device of the present invention.

【図10】カラーフィルタを搭載した本発明の液晶表示
装置の側断面図。
FIG. 10 is a side sectional view of a liquid crystal display device of the present invention equipped with a color filter.

【図11】本発明のカラーフィルタの製法を示すタイミ
ングチャート。
FIG. 11 is a timing chart showing a method for producing a color filter of the present invention.

【図12】本発明のカラーフィルタの別の実施例の説明
図。
FIG. 12 is an explanatory view of another embodiment of the color filter of the invention.

【図13】本発明の回路図。FIG. 13 is a circuit diagram of the present invention.

【図14】本発明の別の駆動波形図。FIG. 14 is another drive waveform diagram of the present invention.

【図15】本発明の測定結果を示す説明図。FIG. 15 is an explanatory diagram showing the measurement results of the present invention.

【符号の説明】[Explanation of symbols]

1…共通電極、2…ゲート絶縁膜、3…信号電極、4…
画素電極、7…基板、12…走査電極、13…アモルフ
ァスシリコン。
1 ... Common electrode, 2 ... Gate insulating film, 3 ... Signal electrode, 4 ...
Pixel electrode, 7 ... Substrate, 12 ... Scan electrode, 13 ... Amorphous silicon.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 平方 純一 千葉県茂原市早野3300番地 株式会社日立 製作所電子デバイス事業部内 (72)発明者 近藤 克己 茨城県日立市大みか町七丁目1番1号 株 式会社日立製作所日立研究所内 (72)発明者 米谷 慎 茨城県日立市大みか町七丁目1番1号 株 式会社日立製作所日立研究所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Junichi Shiro 3300 Hayano, Mobara-shi, Chiba Hitachi, Ltd. Electronic Device Division (72) Inventor Katsumi Kondo 7-1, 1-1 Omika-cho, Hitachi-shi, Ibaraki Hitachi, Ltd. Hitachi Research Laboratory (72) Inventor Shin Yoneya 7-1-1 Omika-cho, Hitachi City, Ibaraki Prefecture Hitachi Ltd. Hitachi Research Laboratory

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】電極と駆動手段と配向膜と偏光板とからな
る液晶素子のうち、一方の基板上には画素電極が形成さ
れており、他方の基板上には電極が形成されてなく、前
記画素電極が液晶層に主として基板面に平行な電界を印
加する構造を有する横電界駆動型の液晶表示装置におい
て、前記画素電極基板と非画素電極基板との間に挟まれ
た液晶分子と前記基板の界面とのなす角が5度以上30
度以下であり、液晶層の厚みが4μmを越え10μm以
下であることを特徴とする液晶表示装置。
1. A liquid crystal element comprising an electrode, a driving means, an alignment film and a polarizing plate, wherein a pixel electrode is formed on one substrate and no electrode is formed on the other substrate. In a lateral electric field drive type liquid crystal display device having a structure in which the pixel electrode applies an electric field mainly to the liquid crystal layer in parallel to the substrate surface, the liquid crystal molecule sandwiched between the pixel electrode substrate and the non-pixel electrode substrate and the liquid crystal molecule The angle with the interface of the substrate is 5 degrees or more 30
And a liquid crystal layer having a thickness of more than 4 μm and 10 μm or less.
【請求項2】請求項1において、前記画素電極基板及び
非画素電極基板上に形成した配向膜をラビングし、互い
のラビング方向をほぼ平行になるように組合せ、それぞ
れの基板の外側に偏光板を設け、偏光板の偏光軸を互い
に直交させて複屈折型の表示モードとした液晶表示装
置。
2. The method according to claim 1, wherein the alignment films formed on the pixel electrode substrate and the non-pixel electrode substrate are rubbed and combined so that the rubbing directions thereof are substantially parallel to each other, and a polarizing plate is provided outside each substrate. A liquid crystal display device in which a polarizing plate is provided and the polarization axes of the polarizing plates are orthogonal to each other to provide a birefringent display mode.
【請求項3】請求項1あるいは2において、前記画素電
極基板上にアクティブ素子が形成されている液晶表示装
置。
3. The liquid crystal display device according to claim 1, wherein an active element is formed on the pixel electrode substrate.
【請求項4】請求項1あるいは2において、非画素電極
基板上にRGBのカラーフイルタが形成されている液晶
表示装置。
4. A liquid crystal display device according to claim 1, wherein RGB color filters are formed on a non-pixel electrode substrate.
【請求項5】請求項1あるいは2において、前記画素電
極基板が櫛歯状に形成されている液晶表示装置。
5. The liquid crystal display device according to claim 1, wherein the pixel electrode substrate is formed in a comb shape.
JP15435195A 1995-06-21 1995-06-21 Liquid crystal display Pending JPH095701A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15435195A JPH095701A (en) 1995-06-21 1995-06-21 Liquid crystal display

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15435195A JPH095701A (en) 1995-06-21 1995-06-21 Liquid crystal display

Publications (1)

Publication Number Publication Date
JPH095701A true JPH095701A (en) 1997-01-10

Family

ID=15582270

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15435195A Pending JPH095701A (en) 1995-06-21 1995-06-21 Liquid crystal display

Country Status (1)

Country Link
JP (1) JPH095701A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100321950B1 (en) * 1998-06-02 2002-02-04 가네꼬 히사시 Active matrix type liquid crystal display
US7961263B2 (en) 1997-11-20 2011-06-14 Samsung Electronics Co., Ltd. Liquid crystal displays and manufacturing methods thereof
JP2014095838A (en) * 2012-11-09 2014-05-22 Stanley Electric Co Ltd Liquid crystal display device
JP2015064397A (en) * 2013-09-24 2015-04-09 スタンレー電気株式会社 Liquid crystal display element

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7961263B2 (en) 1997-11-20 2011-06-14 Samsung Electronics Co., Ltd. Liquid crystal displays and manufacturing methods thereof
KR100321950B1 (en) * 1998-06-02 2002-02-04 가네꼬 히사시 Active matrix type liquid crystal display
JP2014095838A (en) * 2012-11-09 2014-05-22 Stanley Electric Co Ltd Liquid crystal display device
JP2015064397A (en) * 2013-09-24 2015-04-09 スタンレー電気株式会社 Liquid crystal display element

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