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JPH094974A - Method and apparatus for drying coating film - Google Patents

Method and apparatus for drying coating film

Info

Publication number
JPH094974A
JPH094974A JP15615595A JP15615595A JPH094974A JP H094974 A JPH094974 A JP H094974A JP 15615595 A JP15615595 A JP 15615595A JP 15615595 A JP15615595 A JP 15615595A JP H094974 A JPH094974 A JP H094974A
Authority
JP
Japan
Prior art keywords
coating
coated
drying
coating film
contact
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15615595A
Other languages
Japanese (ja)
Other versions
JP3568634B2 (en
Inventor
Hiroshi Isobe
宏志 磯部
Tsutomu Shinozaki
勉 篠崎
Yasuhisa Kojima
康寿 小島
Sueyoshi Sekiuchi
季宜 関内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP15615595A priority Critical patent/JP3568634B2/en
Publication of JPH094974A publication Critical patent/JPH094974A/en
Application granted granted Critical
Publication of JP3568634B2 publication Critical patent/JP3568634B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Drying Of Solid Materials (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)

Abstract

PURPOSE: To provide a coating drying apparatus that suppresses the occurrence of uneven temperature due to contact with an object to be coated, that provides excellently flat coatings and film thickness distribution, and that obtains high- quality coated films. CONSTITUTION: When an object 11 coated with coating liquid 14 is dried by heating, the area of contact with the object 11 coated with the liquid is varied with the progress of heating the object 11 coated with the liquid. In the case five hot plates 12 having a plurality of proximity pins 13 are used to dry an object coated with the liquid, the positions of the proximity pins 13 brought into contact with the object 11 coated with the liquid are varied from one hot plate 12 to another. Transported from one hot plate to another, the object 11 coated with the liquid is heated at each of the five hot plates for a processing cycle time of 3-240 seconds. The positions of contact with the proximity pins 13 on the object 11 coated with the liquid are scattered, and the occurrence of uneven temperature due to contact with the proximity pins 13 is thereby prevented.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、塗膜液が塗膜された被
塗膜物を加熱して、塗膜を乾燥させる塗膜乾燥方法およ
びその装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a coating film drying method and apparatus for heating a coating material coated with a coating liquid to dry the coating film.

【0002】[0002]

【従来の技術】電子部品等の製造工程には、たとえば板
状の被塗膜物に塗膜液を所望の領域、形状に塗布した
後、この被塗膜物を加熱して塗膜の乾燥や平坦化する工
程がある。
2. Description of the Related Art In the process of manufacturing electronic parts, for example, a coating liquid is applied to a plate-shaped coating object in a desired area and shape, and then the coating object is heated to dry the coating film. And a step of flattening.

【0003】このような場合に用いられる加熱装置とし
ては、たとえば加熱用のホットプレートを複数ポジショ
ン設け、被塗膜物を各ポジションに所定のタクトタイム
で搬送し、各ホットプレートにそれぞれ設けた複数のプ
ロキシピンを介してホットプレートで順次加熱触し、こ
の被塗膜物を乾燥させる構成が知られている。
As a heating device used in such a case, for example, a plurality of hot plates for heating are provided, a coating object is conveyed to each position at a predetermined takt time, and a plurality of hot plates are provided on each hot plate. There is known a configuration in which the object to be coated is dried by sequentially heating and touching it with a hot plate via the proxy pin of No.

【0004】このように設定された乾燥装置において、
一定のタクトタイムで被塗膜物を各ポジションに順次搬
送し、被塗膜物および塗膜液を加熱して塗膜液を乾燥し
て平坦化している。
In the drying device set in this way,
The object to be coated is successively conveyed to each position at a constant takt time, and the object to be coated and the coating solution are heated to dry the coating solution and flatten it.

【0005】しかし、このような従来の乾燥装置では、
各ホットプレートに設けられたプロキシピンの位置が、
どのホットプレートでも同じであるため、塗膜液乾燥中
にプロキシピンと接触している被塗膜物の領域と、他の
領域との温度に違いが生じ、この一定領域に温度むらが
生じることがあり、塗膜の平坦性や品位が劣化する。
However, in such a conventional drying device,
The position of the proxy pin on each hot plate
Since it is the same on all hot plates, there is a difference in temperature between the area of the coating object that is in contact with the proxy pin and the other area during the drying of the coating solution, and temperature unevenness may occur in this certain area. Yes, the flatness and quality of the coating film deteriorate.

【0006】また、この種の被塗膜物の加熱乾燥方法と
して、上述したホットプレートを用いた方法の他に、塗
膜液が塗布された被塗膜物を乾燥炉内に搬入し、この乾
燥炉内の熱伝導、対流、輻射により被塗膜物の加熱する
構成も知られている。
As a method for heating and drying the coating material of this type, in addition to the method using the hot plate described above, the coating material to which the coating liquid is applied is carried into a drying oven, There is also known a structure in which a coating object is heated by heat conduction, convection, or radiation in a drying furnace.

【0007】そして、乾燥炉内の各ポジションに被塗膜
物を搬送する搬送アームと、この被塗膜物を乾燥炉内の
各ポジションにて固定支持する固定アームとが設けられ
る。また、被塗膜物は、これら搬送アームおよび固定ア
ーム上において、これらにそれぞれ設けられて支えピン
上に載置される。
A transport arm for transporting the coating object to each position in the drying furnace and a fixed arm for fixedly supporting the coating object at each position in the drying furnace are provided. Further, the object to be coated is mounted on the supporting pins which are respectively provided on the transfer arm and the fixed arm.

【0008】このように設定された乾燥炉内において、
一定のタクトタイムで被塗膜物を各乾燥ポジションに順
次搬送し、被塗膜物および塗膜液を加熱して塗膜液を乾
燥して平坦化している。
In the drying oven set in this way,
The object to be coated is sequentially conveyed to each drying position at a constant takt time, and the object to be coated and the coating solution are heated to dry the coating solution and flatten it.

【0009】しかし、このような従来の乾燥装置では、
搬送アームおよび固定アームにそれぞれ設けられた支え
ピンは、搬送アームおよび固定アームのどの位置でも同
じであるため、塗膜液乾燥中に支えピンと接触している
被塗膜物の一定領域と、他の領域との温度に違いが生
じ、この一定領域に温度むらが生じるおそれがあり、領
域の塗膜の平坦性や品位が劣化する一因となっている。
However, in such a conventional drying device,
Since the supporting pins provided on the transfer arm and the fixed arm are the same at any position of the transfer arm and the fixed arm, a certain area of the coating object that is in contact with the supporting pin during the drying of the coating solution and other areas. There is a possibility that a difference in temperature will occur between the area and the area, and temperature unevenness may occur in this certain area, which is one of the causes of deterioration of the flatness and quality of the coating film in the area.

【0010】[0010]

【発明が解決しようとする課題】このように、従来方法
では、各ホットプレートに設けられたプロキシピンや、
乾燥炉内の搬送アームおよび固定アームに設けられた支
えピンの位置が、それぞれ一定位置であるため、被塗膜
物には、これらプロキシピンや支えピンと接触する一定
領域と他の領域との間に温度の違いが生じる。このた
め、この一定領域の温度むらが顕著となり、この領域の
塗膜の平坦性や品位が劣化するおそれがある問題を有し
ている。
As described above, according to the conventional method, the proxy pin provided on each hot plate,
Since the positions of the supporting pins provided on the transfer arm and the fixed arm in the drying oven are constant, the coating object may have a certain area between the certain area in contact with the proxy pin or the supporting pin and another area. There is a difference in temperature. For this reason, there is a problem that the temperature unevenness in this fixed region becomes remarkable and the flatness and quality of the coating film in this region may deteriorate.

【0011】本発明は、上記問題点に鑑みなされたもの
で、被塗膜物の接触による温度むらの発生を抑制し、塗
膜の平坦性や膜厚分布が良好で、高品位の塗膜を得るこ
とができる塗膜乾燥方法およびその装置を提供すること
を目的とする。
The present invention has been made in view of the above problems, and suppresses the occurrence of temperature unevenness due to the contact of an object to be coated, the flatness and the thickness distribution of the coating are good, and the coating is of high quality. An object of the present invention is to provide a coating film drying method and an apparatus therefor capable of obtaining the following.

【0012】[0012]

【課題を解決するための手段】本発明は、塗膜液を塗膜
した被塗膜物を加熱して、塗膜を乾燥させる際に、被塗
膜物に加熱体との接触領域を変化させたり、乾燥炉内に
て被塗膜物を支持する支えピンの支持位置を変化させる
ものである。
Means for Solving the Problems The present invention changes a contact area of a coating material with a heating body when the coating material coated with a coating liquid is heated to dry the coating film. The support position of the support pin that supports the coating object in the drying furnace is changed.

【0013】[0013]

【作用】本発明は、塗膜液を塗膜した被塗膜物を、加熱
体との接触により加熱する際に、被塗膜物と加熱体との
接触領域を変化させたり、乾燥炉内にて被塗膜物の支持
に用いられる支えピンの被塗膜物に対する支持位置を変
化させ、被塗膜物の温度むらをなくして均一に塗膜を乾
燥させる。
The present invention changes the contact area between the object to be coated and the heating element when heating the object to be coated with the coating solution by contact with the heating element, or in a drying oven. By changing the supporting position of the support pin used for supporting the object to be coated with respect to the object to be coated, the temperature uniformity of the object to be coated is eliminated and the coating film is dried uniformly.

【0014】[0014]

【実施例】以下、本発明の一実施例を図面を参照して説
明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings.

【0015】図1に示すように、被塗膜物11を乾燥させ
る複数の加熱ポジション毎に加熱体としてのホットプレ
ート12を設けている。これらホットプレート12上には、
それぞれ複数のプロキシピン13が設けられており、塗膜
液14が塗膜された被塗膜物11は、ホットプレート12によ
り、これらプロキシピン13を介して間接的に加熱され
る。すなわち、被塗膜物11は、図示しない搬送機構によ
り、所定のタクトタイムで各ポジション毎に設けられた
複数のホットプレート12上に順次搬送され、プロキシピ
ン13を介して加熱される。その結果、被塗膜物11に塗膜
された塗膜液14が乾燥され、平坦化される。なお、最後
に被塗膜物11を冷却ポジションに搬送し、充分冷却した
後に次工程に取り出している。
As shown in FIG. 1, a hot plate 12 as a heating element is provided at each of a plurality of heating positions for drying the coating object 11. On these hot plates 12,
A plurality of proxy pins 13 are provided respectively, and the coating object 11 coated with the coating liquid 14 is indirectly heated by the hot plate 12 via these proxy pins 13. That is, the coating object 11 is sequentially transported by the transport mechanism (not shown) onto the plurality of hot plates 12 provided at each position at a predetermined takt time, and is heated via the proxy pin 13. As a result, the coating liquid 14 coated on the coating object 11 is dried and flattened. Finally, the coating object 11 is conveyed to the cooling position, cooled sufficiently, and then taken out to the next step.

【0016】ここで、各ホットプレート12にそれぞれプ
ロキシピン13を設けたのは、被塗膜物11とホットプレー
ト12との直接接触による温度勾配の発生を防止するため
である。すなわち、プロキシピン13を設けないと、被塗
膜物11には、ホットプレート12との接触面と非接触面と
の間に急激な温度勾配が生じ、反りや撓みなどの形状変
化が発生したり、塗膜液14の乾燥むらが生じたりする。
さらには、被塗膜物11の搬送に支障が生じたりして、塗
膜品位の劣化や歩留まり低下の主因となる。
Here, the reason why each hot plate 12 is provided with a proxy pin 13 is to prevent the occurrence of a temperature gradient due to the direct contact between the object to be coated 11 and the hot plate 12. That is, if the proxy pin 13 is not provided, a sharp temperature gradient occurs between the contact surface with the hot plate 12 and the non-contact surface of the object to be coated 11, and the shape change such as warpage or bending occurs. Or, unevenness in drying of the coating liquid 14 may occur.
Further, the conveyance of the coating object 11 is hindered, which is a main cause of deterioration of coating quality and reduction of yield.

【0017】そこで、各ホットプレート12にプロキシピ
ン13を設けて、被塗膜物11をプロシキピン13を介して間
接的に加熱するように構成している。
Therefore, each hot plate 12 is provided with a proxy pin 13 so that the coating object 11 is indirectly heated via the proxy pin 13.

【0018】また、これらプロシキピン13の配置位置
を、各ホットプレート12毎に異なるように設定してい
る。すなわち、図1に示すように、5つのポジションを
有するので、各ホットプレート12上におけるプロキシピ
ン13の配置は、図2で示すように変化させる。
Further, the arrangement positions of the proxy pins 13 are set to be different for each hot plate 12. That is, as shown in FIG. 1, since there are five positions, the arrangement of the proxy pins 13 on each hot plate 12 is changed as shown in FIG.

【0019】すなわち、第1ポジションではプロキシピ
ン131 の位置とし、第2ポジションでのプロキシピン13
2 の位置とする。以下、同様に第3ポジションから第5
ポジションまでのプロキシピン133 ,134 ,135 の位置
を順次変化させる。なお、図2では、1本のプロキシピ
ンの設置位置のみについて説明したが、図示していない
他のプロキシピンについても同様に設置位置を変化させ
る。
That is, the proxy pin 13 1 is located at the first position and the proxy pin 13 1 is located at the second position.
Position 2 . Similarly, from the 3rd position to the 5th
The positions of the proxy pins 13 3 , 13 4 , 13 5 up to the position are sequentially changed. Although only the installation position of one proxy pin has been described with reference to FIG. 2, the installation position is similarly changed for other proxy pins not shown.

【0020】このように、プロキシピン13の設置位置を
変化させた乾燥装置により、塗膜液14を塗膜した後の被
塗膜物11を乾燥させる場合、被塗膜物11を各ポジション
に設けられた40〜200℃程度の高温のホットプレー
ト12上に3〜240秒の所定のタクトタイムで順次搬送
し、それぞれプロキシピン13上に載置して乾燥させる。
このとき、被塗膜物11とプロキシピン13との接触位置
は、各ポジション毎に異なる。すなわち、被塗膜物11と
加熱体の一部であるプロキシピン13との接触領域を、各
ポジションへの搬送に対応して被塗膜物11に対する加熱
時間の推移とともに変化させている。このため、塗膜液
乾燥中に、被塗膜物11のプロキシピン13と接触している
領域と他の領域との温度の違いによる温度むらの発生を
極力抑制でき、塗膜全体の平坦性や品位を高く保てる。
In this way, when the coating object 11 after the coating solution 14 is coated is dried by the drying device in which the installation position of the proxy pin 13 is changed, the coating object 11 is moved to each position. The hot plate 12 having a high temperature of about 40 to 200 ° C. is sequentially conveyed for a predetermined tact time of 3 to 240 seconds, and each is placed on the proxy pin 13 and dried.
At this time, the contact position between the object to be coated 11 and the proxy pin 13 is different for each position. That is, the contact area between the object to be coated 11 and the proxy pin 13, which is a part of the heating element, is changed along with the transition of the heating time for the object to be coated 11 corresponding to the conveyance to each position. Therefore, it is possible to suppress the occurrence of temperature unevenness due to the difference in temperature between the area in contact with the proxy pin 13 of the object to be coated 11 and other areas during the drying of the coating film liquid as much as possible, and the flatness of the entire coating film. And maintain high quality.

【0021】ここで、被塗膜物11に塗膜された塗膜液14
を実際に乾燥する場合の、各ホットプレート12の温度や
タクトタイム、塗膜液の性質などの具体的な実施条件を
次のように設定する。
Here, the coating liquid 14 coated on the object to be coated 11
In the case of actually drying the, the specific operating conditions such as the temperature and tact time of each hot plate 12 and the properties of the coating liquid are set as follows.

【0022】まず、ホットプレートポジション1の温度
を75℃、ホットプレートポジション2の温度を80
℃、ホットプレートポジション3の温度を85℃、ホッ
トプレートポジション4の温度を90℃、ホットプレー
トポジション5の温度を95℃、そして、冷却の温度を
25℃に設定し、タクトタイムを40秒に設定する。
First, the temperature of the hot plate position 1 is 75 ° C. and the temperature of the hot plate position 2 is 80 ° C.
℃, the temperature of hot plate position 3 is 85 ℃, the temperature of hot plate position 4 is 90 ℃, the temperature of hot plate position 5 is 95 ℃, and the cooling temperature is 25 ℃, and the takt time is 40 seconds. Set.

【0023】また、塗膜液の粘度を50cP、溶媒沸点
を117℃、溶媒蒸気圧を50mmH2 O、固形分濃度
を5%、乾燥後の膜厚を0.5μmにする。
The viscosity of the coating solution is 50 cP, the solvent boiling point is 117 ° C., the solvent vapor pressure is 50 mmH 2 O, the solid content concentration is 5%, and the film thickness after drying is 0.5 μm.

【0024】さらに、プロキシピン13の直径を2mm、
高さを3mmにし、被塗膜物11の平面形状を450mm
×500mmとする。
Further, the diameter of the proxy pin 13 is 2 mm,
Height of 3mm, the planar shape of the coated object 11 is 450mm
× 500 mm.

【0025】そして、プロキシピン13の各ポジション毎
の変化量、すなわちプロキシピン131 ,プロキシピン13
2 ,プロキシピン133 …間の間隔を25mmとする。
The amount of change of the proxy pin 13 for each position, that is, the proxy pin 13 1 and the proxy pin 13
2 and the distance between the proxy pins 13 3 ... 25 mm.

【0026】上述の条件で塗膜乾燥させたところ、塗膜
上プロキシピン跡径は、プロキシピンの位置が一定の従
来例では15〜20mmであるのに対し、本実施例では
7〜9mmと小さくなり、品位が向上した。また、搬送
不良などの副作用も発生しない。
When the coating film was dried under the above conditions, the trace diameter of the proxy pin on the coating film was 15 to 20 mm in the conventional example in which the position of the proxy pin was constant, whereas it was 7 to 9 mm in this embodiment. It became smaller and the quality improved. Moreover, side effects such as poor transportation do not occur.

【0027】このように、塗膜済の被塗膜物11と加熱体
との接触領域を、被塗膜物の乾燥時間とともに変化させ
たので、プロキシピン13などの接触体との温度むらによ
る塗膜の平坦性劣化や品位低下のほとんどない塗膜乾燥
が可能となる。
As described above, the contact area between the coated object 11 and the heating element is changed with the drying time of the object to be coated. The coating film can be dried with almost no deterioration of the flatness of the coating film or deterioration of the quality.

【0028】次に、他の実施例を図3ないし図5を参照
して説明する。
Next, another embodiment will be described with reference to FIGS.

【0029】図5で示すように、被塗膜物11の乾燥に乾
燥炉17を用いており、図4で示す塗膜液14を塗膜後の被
塗膜物11を乾燥炉17内に搬入して、この乾燥炉17内の熱
伝導、対流、輻射により乾燥させている。また、この乾
燥炉17内には図5に示すように第1から第5までの5つ
の乾燥ポジション161 〜165 および1つの冷却ポジショ
ン166 が設けられている。なお、乾燥ポジションは5つ
に限らず、2〜10程度設定すれば良い。
As shown in FIG. 5, a drying oven 17 is used to dry the coating material 11, and the coating fluid 14 shown in FIG. It is carried in and dried by heat conduction, convection, and radiation in the drying furnace 17. In addition, as shown in FIG. 5, five drying positions 16 1 to 16 5 and one cooling position 16 6 from the first to the fifth are provided in the drying furnace 17. It should be noted that the number of drying positions is not limited to five and may be set to about 2 to 10.

【0030】また、この乾燥炉17内には、被塗膜物11を
各ポジション161 〜166 に搬送する搬送アーム18が設け
られ、この搬送アーム18で搬送された被塗膜物11を各ポ
ジション161 〜166 上で固定支持する固定アーム19が、
図3で示すように、搬送アーム18と平行に設けられてい
る。そして、これら搬送アーム18および固定アーム19の
図示上面には複数の支えピン20,21がそれぞれ設けられ
ている。
[0030] Also within the drying oven 17, the transfer arm 18 is provided for conveying the Hinurimakubutsu 11 in each position 161-164 6, to be coating material 11 that has been conveyed by the conveying arm 18 The fixed arm 19 that fixedly supports on each position 16 1 to 16 6
As shown in FIG. 3, it is provided in parallel with the transfer arm 18. A plurality of support pins 20 and 21 are provided on the upper surfaces of the transfer arm 18 and the fixed arm 19 in the figure.

【0031】ここで、支えピン20,21を設けたのは、プ
ロキシピン13の場合と同様に、被塗膜物11での温度勾配
の発生を防止するためである。すなわち、支えピン20,
21を設けずに被塗膜物11を直接搬送アーム18および固定
アーム19上で支えると、被塗膜物11には、各アーム18,
19との接触面と非接触面との間に急激な温度勾配が生
じ、被塗膜物11に反りや撓みなどの形状変化が発生した
り、塗膜液14に乾燥むらが生じたりする。さらには、被
塗膜物11の搬送に支障が生じたりして、塗膜品位の劣化
や歩留まり低下の主因となる。
Here, the support pins 20 and 21 are provided to prevent the occurrence of a temperature gradient in the object to be coated 11, as in the case of the proxy pin 13. That is, the support pin 20,
If the object to be coated 11 is directly supported on the transfer arm 18 and the fixed arm 19 without providing the 21, each of the arms 18,
A sharp temperature gradient is generated between the contact surface with 19 and the non-contact surface, causing a change in shape such as warpage or bending of the object to be coated 11, or unevenness in drying of the coating liquid 14. Further, the conveyance of the coating object 11 is hindered, which is a main cause of deterioration of coating quality and reduction of yield.

【0032】そこで、搬送アーム18および固定アーム19
にそれぞれ支えピン20,21を設けて、被塗膜物11がこれ
ら搬送アーム18および固定アーム19の表面に直接接触し
ないように構成している。
Therefore, the transfer arm 18 and the fixed arm 19
Support pins 20 and 21 are provided on the respective surfaces so that the object to be coated 11 does not directly contact the surfaces of the transfer arm 18 and the fixed arm 19.

【0033】この実施例では、さらにこれら支えピン2
0,21の相互間隔、すなわち、図4で示すA,B,C,
D,E,F,…がそれぞれ異なるように位置設定してい
る。このように支えピン20,21を位置設定することによ
り、被塗膜物11に対する支えピン20,21の支持位置を、
加熱時間の推移、すなわち、各ポジション161 〜166
の搬送の推移とともに変化させることができる。
In this embodiment, further, these support pins 2
The mutual intervals of 0 and 21, that is, A, B, C shown in FIG.
The positions are set so that D, E, F, ... Are different from each other. By setting the positions of the support pins 20 and 21 in this manner, the support positions of the support pins 20 and 21 with respect to the coating object 11 are
It can be changed along with the transition of the heating time, that is, the transition of the conveyance to each of the positions 16 1 to 16 6 .

【0034】このように構成された40〜200℃の高
温状態の乾燥炉17内において、3〜240秒のタクトタ
イムで被塗膜物11を、搬送アーム18により各乾燥ポジシ
ョン161 〜165 に順次搬送し、対応する乾燥ポジション
161 〜165 にて固定アーム19上に支持固定する。そし
て、これら各乾燥ポジション161 〜165 にて順次被塗膜
物11および塗膜液14を加熱して塗膜液の乾燥と平坦化し
ている。
In the drying oven 17 having a high temperature of 40 to 200 ° C. constructed as described above, the object 11 to be coated is dried at the drying positions 16 1 to 16 5 by the transfer arm 18 at a takt time of 3 to 240 seconds. To the corresponding drying position.
It is supported and fixed on the fixed arm 19 by 16 1 to 16 5 . Then, the coating object 11 and the coating liquid 14 are sequentially heated at the respective drying positions 16 1 to 16 5 to dry and flatten the coating liquid.

【0035】最後に、被塗膜物11を冷却ポジション166
に搬送し、被塗膜物11を充分冷却した後、次工程に取り
出している。
Finally, the object to be coated 11 is cooled to the cooling position 16 6
After being transported to and cooled sufficiently, the coating object 11 is taken out to the next step.

【0036】ここで、搬送アーム18による搬送時および
固定アーム19による支持固定時に、被塗膜物11はそれぞ
れ支えピン20,21上に支持されている。また、これら支
えピン20,21の相互間隔A,B,C,D,E,F,…
は、それぞれ異なるように位置設定してあるため、各ポ
ジション161 〜166 間の搬送時および各ポジション161
〜166 での支持固定時のそれぞれにおいて、被塗膜物11
と支えピン20,21との接触位置は、それぞれ異なってい
る。
Here, the object to be coated 11 is supported on the support pins 20 and 21, respectively, when being transported by the transport arm 18 and being supported and fixed by the fixed arm 19. In addition, the mutual spacing A, B, C, D, E, F, ... Of these support pins 20, 21 ...
Since that is situated set differently respectively, during transportation and the position 16 1 between each position 161-164 6
In each of the time supported and fixed in -16 6, Hinurimakubutsu 11
The contact positions of the support pins 20 and 21 are different from each other.

【0037】従来は、この支えピン20,21の相互間隔
A,B,C,D,E,F,…がそれぞれ等しかったた
め、塗膜液14の乾燥中に支えピン20,21と接触している
被塗膜物11の一定領域と、他の領域との温度に違いが生
じ、この一定領域に温度むらが顕著に生じて、塗膜の平
坦性や品位が劣化していたが、被塗膜物11と支えピン2
0,21との接触位置が、各ポジション161 〜166 間の搬
送時および各ポジション161〜166 での支持固定時のそ
れぞれにおいて異なっているため、このような問題はほ
とんど生じず、良好な塗膜状態を得ることができる。
Conventionally, since the mutual intervals A, B, C, D, E, F, ... Of the supporting pins 20 and 21 are equal to each other, they come into contact with the supporting pins 20 and 21 during the drying of the coating liquid 14. There is a difference in temperature between a certain area of the coating object 11 and another area, and temperature unevenness is remarkably generated in this certain area, which deteriorates the flatness and quality of the coating film. Membrane 11 and support pin 2
Contact position between 0,21 is because it differs in each of the time supported and fixed in the transport and at each position 161-164 6 between the positions 16 1 to 16 6, such a problem hardly occurs, A good coating state can be obtained.

【0038】ここで、被塗膜物11に塗膜された塗膜液14
を実際に乾燥する場合の、乾燥炉17内の各ポジション16
1 〜166 の温度やタクトタイム、塗膜液の性質など、具
体的な実施条件を次のように設定する。
Here, the coating liquid 14 applied to the object to be coated 11
Each position 16 in the drying oven 17 when actually drying
1-16 6 temperature and cycle time, etc. the nature of the coating solution, to set the specific implementation conditions as follows.

【0039】まず、第1の乾燥ポジションの温度を75
℃、第2の乾燥ポジションの温度を80℃、第3の乾燥
ポジションの温度を85℃、第4の乾燥ポジションの温
度を90℃、第5の乾燥ポジションの温度を95℃、そ
して、冷却ポジションの温度を25℃に設定し、タクト
タイムを40秒に設定する。
First, the temperature of the first drying position is set to 75.
℃, the temperature of the second drying position is 80 ℃, the temperature of the third drying position is 85 ℃, the temperature of the fourth drying position is 90 ℃, the temperature of the fifth drying position is 95 ℃, and the cooling position The temperature is set to 25 ° C and the takt time is set to 40 seconds.

【0040】また、塗膜液の粘度を50cP、溶媒沸点
を117℃、溶媒蒸気圧を50mmH2 O、固形分濃度
を5%、乾燥後の膜厚を0.5μmにする。
The viscosity of the coating liquid is 50 cP, the boiling point of the solvent is 117 ° C., the vapor pressure of the solvent is 50 mmH 2 O, the solid content concentration is 5%, and the film thickness after drying is 0.5 μm.

【0041】上述の条件で塗膜乾燥させたところ、塗膜
上支えピン跡径は、支えピンの間隔が一定の従来例では
15〜20mmであるのに対し、本実施例では7〜9m
mと小さくなり、品位が向上した。また、搬送不良など
の副作用も発生しない。
When the coating film was dried under the above-mentioned conditions, the trace diameter of the support pin on the coating film was 15 to 20 mm in the conventional example in which the spacing between the support pins was constant, whereas it was 7 to 9 m in this example.
It became as small as m and the quality was improved. Moreover, side effects such as poor transportation do not occur.

【0042】このように、塗膜済の被塗膜物11と支えピ
ン20,21との接触領域を、被塗膜物11の乾燥時間と共に
変化させたので、温度むらによる塗膜の平坦性劣化や品
位低下のほとんどない塗膜乾燥が可能となる。
As described above, the contact area between the coated object 11 and the supporting pins 20 and 21 was changed with the drying time of the object 11, so that the flatness of the coated film due to the temperature unevenness. The coating film can be dried with almost no deterioration or deterioration.

【0043】[0043]

【発明の効果】本発明によれば、塗膜液の乾燥に際し
て、被塗膜物と加熱体との接触位置、あるいは、被塗膜
物と乾燥炉内での支えピンとの接触位置を変化させたの
で、温度むらの発生が少なく、塗膜の平坦性劣化や膜圧
分布劣化、品位低下のほとんどない塗膜乾燥ができる。
According to the present invention, when the coating liquid is dried, the contact position between the coated object and the heating body or the contact position between the coated object and the supporting pin in the drying oven is changed. Therefore, temperature unevenness is less likely to occur, and the coating film can be dried with almost no deterioration in the flatness of the coating film, deterioration in the film pressure distribution, and almost no deterioration in quality.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例の塗膜乾燥装置を示す正面図
である。
FIG. 1 is a front view showing a coating film drying apparatus according to an embodiment of the present invention.

【図2】同上プロキシピンの配置関係を示す平面図であ
る。
FIG. 2 is a plan view showing a positional relationship of proxy pins of the same as above.

【図3】同上他の実施例の要部を示す平面図である。FIG. 3 is a plan view showing a main part of another embodiment of the same.

【図4】同上要部を示す正面図である。FIG. 4 is a front view showing a main part of the same.

【図5】同上全体構成を示す正面図である。FIG. 5 is a front view showing the overall configuration of the same.

【符号の説明】[Explanation of symbols]

11 被塗膜物 12 加熱体としてのホットプレート 17 乾燥炉 20,21 支えピン 11 Coating object 12 Hot plate as heating element 17 Drying oven 20, 21 Support pin

───────────────────────────────────────────────────── フロントページの続き (72)発明者 関内 季宜 埼玉県深谷市幡羅町一丁目9番2号 株式 会社東芝深谷電子工場内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Kiyoshi Kannai 1-9-2 Harara-cho, Fukaya-shi, Saitama Stock company Toshiba Fukaya electronics factory

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 塗膜液を塗膜した被塗膜物を加熱して、
前記塗膜を乾燥させる塗膜乾燥方法において、 前記被塗膜物に加熱体との接触により加熱させ、前記被
塗膜物と加熱体との接触領域を、被塗膜物に対する加熱
時間の推移とともに変化させることを特徴とする塗膜乾
燥方法。
1. An object to be coated coated with a coating liquid is heated,
In the coating film drying method for drying the coating film, the coating object is heated by contact with a heating body, and the contact area between the coating object and the heating body is changed over time. A method for drying a coating film, characterized in that
【請求項2】 塗膜液を塗膜した被塗膜物を加熱して、
前記塗膜を乾燥させる塗膜乾燥方法において、 前記被塗膜物を乾燥炉内に搬入して加熱し、 この乾燥炉内にて前記被塗膜物を支持する支えピンの支
持位置を加熱時間の推移とともに変化させることを特徴
とする塗膜乾燥装置。
2. A coating object coated with a coating solution is heated,
In the coating film drying method for drying the coating film, the coating object is loaded into a drying furnace and heated, and the supporting position of the supporting pin that supports the coating object in the drying furnace is heated for a heating time. A coating film drying device characterized in that it changes with the transition of.
【請求項3】 塗膜液を塗膜した被塗膜物を加熱して、
前記塗膜を乾燥させる塗膜乾燥装置において、 前記被塗膜物を接触により加熱させる接触領域を異なら
せた複数の加熱体を具備したことを特徴とする塗膜乾燥
装置。
3. A coating object coated with a coating solution is heated to
A coating film drying apparatus for drying the coating film, comprising: a plurality of heating bodies having different contact regions for heating the coating object by contact.
【請求項4】 塗膜液を塗膜した被塗膜物を加熱して、
前記塗膜を乾燥させる塗膜乾燥装置において、 前記被塗膜物を加熱する乾燥炉と、 この乾燥炉内にて前記被塗膜物の搬送支持し間隔を異な
らせた複数の支持体とを具備したことを特徴とする塗膜
乾燥装置。
4. An object to be coated coated with the coating liquid is heated,
In a coating film drying apparatus for drying the coating film, a drying furnace for heating the coating target object and a plurality of supports for conveying and supporting the coating target object in the drying furnace at different intervals are provided. A coating film drying device characterized by being provided.
JP15615595A 1995-06-22 1995-06-22 Method and apparatus for drying coating film Expired - Fee Related JP3568634B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15615595A JP3568634B2 (en) 1995-06-22 1995-06-22 Method and apparatus for drying coating film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15615595A JP3568634B2 (en) 1995-06-22 1995-06-22 Method and apparatus for drying coating film

Publications (2)

Publication Number Publication Date
JPH094974A true JPH094974A (en) 1997-01-10
JP3568634B2 JP3568634B2 (en) 2004-09-22

Family

ID=15621557

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15615595A Expired - Fee Related JP3568634B2 (en) 1995-06-22 1995-06-22 Method and apparatus for drying coating film

Country Status (1)

Country Link
JP (1) JP3568634B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006022232A1 (en) * 2004-08-24 2006-03-02 Kabushiki Kaisha Ishiihyoki Drying furnace for coating film
WO2016199689A1 (en) * 2015-06-11 2016-12-15 シャープ株式会社 Substrate treatment apparatus
CN115986136A (en) * 2022-12-22 2023-04-18 航天氢能(上海)科技有限公司 CCM electrode of fuel cell, preparation method thereof and membrane electrode
JP2023061011A (en) * 2021-10-19 2023-05-01 株式会社シモンズ Method for producing drying/coating table and coated object

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006022232A1 (en) * 2004-08-24 2006-03-02 Kabushiki Kaisha Ishiihyoki Drying furnace for coating film
KR101117536B1 (en) * 2004-08-24 2012-03-07 이시이 효키 가부시키가이샤 Drying furnace for coating film
US8167611B2 (en) 2004-08-24 2012-05-01 Kabushiki Kaisha Ishiihyoki Drying furnace for coated film
WO2016199689A1 (en) * 2015-06-11 2016-12-15 シャープ株式会社 Substrate treatment apparatus
JP2023061011A (en) * 2021-10-19 2023-05-01 株式会社シモンズ Method for producing drying/coating table and coated object
CN115986136A (en) * 2022-12-22 2023-04-18 航天氢能(上海)科技有限公司 CCM electrode of fuel cell, preparation method thereof and membrane electrode

Also Published As

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