JPH094677A - Anti-vibration method - Google Patents

Abstract

(57) [Abstract] [Purpose] To effectively prevent the occurrence of swinging of the main body of the apparatus held on the anti-vibration pad. [Structure] The stage thrust calculation function unit 11B is the stage 2
0A, 20B acceleration value and the stage 20A, 20B
The force acting on each stage is calculated based on the mass value of
The first coordinate transformation function unit 11C transforms the force acting on each of these stages into a force acting about the device main body weight center, and the second coordinate transformation function unit 11D and the control amount calculation function unit 11E.
Then, based on the conversion result, the actuators 7A to 7D and 32A to 32C are feed-forward controlled so as to cancel the force acting around the body weight of the apparatus and prevent the apparatus body from shaking. According to this, the actuator is effectively controlled by the controller controlling the actuator based on the mass value of each stage and the detected acceleration value, and effectively swinging.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vibration isolation method, and more particularly, it is suitable for application to vibration isolation of an apparatus body by moving a substrate stage in an exposure apparatus for exposing a mask pattern onto a photosensitive substrate. Anti-vibration method.

[0002]

2. Description of the Related Art Conventionally, in a lithographic process for manufacturing a semiconductor device, a liquid crystal display device or the like, a reticle pattern as a mask is formed on each shot area of a wafer (or a glass plate or the like) coated with a photoresist. An exposure device (stepper or the like) that transfers and exposes light onto a sheet is used. For example, in a one-shot exposure type exposure apparatus such as a stepper, when the reticle pattern is exposed on each shot area of the wafer, the reticle and the wafer need to be almost completely stationary. Therefore, in order to prevent the vibration from the floor from being directly transmitted to the portion above the surface plate of the exposure apparatus (exposure apparatus main body), the surface plate is installed on the floor via a vibration isolation table.

Recently, in order to expose a wider reticle pattern on a wafer without increasing the size of the projection optical system, the reticle is scanned in a direction perpendicular to the optical axis of the projection optical system. Then, a scanning exposure type exposure apparatus such as a step-and-scan method that sequentially exposes the pattern of the reticle onto the wafer by scanning the wafer in the corresponding direction at the same speed ratio as the magnification of the projection optical system is also available. Attention has been paid. In such a scanning exposure type exposure apparatus, since it is necessary to stably scan the reticle and the wafer at a constant speed during exposure, it is also necessary to eliminate the vibration from the floor via the anti-vibration table. .

The conventional anti-vibration table used in the exposure apparatus is constructed by disposing anti-vibration pads at the positions of the four vertices of a quadrangle on the floor, and the exposure apparatus is placed on these four anti-vibration pads. The surface plate of is installed. As the vibration-proof pad, a pneumatic damper, a mechanical damper in which a compression coil spring is put in damping liquid, or the like is used, and the vibration-proof pad itself has a certain centering function.

[0005]

In the passive vibration isolation by the vibration isolation pad as described above, the vibration from the floor to the exposure apparatus main body can be almost shut off, but in the exposure apparatus main body, for example, stepping of a wafer stage is performed. Since it takes a relatively long time to damp the vibration generated by an operation or the like, a waiting time is required until the vibration damps, which causes a problem that the throughput (productivity) of the exposure process cannot be improved.

The present invention has been made in view of the inconveniences of the prior art, and an object thereof is to effectively prevent the occurrence of rocking of the apparatus main body held on the vibration-proof pad. It is to provide an anti-vibration device.

[0007]

According to a first aspect of the present invention, there is provided an apparatus main body which is horizontally held via at least three anti-vibration pads, and at least one stage which moves on the apparatus main body. A vibration-damping method for use in an anti-vibration device for a stage device, comprising: using one or two or more actuators to suppress swinging of the device body caused by movement of each stage; The force acting on each stage is obtained based on the value and the mass value of each stage, the force acting on each stage thus obtained is converted into a force acting around the apparatus main body weight, and based on this conversion result It is characterized in that the one or more actuators are feed-forward controlled so as to cancel the force acting around the device main body weight and prevent the device body from swinging.

According to a second aspect of the present invention, there is provided a stage device including a device main body which is horizontally held via at least three anti-vibration pads and at least one stage which moves on the device main body. A vibration isolation method for use in an anti-vibration device, which suppresses oscillation in the 6-DOF direction generated in the device body due to movement of each stage by using at least six actuators, and detects acceleration of each stage. A first step; a second step of calculating a force acting on the stage for each stage based on a product of the acceleration value of the stage detected in the first step and a mass value of the stage; and a calculation in the second step Third, the force acting on each stage is converted into the force of 6 degrees of freedom acting around the device main body weight center.
A step; calculating a control amount of each of the actuators necessary to cancel each of the forces of 6 degrees of freedom converted in the third step, and a control amount calculated in the fourth step Fifth for driving each of the actuators based on
And a step.

[0009]

According to the invention described in claim 1, the force acting on each stage is obtained based on the acceleration value of each stage and the mass value of each stage, and the obtained force acting on each stage is determined by the device. Feedforward control of one or more actuators is performed so as to convert the force acting around the body center of gravity and cancel the force acting around the body center of gravity of the device based on the conversion result to prevent the device body from shaking. Therefore, the mass value of each stage is stored in the memory in advance, and it is possible to effectively prevent the apparatus main body from swinging only by detecting the acceleration when the stage is moved. That is, unlike the conventional case, the settling time of the swing generated in the apparatus main body by the movement of the stage is not shortened, but the influence of the movement of the stage on the apparatus main body is predicted and the influence is offset. Since the actuator is controlled, it is possible to prevent the apparatus body from swinging.

According to the second aspect of the invention, when each stage is driven, the acceleration of each stage is detected and the stage is acted on the basis of the product of the detected acceleration value of the stage and the mass of the stage. The force to perform is calculated for each stage. Then, the calculated force acting on each stage is converted into a force with 6 degrees of freedom acting around the body weight center of the apparatus, and each actuator control necessary to offset each of the converted forces with 6 degrees of freedom. Calculate the amount, and after that,
Each actuator is driven based on the calculated control amount. According to this, the force in the 6 degrees of freedom around the main body center of the device, which tends to swing the device main body by the force (thrust) acting on each stage, is canceled by the drive of each actuator.

[0011]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of a stepper type projection exposure apparatus to which the vibration isolation method according to the present invention is applied will be described below with reference to FIGS.

FIG. 1 shows a front view of a projection exposure apparatus according to one embodiment. In FIG. 1, four pedestals 2A, 2B, ... (2A, 2A in FIG.
2B only appears, and so on), and these four pedestals 2A, 2B, ...
3D to 3D, vibration damping pads 4A to 4D are installed, and the surface plate 6 of the projection exposure apparatus is installed on these vibration damping pads 4A to 4D via weighting sensors 5A to 5D. here,
As will be described later, since the projection optical system 25 is used in this embodiment, the Z axis is taken parallel to the optical axis of the projection optical system 25, and X is set in the plane parallel to the paper surface of FIG. 1 in the plane orthogonal to the Z axis. The axis is taken as the Y-axis in the direction orthogonal to the paper surface of FIG.

FIG. 3 is a sectional view taken along the line CC of FIG. As shown in FIG. 3, the vertical movement mechanisms 3A to 3D, the vibration isolation pads 4A to 4D, and the weight sensor 5 are provided.
A to 5D are arranged near the four apexes of the quadrangular bottom surface of the surface plate 6, respectively. As the vertical movement mechanisms 3A to 3D, for example, an electric height adjustment mechanism that adjusts the height by rotating a screw with a drive motor is used.
The height adjustment amount of A to 3D in the Z direction is controlled by the control device 11. Moreover, as the vibration-proof pads 4A to 4D,
A pneumatic damper or a mechanical damper in which a compression coil spring is put in damping liquid is used. Anti-vibration pad 4A ~
When a pneumatic damper is used as the 4D, the height of the vibration-damping pads 4A to 4D can be adjusted by the pressure of the air, so the pneumatic damper also serves as the vertical movement mechanisms 3A to 3D and the vibration-damping pads 4A to 4D, respectively. You can do it. A load cell composed of a strain gauge or the like can be used as the weight sensors 5A to 5D, and the weight from the surface plate 6 measured by the weight sensors 5A to 5D, that is, the vibration isolation pads 4A to 4D.
Is supplied to the control device 11 in the Z direction with respect to the surface plate 6.

Returning to FIG. 1, an actuator 7A is installed between the pedestal 2A and the surface plate 6 in parallel with the vibration isolation pad 4A. The actuator 7A includes a stator 9A fixed on the pedestal 2A and a mover 8A fixed on the bottom surface of the surface plate 6, and the pedestal 2A is responsive to an instruction from the control device 11.
To generate a biasing force in the Z direction with respect to the bottom surface of the surface plate 6 or a suction force from the bottom surface of the surface plate 6 toward the pedestal 2A. In the other vibration isolation pads 4B to 4D as well, similarly to the vibration isolation pad 4A, the actuators 7B to 7D are installed in parallel, and the biasing force or suction force of these actuators 7B to 7D is also set by the control device 11, respectively. The control method of the actuators 7A to 7D will be described later.

Next, a specific structure of the actuator 7A will be described with reference to FIG.

FIG. 2A shows an example of the structure of the actuator 7A. In FIG. 2 (a), the stator 9A has an S-pole shaft 9Ab on both sides of an N-pole shaft 9Aa.
9Ac is formed of a magnetized body. Also, the mover 8A
Is composed of an inner cylinder 12 loosely fitted to the shaft 9Aa, a coil 13 wound around the inner cylinder 12, and an outer cylinder 14 covering the coil 13, and by adjusting the current flowing through the coil 13, A shaft 9A is provided between the stator 9A and the mover 8A.
A force is generated in a direction (± Z direction) parallel to a.

FIG. 2 (b) shows another example of the actuator 7A. In FIG. 2B, the magnetic member stator 16 is fixed to the first member 15 and the second member 17 is fixed.
Inner cylinders 18A and 18B are fixed so as to sandwich the stator 16 therebetween, and the coil 1 is provided outside the inner cylinders 18A and 18B, respectively.
9A and 19B are wound. Also in this case, the balance of the attraction force between the first member 15 and the second member 17 is changed by adjusting the current flowing through the coils 19A and 19B, and the force is generated. Other actuator 7B
7D are configured similarly to the actuator 7A.

Returning to FIG. 1, a displacement sensor 10 for detecting the displacement of the surface plate 6 in the Z direction with respect to the floor 1 is installed between the floor 1 and the center of the bottom surface of the surface plate 6. The detection result of is also supplied to the control device 11. As the displacement sensor 10, for example, a linear potentiometer having a resolution of about 0.1 mm, a photoelectric linear encoder, or the like can be used.

A Y stage 20A driven in the Y-axis direction by a driving unit (not shown) is mounted on the surface plate 6, and an X stage driven in the X-axis direction by a driving unit (not shown) is mounted on the Y stage 20A. The stage 20B is placed. Further, a wafer 22 is suction-held on the X stage 20B via a Z leveling stage, a θ stage (all not shown), and a wafer holder 21.
First column 2 so as to surround Y stage 20A on surface plate 6
4 is planted, the projection optical system 25 is fixed to the central portion of the upper plate of the first column 24, and the second column 26 is planted on the upper plate of the first column 24 so as to surround the projection optical system 25. A reticle 28 is placed on the center of the upper plate of the second column 26 via a reticle stage 27.

As shown in FIG. 3, the moving position of the Y stage 20A is measured by the Y-axis laser interferometer 30Y, and the detection signal of the Y-axis laser interferometer 30Y is input to the control device 11. . Similarly, X stage 20B
As shown in FIG. 3, the moving positions of the first and second X
Is measured by the axis laser interferometer 30X _1, 30X _2, also in practice these X-axis laser interferometer 30X _1, the detection signal of 30X ₂ are input to the control device 11. Further, the Z leveling stage is configured so that driving in the Z axis direction and inclination with respect to the Z axis can be adjusted, and the θ stage is configured to be capable of minute rotation about the Z axis. Therefore, the wafer 22 can be three-dimensionally positioned by the Y stage 20A, the X stage 20B, the Z leveling stage, and the θ stage.

The reticle stage 27 is constructed so that the two-dimensional position of the reticle 28 can be finely adjusted and the rotation angle can be adjusted.

Further, an illumination optical system 29 is arranged above the reticle 28, and a main controller (not shown) relatively aligns the reticle 28 and the wafer 22 (alignment).
Also, while performing autofocus by a focus detection system (not shown), under the illumination light for exposure from the illumination optical system 29, an image of the pattern of the reticle 28 is projected on each shot area of the wafer 22 through the projection optical system 25. It is designed to be exposed sequentially.

As shown in FIG. 3, the first column 24 is in contact with the surface plate 6 by the four leg portions 24a to 24d. Further, a level sensor 23 for detecting the deviation amount of the tilt angle from the horizontal plane is installed in the vicinity of the Y stage 20A on the surface plate 6, and the detection result of the level sensor 23 is supplied to the control device 11.

Further, a movable shaft 35A is embedded in the side surface of the first column 24 in the -X direction, and an actuator 32A is attached between the movable shaft 35A and a column 31A fixed on the floor. Like the actuator 7A, the actuator 32A is composed of a stator 34A made of a magnetic body fixed to the column 31A and a mover 33A including a coil attached to the movable shaft 35A, and the controller 11A
The force can be applied to the movable shaft 35A in the + Y direction or the −Y direction by adjusting the current flowing through the coil in the mover 33A. Similarly, the movable shaft 35B is embedded in the side surface of the first column 24 in the + X direction,
An actuator 32B having the same configuration as the actuator 32A is attached between the column 5B and the column 31B fixed on the floor, and the movable shaft 35B is instructed by the control device 11.
The force can be applied to the + Y direction or the −Y direction. Further, the stator 3 is provided between the central portion of the side surface of the first column 24 in the + X direction and the pillar 31C on the floor.
An actuator 32C including 4C and a mover 33C is installed, and a force can be applied to the first column 24 in the + X direction or the −X direction via the actuator 32C according to an instruction from the control device 11. The control method of the actuators 32A to 32C by the control device 11 will also be described later.

Returning to FIG. 1, the columns 31A, 31B and 31C are planted on the floor along the first column 24.

Here, the center of gravity G of the apparatus main body including the surface plate 6, the Y stage 20A, the X stage 20B, the wafer holder 21, the first column 24, the projection optical system 25, the second column 26, the reticle stage 27, etc. is shown. 1 and the centers of the connecting portions of the movable shafts 35A and 35B with the first column 24 by the actuators 32A and 32B are set as action points AP and BP, respectively, and as shown in FIG. Assuming that the center of the connecting portion of the mover 34C with the first column 24 is the action point CP, in the present embodiment, the positions of the three action points AP, BP and CP in the Z direction are approximately the center of gravity G of the apparatus body. It is set to the same Z direction position (height).

Next, the operation of this embodiment constructed as described above will be explained.

First, the adjustment of the height and horizontal level of the surface plate 6 will be described. As shown in FIGS. 1 and 3, the vibration-damping pads 4A-4 measured by the load sensors 5A-5D.
The reaction force on the surface plate 6 for each D is transmitted to the control device 11. Further, the horizontal level of the surface plate 9 measured by the level sensor 23 on the surface plate 6 and the height of the surface plate 6 measured by the displacement sensor 10 are also transmitted to the control device 11. Based on these data, the control device 11 calculates the heights of the vibration-proof pads 4A to 4D for making the height and the horizontal level (tilt angle) of the surface plate 6 respectively preset values. . At that time, the heights of the vibration isolation pads 4A to 4D are determined so that the balance of the reaction forces transmitted from the vibration isolation pads 4A to 4D to the surface plate 6 is in a preset state. After that, the control device 11 sets the heights of the vibration isolation pads 4A to 4D to the calculated heights via the vertical movement mechanisms 3A to 3D, respectively. After that, the heights of the anti-vibration pads 4A to 4D are maintained at their set values. As a result, the surface plate 6 is not distorted, and the Y stage 2 on the surface plate 6 is prevented.
The positioning accuracy and the like of the 0A and the X stage 20B are maintained with high accuracy.

Next, a control method of the actuators 7A to 7D and 32A to 32D by the control device 11, that is, a vibration isolation method of the main body of the device will be described with reference to FIG.

First, each control function unit related to actuator control of the control device 11 will be described. The control device 11 includes an acceleration calculation function unit 11A, a stage thrust calculation function unit 11B, a first coordinate conversion function unit 11C, a second coordinate conversion function unit 11D, and a control amount calculation function unit 11E.

The acceleration calculation function unit 11A calculates the second stage differential value of the position detection signal from the Y-axis laser interferometer 30A to obtain the acceleration of the Y stage 20A, and
Determining the acceleration of the X stage 20B by calculating the arithmetic mean of the second order derivative of the second position detection signal from the laser interferometer 30X X-axis _1, 30X _2.

The stage thrust calculation function unit 11B has the acceleration values of the Y stage 20A and X stage 20B calculated by the acceleration calculation function unit 11A and the mass values of the respective stages (these mass values are known values, The force acting on the Y stage 20A and the X stage 20B is obtained by calculating the product of the above (stored in a memory (not shown)).

The first coordinate transformation function unit 11C transforms the force acting on each stage by the coordinate transformation between the coordinate system of each stage and the coordinate system of the main body weight center of the apparatus, and the force of 6 degrees of freedom around the main body weight center G of the apparatus. That is, the force in the X, Y, and Z directions acting on the center of gravity G and the rotational force around the X, Y, and Z axes passing through the center of gravity G are converted.

The second coordinate conversion function unit 11D obtains the total force around the device main body weight center G after being converted by the first coordinate conversion function unit for each direction of the degree of freedom, and also the coordinate system of the device main body weight center. And 7 actuators 7A, 7B, 7C, 7
By coordinate conversion with the coordinate system of D, 32A, 32B, and 32C, the total sum of forces in the directions of 6 degrees of freedom around the body weight center G is calculated for each actuator (7A, 7B, 7C, 7D, 32A, 32).
B, 32C) is converted into a force acting on each position.

The control amount calculation function unit 11E includes actuators 7A, 7A necessary for canceling the force acting on each actuator position converted by the second coordinate conversion function unit 11D.
The control amounts of B, 7C, 7D, 32A, 32B, and 32C are respectively obtained, and the actuators 7A, 7B, 7C, 7D, 32A, 32B, and 32 are determined according to these control amounts.
Drive C respectively.

That is, the control unit 11 estimates the force acting on each stage based on the acceleration value and the mass value of each stage to move the center of gravity G in the directions of six degrees of freedom, and cancels this force. Actuators 7A required for
The control amounts of 7B, 7C, 7D, 32A, 32B, and 32C are obtained, and the actuators 7A, 7B, 7C, 7D, 32A, 32B, and 3 are so-called feedforward control.
2C is driven and controlled.

According to this, as shown in the control block diagram of FIG. 4, when each stage is driven, the thrust of each stage tries to move the main body of the apparatus around the center of gravity G in the directions of 6 degrees of freedom. To do. That is, there is a coordinate conversion block 40 indicated by a dotted line in FIG. 4, and the forces (thrust) P ₁ and P acting on each stage by the coordinate conversion block 40 are present.
₂ is the force F _x1 , F _y1 , F _z1 , in the direction of 6 degrees of freedom around the center of gravity G,
The phenomenon is such that it is converted into N _x1 , N _y1 , and N _z1 . Here, the forces F _x1 , F _y1 , and F _z1 act on the center of gravity G in X, Y, and
The forces in the Z direction, and the forces N _x1 , N _y1 and N _z1 are rotational forces about the X, Y and Z axes passing through the center of gravity G.

On the other hand, in the control device 11, the forces F _x1 and F _{x are} exerted by the functions of the functional units 11A to 11E as described above.
Actuators 7A, 7B, 7C, 7D, 32A, 32B, which _act to cancel the forces _y1 , F _z1 , N _x1 , N _y1 , and N _z1
Since feedforward control is performed so that the actuators 7A, 7B, 7C, 7D,
2A, 32B, 32C are theoretically F _x1 , F _y1 , F _z1 ,
Forces F _{1 to} F ₇ capable of canceling N _x1 , N _y1 and N _z1 are generated respectively. Even in this case, the forces F _{1 to} F ₇ generated by the seven actuators respectively cause the center of gravity G
Since an attempt is made to move around in the direction of 6 degrees of freedom, there is a coordinate conversion block 42 indicated by a dotted line in FIG. 4, and by this coordinate conversion block 42, the forces F _{1 to} F ₇ are about 6 degrees of freedom around the center of gravity G. the direction of the force _{F xO, F yO, F zO} , N xO,
The phenomenon is such that it is converted into N _yO and N _zO .

Therefore, the X stage 20B and the Y stage 2
When 0A is moved, the apparatus main body, each of which is an output 6 DOF force F _x = F _x1 -F _xO the summing point 44A~44F shown in FIG. _{4, F y = F y1 -F} yO , F _{z
= F z1 -F zO, N x} = N x1 -N xO, N y = N y1 -N yO,
Although N _z = N _z1 -N _zO will act, in the present embodiment, _{computationally, F x1 = F xO, F} y1 = F yO, F z1 =
_{F zO, N x1 = N xO} , N y1 = N yO, since a _{N z1 = N zO, F x} = F y = F z = N x = N y = N z = 0 , and the the device body Is in the same state as no force acts, and the device body does not swing in any direction. Actually, since there are measurement errors and calculation errors of the interferometer, it is considered that a force corresponding to the error acts, but the swing of the apparatus main body due to the influence of this force becomes small enough to be ignored.

As described above, according to this embodiment,
The control device 11 converts the force acting on each stage based on the acceleration and the mass value of each stage (20A, 20B) into a force around the center of gravity of the device body, and cancels this force.
Since the four actuators 7A to 7D for the Z direction, the two actuators 32A and 32B for the Y direction, and the one actuator 32C for the X direction are feed-forward controlled, the exposure apparatus main body on the surface plate 6 is controlled. There is an effect that it is possible to effectively prevent the occurrence of the swing of 6 degrees of freedom.

In the above embodiment, the action point CP of the actuator 32C in the X direction and the action points AP and BP of the two actuators 32A and 32B for the Y direction are the vibration system (vibration suppression) on the surface plate 6. Since they are installed at positions (heights) substantially equal to the center of gravity G of the object) in the Z direction, rotation about the X axis and the Y axis does not occur,
The calculation in the second coordinate conversion function unit 11D is simplified. However, their action points AP ~
It is not necessary to adjust the height of CP to the center of gravity position G.

Further, in the above embodiment, the case where the seven actuators are used to prevent the shaking of the main body of the apparatus in the directions of six degrees of freedom is illustrated, but the present invention is not limited to this, and the six actuators of the main body are used. The number of actuators may be six or eight or more as long as it can prevent the swing in the direction of freedom.

Further, the anti-vibration method of the present invention in which the force acting around the center of gravity of the apparatus main body due to the movement of the stage is predicted and the actuator is feedforward controlled so as to cancel the influence of this force is the same as in the apparatus main body 6 It is not applied only to prevent shaking in the direction of freedom. For example, when the stage is configured to move on the position of the center of gravity of the apparatus main body, the apparatus main body does not necessarily swing in the 6 degrees of freedom direction even if the stage moves, but even in such a case, This is because it is clear that the vibration isolation method according to the invention works effectively.

In the above embodiment, the position of the stage is measured by the laser interferometer and the acceleration of the stage is obtained by the second derivative of the position signal. However, the present invention is not limited to this. However, for example, the acceleration of the stage may be directly detected by an acceleration sensor, and any means may be used as long as the position, speed, and acceleration of the stage can be detected.

Further, in the above embodiment, the case where the present invention is applied to the stepper type projection exposure apparatus has been illustrated, but the scope of application of the present invention is not limited to this, and the step and scan type or the like is applicable. The present invention can be similarly applied to a scanning exposure type projection exposure apparatus. Particularly, in the scanning exposure type, a large acceleration is generated at the start of the scanning exposure, so that the method of the present invention in which the actuator prevents the apparatus main body from swinging is particularly effective.

[0046]

As described above, according to the present invention,
Since the actuator is controlled so as to anticipate the effect of the movement of the stage on the apparatus body and offset this effect, it is possible to effectively prevent the occurrence of the swinging of the apparatus body held on the anti-vibration pad. It has an excellent effect that is not possible in the past.

[Brief description of drawings]

FIG. 1 is a front view showing a projection exposure apparatus to which a vibration isolation method according to the present invention is applied.

FIG. 2A is an enlarged sectional view showing an example of an actuator 7A, and FIG. 2B is an enlarged sectional view showing another example of the actuator 7A.

FIG. 3 is a sectional view taken along line CC of FIG. 1;

FIG. 4 is a control block diagram for visually explaining an actuator control method by a control device and an operation generated thereby.

[Explanation of symbols]

 4A to 4D Anti-vibration pad 6 Surface plate 7A to 7D, 32A to 32C Actuator 11 Control device 20A Y stage 20B X stage 30X1, 30X2 X axis laser interferometer 30Y Y axis laser interferometer

Claims (2)

[Claims] 1. A vibration isolation device for a stage device, comprising: a device main body horizontally held via at least three vibration isolation pads; and at least one stage movable on the device main body. A vibration isolation method for suppressing swinging of the apparatus body caused by movement of each stage by using one or more actuators, wherein each of the stages is based on an acceleration value of each stage and a mass value of each stage. The force acting on the stage is calculated, and the calculated force acting on each stage is converted into the force acting on the device main body center of gravity, and the force acting on the device main body center of gravity is offset based on the conversion result. To prevent shaking of the device body,
A vibration isolation method comprising feedforward controlling the one or more actuators. 2. An anti-vibration device for a stage device, comprising: an apparatus main body held horizontally through at least three anti-vibration pads; and at least one stage moving on the apparatus main body. A vibration isolation method for suppressing swinging in the direction of 6 degrees of freedom in the apparatus body due to movement of each stage by using at least six actuators, the first step of detecting acceleration of each stage; A second step of calculating a force acting on each stage based on a product of an acceleration value of the stage detected in one step and a mass value of the stage; a force acting on each stage calculated in the second step A third step of converting the device into a force of 6 degrees of freedom acting around the body weight center of the device; and each actuation necessary to cancel each of the forces of 6 degrees of freedom converted in the third step. Fourth step and for calculating a control amount of eta; anti-vibration method and a fifth step of driving the respective actuators based on the control amount calculated by said fourth step.