JPH09166703A - UV and visible light range back mirror - Google Patents
UV and visible light range back mirrorInfo
- Publication number
- JPH09166703A JPH09166703A JP7328468A JP32846895A JPH09166703A JP H09166703 A JPH09166703 A JP H09166703A JP 7328468 A JP7328468 A JP 7328468A JP 32846895 A JP32846895 A JP 32846895A JP H09166703 A JPH09166703 A JP H09166703A
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- JP
- Japan
- Prior art keywords
- film
- refractive index
- visible light
- multilayered
- ultraviolet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、紫外線域から可視
光域までの波長において、高反射率で耐光性、耐ガス
性、レーザー耐力を有する反射光学素子に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a reflective optical element having high reflectance, light resistance, gas resistance, and laser resistance in a wavelength range from an ultraviolet range to a visible light range.
【0002】[0002]
【従来技術】従来の紫外線域から可視光域の反射光学素
子として、大別して2種類の構造のものが知られてい
る。第一の反射光学素子は図5に示すような構造で、室
温で基板6上に高反射率金属膜としてアルミニウム(A
l)7を蒸着し、さらにAl7表面を腐蝕ガスであるエ
キシマレーザーガスなどから保護及び紫外線域で反射率
を高くする目的で弗化マグネシウム(MgF2)8を単
層でオーバーコートした構造となっている。Al金属膜
7の膜厚は約1000〜1500オングストローム、オーバーコ
ートされたMgF28の光学的膜厚はλ/4である(λ=
250nm)。分光反射率を図6に示す。2. Description of the Related Art There are known two types of conventional reflective optical elements in the ultraviolet to visible light range. The first reflective optical element has a structure as shown in FIG. 5, and is made of aluminum (A
l) 7 is vapor-deposited, and a single layer of magnesium fluoride (MgF 2 ) 8 is overcoated for the purpose of protecting the surface of Al 7 from excimer laser gas which is a corrosive gas and increasing the reflectance in the ultraviolet range. ing. The Al metal film 7 has a thickness of about 1000 to 1500 angstroms, and the overcoated MgF 2 8 has an optical film thickness of λ / 4 (λ =
250 nm). The spectral reflectance is shown in FIG.
【0003】この反射光学素子は反射率の波長依存性が
少ないため全波長域で使用可能という利点を持つ。第二
の反射光学素子は図7に示すような構造で、基板9上に
LaF310とMgF211からなる弗化物多層膜を形成
した構造となっている。LaF310とMgF211から
なる弗化物多層膜のそれぞれの光学的膜厚はλ/4であ
る(λ=250nm)。分光反射率を図8に示す。This reflective optical element has the advantage that it can be used in the entire wavelength range because the reflectance has little wavelength dependence. The second reflective optical element has a structure as shown in FIG. 7, and has a structure in which a fluoride multilayer film made of LaF 3 10 and MgF 2 11 is formed on the substrate 9. The optical film thickness of each of the fluoride multilayer films made of LaF 3 10 and MgF 2 11 is λ / 4 (λ = 250 nm). The spectral reflectance is shown in FIG.
【0004】この反射光学素子は紫外線域において、高
反射であり、レーザー耐力も約4J/cm2と強い。This reflective optical element has high reflection in the ultraviolet region and has a strong laser resistance of about 4 J / cm 2 .
【0005】[0005]
【発明が解決しようとする課題】第一の反射光学素子
は、反射率の波長依存性が少ないため全波長域で使用可
能という利点を持つ反面、室温による成膜のため膜強度
が弱く、またMgF28は充填密度が小さいため膜中に
不純物が浸食し、金属膜が腐蝕するので、耐ガス性に対
しては不満足である。The first reflective optical element has the advantage that it can be used in the entire wavelength range because the reflectance has little wavelength dependence, but it has a weak film strength because it is formed at room temperature. Since MgF 2 8 has a low packing density, impurities are eroded into the film and the metal film is corroded, so that it is unsatisfactory with respect to gas resistance.
【0006】また、使用時間の経過と共に膜が劣化し、
反射率が低下してくるという問題がある(耐光性が低
い)。さらに、エキシマレーザーを照射した際の膜のレ
ーザー耐力は、金属膜がレーザーを吸収するという特性
を持つため非常に弱く約0.1J/cm2であり、十分満足でき
るものではなかった。Further, the film deteriorates with the passage of time,
There is a problem that the reflectance decreases (low light resistance). Further, the laser resistance of the film when irradiated with an excimer laser is very weak, about 0.1 J / cm 2 , because the metal film has a property of absorbing the laser, which is not sufficiently satisfactory.
【0007】第二の反射光学素子は、紫外線域におい
て、高反射であり、レーザー耐力も約4J/cm2と強い反
面、高反射率帯域は非常に狭く、可視光域で反射率が低
下してしまうという問題がある。可視光域での反射率を
高くすることは、弗化物多層膜の膜層数を増加すること
によって可能であるが、弗化物多層膜は膜厚の増加に伴
い膜の応力も増加し、クラックが発生するという問題が
生じる。The second reflective optical element is highly reflective in the ultraviolet range and has a strong laser resistance of about 4 J / cm 2 , but has a very narrow high reflectivity band and a low reflectivity in the visible light range. There is a problem that it will end up. It is possible to increase the reflectance in the visible light region by increasing the number of layers in the fluoride multilayer film, but in the fluoride multilayer film, the stress of the film also increases as the film thickness increases and cracks Occurs.
【0008】本発明は、かかる問題点に鑑みてなされた
ものであり、紫外線域から可視光域までの波長におい
て、高反射率で耐光性、耐ガス性、レーザー耐力を有す
る反射光学素子を提供することを目的とする。The present invention has been made in view of the above problems, and provides a reflective optical element having high reflectance, light resistance, gas resistance, and laser resistance in a wavelength range from the ultraviolet range to the visible light range. The purpose is to do.
【0009】[0009]
【課題を解決するための手段】本発明は第一に「光学基
板の入射面に対する裏面上に中間屈折率物質と低屈折率
物質からなる少なくとも2層以上の弗化物多層膜、金属
膜並びに前記弗化物多層膜及び前記金属膜を密閉するよ
うに金属保護膜を順次積層してなる紫外線及び可視光域
用裏面鏡(請求項1)」を提供する。SUMMARY OF THE INVENTION The first aspect of the present invention is to provide a "multilayer fluoride film, a metal film, and at least two layers of a medium refractive index material and a low refractive index material on the back surface of the optical substrate, which are on the back surface. Provided is a rear-view mirror for ultraviolet and visible light regions, in which a fluoride multilayer film and a metal protective film are sequentially laminated so as to seal the metal film (claim 1).
【0010】また、本発明は第二に「前記中間屈折率物
質がLaF3、NdF3又はYbF3の単体若しくは混合
物であり、前記低屈折率物質がMgF2、CaF2、Al
F3又はNa3AlF6の単体若しくは混合物であること
を特徴とする請求項1記載の紫外線及び可視光域用裏面
鏡(請求項2)」を提供する。In the second aspect of the present invention, "the intermediate refractive index substance is LaF 3 , NdF 3 or YbF 3 alone or in a mixture, and the low refractive index substance is MgF 2 , CaF 2 or Al.
The rear surface mirror for ultraviolet and visible light regions according to claim 1 (claim 2), which is a single substance or a mixture of F 3 or Na 3 AlF 6 .
【0011】[0011]
【発明の実施の形態】図1は本発明の一実施例であり、
紫外線及び可視光域用裏面鏡の断面図である。これは、
紫外線域から可視光域まで透過する合成石英ガラス1の
表面に交互に5層積層されたLaF33の中間屈折率層
とMgF22の低屈折率層とからなる弗化物多層膜、金
属膜としてAl4並びに前記弗化物多層膜及び前記金属
膜を密閉するようにCu5の保護膜を順次形成したもので
ある。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT FIG. 1 shows an embodiment of the present invention.
It is sectional drawing of the back surface mirror for ultraviolet rays and a visible light range. this is,
Fluoride multi-layered film and metal film composed of five intermediate layers of LaF 3 3 and MgF 2 2 having a low refractive index layer alternately laminated on the surface of synthetic quartz glass 1 transmitting from the ultraviolet range to the visible range As described above, a protective film of Cu5 is sequentially formed so as to seal Al4, the fluoride multilayer film, and the metal film.
【0012】LaF33とMgF22からなる弗化物多層
膜の光学的膜厚は、それぞれλ/4(λ=250)であ
る。Al4金属膜の膜厚は約1000〜1500オングストロー
ム、Cu5保護膜の膜厚は約1000〜1500オングストロー
ムである。図1の構成における分光反射率を図2に示
す。紫外線域から可視光域まで、高い反射率を得ること
ができることがわかる。The optical film thickness of the fluoride multilayer film composed of LaF 3 3 and MgF 2 2 is λ / 4 (λ = 250). The film thickness of the Al4 metal film is about 1000 to 1500 angstroms, and the film thickness of the Cu5 protective film is about 1000 to 1500 angstroms. The spectral reflectance in the configuration of FIG. 1 is shown in FIG. It can be seen that a high reflectance can be obtained from the ultraviolet region to the visible light region.
【0013】その他に中間屈折率層として、LaF3、
NdF3又はYbF3の単体若しくは混合物、低屈折率層
としてMgF2、CaF2、AlF3又はNa3AlF6の
単体若しくは混合物が挙げられる。金属保護膜として
は、金属膜の腐蝕防止のため充填率が高いことが要求さ
れ、SiOも使用することができる。In addition, as an intermediate refractive index layer, LaF 3 ,
Examples include NdF 3 or YbF 3 simple substance or mixture, and the low refractive index layer include MgF 2 , CaF 2 , AlF 3 or Na 3 AlF 6 simple substance or mixture. The metal protective film is required to have a high filling rate to prevent corrosion of the metal film, and SiO can also be used.
【0014】また、弗化物多層膜の成膜方法は真空蒸着
法であり、基板温度は200℃〜300℃、1×10-5Torrの
雰囲気中で成膜され、蒸着速度は0.2〜15Å/sec
である。金属膜及び金属保護膜の成膜方法は真空蒸着法
であり、基板温度は無加熱で約30℃、5×10-6Torr
以下の雰囲気中で成膜され、蒸着速度は0.2〜20Å/
secである。The fluoride multilayer film is formed by vacuum vapor deposition, the substrate temperature is 200 ° C. to 300 ° C., the film is formed in an atmosphere of 1 × 10 −5 Torr, and the vapor deposition rate is 0.2 to 15 Å / sec
It is. The method for forming the metal film and the metal protective film is a vacuum deposition method, and the substrate temperature is about 30 ° C. and 5 × 10 −6 Torr without heating.
The film is formed in the following atmosphere and the deposition rate is 0.2 to 20Å /
sec.
【0015】弗化物多層膜及び金属膜の金属保護膜によ
る密閉は、先ず、基板上に基板の径よりやや小さい径の
マスクを用いて弗化物多層膜及び金属膜を成膜後、基板
の径と同径のマスクを用いて回り込み現象により金属保
護膜を成膜して行う。さらに、膜質制御のために、真空
蒸着法に併用して、イオンビームアシスト法(Ar、
N2等のガスをイオン化して加速し、蒸着中の基板に照
射してイオンビームの運動エネルギーで膜質を改善す
る)、イオンプレーティング法(真空漕内に適当な圧
力のAr、N2等のガスを導入してRF放電によってプラ
ズマ化し、蒸着した材料物質を活性化して基板に堆積さ
せることで膜質を改善する)を行う。To seal the fluoride multilayer film and the metal film with the metal protective film, first, after forming the fluoride multilayer film and the metal film on the substrate using a mask having a diameter slightly smaller than the diameter of the substrate, This is performed by forming a metal protective film by a wraparound phenomenon using a mask having the same diameter as. Further, in order to control the film quality, the ion beam assist method (Ar,
Gas such as N 2 is ionized and accelerated to irradiate the substrate during vapor deposition to improve the film quality by the kinetic energy of the ion beam), ion plating method (Ar, N 2 etc. at an appropriate pressure in the vacuum chamber) Gas is introduced and plasma is generated by RF discharge, and the deposited material is activated and deposited on the substrate to improve the film quality).
【0016】真空蒸着法を用いない方法、即ち加熱によ
る試料の蒸発を行わずにイオンの運動エネルギーで試料
ターゲットから原子、分子をたたき出し(スパッタ)し
て成膜を行う方法によっても膜の充填率を高くでき膜質
を改善することができる。図3は図1で示す構成の本発
明にかかる紫外線及び可視光域用裏面鏡と、図5で示す
構成の従来のAl金属膜の反射鏡とのエキシマレーザー
に対するレーザー耐力(どの程度のエネルギー密度に耐
えられるか)を測定した測定結果である。The filling rate of the film can also be obtained by a method which does not use the vacuum evaporation method, that is, a method in which atoms and molecules are knocked out (sputtered) from the sample target by the kinetic energy of ions without evaporating the sample by heating. It is possible to improve the film quality. FIG. 3 shows the laser resistance to an excimer laser of the rear-view mirror for ultraviolet and visible light regions according to the present invention having the structure shown in FIG. 1 and the conventional Al metal film reflecting mirror having the structure shown in FIG. It is a measurement result of measuring whether or not it can withstand.
【0017】本発明にかかる紫外線及び可視光域用裏面
鏡のレーザー耐力は、従来のAl金属膜のそれに比べ
て、向上していることがわかる。耐レーザー性の評価方
法として、サンプル表面上に場所を変えながらエネルギ
ー密度を変化させたレーザー光をスポットにして照射し
損傷の有無を調べる方法を用いた。It can be seen that the laser resistance of the back mirror for the ultraviolet and visible light regions according to the present invention is improved as compared with that of the conventional Al metal film. As a method for evaluating the laser resistance, a method of irradiating a laser beam whose energy density was changed while changing the location on the sample surface as a spot and inspecting for damage was used.
【0018】 このとき、END:損傷の生じない最大エネルギー密度 (J/cm2) ED :損傷の生じる最小エネルギー密度 (J/cm2) を用いて次式で表されるLDTを素子がどの程度のエネ
ルギー密度に耐えられるかを示す量(レーザー耐力)と
する。 LDT=(END+ED)/2 (J/cm2) このLDTを測定する装置概要図を図4に示す。[0018] At this time, E ND: maximum energy density does not cause damage (J / cm 2) E D : the element of LDT represented by the following equation using the minimum energy density of occurrence of damage (J / cm 2) It is the amount (laser proof strength) that indicates how much energy density can be endured. LDT = (E ND + E D ) / 2 (J / cm 2 ) FIG. 4 shows a schematic diagram of an apparatus for measuring this LDT.
【0019】レーザービームを成形後ズームエキスパン
ダーでビーム径を任意の大きさに変える。これにより単
位面積あたりのエネルギー量を変化させて、対物レンズ
でサンプル表面に照射する。このときの光エネルギーは
ディテクターで常時モニターできる。本発明にかかる構
成は、光学基板と金属保護膜により弗化物多層膜と金属
膜は密閉されているため膜中に腐蝕ガスが浸食すること
がなく、耐ガス性及び耐光性に優れている。After shaping the laser beam, the beam diameter is changed to an arbitrary size with a zoom expander. This changes the amount of energy per unit area and irradiates the sample surface with the objective lens. The light energy at this time can be constantly monitored by a detector. In the structure according to the present invention, since the fluoride multilayer film and the metal film are sealed by the optical substrate and the metal protective film, no corrosive gas is eroded into the film, and the gas resistance and the light resistance are excellent.
【0020】また、光学的には、紫外線域の光は、光学
基板を透過後、弗化物多層膜で反射し、可視光域の光
は、光学基板及び弗化物多層膜を透過後、金属膜で反射
するので、紫外線域から可視光域にかけて、高反射率を
保つことができる。さらに、レーザー耐力は、エキシマ
レーザーが光学基板、弗化物多層膜、金属膜の順に入射
するので金属膜で反射されるエキシマレーザーの光強度
の割合は少なくなるのでくレーザー耐力は強い。Optically, light in the ultraviolet region is transmitted through the optical substrate and then reflected by the fluoride multilayer film, and light in the visible region is transmitted through the optical substrate and the fluoride multilayer film, and then the metal film. Since it is reflected by, it is possible to maintain a high reflectance from the ultraviolet region to the visible light region. Further, the laser proof strength is high because the excimer laser enters the optical substrate, the fluoride multilayer film, and the metal film in this order, and the ratio of the light intensity of the excimer laser reflected by the metal film decreases.
【0021】[0021]
【発明の効果】以上説明したように、本発明にかかる紫
外線及び可視光域用裏面鏡は、弗化物多層膜及び金属膜
が光学基板及び金属保護膜により密閉されているので、
弗化物多層膜及び金属膜中に腐蝕ガス不純物が浸食する
ことがなく、耐ガス性、耐光性(使用時間の経過と共に
紫外線における反射率が低下しない)が向上した。As described above, in the rear-view mirror for the ultraviolet and visible light range according to the present invention, since the fluoride multilayer film and the metal film are sealed by the optical substrate and the metal protective film,
Corrosion gas impurities did not erode into the fluoride multilayer film and the metal film, and the gas resistance and light resistance (the reflectance with respect to ultraviolet rays did not decrease with the lapse of use time) were improved.
【0022】また、紫外線域から可視光域までの広帯域
で高反射率を保つことが可能となった。さらに、エキシ
マーレーザーに対するレーザー耐力が従来のAl金属膜
の反射鏡にくらべて向上した。Further, it has become possible to maintain a high reflectance in a wide band from the ultraviolet range to the visible range. Further, the laser resistance against the excimer laser is improved as compared with the conventional Al metal film reflecting mirror.
【図1】本発明にかかる紫外線及び可視光域用裏面鏡の
構成断面図である。FIG. 1 is a cross-sectional configuration diagram of a backside mirror for ultraviolet and visible light according to the present invention.
【図2】本発明にかかる紫外線及び可視光域用裏面鏡の
分光反射率を示す図である。FIG. 2 is a diagram showing a spectral reflectance of a rear-view mirror for ultraviolet and visible light according to the present invention.
【図3】図1で示す構成の本発明にかかる紫外線及び可
視光域用裏面鏡と、図5で示す構成の従来のAl金属膜
の反射鏡とのエキシマレーザーに対するレーザー耐力を
測定した測定結果である。FIG. 3 is a result of measurement of laser proof strength against excimer laser between the rear surface mirror for ultraviolet and visible light regions according to the present invention having the structure shown in FIG. 1 and the conventional Al metal film reflecting mirror having the structure shown in FIG. Is.
【図4】LDTを測定する装置概要図である。FIG. 4 is a schematic diagram of an apparatus for measuring LDT.
【図5】従来のAl金属膜の反射鏡の構成断面図であ
る。FIG. 5 is a cross-sectional view of a structure of a conventional Al metal film reflecting mirror.
【図6】従来のAl金属膜の反射鏡の分光反射率を示す
図である。FIG. 6 is a diagram showing the spectral reflectance of a conventional Al metal film reflecting mirror.
【図7】従来の弗化物多層膜反射鏡の構成断面図であ
る。FIG. 7 is a sectional view showing a structure of a conventional fluoride multilayer film reflecting mirror.
【図8】従来の弗化物多層膜反射鏡の分光反射率を示す
図である。FIG. 8 is a diagram showing a spectral reflectance of a conventional fluoride multilayer film reflecting mirror.
1・・・石英ガラス基板 2、8、11・・・MgF2 3、10・・・LaF3 4、7・・・Al 5・・・Cu 6、9・・・光学基板1 ... Quartz glass substrate 2, 8, 11 ... MgF 2 3, 10 ... LaF 3 4, 7 ... Al 5 ... Cu 6, 9 ... Optical substrate
Claims (2)
折率物質と低屈折率物質からなる少なくとも2層以上の
弗化物多層膜、金属膜並びに前記弗化物多層膜及び前記
金属膜を密閉するように金属保護膜を順次積層してなる
紫外線及び可視光域用裏面鏡。1. A fluoride multilayer film comprising at least two layers of an intermediate refractive index substance and a low refractive index substance, a metal film, and the fluoride multilayer film and the metal film are hermetically sealed on the back surface of the optical substrate with respect to the incident surface. A rear-view mirror for the ultraviolet and visible light regions, which is formed by sequentially laminating metal protective films.
はYbF3の単体若しくは混合物であり、前記低屈折率
物質がMgF2、CaF2、AlF3又はNa3AlF6の
単体若しくは混合物であることを特徴とする請求項1記
載の紫外線及び可視光域用裏面鏡。2. The intermediate refractive index material is LaF 3 , NdF 3 or YbF 3 alone or a mixture, and the low refractive index material is MgF 2 , CaF 2 , AlF 3 or Na 3 AlF 6 alone or a mixture. The back mirror for ultraviolet and visible light regions according to claim 1, wherein
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7328468A JPH09166703A (en) | 1995-12-18 | 1995-12-18 | UV and visible light range back mirror |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7328468A JPH09166703A (en) | 1995-12-18 | 1995-12-18 | UV and visible light range back mirror |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH09166703A true JPH09166703A (en) | 1997-06-24 |
Family
ID=18210611
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7328468A Pending JPH09166703A (en) | 1995-12-18 | 1995-12-18 | UV and visible light range back mirror |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH09166703A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002131632A (en) * | 2000-10-19 | 2002-05-09 | Konica Corp | Optical parts and its manufacturing method |
| WO2010078105A1 (en) * | 2008-12-30 | 2010-07-08 | 3M Innovative Properties Company | Broadband reflectors, concentrated solar power systems, and methods of using the same |
| KR20220111321A (en) * | 2019-12-09 | 2022-08-09 | 칼 짜이스 에스엠테 게엠베하 | Optical element with protective coating, method for manufacturing such optical element and optical arrangement |
-
1995
- 1995-12-18 JP JP7328468A patent/JPH09166703A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002131632A (en) * | 2000-10-19 | 2002-05-09 | Konica Corp | Optical parts and its manufacturing method |
| WO2010078105A1 (en) * | 2008-12-30 | 2010-07-08 | 3M Innovative Properties Company | Broadband reflectors, concentrated solar power systems, and methods of using the same |
| US9523516B2 (en) | 2008-12-30 | 2016-12-20 | 3M Innovative Properties Company | Broadband reflectors, concentrated solar power systems, and methods of using the same |
| EP2382427A4 (en) * | 2008-12-30 | 2017-06-21 | 3M Innovative Properties Company | Broadband reflectors, concentrated solar power systems, and methods of using the same |
| KR20220111321A (en) * | 2019-12-09 | 2022-08-09 | 칼 짜이스 에스엠테 게엠베하 | Optical element with protective coating, method for manufacturing such optical element and optical arrangement |
| JP2023505682A (en) * | 2019-12-09 | 2023-02-10 | カール・ツァイス・エスエムティー・ゲーエムベーハー | Optical element with protective coating, method for manufacturing the same, and optical device |
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