JPH09150008A - Treating liquid supply device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To prevent an inconvenience from occurring due to the deterioration of a deaeration capability in a deaeration module caused by the damage to a flow path for a treating liquid by providing a trap halfway through piping for deaeration and also a detecting sensor for detecting the arriving of the treating liquid to be stored in the trap at a specified storage quantity. SOLUTION: If a small-dia tube in the flow path for a treating liquid of a deaeration module 2 is damaged, the treating liquid flows into piping 10 for deaeration from the vacuum chamber of the deaeration module 2, then in turn, flows into a trap tank 12, and is stored after being separated from a gas in the trap tank 12. Consequently, only the gas is sucked by a vacuum suction source, so that the influx treating liquid does not flow into the vacuum suction source. If the treating liquid stored in the trap tank 12 arrived at a specified quantity, a detecting signal from a sensor 32 for detecting a storage quantity is sent to CPU 34, then a signal is sent from CPU 34 to an alarm 36 and an operator is posted about the occurrence of an abnormal state. Simultaneously, a control signal is sent to emergency shutoff valves 14, 16 from CPU 34, and the valves 14, 16 are closed.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a surface of various substrates such as a semiconductor wafer, a glass substrate for a liquid crystal display (LCD), a glass substrate for a photomask, a substrate for an optical disk, a developing solution and a photoresist. The present invention relates to a processing liquid supply device that supplies a processing liquid such as a cleaning liquid such as liquid or pure water.

[0002]

2. Description of the Related Art For example, when developing a photoresist film deposited on the surface of a substrate such as a semiconductor wafer or a glass substrate for LCD while holding the substrate in a horizontal posture and rotating it about a vertical axis, The developer is supplied from the developer supply source to the discharge nozzle through a liquid supply pipe in which a filter or the like is inserted, and is supplied from the discharge port of the discharge nozzle to the surface of the substrate. Then, the developer is controlled so as to be uniformly supplied over the entire surface of the substrate so as to prevent uneven development.

However, air may be trapped in the liquid sending pipe or gas may be dissolved in the developing liquid flowing in the liquid sending pipe, and if this developing liquid is directly supplied from the discharge nozzle to the surface of the substrate. The gas in the developer adheres to the surface of the photoresist film on the substrate as bubbles. As a result, the development process at the air bubble adhesion site is hindered, resulting in poor development. Problems similar to this occur not only in the development processing but also in various processing steps.
In the photoresist liquid coating process, if gas is dissolved in the photoresist liquid, it causes uneven coating.

Therefore, as shown in FIG. 2, in order to eliminate processing defects caused by air trapped in the liquid supply pipe or gas dissolved in the processing liquid, as shown in FIG.
A degassing module 2 is provided in the middle of the liquid sending pipe 1 from the processing liquid supply source to the processing liquid discharge port, and the gas in the processing liquid is removed when the processing liquid passes through the degassing module 2. Then
The processing liquid in which gas is not dissolved is supplied onto the substrate from the discharge port. The degassing module 2 whose schematic cross-sectional view is shown in FIG. 2 includes an inlet-side joint portion 3 and an outlet-side joint portion 4, which are flow-path-connected to the liquid-sending pipe 1, a non-corrosive material such as tetrafluoroethylene resin And a liquid flow path 5 composed of a large number of thin tubes which are formed of a gas permeable membrane material and which are arranged in parallel with each other and have both ends communicating with the joint parts 3 and 4, respectively. Is housed inside and the periphery thereof is hermetically sealed. Then, the deaeration module 2 is connected to the deaeration pipe 7 so as to communicate with the closed space in the vacuum chamber 6, and the deaeration pipe 7 is used as a vacuum suction source such as a vacuum pump or a vacuum line in a factory. Connected. A pressure regulating valve 8 for adjusting the vacuum pressure for vacuuming the inside of the vacuum chamber 6 to a predetermined value and connecting the degassing pipe 7 is provided in the degassing pipe 7 if necessary.

When a processing solution such as a developing solution, a photoresist solution, pure water for cleaning supplied from a processing solution supply source through the solution sending pipe 1 is flown into the degassing module 2, a gas permeable film material is obtained. While the processing liquid is flowing through the liquid flow path 5 composed of a large number of thin tubes formed by the above, a gas, such as air, dissolved in the processing liquid passes through the gas permeable membrane material of the thin tubes and is held in a vacuum chamber 6 under vacuum. Effectively removed into the enclosed space inside. As described above, the treatment liquid is quickly degassed while being continuously passed through the degassing module 2, and the degassed treatment liquid is discharged from the outlet of the degassing module 2 and the liquid sending pipe 1 Is sent in.

[0006]

By the way, while using the treatment liquid supply apparatus as shown in FIG. 2, the gas flow permeable membrane material constituting the liquid flow path 5 of the degassing module 2 is used. If the thin tube is damaged due to aging, etc.,
Even if the processing liquid is flown through the degassing module 2, the gas in the processing liquid is not removed, and the processing liquid that has not been degassed is supplied to the surface of the substrate from the discharge nozzle at the tip of the liquid supply pipe 1. And cause defective development and uneven coating. And if such a state is continued as it is, the yield will be remarkably reduced.

Incidentally, there is no particular method for surely knowing the decrease in the deaeration capacity of the deaeration module 2, and a dissolved nitrogen meter is used to place the degassing module 2 downstream of the deaeration module 2. A method of measuring the amount of nitrogen gas dissolved in the treatment liquid can be considered, but that method also lacks reliability.

Further, the vacuum chamber 6 of the degassing module 2
A very small amount of liquid may exude from the closed space in the vacuum chamber 6 into the degassing pipe 7 connected to the. The exuded liquid has conventionally passed through the degassing pipe 7 as it is. It was designed to flow into a vacuum suction source, such as a vacuum line facility in a factory. In a normal state, the amount of the exuded liquid is extremely small, so that there is no particular problem. However, in the event of an abnormality such as when the thin tube made of the gas permeable membrane material that constitutes the liquid flow path 5 of the degassing module 2 is damaged due to aging, a large amount of processing liquid passes through the degassing pipe 7 and vacuum equipment is installed. It will flow to the side. As a result, the equipment is greatly damaged. Also,
In order to protect the vacuum equipment, a relatively inexpensive ejector may be used as a vacuum suction source, but in that case, a large amount of gas-liquid mixed flow will be generated in the above-mentioned abnormal time. Therefore, there is a problem that it becomes difficult to collect the drain, or a complicated system is required for that.

The present invention has been made in view of the above circumstances, and in the case where the liquid flow path of the degassing module is damaged, the abnormality is surely detected and the degassing module is operated. A first object of the present invention is to provide a treatment liquid supply device capable of avoiding the inconvenience caused by the deterioration of the degassing ability.

Further, according to the present invention, when the liquid flow path of the degassing module is damaged, a large amount of processing liquid is passed from the degassing module to the vacuum equipment side which is a vacuum suction source through the degassing pipe. A second object is to provide a processing liquid supply apparatus that prevents the liquid from flowing into the equipment and does not damage the equipment.

[0011]

The invention according to claim 1 is
A liquid-feeding pipe for feeding the treatment liquid, and a liquid-flow passage that is inserted in the middle of the liquid-feeding pipe and is formed of a gas-permeable membrane material and connects the inlet and the outlet, In a processing liquid supply device comprising a degassing module that hermetically seals the surroundings in a vacuum chamber, and a degassing pipe that connects a sealed space in the vacuum chamber of the degassing module to a vacuum suction source, A detection unit is provided in the degassing pipe to detect that the processing liquid has flowed from the vacuum chamber of the degassing module, and the process into the degassing pipe is performed based on a detection signal output from the detection unit. It is characterized in that a notifying means for notifying the inflow of the liquid is provided.

According to a second aspect of the present invention, in the treatment liquid supply apparatus according to the first aspect, the degassing pipe and / or the liquid sending pipe is always opened upstream of the degassing module and has a detecting means. It is characterized in that an emergency shutoff valve that is closed by a detection signal is provided.

According to a third aspect of the present invention, there is provided a liquid feed pipe for feeding a treatment liquid, and a liquid which is inserted in the middle of the liquid feed pipe and which is formed of a gas permeable membrane material and which connects the inlet and the outlet. A degassing module having a flow path and hermetically sealing the periphery of the liquid flow path in a vacuum chamber, and a degassing pipe connecting a closed space in the vacuum chamber of the degassing module to a vacuum suction source. In the treatment liquid supply apparatus including, in the middle of the degassing pipe, the treatment liquid that has flowed into the degassing pipe from the vacuum chamber of the degassing module is separated from the gas and stored to be a vacuum suction source. It is characterized in that a liquid reservoir portion for preventing the processing liquid from flowing inward is provided.

According to a fourth aspect of the present invention, in the treatment liquid supply apparatus according to the third aspect, a storage amount detecting means for detecting that the treatment liquid stored therein reaches a predetermined amount is provided in the liquid reservoir. And a storage amount notifying unit for notifying that a predetermined amount of the processing liquid has been stored in the liquid storage unit based on a detection signal output from the storage amount detecting unit.

According to a fifth aspect of the invention, in the treatment liquid supply apparatus according to the third or fourth aspect, a drain discharge pipe for discharging the liquid accumulated in the liquid reservoir is provided at the bottom of the liquid reservoir. It is characterized in that it is connected and an on-off valve is provided in the drain discharge pipe.

When the gas permeable membrane material forming the liquid flow path of the degassing module is damaged, the processing liquid flows from the vacuum chamber of the degassing module into the degassing pipe. come. In the processing liquid supply apparatus of the invention according to the above-mentioned claim 1, the detection means detects that the processing liquid has flowed into the degassing distribution pipe, and the inflow means of the processing liquid has flowed into the degassing pipe. Informs the operator. Therefore,
By stopping the supply of the processing liquid to the object to be processed by the worker, it is possible to avoid the inconvenience that the processing liquid that has not been degassed is supplied onto the object to be processed, resulting in poor development and uneven coating. It will be possible.

In the treatment liquid supply apparatus according to the second aspect of the invention, when the detection means detects the inflow of the treatment liquid into the degassing distribution pipe, the degassing pipe and / or the liquid sending pipe are
The emergency shutoff valve installed upstream of the degassing module is closed. This prevents the processing liquid that has flowed into the degassing distribution pipe from flowing into the vacuum suction source, and / or the processing liquid from the processing liquid supply source through the liquid sending pipe into the degassing module. Is stopped and the inflow of the processing liquid from the degassing module into the degassing pipe is stopped.

In the treatment liquid supply apparatus according to the third aspect of the present invention, the gas permeable membrane material forming the liquid flow path of the degassing module is damaged and the vacuum chamber of the degassing module moves into the degassing pipe. When the treatment liquid flows in, the treatment liquid flows into a liquid reservoir provided in the middle of the degassing pipe, and is separated from the gas and stored in the liquid reservoir. Therefore, it is possible to prevent the processing liquid flowing from the degassing module into the degassing pipe from flowing into the vacuum suction source as it is.

In the treatment liquid supply apparatus according to the fourth aspect of the invention, when the treatment liquid flowing from the degassing module into the degassing pipe and stored in the liquid reservoir reaches a predetermined amount, Is detected by the storage amount detecting means, and the worker is notified by the storage amount notifying means. As a result, the worker knows that an abnormality has occurred in the degassing module, and by stopping the supply of the processing liquid to the object to be processed, the processing liquid that has not been degassed is supplied onto the object to be processed. It is possible to avoid inconveniences such as poor development and uneven coating.

Even in a normal state, a very small amount of liquid may exude from the vacuum chamber of the degassing module into the degassing pipe, and dew condensation may occur in the degassing pipe. Although the amount of the liquid is extremely small, the liquid gradually accumulates in the liquid reservoir over a long period of time.
In the treatment liquid supply apparatus according to the fifth aspect of the present invention, the on-off valve provided in the drain discharge pipe connected to the bottom of the liquid reservoir is opened so that the liquid accumulated in the liquid reservoir is drained. Exhausted through. In particular, when a storage amount detecting means is provided in the liquid reservoir, the liquid accumulated in the liquid reservoir is periodically discharged so that the liquid is stored in the liquid reservoir in a steady state. As a result, the storage amount detection means does not malfunction, and it becomes possible to reliably detect only the inflow of the processing liquid into the liquid storage section at the time of an abnormality.

[0021]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The best embodiment of the present invention will be described below with reference to FIG.

FIG. 1 is a schematic configuration diagram of a processing liquid supply apparatus showing an example of an embodiment of the present invention. In this apparatus, a degassing module 2 is inserted in the middle of a liquid sending pipe 1 from a processing liquid supply source to a processing liquid discharge port. The configuration of the degassing module 2 is the same as that of the processing liquid supply device described above with reference to FIG. 2, and the degassing action of the processing liquid is also performed in the same manner, and therefore the description thereof is omitted here. A degassing pipe 10 is connected to the vacuum chamber of the degassing module 2 so as to communicate with the closed space, and the degassing pipe 10 is connected to a vacuum suction source such as a vacuum line or a vacuum pump in a factory. It is connected. The configuration of the degassing module is not limited to that described above, and may have any configuration as long as the same degassing action can be obtained.

In this treatment liquid supply apparatus, the degassing pipe 10 is used.
A trap tank 12 that separates gas and liquid and stores the liquid is interposed. Further, the degassing pipe 10 is provided with an emergency shutoff valve 14 which is normally opened and closed in an abnormal state on the vacuum suction source side of the trap tank 12. Further, the liquid delivery pipe 1 is also provided with an emergency shutoff valve 16 that is normally opened and closed in an abnormal state. The emergency shutoff valve is used as the degassing pipe 1.
It may be provided in only one of 0 and the liquid sending pipe 1.

At the bottom of the trap tank 12, a drain discharge pipe 18 for discharging the liquid accumulated in the tank
Are connected in communication with each other, and an on-off valve 20 is provided in the drain discharge pipe 18. An atmosphere communication pipe 22 that communicates with the atmosphere is communicatively connected to the upper portion of the trap tank 12, and an atmosphere release valve 24 is provided in the atmosphere communication pipe 22. Further, an edge cutoff valve 30 is provided between the trap tank 12 of the degassing pipe 10 and the vacuum chamber of the degassing module 2.

Further, the trap tank 12 is provided with a storage amount detection sensor 32 for detecting that the processing liquid stored in the tank has reached a predetermined amount. As the storage amount detection sensor 32, any one of a float switch system, a photoelectric system, an electrostatic capacity system and the like may be used. The detection signal output from the storage amount detection sensor 32 is sent to the CPU 34.
The CPU 34 controls opening / closing of the emergency shutoff valves 14 and 16, the opening / closing valve 20, the atmosphere opening valve 24, and the edging valve 30. Further, the CPU 34 notifies the trap tank 1 based on the detection signal from the storage amount detection sensor 32.
Alarm device 3 for notifying that a predetermined amount of processing liquid is stored in 2.
6 are connected.

Next, the operation of the treatment liquid supply apparatus shown in FIG. 1 when the thin tube made of the gas permeable membrane material forming the liquid flow path of the degassing module 2 is broken will be described.

At normal times, the emergency shutoff valves 14 and 16 and the edge cutoff valve 30 are open, and the open / close valve 20 and the atmosphere open valve 24 are closed. Degas module 2
When the thin tube of the liquid flow path is damaged, the processing liquid flows out from the damaged part, and the processing liquid flows from the vacuum chamber of the degassing module 2 into the degassing pipe 10. Degassing pipe 10
The processing liquid that has flowed in flows into the trap tank 12, is separated from the gas in the trap tank 12, and is stored. Therefore, only the gas is sucked by the vacuum suction source, and the processing liquid flowing from the degassing module 2 into the degassing pipe 10 does not flow directly to the vacuum suction source. When the treatment liquid flowing from the degassing module 2 into the degassing pipe 10 and stored in the trap tank 12 reaches a predetermined amount, the storage amount detection sensor 32 detects it and sends the detection signal to the CPU 34. To be And
A signal is sent from the CPU 34 to the alarm device 36, and the alarm device 3
6 is activated to notify the operator of the occurrence of the abnormal situation.
At the same time, a control signal is sent from the CPU 34 to the emergency shutoff valves 14 and 16, and the emergency shutoff valves 14 and 16 are closed. As a result, the communication between the vacuum suction source and the inside of the vacuum chamber of the degassing module 2 is cut off, and the processing liquid stops flowing from the processing liquid supply source through the liquid sending pipe 1 into the degassing module 2. Then, the inflow of the processing liquid from the degassing module 2 into the degassing pipe 10 is stopped. And
Upon receiving the alarm from the alarm device 36, the worker completely stops the operation of the processing liquid supply device.

When the operation of the processing liquid supply device is stopped, the edge cutoff valve 30 is closed and the atmosphere opening valve 24 and the opening / closing valve 20 are opened. As a result, the trap tank 12
The processing liquid accumulated inside is discharged to the outside through the drain discharge pipe 18. And the damaged degassing module 2
Take the necessary measures such as replacing with a new one. When drainage is completed, the on-off valve 20 and the atmosphere release valve 24 are closed again and the rim cut valve 30 is opened again.
Then, the emergency shutoff valves 14 and 16 are returned to their original states,
The operation of the processing liquid supply device is restarted.

Even in a normal state, a very small amount of liquid may seep out of the vacuum chamber of the degassing module 2 into the degassing pipe 10, or dew may condense in the degassing pipe 10. , Over a long period of time, the trap tank 12
Liquid may gradually accumulate inside. In such a case, it is preferable to periodically open the atmosphere opening valve 24 and the opening / closing valve 20 so that the liquid accumulated in the trap tank 12 is discharged through the drain discharge pipe 18. In this case, the storage amount detection sensor 32 does not operate due to the storage of the liquid in the trap tank 12 in a steady state, so that only the storage amount detection sensor 3 detects the inflow of the processing liquid into the trap tank 12 at the time of abnormality.
2 will definitely detect.

In the apparatus shown in FIG. 1, the trap tank 12 is provided in the degassing pipe 10, but, for example,
A part of the degassing pipe may be bent in a U shape so that the bent portion serves as a trap portion. Further, the degassing pipe 10 is branched along the way with the drain discharge pipe 18 to separate the processing liquid from the gas, and the processing liquid is collected upstream of the on-off valve 20 provided in the drain discharge pipe 18. Alternatively, the processing liquid stored in the drain discharge pipe 18 may be detected by the storage amount detection sensor 32. Also,
The switching operation of the opening / closing valve 20, the atmosphere opening valve 24, and the edge cutoff valve 30 may be performed manually instead of automatically. Further, the operator does not manually provide the emergency shutoff valves 14 and 16 which are operated by the signal from the CPU 34, but the operator manually operates the open / close valve provided in the liquid sending pipe 1 or the degassing pipe 10 by the alarm of the alarm device 36. You may close it with. Further, the storage amount detection sensor 32 and the drain discharge pipe 18 are
If it is not necessary, it may not be provided.

In the embodiment described above, the degassing pipe 10 is used.
The trap tank 12 is provided in the above to prevent the processing liquid from flowing into the vacuum suction source side. However, the degassing pipe is not provided with a liquid reservoir such as a trap tank, but simply
The degassing pipe is provided with a detection sensor that detects that the processing liquid has flowed into the degassing module from the vacuum chamber of the degassing module, and only the alarm device is activated by the detection signal output from the detection sensor. But it's okay. In this case, the operator manually closes the on-off valve provided in the liquid sending pipe or the degassing pipe by the alarm of the alarm device. Alternatively, the emergency shutoff valve provided in the liquid sending pipe or the degassing pipe is automatically closed by the detection signal output from the detection sensor.

[0032]

When the treatment liquid supply apparatus according to the first aspect of the present invention is used, when the liquid flow path of the degassing module is damaged, the abnormality is surely detected and the degassing module is degassed. It is possible to avoid inconveniences such as poor development and uneven coating caused by the supply of processing liquid that has not been degassed due to a decrease in vapor capacity to the object to be processed, and to prevent a decrease in yield. You can

In the treatment liquid supply apparatus according to the second aspect of the present invention, the treatment liquid flowing into the degassing distribution pipe is prevented from flowing toward the vacuum suction source and / or sent from the treatment liquid supply source. A large amount of processing liquid is degassed because the processing liquid can be stopped from flowing through the liquid piping into the degassing module and the flow of processing liquid from the degassing module into the degassing piping can be stopped. It is possible to prevent the equipment from being damaged by automatically stopping the flow from the module to the vacuum equipment, which is the vacuum suction source, through the degassing pipe.

With the treatment liquid supply apparatus according to the third aspect of the present invention, when the liquid flow path of the degassing module is damaged, a large amount of treatment liquid flows from the degassing module through the degassing pipe. Since it does not flow into the vacuum equipment that is the vacuum suction source, it is possible to prevent the equipment from being damaged.

In the treatment liquid supply apparatus according to the fourth aspect of the present invention, since the worker is informed that an abnormality has occurred in the degassing module, the worker must stop the supply of the treatment liquid to the object to be processed. As a result, the processing liquid that has not been degassed is supplied onto the object to be processed, resulting in poor development and uneven coating.
It is possible to avoid such inconvenience.

In the treatment liquid supply apparatus according to the fifth aspect of the present invention, the liquid accumulated in the liquid reservoir can be discharged through the drain discharge pipe. Further, by periodically discharging the liquid accumulated in the liquid reservoir, the storage amount detecting means does not operate due to the storage of the liquid in the liquid reservoir during a steady state, so that the liquid reservoir at the time of abnormality Only the inflow of the treatment liquid to the storage amount detection means can be surely detected.

[Brief description of the drawings]

FIG. 1 is a schematic configuration diagram of a processing liquid supply apparatus showing an example of an embodiment of the present invention.

FIG. 2 is a schematic configuration diagram showing an example of a conventional processing liquid supply apparatus.

[Explanation of reference signs] 1 pipe for liquid supply 2 degassing module 3 joint part on inlet side 4 joint part on outlet side 5 liquid channel 6 vacuum chamber 7, 10 pipe for degassing 12 trap tank 14, 16 emergency shutoff valve 18 drain discharge Pipe 20 Open / close valve 22 Atmosphere communication pipe 24 Atmosphere release valve 30 Edge cut valve 32 Storage amount detection sensor 34 CPU 36 Alarm device

Claims (5)

[Claims] 1. A liquid-feeding pipe for feeding a processing liquid, and a liquid flow path which is inserted in the middle of the liquid-feeding pipe and which is formed of a gas-permeable membrane material and connects an inlet and an outlet, A treatment liquid including a degassing module that hermetically seals the periphery of the liquid flow path in a vacuum chamber, and a degassing pipe that connects a sealed space in the vacuum chamber of the degassing module to a vacuum suction source. In the supply device, the degassing pipe is provided with a detection means for detecting that the processing liquid has flowed from the vacuum chamber of the degassing module, and the degassing is performed based on the detection signal output from the detection means. A processing liquid supply device, characterized by comprising an informing means for informing of the inflow of the processing liquid into the pipe for use. 2. An emergency shutoff valve which is normally opened and closed by a detection signal of a detection means is provided upstream of the degassing module in the degassing pipe and / or the liquid sending pipe. Processing liquid supply device. 3. A liquid feed pipe for feeding a treatment liquid, and a liquid flow path which is inserted in the middle of the liquid feed pipe and which is formed of a gas permeable membrane material and connects an inlet and an outlet, A treatment liquid including a degassing module that hermetically seals the periphery of the liquid flow path in a vacuum chamber, and a degassing pipe that connects a sealed space in the vacuum chamber of the degassing module to a vacuum suction source. In the supply device, in the middle of the degassing pipe, the processing liquid flowing from the vacuum chamber of the degassing module into the degassing pipe is separated from the gas and stored, and the processing liquid flows toward the vacuum suction source. A treatment liquid supply device characterized in that a treatment liquid reservoir for preventing the above is provided. 4. A liquid storage part is provided with a storage amount detection means for detecting that the processing liquid stored therein reaches a predetermined amount, and based on a detection signal output from the storage amount detection means. 4. The processing liquid supply apparatus according to claim 3, further comprising storage amount notifying means for notifying that a predetermined amount of the processing liquid has been stored in the liquid storage section. 5. The drain discharge pipe for discharging the liquid accumulated in the liquid storage part is connected to the bottom of the liquid storage part, and an opening / closing valve is provided in the drain discharge pipe. Item 4. The processing liquid supply apparatus according to item 4.