JPH08988B2 - Gold plating remover - Google Patents
Gold plating removerInfo
- Publication number
- JPH08988B2 JPH08988B2 JP9554787A JP9554787A JPH08988B2 JP H08988 B2 JPH08988 B2 JP H08988B2 JP 9554787 A JP9554787 A JP 9554787A JP 9554787 A JP9554787 A JP 9554787A JP H08988 B2 JPH08988 B2 JP H08988B2
- Authority
- JP
- Japan
- Prior art keywords
- thallium
- nickel
- gold
- gold plating
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/32—Alkaline compositions
- C23F1/40—Alkaline compositions for etching other metallic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/44—Compositions for etching metallic material from a metallic material substrate of different composition
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
Description
【発明の詳細な説明】 (産業上の利用分野) 本発明は、ニッケルを含む金属を下地とする金めっき
の金めっき剥離液に関する。TECHNICAL FIELD The present invention relates to a gold plating stripping solution for gold plating using a metal containing nickel as a base.
(従来の技術とその問題点) 一般に外装めっき等がめっき不良である場合に、当該
不良めっきを剥離して、製品に再めっきを施すことが行
われる。この場合、剥離液として下地素材や下地めっき
を傷めぬように、下地素材や下地めっきへのアタックの
少ないものが要求される。(Conventional Technology and Problems Thereof) Generally, when the exterior plating or the like is defective, the defective plating is peeled off and the product is re-plated. In this case, a stripping solution is required to have a small attack on the base material and the base plating so as not to damage the base material and the base plating.
ところで、従来、ニッケルや鉄−ニッケル合金、鉄−
ニッケル−コバルト合金等のニッケルを含む下地金属上
に施した金めっきを、下地を傷めることなく、しかも高
速に剥離する剥離液には適当なものがなかった。By the way, conventionally, nickel or iron-nickel alloy, iron-
There has been no suitable stripping solution for stripping gold plating applied on a base metal containing nickel such as nickel-cobalt alloy at high speed without damaging the base.
例えば、ニトロ置換安息香酸と、シアン化アルカリ、
酢酸鉛をベースとする剥離液が知られているが、この剥
離液は比較的大きな剥離速度は有するものの、ニッケル
へのアタックが大きく、ニッケルを含む下地金属を傷め
る問題点がある。For example, nitro-substituted benzoic acid and alkali cyanide,
Although a lead acetate-based stripping solution is known, this stripping solution has a relatively high stripping rate, but has a large attack on nickel and has a problem of damaging a base metal containing nickel.
発明者は上記問題点を解消すべく鋭意検討を重ねた結
果、酢酸鉛に替えて、タリウム化合物とイオウ化合物と
を添加することで所望の剥離液が得られることに想到し
た。As a result of intensive studies to solve the above problems, the inventor has realized that a desired stripping solution can be obtained by adding a thallium compound and a sulfur compound in place of lead acetate.
すなわち本発明の目的は、ニッケルを含む下地金属を
傷めることなく金めっきを高速で剥離することのできる
金めっき剥離液を提供するにある。That is, an object of the present invention is to provide a gold plating stripping solution capable of stripping gold plating at high speed without damaging a base metal containing nickel.
(発明の概要) 上記目的による本発明に係る金めっき剥離液は次の構
成を備える。(Summary of the Invention) The gold plating stripper according to the present invention for the above object has the following constitution.
すなわち、P−ニトロ安息香酸、2−クロロ−4−ニ
トロ安息香酸等のニトロ置換安息香酸と、シアン化アル
カリと、水酸化アルカリ等のPH調整剤と、硝酸タリウ
ム、酢酸タリウム等のタリウム化合物と、=S基または
−SH基をもつ、チアゾリジン−4−カルボン酸、L−シ
スティン等のイオウ化合物とを含むことを特徴とする。That is, nitro-substituted benzoic acids such as P-nitrobenzoic acid and 2-chloro-4-nitrobenzoic acid, alkali cyanide, pH adjusting agents such as alkali hydroxide, and thallium compounds such as thallium nitrate and thallium acetate. , = S group or -SH group, and a sulfur compound such as thiazolidine-4-carboxylic acid or L-cystine.
ニトロ置換安息香酸は、P−ニトロ安息香酸、2−ク
ロロ−4−ニトロ安息香酸、2−クロロ−5−ニトロ安
息香酸、3−クロロ−2−ニトロ安息香酸、m−ニトロ
安息香酸等を用いることができ、量的には1〜100g/lが
好適である。これらニトロ置換安息香酸は酸化剤として
作用する。As the nitro-substituted benzoic acid, P-nitrobenzoic acid, 2-chloro-4-nitrobenzoic acid, 2-chloro-5-nitrobenzoic acid, 3-chloro-2-nitrobenzoic acid, m-nitrobenzoic acid or the like is used. The amount is preferably 1 to 100 g / l. These nitro-substituted benzoic acids act as oxidizing agents.
シアン化アルカリはシアン化カリウム、シアン化ナト
リウム等を用いることができ、量的には1〜100g/lが好
適である。シアン化アルカリは溶解した金を錯体として
液中に保有する。上記のニトロ置換安息香酸はその際の
酸化剤として作用する。As the alkali cyanide, potassium cyanide, sodium cyanide and the like can be used, and the amount is preferably 1 to 100 g / l. Alkali cyanide holds dissolved gold in the liquid as a complex. The above-mentioned nitro-substituted benzoic acid acts as an oxidizing agent in that case.
PH調整剤としては、水酸化アルカリ、リン酸塩等を用
いることができる。As the pH adjuster, alkali hydroxide, phosphate or the like can be used.
タリウム化合物としては、硝酸タリウム、酢酸タリウ
ム、硫酸タリウム、マロン酸タリウム等を用いることが
でき、量的には0.005〜10g/lが好適である。As the thallium compound, thallium nitrate, thallium acetate, thallium sulfate, thallium malonate, or the like can be used, and the amount is preferably 0.005 to 10 g / l.
またイオウ化合物としては、チアゾリジン−4−カル
ボン酸、L−システィン、メルカプトベンゾチアゾー
ル、メルカプトベンゾチアゾールナトリウム、β−メル
カプトプロピオン酸等の=S基、−SH基をもつものを用
い、量的には0.005〜10g/lが好適である。As the sulfur compound, thiazolidine-4-carboxylic acid, L-cystine, mercaptobenzothiazole, sodium mercaptobenzothiazole, β-mercaptopropionic acid or the like having an = S group or a -SH group is used, and in terms of quantity, 0.005-10 g / l is preferred.
タリウム化合物とイオウ化合物は相乗的に作用して、
金の溶解を促進すると共に、金めっき剥離後は、露出し
たニッケルを含む金属の下地上に選択的に吸着されて一
種の保護膜を形成し、ニッケルの剥離液中への溶出を抑
制するものと考えられる。Thallium compounds and sulfur compounds act synergistically,
It accelerates the dissolution of gold and, after stripping of the gold plating, selectively adsorbs on the underlying metal of the exposed nickel to form a kind of protective film, suppressing the elution of nickel into the stripping solution. it is conceivable that.
なお、タリウム化合物とイオウ化合物に加えて、EDTA
や、EDTAナトリウム、EDTAカリウム、EDTA・4H、メチル
EDTA等のEDTAの派生化合物を添加すると、一層ニッケル
の溶出を抑制することができた。In addition to thallium compounds and sulfur compounds, EDTA
Or sodium EDTA, potassium EDTA, EDTA.4H, methyl
Addition of compounds derived from EDTA such as EDTA could further suppress the elution of nickel.
(実施例) 次の比較例1、2と実施例1、2、3の金めっき剥離
液を調整した。(Example) The following gold plating stripping solutions of Comparative Examples 1 and 2 and Examples 1, 2 and 3 were prepared.
比較例1 P−ニトロ安息香酸 12g/l KCN 50g/l KOH 20g/l 酢酸鉛 0.6g/l 比較例2 P−ニトロ安息香酸 12g/l KCN 50g/l KOH 20g/l 酢酸鉛 0.6g/l L−システイン 0.02g/l EDTA・3K 0.1g/l 実施例1 P−ニトロ安息香酸 12g/l KCN 50g/l KOH 20g/l 硝酸第1タリウム 0.6g/l L−システイン 0.02g/l 実施例2 P−ニトロ安息香酸 12g/l KCN 50g/l KOH 20g/l 硝酸第1タリウム 0.6g/l L−システイン 0.02g/l EDTA・3K 0.1g/l 実施例3 2−クロロ−4−ニトロ安息香酸 12g/l KCN 50g/l KOH 20g/l 酢酸第1タリウム 0.6g/l チアゾリジン−4−カルボン酸 0.1g/l メチルEDTA 0.1g/l サンプルとして、アイレット(金属外環)が鉄−ニッ
ケル−コバルト合金製である気密ガラス端子にニッケル
下地めっきを施し、その上に1.3μmの金めっきを施し
たものを採用した。Comparative Example 1 P-nitrobenzoic acid 12g / l KCN 50g / l KOH 20g / l Lead acetate 0.6g / l Comparative Example 2 P-nitrobenzoic acid 12g / l KCN 50g / l KOH 20g / l Lead acetate 0.6g / l L-Cysteine 0.02 g / l EDTA.3K 0.1 g / l Example 1 P-nitrobenzoic acid 12 g / l KCN 50 g / l KOH 20 g / l First thallium nitrate 0.6 g / l L-cysteine 0.02 g / l Example 2 P-nitrobenzoic acid 12 g / l KCN 50 g / l KOH 20 g / l first thallium nitrate 0.6 g / l L-cysteine 0.02 g / l EDTA.3K 0.1 g / l Example 3 2-chloro-4-nitrobenzoic acid Acid 12g / l KCN 50g / l KOH 20g / l Thallium acetate 0.6g / l Thiazolidine-4-carboxylic acid 0.1g / l Methyl EDTA 0.1g / l As sample, the eyelet (external metal ring) is iron-nickel- An airtight glass terminal made of a cobalt alloy was plated with nickel undercoat, and 1.3 μm of gold was plated on it.
上記各例の剥離液150ml(40℃)中で1回につき30個
のサンプルを計10回剥離した。その際の平均剥離速度、
最終金濃度、最終溶出ニッケル濃度を表1に示す。In 150 ml (40 ° C.) of the stripping solution of each of the above examples, 30 samples were stripped 10 times in total. Average peeling speed at that time,
Table 1 shows the final gold concentration and the final eluted nickel concentration.
表1から明らかなように、比較例1は溶出ニッケル量
が多く、下地ニッケルに対するアタックが大きい。これ
に対して実施例1では溶出ニッケル量が10分の1以下と
少なく、下地ニッケルへのアタックが緩やかである。ま
た剥離速度は比較例1に対して約1.5倍と速く、実用上
は全く問題ない。実施例2は実施例1の組成にEDTA・3K
を添加したものであり、より下地ニッケルに対するアタ
ックが緩やかであり、また剥離速度もほぼ同様となって
いる。比較例2は、実施例2の硝酸第1タリウムを酢酸
鉛に替えたものである。比較例2と実施例2との比較か
らも明らかなように、タリウム化合物を使用した場合、
鉛化合物を使用した場合より下地ニッケルに対するアタ
ックが格段に低いことがわかる。実施例3は、酸化剤と
して2−クロロ−4−ニトロ安息香酸を、硝酸第1タリ
ウムの替りに酢酸タリウムを、L−システィンの替りに
チアゾリン−4−カルボン酸を、EDTA・3Kの替りにメチ
ルEDTAを用いた組成であり、剥離速度は若干遅いものの
実施例2と同様の効果が得られた。 As is clear from Table 1, Comparative Example 1 has a large amount of eluted nickel and a large attack on the underlying nickel. On the other hand, in Example 1, the amount of eluted nickel is as small as 1/10 or less, and the attack on the nickel underlayer is gentle. Further, the peeling speed is about 1.5 times faster than that of Comparative Example 1, and there is no problem in practical use. Example 2 has the same composition as in Example 1 with EDTA / 3K.
Is added, the attack on the underlying nickel is more gradual, and the peeling speed is almost the same. In Comparative Example 2, the first thallium nitrate of Example 2 was replaced with lead acetate. As is clear from the comparison between Comparative Example 2 and Example 2, when a thallium compound is used,
It can be seen that the attack on the underlying nickel is much lower than when a lead compound is used. In Example 3, 2-chloro-4-nitrobenzoic acid was used as an oxidizing agent, thallium acetate was used instead of the first thallium nitrate, thiazoline-4-carboxylic acid was used instead of L-cystine, and EDTA · 3K was used instead. With the composition using methyl EDTA and the peeling speed was slightly slow, the same effect as in Example 2 was obtained.
なお、鉄−ニッケル合金や鉄−ニッケル−コバルト合
金を下地素材として金めっきを施したものの場合には、
ニッケルの溶出量だけでなく鉄の溶出量も抑制すること
ができ、下地金属へのアタックが少なかった。In the case of an iron-nickel alloy or an iron-nickel-cobalt alloy that is gold-plated as a base material,
Not only the elution amount of nickel but also the elution amount of iron could be suppressed, and the attack on the base metal was small.
以上本発明につき好適な実施例を挙げて種々説明した
が、本発明はこの実施例に限定されるものではなく、発
明の精神を逸脱しない範囲内で多くの改変を施し得るの
はもちろんのことである。Although the present invention has been variously described with reference to the preferred embodiments, the present invention is not limited to these embodiments, and it goes without saying that many modifications can be made without departing from the spirit of the invention. Is.
(発明の効果) 以上のように本発明に係る金めっき剥離液によれば、
下地のニッケルを含む金属を傷めることなく、かつ高速
で金めっきを剥離することができるという著効を奏す
る。(Effects of the Invention) As described above, according to the gold plating stripper of the present invention,
The gold plating can be removed at high speed without damaging the underlying metal containing nickel.
Claims (4)
トロ安息香酸等のニトロ置換安息香酸と、シアン化アル
カリと、水酸化アルカリ等のPH調整剤と、硝酸タリウ
ム、酢酸タリウム等のタリウム化合物と、=S基または
−SH基をもつ、チアゾリジン−4−カルボン酸、L−シ
スティン等のイオウ化合物とを含む、ニッケルを含む金
属を下地とする金めっきの金めっき剥離液。1. A nitro-substituted benzoic acid such as P-nitrobenzoic acid or 2-chloro-4-nitrobenzoic acid, an alkali cyanide, a pH adjusting agent such as an alkali hydroxide, thallium nitrate, thallium acetate or the like. A gold-plating stripper for gold-plating a metal containing nickel, which contains a thallium compound and a sulfur compound such as thiazolidine-4-carboxylic acid or L-cystine having a = S group or a -SH group.
ある特許請求の範囲第1項記載の金めっき剥離液。2. The gold plating stripper according to claim 1, wherein the content of the thallium compound is 0.005 to 10 g / l.
特許請求の範囲第1項または第2項記載の金めっき剥離
液。3. The gold plating stripper according to claim 1, wherein the sulfur compound content is 0.005 to 10 g / l.
特許請求の範囲第1項、第2項または第3項記載の金め
っき剥離液。4. The gold plating stripping solution according to claim 1, 2 or 3, which is obtained by adding EDTA or a derivative compound thereof.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9554787A JPH08988B2 (en) | 1987-04-18 | 1987-04-18 | Gold plating remover |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9554787A JPH08988B2 (en) | 1987-04-18 | 1987-04-18 | Gold plating remover |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63262482A JPS63262482A (en) | 1988-10-28 |
| JPH08988B2 true JPH08988B2 (en) | 1996-01-10 |
Family
ID=14140598
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9554787A Expired - Fee Related JPH08988B2 (en) | 1987-04-18 | 1987-04-18 | Gold plating remover |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH08988B2 (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5380400A (en) * | 1993-12-29 | 1995-01-10 | At&T Corp. | Chemical etchant for palladium |
| JP3331260B2 (en) * | 1994-08-19 | 2002-10-07 | 日本エレクトロプレイテイング・エンジニヤース株式会社 | Electroless gold plating solution |
| JP4696565B2 (en) * | 2005-01-19 | 2011-06-08 | 三菱化学株式会社 | Etching solution and etching method |
| JP5369975B2 (en) * | 2009-08-04 | 2013-12-18 | 大日本印刷株式会社 | Method for forming gold plating pattern on stainless steel substrate |
| JP5302139B2 (en) * | 2009-09-01 | 2013-10-02 | 新光電気工業株式会社 | Removal method of displacement plating layer |
| JP5302140B2 (en) * | 2009-09-01 | 2013-10-02 | 新光電気工業株式会社 | Removal method of displacement plating layer |
-
1987
- 1987-04-18 JP JP9554787A patent/JPH08988B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63262482A (en) | 1988-10-28 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |