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JPH0885891A - Cleaning method for concentrated free chlorine water generation system for sterilization - Google Patents

Cleaning method for concentrated free chlorine water generation system for sterilization

Info

Publication number
JPH0885891A
JPH0885891A JP6223358A JP22335894A JPH0885891A JP H0885891 A JPH0885891 A JP H0885891A JP 6223358 A JP6223358 A JP 6223358A JP 22335894 A JP22335894 A JP 22335894A JP H0885891 A JPH0885891 A JP H0885891A
Authority
JP
Japan
Prior art keywords
water
free chlorine
cleaning
concentrated free
sterilization
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6223358A
Other languages
Japanese (ja)
Other versions
JP3339196B2 (en
Inventor
Akihisa Honda
晃久 本田
Minoru Nagata
稔 永田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP22335894A priority Critical patent/JP3339196B2/en
Publication of JPH0885891A publication Critical patent/JPH0885891A/en
Application granted granted Critical
Publication of JP3339196B2 publication Critical patent/JP3339196B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/02Non-contaminated water, e.g. for industrial water supply
    • C02F2103/023Water in cooling circuits

Landscapes

  • Treatment Of Water By Oxidation Or Reduction (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)

Abstract

(57)【要約】 【目的】 錆の発生を防止することができ、メンテナン
スが容易であり、洗浄後の液処理が容易な殺菌用濃縮遊
離塩素水生成システムの洗浄方法を提供することを目的
とするものである。 【構成】 本発明の殺菌用濃縮遊離塩素水生成システム
の洗浄方法は、濃縮遊離塩素水を吐出路11から吐出さ
せた後、第2所定量の洗浄水を殺菌用濃縮遊離塩素水生
成システムに供給し、循環路15を介しての循環洗浄を
継続した後で切り換え手段6を切り換え、第2所定量の
ほぼ全量の洗浄水を吐出路11から吐出させることを特
徴とする。
(57) [Summary] [Purpose] An object of the present invention is to provide a cleaning method for a concentrated free chlorine water generation system for sterilization, which can prevent rust generation, is easy to maintain, and is easy to perform liquid treatment after cleaning. It is what According to the cleaning method of the sterilized concentrated free chlorine water producing system of the present invention, after the concentrated free chlorine water is discharged from the discharge passage 11, a second predetermined amount of washing water is supplied to the sterilized concentrated free chlorine water generating system. It is characterized in that after supplying and continuing the circulation cleaning through the circulation path 15, the switching means 6 is switched to discharge almost the entire amount of the second predetermined amount of cleaning water from the discharge path 11.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、冷却水系の冷却塔など
に発生するレジオネラ属菌の殺菌に使用する殺菌用濃縮
遊離塩素水生成システムの洗浄方法に関するものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for cleaning a concentrated free chlorine water producing system for sterilization used for sterilizing Legionella spp. Generated in a cooling water cooling tower or the like.

【0002】[0002]

【従来の技術】近年、住宅環境の整備及び高級化に伴っ
て建造物の密閉度が高くなってきており、室内の空調を
快適にするため多くの努力が払われている。一方、住宅
や事務所等の高層化、集合化によって大規模空調が普及
し室内の換気や冷房にその効果を発揮している。ところ
で通常の冷房システムは冷却コイルに冷却された冷媒を
循環する冷凍機と、冷凍機に冷却水を供給する冷却塔か
ら構成されている。ここで冷却塔は熱交換機で冷媒の熱
を吸収した冷却水をその内部で給水管から滴下させ空気
と接触させて噴霧状にし、その時の気化熱によって冷却
水の熱を吸収し冷却水の温度を下げるものである。とこ
ろでこの冷却塔は室外に設置されることが多く、外気温
にさらされ、特に夏期には高温多湿の状況で運転される
ことになる。このような高温多湿では多くの細菌が繁殖
しやすく、非衛生的で環境汚染源にもなる。特に近年で
は冷却塔に発生したレジオネラ属菌によって引き起こさ
れる肺炎などの疾病の集団発生が大きな社会問題となっ
てきている。冷却塔に発生したレジオネラ属菌は冷却水
とともにエアロゾル状となって大気中に広く飛散した
り、近接して設置された空調用の外気取り入れ口から吸
入されて各室内に分散して集団的に疾病を引き起こすも
のである。これを防ぐために冷却塔内を定期的に清掃
し、冷却水を全量交換してレジオネラ属菌を洗浄除去す
る方法が広く一般的である。しかしながらこの方法は煩
雑であるのと、レジオネラ属菌の除去が十分ではなくレ
ジオネラ属菌を含んだ廃液の処分にコストがかかるとい
う問題がある。こうした問題を解決するため冷却液に酸
や過酸化水素などの薬剤を手動で添加し、レジオネラ属
菌を殺菌洗浄する方法がある。しかしながらこの方法は
酸や過酸化水素などの薬剤を直接扱うので安全上問題で
あるばかりでなく、作業が煩雑になる。さらに、酸や過
酸化水素などの薬剤保管容器を冷却塔に併設して設ける
方法がある。つまりこの方法は薬剤保管容器に薬剤注入
ポンプを設けて冷却水の流量積算信号により冷却塔に薬
剤を所定量注入し、レジオネラ属菌を殺菌洗浄しようと
するものである。
2. Description of the Related Art In recent years, the degree of airtightness of buildings has become higher with the development and upgrading of the residential environment, and many efforts have been made to make indoor air conditioning comfortable. On the other hand, large-scale air conditioning has become widespread due to the increase in the number of houses and offices, and it has been effective in ventilation and cooling in the room. By the way, a normal cooling system is composed of a refrigerator that circulates the cooled refrigerant in a cooling coil and a cooling tower that supplies cooling water to the refrigerator. In the cooling tower, the cooling water that has absorbed the heat of the refrigerant in the heat exchanger is dropped from the water supply pipe inside the cooling tower and brought into contact with the air to form a spray, and the heat of vaporization at that time absorbs the heat of the cooling water and the temperature of the cooling water. Is to lower. By the way, this cooling tower is often installed outdoors and is exposed to the outside temperature, and it is operated in hot and humid conditions especially in summer. In such high temperature and high humidity, many bacteria easily propagate, which is unhygienic and also a source of environmental pollution. Particularly in recent years, a mass outbreak of diseases such as pneumonia caused by Legionella spp. Which have occurred in cooling towers has become a major social problem. The Legionella spp.generated in the cooling tower become an aerosol with cooling water and widely disperse in the atmosphere, or are sucked from the outside air intake for air conditioning installed nearby and dispersed in each room and collectively. It causes disease. In order to prevent this, a general method is to regularly clean the inside of the cooling tower and exchange all the cooling water to wash and remove Legionella spp. However, this method is complicated, and there is a problem that the removal of the Legionella bacterium is not sufficient and the disposal of the waste liquid containing the Legionella bacterium costs. In order to solve these problems, there is a method of manually adding a chemical such as acid or hydrogen peroxide to the cooling liquid to sterilize and wash Legionella spp. However, this method directly handles chemicals such as acid and hydrogen peroxide, which is not only a safety problem but also complicated. Further, there is a method in which a chemical storage container for acid, hydrogen peroxide, etc. is provided side by side with the cooling tower. That is, in this method, a drug injection pump is provided in the drug storage container, and a predetermined amount of the drug is injected into the cooling tower according to the flow rate cumulative signal of the cooling water to sterilize and wash Legionella spp.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、薬剤保
管容器に薬剤注入ポンプを設けて冷却水の流量積算信号
により冷却塔に薬剤を所定量注入する方法は、薬剤が保
管容器を酸化腐食することから、防錆処理した保管容器
などを使用しなければならず、メンテナンスに多くの時
間を必要とし、洗浄設備の寿命が短いなどの問題があっ
た。
However, the method of injecting a predetermined amount of the drug into the cooling tower by providing the drug injection pump in the drug storage container and the flow rate cumulative signal of the cooling water causes the drug to oxidize and corrode the storage container. However, there is a problem in that a rustproof storage container or the like must be used, a lot of time is required for maintenance, and the life of the cleaning equipment is short.

【0004】そこで本発明は、前記従来の問題点を解決
するもので、錆の発生を防止することができ、メンテナ
ンスが容易であり、洗浄後の液処理が容易な殺菌用濃縮
遊離塩素水生成システムの洗浄方法を提供することを目
的とするものである。
Therefore, the present invention solves the above-mentioned problems of the prior art. It can prevent the generation of rust, can be easily maintained, and can be treated with a liquid after washing to produce concentrated free chlorine water for sterilization. It is an object of the present invention to provide a method for cleaning a system.

【0005】[0005]

【課題を解決するための手段】上記目的を達成するため
に本発明の殺菌用濃縮遊離塩素水生成システムの洗浄方
法は、濃縮遊離塩素水を吐出路から吐出させた後、第2
所定量の洗浄水を殺菌用濃縮遊離塩素水生成システムに
供給し、循環路を介しての循環洗浄を継続した後で切り
換え手段を切り換え、第2所定量のほぼ全量の洗浄水を
吐出路から吐出させることを特徴とする。
In order to achieve the above object, the method for cleaning a concentrated free chlorine water producing system for sterilization according to the present invention comprises a second method after discharging concentrated free chlorine water from a discharge passage.
A predetermined amount of washing water is supplied to the concentrated free chlorine water generation system for sterilization, and after continuing the circulation washing through the circulation passage, the switching means is changed over so that almost the entire amount of the second prescribed amount of washing water is discharged from the discharge passage. It is characterized by discharging.

【0006】[0006]

【作用】本発明の殺菌用濃縮遊離塩素水生成システムの
洗浄方法は、濃縮した殺菌用濃縮遊離塩素水を生成した
後、一度に吐出させ、新たに第2所定量の洗浄水を供給
して循環させるから、濃縮のたび毎に十分な洗浄をする
ことができる。また濃縮によって腐食が進みやすくなっ
たシステムを濃縮のたび毎に当初状態に回復させること
ができる。また、循環路で循環洗浄後、吐出路に洗浄後
の洗浄水を吐出するから、洗浄後の液処理を容易にする
ことができる。
The cleaning method for the sterilized concentrated free chlorine water producing system of the present invention is such that after the concentrated sterilized concentrated free chlorine water is generated, it is discharged at one time and a second predetermined amount of cleaning water is newly supplied. Since it is circulated, sufficient washing can be carried out at each concentration. Moreover, the system in which corrosion is likely to proceed due to the concentration can be restored to the initial state each time the concentration is increased. Further, since the cleaning water after cleaning is discharged to the discharge path after circulating cleaning in the circulation path, the liquid treatment after cleaning can be facilitated.

【0007】[0007]

【実施例】以下本発明の実施例の詳細を図面に基づいて
説明する。図1は本発明の一実施例における殺菌用濃縮
遊離塩素水生成システム洗浄方法の説明図である。図1
において1は原水または原水を濃縮した殺菌用濃縮遊離
塩素水を貯水する貯水槽である。この原水は遊離塩素水
を生成するためにも、また洗浄水として利用するために
も導入される。2は塩水ポンプ5で原水に塩化ナトリウ
ム等の塩素成分を含む塩化物を添加する塩化物水溶液
槽、3は電極C、Dを内部に設けた電解槽、4は循環路
15に設けて原水を循環させるポンプ、6は循環路15
と吐出路11を接続するかまたは閉鎖された循環路15
のどちらを選択するかを切り換える流路切り換え手段、
7は原水の流入量を調節する原水電磁弁、8は原水であ
る水道水または地下水の流入口、9は貯水槽1に設けて
原水の貯水量を検出する高水位センサ、10は貯水槽1
に設けて原水の最低貯水量を検出する低水位センサ、1
2は吐出路11から吐出する殺菌用濃縮遊離塩素水を冷
却室の中に混入して殺菌される冷却塔である。低水位セ
ンサ10が検出するのは残留殺菌用濃縮遊離塩素水及び
洗浄水であるが、最低貯水量は低ければ低いほど望まし
い。また冷却塔12には後記するように洗浄液も導かれ
るものである。13は塩化物水溶液の貯水槽1への流入
量を調節する塩水電磁弁、14は電極C、D、ポンプ
4、流路切り換え手段6、原水電磁弁7及び塩水電磁弁
13を制御して殺菌用濃縮遊離塩素水の生成および殺菌
用濃縮遊離塩素水生成システムの洗浄を行う制御部であ
る。
Embodiments of the present invention will be described in detail below with reference to the drawings. FIG. 1 is an explanatory diagram of a method for cleaning a concentrated free chlorine water producing system for sterilization in one embodiment of the present invention. FIG.
In the above, 1 is a water tank for storing raw water or concentrated free chlorine water for sterilization. This raw water is introduced to produce free chlorine water and also to be used as washing water. 2 is a chloride aqueous solution tank for adding chloride containing chlorine components such as sodium chloride to raw water by a salt water pump 5, 3 is an electrolytic cell in which electrodes C and D are provided inside, and 4 is a circulation path 15 for supplying raw water. A pump for circulation, 6 is a circulation path 15
And the circulation path 15 connecting or closing the discharge path 11
Flow path switching means for switching which to select,
Reference numeral 7 is a raw water electromagnetic valve for adjusting the inflow amount of raw water, 8 is an inlet for tap water or ground water, which is raw water, 9 is a high water level sensor installed in the water tank 1 to detect the amount of stored raw water, and 10 is the water tank 1
A low water level sensor installed on the ground to detect the minimum amount of raw water stored, 1
A cooling tower 2 is sterilized by mixing the concentrated free chlorine water for sterilization discharged from the discharge passage 11 into the cooling chamber. The low water level sensor 10 detects concentrated free chlorine water for residual sterilization and washing water, but the lower the minimum storage amount, the more preferable. A cleaning liquid is also introduced into the cooling tower 12 as described later. 13 is a salt water solenoid valve for adjusting the inflow amount of the chloride aqueous solution into the water storage tank 1. 14 is a sterilizer by controlling the electrodes C, D, the pump 4, the flow path switching means 6, the raw water solenoid valve 7 and the salt water solenoid valve 13. This is a control unit for generating concentrated free chlorine water for cleaning and cleaning the concentrated free chlorine water generating system for sterilization.

【0008】ここで貯水槽1の容量は冷却塔12内を循
環する冷却水の量の約1/40〜1/50の程度が望ま
しい。この程度の容量によって遊離塩素水を短時間に生
成、濃縮でき生成システムが酸化腐食するのを抑えるこ
とができる。この実施例では冷却塔12の冷却水を20
00リットル、貯水槽1の容量を50リットルとしてい
る。このとき後述する濃縮遊離塩素水生成プロセスに要
する時間は約5時間、冷却塔12への吐出プロセス時間
は約5分、洗浄プロセスに約1時間となる。
Here, the capacity of the water storage tank 1 is preferably about 1/40 to 1/50 of the amount of cooling water circulating in the cooling tower 12. With such a capacity, free chlorine water can be generated and concentrated in a short time, and oxidative corrosion of the generation system can be suppressed. In this embodiment, the cooling water of the cooling tower 12 is set to 20
The volume of the water storage tank 1 is 00 liters and 50 liters. At this time, the time required for the concentrated free chlorine water generation process described later is about 5 hours, the discharge process time to the cooling tower 12 is about 5 minutes, and the cleaning process is about 1 hour.

【0009】ところで上記した通り殺菌洗浄は1時間程
度で終了するが、次回の冷却塔12への吐出まで約1週
間程度の間、殺菌用濃縮遊離塩素水生成システムを休止
しておくといったことが一般的に行われている。したが
って生成プロセス直後のできるだけ早い時期に洗浄する
ことが重要である。そこでまずこの殺菌用濃縮遊離塩素
水生成プロセスについて説明し、その後で吐出プロセ
ス、洗浄プロセスについて説明する。
By the way, as described above, the sterilization and cleaning is completed in about 1 hour, but the concentrated free chlorine water producing system for sterilization may be suspended until the next discharge to the cooling tower 12 for about 1 week. It is commonly done. Therefore, it is important to wash as soon as possible immediately after the production process. Therefore, the concentrated free chlorine water producing process for sterilization will be described first, and then the discharging process and the cleaning process will be described.

【0010】制御部14からの信号で原水電磁弁7が開
かれ流入口8から原水が貯水槽1に流入する。貯水槽1
に設けた水位センサ9が所定の水位を検知すると原水電
磁弁7が閉止され、原水の供給が止められる。この実施
例の場合は貯水槽1に貯水する原水の第1所定量は50
リットルとする。次に塩水電磁弁13を開け塩水ポンプ
5によって塩化物水溶液槽2から10%濃度の塩化ナト
リウム水溶液の一部をを貯水槽1の原水に添加し、約3
00ppmの塩素濃度を生成する。塩化ナトリウム水溶
液を添加された原水はポンプ4で吸引され、流路切り換
え手段6に送られる。流路切り換え手段6は例えば三方
弁など用いるのがよく、循環路15で原水を循環してい
るときには吐出路11に原水が吐出しないように閉じら
れている。この流路切り換え手段6を経由して循環路1
5から塩化ナトリウムを添加された原水は電解槽3に注
水される。ポンプ4は10リットル/分の吸引容量を有
している。電解槽3に注水された原水が図示しないフロ
ースイッチの検知によって所定の水量に達すると、制御
部14から電圧が電極C、Dに印加され電気分解が開始
される。電気分解によって生成された遊離塩素(C
2 、HOCl、OCl - 等)を含んだ原水は、循環路
15から貯水槽1に還流されることになる。以上のプロ
セスを1サイクルとして最初の原水に比べ遊離塩素濃度
の高くなった原水が貯水槽1に貯水される。ポンプ4は
連続的に貯水槽1の原水を電解槽3に注水し続け、電解
槽3では電極C、Dに連続して電圧が印加され電気分解
されていることから、貯水槽1に環流してくる原水の遊
離塩素濃度は時間経過とともに上記サイクルを繰り返す
ことで濃縮されることになる。この実施例では約5時間
の連続循環で約40ppm濃度の遊離塩素を含んだ濃縮
遊離塩素水50リットルが得られ貯水槽1に貯水するこ
とができた。
The raw water solenoid valve 7 is opened by a signal from the control unit 14.
Raw water flows into the water storage tank 1 through the inflow port 8. Water tank 1
When the water level sensor 9 installed in the
The magnetic valve 7 is closed and the supply of raw water is stopped. This practice
In the case of the example, the first predetermined amount of raw water stored in the water tank 1 is 50
Let it be liters. Next, open the salt water solenoid valve 13 and pump the salt water pump.
5 from the chloride aqueous solution tank 2 to 10% concentration of sodium chloride
Add a portion of the aqueous solution of arium to the raw water in the water tank 1 to
It produces a chlorine concentration of 00 ppm. Sodium chloride water soluble
The raw water added with the liquid is sucked by the pump 4, and the flow path is switched.
It is sent to the means 6. The flow path switching means 6 is, for example, three-way
It is good to use a valve, etc. to circulate the raw water in the circulation path 15.
The discharge passage 11 to prevent the raw water from being discharged.
Have been. Circulation path 1 via this flow path switching means 6
Raw water added with sodium chloride from 5 is poured into the electrolyzer 3.
To be watered. Pump 4 has a suction capacity of 10 l / min
are doing. The raw water poured into the electrolyzer 3 is not shown in the flow chart.
-When the specified amount of water is detected by the switch detection, control
A voltage is applied to the electrodes C and D from the part 14 to start electrolysis.
To be done. Free chlorine (C
l2, HOCl, OCl -The raw water containing
It will be returned to the water tank 1 from 15. More professionals
The free chlorine concentration compared to the first raw water with the process as one cycle
The raw water whose temperature has risen is stored in the water tank 1. Pump 4
Continuously pouring raw water from the water storage tank 1 into the electrolysis tank 3 for electrolysis
In tank 3, voltage is continuously applied to electrodes C and D for electrolysis.
Because of this, the water flowing back to the water tank 1
The dechlorinated concentration repeats the above cycle over time
It will be concentrated. About 5 hours in this example
Concentration containing about 40ppm concentration of free chlorine in continuous circulation
50 liters of free chlorine water can be obtained and stored in the water storage tank 1.
I was able to.

【0011】ところで電極C、Dに同じ電位を印加し続
けるとその表面に原水中のCaイオンなどが付着して電
気分解を妨げるので、それを防ぐため定期的に互いに逆
の極性の電圧を印加する逆電操作が必要となる。ここで
は30分毎に極性を交換してCaイオンなどの付着物を
除去して電気分解能力を維持している。以上の操作によ
り約40ppmの濃縮遊離塩素水が得られたとき殺菌用
濃縮遊離塩素水の生成プロセスを終了する。
By the way, if the same potential is continuously applied to the electrodes C and D, Ca ions in the raw water adhere to the surface of the electrodes to prevent electrolysis. To prevent this, voltages of opposite polarities are periodically applied. Reverse operation is required. Here, the polarity is exchanged every 30 minutes to remove deposits such as Ca ions and maintain the electrolysis ability. When about 40 ppm of concentrated free chlorine water is obtained by the above operation, the process for producing concentrated free chlorine water for sterilization is terminated.

【0012】つぎに吐出プロセスについて説明する。制
御部14からの信号によって電極C、Dへの電圧印加を
中止し、流路切り換え手段6の循環路15側が閉じら
れ、吐出路11側が開けられることによって貯水槽1に
貯水された約40ppm濃度の濃縮遊離塩素水50リッ
トルは冷却塔12に吐出され、高濃度の濃縮遊離塩素水
に瞬時に触れさせることでレジオネラ属菌を殺菌洗浄す
ることができる。この実施例の冷却塔12は100冷凍
トンの容量を有する冷房システムを構成するもので、約
2000リットルの冷却水を循環している。従ってこの
冷却水に約40ppm濃度の濃縮遊離塩素水50リット
ルを吐出することによって、冷却水には約1ppm濃度
の遊離塩素が含まれることになり、レジオネラ属菌を殺
菌洗浄するのに適した濃度になるのである。レジオネラ
属菌を殺菌洗浄するのには通常0.4ppm以上の遊離
塩素が効果的であると言われているから、殆ど完全に殺
菌することができる。生成プロセスの終了と同時に殺菌
用濃縮遊離塩素水生成システムから全量の濃縮遊離塩素
水が吐出されるのが望ましいが、貯水槽1や電解槽3内
に不可避的に残留遊離塩素水が残ることが多い。従って
生成プロセスで得られた濃縮遊離塩素水はこの残留遊離
塩素水分を除いてほぼ全量が吐出されることになる。
Next, the discharge process will be described. The voltage applied to the electrodes C and D is stopped by a signal from the control unit 14, the circulation path 15 side of the flow path switching means 6 is closed, and the discharge path 11 side is opened, whereby the concentration of about 40 ppm stored in the water tank 1 is reached. 50 liters of the concentrated free chlorine water is discharged to the cooling tower 12, and the concentrated free chlorine water having a high concentration can be instantly contacted to sterilize and wash the Legionella spp. The cooling tower 12 of this embodiment constitutes a cooling system having a capacity of 100 refrigeration tons, and circulates about 2000 liters of cooling water. Therefore, by discharging 50 liters of concentrated free chlorine water having a concentration of about 40 ppm into the cooling water, the cooling water contains about 1 ppm concentration of free chlorine, which is a concentration suitable for sterilizing and washing Legionella spp. It becomes. It is generally said that 0.4 ppm or more of free chlorine is effective for sterilizing and washing Legionella spp. Therefore, it can be almost completely sterilized. It is desirable that the concentrated free chlorine water for sterilization is discharged from the concentrated free chlorine water generation system for sterilization at the same time as the end of the generation process, but residual free chlorine water may inevitably remain in the water storage tank 1 or the electrolytic cell 3. Many. Therefore, almost all of the concentrated free chlorine water obtained in the production process is discharged except this residual free chlorine water.

【0013】ところで貯水槽1、ポンプ4、流路切り換
え手段6、電解槽3及び循環路15内には濃縮遊離塩素
水が付着残留し、これらの各部材を酸化腐食することに
なる。これを防止するために従来はこれらの各部材に特
別な防錆処理を行っていたが、システムが高価になり耐
用年数も短くなるものであった。本実施例の殺菌用濃縮
遊離塩素水生成システムの洗浄プロセスはこのよな問題
点を解決するものである。以下この殺菌用濃縮遊離塩素
水の生成プロセスについて説明する。
By the way, concentrated free chlorine water adheres and remains in the water storage tank 1, the pump 4, the flow path switching means 6, the electrolysis tank 3 and the circulation path 15, and oxidizes and corrodes these members. In order to prevent this, conventionally, a special anticorrosion treatment was applied to each of these members, but the system was expensive and the service life was shortened. The cleaning process of the concentrated free chlorine water generation system for sterilization of this embodiment solves such a problem. The process of producing concentrated free chlorine water for sterilization will be described below.

【0014】上記の生成プロセスが終了すると制御部1
4からの信号によって原水電磁弁7が開き、洗浄水であ
る原水を貯水槽1に第2所定量である50リットル程度
貯水する。次に原水はポンプ4で吸引されて流路切り換
え手段6を経由して電解槽3に注水し循環路15から貯
水槽1に残留遊離塩素を洗浄して環流する。このとき流
路切り換え手段6は最初の状態に戻って循環路15側を
開け、吐出路11側は閉じられているからである。また
この洗浄プロセス中は電極C、Dには電圧は印加されな
い。このようにして貯水槽1、ポンプ4、流路切り換え
手段6、電解槽3及び循環路15内を繰り返して循環洗
浄し内部の残留遊離塩素を洗い流して貯水槽1に貯水す
る。この実施例の殺菌用濃縮遊離塩素水生成システム内
では上述したように不可避的に残留する約40ppmの
濃縮遊離塩素水が約5リットル程度残留しており、新た
に洗浄水として50リットル貯水して循環洗浄すること
によって遊離塩素が約4ppmにまで薄められた洗浄液
が貯水槽1に貯水されることになる。ここで再び流路切
り換え手段6の吐出路11側を開け、遊離塩素が約4p
pmにまで薄められた洗浄液を冷却塔12に吐出してレ
ジオネラ属菌を殺菌洗浄する。殺菌用濃縮遊離塩素水の
生成プロセスの後の吐出プロセスで吐出した濃縮遊離塩
素水に比べ遊離塩素の濃度が低いが、既に述べた通りレ
ジオネラ属菌の発生を抑えるには十分である。またこの
洗浄液は冷却塔12内の冷却水の補充液の役割も担って
いることになる。
When the above generation process is completed, the control unit 1
The raw water electromagnetic valve 7 is opened in response to the signal from 4, and raw water, which is washing water, is stored in the water storage tank 1 at a second predetermined amount of about 50 liters. Next, the raw water is sucked by the pump 4 and poured into the electrolytic cell 3 via the flow path switching means 6, and the residual free chlorine is washed from the circulation path 15 into the water storage tank 1 and circulated. At this time, the flow path switching means 6 returns to the initial state, the circulation path 15 side is opened, and the discharge path 11 side is closed. Further, no voltage is applied to the electrodes C and D during this cleaning process. In this way, the water tank 1, the pump 4, the flow path switching means 6, the electrolysis tank 3 and the circulation path 15 are repeatedly circulated and washed to wash away the residual free chlorine inside and store the water in the water tank 1. In the concentrated free chlorine water generating system for sterilization of this embodiment, about 5 liters of concentrated free chlorine water of about 40 ppm inevitably remained as described above, and about 50 liters was newly stored as washing water. By circulating cleaning, the cleaning liquid in which the free chlorine is diluted to about 4 ppm is stored in the water storage tank 1. Here, the discharge passage 11 side of the flow passage switching means 6 is opened again, and free chlorine is about 4 p
The washing liquid diluted to pm is discharged to the cooling tower 12 to sterilize and wash Legionella spp. The concentration of free chlorine is lower than that of the concentrated free chlorine water discharged in the discharge process after the process of producing concentrated free chlorine water for sterilization, but it is sufficient to suppress the generation of Legionella spp. Further, this cleaning liquid also serves as a replenishing liquid for the cooling water in the cooling tower 12.

【0015】貯水槽1の洗浄水をほぼ全量吐出して後に
再び原水を貯水槽1に貯水しポンプ4によって殺菌用濃
縮遊離塩素水生成システム内を繰り返し循環洗浄するの
もよい。これらの洗浄プロセスに要する時間は約1時間
程度で十分である。こうして貯水槽1に貯水される洗浄
水の遊離塩素の濃度は約0.4ppm程度にまで薄めら
れ通常の水道水の含有量の変動範囲にまでになる。この
濃度では殺菌用濃縮遊離塩素水生成システム内の各部材
が酸化腐食される速度が非常に遅くなっており、実用上
特別な防錆処理を施す必要がない。また次の濃縮遊離塩
素水の生成プロセス開始まで約一週間程度の期間が空く
ことの多いこの殺菌用濃縮遊離塩素水生成システムにお
いては、この0.4ppm程度の洗浄水を貯水しておけ
ば一般細菌等が繁殖することを防ぐことができる。約一
週間程度経過後に濃縮遊離塩素水の生成プロセスを再開
する場合には、この貯水した0.4ppm程度の洗浄水
をそのまま原水として用い、制御部14に接続された濃
度検知センサて塩素の濃度を検出し、約300ppmの
塩素濃度になるように塩化物水溶液槽2の塩化ナトリウ
ム水溶液を適当量添加して電気分解すればよく、新たに
原水を給水して貯水槽1の洗浄水を置換する必要がな
い。この実施例での冷却塔12は100冷凍トンの容量
を有する冷房システムを構成するもので、約2000リ
ットルの冷却水中のレジオネラ属菌を殺菌洗浄する場合
の殺菌用濃縮遊離塩素水生成システムの洗浄方法につい
て説明した。冷却水の量がこれ以外の場合には貯水槽
1、電解槽3及びポンプ4などの容量や能力を適当に調
整、変更するだけでよく、本発明による効果にはなんら
影響を与えるものではない。
It is also possible to discharge almost all the washing water in the water storage tank 1 and then store the raw water again in the water storage tank 1 and repeatedly circulate and wash the inside of the concentrated free chlorine water production system for sterilization by the pump 4. About 1 hour is sufficient for these cleaning processes. In this way, the concentration of free chlorine in the wash water stored in the water storage tank 1 is diluted to about 0.4 ppm, and reaches the range of fluctuation of the content of normal tap water. At this concentration, the rate of oxidative corrosion of each member in the concentrated free chlorine water generation system for sterilization is very slow, and it is not necessary to perform a special rust preventive treatment in practice. In addition, in this concentrated free chlorine water generation system for sterilization, which often takes about a week until the start of the next concentrated free chlorine water generation process, it is common to store about 0.4 ppm of wash water. It is possible to prevent bacteria and the like from breeding. When the production process of concentrated free chlorine water is restarted after about one week, the stored wash water of about 0.4 ppm is directly used as raw water, and the chlorine concentration is detected by the concentration detection sensor connected to the control unit 14. Is detected, electrolysis is performed by adding an appropriate amount of sodium chloride aqueous solution in the chloride aqueous solution tank 2 so that the chlorine concentration becomes about 300 ppm, and new raw water is supplied to replace the wash water in the water tank 1. No need. The cooling tower 12 in this embodiment constitutes a cooling system having a capacity of 100 refrigeration tons, and washing of a concentrated free chlorine water producing system for sterilization when sterilizing and washing Legionella spp. In about 2000 liters of cooling water. I explained how. When the amount of the cooling water is other than this, it is sufficient to appropriately adjust and change the capacity and capacity of the water storage tank 1, the electrolytic tank 3 and the pump 4, and the effect of the present invention is not affected at all. .

【0016】また、冷却塔12内に発生するレジオネラ
属菌を殺菌洗浄するだけでなく、加湿器、給水・給湯
器、及び装飾用噴水などの貯水部を配設した装置の各種
細菌の殺菌洗浄プロセスにおいても本発明の殺菌用濃縮
遊離塩素水生成システムの洗浄方法は有効なものであ
る。
Further, not only sterilizing and cleaning Legionella spp. Generated in the cooling tower 12, but also sterilizing and cleaning various bacteria in a device provided with a humidifier, a water / water heater, and a fountain for decoration. Also in the process, the cleaning method of the concentrated free chlorine water producing system for sterilization of the present invention is effective.

【0017】[0017]

【発明の効果】以上から明らかなように本発明によれ
ば、濃縮した殺菌用濃縮遊離塩素水を生成した後、一度
に吐出させ、新たに第2所定量の洗浄水を供給して循環
させるから、システム内の特別な防錆処理が不要で、メ
ンテナンスが容易であり、洗浄後の液処理を容易にする
ことができる。
As is apparent from the above, according to the present invention, after producing concentrated concentrated free chlorine water for sterilization, it is discharged at one time and a second predetermined amount of cleaning water is newly supplied and circulated. Therefore, special rust preventive treatment in the system is not required, maintenance is easy, and liquid treatment after cleaning can be facilitated.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例における殺菌用濃縮遊離塩素
水生成システム洗浄方法の説明図
FIG. 1 is an explanatory view of a cleaning method for a concentrated free chlorine water generation system for sterilization in one embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 貯水槽 2 塩化物水溶液槽 3 電解槽 4 ポンプ 5 塩水ポンプ 6 流路切り換え手段 7 原水電磁弁 8 流入口 9 水位センサ 10 低水位センサ 11 吐出路 12 冷却塔 13 塩水電磁弁 14 制御部 15 循環路 1 Water Storage Tank 2 Chloride Aqueous Solution Tank 3 Electrolysis Tank 4 Pump 5 Salt Water Pump 6 Flow Path Switching Device 7 Raw Water Solenoid Valve 8 Inlet 9 Water Level Sensor 10 Low Water Level Sensor 11 Discharge Channel 12 Cooling Tower 13 Salt Water Solenoid Valve 14 Control Section 15 Circulation Road

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 C02F 1/50 531 N 540 B 550 D L 560 F 1/76 A ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification number Office reference number FI technical display location C02F 1/50 531 N 540 B 550 DL L 560 F 1/76 A

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】貯水槽と電解槽を循環路によって接続する
とともに、塩化物を添加した第1所定量の原水を前記循
環路を介して循環させながら前記電解槽で電気分解して
濃縮遊離塩素水を生成し、前記循環路に設けた流路切り
換え手段によって吐出路と前記循環路を選択的に接続し
て前記第1所定量のほぼ全量の濃縮遊離塩素水を吐出す
る殺菌用濃縮遊離塩素水生成システムの洗浄方法であっ
て、前記濃縮遊離塩素水を前記吐出路から吐出させた
後、第2所定量の洗浄水を前記殺菌用濃縮遊離塩素水生
成システムに供給し、前記循環路を介しての循環洗浄を
継続した後で前記切り換え手段を切り換え、前記第2所
定量のほぼ全量の洗浄水を吐出路から吐出させることを
特徴とする殺菌用濃縮遊離塩素水生成システムの洗浄方
法。
1. A water storage tank and an electrolysis tank are connected by a circulation path, and a first predetermined amount of raw water containing chloride is electrolyzed in the electrolysis cell while circulating through the circulation path and concentrated free chlorine. Concentrated free chlorine for sterilization that generates water and discharges almost the entire amount of concentrated free chlorine water of the first predetermined amount by selectively connecting the discharge path and the circulation path by the flow path switching means provided in the circulation path. A method of cleaning a water generation system, comprising: discharging the concentrated free chlorine water from the discharge passage, supplying a second predetermined amount of cleaning water to the sterilized concentrated free chlorine water generation system, and then circulating the circulation path. A cleaning method for a concentrated free chlorine water production system for sterilization, characterized in that the switching means is switched after continuing the circulation cleaning via the discharging means to discharge substantially the entire amount of the second predetermined amount of cleaning water from the discharge passage.
JP22335894A 1994-09-19 1994-09-19 Cleaning method of concentrated free chlorine water generation system for sterilization Expired - Fee Related JP3339196B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22335894A JP3339196B2 (en) 1994-09-19 1994-09-19 Cleaning method of concentrated free chlorine water generation system for sterilization

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22335894A JP3339196B2 (en) 1994-09-19 1994-09-19 Cleaning method of concentrated free chlorine water generation system for sterilization

Publications (2)

Publication Number Publication Date
JPH0885891A true JPH0885891A (en) 1996-04-02
JP3339196B2 JP3339196B2 (en) 2002-10-28

Family

ID=16796907

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22335894A Expired - Fee Related JP3339196B2 (en) 1994-09-19 1994-09-19 Cleaning method of concentrated free chlorine water generation system for sterilization

Country Status (1)

Country Link
JP (1) JP3339196B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6623695B2 (en) 1997-12-04 2003-09-23 Steris Corporation Chemical modification of electrochemically activated solutions for improved performance
JP2005514201A (en) * 2002-01-14 2005-05-19 ペー・ウント・ヴェー・インヴェスト・フェアメーゲンス・フェアヴァルトゥングスゲゼルシャフト・エム・ベー・ハー Water supply system, in particular a method for sterilization and cleaning of a water supply system in swimming and bathing pool units, and apparatus for carrying out the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6623695B2 (en) 1997-12-04 2003-09-23 Steris Corporation Chemical modification of electrochemically activated solutions for improved performance
JP2005514201A (en) * 2002-01-14 2005-05-19 ペー・ウント・ヴェー・インヴェスト・フェアメーゲンス・フェアヴァルトゥングスゲゼルシャフト・エム・ベー・ハー Water supply system, in particular a method for sterilization and cleaning of a water supply system in swimming and bathing pool units, and apparatus for carrying out the same

Also Published As

Publication number Publication date
JP3339196B2 (en) 2002-10-28

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