JPH0845895A - Centrifugal substrate drying apparatus - Google Patents

Abstract

PURPOSE:To prevent the rise of dust doze to friction between substrates to be processed and a carrier and restrain the deformation in carriers, by providing substrate holding members that clamp the workpieces and hold them in a position away from the carrier together with the substrate holding section of movable substrate holding members. CONSTITUTION:Movable substrate holding members 15, 16 consist of carrier holding members 152, 162 and substrate holding members 153, 163. When the movable substrate holding members 15, 16 are closed, the carrier holding members 152, 162 are brought into contact with the upper part of a carrier 7, and the substrate holding members 153, 163 are brought into contact with the upper part of substrates 6 to be processed. Substrate holding members 22, 23, 24, 25 are placed between inner plates 18, 19. The substrate holding members 22, 23, 24, 25 are brought into contact with the workpieces 6 held in the carrier 7 placed on a carrier placement plate 10. When the movable substrate holding members 15, 16 are closed, the substrate holding members 22, 23, 24, 25 hold the workpieces to in a position away from the carrier 7, together with the substrate holding members 153, 163.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a centrifugal substrate in which a carrier containing a substrate to be processed such as a semiconductor wafer is contained and held in a rotor, and the rotor is rotated to drain and dry the substrate to be processed by centrifugal force. The present invention relates to a drying device, and more particularly to a centrifugal type substrate drying device having a rotation axis as a horizontal axis.

[0002]

2. Description of the Related Art As such a centrifugal type substrate drying apparatus shown in FIG. 4 is known. FIG. 4 shows a side sectional view of a rotor included in a centrifugal substrate drying apparatus. The rotor 26 includes a carrier mounting portion 29 for mounting a carrier 28 for accommodating a plurality of substrates 27 to be processed such as semiconductor wafers. The substrate mounting portion 29 is paired with the carrier 28 and movable substrate holding members 30 and 31 for holding the substrate 27 to be processed in the carrier 28. The centrifugal substrate drying device rotates the rotor 26 at a high speed, The centrifugal force generated by the rotation separates and drops the water droplets attached to the substrate 27 to be processed.

[0003]

However, in such a centrifugal type substrate drying apparatus, a small amount of dust is generated by rubbing the carrier and the substrate to be processed during the rotation of the rotor, and the centrifugal force during the rotation causes the substrate to be covered. There has been a problem that the processed substrate bites into the carrier and the carrier is deformed.
In view of the above problems, it is an object of the present invention to provide a centrifugal substrate drying apparatus capable of eliminating dust generation due to friction between a substrate to be processed and a carrier and suppressing deformation of the carrier.

[0004]

SUMMARY OF THE INVENTION A centrifugal substrate drying apparatus of the present invention is a carrier placing section for placing a pair of side plates and a carrier which is placed between the pair of side plates and accommodates a plurality of substrates to be processed. And a substrate that is movably hung between the pair of side plates and that, when closed, forms a pair with the carrier placement part and a carrier holding part that holds the carrier and a substrate that contacts the substrate to be processed housed in the carrier. A centrifuge substrate drying device for drying a substrate to be processed is provided with a rotor having a movable substrate holding member having a holding portion, the rotation axis of which is horizontal, and the substrate is held in the centrifugal substrate drying device. It is characterized in that it has a substrate holding member which is paired with the substrate holding portion of the member and which holds the substrate to be processed and holds the substrate to be processed at a position apart from the carrier.

[0005]

In the centrifugal substrate drying apparatus of the present invention, when the movable substrate holding member is closed, the carrier is held by the carrier placing portion and the carrier holding portion of the movable substrate holding member, and the substrate to be processed is held by the substrate holding member. And the substrate holding portion of the movable substrate holding member holds the movable substrate holding member at a position apart from the carrier. This can prevent the carrier from coming into contact with the substrate to be processed while the rotor is rotating.

[0006]

Embodiments of the present invention will be described with reference to the drawings. FIG. 1 is a front sectional view of a centrifugal type substrate drying apparatus of the present invention, and FIG.
FIG. 3 is a cross-sectional view taken along the line AA ′ of FIG. 3, and FIG. 3 is a side cross-sectional view of the centrifugal substrate drying apparatus when the carrier is mounted.

The centrifugal type substrate drying apparatus 1 has a chamber 2 inside, a lid 3 that can be opened and closed is provided at the upper part of the chamber 2, a drain port 4 is provided at the lower part, and a horizontal bearing type rotor 5 is provided inside. Is provided.

The rotor 5 accommodates and holds a carrier 7 for accommodating a plurality of substrates 6 to be processed in parallel, and includes a pair of side plates 8 and 9 and a carrier mounting portion 10 connecting the side plates 8 and 9. A plurality of shafts 11, rotating shafts 12, 13, 14 rotatably mounted between the side plates 8 and 9, and a rotating shaft 1.
2, the movable substrate holding member 15 fixed to the rotating shaft 13, the movable substrate holding member 16 fixed to the rotating shaft 13, and the movable substrate holding members 15 and 16 fixed to the rotating shaft 14 in a closed state. The locking member 17 for fixing and the inner plates 18 and 19 positioned inside the side plates 8 and 9 and fixed to the shaft 11 for laterally positioning the carrier 7 are generally configured.

The lock member 17 and the movable substrate holding member 15 are connected by a tension bar 20, and the movable substrate holding member 15 and the movable substrate holding member 16 are connected by an interlocking rod 21, and the lock member 17 is shown in FIG. Arrow A from the state shown
When the movable substrate holding member 15 and the movable holding member 16 interlock with this, the movable holding member 15 and the movable holding member 16 rotate in the directions of arrows B and C, respectively. It is adapted to engage with the engaging surface 161 of the movable substrate holding member 16.

Further, the lock member 17 is attached to the tension bar 2
The lock member 1 is rotated in the direction of arrow A against the resistance of 0.
The engaging recessed portion 171 of the movable substrate holding member 15
When engaged with 51, the movable substrate holding members 15 and 16 are maintained in a closed state.

Further, the movable substrate holding members 15 and 16 are
There are provided carrier holding portions 152 and 162 which come into contact with the upper portion of the carrier 7 when closed, and substrate holding portions 153 and 163 which come into contact with the upper portion of the substrate 6 to be processed.

A substrate holding member 2 is provided between the inner plates 18 and 19.
2, 23, 24, 25 are laid on the substrate holding member 22, 23, 24, 25, and the substrate 6 to be processed is housed in the carrier 7 placed on the carrier placing plate 10.
2 and the movable substrate holding members 15, 1 as shown in FIG.
When the substrate 6 is closed, the substrate 6 to be processed is held at a position apart from the carrier 7 together with the substrate holders 153 and 163. At this time, the carrier 7 is the movable substrate holding member 1
The carrier holding portions 152 and 162 of Nos. 5 and 16, the carrier mounting portion 10 and the inner plates 18 and 19 are fixed.

The substrate holding members 22, 23, 24, 25
And the substrate holding portion 15 of the movable substrate holding members 15 and 16.
As the material of 3, 163, wear resistance should be taken into consideration in order to suppress chemical resistance and dust generation due to wear, and since workability need not be taken into consideration because a simple shape is required, fluororesin is used. Suitable and even harder materials are suitable. This is also used in this embodiment.

Next, the operation of this embodiment will be described.
First, the carrier 7 is attached to the rotor 5 by, for example, a robot arm. At this time, as shown in FIG. 3, the lid 3 is opened, the movable substrate holding members 15 and 16 are opened, and the lock member 17 is engaged. The engagement with the dowel pin 151 is released.

When the carrier 7 is placed on the carrier placing plate 10, the lock member 17 is rotated. In association with this, the movable substrate holding members 15 and 16 also rotate, the movable substrate holding members 15 and 16 are closed as shown in FIG. 2, and the engaging recess 171 of the lock member 17 serves as the engaging pin 151, though not shown. The movable substrate holding members 15 and 16 are locked by engaging with each other.

When the carrier 7 is fixed in the rotor 5 and the lid 3 is closed, the rotor 5 is rotated at a high speed to dry the substrate 20 to be processed. At this time, as shown in FIG. 2, the carrier 7 includes the carrier mounting plate 10 and the movable substrate holding member 1.
With the carrier holding portions 152 and 162 of 5 and 16,
The substrate 6 to be processed includes the substrate holding members 22, 23, 24 and 25 and the substrate holding portions 153 and 16 of the movable substrate holding members 15 and 16.
Since they are held in the rotor 5 by 3 and 3, respectively,
The substrate 6 to be processed and the carrier 7 do not come into contact with each other while the rotor is rotating.

[0017]

According to the present invention, the substrate to be processed and the carrier can be held at positions separated from each other with a simple structure, whereby the substrate to be processed and the carrier do not come into contact with each other during rotation of the rotor. It is possible to provide a centrifugal substrate drying apparatus which eliminates dust generation due to friction between a substrate to be processed and a carrier and further prevents the substrate to be processed from biting into the carrier during rotation.

[Brief description of drawings]

FIG. 1 is a front sectional view of a centrifugal substrate drying apparatus according to this embodiment.

FIG. 2 is a sectional view taken along the line A-A ′ in FIG.

FIG. 3 is a side sectional view of the centrifugal substrate drying device with the carrier attached.

FIG. 4 is a side sectional view of a rotor of a conventional centrifugal substrate drying device.

[Description of sign]

 DESCRIPTION OF SYMBOLS 1 Centrifugal substrate drying apparatus 2 Chamber 5 Rotor 6 Processing substrate 7 Carrier 10 Carrier placing part 15, 16 Movable substrate holding member 152, 162 Carrier holding part 153, 163 Substrate holding part 22, 23, 24, 25 Substrate holding member

Claims (1)

[Claims] 1. A pair of side plates, a carrier mounting portion mounted between the pair of side plates for mounting a carrier that accommodates a plurality of substrates to be processed, and a pair of side plates movably mounted between the pair of side plates. A rotor having a carrier holding portion which is paired with the carrier placing portion when holding the carrier and holds the carrier, and a movable substrate holding member having a substrate holding portion which comes into contact with a substrate to be processed housed in the carrier, In a centrifugal type substrate drying apparatus that is provided with its rotation axis in the horizontal direction and rotates this rotor at high speed to dry the substrate to be processed, it is paired with the substrate holding part of the movable substrate holding member to hold the substrate to be processed. A centrifugal substrate drying apparatus having a substrate holding member for holding the substrate to be processed at a position apart from the carrier.