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JPH08234426A - Negative type image recording material - Google Patents

Negative type image recording material

Info

Publication number
JPH08234426A
JPH08234426A JP7035493A JP3549395A JPH08234426A JP H08234426 A JPH08234426 A JP H08234426A JP 7035493 A JP7035493 A JP 7035493A JP 3549395 A JP3549395 A JP 3549395A JP H08234426 A JPH08234426 A JP H08234426A
Authority
JP
Japan
Prior art keywords
acid
group
recording material
image recording
enol ether
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7035493A
Other languages
Japanese (ja)
Inventor
Shunichi Kondo
俊䞀 è¿‘è—€
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP7035493A priority Critical patent/JPH08234426A/en
Priority to US08/598,496 priority patent/US5658708A/en
Publication of JPH08234426A publication Critical patent/JPH08234426A/en
Pending legal-status Critical Current

Links

Landscapes

  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE: To enable recording independently of the wavelength of light emitted from a light source for exposure by incorporating a radiation absorbing material, a compd. having specified enol ether groups in each molecule and a linear polymer having acid groups and reacting thermally with the enol ether groups. CONSTITUTION: A radiation absorbing material, a compd. having at least two enol ether groups represented by the formula in each molecule and a linear polymer having acid groups and reacting thermally with the enol ether groups are incorporated. In the formula, each of R1 -R3 is H, an alkyl or aryl and two of them may bond to each other to form a satd. or olefinically unsatd. ring. The linear polymer is required only to have at least acid groups and may have acid and hydroxyl groups.

Description

【発明の詳现な説明】Detailed Description of the Invention

【】[0001]

【産業䞊の利甚分野】本発明はオフセット印刷マスタヌ
ずしお䜿甚できる画像蚘録材料に関するものであり、特
にコンピュヌタヌ等のディゞタル信号から盎接補版でき
る、いわゆるダむレクト補版甚の平版印刷版に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an image recording material which can be used as an offset printing master, and more particularly to a lithographic printing plate for so-called direct plate making which can be made directly from digital signals of a computer or the like.

【】[0002]

【埓来の技術】近幎におけるレヌザの発展は目ざたし
く、特に近赀倖から赀倖に発光領域をも぀固䜓レヌザ・
半導䜓レヌザは高出力か぀小型の物が容易に入手できる
ようになっおきおいる。これらのレヌザはコンピュヌタ
等のディゞタルデヌタから盎接補版する際の露光光源ず
しお非垞に有甚である。
2. Description of the Related Art The development of lasers in recent years has been remarkable, and particularly solid-state lasers having an emission region from near infrared to infrared.
High-power and small-sized semiconductor lasers are easily available. These lasers are very useful as an exposure light source when making a plate directly from digital data of a computer or the like.

【】埓来、コンピュヌタのディゞタルデヌタか
ら盎接描画できる平版印刷版ずしお、電子写真方匏に利
甚した印刷版、アルゎンレヌザやレヌザによる露
光、必芁に応じ埌加熱を組み合わせた光重合系印刷版、
感光性暹脂䞊に銀塩感材を積局したもの、銀塩拡散転写
匏のもの、攟電やレヌザ光によりシリコヌンゎム局を砎
壊するタむプの印刷版等が知られおいる。
Conventionally, as a lithographic printing plate which can be directly drawn from digital data of a computer, a printing plate used in an electrophotographic system, a photopolymerization type printing plate in which exposure by an argon laser or a YAG laser and, if necessary, post-heating are combined,
It is known that a silver salt sensitive material is laminated on a photosensitive resin, a silver salt diffusion transfer type, a printing plate of a type in which a silicone rubber layer is destroyed by discharge or laser light.

【】電子写真方匏を甚いるものは、垯電、露
光、珟像凊理が煩雑であり、装眮が耇雑で倧型になる。
光重合型印刷版は本来感床に限界があり、小型レヌザヌ
の䜿甚が困難であり、か぀明宀での取扱いが難しい。銀
塩感材を積局したもの、銀塩拡散転写匏のものは、凊理
が煩雑であり、コストが高くなる欠点を有する。たた、
レヌザヌによりシリコヌンゎム局を砎壊するタむプのも
のは、版面に残るシリコヌン滓の陀去に問題点を残しお
いる。
In the case of using the electrophotographic method, charging, exposure and development processing are complicated, and the apparatus is complicated and large.
The photopolymerizable printing plate originally has a limited sensitivity, and it is difficult to use a small laser and it is difficult to handle in a bright room. The one in which the silver salt sensitive material is laminated and the one in which the silver salt diffusion transfer type is used have the drawbacks that the processing is complicated and the cost is high. Also,
The type in which the silicone rubber layer is destroyed by a laser has a problem in removing the silicone residue remaining on the plate surface.

【】これらの光源を利甚しお、画像圢成可胜な
技術ずしお、特開昭−号公報には、光
および熱で分解する化合物䟋えばゞアゟニりム化合
物ず光を吞収し熱に倉えるこずのできる物質粒子ず結
着剀ずからなるポゞ型蚘録材料が開瀺されおいる。た
た、特開昭−号公報には、熱可塑性暹
脂粒子ず光−熱倉換物質ず光架橋性物質䟋えばゞアゟ
ニりム化合物を䞻成分ずするポゞ型の感光、感熱蚘録
材料が開瀺されおいる。
As a technique capable of forming an image using these light sources, Japanese Patent Application Laid-Open No. 52-113219 discloses a compound (for example, a diazonium compound) which decomposes with light and heat and absorbs light to convert it into heat. A positive type recording material composed of substance particles capable of forming and a binder is disclosed. Further, JP-A-58-148792 discloses a positive type photosensitive and heat-sensitive recording material containing thermoplastic resin particles, a light-heat converting substance and a photo-crosslinking substance (for example, a diazonium compound) as main components. There is.

【】しかしながら、䞊蚘レヌザを光源ずしお利
甚できる蚘録材料は感床が䜎く、曎に盎接補版の堎合、
コンピュヌタ等のディゞタルデヌタを盎接、レヌザビヌ
ムをスキャンさせお版材に曞き蟌むので、䞊蚘ポゞ型材
料はかなりの曞き蟌み時間を必芁ずする。そのため、曞
き蟌み時間が短瞮できる近赀倖から赀倖に発光領域をも
぀固䜓レヌザ・半導䜓レヌザ熱モヌド可胜な高感床
なネガ型材料の開発が望たれおいた。
However, the recording material which can use the above laser as a light source has low sensitivity, and in the case of direct plate making,
Since the digital data of a computer or the like is directly written on the plate material by scanning the laser beam, the positive type material requires a considerable writing time. Therefore, there has been a demand for the development of a high-sensitivity negative type material capable of shortening the writing time and capable of solid-state laser / semiconductor laser (thermal mode) having an emission region from near infrared to infrared.

【】このように埓来のコンピナヌタのデゞタル
デヌタから盎接描画できる平版印刷版は、十分満足でき
るものではない。䞀方、䞀般に重合性化合物の皮ずし
おビニル゚ヌテル基含有化合物が知られおいる。このビ
ニル゚ヌテル基含有化合物は、䞻にカチオン重合性化合
物ずしお開発が進められおいる。カチオン重合はラゞカ
ル重合ず比范しお、重合の際、酞玠の重合阻害効果がな
いこず、䜓積収瞮が小さいこず等の特城を有する。この
ため、ビニル゚ヌテル基含有化合物は、硬化型暹脂
ずしお、光酞発生剀ずの組み合わせで、むンクや塗料、
最近は䞉次元立䜓像の䜜成に利甚されおいる。
As described above, the lithographic printing plate capable of directly drawing from the digital data of the conventional computer is not sufficiently satisfactory. On the other hand, vinyl ether group-containing compounds are generally known as one type of polymerizable compounds. This vinyl ether group-containing compound is being developed mainly as a cationically polymerizable compound. Cationic polymerization is characterized in that it has no effect of inhibiting the polymerization of oxygen during polymerization and has a small volume contraction, as compared with radical polymerization. Therefore, the vinyl ether group-containing compound can be used as a UV curable resin in combination with a photo acid generator to form an ink, a paint,
Recently, it has been used to create 3D stereoscopic images.

【】この光酞発生剀光カチオン重合開始剀
ずしおはゞアゟニりム塩、スルホニりム塩、ペヌドニり
ム塩、ピリリニりム塩、チオピリリニりム塩等が既知で
ある。これらカチオン重合甚のモノマヌず光酞開始剀の
組合せは、いづれも感床が十分でない。又 Stephen C.
Lapin, Polymers Paint Colour Journal,179 (4237)、
321(1989) には高感床の光カチオン性重合モノマヌの蚘
茉が芋られる。
This photoacid generator (photocationic polymerization initiator)
Known examples thereof include diazonium salts, sulfonium salts, iodonium salts, pyrilinium salts, thiopyrrinium salts, and the like. None of these combinations of cationic polymerization monomer and photoacid initiator have sufficient sensitivity. See Stephen C.
Lapin, Polymers Paint Color Journal, 179 (4237),
321 (1989) describes a highly sensitive photo-cationic polymerizable monomer.

【】たた最近、ビニル゚ヌテル基が酞存圚䞋で
加氎分解される性質を利甚しお、同じく光酞発生剀ずの
組み合わせで化孊増幅型のポゞ系材科ずしお䜿甚できる
こずが、特開平−号公報、特開昭−
号公報に開瀺されおいる。この技術においお
甚いられる実甚䞊有効な光酞発生剀の倚くが
以䞋にしか吞収がないため、露光光源ずしおは
以䞋の波長の光を発するものしか䜿甚できなかった。
Further, recently, by utilizing the property that a vinyl ether group is hydrolyzed in the presence of an acid, it can be used as a chemically amplified positive material also in combination with a photo-acid generator, as disclosed in JP-A-6-230574. JP-A-62-
It is disclosed in Japanese Patent No. 45971. Most of the practically effective photoacid generators used in this technology are 450 nm.
As the exposure light source is 450 n
Only those that emit light with a wavelength of m or less can be used.

【】[0010]

【発明が解決しようずする課題】本発明の目的は、露光
光源の発光波長に䟝存せずに蚘録可胜なネガ型画像蚘録
材料を提䟛するこずであり、特に近赀倖光から赀倖光
熱線で蚘録可胜なネガ型画像蚘録材料を提䟛するこ
ずにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a negative type image recording material capable of recording without depending on the emission wavelength of an exposure light source, and particularly from near infrared light to infrared light ( It is to provide a negative image recording material capable of recording by heat rays).

【】[0011]

【課題を解決するための手段】䞊蚘の目暙を達成するた
めに皮々のネガ型画像蚘録材料以䞋、感材又は感光性
組成物ずするこずもある。の探玢を行っおいたが、゚
ノヌル゚ヌテル基を分子内に個以䞊有する化合物ず酞
基を有する線状高分子ずを溶剀に溶かし、支持䜓に比范
的䜎枩で也燥塗垃した皮膜が、高枩により効果的に熱架
橋し、溶剀やアルカリ氎溶液に䞍溶の事実を芋出し、本
発明に到達した。
Various negative-type image recording materials (hereinafter sometimes referred to as light-sensitive materials or photosensitive compositions) have been searched for in order to achieve the above-mentioned goals. A film prepared by dissolving a compound having two or more ether groups in the molecule and a linear polymer having an acid group in a solvent and dry-coating it on a support at a relatively low temperature effectively thermally crosslinks at a high temperature, The present invention has been reached by finding the fact that it is insoluble in an alkaline aqueous solution.

【】即ち、本発明は、 茻射線を吞収する物質、分子内に䞋蚘䞀般匏
で瀺される゚ノヌル゚ヌテル基を少なくずも個
有する化合物、および酞基を有し、゚ノヌル゚ヌテル基
ず熱的に反応する線状高分子を含むこずを特城ずするネ
ガ型画像蚘録材料。
That is, the present invention includes (1) a substance that absorbs radiation, a compound having at least two enol ether groups represented by the following general formula (I) in the molecule, and an acid group having an enol ether group. A negative-type image recording material comprising a linear polymer that thermally reacts with a base.

【】[0013]

【化】 Embedded image

【】匏䞭、1、2及び3は氎玠、アルキル
基又はアリヌル基を衚し、同䞀もしくは異なっおいおも
よい。たた、それらの内の぀が結合しお飜和又はオレ
フィン性䞍飜和の環を圢成しおもよい。 支持䜓䞊に、赀倖光もしくは近赀倖光を吞収する
物質ず、分子内に前蚘䞀般匏で瀺される゚ノヌル
゚ヌテル基を少なくずも個有する化合物、および酞基
を有する線状高分子を含むこずを特城ずするヒヌトモヌ
ド曞き蟌み型ダむレクト補版甚ネガ型平版印刷版である
ネガ型画像蚘録材料であり、この発明により、䞊蚘課題
が達成できる。
In the formula, R 1 , R 2 and R 3 represent hydrogen, an alkyl group or an aryl group, and may be the same or different. Also, two of them may combine to form a saturated or olefinically unsaturated ring. (2) On a support, a substance that absorbs infrared light or near infrared light, a compound having at least two enol ether groups represented by the general formula (I) in the molecule, and a line having an acid group A negative type image recording material which is a negative lithographic printing plate for direct plate making in the heat mode writing type characterized by containing a macromolecule. The present invention can achieve the above objects.

【】本発明の奜たしい実斜態様ずしお、䞋蚘
〜のものが挙げられる。 支持䜓䞊に、赀倖光もしくは近赀倖光を吞収する
物質ず、分子内に䞋蚘䞀般匏の゚ノヌル゚ヌテル
基を少なくずも個有する化合物、および酞基及び氎酞
基を有する線状高分子を含む局ずを蚭けおなるこずを特
城ずするネガ型画像蚘録材料。 赀倖光もしくは近赀倖光を吞収する物質ずしお染
料を甚いる䞊蚘の画像蚘録材料。 赀倖光もしくは近赀倖光を吞収する物質ずしお顔
料を甚いる䞊蚘の画像蚘録材料。 赀倖光もしくは近赀倖光を吞収する物質ずしおカ
ヌボンブラックを甚いる䞊蚘の画像蚘録材料。 支持䜓ずしおポリ゚ステルフィルムを甚いる䞊蚘
の画像蚘録材料。 支持䜓ずしおアルミ板を甚いる䞊蚘の画像
蚘録材料。 支持䜓䞊に、赀倖光もしくは近赀倖光を吞収する
物質ず、分子内に䞀般匏の゚ノヌル゚ヌテル基を
少なくずも個有する化合物、および酞基及び氎酞基分
を有する線状高分子を含む局ず蚭けおネガ型画像蚘録材
料を、近赀倖もしくは赀倖光を発するレヌザを甚いお露
光し、その埌アルカリ氎で珟像するこずを特城ずするネ
ガ型画像蚘録方法。 10䞊蚘においお、ネガ型感熱性平版印刷版で
あるネガ型画像蚘録材料。
Preferred embodiments of the present invention include the following (3) to (10). (3) A substance that absorbs infrared light or near infrared light, a compound having at least two enol ether groups of the following general formula (I) in the molecule, and a line having an acid group and a hydroxyl group, on a support And a layer containing a macromolecule. (4) The image recording material according to (3) above, which uses a dye as a substance that absorbs infrared light or near infrared light. (5) The image recording material according to the above (3), which uses a pigment as a substance that absorbs infrared light or near infrared light. (6) The image recording material according to (3), wherein carbon black is used as a substance that absorbs infrared light or near infrared light. (7) The image recording material according to (3) above, which uses a polyester film as a support. (8) The image recording material according to (3) above, which uses an aluminum plate as a support. (9) A substance that absorbs infrared light or near infrared light, a compound having at least two enol ether groups of the general formula (I) in the molecule, and a line having an acid group and a hydroxyl group component, on a support. Negative image recording method, which comprises providing a layer containing a macromolecule, exposing a negative image recording material using a laser emitting near infrared light or infrared light, and then developing with alkaline water. (10) The negative image recording material as described in (3) above, which is a negative heat-sensitive lithographic printing plate.

【】本発明は、茻射線を吞収するこずにより埗
た熱゚ネルギヌにより、酞基を有する線状高分子ず個
以䞊の゚ノヌル゚ヌテル基を有する化合物ずを熱架橋さ
せ、ネガ画像を䜜成するものである。本発明で甚いられ
る線状高分子は、少なくずも酞基を有しおいればよく、
たた、線状高分子は酞基及び氎酞基を有しおいおもよ
い。
The present invention thermally crosslinks a linear polymer having an acid group and a compound having two or more enol ether groups by heat energy obtained by absorbing radiation to form a negative image. It is a thing. The linear polymer used in the present invention may have at least an acid group,
Further, the linear polymer may have an acid group and a hydroxyl group.

【】特に茻射線が赀倖光もしくは近赀倖光であ
る堎合に、熱モヌドでの蚘録を良奜にするこずができ奜
たしい。本発明においお、赀倖光もしくは近赀倖光を吞
収する物質が、染料であるず露光埌の珟像性の点で奜た
しく、たた顔料であるず感床が良奜になり奜たしい。カ
ヌボンブラックの堎合は吞収波長域が広くか぀感床が高
いずいう点で奜たしい。
Particularly, when the radiation is infrared light or near-infrared light, recording in the thermal mode can be made good, which is preferable. In the present invention, the substance that absorbs infrared light or near infrared light is preferably a dye from the viewpoint of developability after exposure, and is preferably a pigment because sensitivity is good. Carbon black is preferable because it has a wide absorption wavelength range and high sensitivity.

【】本発明においお、支持䜓ずしおポリ゚ステ
ルを甚いるず軜量である点、透光性画像ができる点で奜
たしく、アルミ板を甚いるず、寞床安定性、耐久性の面
で優れる。本発明の画像蚘録材料は、赀倖光もしくは近
赀倖光を発するレヌザを甚いお露光し、その埌アルカリ
氎で珟像される蚘録方法が奜たしい。
In the present invention, the use of polyester as the support is preferable in that it is light in weight and can form a light-transmitting image, and the use of an aluminum plate is excellent in dimensional stability and durability. The image recording material of the present invention is preferably a recording method in which the image recording material is exposed using a laser emitting infrared light or near infrared light and then developed with alkaline water.

【】たた、本発明の画像蚘録材料が、平版印刷
版である堎合、ヒヌトモヌド曞き蟌み型ダむレクト補版
甚平版印刷版であるこずが奜たしい。ヒヌトモヌド曞き
蟌みずは、適圓な熱線源を甚い、ディゞタルデヌタを基
にこの熱線源を制埡し、画像蚘録材料ぞ蚘録するこずで
ある。この際の熱線源ずしおは、ファクシミリ、感熱耇
写機等に䜿甚されおいるサヌマルヘッドや赀倖光もしく
は近赀倖光を発するレヌザであるが、ダむレクト補版甚
ずしおは、赀倖光もしくは近赀倖光を発するレヌザが奜
たしい。
When the image recording material of the present invention is a lithographic printing plate, it is preferably a heat mode writing type lithographic printing plate for direct plate making. The heat mode writing is to record on the image recording material by using an appropriate heat ray source, controlling the heat ray source based on digital data. The heat ray source at this time is a thermal head used in a facsimile machine or a thermal copying machine, or a laser emitting infrared light or near infrared light. For direct plate making, infrared light or near infrared light is used. Lasers that emit light are preferred.

【】本発明で䜿甚される奜たしい光は、近赀倖
線、赀倖線であり、この内赀倖線は䞀般に熱線ずも呌ば
れおおり、赀倖線で本発明の蚘録を行う堎合、本発明は
感熱性ずも蚀える。
The preferred light used in the present invention is near-infrared rays and infrared rays, of which infrared rays are also generally called heat rays, and when the recording of the present invention is carried out by infrared rays, the present invention can be said to be heat-sensitive.

【】以䞋本発明を詳现に説明する。本発明にお
いおは、茻射線を吞収する物質は、光茻射線を吞収
しお熱を発生する物質である。このような物質ずしお皮
々の顔料もしくは染料が甚いられる。顔料ずしおは、垂
販の顔料およびカラヌむンデックス䟿芧、
「最新顔料䟿芧」日本顔料技術協䌚線、幎
刊、「最新顔料応甚技術」出版、幎
刊、「印刷むンキ技術」出版、幎
刊に蚘録されおいる顔料が利甚できる。
The present invention will be described in detail below. In the present invention, a substance that absorbs radiation is a substance that absorbs light (radiation) and generates heat. Various pigments or dyes are used as such substances. As the pigment, commercially available pigments and color index (CI) handbooks,
Pigments recorded in "Latest Pigment Handbook" (edited by Japan Pigment Technology Association, 1977), "Latest Pigment Application Technology" (CMC Publishing, 1986), "Printing Ink Technology" (CMC Publishing, 1984) are used. it can.

【】顔料の皮類ずしおは、黒色顔料、黄色顔
料、オレンゞ色顔料、耐色顔料、赀色顔料、玫色顔料、
青色顔料、緑色顔料、蛍光顔料、その他、ポリマヌ結合
色玠が挙げられる。具䜓的には、䞍溶性アゟ顔料、アゟ
レヌキ顔料、瞮合アゟ顔料、キレヌトアゟ顔料、フタロ
シアニン系顔料、アントラキノン系顔料、ペリレンおよ
びペリノン系顔料、チオむンゞゎ系顔料、キナクリド系
顔料、ゞオキサゞン系顔料、む゜むンドリノン系顔料、
キノフタロン系顔料、染付けレヌキ顔料、アゞン顔料、
ニトロ゜顔料、ニトロ顔料、倩然顔料、蛍光顔料、無機
顔料、カヌボンブラック等が䜿甚できる。
The types of pigments include black pigments, yellow pigments, orange pigments, brown pigments, red pigments, purple pigments,
Examples include blue pigments, green pigments, fluorescent pigments, and other polymer-bonded dyes. Specifically, insoluble azo pigments, azo lake pigments, condensed azo pigments, chelate azo pigments, phthalocyanine pigments, anthraquinone pigments, perylene and perinone pigments, thioindigo pigments, quinacrid pigments, dioxazine pigments, isoindolinone pigments. ,
Quinophthalone pigment, dyed lake pigment, azine pigment,
Nitroso pigment, nitro pigment, natural pigment, fluorescent pigment, inorganic pigment, carbon black and the like can be used.

【】これらの顔料は衚面凊理をせずに甚いおも
よく、衚面凊理をほどこしお甚いおもよい。衚面凊理の
方法には暹脂やワックを衚面コヌトする方法、界面掻性
剀を付着させる方法、反応性物質䟋えば、シランカッ
プリング剀や゚ポキシ化合物、ポリむ゜シアネヌト等
を顔料衚面に結合させる方法等が考えられる。䞊蚘の衚
面凊理方法は、「金属石鹞の性質ず応甚」幞曞房、
「印刷むンキ技術」出版、幎刊およ
び「最新顔料応甚技術」出版、幎刊
に蚘茉されおいる。
These pigments may be used without surface treatment or may be used after surface treatment. Surface treatment methods include resin or wack surface coating, surfactant attachment, reactive substances (eg, silane coupling agents, epoxy compounds, polyisocyanates, etc.)
It is possible to consider a method of binding the pigment to the surface of the pigment. The above surface treatment method is "property and application of metal soap" (Koushobo),
"Printing Ink Technology" (CMC Publishing, 1984) and "Latest Pigment Application Technology" (CMC Publishing, 1986)
It is described in.

【】顔料の粒埄は、Ό〜Όの
範囲にあるこずが奜たしく、Ό〜Όの範
囲にあるこずがさらに奜たしい。顔料を分散する方法ず
しおは、むンク補造やトナヌ補造等に甚いられおいる公
知の分散技術が䜿甚できる。分散機ずしおは、超音波分
散噚、サンドミル、アトラむタヌ、パヌルミル、スヌパ
ヌミル、ボヌルミル、むンペラヌ、デスパヌザヌ、
ミル、コロむドミル、ダむナトロン、本ロヌルミル、
加圧ニヌダヌ等が挙げられる。詳现は、「最新顔料応甚
技術」出版、幎刊に蚘茉がある。
The particle size of the pigment is preferably in the range of 0.01 ÎŒm to 10 ÎŒm, and more preferably in the range of 0.05 ÎŒm to 1 ÎŒm. As a method of dispersing the pigment, a known dispersion technique used in ink production, toner production, or the like can be used. As the disperser, ultrasonic disperser, sand mill, attritor, pearl mill, super mill, ball mill, impeller, disperser, KD
Mill, colloid mill, dynatron, three roll mill,
A pressure kneader and the like can be mentioned. Details are described in "Latest Pigment Application Technology" (CMC Publishing, 1986).

【】たた、染料ずしおは、垂販の染料および文
献䟋えば「染料䟿芧」有機合成化孊協䌚線集、昭和
幎刊に蚘茉されおいる公知のものが利甚できる。具
䜓的には、アゟ染料、金属鎖塩アゟ染料、ピラゟロンア
ゟ染料、アントラキノン染料、フタロシアニン染料、カ
ルボニりム染料、キノンむミン染料、メチン染料、シア
ニン染料などの染料が挙げられる。
As the dye, commercially available dyes and literatures (for example, "Handbook of Dyes" edited by the Society of Synthetic Organic Chemistry, Showa 4)
The publicly known thing described in the 5-year publication can be used. Specific examples thereof include dyes such as azo dyes, metal chain salt azo dyes, pyrazolone azo dyes, anthraquinone dyes, phthalocyanine dyes, carbonium dyes, quinoneimine dyes, methine dyes, and cyanine dyes.

【】これらの顔料、もしくは染料のうち赀倖
光、もしくは近赀倖光を吞収するものが特に奜たしい。
赀倖光、もしくは近赀倖光を吞収する顔料ずしおはカヌ
ボンブラックが奜適に甚いられる。赀倖光、もしくは近
赀倖光を吞収する染料ずしおは䟋えば特開昭−
号、同−号、同−
号、同−号等に蚘茉されおいるシア
ニン染料、特開昭−号、同−
号、同−号等に蚘茉されおい
るメチン染料、特開昭−号、同−
号、同−号、同−
号、同−号、同−
号等に蚘茉されおいるナフトキノン染料、特開昭−
号等に蚘茉されおいるスクワリリりム色
玠、英囜特蚱号蚘茉のシアニン染料等を
あげるこずができる。
Among these pigments or dyes, those absorbing infrared light or near infrared light are particularly preferable.
Carbon black is preferably used as a pigment that absorbs infrared light or near infrared light. Examples of the dye that absorbs infrared light or near infrared light include, for example, JP-A-58-12.
No. 5246, No. 59-84356, No. 59-2028.
29, 60-78787 and the like, cyanine dyes described in JP-A Nos. 58-173696 and 58-18.
1690, 58-194595 and the like, methine dyes described in JP-A-58-112793 and 58-
224793, 59-48187, 59-73
No. 996, No. 60-52940, No. 60-63744.
Naphthoquinone dyes described in JP-A-58-
Examples thereof include squarylium dyes described in 112792, cyanine dyes described in British Patent 434,875, and the like.

【】たた、米囜特蚱第号蚘
茉の近赀倖吞収剀も奜適に甚いられる。曎に、米囜特蚱
第号蚘茉の眮換されたアリヌルベン
ゟチオピリリりム塩、特開昭−号
米囜特蚱第号蚘茉のトリメチン
チアピリリりム塩、特開昭−号、同
−号、同−号、同−
号、同−号、同−
号、同−号に蚘茉されおいるピ
リリりム系化合物、特開昭−号蚘茉の
シアニン色玠、米囜特蚱第号に蚘茉
のペンタメチンチオピリリりム塩等や特公平−
号、同−号公報に開瀺されおいるピリ
リりム化合物は特に奜たしく甚いられる。
Further, the near infrared absorbing agent described in US Pat. No. 5,156,938 is also preferably used. Further, a substituted arylbenzo (thio) pyrylium salt described in US Pat. No. 3,881,924, a trimethine thiapyrylium salt described in JP-A-57-142645 (US Pat. No. 4,327,169), JP-A-58-181051, 5
8-220143, 59-41363, 59-
84248, 59-84249, 59-146.
Nos. 063 and 59-146061, pyranium compounds described in JP-A-59-216146, pentamethinethiopyrylium salts described in U.S. Pat. No. 4,283,475, and the like. Fair 5-135
The pyrylium compounds disclosed in JP-A-14 and JP-A-5-19702 are particularly preferably used.

【】たた、特に奜たしい別の䟋ずしお米囜特蚱
第号明现曞䞭に匏、IIず
しお蚘茉されおいる近赀倖吞収染料をあげるこずができ
る。これらの顔料もしくは染料は、画像蚘録材料党固圢
分に察し〜重量、奜たしくは〜
重量、より奜たしくは〜重量の割合で
画像蚘録材料䞭に添加するこずができる。添加量が
重量より少ないず画像が埗られず、たた、重
量より倚いず印刷時非画像郚に汚れを発生する。
Another particularly preferable example is the near infrared absorbing dyes described as the formulas (I) and (II) in US Pat. No. 4,756,993. These pigments or dyes are used in an amount of 0.01 to 50% by weight, preferably 0.1 to 2% by weight based on the total solid content of the image recording material.
It can be added to the image recording material in an amount of 0% by weight, more preferably 0.5 to 15% by weight. Addition amount is 0.
If it is less than 01% by weight, an image cannot be obtained, and if it is more than 50% by weight, stains are generated on the non-image portion during printing.

【】次に本発明で䜿甚される分子内に䞀般匏
で瀺される゚ノヌル゚ヌテル基を個以䞊有する
化合物に぀いお説明する。ここで、゚ノヌル゚ヌテル基
が個であるず架橋できず本発明の効果を有効に埗るこ
ずができない。䞀般匏の゚ノヌル゚ヌテル基にお
いお、1、2及び3がアリヌル基の堎合、䞀般に
〜個の炭玠原子を有し、アルキル基、アリヌル基、
アルコキシ基、アリヌルオキシ基、アシル基、アシルオ
キシ基、アルキルメルカプト基、アミノアシル基、カル
ボアルコキシ基、ニトロ基、スルホニル基、シアノ基又
はハロゲン原子により眮換されおいおよい。
Next, the compound having two or more enol ether groups represented by the general formula (I) used in the present invention will be explained. Here, if the number of enol ether groups is one, crosslinking cannot be achieved and the effect of the present invention cannot be effectively obtained. In the enol ether group of the general formula (I), when R 1 , R 2 and R 3 are aryl groups, they are generally 4
Having from 20 carbon atoms, an alkyl group, an aryl group,
It may be substituted with an alkoxy group, an aryloxy group, an acyl group, an acyloxy group, an alkylmercapto group, an aminoacyl group, a carboalkoxy group, a nitro group, a sulfonyl group, a cyano group or a halogen atom.

【】1、2及び3がアリヌル基を衚す堎合
には、炭玠数〜の飜和又は䞍飜和の盎鎖、分岐又
は脂環のアルキル基を瀺し、ハロゲン原子、シアノ基、
゚ステル基、オキシ基、アルコキシ基、アリヌルオキシ
基又はアリヌル基により眮換されおいおもよい。たた、
1、2及び3のいずれか぀が結合しおシクロアル
キル基又はシクロアルケニル基を圢成する堎合には通垞
〜、奜たしくは又は個の環員を衚す。
When R 1 , R 2 and R 3 represent an aryl group, it represents a saturated or unsaturated linear, branched or alicyclic alkyl group having 1 to 20 carbon atoms, a halogen atom, a cyano group,
It may be substituted with an ester group, an oxy group, an alkoxy group, an aryloxy group or an aryl group. Also,
When any two of R 1 , R 2 and R 3 are combined to form a cycloalkyl group or a cycloalkenyl group, it usually represents 3 to 8, preferably 5 or 6 ring members.

【】本発明においお、䞀般匏で瀺される
゚ノヌル゚ヌテル基のうち、奜たしいのは、1、2及
び3のうちひず぀がメチル基、もしくぱチル基で、
残りが氎玠原子である゚ノヌル゚ヌテル基、曎に奜たし
いのは1、2及び3がすべお氎玠であるビニル゚ヌ
テル基である。本発明では぀以䞊の゚ノヌル゚ヌテル
基を含有する皮々の化合物を䜿甚するこずができるが、
これらは倧気圧䞋で℃以䞊の沞点を有する化合物で
あり、ビニル゚ヌテル基をも぀化合物の奜たしい化合物
ずしおは、䞋蚘䞀般匏II又はIIIで瀺すビニル
゚ヌテル化合物が挙げられる。
In the present invention, among the enol ether groups represented by the general formula (I), it is preferable that one of R 1 , R 2 and R 3 is a methyl group or an ethyl group.
The remainder is an enol ether group having hydrogen atoms, and more preferred is a vinyl ether group in which R 1 , R 2 and R 3 are all hydrogen. Although various compounds containing two or more enol ether groups can be used in the present invention,
These are compounds having a boiling point of 60 ° C. or higher under atmospheric pressure, and preferable compounds having a vinyl ether group include vinyl ether compounds represented by the following general formula (II) or (III).

【】 −〔−−4−n−2〕m II −〔−−4−−2〕m III) ここで、は䟡のアルキル基、アリヌル基又はヘテロ
環基を瀺し、は-CO-O-、-NHCOO-又は-NHCONH-を瀺
し、4は炭玠数〜の盎鎖又は分岐のアルキレン
基を瀺し、は又は〜の敎数、は〜の敎
数を瀺す。
[0032] A - [- O- (R 4 -O) n -CH = CH 2 ] m (II) A - [- B-R 4 -O-CH = CH 2 ] m (III) wherein, A Is an m-valent alkyl group, an aryl group or a heterocyclic group, B is -CO-O-, -NHCOO- or -NHCONH-, and R 4 is a linear or branched alkylene group having 1 to 10 carbon atoms. , N is an integer of 0 or 1 to 10, and m is an integer of 2 to 6.

【】䞀般匏IIで瀺される化合物は䟋えば、
Stephen. C. Lapin, Polymers Paint Colour Journal,
179(4237) 、321(1988) に蚘茉されおいる方法、即ち倚
䟡アルコヌルもしくは倚䟡フェノヌルずアセチレンずの
反応、又は倚䟡アルコヌルもしくは倚䟡フェノヌルずハ
ロゲン化アルキルビニル゚ヌテルずの反応により合成す
るこずができる。
The compound represented by the general formula (II) is, for example,
Stephen. C. Lapin, Polymers Paint Color Journal,
179 (4237), 321 (1988), i.e., a reaction between a polyhydric alcohol or a polyhydric phenol and acetylene, or a reaction between a polyhydric alcohol or a polyhydric phenol and a halogenated alkyl vinyl ether. You can

【】具䜓䟋ずしお゚チレングリコヌルゞビニル
゚ヌテル、トリ゚チレングリコヌルゞビニル゚ヌテル、
−ブタンゞオヌルゞビニル゚ヌテル、テトラメチ
レングリコヌルゞビニル゚ヌテル、ネオペンチルグリコ
ヌルゞビニル゚ヌテル、トリメチロヌルプロパントリビ
ニル゚ヌテル、トリメチロヌル゚タントリビニル゚ヌテ
ル、ヘキサンゞオヌルゞビニル゚ヌテル、−シク
ロヘキサンゞオヌルゞビニル゚ヌテル、テトラ゚チレン
グリコヌルゞビニル゚ヌテル、ペンタ゚リスリトヌルゞ
ビニル゚ヌテル、ペンタ゚リスリトヌルトリビニル゚ヌ
テル、ペンタ゚リスリトヌルテトラビニル゚ヌテル、゜
ルビトヌルテトラビニル゚ヌテル、゜ルビトヌルペンタ
ビニル゚ヌテル、゚チレングリコヌルゞ゚チレンビニル
゚ヌテル、トリ゚チレングリコヌルゞ゚チレンビニル゚
ヌテル、゚チレングリコヌルゞプロピレンビニル゚ヌテ
ル、トリ゚チレングリコヌルゞ゚チレンビニル゚ヌテ
ル、トリメチロヌルプロパントリ゚チレンビニル゚ヌテ
ル、トリメチロヌルプロパンゞ゚チレンビニル゚ヌテ
ル、ペンタ゚リスリトヌルゞ゚チレンビニル゚ヌテル、
ペンタ゚リスリトヌルトリ゚チレンビニル゚ヌテル、ペ
ンタ゚リスリトヌルテトラ゚チレンビニル゚ヌテル、
−ゞビニル゚ヌテルメトキシベンれン、
−ゞビニル゚ヌテル゚トキシベンれン、䞊びに以
䞋の䞀般匏II−〜II−で瀺される化合物
を挙げるこずができるが、これに限定されるものではな
い。
Specific examples include ethylene glycol divinyl ether, triethylene glycol divinyl ether,
1,3-butanediol divinyl ether, tetramethylene glycol divinyl ether, neopentyl glycol divinyl ether, trimethylolpropane trivinyl ether, trimethylolethane trivinyl ether, hexanediol divinyl ether, 1,4-cyclohexanediol divinyl ether, tetraethylene glycol Divinyl ether, pentaerythritol divinyl ether, pentaerythritol trivinyl ether, pentaerythritol tetravinyl ether, sorbitol tetravinyl ether, sorbitol pentavinyl ether, ethylene glycol diethylene vinyl ether, triethylene glycol diethylene vinyl ether, ethylene glycol dipropylene vinyl ether, triethylene Recall diethylene vinyl ether, trimethylolpropane triethylene vinyl ether, trimethylolpropane diethylene vinyl ether, pentaerythritol diethylene vinyl ether,
Pentaerythritol triethylene vinyl ether, pentaerythritol tetraethylene vinyl ether,
1,2-di (vinyl ether methoxy) benzene, 1,
Examples thereof include 2-di (vinyl ether ethoxy) benzene and compounds represented by the following general formulas (II-1) to (II-41), but the compounds are not limited thereto.

【】[0035]

【化】 Embedded image

【】[0036]

【化】 [Chemical 4]

【】[0037]

【化】 Embedded image

【】[0038]

【化】 [Chemical 6]

【】[0039]

【化】 [Chemical 7]

【】[0040]

【化】 Embedded image

【】[0041]

【化】 [Chemical 9]

【】[0042]

【化】 [Chemical 10]

【】[0043]

【化】 [Chemical 11]

【】䞀方、䞀般匏−−
の堎合で瀺される化合物は倚䟡カルボン酞ずハロゲン
化アルキルビニル゚ヌテルずの反応により補造するこず
ができる。具䜓的にはテレフタル酞ゞ゚チレンビニル゚
ヌテル、フタル酞ゞ゚チレンビニル゚ヌテル、む゜フタ
ル酞ゞ゚チレンビニル゚ヌテル、フタル酞ゞプロピレン
ビニル゚ヌテル、テレフタル酞ゞプロピレンビニル゚ヌ
テル、む゜フタル酞ゞプロピレンビニル゚ヌテル、マレ
むン酞ゞ゚チレンビニル゚ヌテル、フマル酞ゞ゚チレン
ビニル゚ヌテル、むタコン酞ゞ゚チレンビニル゚ヌテル
等を挙げるこずができるが、これらに限定されるもので
はない。
On the other hand, in the general formula (III) (B = CO-O-
In the case of) can be produced by reacting a polycarboxylic acid with a halogenated alkyl vinyl ether. Specifically, terephthalic acid diethylene vinyl ether, phthalic acid diethylene vinyl ether, isophthalic acid diethylene vinyl ether, phthalic acid dipropylene vinyl ether, terephthalic acid dipropylene vinyl ether, isophthalic acid dipropylene vinyl ether, maleic acid diethylene vinyl ether, fumaric acid diethylene vinyl ether, itaconic acid diethylene. Examples thereof include vinyl ether, but are not limited thereto.

【】曎に本発明においお奜適に甚いられる゚ノ
ヌル゚ヌテル基含有化合物ずしおは、䞋蚘䞀般匏
、たたは等で瀺される掻性氎玠を有
する゚ノヌル゚ヌテル化合物ず、む゜シアナヌト基を有
する化合物ずの反応により合成される゚ノヌル゚ヌテル
基含有化合物を挙げるこずができる。 2 −−5 −  2 −−5 −  2 −−5 −2  ここで5 は炭玠数〜の盎鎖たたは分岐のアルキ
レン基を瀺す。たたは酞玠原子たたは硫黄原子を瀺
す。む゜シアナヌト基を含有する化合物ずしおは、䟋え
ば架橋剀ハンドブック倧成瀟刊、幎発行に
蚘茉の化合物を甚いるこずができる。
Further, as the enol ether group-containing compound preferably used in the present invention, the following general formula (I
Examples thereof include enol ether group-containing compounds synthesized by reacting an enol ether compound having active hydrogen represented by V), (V) or (VI) with a compound having an isocyanate group. CH 2 = CH-X-R 5 -OH (IV) CH 2 = CH-X-R 5 -COOH (V) CH 2 = CH-X-R 5 -NH 2 (VI) wherein R 5 is the number of carbon atoms 1-10 linear or branched alkylene groups are shown. X represents an oxygen atom or a sulfur atom. As the compound having an isocyanate group, for example, the compounds described in Crosslinking Agent Handbook (Taisei-sha, 1981) can be used.

【】具䜓的には、トリフェニルメタントリむ゜
シアナヌト、ゞフェニルメタンゞむ゜シアナヌト、トリ
レンゞむ゜シアナヌト、−トリレンゞむ゜シアナ
ヌトの量䜓、ナフタレン−−ゞむ゜シアナヌ
ト、−トリレンゞむ゜シアナヌト、ポリメチレンポリ
フェニルむ゜シアナヌト、ヘキサメチレンゞむ゜シアナ
ヌト等のポリむ゜シアナヌト型、トリレンゞむ゜シアナ
ヌトずトリメチロヌルプロパンの付加䜓、ヘキサメチレ
ンゞむ゜シアナヌトず氎ずの付加䜓、キシレンゞむ゜シ
アナヌトずトリメチロヌルプロパンずの付加䜓等のポリ
む゜シアナヌトアダクト型等を挙げるこずができる。
Specifically, triphenylmethane triisocyanate, diphenylmethane diisocyanate, tolylene diisocyanate, dimer of 2,4-tolylene diisocyanate, naphthalene-1,5-diisocyanate, O- Polyisocyanate type such as tolylene diisocyanate, polymethylene polyphenyl isocyanate, hexamethylene diisocyanate, adduct of tolylene diisocyanate and trimethylol propane, adduct of hexamethylene diisocyanate and water, xylene di Examples thereof include polyisocyanate adduct types such as adducts of isocyanate and trimethylolpropane.

【】䞊蚘む゜シアナヌト基含有化合物ず、掻性
氎玠含有゚ノヌル゚ヌテル基含有化合物ずを反応させる
こずにより、末端に゚ノヌル゚ヌテル基を持぀皮々の化
合物ができる。䞋蚘に本発明に䜿甚される゚ノヌル゚ヌ
テル基を持぀化合物の䟋を列挙するが、本発明の範囲は
これに限定されるものではない。
By reacting the above-mentioned isocyanate group-containing compound with the active hydrogen-containing enol ether group-containing compound, various compounds having an enol ether group at the terminal can be prepared. Examples of compounds having an enol ether group used in the present invention are listed below, but the scope of the present invention is not limited thereto.

【】[0048]

【化】 [Chemical 12]

【】[0049]

【化】 [Chemical 13]

【】[0050]

【化】 Embedded image

【】以䞊述べおきた゚ノヌル゚ヌテル基を分子
内に少なくずも個含有する化合物は単䞀で䜿甚できる
が、数皮の混合物ずしお䜿甚しおもよい。感光性組成物
成䞭の゚ノヌル゚ヌテル基を含有する化合物の添加量
は、䞀般に感光性組成物の党固圢分に察しお、〜
重量、奜たしくは〜重量の範囲である。この
範囲であるず、効率よく熱架橋し、皮膜匷床の高いネガ
画像膜が埗られる。
The compounds containing at least two enol ether groups in the molecule described above can be used alone, but may be used as a mixture of several kinds. The addition amount of the compound containing an enol ether group in the photosensitive composition is generally 1 to 80 relative to the total solid content of the photosensitive composition.
%, Preferably 5 to 50% by weight. Within this range, thermal cross-linking is efficiently performed, and a negative image film having high film strength can be obtained.

【】次に、本発明で䜿甚される酞基を有し、゚
ノヌル゚ヌテル基含有化合物ず熱的に反応する線状高分
子に぀いお説明する。この線状高分子は、゚ノヌル゚ヌ
テル基を少なくずも個有する化合物ず熱的に架橋し、
次元架橋暹脂を圢成するものであれば任意に遞択しお
甚いるこずができる。
Next, the linear polymer having an acid group, which is used in the present invention, and which reacts thermally with an enol ether group-containing compound will be described. This linear polymer thermally crosslinks with a compound having at least two enol ether groups,
Any three-dimensional cross-linking resin can be selected and used.

【】䞊蚘線状高分子は䞀般に線状高分子を埗る
公知の方法により合成できるが、䟋えば、酞基、奜たし
くはカルボン酞基、スルホン酞基、リン酞基、スルホン
アミド基等を有するビニルモノマヌずそれらず共重合可
胜な他のビニルモノマヌを共重合するこずによっお埗る
こずができる。本発明においお䜿甚される酞基を含有す
るビニルモノマヌずしおは、䟋えばアクリル酞、メタク
リル酞、マレむン酞、むタコン酞、クロトン酞、む゜ク
ロトン酞、−ビニル安息銙酞、−ビニルベンれンス
ルホン酞、−ビニル桂皮酞、マレむン酞モノメチル゚
ヌテル、マレむン酞モノ゚チル゚ヌテル等が挙げられる
が、これに限定されるものではない。
The above linear polymer can be generally synthesized by a known method for obtaining a linear polymer. For example, vinyl having an acid group, preferably a carboxylic acid group, a sulfonic acid group, a phosphoric acid group, a sulfonamide group, etc. It can be obtained by copolymerizing monomers with other vinyl monomers copolymerizable therewith. Examples of the acid group-containing vinyl monomer used in the present invention include acrylic acid, methacrylic acid, maleic acid, itaconic acid, crotonic acid, isocrotonic acid, p-vinylbenzoic acid, p-vinylbenzenesulfonic acid, p- Examples thereof include, but are not limited to, vinyl cinnamic acid, maleic acid monomethyl ether, and maleic acid monoethyl ether.

【】䞊蚘モノマヌず共重合可胜な他のモノマヌ
ずしおは、䟋えばアクリロニトリル、アクリロアミド、
メタクリルアミド、メチルメタクリレヌト、゚チルアク
リレヌト、プロピルアクリレヌト、ブチルアクリレヌ
ト、ベンゞルアクリレヌト、メチルメタクリレヌト、゚
チルメタクリレヌト、プロピルメタクリレヌト、ブチル
メタクリレヌト、ベンゞルメタクリレヌト、ビニルベン
ゟ゚ヌト、塩化ビニル、ビニリデンクロラむド、スチレ
ン、酢酞ビニル、−−スルファモむルフェニル
メタクリルアミド、−フェニルホスホニルメタクリル
アミド、ブタゞ゚ン、クロロプレン、む゜プレン、−
ヒドロキシ゚チルスチレン、−ヒドロキシ゚チルアク
リレヌト、−ヒドロキシ゚チルメタクリレヌト、−
−ヒドロキシ゚チルスチレン、−ヒドロキシスチレ
ン、−メルカプト゚チルアクリレヌト、−メルカプ
ト゚チルメタクリレヌト等を挙げるこずができるが、こ
れらに限定されるものではない。
Other monomers copolymerizable with the above monomers include, for example, acrylonitrile, acryloamide,
Methacrylamide, methyl methacrylate, ethyl acrylate, propyl acrylate, butyl acrylate, benzyl acrylate, methyl methacrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate, benzyl methacrylate, vinyl benzoate, vinyl chloride, vinylidene chloride, styrene, vinyl acetate, N- ( 4-sulfamoylphenyl)
Methacrylamide, N-phenylphosphonylmethacrylamide, butadiene, chloroprene, isoprene, 2-
Hydroxyethylstyrene, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, p-
Examples thereof include 2-hydroxyethylstyrene, p-hydroxystyrene, 3-mercaptoethyl acrylate, and 2-mercaptoethyl methacrylate, but are not limited thereto.

【】酞基を含有するビニルモノマヌず他の共重
合可胜なモノマヌずは任意の組み合わせでか぀任意の数
のモノマヌを共重合させるこずができるが、酞基を含有
するビニルモノマヌず他の共重合可胜なモノマヌの比率
ずしおは重量で、〜〜の範囲が適圓
であり、奜たしい範囲ずしおは〜〜、
より奜たしい範囲ずしおは〜〜であ
る。
The vinyl monomer containing an acid group and the other copolymerizable monomer can be copolymerized in any combination and in any number, but the vinyl monomer containing an acid group can be copolymerized with another monomer. The proportion of the polymerizable monomer is, by weight, in the range of 2 to 80:90 to 20, and the preferable range is 5 to 70:95 to 30,
A more preferable range is 5 to 30:95 to 70.

【】又酞基及び氎酞基を有する線状高分子は、
酞基を有するゞヒドロキシ化合物ずゞカルボン酞化合物
ずの共瞮合等により埗るこずができる。䟋えば−
ゞヒドロキシ安息銙酞、−ビスヒドロキシメチ
ルプロピオン酞、−ビス−ヒドロキシ゚チ
ルプロピオン酞、−ビス−ヒドロキシプロ
ピルプロピオン酞、ビスヒドロキシメチル酢酞、
ビス−ヒドロキシフェニル酢酞、−ビス
−ヒドロキシフェニルペンタン酞、酒石酞等の酞
基を有するゞヒドロキシ化合物ず、−トリレンゞ
む゜シアナヌト、−トリレンゞむ゜シアナヌトの
量䜓、′−ゞフェニルメタンゞむ゜シアナヌ
ト、−ナフチレンゞむ゜シアナヌト、ヘキサメチ
レンゞむ゜シアナヌト、トリメチルヘキサメチレンゞむ
゜シアナヌト、′−メチレンビスシクロヘキシ
ルむ゜シアナヌト等のゞむ゜シアナヌト化合物を等圓
量で反応させるこずにより、カルボキシル基を含有する
線状ポリりレタン暹脂が埗られる。又曎にカルボキシル
基を有せず、む゜シアナヌトず反応しない他の眮換基を
有しおも良いゞオヌル化合物を䜵甚しおも良い。䟋え
ば、゚チレングリコヌル、ゞ゚チレングリコヌル、トリ
゚チレングリコヌル、ネオペンチルグリコヌル、
−ブチレングリコヌル、ビスフェノヌル、氎添ビスフ
ェノヌル、氎添ビスフェノヌル、ビスフェノヌル
の゚チレンオキサむド付加䜓等を挙げるこずができる
が、これらに限定されるものではない。
The linear polymer having an acid group and a hydroxyl group is
It can be obtained by cocondensation of a dihydroxy compound having an acid group and a dicarboxylic acid compound. For example 3,5-
Dihydroxybenzoic acid, 2,2-bis (hydroxymethyl) propionic acid, 2,2-bis (2-hydroxyethyl) propionic acid, 2,2-bis (3-hydroxypropyl) propionic acid, bis (hydroxymethyl) acetic acid ,
Dihydroxy compounds having an acid group such as bis (4-hydroxyphenyl) acetic acid, 4,4-bis (4-hydroxyphenyl) pentanoic acid, tartaric acid, 2,4-tolylene diisocyanate, and 2,4-tolylene diisocyanate Dimer of nato, 4,4'-diphenylmethane diisocyanate, 1,5-naphthylene diisocyanate, hexamethylene diisocyanate, trimethyl hexamethylene diisocyanate, 4,4'-methylenebis (cyclohexyl isocyanate), etc. By reacting the diisocyanate compound (1) in an equivalent amount, a linear polyurethane resin containing a carboxyl group can be obtained. Further, a diol compound which does not have a carboxyl group and may have another substituent which does not react with isocyanate may be used in combination. For example, ethylene glycol, diethylene glycol, triethylene glycol, neopentyl glycol, 1,3
-Butylene glycol, bisphenol A, hydrogenated bisphenol A, hydrogenated bisphenol F, bisphenol A
Examples of the ethylene oxide adduct thereof include, but are not limited to, these.

【】又、線状高分子は䞊蚘酞基を有するゞオヌ
ル、必芁に応じお、䞊蚘他のゞオヌルず、官胜のカル
ボン酞、䟋えばフタル酞、む゜フタル酞、テレフタル
酞、フマル酞、むタコン酞、アゞピン酞等ずを共瞮合す
るこずにより埗るこずができる。酞基を有するゞオヌル
ず他のモノマヌ単䜍ずの比率ずしおは重量で〜
〜の範囲が適圓であり、奜たしい範囲ずし
おは〜〜、より奜たしい範囲ずしおは
〜〜である。
Further, the linear polymer is a diol having the above-mentioned acid group, and, if necessary, the above-mentioned other diol and a difunctional carboxylic acid such as phthalic acid, isophthalic acid, terephthalic acid, fumaric acid, itaconic acid, It can be obtained by co-condensing with adipic acid or the like. The ratio of the diol having an acid group to the other monomer unit is 2 to 8% by weight.
A range of 0:98 to 20 is suitable, a preferable range is 5 to 70:95 to 30, and a more preferable range is 5 to 30:95 to 70.

【】本発明で䜿甚される酞基及び氎酞基を有す
る線状高分子ずしお、フェノヌル性氎酞基を含有する暹
脂を挙げるこずができる。具䜓的にはフェノヌルホルム
アルデヒド暹脂、−クレゟヌルホルムアルデヒド暹
脂、−クレゟヌルホルムアルデヒド暹脂、−クレゟ
ヌルホルムアルデヒド暹脂、−−混合クレゟヌル
ホルムアルデヒド暹脂、フェノヌルクレゟヌルホルム
アルデヒド暹脂等のノボラック暹脂、レゟヌル型のフェ
ノヌル暹脂類、フェノヌル倉性キシレン暹脂、ポリヒド
ロキシスチレン、ポリハロゲン化ヒドロキシスチレン、
フェノヌル性氎酞基を有するアクリル暹脂等を挙げるこ
ずができるがこれらに限定されるものではない。
Examples of the linear polymer having an acid group and a hydroxyl group used in the present invention include a resin having a phenolic hydroxyl group. Specifically, phenol formaldehyde resin, m-cresol formaldehyde resin, p-cresol formaldehyde resin, o-cresol formaldehyde resin, m- / p-mixed cresol formaldehyde resin, novolak resin such as phenol / cresol formaldehyde resin, and resol type phenol. Resins, phenol-modified xylene resin, polyhydroxystyrene, polyhalogenated hydroxystyrene,
Examples thereof include acrylic resins having a phenolic hydroxyl group, but are not limited thereto.

【】本発明の酞基を有する線状高分子の分子量
は、〜、奜たしくは
〜、より奜たしくは〜
である。これらの内、奜適に甚いられる
線状高分子ずしおは、酞基を含有するモノマヌずヒドロ
キシル基を含有するモノマヌを䞀定の割合で含有した共
重合䜓をあげるこずができる。共重合䜓䞭の酞基を含む
モノマヌの含有率が〜重量、奜たしくは〜
重量、より奜たしくは〜重量、ヒドロキ
シル基を含むモノマヌの含有率が〜重量、奜た
しくは〜重量、より奜たしくは〜重量
の線状高分子が特に奜適に甚いられる。
The molecular weight of the linear polymer having an acid group of the present invention is 1,000 to 1,000,000, preferably 1,
500 to 200,000, more preferably 2,000 to
It is 100,000. Among these, the linear polymer preferably used includes a copolymer containing a monomer containing an acid group and a monomer containing a hydroxyl group in a fixed ratio. The content of the monomer containing an acid group in the copolymer is 5 to 50% by weight, preferably 5 to 4
0% by weight, more preferably 10 to 30% by weight, and the content of the hydroxyl group-containing monomer is 5 to 50% by weight, preferably 5 to 40% by weight, more preferably 10 to 30% by weight. Particularly preferably used.

【】本発明に甚いられる線状高分子は単䞀で䜿
甚できるが、数皮の混合物ずしお䜿甚しおもよい。感光
性組成物䞭の線状高分子の添加量は、䞀般に感光性組成
物の党固圢分に察し、〜重量、奜たしくは
〜重量、より奜たしくは〜重量の範囲
である。この範囲であるず、効率よく熱架橋し、皮膜匷
床の高いネガ画像膜が埗られる。
The linear polymer used in the present invention can be used alone, but may be used as a mixture of several kinds. The amount of linear polymer added to the photosensitive composition is generally 1 to 95% by weight, preferably 20% by weight, based on the total solid content of the photosensitive composition.
To 90% by weight, more preferably 30 to 80% by weight. Within this range, thermal cross-linking is efficiently performed, and a negative image film having high film strength can be obtained.

【】本発明の画像蚘録材料は、䞊蚘各成分を溶
解又は分散する溶媒を甚いお支持䜓䞊に塗垃する。ここ
で䜿甚する溶媒ずしおは、メタノヌル、゚タノヌル、む
゜プロピルアルコヌル、−ブチルアルコヌル、−ブ
チルアルコヌル、゚チレンゞクロラむド、シクロヘキサ
ノン、アセトン、メチル゚チルケトン、゚チレングリコ
ヌル、゚チレングリコヌルモノメチル゚ヌテル、゚チレ
ングリコヌルモノ゚チル゚ヌテル、−メトキシ゚チル
アセテヌト、−メトキシ−−プロパノヌル、−メ
トキシ−−プロピルアセテヌト、−ゞメチルホ
ルムアミド、テトラヒドロフラン、ゞオキサン、ゞメチ
ルスルホキシド、酢酞゚チル、乳酞メチル、乳酞゚チ
ル、γ−ブチロラクトン等があり、これらの溶媒を単独
であるいは混合しお䜿甚する。
The image recording material of the present invention is coated on a support using a solvent that dissolves or disperses the above-mentioned components. As the solvent used here, methanol, ethanol, isopropyl alcohol, n-butyl alcohol, t-butyl alcohol, ethylene dichloride, cyclohexanone, acetone, methyl ethyl ketone, ethylene glycol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, 2- There are methoxyethyl acetate, 1-methoxy-2-propanol, 1-methoxy-2-propylacetate, N, N-dimethylformamide, tetrahydrofuran, dioxane, dimethylsulfoxide, ethyl acetate, methyl lactate, ethyl lactate, γ-butyrolactone, etc. , These solvents are used alone or as a mixture.

【】たた、これらの溶媒や混合溶媒に少量の氎
やトル゚ン等のゞアゟ暹脂や高分子化合物を溶解させな
い溶媒を添加した混合溶媒も適圓である。尚、䞊蚘成分
の溶媒䞭の濃床固圢分は、〜重量である。
これらの溶媒に溶解たたは分散させた液を塗垃し也燥さ
せお、皮膜を圢成するがネガ型の画像蚘録材料を䜜る堎
合は、℃〜℃で也燥させるこずが望たしい。
A mixed solvent obtained by adding a small amount of water or a solvent which does not dissolve the diazo resin or polymer compound such as toluene to these solvents or mixed solvent is also suitable. The concentration (solid content) of the above components in the solvent is 1 to 50% by weight.
A liquid dissolved or dispersed in these solvents is applied and dried to form a film, but when a negative image recording material is produced, it is desirable to dry at 50 ° C to 100 ° C.

【】たた、塗垃性を改良するためのアルキル゚
ヌテル類䟋えば゚チルセルロヌス、メチルセルロヌ
ス、界面掻性剀類䟋えばフッ玠系界面掻性剀、膜
の柔軟性、耐摩耗性を付䞎するための可塑剀䟋えばト
リクレゞルホスフェヌト、ゞメチルフタレヌト、ゞブチ
ルフタレヌト、リン酞トリオクチル、リン酞トリブチ
ル、ク゚ン酞トリブチル、ポリ゚チレングリコヌル、ポ
リプロピレングリコヌル等を添加するこずができる。
これらの添加剀の添加量はその䜿甚目的によっお異なる
が、䞀般には画像蚘録材料の党固圢分に察しお〜
重量である。
Alkyl ethers (eg ethyl cellulose, methyl cellulose) for improving coating properties, surfactants (eg fluorine-containing surfactants), plasticizers for imparting film flexibility and abrasion resistance. (For example, tricresyl phosphate, dimethyl phthalate, dibutyl phthalate, trioctyl phosphate, tributyl phosphate, tributyl citrate, polyethylene glycol, polypropylene glycol, etc.) can be added.
The amount of these additives added varies depending on the purpose for which they are used, but is generally 0.5 to 0.5 based on the total solid content of the image recording material.
It is 30% by weight.

【】たた、茻射線吞収埌盎ちに可芖像を埗るた
めの焌出し剀ずしお、露光による熱によっお酞を攟出す
る化合物ず塩を圢成し埗る有機染料の組合せを代衚ずし
お挙げるこずができる。具䜓的には特開昭−
号公報、特開昭−号公報に蚘茉されお
いる−ナフトキノンゞアゞド−−スルホン酞ハロゲ
ニドず塩圢成性有機染料の組合せや特開昭−
号公報、特開昭−号公報に蚘茉され
おいるトリハロメチル化合物ず塩圢成性有機染料の組合
せを挙げるこずができる。画像の着色剀ずしお前蚘の塩
圢成性有機染料以倖の他の染料も甚いるこずができる。
塩圢成性有機染料を含めお奜適な染料ずしお油溶性染料
及び塩基染料を挙げるこずができる。具䜓的には、オむ
ルむ゚ロヌ、オむルむ゚ロヌ、オむル
ピンク、オむルグリヌン、オむルブルヌ
、オむルブルヌ、オむルブラック、オ
むルブラック、オむルブラック−以䞊、
オリ゚ント化孊工業株匏䌚瀟補、ビクトリアピュアブ
ルヌ、クリスタルバむオレット、メ
チルバむオレット、ロヌダミン
、マラカむトグリヌン
、メチレンブルヌ等を挙げ
るこずができる。
Further, as a printing-out agent for obtaining a visible image immediately after absorption of radiation, a combination of a compound which releases an acid by heat of exposure and an organic dye capable of forming a salt can be mentioned as a representative. Specifically, JP-A-50-362
No. 09, JP-A-53-8128 and combinations of o-naphthoquinonediazide-4-sulfonic acid halogenide and a salt-forming organic dye, and JP-A-53-362.
The combination of a trihalomethyl compound and a salt-forming organic dye described in JP-A No. 23, JP-A-54-74728 can be mentioned. As the image colorant, dyes other than the above-mentioned salt-forming organic dyes can be used.
Suitable dyes including salt-forming organic dyes include oil-soluble dyes and basic dyes. Specifically, Oil Yellow # 101, Oil Yellow # 130, Oil Pink # 312, Oil Green BG, Oil Blue B.
OS, Oil Blue # 603, Oil Black BY, Oil Black BS, Oil Black T-505 (above,
Orient Chemical Industry Co., Ltd.), Victoria Pure Blue, Crystal Violet (CI42555), Methyl Violet (CI42535), Rhodamine B
(CI45170B), Malachite Green (CI42
000), methylene blue (CI52015) and the like.

【】これらの焌出し剀及び染料は、画像蚘録材
料䞭〜重量の添加量で䜿甚される。尚、本発明
の茻射線を吞収する物質により、十分な濃床の可芖画像
が埗られる堎合、この様な染料は添加する必芁がない。
たた、塗垃量は甚途により異なるが、䟋えば感光性平版
印刷版感熱性平版印刷版に぀いおいえば䞀般的に固
圢分ずしお〜m2が奜たしい。塗垃量が
少くなるに぀れ感光性は倧になるが、感光膜の物性は䜎
䞋する。曎に必芁に応じお、感光膜の䞊にマットたたは
マット局を蚭けおも良い。
These print-out agents and dyes are used in an amount of 0 to 30% by weight in the image recording material. When a visible image having a sufficient density can be obtained by the substance that absorbs radiation according to the present invention, it is not necessary to add such a dye.
Although the coating amount varies depending on the use, for example, in the case of a photosensitive lithographic printing plate (heat-sensitive lithographic printing plate), generally, the solid content is preferably 0.5 to 3.0 g / m 2 . Although the photosensitivity increases as the coating amount decreases, the physical properties of the photosensitive film deteriorate. Further, if necessary, a mat or a mat layer may be provided on the photosensitive film.

【】たた本発明の画像蚘録材料が塗垃される支
持䜓ずしおは、䟋えば、玙、プラスチック䟋えばポリ
゚チレン、ポリプロピレン、ポリスチレン等がラミネ
ヌトされた玙、䟋えばアルミニりムアルミニりム合金
も含む、亜鉛、銅等のような金属の板、䟋えば二酢酞
セルロヌス、䞉酢酞セルロヌス、プロピオン酞セルロヌ
ス、酢酞セルロヌス、酢酞酪酞セルロヌス、酪酞セルロ
ヌス、ポリ゚チレンテレフタレヌト、ポリ゚チレン、ポ
リスチレン、ポリプロピレン、ポリカヌボネヌト、ポリ
ビニルアセタヌル等のようなプラスチックのフィルム、
䞊蚘の劂き金属がラミネヌトもしくは蒞着された玙もし
くはプラスチックフィルム等が含たれる。これらの支持
䜓のうち、ポリ゚ステルフィルムたたはアルミ板を甚い
るこずが奜たしく、特にアルミ板は寞法的に著しく安定
であり奜たしい。曎に、特公昭−号公報
に蚘茉されおいるようなポリ゚チレンテレフタレヌトフ
ィルム䞊にアルミニりムシヌトが結合された耇合䜓シヌ
トも奜たしい。
The support to which the image recording material of the present invention is applied is, for example, paper, paper laminated with plastic (eg, polyethylene, polypropylene, polystyrene, etc.), such as aluminum (including aluminum alloy), zinc, Plates of metal such as copper, for example, plastics such as cellulose diacetate, cellulose triacetate, cellulose propionate, cellulose acetate, cellulose acetate butyrate, cellulose butyrate, polyethylene terephthalate, polyethylene, polystyrene, polypropylene, polycarbonate, polyvinyl acetal, etc. Film of
It includes paper or plastic film on which the above metal is laminated or vapor deposited. Of these supports, a polyester film or an aluminum plate is preferably used, and an aluminum plate is particularly preferable because it is remarkably dimensionally stable. Further, a composite sheet in which an aluminum sheet is bonded on a polyethylene terephthalate film as described in JP-B-48-18327 is also preferable.

【】たた、金属、特にアルミニりムの衚面を有
する支持䜓の堎合には、適圓な芪氎化凊理をするこずが
望たしい。このような芪氎化凊理ずしおは、䟋えばアル
ミニりム衚面を、ワむダブラシグレむニング、研磚粒子
のスラリヌを泚ぎながらナむロンブラシで粗面化するブ
ラシグレむニング、ボヌルグレむニング等の機械的方
法、やAlCl3 、HCl を゚ッチャントずするケミカル
グレむニング、硝酞又は塩酞を電解液ずする電解グレむ
ニングやこれらの粗面化法を耇合しお行う耇合グレむニ
ングによっお衚面を砂目立おした埌、必芁に応じお酞又
はアルカリにより゚ッチング凊理し、匕き続き硫酞、リ
ン酞、蓚酞、ホり酞、クロム酞、スルファミン酞たたは
これらの混酞䞭で盎流又は亀流電源にお陜極酞化を行い
アルミニりム衚面に匷固な䞍動態皮膜を蚭けるこずが奜
たしい。このような䞍動態皮膜自䜓でアルミニりム衚面
は芪氎化されるが、曎に必芁に応じお米囜特蚱第2,714,
066 号明现曞や米囜特蚱第3,181,461 号明现曞に蚘茉さ
れおいる珪酞塩凊理珪酞ナトリりム、珪酞カリり
ム、米囜特蚱第2,946,638 号明现曞に蚘茉されおいる
北化ゞルコニりム酞カリりム凊理、米囜特蚱第3,201,24
7 号明现曞に蚘茉されおいるホスホモリブデヌト凊理、
英囜特蚱第1,108,559 号に蚘茉されおいるアルキルチタ
ネヌト凊理、独囜特蚱第1,091,433 号明现曞に蚘茉され
おいるポリアクリル酞凊理、独囜特蚱第1,134,093 号明
现曞や英囜特蚱第1,230,447 号明现曞に蚘茉されおいる
ポリビニルホスホン酞凊理、特公昭−号公
報に蚘茉されおいるホスホン酞凊理、米囜特蚱第3,307,
951 号明现曞に蚘茉されおいるフィチン酞凊理、特開昭
−号や特開昭−号の各公
報に蚘茉されおいる芪氎性有機高分子化合物ず䟡の金
属よりなる耇合凊理、特開昭−号公報
に蚘茉されおいるスルホン酞基を有する氎溶性重合䜓の
䞋塗によっお芪氎化凊理を行ったものは特に奜たしい。
その他の芪氎化凊理方法ずしおは米囜特蚱第3,658,662
号明现曞に蚘茉されおいるシリケヌト電着を挙げるこず
ができる。
Further, in the case of a support having a surface of metal, especially aluminum, it is desirable to carry out an appropriate hydrophilic treatment. Examples of such a hydrophilic treatment include a mechanical method such as wire brush graining, brush graining in which a surface of an aluminum surface is roughened with a nylon brush while pouring a slurry of abrasive particles, ball graining, HF or AlCl 3 , Graining the surface by chemical graining using HCl as an etchant, electrolytic graining using nitric acid or hydrochloric acid as an electrolytic solution, or complex graining performed by combining these surface roughening methods, and then acidifying as necessary. It is possible to form a strong passivation film on the aluminum surface by etching treatment with alkali, and subsequently by anodizing with sulfuric acid, phosphoric acid, oxalic acid, boric acid, chromic acid, sulphamic acid or mixed acid of these with direct current or alternating current power supply. preferable. The aluminum surface is hydrophilized by such a passivation film itself, but if necessary, US Patent 2,714,
Silicate treatment (sodium silicate, potassium silicate) described in US Pat. No. 066 and US Pat. No. 3,181,461, potassium zirconium fluoride treatment described in US Pat. No. 2,946,638, US patent 3,201,24
Phosphomolybdate treatment described in No. 7,
Alkyl titanate treatment described in British Patent No. 1,108,559, polyacrylic acid treatment described in German Patent No. 1,091,433, described in German Patent Nos. 1,134,093 and British Patent No. 1,230,447 Polyvinylphosphonic acid treatment described in JP-B-44-6409, U.S. Patent No. 3,307,
Phytic acid treatment described in Japanese Patent No. 951 and a composite of a hydrophilic organic polymer compound and a divalent metal described in JP-A-58-16893 and JP-A-58-18291. Those treated with a hydrophilizing treatment by undercoating a water-soluble polymer having a sulfonic acid group described in JP-A-59-101651 are particularly preferable.
Other hydrophilic treatment methods include U.S. Pat. No. 3,658,662.
The silicate electrodeposition described in the specification can be mentioned.

【】像露光に甚いられる掻性光線の光源ずしお
は、䟋えば、氎銀灯、メタルハラむドランプ、キセノン
ランプ、ケミカルランプ、カヌボンアヌク灯等がある。
攟射線ずしおは、電子線、線、むオンビヌム、遠赀倖
線などがある。たた線、線、Deep−光、高密床
゚ネルギヌビヌムレヌザヌビヌムも䜿甚される。レ
ヌザヌビヌムずしおはヘリりム・ネオンレヌザヌ、アル
ゎンレヌザヌ、クリプトンレヌザヌ、ヘリりム・カドミ
りムレヌザヌ、゚キシマレヌザヌ等が挙げられ
る。本発明においおは、近赀倖から赀倖領域に発光波長
を持぀光源が奜たしく、固䜓レヌザ、半導䜓レヌザが特
に奜たしい。
Examples of the light source of actinic rays used for image exposure include a mercury lamp, a metal halide lamp, a xenon lamp, a chemical lamp, and a carbon arc lamp.
Radiation includes electron beams, X-rays, ion beams, far infrared rays, and the like. Also, g-line, i-line, Deep-UV light, and high-density energy beam (laser beam) are used. Examples of the laser beam include helium / neon laser, argon laser, krypton laser, helium / cadmium laser, and KrF excimer laser. In the present invention, a light source having an emission wavelength in the near infrared to infrared region is preferable, and a solid laser and a semiconductor laser are particularly preferable.

【】本発明の画像蚘録材料の珟像液および補充
液ずしおは埓来より知られおいるアルカリ氎溶液が䜿甚
できる。䟋えば、ケむ酞ナトリりム、同カリりム、第
リン酞ナトリりム、同カリりム、同アンモニりム、第
リン酞ナトリりム、同カリりム、同アンモニりム、炭酞
ナトリりム、同カリりム、同アンモニりム、炭酞氎玠ナ
トリりム、同カリりム、同アンモニりム、ほう酞ナトリ
りム、同カリりム、同アンモニりム、氎酞化ナトリり
ム、同アンモニりム、同カリりムおよび同リチりムなど
の無機アルカリ塩が挙げられる。たた、モノメチルアミ
ン、ゞメチルアミン、トリメチルアミン、モノ゚チルア
ミン、ゞ゚チルアミン、トリ゚チルアミン、モノむ゜プ
ロピルアミン、ゞむ゜プロピルアミン、トリむ゜プロピ
ルアミン、−ブチルアミン、モノ゚タノヌルアミン、
ゞ゚タノヌルアミン、トリ゚タノヌルアミン、モノむ゜
プロパノヌルアミン、ゞむ゜プロパノヌルアミン、゚チ
レンむミン、゚チレンゞアミン、ピリゞンなどの有機ア
ルカリ剀も甚いられる。
As the developing solution and replenishing solution for the image recording material of the present invention, conventionally known alkaline aqueous solutions can be used. For example, sodium silicate, potassium silicate, third
Sodium phosphate, potassium, ammonium, second
Sodium phosphate, potassium, ammonium, sodium carbonate, potassium, ammonium, sodium hydrogen carbonate, potassium, ammonium, sodium borate, potassium, ammonium, sodium hydroxide, ammonium, potassium and lithium. Inorganic alkali salts such as Further, monomethylamine, dimethylamine, trimethylamine, monoethylamine, diethylamine, triethylamine, monoisopropylamine, diisopropylamine, triisopropylamine, n-butylamine, monoethanolamine,
Organic alkaline agents such as diethanolamine, triethanolamine, monoisopropanolamine, diisopropanolamine, ethyleneimine, ethylenediamine and pyridine are also used.

【】これらのアルカリ剀は単独もしくは皮以
䞊を組み合わせお甚いられる。
These alkaline agents may be used alone or in combination of two or more.

【】珟像液および補充液には珟像性の促進や抑
制、珟像カスの分散および印刷版画像郚の芪むンキ性を
高める目的で必芁に応じお皮々の界面掻性剀や有機溶剀
を添加できる。奜たしい界面掻性剀ずしおは、アニオン
系、カチオン系、ノニオン系および䞡性界面掻性剀があ
げられる。曎に珟像液および補充液には必芁に応じお、
ハむドロキノン、レゟルシン、亜硫酞、亜硫酞氎玠酞な
どの無機酞のナトリりム塩、カリりム塩等の還元剀、曎
に有機カルボン酞、消泡剀、硬氎軟化剀を加えるこずも
できる。
Various surfactants and organic solvents can be added to the developing solution and the replenishing solution, if necessary, for the purpose of promoting or suppressing the developing property, dispersing the development residue and enhancing the ink affinity of the printing plate image area. Preferred surfactants include anionic, cationic, nonionic and amphoteric surfactants. If necessary, the developer and replenisher
It is also possible to add a reducing agent such as sodium salt or potassium salt of an inorganic acid such as hydroquinone, resorcin, sulfurous acid or bisulfite, and further an organic carboxylic acid, an antifoaming agent or a water softener.

【】これらの珟像液の䞭で特に奜たしいものず
しお、䟋えば特開昭−号、特公昭−
号明现曞に蚘茉されおいるもの、及び特開昭
−号に瀺されおいる、ベンゞルアルコヌ
ル、アニオン性界面掻性剀、アルカリ剀及び氎からなる
珟像液組成物、特開昭−号に蚘茉されお
いる、ベンゞルアルコヌル、アニオン性界面掻性剀、氎
溶性亜硫酞塩を含む氎性溶液からなる珟像液組成物、特
開昭−号に蚘茉されおいる、氎に察す
る溶解床が垞枩においお重量以䞋である有機溶剀
ずアルカリ剀ず氎ずを含有する珟像液組成物等が挙げら
れる。
Among these developing solutions, particularly preferable ones are, for example, JP-A-54-62004 and JP-B-57-.
Those described in Japanese Patent No. 7427 and Japanese Patent Laid-Open No.
No. 1-77401, a developer composition comprising benzyl alcohol, an anionic surfactant, an alkaline agent and water, and benzyl alcohol, an anionic surfactant described in JP-A-53-44202. Developer, a developer composition comprising an aqueous solution containing a water-soluble sulfite, an organic solvent having a solubility in water of 10% by weight or less at room temperature, an alkaline agent, and water, as described in JP-A-55-155355. And a developer composition containing the same.

【】本発明の画像蚘録材料を印刷版ずしお甚い
る堎合、䞊蚘珟像液および補充液を甚いお珟像凊理した
埌、氎掗氎、界面掻性剀等を含有するリンス液、アラビ
アガムや柱粉誘導䜓を含む䞍感脂化液で埌凊理されるこ
ずが奜たしい。埌凊理にはこれらの凊理を皮々組み合わ
せお甚いるこずができる。
When the image recording material of the present invention is used as a printing plate, it is washed with the above-mentioned developing solution and replenishing solution and then rinsed with water, a rinse solution containing a surfactant, gum arabic and a starch derivative. It is preferably post-treated with a desensitizing solution. Various combinations of these treatments can be used for the post-treatment.

【】近幎、補版・印刷業界では補版䜜業の合理
化および暙準化のため、印刷版甚の自動珟像機が広く甚
いられおいる。この自動珟像機は、䞀般に珟像郚ず埌凊
理郚からなり、印刷版を搬送する装眮ず各凊理液槜およ
びスプレヌ装眮からなり、露光枈みの印刷版を氎平に搬
送しながら、ポンプで汲み䞊げた各凊理液をスプレヌノ
ズルから吹き付けお珟像凊理するものである。たた、最
近は凊理液が満たされた凊理液槜䞭に液䞭ガむドロヌル
などによっお印刷版を浞挬搬送させお凊理する方法も知
られおいる。このような自動凊理においおは、各凊理液
に凊理量や皌働時間等に応じお補充液を補充しながら凊
理するこずができる。
In recent years, automatic developing machines for printing plates have been widely used in the plate making / printing industry in order to rationalize and standardize the plate making work. This automatic developing machine is generally composed of a developing section and a post-processing section, and is composed of a device for conveying a printing plate, each processing liquid tank and a spraying device, which conveys an exposed printing plate horizontally while pumping it up with each pump. The processing liquid is sprayed from a spray nozzle for development processing. Further, recently, a method has also been known in which a printing plate is dipped and conveyed by a submerged guide roll or the like in a processing liquid tank filled with the processing liquid for processing. In such automatic processing, it is possible to perform processing while supplementing each processing solution with a replenishing solution according to the processing amount, operating time, and the like.

【】たた、実質的に未䜿甚の凊理液で凊理する
いわゆる䜿い捚お凊理方匏も適甚できる。
Further, a so-called disposable processing method of processing with a substantially unused processing liquid can be applied.

【】本発明の画像蚘録材料を甚いた感光性平版
印刷版を画像露光し、珟像し、氎掗及び又はリンス及
び又はガム匕きしお埗られた平版印刷版に䞍必芁な画
像郚䟋えば原画フィルムのフィルム゚ッゞ跡などが
ある堎合には、その䞍必芁な画像郚の消去が行なわれ
る。このような消去は、䟋えば特公平 2−13293 号公報
に蚘茉されおいるような消去液を䞍必芁画像郚に塗垃
し、そのたた所定の時間攟眮したのちに氎掗するこずに
より行なう方法等がある。
The photosensitive lithographic printing plate using the image recording material of the present invention is subjected to imagewise exposure, development, washing with water and / or rinsing and / or gumming. For example, if there is a film edge mark of the original image film), the unnecessary image portion is erased. Such erasing can be carried out, for example, by applying an erasing liquid to an unnecessary image portion as described in Japanese Patent Publication No. 2-13293, leaving it as it is for a predetermined time, and then rinsing with water.

【】以䞊のようにしお埗られた平版印刷版は所
望により䞍感脂化ガムを塗垃したのち、印刷工皋に䟛す
るこずができる。
The lithographic printing plate obtained as described above can be subjected to a printing step after applying a desensitizing gum, if desired.

【】[0078]

【実斜䟋】以䞋、本発明を実斜䟋により曎に詳现に説明
するが、本発明はこれにより限定されるものではない。
EXAMPLES The present invention will now be described in more detail by way of examples, which should not be construed as limiting the invention thereto.

【】実斜䟋 〔基板の䜜補〕特開昭ヌ号公報に開瀺さ
れた方法により基板を䜜補した。即ち、厚さ
のアルミニりム板を、ナむロンブラシずメッシ
ュのパミストンの氎懞濁液を甚い、その衚面を砂目立お
した埌、よく氎で掗浄した。次いで氎酞化ナトリ
りム氎溶液に℃で秒間浞挬しお゚ッチングした
埌、流氎で氎掗埌、曎に3 で䞭和掗浄し、
氎掗した。次にこの板を陜極時電圧がで陜極
時電気量に察する陰極時電気量の比がの条件䞋で
正匊波の亀番波圢電流を甚いお硝酞氎溶液䞭で
クヌロン2 の陜極時電気量で電解粗面化凊理を
行った。このずきの衚面粗さを枬定したずころΌ
( 衚瀺) であった。匕き続いおの硫酞䞭に浞
挬し、℃で分間デスマットした埌、硫酞
䞭、電流密床2 においお厚さが
2 になるように分間陜極酞化凊理した。その埌℃
の珪酞゜ヌダ氎溶液に分間浞挬埌氎掗也燥し
た。
Example 1 [Production of Substrate] A substrate was produced by the method disclosed in JP-A-56-28893. That is, the thickness is 0.24 m
The aluminum plate of m was washed with water after the surface of the aluminum plate was grained using a nylon brush and an aqueous suspension of 400 mesh pumice. Then, it is immersed in a 10% aqueous sodium hydroxide solution at 70 ° C. for 60 seconds for etching, washed with running water, and then neutralized and washed with 20% HNO 3.
Washed with water. Next, this plate was subjected to 16% in a 1% nitric acid aqueous solution using a sinusoidal alternating waveform current under the conditions that the voltage at the anode was 12.7 V and the ratio of the electricity at the cathode to the electricity at the anode was 0.8.
The electrolytic surface-roughening treatment was performed with an electric quantity at the anode of 0 coulomb / dm @ 2. The surface roughness at this time was measured to be 0.6Ό.
(Ra indication). Subsequently, it was immersed in 30% sulfuric acid and desmutted at 55 ° C. for 2 minutes, and then, in 20% sulfuric acid, at a current density of 2 A / dm 2, the thickness was 2.7 g / m 2.
Anodizing treatment was performed for 2 minutes so as to be 2. Then 70 ° C
Was immersed in a 2.5% aqueous solution of sodium silicate for 1 minute, washed with water and dried.

【】〔カヌボンブラック分散液の䜜補〕䞋蚘重
量比による組成物をガラスビヌズにより分間分散し
カヌボンブラック分散液を埗た。 カヌボンブラック  重量郹 ベンゞルメタクリレヌトずメタクリル酞の共重合䜓 重量郚 モル比重量平均分子量䞇 シクロヘキサノン 重量郚 メトキシプロピルアセテヌト 重量郚
[Preparation of Carbon Black Dispersion] A composition having the following weight ratio was dispersed with glass beads for 10 minutes to obtain a carbon black dispersion. Carbon black 1 part by weight Copolymer of benzyl methacrylate and methacrylic acid 1.6 parts by weight (molar ratio 72:28, weight average molecular weight 70,000) Cyclohexanone 1.6 parts by weight Methoxypropyl acetate 3.8 parts by weight

【】〔ネガ型感光性平版印刷版の䜜補〕䞊蚘に
より埗られたアルミニりム板に䞋蚘感光液を塗垃し
℃で分間也燥をしおネガ型感光性平版印刷版を埗
た。也燥埌の重量は2 であった。 感光液 前蚘カヌボンブラック分散液  本文䞭の化合物 II−  ベンゞルメタクリレヌト−ヒドロキシメチル  メタクリレヌトメタクリル酞の モル比共重合䜓、重量平均分子量䞇 −米囜瀟補フッ玠系界面掻性剀  メチル゚チルケトン  埗られたネガ型感光性平版印刷版を版面出力に調節
したレヌザで露光した埌、富士写真フィルム
株補珟像液、−、ガム液−
を仕蟌んだ自動珟像機を通しお凊理したず
ころ、ネガ画像が埗られた。この平版印刷版をハむデル
−機で印刷したずころ、良奜な印刷物が玄
䞇枚埗られた。 比范䟋 実斜䟋の感光液組成䞭、カヌボンブラック分散液のか
わりに油溶性染料ビクトリアピュアブルヌ
を甚いた以倖は実斜䟋ず同様にしお、ネガ型
感光性平版印刷版を䜜補した。この感光性平版印刷版
を、実斜䟋ず同様に露光し珟像凊理したずころ、感光
膜がすべお珟像液に溶解しおしたい画像が埗られなかっ
た。
[Preparation of negative photosensitive lithographic printing plate] The aluminum plate obtained above was coated with the following photosensitive solution, and 8
It was dried at 0 ° C for 2 minutes to obtain a negative photosensitive lithographic printing plate. The weight after drying was 2.0 g / m 2. Photosensitive solution Carbon black dispersion 10 g Compound II-11 3 in the text Benzyl methacrylate / 2-hydroxymethyl 10 g Methacrylate / methacrylic acid 60/20/20 molar ratio copolymer, weight average molecular weight 30,000 FC-430 (US 3M Fluorine-based surfactant) 0.1 g Methyl ethyl ketone 50 g After exposing the obtained negative-type photosensitive lithographic printing plate with a YAG laser adjusted to a plate surface output of 2 W, a developing solution manufactured by Fuji Photo Film Co., Ltd., DN- 3C (1: 1), gum solution FN-
When processed through an automatic processor equipped with 2 (1: 1), a negative image was obtained. When this lithographic printing plate was printed on a Heidel SOR-KZ machine, good printed matter was about 3
I got 10,000 copies. Comparative Example 1 In the photosensitive liquid composition of Example 1, an oil-soluble dye (Victoria Pure Blue BOH) was used instead of the carbon black dispersion.
A negative photosensitive lithographic printing plate was prepared in the same manner as in Example 1 except that 0.3 g was used. When this photosensitive lithographic printing plate was exposed and developed in the same manner as in Example 1, all the photosensitive film was dissolved in the developing solution, and no image was obtained.

【】実斜䟋〜 実斜䟋の感光液組成䞭、化合物−の
かわりに衚の化合物を甚いた以倖は、実斜䟋ず同様
にサンプルを䜜成し、同様にレヌザで曞き蟌み、
珟像凊理したずころ、ネガ画像が埗られた。この印刷版
を甚い、実斜䟋ず同様な条件で印刷したずころ衚の
枚数、良奜な印刷物が埗られた。
Examples 2 to 4 Samples were prepared in the same manner as in Example 1 except that the compound of Table 1 was used in place of 3 g of the compound (II-11) in the composition of the photosensitive solution of Example 1, and the same procedure was carried out. Write with YAG laser,
After development, a negative image was obtained. When this printing plate was used and printed under the same conditions as in Example 1, the number of sheets shown in Table 1 and good printed matter were obtained.

【】[0083]

【衚】 [Table 1]

【】実斜䟋 実斜䟋の感光液組成䞭、線状高分子を䞋蚘の暹脂に倉
えた以倖は、党く同様にしおネガ型感光性平版印刷版を
埗た。
Example 5 A negative photosensitive lithographic printing plate was obtained in exactly the same manner as in the photosensitive liquid composition of Example 1, except that the linear polymer was changed to the following resin.

【】[0085]

【化】 [Chemical 15]

【】埗られたネガ型感光性平版印刷版を版面出
力に調節したレヌザで露光した埌、富士写真
フむルム株補珟像液、−、ガム
液−を仕蟌んだ自動珟像機を通しお凊
理したずころ、ネガ画像が埗られた。この平版印刷版を
ハむデル−機で印刷したずころ、良奜な印刷
物が玄䞇枚埗られた。
The negative-working photosensitive lithographic printing plate thus obtained was exposed with a YAG laser adjusted to a plate surface output of 2 W, and then developed by Fuji Photo Film Co., Ltd., DN-3C (1: 1), gum solution FN-. When processed through an automatic processor equipped with 2 (1: 1), a negative image was obtained. When this lithographic printing plate was printed with a Heidel SOR-KZ machine, about 50,000 good prints were obtained.

【】実斜䟋 実斜䟋で甚いたカヌボンブラック分散液のかわりに䞋
蚘染料を甚い、実斜䟋ず同様の操䜜によりネガ型感光
性平版印刷版を埗た。 染料 −ゞ−−ブチル−−−−ゞ−−  ブチル−−チオピラン−−むリデン−ペンタ− −ゞ゚ニルチオピリリりムテトラフルオロボレヌト 米囜特蚱第号明现曞蚘茉の化合物 埗られたネガ型感光性平版印刷版を半導䜓レヌザ波長
、スポット埄2Όを甚
い、線速床で版面出力に調節
し、露光した。次に実斜䟋ず同様の珟像凊理を行った
ずころ、線幅Όの现線が圢成できた。
Example 6 A negative photosensitive lithographic printing plate was obtained in the same manner as in Example 1 except that the following dye was used in place of the carbon black dispersion used in Example 1. Dye 2,6-di-t-butyl-4- {5- (2,6-di-t-0.02g butyl-4H-thiopyran-4-ylidene) -penta-1,3-dienyl} thiopyrylium Tetrafluoroborate (Compound described in U.S. Pat. No. 4,283,475) The obtained negative-type photosensitive lithographic printing plate was used with a semiconductor laser (wavelength 825 nm, spot diameter: 1 / e 2 = 11.9 Ό). , The plate surface output was adjusted to 110 mW at a linear velocity of 8 m / sec, and exposure was performed. Next, when the same developing treatment as in Example 1 was performed, a fine line having a line width of 10 Ό could be formed.

【】次に、ビヌム埄をΌ2に調敎
し同様にしおの曞き蟌み解像床にお
の網点画像露光埌、同様の凊理を行い網点画像
を圢成した。埗られた平版印刷版を甚いおハむデルベル
グ瀟補−型印刷機で垂販のむンキを甚いお䞊
質玙に印刷したずころ実斜䟋ず同様に、優れた耐刷性
が埗られた。 比范䟋 実斜䟋の感光液組成䞭、染料のかわりに油溶性染料
ビクトリアピュアブルヌを甚いた以
倖は実斜䟋ず同様にしお、ネガ型感光性平版印刷版を
䜜補した。この感光性平版印刷版を、実斜䟋ず同様に
露光し珟像凊理したずころ、感光膜がすべお珟像液に溶
解しおしたい画像が埗られなかった。
Next, the beam diameter is adjusted to 6 Ό (1 / e 2 ) and similarly, the writing resolution of 4000 dpi is set to 20 Όm.
After the exposure of the dot image of 0 lpi, the same process was performed to form a dot image. When the obtained lithographic printing plate was used to print on high-quality paper with a commercially available ink using a SOR-KZ type printer manufactured by Heidelberg, excellent printing durability was obtained as in Example 1. Comparative Example 2 A negative photosensitive lithographic printing plate was prepared in the same manner as in Example 6 except that 0.2 g of an oil-soluble dye (Victoria Pure Blue BOH) was used in place of the dye in the photosensitive liquid composition of Example 6. did. When this photosensitive lithographic printing plate was exposed and developed in the same manner as in Example 6, all the photosensitive film was dissolved in the developing solution, and no image was obtained.

【】[0089]

【発明の効果】本発明は、露光光源の発光波長に䟝存せ
ずに蚘録可胜なネガ型画像蚘録材料をうるこずができ、
特に近赀倖から赀倖熱線で蚘録可胜なネガ型画像蚘
録材料をうるこずができる。
INDUSTRIAL APPLICABILITY The present invention can provide a negative image recording material capable of recording without depending on the emission wavelength of the exposure light source.
In particular, it is possible to obtain a negative image recording material capable of recording from near infrared to infrared (heat rays).

Claims (1)

【特蚱請求の範囲】[Claims] 【請求項】 茻射線を吞収する物質、分子内に䞋蚘䞀
般匏で瀺される゚ノヌル゚ヌテル基を少なくずも
個有する化合物、及び酞基を有し、゚ノヌル゚ヌテル
基ず熱的に反応する線状高分子を含むこずを特城ずする
ネガ型画像蚘録材料。 【化】 匏䞭、1、2及び3は、それぞれ独立に氎玠、アル
キル基又はアリヌル基を衚す。たた、それらの内の぀
が結合しお飜和又はオレフィン性䞍飜和の環を圢成しお
もよい。
1. A substance which absorbs radiation, a compound having at least two enol ether groups represented by the following general formula (I) in a molecule, and an acid group, which reacts thermally with an enol ether group. A negative image recording material containing a linear polymer. Embedded image In the formula, R 1 , R 2 and R 3 each independently represent hydrogen, an alkyl group or an aryl group. Also, two of them may combine to form a saturated or olefinically unsaturated ring.
JP7035493A 1995-02-17 1995-02-23 Negative type image recording material Pending JPH08234426A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP7035493A JPH08234426A (en) 1995-02-23 1995-02-23 Negative type image recording material
US08/598,496 US5658708A (en) 1995-02-17 1996-02-08 Image recording material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7035493A JPH08234426A (en) 1995-02-23 1995-02-23 Negative type image recording material

Publications (1)

Publication Number Publication Date
JPH08234426A true JPH08234426A (en) 1996-09-13

Family

ID=12443280

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7035493A Pending JPH08234426A (en) 1995-02-17 1995-02-23 Negative type image recording material

Country Status (1)

Country Link
JP (1) JPH08234426A (en)

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