JPH08201755A - Projection optical system and image forming device - Google Patents
Projection optical system and image forming deviceInfo
- Publication number
- JPH08201755A JPH08201755A JP7008187A JP818795A JPH08201755A JP H08201755 A JPH08201755 A JP H08201755A JP 7008187 A JP7008187 A JP 7008187A JP 818795 A JP818795 A JP 818795A JP H08201755 A JPH08201755 A JP H08201755A
- Authority
- JP
- Japan
- Prior art keywords
- optical system
- light
- projection optical
- illumination light
- projection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Landscapes
- Liquid Crystal (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Projection Apparatus (AREA)
- Transforming Electric Information Into Light Information (AREA)
Abstract
(57)【要約】
【目的】 高輝度且つ高コントラストで、不必要な収差
の発生を抑えた投写光学系を提供する。
【構成】 照明系1から出射した光は,光学系2に入射
して光軸6に対して角度2θを成す略平行光とされ,反
射パネル3に到達する。反射パネル3は、法線方向と光
学系2の光軸とが一致するように配置しており、この反
射パネル3に対して正反射した光は、光学系2を通過
し、その大部分は遮光部材4によって遮断され、投写面
7上の暗部を形成する。反射パネル3の法線方向に反射
し、光軸6に平行に射出された光束は、再度光学系2に
より集光されて遮光部材4の開口部41を通過し、投写
面7上の明部を形成する。
(57) [Summary] [Object] To provide a projection optical system having high brightness and high contrast, and suppressing the occurrence of unnecessary aberrations. [Structure] The light emitted from the illumination system 1 enters the optical system 2 to be substantially parallel light forming an angle 2θ with the optical axis 6, and reaches the reflection panel 3. The reflection panel 3 is arranged so that the normal direction and the optical axis of the optical system 2 coincide with each other. The light specularly reflected by the reflection panel 3 passes through the optical system 2, and most of it is It is blocked by the light shielding member 4 and forms a dark portion on the projection surface 7. The light beam reflected in the normal direction of the reflection panel 3 and emitted parallel to the optical axis 6 is again condensed by the optical system 2 and passes through the opening 41 of the light shielding member 4 to form a bright portion on the projection surface 7. To form.
Description
【0001】[0001]
【産業上の利用分野】本発明は、投写光学系に関し、特
にシュリーレン光学系を用いた投写光学系に関するもの
である。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a projection optical system, and more particularly to a projection optical system using a Schlieren optical system.
【0002】[0002]
【従来の技術】従来の反射型の空間変調光学素子とシュ
リーレン光学系を用いた投写光学系の一例を、図9及び
図10に示す。図9において、光源11から出た光は直
接もしくは反射鏡12により反射されて集光レンズ13
に入射する。次いで、反射鏡14で反射された光は光学
系2を通過して略平行光となって、図10に示したよう
に入射角2θで液晶パネル30に入射する。従って、液
晶パネル30において、散乱せずに反射した光は略平行
光として、光学系2の光軸に対して2θ傾いて再び光学
系2を通過する。光束は光学系2により集光されて、遮
光部材4の開口部を通り、投写面7に投写される。ま
た、液晶パネル30における電圧印加部分で散乱反射さ
れた光は、その大部分が光学系2を通過した後、遮光部
材4により遮断され投写面7には到達しない。2. Description of the Related Art An example of a conventional projection type optical system using a reflection type spatial modulation optical element and a Schlieren optical system is shown in FIGS. In FIG. 9, the light emitted from the light source 11 is directly reflected by the reflecting mirror 12 or the condensing lens 13
Incident on. Next, the light reflected by the reflecting mirror 14 passes through the optical system 2 to become substantially parallel light, and enters the liquid crystal panel 30 at the incident angle 2θ as shown in FIG. Therefore, in the liquid crystal panel 30, the light reflected without being scattered passes through the optical system 2 again as a substantially parallel light, inclined by 2θ with respect to the optical axis of the optical system 2. The light flux is condensed by the optical system 2, passes through the opening of the light shielding member 4, and is projected on the projection surface 7. Further, most of the light scattered and reflected at the voltage applying portion of the liquid crystal panel 30 passes through the optical system 2 and is blocked by the light shielding member 4 and does not reach the projection surface 7.
【0003】[0003]
【発明が解決しようとする課題】しかしながら、上記の
ような投写光学系においては、液晶パネル30からの反
射光が、光軸から離れた部分を通るため、高次の収差が
発生しやすく、収差補正の点で好ましくなかった。However, in the projection optical system as described above, since the reflected light from the liquid crystal panel 30 passes through a portion distant from the optical axis, high-order aberrations are likely to occur and It was not preferable in terms of correction.
【0004】本発明は、高輝度且つ高コントラストで、
不必要な収差の発生を抑えた投写光学系の提供を目的と
する。The present invention provides high brightness and high contrast,
An object of the present invention is to provide a projection optical system in which unnecessary aberrations are suppressed.
【0005】[0005]
【課題を解決するための手段および作用】上記目的を達
成するため、本願第1発明は、画素毎に、照明光が第1
の方向に正反射する第1の状態と、前記照明光の少なく
とも一部が前記第1の方向に正反射しない第2の状態と
が切り換わる光学素子と、前記照明光として前記光学素
子に斜入射する略平行光を形成するとともに、前記光学
素子の画素により前記第1の方向に正反射した反射光を
受けて投写する光学系とを有する投写光学系において、
前記第1の方向が前記光学系の光軸とほぼ平行になるよ
う、前記第1の状態における前記画素の反射面を前記光
学系の光軸に対して傾けることを特徴とする。これによ
り、不必要な収差の発生を抑えた投写光学系を提供でき
る。In order to achieve the above object, the first invention of the present application is such that the illumination light is set to the first
Optical element that switches between a first state in which the illumination light is regularly reflected and a second state in which at least a part of the illumination light is not regularly reflected in the first direction; A projection optical system having an optical system for forming incident substantially parallel light and projecting by receiving reflected light specularly reflected in the first direction by the pixels of the optical element,
The reflective surface of the pixel in the first state is inclined with respect to the optical axis of the optical system so that the first direction is substantially parallel to the optical axis of the optical system. This makes it possible to provide a projection optical system that suppresses the generation of unnecessary aberrations.
【0006】本願第2発明は、本願第1発明の投写光学
系を有することを特徴とする画像形成装置である。A second invention of the present application is an image forming apparatus having the projection optical system of the first invention of the present application.
【0007】[0007]
【実施例】以下、本発明を実施例を用いて説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below with reference to embodiments.
【0008】本実施例における投写光学系の構成を図1
に示す。1は照明系で、11は光源、12は反射鏡、1
3は集光光学系、14は反射鏡である。2は光学系、3
は反射パネルである。本実施例においては、入射光が反
射パネルの法線方向、すなわち光学系2の光軸とほぼ平
行な方向に反射し得るような反射型の空間変調素子を用
いている。これについては、後に詳述する。4は開口部
41を有する遮光部材、6は光学系2の光軸、7は投写
面である。FIG. 1 shows the configuration of the projection optical system in this embodiment.
Shown in 1 is an illumination system, 11 is a light source, 12 is a reflecting mirror, 1
3 is a condensing optical system, and 14 is a reflecting mirror. 2 is an optical system, 3
Is a reflective panel. In this embodiment, a reflection type spatial modulation element is used which can reflect incident light in the normal direction of the reflection panel, that is, in the direction substantially parallel to the optical axis of the optical system 2. This will be described later in detail. Reference numeral 4 is a light blocking member having an opening 41, 6 is an optical axis of the optical system 2, and 7 is a projection surface.
【0009】光源11から発した光は、直接もしくは反
射鏡12により反射されて光学系13に入射する。光学
系13により集光された光は反射鏡14に到達し、これ
により反射されて照明光束を成す。このようにして照明
系1から出射した光は、光学系2に入射して光軸6に対
して角度2θを成す略平行光とされ、反射パネル3に到
達する。ここで、反射パネルの法線方向と光学系2の光
軸の方向とが一致するように配置してある。反射パネル
3に対して正反射した光は、光学系2を通過し、その大
部分は遮光部材4によって遮断され、投写面7上の暗部
を形成する。反射パネル3の法線方向に反射し、光軸6
に略平行に射出された光束は、再度光学系2により集光
されて遮光部材4の開口部41を通過し、投写面7上の
明部を形成する。The light emitted from the light source 11 enters the optical system 13 directly or after being reflected by the reflecting mirror 12. The light condensed by the optical system 13 reaches the reflecting mirror 14 and is reflected thereby to form an illumination light flux. In this way, the light emitted from the illumination system 1 enters the optical system 2 to be substantially parallel light that forms an angle 2θ with the optical axis 6, and reaches the reflection panel 3. Here, it is arranged so that the normal direction of the reflection panel and the direction of the optical axis of the optical system 2 coincide with each other. The light specularly reflected by the reflection panel 3 passes through the optical system 2, and most of the light is blocked by the light blocking member 4 to form a dark portion on the projection surface 7. The light is reflected in the direction normal to the reflection panel 3 and the optical axis 6
The light flux emitted substantially in parallel with is condensed again by the optical system 2 and passes through the opening 41 of the light shielding member 4 to form a bright portion on the projection surface 7.
【0010】尚、本実施例においてカラー表示を行う場
合には、例えば反射パネルの表面にカラーフィルターを
載置すればよい。When color display is performed in this embodiment, a color filter may be placed on the surface of the reflection panel, for example.
【0011】次に、本実施例に用いる反射パネル3につ
いて詳述する。Next, the reflection panel 3 used in this embodiment will be described in detail.
【0012】反射パネル3に用いられる反射型の空間変
調光学素子として、高分子分散型液晶として一般的なP
DLC(Polymer Dispersed Liquid Crystal)を用いる
ことで光効率の良い投写光学系が構成できる。As a reflection type spatial modulation optical element used in the reflection panel 3, a P type which is generally used as a polymer dispersion type liquid crystal.
By using DLC (Polymer Dispersed Liquid Crystal), a projection optical system with good light efficiency can be constructed.
【0013】本実施例で用いる反射型PDLCパネルの
構成を図2に示す。201は対向基板となるガラス板、
202、206は透明電極、203、205は配向膜、
204はPDLC層、207は反射パネル3に対して
θ′の傾きを有する反射用電極、208は信号線配線、
209は画素部TFTのゲートポリシリコン、210は
画素部TFTを形成するポリシリコン層、211は絶縁
層、212はシリコン基板、213、214は層間膜で
ある。The structure of the reflective PDLC panel used in this embodiment is shown in FIG. 201 is a glass plate serving as a counter substrate,
202 and 206 are transparent electrodes, 203 and 205 are alignment films,
Reference numeral 204 is a PDLC layer, 207 is a reflection electrode having an inclination of θ ′ with respect to the reflection panel 3, 208 is a signal line wiring,
Reference numeral 209 is a gate polysilicon of the pixel portion TFT, 210 is a polysilicon layer forming the pixel portion TFT, 211 is an insulating layer, 212 is a silicon substrate, and 213 and 214 are interlayer films.
【0014】反射用電極207の反射パネル3に対する
傾きθ′は、反射パネル3に入射角2θで入射してくる
照明光に対して、反射パネル3の法線方向に反射光を出
射するような角度に設定している。The inclination θ'of the reflection electrode 207 with respect to the reflection panel 3 is such that the reflection light is emitted in the normal direction of the reflection panel 3 with respect to the illumination light incident on the reflection panel 3 at the incident angle 2θ. The angle is set.
【0015】以下、PDLCパネルにおける光の明暗状
態の動作原理について述べる。The operating principle of the light / dark state of light in the PDLC panel will be described below.
【0016】PDLC層204は透明電極202、20
6による電圧印加にともない光の拡散状態が変化する。
電圧を印加すると高分子球内の液晶配向が揃い入射光は
そのまま透過光となる。したがって、液晶パネル3に入
射角2θで入射した照明光は、液晶パネルの法線方向に
出射することになる。電圧を印加しない状態では、液晶
の配向が無秩序で揃っていないため散乱光となる。この
ように画素単位に印加電圧を制御することにより、画像
表示が行なえる。The PDLC layer 204 is a transparent electrode 202, 20.
As the voltage is applied by 6, the light diffusion state changes.
When a voltage is applied, the liquid crystal alignment in the polymer spheres becomes uniform and the incident light becomes transmitted light as it is. Therefore, the illumination light incident on the liquid crystal panel 3 at the incident angle 2θ is emitted in the normal direction of the liquid crystal panel. When no voltage is applied, the liquid crystal is disordered and not aligned, so that scattered light is generated. By controlling the applied voltage for each pixel in this way, image display can be performed.
【0017】図2の構成では照明系からの入射光はPD
LC層204を往復するため散乱の度合いがより強ま
り、PDLC層が約2倍の透過型PDLCパネルに相当
するコントラストとなる。In the configuration of FIG. 2, the incident light from the illumination system is PD
Since the light travels back and forth through the LC layer 204, the degree of scattering becomes stronger, and the contrast of the PDLC layer becomes about twice that of a transmissive PDLC panel.
【0018】また、対向基板201の表面、裏面におけ
る反射光の進行方向と、反射用電極207での反射光の
進行方向とが異なるため、ゴースト、フレアの発生が低
減しコントラストが向上するという利点もある。なお、
傾斜電極を形成する際に、ポリシリコン層210、ゲー
トのポリシリコン209、信号線配線208を図2のよ
うに順番に配置すると斜めに段差が形成される。この局
所的段差をレジストエッチバック等で滑らかにすると層
間膜214は図2に示すような形状となる。ここに電極
207を形成した後、層間膜213により平坦化し反射
用電極207と透明電極206でコンタクトをとればよ
い。このようにすると平坦化された透明基板206と対
向電極との間で電界が一様にかかるため分布ムラが生じ
ない。Further, since the traveling directions of the reflected light on the front surface and the back surface of the counter substrate 201 are different from the traveling directions of the reflected light on the reflection electrode 207, ghost and flare are reduced and the contrast is improved. There is also. In addition,
When the inclined electrode is formed, if the polysilicon layer 210, the gate polysilicon 209, and the signal line wiring 208 are sequentially arranged as shown in FIG. 2, a step is formed obliquely. When this local step is smoothed by resist etch back or the like, the interlayer film 214 has a shape as shown in FIG. After the electrode 207 is formed here, it may be flattened by the interlayer film 213 and contacted with the reflective electrode 207 and the transparent electrode 206. In this case, an electric field is uniformly applied between the flattened transparent substrate 206 and the counter electrode, so that uneven distribution does not occur.
【0019】他の反射型の空間変調光学素子として、特
開昭62−125772号公報に記載されている多数の
微小ミラーを格子状に配置し、これら微小ミラー単位に
角度制御可能な反射型空間変調光学素子(Deformable M
irror Device素子、以下DMD素子)を用いたものがあ
る。このDMD素子について図3乃至5を用いて説明す
る。As another reflection-type spatial modulation optical element, a large number of micromirrors described in JP-A-62-125772 are arranged in a grid pattern, and a reflection-type space whose angle can be controlled in units of these micromirrors. Modulation optics (Deformable M
There is a device using an irror device element, which will be referred to as a DMD element hereinafter. This DMD element will be described with reference to FIGS.
【0020】図3において301はミラーで、Al,A
g等の物質で製造され入射光を反射させる役割を果す。
302はミラー301を支持する基板でAu等で構成さ
れる。303,304はミラー301、支持基板302
の支持部材で、303はミラーコンタクトと呼ばれ、特
に電気機械動作をするひんじ部を受けるものであり、3
04はポリオキサイドSi等からなる絶縁物質である。
305はポリシリコンゲートでMOS型FETトランジ
スタのゲートの役割を示す。306はエアギャップで、
0.6μm〜数μmの空洞である。307はフローティ
ングフィールドプレートで、308のN+フローティン
グソースからトランジスタのON,OFF情報によりフ
ローティングフィールドプレート307に電圧がかか
る。309はN+ドレインを示す。これもMOS型FE
Tトランジスタの構成の役割をする。310はゲートオ
キサイド、311はP型シリコン基板である。In FIG. 3, 301 is a mirror, which is made of Al, A
It is made of a material such as g and plays a role of reflecting incident light.
A substrate 302 supports the mirror 301 and is made of Au or the like. Reference numerals 303 and 304 denote a mirror 301 and a support substrate 302.
The supporting member 303 is called a mirror contact, and particularly receives a hinge portion that performs electromechanical operation.
Reference numeral 04 is an insulating material made of polyoxide Si or the like.
Reference numeral 305 denotes a polysilicon gate, which serves as a gate of a MOS FET transistor. 306 is an air gap,
It is a cavity of 0.6 μm to several μm. A floating field plate 307 applies a voltage from the N + floating source 308 to the floating field plate 307 according to ON / OFF information of the transistor. Reference numeral 309 represents an N + drain. This is also a MOS type FE
Plays the role of the T-transistor. Reference numeral 310 is a gate oxide, and 311 is a P-type silicon substrate.
【0021】図4は図3のA方向からの正面図で、41
2はエア空隙で、413は電気機械的に揺動するミラー
揺動部、414はひんじ部分を示す。415は光偏向素
子表面のミラー揺動部413以外のミラー表面を示す。
光偏向素子はICまたはLSIのプロセスと似た工程で
製作される。FIG. 4 is a front view from the direction A in FIG.
Reference numeral 2 is an air gap, 413 is a mirror swing portion that swings electromechanically, and 414 is a hinge portion. Reference numeral 415 denotes a mirror surface other than the mirror oscillating portion 413 on the surface of the light deflection element.
The light deflection element is manufactured by a process similar to the IC or LSI process.
【0022】図5は光偏向素子の電気的等価図を示す。
516はミラー301、支持基板302にかかる電圧V
M を示す。517はN+フローティングソース308に
かかる電圧VF を示す。518はトランジスタ構成を示
しており、N+ドレイン309のD(ドレイン)信号、
ポリシリコンゲート305のG(ゲート)信号のON,
OFFによりVF の電圧がN+フローティングソース3
08にON,OFFされる。この時、ミラー301、支
持基板302に電圧VM がかかっており、ミラー30
1、支持基板302とN+フローティングソース308
間の電位差がON,OFF信号により増減されることに
なる。そして電位差に応じてエアギャップ306、フロ
ーティングフィールドプレート307の間に次の式に応
じた力Fが生じる。FIG. 5 shows an electrical equivalent diagram of the light deflection element.
516 is a voltage V applied to the mirror 301 and the supporting substrate 302
Indicates M. Reference numeral 517 denotes the voltage V F applied to the N + floating source 308. Reference numeral 518 denotes a transistor configuration, which is a D (drain) signal of the N + drain 309,
ON of G (gate) signal of polysilicon gate 305,
When turned off, the voltage of V F is N + floating source 3
It is turned on and off at 08. At this time, the voltage V M is applied to the mirror 301 and the support substrate 302, and the mirror 30
1. Support substrate 302 and N + floating source 308
The potential difference between them is increased or decreased by the ON and OFF signals. Then, a force F according to the following equation is generated between the air gap 306 and the floating field plate 307 according to the potential difference.
【0023】F∽KVα (K:定数 V:電位差
α:定数 F:曲げ力) この力Fによって、ミラー揺動部413がひんじ部41
4を中心に揺動される。F∽KVα (K: constant V: potential difference
α: constant F: bending force) This force F causes the mirror swing unit 413 to move to the hinge portion 41.
It is swung around 4.
【0024】図3の左図はミラー301、支持基板30
2とN+フローティングソース308の間に電位差が大
きくある場合で、ミラー揺動部413はひんじ部414
から折れ曲がり、この作用のため入射光はミラーの振れ
角の2倍角度を変えて反射される。一方、電位差が少な
い場合は図3の右図に示すように、ミラー301、支持
基板302からなるミラー揺動部413はフローティン
グフィールドプレート307により引っ張られる力が少
なく湾曲されない。したがって、入射光はミラーの振れ
ない状態で反射されることとなる。すなわち、光偏向素
子とは電気的ON,OFFをミラー揺動部413の揺動
のON,OFFに変換し、更に光の振れ角の変化に変換
するものである。The left view of FIG. 3 shows the mirror 301 and the support substrate 30.
2 and the N + floating source 308 have a large potential difference, the mirror oscillating portion 413 causes the hinge portion 414 to move.
The incident light is reflected by changing the double angle of the deflection angle of the mirror due to this action. On the other hand, when the potential difference is small, as shown in the right diagram of FIG. 3, the mirror oscillating portion 413 composed of the mirror 301 and the support substrate 302 has a small pulling force by the floating field plate 307 and is not curved. Therefore, the incident light is reflected while the mirror is not shaken. That is, the light deflection element is to convert electrical ON / OFF to ON / OFF of the swing of the mirror swing unit 413, and further to change the deflection angle of light.
【0025】このDMD素子を反射パネル3に用いるこ
とにより、暗部の光線が投写面上に到達することがな
く、極めてコントラストの高い投写が可能になる。By using this DMD element for the reflection panel 3, it is possible to perform projection with extremely high contrast without the light rays in the dark part reaching the projection surface.
【0026】また、投写光学系は図6に示すような構成
でもよい。図6において特徴的なのは、図7に示してい
るように、遮光部材4に開口部41の他に照明光を通過
させるための開口部42を設けている点である。投写光
学系をこのような構成とすることにより、カラー表示を
行う場合、反射パネル3の表面にカラーフィルターを載
置する方法の他に、図8に示すように、カラーフィルタ
ー801を遮光部材704の前、もしくは後ろに配し、
反射パネルの駆動に同期させて回転させる等の方式をと
れる。後者の方式をとる場合、カラーフィルターの配置
場所が照明光束の集光部付近であるために、カラーフィ
ルターを小型化できるという利点がある。Further, the projection optical system may be constructed as shown in FIG. What is characteristic in FIG. 6 is that, as shown in FIG. 7, in addition to the opening 41, the opening 42 for allowing the illumination light to pass is provided in the light shielding member 4. When a color display is performed by configuring the projection optical system as described above, in addition to the method of placing the color filter on the surface of the reflection panel 3, as shown in FIG. Place it in front of or behind
A method such as rotating in synchronization with the driving of the reflection panel can be adopted. The latter method has an advantage that the color filter can be miniaturized because the color filter is arranged near the condensing portion of the illumination light flux.
【0027】本実施例の投写光学系は、反射パネル3の
法線方向と、光学系2の光軸を一致させており、各画素
の反射面を傾けることで各画素の正反射光が、光軸と略
平行に出射するよう構成している。しかしながら、各画
素の反射面が反射パネルに対して平行な反射パネル(例
えば、従来より知られているTN(Twisted Nematic)
型の反射型液晶パネル等)でも、反射パネル自体を光軸
に対して傾けることによって、本実施例と同様の効果を
得ることができる。この場合、像が変形するが、光学系
により補正することができる。In the projection optical system of this embodiment, the normal line direction of the reflection panel 3 and the optical axis of the optical system 2 are aligned, and the specular reflection light of each pixel is tilted by tilting the reflection surface of each pixel. The light is emitted substantially parallel to the optical axis. However, the reflective surface of each pixel is parallel to the reflective panel (for example, a conventionally known TN (Twisted Nematic) panel).
Type reflective liquid crystal panel, etc.), the same effect as this embodiment can be obtained by inclining the reflective panel itself with respect to the optical axis. In this case, the image is deformed, but it can be corrected by the optical system.
【0028】[0028]
【発明の効果】以上説明したように、本発明によれば、
従来の投写光学系よりも、高輝度且つ高コントラスト
で、不必要な収差の発生を抑えたものが提供できる。As described above, according to the present invention,
It is possible to provide a system that has higher brightness and higher contrast than the conventional projection optical system and that suppresses the generation of unnecessary aberrations.
【図1】本発明の第1の実施例の光学系の構成図であ
る。FIG. 1 is a configuration diagram of an optical system according to a first embodiment of the present invention.
【図2】PDLC素子の断面図である。FIG. 2 is a sectional view of a PDLC element.
【図3】DMD素子の断面図である。FIG. 3 is a sectional view of a DMD element.
【図4】DMD素子の正面図である。FIG. 4 is a front view of a DMD element.
【図5】本発明の微小ミラーを有した変調素子の電気的
等価図である。FIG. 5 is an electrical equivalent diagram of a modulator having a micro mirror of the present invention.
【図6】本発明の第2の実施例の光学系の構成図であ
る。FIG. 6 is a configuration diagram of an optical system according to a second embodiment of the present invention.
【図7】本発明の第2の実施例の遮光部材を示す図であ
る。FIG. 7 is a diagram showing a light shielding member according to a second embodiment of the present invention.
【図8】図7の遮光部材の前もしくは後にカラーフィル
ターを配した場合の図である。FIG. 8 is a view showing a case where a color filter is arranged in front of or behind the light shielding member of FIG.
【図9】従来の投写光学系の一例を示す図である。FIG. 9 is a diagram showing an example of a conventional projection optical system.
【図10】従来の投写光学系の要部拡大図である。FIG. 10 is an enlarged view of a main part of a conventional projection optical system.
1 照明系 2 光学系 3 反射パネル 4 遮光部材 5 投影レンズ 6 投写光学系の光軸 7 投写面 1 Illumination system 2 Optical system 3 Reflection panel 4 Light-shielding member 5 Projection lens 6 Optical axis of projection optical system 7 Projection surface
Claims (8)
する第1の状態と、前記照明光の少なくとも一部が前記
第1の方向に正反射しない第2の状態とが切り換わる光
学素子と、前記照明光として前記光学素子に斜入射する
略平行光を形成するとともに、前記光学素子の画素によ
り前記第1の方向に正反射した反射光を受けて投写する
光学系とを有する投写光学系において、前記第1の方向
が前記光学系の光軸とほぼ平行になるよう、前記第1の
状態における前記画素の反射面を前記光学系の光軸に対
して傾けることを特徴とする投写光学系。1. For each pixel, a first state in which illumination light is specularly reflected in a first direction and a second state in which at least a part of the illumination light is not specularly reflected in the first direction are separated. And an optical system that forms substantially parallel light that is obliquely incident on the optical element as the illumination light and that receives and reflects the reflected light that is specularly reflected in the first direction by the pixels of the optical element. In the projection optical system having, the reflection surface of the pixel in the first state is inclined with respect to the optical axis of the optical system so that the first direction is substantially parallel to the optical axis of the optical system. Projection optical system.
前記光学素子の画素により前記第1の方向に正反射した
反射光を、前記光学系により前記遮光部材の第1の開口
部に集光させて投写するよう構成したことを特徴とする
請求項1記載の投写光学系。2. A light-shielding member having a first opening,
The reflected light that is specularly reflected in the first direction by the pixels of the optical element is condensed and projected by the optical system in the first opening of the light shielding member. The projection optical system described.
第2の開口部を有することを特徴とする請求項2記載の
投写光学系。3. The projection optical system according to claim 2, wherein the light shielding member has a second opening for collecting the illumination light.
の主平面までの距離と前記光学系の焦点距離とを略等し
く構成したことを特徴とする請求項3記載の投写光学
系。4. The projection optical system according to claim 3, wherein a distance from a point where the illumination light is condensed to a main plane of the optical system is substantially equal to a focal length of the optical system.
において前記画素の反射面が各画素毎に前記光学系の光
軸と垂直な面に対して傾きを有した高分子分散型液晶で
あり、前記第2の状態で前記照明光を散乱することを特
徴とする請求項1乃至4記載の投写光学系。5. The polymer dispersion type optical element, wherein in the first and second states, the reflection surface of the pixel has an inclination with respect to a surface perpendicular to the optical axis of the optical system for each pixel. The projection optical system according to claim 1, wherein the projection optical system is a liquid crystal and scatters the illumination light in the second state.
子状に配置され、前記微小ミラー毎に角度制御可能な光
学素子であり、前記第2の状態において前記照明光を前
記第1の方向とは異なる第2の方向に正反射することを
特徴とする請求項1乃至4記載の投写光学系。6. The optical element is an optical element in which a large number of minute mirrors are arranged in a grid pattern and the angle of each minute mirror can be controlled. In the second state, the illumination light is directed in the first direction. 5. The projection optical system according to claim 1, wherein the projection optical system specularly reflects in a second direction different from.
方の2枚の偏光板に挟まれたねじれネマティック型液晶
であり、前記第1、第2の状態において前記画素の反射
面が前記光軸に対して傾いており、前記第2の状態で前
記照明光を吸収することを特徴とする請求項1乃至4記
載の投写光学系。7. The optical element is a twisted nematic type liquid crystal sandwiched between two polarizing plates in front of the reflective surface of the pixel, and the reflective surface of the pixel is in the first and second states. The projection optical system according to claim 1, wherein the projection optical system is inclined with respect to the optical axis and absorbs the illumination light in the second state.
ることを特徴とする画像形成装置。8. An image forming apparatus comprising the projection optical system according to claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7008187A JPH08201755A (en) | 1995-01-23 | 1995-01-23 | Projection optical system and image forming device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7008187A JPH08201755A (en) | 1995-01-23 | 1995-01-23 | Projection optical system and image forming device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH08201755A true JPH08201755A (en) | 1996-08-09 |
Family
ID=11686304
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7008187A Withdrawn JPH08201755A (en) | 1995-01-23 | 1995-01-23 | Projection optical system and image forming device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH08201755A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001002906A1 (en) * | 1999-07-02 | 2001-01-11 | Matsushita Electric Industrial Co., Ltd. | Projection image display |
| US6508557B1 (en) | 2000-06-28 | 2003-01-21 | Koninklijke Philips Electronics N.V. | Reflective LCD projector |
| US6798583B1 (en) | 2003-04-11 | 2004-09-28 | Olympus Corporation | Projection optical apparatus |
| US7854521B2 (en) | 2005-12-28 | 2010-12-21 | Olympus Corporation | Projector |
| US12078809B2 (en) | 2020-07-17 | 2024-09-03 | Samsung Electronics Co., Ltd. | Augmented reality display device |
-
1995
- 1995-01-23 JP JP7008187A patent/JPH08201755A/en not_active Withdrawn
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001002906A1 (en) * | 1999-07-02 | 2001-01-11 | Matsushita Electric Industrial Co., Ltd. | Projection image display |
| US6666558B1 (en) | 1999-07-02 | 2003-12-23 | Matsushita Electric Industrial Co., Ltd. | Projection image display |
| US6508557B1 (en) | 2000-06-28 | 2003-01-21 | Koninklijke Philips Electronics N.V. | Reflective LCD projector |
| US6798583B1 (en) | 2003-04-11 | 2004-09-28 | Olympus Corporation | Projection optical apparatus |
| US7854521B2 (en) | 2005-12-28 | 2010-12-21 | Olympus Corporation | Projector |
| US12078809B2 (en) | 2020-07-17 | 2024-09-03 | Samsung Electronics Co., Ltd. | Augmented reality display device |
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Legal Events
| Date | Code | Title | Description |
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