JPH0816980B2 - Magnetic disk substrate and method of manufacturing the same - Google Patents
Magnetic disk substrate and method of manufacturing the sameInfo
- Publication number
- JPH0816980B2 JPH0816980B2 JP62062299A JP6229987A JPH0816980B2 JP H0816980 B2 JPH0816980 B2 JP H0816980B2 JP 62062299 A JP62062299 A JP 62062299A JP 6229987 A JP6229987 A JP 6229987A JP H0816980 B2 JPH0816980 B2 JP H0816980B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic disk
- substrate
- groove
- magnetic
- mold
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000758 substrate Substances 0.000 title claims description 56
- 238000004519 manufacturing process Methods 0.000 title claims description 20
- 238000001746 injection moulding Methods 0.000 claims description 9
- 229920005992 thermoplastic resin Polymers 0.000 claims description 8
- 238000000034 method Methods 0.000 description 17
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 16
- 239000010408 film Substances 0.000 description 9
- 229920005989 resin Polymers 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- 238000001179 sorption measurement Methods 0.000 description 7
- 229920002120 photoresistant polymer Polymers 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 238000005323 electroforming Methods 0.000 description 5
- 229910052759 nickel Inorganic materials 0.000 description 5
- 238000000465 moulding Methods 0.000 description 4
- 238000005520 cutting process Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000003068 static effect Effects 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 239000004697 Polyetherimide Substances 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 229920001601 polyetherimide Polymers 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 238000007788 roughening Methods 0.000 description 2
- 230000008961 swelling Effects 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229910018487 Ni—Cr Inorganic materials 0.000 description 1
- 229930182556 Polyacetal Natural products 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 239000006061 abrasive grain Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000003698 laser cutting Methods 0.000 description 1
- 238000005339 levitation Methods 0.000 description 1
- 229910001004 magnetic alloy Inorganic materials 0.000 description 1
- 125000005439 maleimidyl group Chemical class C1(C=CC(N1*)=O)=O 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920006380 polyphenylene oxide Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Description
【発明の詳細な説明】 〈産業上の利用分野〉 本発明は高密度記録再生用硬質磁気デイスクに用いら
れる熱可塑性樹脂製の磁気デイスク基板およびその製造
方法に関する。DETAILED DESCRIPTION OF THE INVENTION <Industrial field of application> The present invention relates to a magnetic disk substrate made of a thermoplastic resin used for a hard magnetic disk for high-density recording and reproduction, and a method for manufacturing the same.
〈従来の技術〉 近年、高密度記録の磁気デイスクとして熱可塑性樹脂
を用いて射出成形により平坦でかつ平滑な円盤状の基体
を製造し、この表面にメツキ法もしくはスパツタ法によ
り磁性薄膜を設けたものが検討されはじめた。<Prior Art> In recent years, a flat and smooth disk-shaped substrate was manufactured by injection molding using a thermoplastic resin as a magnetic disk for high-density recording, and a magnetic thin film was provided on the surface by a plating method or a sputtering method. Things began to be considered.
磁気デイスク装置の磁気ヘツド(以下、単にヘツドと
いう)は一般にコンタクト・スタート・ストツプ型の浮
上タイプが使用されており、磁気デイスクの回転中には
ヘツドが浮上しているが、回転停止中にはヘツドが磁気
デイスクに接触している。近年の高記録密度化の要求か
ら、ヘツドの浮上高さを可能な限り小さくする努力がな
され、磁気デイスクの表面はとくに平坦でかつ高度の鏡
面に仕上げられている。The magnetic head (hereinafter simply referred to as head) of the magnetic disk device is generally a contact start stop type levitation type. While the magnetic disk is rotating, the head is floating, but when the rotation is stopped, The head is in contact with the magnetic disk. Due to the recent demand for higher recording density, efforts have been made to reduce the flying height of the head as much as possible, and the surface of the magnetic disk is particularly flat and highly mirror finished.
ところが、磁気デイスク表面の仕上げの高度化にとも
ない、ヘツドが磁気デイスクに吸着する現象が生じる。
すなわち、ヘツドが磁気デイスクに接触したままになる
とヘツドが磁気デイスクに吸着し、ふたたび磁気デイス
クが回転を始めるときに静摩擦係数が大きくなるという
問題が生じている。とくに前記吸着現象は磁気デイスク
の停止時間が長くなるほど生じやすく、磁気デイスク装
置の信頼性を低下させる結果となつていた。However, as the surface finish of the magnetic disk becomes more sophisticated, a phenomenon occurs in which the head is attracted to the magnetic disk.
That is, if the head remains in contact with the magnetic disk, the head is attracted to the magnetic disk, and the static friction coefficient increases when the magnetic disk starts to rotate again. In particular, the adsorption phenomenon is more likely to occur as the stop time of the magnetic disk becomes longer, resulting in a decrease in reliability of the magnetic disk device.
従来、このようなヘツドの吸着現象の発生を防ぐため
に研摩された磁気デイスク基板を回転させ、これにサン
ドペーパーなどの研摩材を押当てて、基板の表面に円心
円状の微細な溝を作つて粗面化する方法が知られている
(特開昭53-123906号公報)。また、磁気デイスク基板
の表面を荒い研摩布で荒仕上げをしたり、あるいはレー
ザービームを照射して基板の表面層を焼きつけることに
よつて粗面化する方法も知られている(特開昭54-23508
号公報)。Conventionally, a magnetic disk substrate that has been polished to prevent the occurrence of such a head adsorption phenomenon is rotated, and an abrasive such as sandpaper is pressed against the magnetic disc substrate to form fine circular concentric grooves on the surface of the substrate. A method of producing and roughening is known (Japanese Patent Laid-Open No. 53-123906). There is also known a method of roughening the surface of a magnetic disk substrate by roughing it with a rough polishing cloth or by irradiating a laser beam to burn the surface layer of the substrate (JP-A-54). -23508
Issue).
また、磁気デイスクの表面を研摩剤を用いてメカノケ
ミカルポリツシユすることによつて適度の表面荒さとす
る方法も知られている(特開昭61-267931号公報)。There is also known a method in which the surface of a magnetic disk is mechanically chemically polished with an abrasive to obtain an appropriate surface roughness (JP-A-61-267931).
さらに、非磁性基体面上に研摩砥粒等を配し、非磁性
基体を回転させることによつて、非磁性基体上にほぼ同
心円状のあるいはほぼ渦巻状の傷を付けておき、その表
面にメツキ処理で磁性膜を構成すると、この磁性膜は下
地面の影響を受けて、磁性膜が円周方向に磁気配向し、
磁気特性が向上することが知られている(特開昭61-168
118号公報、特開昭61-202324号公報および特開昭61-242
334号公報)。Further, by disposing abrasive grains or the like on the surface of the non-magnetic substrate and rotating the non-magnetic substrate, a scratch on the non-magnetic substrate is formed in a substantially concentric or spiral shape, and the surface is scratched. When a magnetic film is formed by plating, the magnetic film is affected by the underlying surface, and the magnetic film is magnetically oriented in the circumferential direction.
It is known that magnetic characteristics are improved (Japanese Patent Laid-Open No. 61-168).
118, JP-A 61-202324, and JP 61-242
No. 334).
また、円周状に形成された溝があることによつて、そ
の上に形成された磁性合金薄膜は円周方向に角形比が高
い、すなわち円周方向に磁気配向したデイスクが得られ
る効果がある。また、溝の本数が多いほど又溝の形状が
規則正しいほど配向性が高くなることも知られている
(E.Teng,N.Ballard:IEEE Trans.Mag.,vol.MAG−22,No.
5,September 1986)。Further, since the groove is formed in a circular shape, the magnetic alloy thin film formed thereon has a high squareness ratio in the circumferential direction, that is, the effect of obtaining a disk magnetically oriented in the circumferential direction is obtained. is there. It is also known that the greater the number of grooves and the more regular the shape of the grooves, the higher the orientation (E.Teng, N. Ballard: IEEE Trans.Mag., Vol.MAG-22, No.
5, September 1986).
〈発明が解決しようとする問題点〉 しかし、このような研摩による方法あるいはレーザー
ビームの照射による方法では円盤上の溝が不均一にな
る。すなわち、溝の幅、深さおよび溝ピツチ(溝と溝と
の間隔)がまちまちになる。また、研摩材で削りとられ
て出来た溝の縁には盛り上りを生じる。このように溝が
不均一であつたり、盛り上りがあるとヘツドの浮上が安
定しなくなりヘツドクラツシユを生ずる原因になる。<Problems to be Solved by the Invention> However, with such a polishing method or a laser beam irradiation method, the grooves on the disk become non-uniform. That is, the width and depth of the groove and the groove pitch (distance between the grooves) vary. In addition, a swelling occurs on the edge of the groove formed by cutting with the abrasive. If the grooves are uneven or risen in this manner, the flying of the head becomes unstable and causes head clash.
また、上記のような方法で円周方向に溝を形成するた
めにはその表面を一担鏡面に仕上げてから行なう必要が
あるため基板製造の工程が長くなるという欠点がある。Further, in order to form a groove in the circumferential direction by the above-mentioned method, it is necessary to finish the surface of the groove to form a mirror-finished surface, so that there is a drawback that the manufacturing process of the substrate becomes long.
本発明はこれらの問題点を改善し所望の特性を有する
磁気デイスク用基板を提供することを目的とする。It is an object of the present invention to solve these problems and provide a magnetic disk substrate having desired characteristics.
〈問題を解決するための手段〉 発明者らは熱可塑性樹脂から射出成形により表面が平
滑な磁気デイスク基板を製造するときに、金型表面の微
細な傷が磁気デイスク基板の表面に忠実に転写されるこ
とに着目し種々検討の結果、ここで射出成形する金型に
同心円状の溝を転写させるための逆の形状の加工を施し
ておくことにより、射出成形して得られる基板上に規則
正しい同心円状の溝を容易に形成できることがわかつ
た。<Means for Solving the Problem> When manufacturing a magnetic disk substrate having a smooth surface by injection molding from a thermoplastic resin, the inventors faithfully transfer minute scratches on the surface of the mold to the surface of the magnetic disk substrate. As a result of various studies focusing on the fact that the injection molding is performed on the substrate obtained by injection molding regularly, by performing processing of the reverse shape for transferring the concentric circular groove to the mold to be injection molded here. It has been found that a concentric groove can be easily formed.
すなわち、本発明は第1に表面が鏡面の熱可塑性樹脂
製円盤上に、溝幅500〜20000Å、溝深さ200〜2000Å、
溝ピツチ1000〜20000Åの同心円状又は渦巻き状の多数
の溝を射出成形法により形成した磁気デイスク基板であ
る。That is, the present invention is, firstly, on a thermoplastic resin disk whose surface is a mirror surface, with a groove width of 500 to 20000Å, a groove depth of 200 to 2000Å,
A magnetic disk substrate having a large number of concentric circular or spiral grooves of groove pitch 1000 to 20000Å formed by an injection molding method.
また、本発明の第2は熱可塑性樹脂を成形して表面が
鏡面の磁気デイスク基板を製造する際に、該基板の表面
に当接する金型の表面に同心円状の多数の凸堤を形成さ
せた金型を用いることを特徴とする、同心円状に多数の
溝を形成させた磁気デイスク基板の製造方法である。In the second aspect of the present invention, when a thermoplastic resin is molded to manufacture a magnetic disk substrate having a mirror surface, a large number of concentric convex ridges are formed on the surface of a mold that abuts the surface of the substrate. Another method is to manufacture a magnetic disk substrate having a large number of concentric grooves formed by using a metal mold.
以下、本発明について詳しく説明する。本発明におい
て熱可塑性樹脂とはポリエーテルイミド樹脂、ポリエー
テルサルフオン樹脂、ポリカーボネート樹脂、ポリサル
フオン樹脂、アクリル樹脂、変性マレイミド樹脂、ポリ
アミド樹脂、ポリフエニレンオキサイド樹脂、ポリフエ
ニレンスルフイド樹脂、PBT樹脂、ポリアセタール樹脂
等であり、好ましくはそれらの熱変形温度(ASTM D−64
8に準拠して荷重18、6Kg/cm2で測定)が100℃以上のも
のである。表面が鏡面とはその凹凸がヘツドの浮上走行
に支障がない程度のものであり、具体的には粗面度Rmax
が3000Å以下、好ましくは200Å以下である。Rmaxが300
0Åを超えると、ヘツドの浮上高さをそれ以上にしなけ
ればならず、高密度の記録ができない。Hereinafter, the present invention will be described in detail. In the present invention, the thermoplastic resin is a polyetherimide resin, a polyether sulfone resin, a polycarbonate resin, a polysulfone resin, an acrylic resin, a modified maleimide resin, a polyamide resin, a polyphenylene oxide resin, a polyphenylene sulfide resin, PBT resin , Polyacetal resin, etc., preferably their heat distortion temperature (ASTM D-64
Measured with a load of 18 and 6 kg / cm 2 according to 8) above 100 ° C. If the surface is a mirror surface, its irregularities do not hinder the flying of the head.
Is less than 3000Å, preferably less than 200Å. Rmax is 300
If it exceeds 0Å, the flying height of the head must be made higher, and high-density recording cannot be performed.
同心円状の多数の溝とは同心円の多数の溝あるいは巻
回数の多い渦巻きの溝である。溝幅は500〜20000Åの範
囲でなければならず、好ましくは1000〜10000Åであ
る。溝ピツチは1000〜20000Åの範囲でなければなら
ず、好ましくは2000〜20000Åである。溝幅または溝ピ
ツチが上記範囲外ではヘツドの吸着現象の防止効果がな
い。溝の深さは200〜2000Åの範囲になければならず、
好ましくは500〜1000Åである。溝の深さが200Å未満で
はヘツドの吸着現象の防止効果がなく、逆に2000Åを越
えるとヘツドと磁気デイスク表面の磁性媒体との間隔が
大きくなり、再生出力が低下する。溝の断面形状はとく
に限定はなく、V字形でもU字形でもよい。The large number of concentric grooves is a large number of concentric grooves or a spiral groove having a large number of turns. The groove width should be in the range of 500 to 20000Å, preferably 1000 to 10000Å. The groove pitch should be in the range of 1000 to 20000Å, preferably 2000 to 20000Å. If the groove width or groove pitch is outside the above range, there is no effect of preventing the head adsorption phenomenon. The depth of the groove must be in the range of 200-2000Å,
It is preferably 500 to 1000Å. If the depth of the groove is less than 200Å, there is no effect of preventing the head adsorption phenomenon. On the other hand, if it exceeds 2000Å, the distance between the head and the magnetic medium on the magnetic disk surface becomes large and the reproduction output decreases. The cross-sectional shape of the groove is not particularly limited and may be V-shaped or U-shaped.
磁気デイスク基板表面に前記の溝を形成するために用
いられる金型は、該基板の表面に当接する金型の表面に
同心円状の多数の凸堤を形成させた金型を用いる。凸堤
とは平面からの細長い盛上りである。金型の表面の凸堤
が転写されて磁気デイスク基板上に溝が形成されるので
あるから凸堤はその凹凸が溝と反対であるが、その幅、
ピツチなどの特性は前記の溝の場合と同じである。The mold used for forming the groove on the surface of the magnetic disk substrate is a mold in which a large number of concentric convex ridges are formed on the surface of the mold that contacts the surface of the substrate. A convex bank is a slender rise from a plane. Since the convex bank on the surface of the mold is transferred and the groove is formed on the magnetic disk substrate, the convex bank has unevenness opposite to the groove, but its width is
The characteristics of the pitch and the like are the same as those of the groove described above.
このような凸堤を設けた金型を製作するには、まずマ
スター基板を製作しなければならない。マスター基板を
製作する第1の方法はまず磁気デイスク基板と同一形
状、同一寸法の円盤を製作し、これにダイヤモンド切削
によつて溝を形成させてマスター基板とする方法であ
る。In order to manufacture a mold provided with such a convex bank, a master substrate must first be manufactured. The first method of manufacturing the master substrate is to first manufacture a disk having the same shape and size as the magnetic disk substrate, and form a groove on the disk by diamond cutting to obtain the master substrate.
マスター基板の製作方法の第2のレーザーカツテイン
グ技術とフオトレジストを利用する方法である。すなわ
ち、まず磁気デイスク基板と同一形状、同一寸法のガラ
ス円盤の表面にフオトレジストを薄く塗布し、これにレ
ーザー光線のスポツトを同心円または渦巻状に照射する
ことによつて円盤の表面にフオトレジストの硬化物から
なる同心円または渦巻の凸堤を形成させマスター基板と
する方法である。This is a method of using a second laser cutting technique and a photoresist as a method of manufacturing a master substrate. That is, first, a photoresist is thinly applied to the surface of a glass disk having the same shape and size as the magnetic disk substrate, and spots of a laser beam are irradiated concentrically or spirally on the surface of the disk to cure the photoresist. This is a method of forming a concentric circular or spiral convex bank of objects and using it as a master substrate.
マスター基板から金型を製作するにはマスター基板に
電鋳を行なうことによつて金属箔上にマスター基板表面
の凹凸を転写させ、金属箔に裏打ち補強を行なつて金型
に仕上げる。金型としては射出成形用の金型入子でもよ
く、また、光デイスク、コンパクトデイスク等の成形に
用いられているスタンパー成形仕様の射出成形金型とし
てもよい。To manufacture a die from the master substrate, electroforming is performed on the master substrate to transfer the irregularities on the surface of the master substrate onto the metal foil, and the metal foil is backed and reinforced to complete the die. The mold may be a mold insert for injection molding, or may be an injection molding mold having a stamper molding specification used for molding an optical disc, a compact disc, or the like.
〈実施例〉 以下、実施例により本発明を具体的に説明する 実施例1 まず、アルミ板を切削加工して磁気デイスク基板と同
一寸法の円盤を製作した。円盤にニツケルメツキを施し
たのち、表面を研摩して粗面度Rmaxが0.02μm以下の超
鏡面に仕上げた。<Examples> Hereinafter, the present invention will be described in detail with reference to Examples. Example 1 First, an aluminum plate was cut to manufacture a disk having the same dimensions as a magnetic disk substrate. After the disk was nicked, the surface was polished to a super-mirror surface with a roughness Rmax of 0.02 μm or less.
つぎに、ダイヤモンド切削により円盤上に溝幅1000〜
2000Å、溝深さ500〜1000Å、溝ピツチ2000〜4000Åで
断面形状がV形の溝を形成させマスター基板とした。Next, by diamond cutting, the groove width of 1000 ~
A master substrate was prepared by forming a groove having a V-shaped cross section with 2000Å, a groove depth of 500 to 1000Å, and a groove pitch of 2000 to 4000Å.
第1図に示すとおり、マスター基板1にニツケル電鋳
2を行なつたのち、これを引剥がして第2図に示すニツ
ケル箔3を得て、これに第3図に示すとおりニツケルに
より裏打ち4の補強を行ない、肉厚25mmの金型入子とし
た。As shown in FIG. 1, nickel electroforming 2 is performed on the master substrate 1 and then the nickel foil 3 is peeled off to obtain a nickel foil 3 shown in FIG. 2. The nickel foil 3 is lined with nickel as shown in FIG. Was reinforced to form a mold insert with a wall thickness of 25 mm.
第4図に示すとおり、金型入子6,7を金型内に納め、
型締めした。ポリエーテルイミドの溶融体(温度390
℃)を注入口5から温度150℃に加熱した金型内に注入
した。金型を冷却し固化した成形品8を取外した。As shown in Fig. 4, put the mold inserts 6, 7 in the mold,
The mold was clamped. Polyetherimide melt (temperature 390
(° C.) was injected from the injection port 5 into a mold heated to a temperature of 150 ° C. The mold was cooled and the solidified molded product 8 was removed.
次に成形された基板上にスパツタ装置により、クロム
膜(厚さ1000〜1200Å)、磁性膜(組成Co-Ni-Cr、厚さ
700Å)およびカーボン保護膜(厚さ200〜300Å)をこ
の順で被着させて磁気デイスクとした。Next, a chrome film (thickness: 1000 to 1200Å), magnetic film (composition: Co-Ni-Cr, thickness:
700 Å) and a carbon protective film (thickness 200 to 300 Å) were applied in this order to form a magnetic disk.
完成した磁気デイスクをコンタクト・スタート・スト
ツプ装置(CSS装置)によりスタート・ストツプを繰返
し行なつたのち、磁気デイスクの回転を一定時間止め、
ついで低速で回転させた時にヘツドが磁気デイスクに吸
着しないかストレーンゲージで確認した結果、静摩擦係
数が0.3以下であり吸着現象は認められなかつた。ま
た、この磁気デイスクの磁気特性を振動試料型磁気測定
機(VSM装置)で測定した結果、円周方向の角形比θと
円周と直角方向の角形比γとの比(θ/γ)は1.3であ
り、磁性体が円周方向に配向していた。After repeating the start and stop of the completed magnetic disk by the contact start and stop device (CSS device), the rotation of the magnetic disk is stopped for a certain period of time.
Then, it was confirmed by a strain gauge whether the head did not adsorb to the magnetic disk when it was rotated at a low speed. As a result, the static friction coefficient was 0.3 or less and no adsorption phenomenon was observed. In addition, as a result of measuring the magnetic characteristics of this magnetic disk with a vibrating sample magnetometer (VSM device), the ratio (θ / γ) between the squareness ratio θ in the circumferential direction and the squareness ratio γ in the direction perpendicular to the circumference is It was 1.3, and the magnetic substance was oriented in the circumferential direction.
実施例2 まず、ガラス板を加工して磁気デイスク基板と同一寸
法の円盤を製作し、その表面を超鏡面に仕上げた。Example 2 First, a glass plate was processed to manufacture a disk having the same dimensions as the magnetic disk substrate, and the surface thereof was finished into a super-mirror surface.
つぎに、コンパクトデイスクや光デイスク基板の成形
の際に情報面を転写させるスタンパーを製造する工程を
利用して、磁気ディスク基板用スタンパーを製造した。
すなわち、まず、ガラス円盤の表面に光硬化性のフオト
レジストを均等に塗布した。つぎに、円盤を回転させな
がらレーザー光線のスポツト(径約500Å)を円盤の半
径方向に移動させることにより、円盤の表面のフオトレ
ジストを渦巻状に硬化させた。未硬化のフオトレジスト
は溶剤で洗浄して除去した。以上の方向で円盤の表面に
凸堤の幅5000〜10000Å、高さ500〜1000Å、ピツチ1000
0〜20000Å、凸堤断面が逆U字形の凸堤を形成させ、逆
マスター基板13とした。この逆マスター基板にニツケル
電鋳14を行なつたのち、これを引剥がしてニツケル箔を
得、これに裏打ち15の補強を行なつてマスター基板とし
た。Next, a stamper for a magnetic disk substrate was manufactured by using a process of manufacturing a stamper for transferring an information surface when molding a compact disk or an optical disk substrate.
That is, first, a photocurable photoresist was uniformly applied to the surface of the glass disk. Next, while rotating the disk, the spot of the laser beam (diameter about 500Å) was moved in the radial direction of the disk to cure the photoresist on the surface of the disk in a spiral shape. The uncured photoresist was removed by washing with a solvent. In the above direction, the convex bank has a width of 5000 to 10000Å, a height of 500 to 1000Å, and a pitch of 1000 on the surface of the disk.
The reverse master substrate 13 was formed by forming a convex bank with an inverted U-shaped cross section of 0 to 20000Å. Nickel electroforming 14 was performed on the reverse master substrate, and the nickel foil was peeled off to obtain a nickel foil, which was then reinforced with a backing 15 to obtain a master substrate.
このマスター基板をニツケル電鋳16により転写させ
て、凸堤を形成させたスタンパー17とし、これをスタン
パー成形用の射出成形金型に取付けて実施例1と同様に
成形を行ない磁気デイスク基板とした。This master substrate was transferred by Nickel electroforming 16 to form a stamper 17 having a convex bank formed thereon, and this stamper 17 was attached to an injection molding die for stamper molding and molded in the same manner as in Example 1 to obtain a magnetic disk substrate. .
実施例1と同じ方法でクロム膜、磁性膜およびカーボ
ン保護膜を被着させ磁気デイスクに仕上げた。実施例1
と同じ方法でヘツドの吸着現象の有無を調べた結果、静
摩擦係数が0.3以下であり、ヘツドが磁気デイスクに吸
着する現象は全く認められなかつた。A chrome film, a magnetic film and a carbon protective film were applied in the same manner as in Example 1 to complete a magnetic disk. Example 1
As a result of investigating the presence or absence of the adsorption phenomenon of the head by the same method as the above, the static friction coefficient was 0.3 or less, and the phenomenon that the head was adsorbed to the magnetic disk was not recognized at all.
〈発明の効果〉 この発明の磁気デイスク基板から製造した磁気デイス
クはヘツドの磁気デイスク面への吸着現象がないので、
磁気デイスクのコンタクト・スタート・ストツプを繰返
し行なつてもヘツドの損傷を生ずるおそれがない。<Effect of the Invention> Since the magnetic disk manufactured from the magnetic disk substrate of the present invention has no phenomenon of adsorption to the magnetic disk surface of the head,
There is no risk of the head being damaged even if the contact start stop of the magnetic disk is repeated.
また、この発明の方法によれば特別な工程によること
なく、上記磁気デイスク基板を製造することができ、と
くにこの発明の方法では原理的に溝の縁に余分な盛り上
りを生ずることがないので、この点でもヘツドの損傷を
生ずるおそれがない。Further, according to the method of the present invention, the above-mentioned magnetic disk substrate can be manufactured without any special process, and in particular, in the method of the present invention, an extra swelling does not occur at the edge of the groove in principle. In this respect as well, there is no risk of head damage.
また、この発明の磁気デイスク基板から製造された磁
気デイスクはとくに円周方向の角形比が高いので、高密
度で磁気記録を行なう上で有利である。このように、本
願発明によれば、コンタクト・スタート・ストツプ領域
およびデータ記録領域の両者で独立した効果を得られる
ため、必ずしも基板の全面に渡って溝を形成する必要は
ない。Further, since the magnetic disk manufactured from the magnetic disk substrate of the present invention has a particularly high squareness ratio in the circumferential direction, it is advantageous in performing magnetic recording at high density. As described above, according to the present invention, it is not necessary to form the groove over the entire surface of the substrate because the contact start stop region and the data recording region can obtain independent effects.
第1図〜第3図はこの発明の磁気デイスク基板の製造に
用いられる金型入子の製作途中の断面図である。第4図
はこの発明の磁気デイスク基板の製造に用いられる金型
の断面図である。第5図〜第9図はこの発明の磁気デイ
スク基板の製造に用いられるスタンパーの製作途中の断
面図である。 符号 1……マスター基板、2,14,16……ニツケル電鋳、3…
…ニツケル箔、4,15……裏打ち、5……注入口、6,7…
…金型入子、8……成形品、9……スプルーブツシユ、
10……エジエクターロツド、11……固型側型板、12……
可動側型板、13……逆マスター基板、17……スタンパー1 to 3 are cross-sectional views of a mold insert used in the manufacture of the magnetic disk substrate of the present invention during manufacture. FIG. 4 is a sectional view of a mold used for manufacturing the magnetic disk substrate of the present invention. 5 to 9 are sectional views of the stamper used for manufacturing the magnetic disk substrate of the present invention during manufacture. Reference numeral 1 ... Master substrate, 2, 14, 16 ... Nickel electroforming, 3 ...
… Nickel foil, 4,15 …… lining, 5 …… injector, 6,7…
… Mold insert, 8 …… Molded product, 9… Sprue bush,
10: Edger rod, 11: Solid side template, 12 ...
Movable side template, 13 …… Reverse master board, 17 …… Stamper
Claims (2)
500〜20000Å、溝深さ200〜2000Å、溝ピッチ1000〜200
00Åの同心円状の多数の溝を射出成形法により形成させ
た磁気デイスク基板。1. A groove width is formed on a thermoplastic resin disk whose surface is a mirror surface.
500 to 20000Å, groove depth 200 to 2000Å, groove pitch 1000 to 200
A magnetic disk substrate with a large number of concentric 00Å grooves formed by injection molding.
デイスク基板を製造する際に、該基板の表面に当接する
金型の表面に同心円状の多数の凸堤を形成させた金型を
用いることを特徴とする、同心円状に多数の溝を形成さ
せた磁気デイスク基板の製造方法。2. A mold in which a large number of concentric convex ridges are formed on the surface of a mold which is in contact with the surface of a substrate when the thermoplastic resin is molded to produce a magnetic disk substrate having a mirror surface. A method of manufacturing a magnetic disk substrate having a large number of concentric grooves formed therein.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62062299A JPH0816980B2 (en) | 1987-03-17 | 1987-03-17 | Magnetic disk substrate and method of manufacturing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62062299A JPH0816980B2 (en) | 1987-03-17 | 1987-03-17 | Magnetic disk substrate and method of manufacturing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63228414A JPS63228414A (en) | 1988-09-22 |
| JPH0816980B2 true JPH0816980B2 (en) | 1996-02-21 |
Family
ID=13196101
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62062299A Expired - Fee Related JPH0816980B2 (en) | 1987-03-17 | 1987-03-17 | Magnetic disk substrate and method of manufacturing the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0816980B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63255816A (en) * | 1987-04-14 | 1988-10-24 | Sekisui Chem Co Ltd | Production of substrate for magnetic disk |
| JPH01273218A (en) * | 1988-04-25 | 1989-11-01 | Mitsubishi Electric Corp | Magnetic disk |
| US5067039A (en) * | 1989-10-20 | 1991-11-19 | Insite Peripherals, Inc. | High track density magnetic media with pitted optical servo tracks and method for stamping the tracks on the media |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6151619A (en) * | 1984-08-22 | 1986-03-14 | Asahi Chem Ind Co Ltd | magnetic recording medium |
-
1987
- 1987-03-17 JP JP62062299A patent/JPH0816980B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63228414A (en) | 1988-09-22 |
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